1
|
Fotouhiardakani F, Destrieux A, Profili J, Laurent M, Ravichandran S, Dorairaju G, Laroche G. Investigating the Behavior of Thin-Film Formation over Time as a Function of Precursor Concentration and Gas Residence Time in Nitrogen Dielectric Barrier Discharge. Materials (Basel) 2024; 17:875. [PMID: 38399128 PMCID: PMC10890183 DOI: 10.3390/ma17040875] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/20/2023] [Revised: 11/22/2023] [Accepted: 02/08/2024] [Indexed: 02/25/2024]
Abstract
This study aims to establish a correlation between the fragmentation process and the growth mechanisms of a coating deposited on a fluoropolymer. Deposition was carried out using dielectric barrier discharge at atmospheric pressure, employing an oxygen-containing organic precursor in a nitrogen environment. The findings reveal that the impact of precursor concentration on the formation of specific functionalities is more significant than the influence of treatment time. The X-ray photoelectron spectroscopy (XPS) results obtained indicate a reduction in the N/O ratio on the coating's surface as the precursor concentration in the discharge increases. Fourier transform infrared spectroscopy (FTIR) analysis, conducted in the spectral range of 1500 cm-1 to 1800 cm-1, confirmed the connection between the chemical properties of plasma-deposited thin films and the concentration of organic precursors in the discharge. Furthermore, the emergence of nitrile moieties (C≡N) in the FTIR spectrum at 2160 cm-1 was noted under specific experimental conditions.
Collapse
Affiliation(s)
- Faegheh Fotouhiardakani
- Laboratoire d’Ingénierie de Surface, Centre de Recherche sur les Matériaux Avancés, Département de Génie des Mines, de la Métallurgie et des Matériaux, Université Laval, Quebec, QC G1V 0A6, Canada; (F.F.); (A.D.); (J.P.)
- Centre de Recherche du CHU de Québec, Hôpital St François d’Assise, 10 Rue de L’Espinay, Québec, QC G1L 3L5, Canada
| | - Alex Destrieux
- Laboratoire d’Ingénierie de Surface, Centre de Recherche sur les Matériaux Avancés, Département de Génie des Mines, de la Métallurgie et des Matériaux, Université Laval, Quebec, QC G1V 0A6, Canada; (F.F.); (A.D.); (J.P.)
- Centre de Recherche du CHU de Québec, Hôpital St François d’Assise, 10 Rue de L’Espinay, Québec, QC G1L 3L5, Canada
| | - Jacopo Profili
- Laboratoire d’Ingénierie de Surface, Centre de Recherche sur les Matériaux Avancés, Département de Génie des Mines, de la Métallurgie et des Matériaux, Université Laval, Quebec, QC G1V 0A6, Canada; (F.F.); (A.D.); (J.P.)
- Centre de Recherche du CHU de Québec, Hôpital St François d’Assise, 10 Rue de L’Espinay, Québec, QC G1L 3L5, Canada
| | - Morgane Laurent
- Saint-Gobain Research North America, 9 Goddard Rd, Northborough, MA 01532, USA (S.R.); (G.D.)
| | | | - Gowri Dorairaju
- Saint-Gobain Research North America, 9 Goddard Rd, Northborough, MA 01532, USA (S.R.); (G.D.)
| | - Gaetan Laroche
- Laboratoire d’Ingénierie de Surface, Centre de Recherche sur les Matériaux Avancés, Département de Génie des Mines, de la Métallurgie et des Matériaux, Université Laval, Quebec, QC G1V 0A6, Canada; (F.F.); (A.D.); (J.P.)
- Centre de Recherche du CHU de Québec, Hôpital St François d’Assise, 10 Rue de L’Espinay, Québec, QC G1L 3L5, Canada
| |
Collapse
|