Ultrathin Silver Film Electrodes with Ultralow Optical and Electrical Losses for Flexible Organic Photovoltaics

Pushing the thinness limit of silver films for flexible optoelectronic devices via ion-beam thinning-back process

Reducing the silver film to 10 nm theoretically allows higher transparency but in practice leads to degraded transparency and electrical conductivity because the ultrathin film tends to be discontinuous. Herein, we developed a thinning-back process to address this dilemma, in which silver film is first deposited to a larger thickness with high continuity and then thinned back to a reduced thickness with an ultrasmooth surface, both implemented by a flood ion beam. Contributed by the shallow implantation of silver atoms into the substrate during deposition, the thinness of silver films down to 4.5 nm can be obtained, thinner than ever before. The atomic-level surface smooth permits excellent visible transparency, electrical conductivity, and the lowest haze among all existing transparent conductors. Moreover, the ultrathin silver film exhibits the unique robustness of mechanical flexibility. Therefore, the ion-beam thinning-back process presents a promising solution towards the excellent transparent conductor for flexible optoelectronic devices.

Extreme Dewetting Resistance and Improved Visible Transmission of Ag Layers Using Sub-Nanometer Ti Capping Layers

As technology development drives the thickness of thin film depositions down into the nano regime, understanding and controlling the dewetting of thin films has become essential for many applications. The dewetting of ultra-thin Ag (9 nm) films with Ti (0.5 nm) adhesion and capping layers on glass substrates was investigated in this work. Various thin film stacks were created using magnetron sputtering and were analyzed using scanning electron microscopy/energy dispersive X-rays, Vis/IR spectrometry, and four four-point probe resistivity measurements. Upon annealing for 5 h in air at 250 °C, the addition of a 0.5 nm thick Ti capping layer reduced the dewet area by an order of magnitude. This is reflected in film resistivity, which remained 2 orders of magnitude lower than uncapped variants. This Ti/Ag/Ti structure was then deployed in a typical low-emissivity window coating structure with additional antireflective layers of AZO, resulting in a superior performance upon annealing. These results demonstrate an easy, manufacturable process that improves the longevity of devices and products containing thin Ag films.

Flexible and Stretchable Light-Emitting Diodes and Photodetectors for Human-Centric Optoelectronics

Optoelectronic devices with unconventional form factors, such as flexible and stretchable light-emitting or photoresponsive devices, are core elements for the next-generation human-centric optoelectronics. For instance, these deformable devices can be utilized as closely fitted wearable sensors to acquire precise biosignals that are subsequently uploaded to the cloud for immediate examination and diagnosis, and also can be used for vision systems for human-interactive robotics. Their inception was propelled by breakthroughs in novel optoelectronic material technologies and device blueprinting methodologies, endowing flexibility and mechanical resilience to conventional rigid optoelectronic devices. This paper reviews the advancements in such soft optoelectronic device technologies, honing in on various materials, manufacturing techniques, and device design strategies. We will first highlight the general approaches for flexible and stretchable device fabrication, including the appropriate material selection for the substrate, electrodes, and insulation layers. We will then focus on the materials for flexible and stretchable light-emitting diodes, their device integration strategies, and representative application examples. Next, we will move on to the materials for flexible and stretchable photodetectors, highlighting the state-of-the-art materials and device fabrication methods, followed by their representative application examples. At the end, a brief summary will be given, and the potential challenges for further development of functional devices will be discussed as a conclusion.

On the O2 "Surfactant" Effect during Ag/SiO2 Magnetron Sputtering Deposition: The Point of View of In Situ and Real-Time Measurements

The use of gaseous species has been proposed in the literature to counteract the three-dimensional growth tendency of noble metals on dielectric substrates and favor an earlier percolation without compromising electrical properties. This "surfactant" effect is rationalized herein in the case of O₂ presence during magnetron sputtering deposition of Ag films on SiO₂. In situ and real-time techniques (X-ray photoemission, film resistivity, UV-visible optical spectroscopy) and ex situ characterizations (X-ray diffraction and transmission electron microscopy) were combined to scrutinize the impact of O₂ addition in the gas flow (%O₂), revealing three regimes of evolution of film resistivity, morphology, structure, and chemical composition. At low oxygen flow conditions (%O₂ < 4), the observed drastic decrease of the percolation threshold is assigned to a combination of (i) a change in nanoparticle density, wetting, and crystallographic texture and (ii) a delayed coalescence effect. The driving force is ascribed to the presence of specific adsorbed oxygen moieties, the nature of which starts evolving at intermediate oxygen flow conditions (10 ≤ %O₂ < 20). At high oxygen flow (20 ≤ %O₂ < 40), the found detrimental impact on film resistivity is assigned to an actual oxidation in the form of a Ag₂O-like poorly crystallized compound. For all %O₂, a composition gradient is observed across the film thickness, with a more metallic Ag at the substrate interface. A correlation between percolation and the nature of the detected O moieties is observed. In parallel to an oxygen spillover mechanism, this gradient can be explained by the competition between different surface processes occurring before percolation, namely, aggregation, metal oxidation, and substrate reactivity. Such findings pave the way to a rational use of O₂ as a modifier for Ag growth.

Stable Ultra-thin Silver Films Grown by Soft Ion Beam-Enhanced Sputtering with an Aluminum Cap Layer

Ultra-thin silver films are susceptible to ambient environments and form grayish layers in the silver mirroring process. The poor wettability together with the high diffusivity of surface atoms in the presence of oxygen accounts for the thermal instability of ultra-thin silver films in the air and at elevated temperatures. This work demonstrates an atomic-scale aluminum cap layer on the silver to enhance the thermal and environmental stabilities of ultra-thin silver films deposited by sputtering with the assistance of a soft ion beam reported in our previous work. The resulted film consists of an ion-beam-treated seed silver layer of ∼1 nm nominal thickness, a subsequent silver layer of ∼6 nm thickness produced by sputtering alone, and an aluminum cap layer of ∼0.2 nm nominal thickness. Although the aluminum cap is only one to two atomic layers and likely non-continuous, it significantly improved the thermal and ambient environmental stability of the ultra-thin silver films (∼7 nm thick) without affecting the film's optical and electrical properties. The improved environmental stability is attributed to the cathodic protection mechanism and reduced diffusivity of surface atoms. The improved thermal stability is attributed to the reduced mobility of surface atoms in the presence of aluminum atoms. Thermal treatment of the duplex film also improves the film's electrical conductivity and optical transmittance by enhancing its crystallinity. The annealed aluminum/silver duplex structure has exhibited the lowest electric resistivity among the reported ultra-thin silver films and high optical transmittance similar to the simulated theoretical results.

Analysis of the Effect of Graphene, Metal, and Metal Oxide Transparent Electrodes on the Performance of Organic Optoelectronic Devices

Transparent electrodes (TEs) are important components in organic optoelectronic devices. ITO is the mostly applied TE material, which is costly and inferior in mechanical performance, and could not satisfy the versatile need for the next generation of transparent optoelectronic devices. Recently, many new TE materials emerged to try to overcome the deficiency of ITO, including graphene, ultrathin metal, and oxide-metal-oxide structure. By finely control of the fabrication techniques, the main properties of conductivity, transmittance, and mechanical stability, have been studied in the literatures, and their applicability in the potential optoelectronic devices has been reported. Herein, in this work, we summarized the recent progress of the TE materials applied in optoelectronic devices by focusing on the fabrication, properties, such as Graphene, ultra-thin metal film, and metal oxide and performance. The advantages and insufficiencies of these materials as TEs have been summarized and the future development aspects have been pointed out to guide the design and fabrication TE materials in the next generation of transparent optoelectronic devices.

Tailoring of the Distribution of SERS-Active Silver Nanoparticles by Post-Deposition Low-Energy Ion Beam Irradiation

The possibility of controlled scalable nanostructuring of surfaces by the formation of the plasmonic nanoparticles is very important for the development of sensors, solar cells, etc. In this work, the formation of the ensembles of silver nanoparticles on silicon and glass substrates by the magnetron deposition technique and the subsequent low-energy Ar⁺ ion irradiation was studied. The possibility of controlling the sizes, shapes and aerial density of the nanoparticles by the variation of the deposition and irradiation parameters was systematically investigated. Scanning electron microscopy studies of the samples deposited and irradiated in different conditions allowed for analysis of the morphological features of the nanoparticles and the distribution of their sizes and allowed for determination of the optimal parameters for the formation of the plasmonic-active structures. Additionally, the plasmonic properties of the resulting nanoparticles were characterized by means of linear spectroscopy and surface-enhanced Raman spectroscopy. Hereby, in this work, we demonstrate the possibility of the fabrication of silver nanoparticles with a widely varied range of average sizes and aerial density by means of a post-deposition ion irradiation technique to form nanostructured surfaces which can be applied in sensing technologies and surface-enhanced Raman spectroscopy (SERS).

Strategy for Fabricating Ultrathin Au Film Electrodes with Ultralow Optoelectrical Losses and High Stability

A vital objective in the wetting of Au deposited on chemically heterogeneous oxides is to synthesize a completely continuous, highly crystalline, ultrathin-layered geometry with minimized electrical and optical losses. However, no effective solution has been proposed for synthesizing an ideal Au-layered structure. This study presents evidence for the effectiveness of atomic oxygen-mediated growth of such an ideal Au layer by improving Au wetting on ZnO substrates with a substantial reduction in free energy. The unexpected outcome of the atomic oxygen-mediated Au growth can be attributed to the unconventional segregation and incorporation of atomic oxygen along the outermost boundaries of Au nanostructures evolving in the clustering and layering stages. Moreover, the experimental and numerical investigations revealed the spontaneous migration of atomic oxygen from an interstitial oxygen surplus ZnO bulk to the Au-ZnO interface, as well as the segregation (float-out) of the atomic oxygen toward the top Au surfaces. Thus, the implementation of a 4-nm-thick, two-dimensional, quasi-single-crystalline Au layer with a nearly complete crystalline realignment at a mild temperature (570 K) enabled exceptional optoelectrical performance with record-low resistivity (<7.5 × 10^-8 Ω·m) and minimal optical loss (∼3.5%) at a wavelength of 700 nm.

Ultrathin Metals on a Transparent Seed and Application to Infrared Reflectors

Ultrathin metal films (UTMFs) are widely used in optoelectronic applications, from transparent conductors to photovoltaic cells, low emissivity windows, and plasmonic metasurfaces. During the initial deposition phase, many metals tend to form islands on the receiving substrate rather than a physically connected (percolated) network, which eventually evolves into continuous films as the thickness increases. For example, in the case of Ag and Au on dielectric surfaces, percolation begins when the thickness of the metal film is at least about 5 nm. It is known that the type of growth can be changed when a proper seed layer is used. Here, we show that a CuO layer directly deposited on a substrate can dramatically influence surface wetting and promote early percolation of polycrystalline Ag and Au UTMFs. We demonstrate that the proposed seed is effective even when its thickness is sub-nanometric, in this way maintaining the full transparency of the receiving substrate. The Ag and Au films seeded with CuO showed a percolation thickness close to 1 nm and were morphologically and optically characterized from an ultraviolet (λ = 300 nm) to a midinfrared (λ = 15 μm) wavelength. Infrared reflectors, a mirror and a resonant plasmonic structure, were also demonstrated and uniquely tuned by electrical gating, this being possible owing to the small thickness of the constituting Au UTMF.

Plasmonic metal nanostructures with extremely small features: new effects, fabrication and applications

Surface plasmons in metals promise many fascinating properties and applications in optics, sensing, photonics and nonlinear fields. Plasmonic nanostructures with extremely small features especially demonstrate amazing new effects as the feature sizes scale down to the sub-nanometer scale, such as quantum size effects, quantum tunneling, spill-out of electrons and nonlocal states etc. The unusual physical, optical and photo-electronic properties observed in metallic structures with extreme feature sizes enable their unique applications in electromagnetic field focusing, spectra enhancing, imaging, quantum photonics, etc. In this review, we focus on the new effects, fabrication and applications of plasmonic metal nanostructures with extremely small features. For simplicity and consistency, we will focus our topic on the plasmonic metal nanostructures with feature sizes of sub-nanometers. Subsequently, we discussed four main and typical plasmonic metal nanostructures with extremely small features, including: (1) ultra-sharp plasmonic metal nanotips; (2) ultra-thin plasmonic metal films; (3) ultra-small plasmonic metal particles and (4) ultra-small plasmonic metal nanogaps. Additionally, the corresponding fascinating new effects (quantum nonlinear, non-locality, quantum size effect and quantum tunneling), applications (spectral enhancement, high-order harmonic wave generation, sensing and terahertz wave detection) and reliable fabrication methods will also be discussed. We end the discussion with a brief summary and outlook of the main challenges and possible breakthroughs in the field. We hope our discussion can inspire the broader design, fabrication and application of plasmonic metal nanostructures with extremely small feature sizes in the future.

Improved Metal Oxide Electrode for CIGS Solar Cells: The Application of an AgOX Wetting Layer

Oxide/metal/oxide (OMO) layer stacks are used to replace transparent conductive oxides as front contact of thin-film solar cells. These multilayer structures not only reduce the overall thickness of the contact, but can be used for colouring of the cells utilizing interference effects. However, sheet resistance and parasitic absorption, both of which depend heavily on the metal layer, should be further reduced to reach higher efficiencies in the solar cells. In this publication, AgO_X wetting layers were applied to OMO electrodes to improve the performance of Cu(In,Ga)Se₂ (CIGS) thin-film solar cells. We show that an AgO_X wetting layer is an effective measure to increase transmission and conductivity of the multilayer electrode. With the presented approach, we were able to improve the short-circuit current density by 18% from 28.8 to 33.9 mA/cm² with a metal (Ag) film thickness as low as 6 nm. Our results highlight that OMO electrodes can be an effective replacement for conventional transparent conductive oxides like aluminium-doped zinc oxide on thin-film solar cells.

Spectral engineering of ultrathin germanium solar cells for combined photovoltaic and photosynthesis

In densely populated areas, ground mounted photovoltaic power plants compete with agriculture for cultivable land. Agrivoltaic systems allow the combination of these two forms of land use by deliberately designed light sharing. In this contribution, we present a spectrally selective solar cell, for use in agrivoltaic systems, greenhouses, and photo-bioreactors. Our concept benefits from a solar cell with a transmission spectrum which can be easily tuned for the specific absorption requirements of algae and plants. This is achieved by a Fabry-Perot-type multilayer resonator as a back reflector, which determines the transmission and absorption spectrum of the solar cell. We demonstrate the extent of how this transmission spectrum can be engineered by varying the layer thicknesses of the reflector and we show how the reflecting metal layers in the back reflector influence the transmission and photocurrent generation of the spectrally selective solar cell. Finally, we analyze the optical loss mechanisms of the solar cell layer stack to address further optimization potential. Our work offers a spectrally selective solar cell which can be easily adjusted for the requirements of combining photovoltaic and photosynthesis.

In Situ and Real-Time Nanoscale Monitoring of Ultra-Thin Metal Film Growth Using Optical and Electrical Diagnostic Tools

Continued downscaling of functional layers for key enabling devices has prompted the development of characterization tools to probe and dynamically control thin film formation stages and ensure the desired film morphology and functionalities in terms of, e.g., layer surface smoothness or electrical properties. In this work, we review the combined use of in situ and real-time optical (wafer curvature, spectroscopic ellipsometry) and electrical probes for gaining insights into the early growth stages of magnetron-sputter-deposited films. Data are reported for a large variety of metals characterized by different atomic mobilities and interface reactivities. For fcc noble-metal films (Ag, Cu, Pd) exhibiting a pronounced three-dimensional growth on weakly-interacting substrates (SiO2, amorphous carbon (a-C)), wafer curvature, spectroscopic ellipsometry, and resistivity techniques are shown to be complementary in studying the morphological evolution of discontinuous layers, and determining the percolation threshold and the onset of continuous film formation. The influence of growth kinetics (in terms of intrinsic atomic mobility, substrate temperature, deposition rate, deposition flux temporal profile) and the effect of deposited energy (through changes in working pressure or bias voltage) on the various morphological transition thicknesses is critically examined. For bcc transition metals, like Fe and Mo deposited on a-Si, in situ and real-time growth monitoring data exhibit transient features at a critical layer thickness of ~2 nm, which is a fingerprint of an interface-mediated crystalline-to-amorphous phase transition, while such behavior is not observed for Ta films that crystallize into their metastable tetragonal β-Ta allotropic phase. The potential of optical and electrical diagnostic tools is also explored to reveal complex interfacial reactions and their effect on growth of Pd films on a-Si or a-Ge interlayers. For all case studies presented in the article, in situ data are complemented with and benchmarked against ex situ structural and morphological analyses.

Using Dual Microresonant Cavity and Plasmonic Effects to Enhance the Photovoltaic Efficiency of Flexible Polymer Solar Cells

Fabricating polymer solar cells (PSCs) on flexible polymer substrates, instead of on hard glass, is attractive for implementing the advantage and uniqueness of the PSCs represented by mechanically rollable and light-weight natures. However, simultaneously achieving reliable robustness and high-power conversion efficiency (PCE) in such flexible PSCs is still technically challenging due to poor light harvesting of thin photoactive polymers. In this work, we report a facile, effective strategy for improving the light-harvesting performance of flexible PSCs without sacrificing rollability. Very high transparent (93.67% in 400–800 nm) and low sheet resistance (~10 Ω sq⁻¹) ZnO/Ag_(O)/ZnO electrodes were implemented as the flexible substrates. In systematically comparison with ZnO/Ag/ZnO electrodes, small amount of oxygen induced continuous metallic films with lower thickness, which resulted in higher transmittance and lower sheet resistance. To increase the light absorption of thin active layer (maintain the high rollability of active layer), a unique platform simultaneously utilizing both a transparent electrode configuration based on an ultrathin oxygen-doped Ag, Ag_(O), and film and plasmonic Ag@SiO₂ nanoparticles were designed for fully leveraging the advantages of duel microresonant cavity and plasmonic effects to enhance light absorbance in photoactive polymers. A combination of the ZnO/Ag_(O)/ZnO electrode and Ag@SiO₂ nanoparticles significantly increased the short-current density of PSCs to 17.98 mA cm⁻² with enhancing the photoluminescence of PTB7-Th film. The flexible PSC using the optimized configuration provided an average PCE of 8.04% for flexible PSCs, which was increased by 36.27% compared to that of the PSC merely using a conventional transparent indium tin oxide electrode.

Ultrathin sputter-deposited plasmonic silver nanostructures

In this study, ultrathin silver plasmonic nanostructures are fabricated by sputter deposition on substrates patterned by nanoimprint lithography, without additional lift-off processes. Detailed investigation of silver growth on different substrates results in a structured, defect-free silver film with thickness down to 6 nm, deposited on a thin layer of doped zinc oxide. Variation of the aspect ratio of the nanostructure reduces grain formation at the flanks, allowing for well-separated disk and hole arrays, even though conventional magnetron sputtering is less directional than evaporation. The resulting disk-hole array features high average transmittance in the visible range of 71% and a strong plasmonic dipole resonance in the near-infrared region. It is shown that the ultrathin Ag film exhibits even lower optical losses in the NIR range compared to known bulk optical properties. The presented FDTD simulations agree well with experimental spectra and show that for defect-free, ultrathin Ag nanostructures, bulk optical properties of Ag are sufficient for a reliable simulation-based design.

An unexpected surfactant role of immiscible nitrogen in the structural development of silver nanoparticles: an experimental and numerical investigation

Artificially designing the crystal orientation and facets of noble metal nanoparticles is important to realize unique chemical and physical features that are very different from those of noble metals in bulk geometries. However, relative to their counterparts synthesized in wet-chemical processes, vapor-depositing noble metal nanoparticles with the desired crystallographic features while avoiding any notable impurities is quite challenging because this task requires breaking away from the thermodynamically favorable geometry of nanoparticles. We used plasma-generated N atoms as a surface-active agent, a so-called surfactant, to control the structural development of Ag nanoparticles supported on a chemically heterogeneous ZnO substrate. The N-surfactant-facilitated sputter deposition provided strong selectivity for crystalline orientation and facets, leading to a highly flattened nanoparticle shape that clearly deviated from the energetically favorable spherical polyhedra, due to the drastic decreases in the surface free energies of Ag nanoparticles in the presence of the N surfactant. The Ag nanoparticles successively developed a nearly unidirectional (111) orientation aligned by stimulating the crystalline coupling of Ag along the orientation of the ZnO substrate. The experimental and simulation results not only offer new insights into the advantages of N as a surfactant for the orientation and shape-controlled synthesis of Ag nanoparticles via sputter deposition but also provide the first solid evidence validating that immiscible, nonresidual gaseous surfactants can be used in the vapor deposition processes of noble metal nanoparticles to manipulate their surface free energies.

Pinhole-free TiO2/Ag(O)/ZnO configuration for flexible perovskite solar cells with ultralow optoelectrical loss

Perovskite solar cells (PSCs) fabricated on transparent polymer substrates are considered a promising candidate as flexible solar cells that can emulate the advantages of organic solar cells, which exhibit considerable freedom in their device design thanks to their light weight and mechanically flexibility while achieving high photocurrent conversion efficiency, comparable to that of their conventional counterparts fabricated on rigid glasses. However, the full realization of highly efficient, flexible PSCs is largely prevented by technical difficulties in simultaneously attaining a transparent electrode with efficient charge transport to meet the specifications of PSCs. In this study, an effective strategy for resolving this technical issue has been devised by proposing a simple but highly effective technique to fabricate an efficient, multilayer TiO₂/Ag_(O)/ZnO (TAOZ) configuration. This configuration displays low losses in optical transmittance and electrical conductivity owing to its completely continuous, ultrathin metallic Ag_(O) transparent electrode, and any notable current leakage is suppressed by its pinhole-free TiO₂ electron transport layer. These features are a direct consequence of the rapid evolution of Ag_(O) and TiO₂ into ultrathin, completely continuous, pinhole-free layers owing to the dramatically improved wetting of metallic Ag_(O) with a minimal dose of oxygen (ca. 3 at%) during sputtering. The TAOZ configuration exhibits an average transmittance of 88.5% in the spectral range of 400–800 nm and a sheet resistance of 8.4 Ω sq⁻¹ while demonstrating superior mechanical flexibility to that of the conventional TiO₂ on ITO configuration. The photocurrent conversion efficiency of flexible PSCs is significantly improved by up to 11.2% thanks to an optimum combination of optoelectrical performance and pinhole-free morphologies in the TAOZ configuration.

A TiO₂/Ag_(O)/ZnO configuration is developed for flexible perovskite solar cells to provide a pinhole-free electron transport layer and a transparent electrode.

Nitrogen-Mediated Growth of Silver Nanocrystals to Form UltraThin, High-Purity Silver-Film Electrodes with Broad band Transparency for Solar Cells

Controlling the shape and crystallography of nanocrystals during the early growth stages of a noble metal layer is important because of its correlation with the final layer morphology and optoelectrical features, but this task is unattainable in vapor deposition processes dominated by artificially uncontrollable thermodynamic free energies. We report on experimental evidence for the controllable evolution of Ag nanocrystals as induced by the addition of nitrogen, presumed to be nonresidual in the Ag lattice given its strong float-out behavior. This atypical formation of energetically stable Ag nanocrystals with significantly improved wetting abilities on a chemically heterogeneous substrate promotes the development of an atomically flat, ultrathin, high-purity Ag layer with a thickness of only 5 nm. This facilitates the fabrication of Ag thin-film electrodes exhibiting highly enhanced optical transparency over a broad spectral range in the visible and near-infrared spectral range. An Ag thin-film electrode with a ZnO/Ag/ZnO configuration exhibits an average transmittance of about 95% in the spectral range of 400-800 nm with a maximum transmittance of over 98% at 580 nm, which is comparable with the best transparency values so far reported for transparent electrodes. This degree of optical transparency provides an excellent chance to improve the photon absorption of photovoltaic devices employing an Ag thin film as their window electrode. This is clearly confirmed by the superior performance of a flexible organic solar cell with a power conversion efficiency of 8.0%, which is far superior to that of the same solar cell using a conventional amorphous indium tin oxide electrode (6.4%).