ETFE-g-pentafluorostyrene: Functionalization and proton conductivity

Investigating the Behavior of Thin-Film Formation over Time as a Function of Precursor Concentration and Gas Residence Time in Nitrogen Dielectric Barrier Discharge

This study aims to establish a correlation between the fragmentation process and the growth mechanisms of a coating deposited on a fluoropolymer. Deposition was carried out using dielectric barrier discharge at atmospheric pressure, employing an oxygen-containing organic precursor in a nitrogen environment. The findings reveal that the impact of precursor concentration on the formation of specific functionalities is more significant than the influence of treatment time. The X-ray photoelectron spectroscopy (XPS) results obtained indicate a reduction in the N/O ratio on the coating's surface as the precursor concentration in the discharge increases. Fourier transform infrared spectroscopy (FTIR) analysis, conducted in the spectral range of 1500 cm-1 to 1800 cm-1, confirmed the connection between the chemical properties of plasma-deposited thin films and the concentration of organic precursors in the discharge. Furthermore, the emergence of nitrile moieties (C≡N) in the FTIR spectrum at 2160 cm-1 was noted under specific experimental conditions.

Fragmentation Mechanism in a Nitrogen Dielectric Barrier Discharge Plasma on Fluoropolymer Polymer Films

Due to their chemical inertness and low friction coefficient, fluoropolymers are today widely employed in sectors of activity as diverse and distinct as the textile industry, architectural sector, and medicine. However, their low surface energy results in poor adhesion, for example, when used for a component in a composite device with multiple other materials. Among the techniques used to enhance their adhesion, atmospheric pressure discharges provide a fast and low-cost method with a reduced environmental impact. Although this approach has proven to be efficient, the different chemical and physical processes in the discharge remain not fully understood. In this study, fluoropolymer surfaces were modified using an atmospheric pressure dielectric barrier discharge in a nitrogen and organic precursor environment. To prevent any damage to fluoropolymer surfaces, the dissipated power in the discharges was tuned by applying a duty cycle. Evidence shows that plasma treatment allows for the incorporation of oxygen and nitrogen in the surface resulting in the formation of hydrophilic functionalities such as carbonyl groups both in ketone and amide form, amine, and hydroxyl groups after 180 s of treatment. Overall, the data reveal that the discharge duty cycle has more effect on the oxygen and carbon content in the coating than the precursor concentration. In addition, increasing the precursor concentration limits the molecular fragmentation and nitrogen incorporation into the coating. These experiments enable the building of a better fundamental understanding of the formation mechanism of such chemical moieties at the fluoropolymer surface.