Generation of excimer emission in dielectric barrier discharges

Technological Innovations in Photochemistry for Organic Synthesis: Flow Chemistry, High-Throughput Experimentation, Scale-up, and Photoelectrochemistry

Photoinduced chemical transformations have received in recent years a tremendous amount of attention, providing a plethora of opportunities to synthetic organic chemists. However, performing a photochemical transformation can be quite a challenge because of various issues related to the delivery of photons. These challenges have barred the widespread adoption of photochemical steps in the chemical industry. However, in the past decade, several technological innovations have led to more reproducible, selective, and scalable photoinduced reactions. Herein, we provide a comprehensive overview of these exciting technological advances, including flow chemistry, high-throughput experimentation, reactor design and scale-up, and the combination of photo- and electro-chemistry.

VUV-photolysis of aqueous solutions of hydroxylamine and nitric oxide. Effect of organic matter: phenol

VUV-irradiation of aqueous solutions containing hydroxylamine (NH₂OH) in its acid form (NH₃OH⁺) and phenol (C₆H₅OH) results in the simultaneous mineralization of the organic substrate and the almost quantitative reduction of NH₃OH⁺ to ammonium ions (NH₄⁺). Irradiation of aqueous solutions of NH₃OH⁺ in the absence of organic substrates showed the formation of nitrate (NO₃^-) and nitrite (NO₂^-) and minor quantities of NH₄⁺. In line with these experiments, VUV-irradiation of aqueous solutions of nitrogen monoxide (NO˙) yields NH₄⁺ only when C₆H₅OH is simultaneously mineralized. A possible reaction mechanism is discussed, where reactions of NO˙ and NH₃OH⁺ with hydrogen atoms (H˙), hydroxyl radicals (HO˙) and hydrated electrons (e^-_aq), all generated by the VUV-photochemically initiated homolysis of water, are of great importance to the observed results. In the presence of phenol, competition between phenol and either NO˙ or NH₃OH⁺ for these reactive intermediates in the primary volume of reactions strongly determines the oxidation state and nature of the N-containing products. C-Centered radicals and intermediate products of reactions may also have an important effect on the overall mechanism. The present results are discussed in relation to the actual state of knowledge presented in the literature.

Can light-based approaches overcome antimicrobial resistance?

The relentless rise of antibiotic resistance is considered one of the most serious problems facing mankind. This mini-review will cover three cutting-edge approaches that use light-based techniques to kill antibiotic-resistant microbial species, and treat localized infections. First, we will discuss antimicrobial photodynamic inactivation using rationally designed photosensitizes combined with visible light, with the added possibility of strong potentiation by inorganic salts such as potassium iodide. Second, the use of blue and violet light alone that activates endogenous photoactive porphyrins within the microbial cells. Third, it is used for "safe UVC" at wavelengths between 200 nm and 230 nm that can kill microbial cells without damaging host mammalian cells. We have gained evidence that all these approaches can kill multidrug resistant bacteria in vitro, and they do not induce themselves any resistance, and moreover can treat animal models of localized infections caused by resistant species that can be monitored by noninvasive bioluminescence imaging. Light-based antimicrobial approaches are becoming a growing translational part of anti-infective treatments in the current age of resistance.

Dielectric Barrier Discharge based Mercury-free plasma UV-lamp for efficient water disinfection

A structurally simple dielectric barrier discharge based mercury-free plasma UV-light source has been developed for efficient water disinfection. The source comprises of a dielectric barrier discharge arrangement between two co-axial quartz tubes with an optimized gas gap. The outer electrode is an aluminium baked foil tape arranged in a helical form with optimized pitch, while the inner electrode is a hollow aluminium metallic rod, hermetically sealed. Strong bands peaking at wavelengths 172 nm and 253 nm, along with a weak band peaking at wavelength 265 nm have been simultaneously observed due to plasma radiation from the admixture of xenon and iodine gases. The developed UV source has been used for bacterial deactivation studies using an experimental setup that is an equivalent of the conventional house-hold water purifier system. Deactivation studies for five types of bacteria, i.e., E. coli, Shigella boydii, Vibrio, Coliforms and Fecal coliform have been demonstrated with 4 log reductions in less than ten seconds.

Cold and intense OH radical beam sources

We present the design and performance of two supersonic radical beam sources: a conventional pinhole-discharge source and a dielectric barrier discharge (DBD) source, both based on the Nijmegen pulsed valve. Both designs have been characterized by discharging water molecules seeded in the rare gases Ar, Kr, or Xe. The resulting OH radicals have been detected by laser-induced fluorescence. The measured OH densities are (3.0 ± 0.6) × 10(11) cm(-3) and (1.0 ± 0.5) × 10(11) cm(-3) for the pinhole-discharge and DBD sources, respectively. The beam profiles for both radical sources show a relative longitudinal velocity spread of about 10%. The absolute rotational ground state population of the OH beam generated from the pinhole-discharge source has been determined to be more than 98%. The DBD source even produces a rotationally colder OH beam with a population of the ground state exceeding 99%. For the DBD source, addition of O2 molecules to the gas mixture increases the OH beam density by a factor of about 2.5, improves the DBD valve stability, and allows to tune the mean velocity of the radical beam.

Photo-dissociation of dimethylamine by KrBr* excilamp

A study of dimethylamine photo-dissociation in the gas phase has been conducted using UV radiation delivered from a KrBr(*) excilamp, driven by a sinusoidal electronic control gear with maximum emission at wavelength of 207 nm. The electrical input power and radiant power of the lamp were measured to determine their effects on the degradation. The influence of flow velocity and initial concentration of dimethylamine were also examined. In order to evaluate the photo-dissociation process comprehensively, several parameters were investigated, including removal efficiency, energy yield, carbon balance and CO₂ selectivity. It is shown that the removal efficiency increases with enhanced input power and decreased gas flow rate. A high removal efficiency of 68% is achieved for lamp power 102W and flow velocity 15 m(3) h(-1). The optimum dimethylamine initial concentration is around 3520 mg m(-3), for which the energy yield reaches up to 442 gk Wh(-1) when the input power is 65W. In addition, two chain compounds (1,3-bis-dimethylamino-2-propanol; 3-penten-2-one, 4-amino) and three ring organic matters (1-azetidinecarboxaldehyde, 2,2,4,4-tetramethyl; N-m-tolyl-succinamic acid; p-acetoacetanisidide), were identified by GC-MS as secondary products, in order to demonstrate the pathways of the dimethylamine degradation.

Microfabricated chip-scale rubidium plasma light source for miniature atomic clocks

We present the microfabrication and characterization of a low-power, chip-scale Rb plasma light source, designed for optical pumping in miniature atomic clocks. A dielectric barrier discharge (DBD) configuration is used to ignite a Rb plasma in a micro-fabricated Rb vapor cell on which external indium electrodes were deposited. The device is electrically driven at frequencies between 1 and 36 MHz, and emits 140 μW of stable optical power while coupling less than 6 mW of electrical power to the discharge cell. Optical powers of up to 15 and 9 μW are emitted on the Rb D2 and D1 lines, respectively. Continuous operation of the light source for several weeks has been demonstrated, showing its capacity to maintain stable optical excitation of Rb atoms in chip-scale double-resonance atomic clocks.

A novel APPI-MS setup for in situ degradation product studies of atmospherically relevant compounds: capillary atmospheric pressure photo ionization (cAPPI)

We report on the development of a novel atmospheric pressure photoionization setup and its applicability for in situ degradation product studies of atmospherically relevant compounds. A custom miniature spark discharge lamp was embedded into an ion transfer capillary, which separates the atmospheric pressure from the low pressure region in the first differential pumping stage of a conventional atmospheric pressure ionization mass spectrometer. The lamp operates with a continuous argon flow and produces intense light emissions in the VUV. The custom lamp is operated windowless and efficiently illuminates the sample flow through the transfer capillary on an area smaller than 1 mm(2). Limits of detection in the lower ppbV range, a temporal resolution of milliseconds in the positive as well as the quasi simultaneously operating negative ion mode, and a significant reduction of ion transformation processes render this system applicable to real time studies of rapidly changing chemical systems. The method termed capillary atmospheric pressure photo ionization (cAPPI) is characterized with respect to the lamp emission properties as a function of the operating conditions, temporal response, and its applicability for in situ degradation product studies of atmospherically relevant compounds, respectively.

Low Temperature Si Oxidation with Excimer Lamp Sources

The principles of vacuum ultraviolet (VUV) and ultraviolet (UV) light generated from a new type of excimer lamp are described. Direct photo-oxidation of silicon at a temperature of 250°C has been investigated using a Xe2* excimer lamp operating at a wavelength of 172 nm. The induced reaction rate of 0.1 nm/min is 90 times greater than thermal oxidation at 612°C. Results will be compared to those previously obtained by a low pressure mercury lamp and conventional furnace oxidation. Ozone plays an extremely important role in the reaction enhancement which was found to be strongly dependent upon oxygen pressure with the highest rates being achievable below 10 mbar. Ellipsometry, Fourier transform infrared spectroscopy, capacitance-voltage, and current-voltage measurements have been employed to characterise the oxide films grown and indicate them to be high quality layers. The electrical properties of the as-grown films have been improved significantly by applying an additional UV/O3 annealing step. A simple model explaining the observed reduction in the leakage current after UV annealing is proposed whilst the current conduction mechanism within the films is discussed.

Dielectric barrier discharge source for supersonic beams

We present a new excitation source for pulsed supersonic beams. The excitation is based on dielectric barrier discharge in the beam. It produces cold beams of metastable atoms, dissociated neutral atoms from molecular precursors, and both positive and negative ions with high efficiency and reliability.

Neutron reflectometry and spectroscopic ellipsometry studies of cross-linked poly(dimethylsiloxane) after irradiation at 172 nm

Poly(dimethylsiloxane) (PDMS) was irradiated under ambient conditions in air with a Xe2-excimer lamp. The formation of atomic oxygen and ozone during irradiation in air by V-UV photons results in the transformation of PDMS to silicon oxide. The irradiated surfaces were studied by spectroscopic ellipsometry and neutron reflectometry. The measurements revealed the formation of a rough, i.e., between 11 and 20 nm, oxidized surface layer and a decrease of the total layer thickness. The thickness of the oxidized layer decreased for a given PDMS thickness when the polymer was irradiated for longer times and/or higher intensities. The composition of the oxidized layer after irradiation was not uniform through the layer and consisted of a mixture of original polymer and silicon bonded to three or four oxygen atoms (SiOx). The refractive index n determined by ellipsometry reaches a value similar to values reported for SiO2.

Single photon ionization (SPI) via incoherent VUV-excimer light: robust and compact time-of-flight mass spectrometer for on-line, real-time process gas analysis

Fast on-line detection of organic compounds from complex mixtures, such as industrial process gas streams, require selective and sensitive analytical methods. One feasible approach for this purpose is the use of mass spectrometry (MS) with a selective and soft (fragment-free) ionization technique, such as chemical ionization (CI) or photo ionization (PI). Single photon ionization (SPI) with vacuum ultraviolet (VUV) light is a particularly sof tionization technique, well-suited for detection of both aromatic and aliphatic species. Problematic, however, is the generation of the VUV light. In general, the vacuum ultraviolet (VUV) light sources for SPI-MS are based either on lasers (e.g., 118-nm radiation generated by frequency-tripling of the third harmonic of a Nd:YAG laser) or on conventional VUV lamps, such as deuterium lamps. Althoughthe laser-based techniques are very sophisticated and expensive, the conventional lamps have serious drawbacks regarding their optical parameters, such as low-output power, low spectral power density, and broad emission bands. In this work, a novel excimer VUV light source, in which an electron beam is used to form rare gas excimer species, is used. The excimer VUV light sourceproduces brilliant and intense VUV light. The novel VUV light source was coupled to a compact and mobile time-of-flight mass spectrometer (TOFMS). A special interface design, including optical (VUV optics) as well as electronic measures (e.g., pulsed ion extraction) was realized. The use of the excimer VUV lamp for SPI will allow the realization of very compact, rugged, and sensitive SPI-TOFMS devices, which preferably will be adapted for process analytical application or monitoring issues (e.g., chemical warfare detection). The excimer VUV-lamp technology delivers VUV light with a good beam quality and high-output power at low costs. Furthermore, it allows changing the emitted wavelength as well as the bandwidth of the excimer VUV lamp in t he 100-200-nm region by changing the gas filling. Consequently, SPI-TOFMS with an excimer light source is a fast detection technique that can be used for online monitoring, for example, in environmental studies or industrial manufacturing processes. In this paper, technology and characteristics of the new excimer light source, as well as the combination with the TOFMS, are presented. Furthermore, a first characterization of the SPI-TOFMS instrument, regarding analytical parameters such as detection limits and selectivity, is given. This includes a discussion of potential improvements that probably will be achievable within a future prototype genertation. Finally, first applications of the system for on-line measurement of organic trace species in a complex gas mixture (here, motorcycle exhaust gas) are presented.

Spontaneous pattern formation in an effectively one-dimensional dielectric-barrier discharge system

In a dielectric-barrier discharge between diametrically opposite sides of a narrow tube, discharge filaments stabilize at regular intervals along the tube's length. Three types of periodic patterns are observed, as is a disordered state in which filaments fire at apparently random positions and times. Time-resolved current measurements indicate that for each spatial pattern, a particular number of discharge stages occur during the voltage half-cycle. A preliminary model of the pattern-formation dynamics is described, motivating further work on time-resolved imaging and investigations of surface charge distributions.