Fabrication of 2D PdSe2/3D CdTe Mixed-Dimensional van der Waals Heterojunction for Broadband Infrared Detection

Development and challenges of polarization-sensitive photodetectors based on 2D materials

Polarization-sensitive photodetectors based on two-dimensional (2D) materials have garnered significant research attention owing to their distinctive architectures and exceptional photophysical properties. Specifically, anisotropic 2D materials, including semiconductors such as black phosphorus (BP), tellurium (Te), transition metal dichalcogenides (TMDs), and tantalum nickel pentaselenide (Ta2NiSe5), as well as semimetals like 1T'-MoTe2 and PdSe2, and their diverse van der Waals (vdW) heterojunctions, exhibit broad detection spectral ranges and possess inherent functional advantages. To date, numerous polarization-sensitive photodetectors based on 2D materials have been documented. This review initially provides a concise overview of the detection mechanisms and performance metrics of 2D polarization-sensitive photodetectors, which are pivotal for assessing their photodetection capabilities. It then examines the latest advancements in polarization-sensitive photodetectors based on individual 2D materials, 2D vdW heterojunctions, nanoantenna/electrode engineering, and structural strain integrated with 2D structures, encompassing a range of devices from the ultraviolet to infrared bands. However, several challenges persist in developing more comprehensive and functional 2D polarization-sensitive photodetectors. Further research in this area is essential. Ultimately, this review offers insights into the current limitations and challenges in the field and presents general recommendations to propel advancements and guide the progress of 2D polarization-sensitive photodetectors.

Carrier Recirculation Induced Ultrasensitive Photodetectors of InSe/CdTe Heterostructure Featuring an Interfacial Holes Layer

Photodetectors (PDs) based on mix-dimensional heterojunctions (MDHJs) built from 2D layered materials and covalent-bonded semiconductors show the prospect of compensating the intrinsic weakness of 2D materials to realize their full potential. However, there is an open issue to improve the temporal response of PDs while maintaining high gain and sensitivity. Herein, photoconductive type MDHJs PDs with 2D InSe and covalent-bonded CdTe thin film are designed and fabricated in which InSe is the active layer and CdTe is the medium gain one. The conductivity of InSe is improved by exceeding 50 times led by the formation of p-p heterojunction because of that an interfacial hole accumulation at InSe side and a built-in field at CdTe one are formed. Benefiting from the synergistic function of photoconductive and photogating effects, carrier recirculation induced responsitivity, detectivity, and external quantum efficiency with orders of magnitude increment reach 4.31 × 104 AW-1, 7.55 × 1013 Jones and 1.01 × 107%, and more optimal response time than those of other InSe PDs is demonstrated. This device construction strategy with exceptional performance hints at the prospect of optoelectronic devices of 2D InSe.

PdSe2/NbSe2 Heterojunction Photodetector with Broadband Detection and Polarization Sensitivity

Polarized photodetectors based on anisotropic two-dimensional (2D) materials display great potential applications in communications and optoelectronics. However, the existence of high dark current, low anisotropic ratio, and response speed limits their development. In this paper, a broadband polarization angle-dependent photodetector based on the PdSe2/NbSe2 van der Waals (vdW) heterojunction has been constructed. Characterization results show that the PdSe2/NbSe2 heterojunction photodetector can suppress the dark current effectively (NbSe2 ∼4 orders of magnitude and PdSe2 ∼1 order of magnitude compared with individual material). Meanwhile, the device exhibits a broadband detection capability ranging from 405 to 980 nm. The device shows a superior responsivity of 27 mA/W, a considerable detectivity of 9.8 × 107 Jones, a large external quantum efficiency of 528%, and an ultrafast rise/decay time of 1.6/1.9 μs at 1 V bias under 638 nm laser wavelength. The photodetector also achieves a high polarization-sensitive anisotropic ratio of ∼2.62 under 638 nm laser irradiation. In addition, the heterojunction device shows outstanding polarization imaging capabilities, which can be used as the image sensor. This work proposed a PdSe2/NbSe2 vdW heterojunction device with low dark current, broadband polarized detection, and polarized visual imaging, which will promote the development and practicality of polarization-sensitive photodetectors.

Electrically Tunable Multiple-Effects Synergistic and Boosted Photoelectric Performance in Te/WSe2 Mixed-Dimensional Heterojunction Phototransistors

Mix-dimensional heterojunctions (MDHJs) photodetectors (PDs) built from bulk and 2D materials are the research focus to develop hetero-integrated and multifunctional optoelectronic sensor systems. However, it is still an open issue for achieving multiple effects synergistic characteristics to boost sensitivity and enrich the prospect in artificial bionic systems. Herein, electrically tunable Te/WSe2 MDHJs phototransistors are constructed, and an ultralow dark current below 0.1 pA and a large on/off rectification ratio of 106 is achieved. Photoconductive, photovoltaic, and photo-thermoelectric conversions are simultaneously demonstrated by tuning the gate and bias. By these synergistic effects, responsivity and detectivity respectively reach 13.9 A W-1 and 1.37 × 1012 Jones with 400 times increment. The Te/WSe2 MDHJs PDs can function as artificial bionic visual systems due to the comparable response time to those of the human visual system and the presence of transient positive and negative response signals. This work offers an available strategy for intelligent optoelectronic devices with hetero-integration and multifunctions.

Infrared Photodetection from 2D/3D van der Waals Heterostructures

An infrared photodetector is a critical component that detects, identifies, and tracks complex targets in a detection system. Infrared photodetectors based on 3D bulk materials are widely applied in national defense, military, communications, and astronomy fields. The complex application environment requires higher performance and multi-dimensional capability. The emergence of 2D materials has brought new possibilities to develop next-generation infrared detectors. However, the inherent thickness limitations and the immature preparation of 2D materials still lead to low quantum efficiency and slow response speeds. This review summarizes 2D/3D hybrid van der Waals heterojunctions for infrared photodetection. First, the physical properties of 2D and 3D materials related to detection capability, including thickness, band gap, absorption band, quantum efficiency, and carrier mobility, are summarized. Then, the primary research progress of 2D/3D infrared detectors is reviewed from performance improvement (broadband, high-responsivity, fast response) and new functional devices (two-color detectors, polarization detectors). Importantly, combining low-doped 3D and flexible 2D materials can effectively improve the responsivity and detection speed due to a significant depletion region width. Furthermore, combining the anisotropic 2D lattice structure and high absorbance of 3D materials provides a new strategy in high-performance polarization detectors. This paper offers prospects for developing 2D/3D high-performance infrared detection technology.

Wafer-Scale Patterning Synthesis of Two-Dimensional WSe2 Layers by Direct Selenization for Highly Sensitive van der Waals Heterojunction Broadband Photodetectors

Two-dimensional (2D) transition-metal dichalcogenides (TMDs) exhibit promising potential in fabricating highly sensitive photodetectors due to their unique electrical and optoelectrical characteristics. However, micron-sized 2D materials produced by conventional chemical vapor deposition (CVD) and mechanical exfoliation methods fail to satisfy the demands for applications in integrated optoelectronics and systems given their poor controllability and repeatability. Here, we propose a simple selenization approach to grow wafer-scale (2 in.) 2D p-WSe₂ layers with high uniformity and customized patterns. Furthermore, a self-driven broadband photodetector with a p-WSe₂/n-Si van der Waals heterojunction has been in situ fabricated with a satisfactory responsivity of 689.8 mA/W and a large specific detectivity of 1.59 × 10¹³ Jones covering from ultraviolet to short-wave infrared. In addition, a remarkable nanosecond response speed has been recorded under 0.5% duty cycle of the input light. The proposed selenization approach on the growth of 2D WSe₂ layers demonstrates an effective route to fabricate highly sensitive broadband photodetectors used for integrated optoelectronic systems.

Type-I Heterostructure Based on WS2/PtS2 for High-Performance Photodetectors

van der Waals (vdW) heterodiodes composed of two-dimensional (2D) layered materials led to a new prospect in photoelectron diodes and photovoltaic devices. Existing studies have shown that Type-I heterostructures have great potential to be used as photodetectors; however, the tunneling phenomena in Type-I heterostructures have not been fully revealed. Herein, a highly efficient nn⁺ WS₂/PtS₂ Type-I vdW heterostructure photodiode is constructed. The device shows an ultrahigh reverse rectification ratio of 10⁵ owing to the transmission barrier-induced low reverse current. A unilateral depletion region is formed on WS₂, which inhibits the recombination of carriers at the interface and makes the external quantum efficiency (EQE) of the device reach 67%. Due to the tunneling mechanism of the device, which allows the co-existence of a large photocurrent and a low dark current, this device achieves a light on/off ratio of over 10⁵. In addition, this band design allows the device to maintain a high detectivity of 4.53 × 10¹⁰ Jones. Our work provides some new ideas for exploring new high-efficiency photodiodes.

In situ integration of Te/Si 2D/3D heterojunction photodetectors toward UV-vis-IR ultra-broadband photoelectric technologies

Over the past decade, 2D elemental semiconductors have emerged as an ever-increasingly important group in the 2D material family due to their simple crystal structures and compositions, and versatile physical properties. Taking advantage of the relatively small bandgap, outstanding carrier mobility, high air-stability and strong interactions with light, 2D tellurium (Te) has emerged as a compelling candidate for use in ultra-broadband photoelectric technologies. In this study, high-quality centimeter-scale Te nanofilms have been successfully produced by exploiting pulsed-laser deposition (PLD). By performing deposition on pre-patterned SiO₂/Si substrates, a Te/Si 2D/3D heterojunction array is formed in situ. To our delight, taking advantage of the relatively small bandgap of Te, the Te/Si photodetectors demonstrate an ultra-broadband photoresponse from ultraviolet to near-infrared (370.6 nm to 2240 nm), enabling them to serve as important alternatives to conventional 2D materials such as MoS₂. In addition, an outstanding on/off ratio of ∼10⁸ and a fast response rate (a response/recovery time of 3.7 ms/4.4 ms) are achieved, which is associated with the large band offset and strong interfacial built-in electric field that contribute to suppressing the dark current and separating photocarriers. Beyond these, a 35 × 35 matrix array has been successfully constructed, where the devices exhibit comparable properties, with a production yield of 100% for 100 randomly tested devices. The average responsivity, external quantum efficiency and detectivity reach 249 A W^-1, 76 350% and 1.15 × 10¹¹ Jones, respectively, making the Te/Si devices among the best-performing 2D/3D heterojunction photodetectors. On the whole, this study has established that PLD is a promising technique for producing high-quality Te nanofilms with good scalability, and the Te/Si 2D/3D heterojunction provides a promising platform for implementing high-performance ultra-broadband photoelectronic technologies.