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Haslinger MJ, Maier OS, Pribyl M, Taus P, Kopp S, Wanzenboeck HD, Hingerl K, Muehlberger MM, Guillén E. Increasing the Stability of Isolated and Dense High-Aspect-Ratio Nanopillars Fabricated Using UV-Nanoimprint Lithography. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:nano13091556. [PMID: 37177101 PMCID: PMC10180511 DOI: 10.3390/nano13091556] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/06/2023] [Revised: 04/28/2023] [Accepted: 04/29/2023] [Indexed: 05/15/2023]
Abstract
Structural anti-reflective coating and bactericidal surfaces, as well as many other effects, rely on high-aspect-ratio (HAR) micro- and nanostructures, and thus, are of great interest for a wide range of applications. To date, there is no widespread fabrication of dense or isolated HAR nanopillars based on UV nanoimprint lithography (UV-NIL). In addition, little research on fabricating isolated HAR nanopillars via UV-NIL exists. In this work, we investigated the mastering and replication of HAR nanopillars with the smallest possible diameters for dense and isolated arrangements. For this purpose, a UV-based nanoimprint lithography process was developed. Stability investigations with capillary forces were performed and compared with simulations. Finally, strategies were developed in order to increase the stability of imprinted nanopillars or to convert them into nanoelectrodes. We present UV-NIL replication of pillars with aspect ratios reaching up to 15 with tip diameters down to 35 nm for the first time. We show that the stability could be increased by a factor of 58 when coating them with a 20 nm gold layer and by a factor of 164 when adding an additional 20 nm thick layer of SiN. The coating of the imprints significantly improved the stability of the nanopillars, thus making them interesting for a wide range of applications.
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Affiliation(s)
| | - Oliver S Maier
- PROFACTOR GmbH, 4407 Steyr-Gleink, Austria
- Center for Surface and Nanoanalytics, Johannes Kepler University Linz, 4040 Linz, Austria
| | - Markus Pribyl
- TU Wien, Institute for Solid State Electronics, 1040 Vienna, Austria
| | - Philipp Taus
- TU Wien, Institute for Solid State Electronics, 1040 Vienna, Austria
| | - Sonja Kopp
- PROFACTOR GmbH, 4407 Steyr-Gleink, Austria
| | | | - Kurt Hingerl
- Center for Surface and Nanoanalytics, Johannes Kepler University Linz, 4040 Linz, Austria
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Simonenko NP, Fisenko NA, Fedorov FS, Simonenko TL, Mokrushin AS, Simonenko EP, Korotcenkov G, Sysoev VV, Sevastyanov VG, Kuznetsov NT. Printing Technologies as an Emerging Approach in Gas Sensors: Survey of Literature. SENSORS (BASEL, SWITZERLAND) 2022; 22:3473. [PMID: 35591162 PMCID: PMC9102873 DOI: 10.3390/s22093473] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 04/13/2022] [Revised: 04/28/2022] [Accepted: 04/29/2022] [Indexed: 02/04/2023]
Abstract
Herein, we review printing technologies which are commonly approbated at recent time in the course of fabricating gas sensors and multisensor arrays, mainly of chemiresistive type. The most important characteristics of the receptor materials, which need to be addressed in order to achieve a high efficiency of chemisensor devices, are considered. The printing technologies are comparatively analyzed with regard to, (i) the rheological properties of the employed inks representing both reagent solutions or organometallic precursors and disperse systems, (ii) the printing speed and resolution, and (iii) the thickness of the formed coatings to highlight benefits and drawbacks of the methods. Particular attention is given to protocols suitable for manufacturing single miniature devices with unique characteristics under a large-scale production of gas sensors where the receptor materials could be rather quickly tuned to modify their geometry and morphology. We address the most convenient approaches to the rapid printing single-crystal multisensor arrays at lab-on-chip paradigm with sufficiently high resolution, employing receptor layers with various chemical composition which could replace in nearest future the single-sensor units for advancing a selectivity.
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Affiliation(s)
- Nikolay P. Simonenko
- Kurnakov Institute of General and Inorganic Chemistry, Russian Academy of Sciences, 31 Leninsky pr., 119991 Moscow, Russia; (N.A.F.); (T.L.S.); (A.S.M.); (E.P.S.); (V.G.S.); (N.T.K.)
| | - Nikita A. Fisenko
- Kurnakov Institute of General and Inorganic Chemistry, Russian Academy of Sciences, 31 Leninsky pr., 119991 Moscow, Russia; (N.A.F.); (T.L.S.); (A.S.M.); (E.P.S.); (V.G.S.); (N.T.K.)
- Higher Chemical College of the Russian Academy of Sciences, D. Mendeleev University of Chemical Technology of Russia, 9 Miusskaya sq., 125047 Moscow, Russia
| | - Fedor S. Fedorov
- Laboratory of Nanomaterials, Skolkovo Institute of Science and Technology, 3 Nobel Str., 121205 Moscow, Russia;
| | - Tatiana L. Simonenko
- Kurnakov Institute of General and Inorganic Chemistry, Russian Academy of Sciences, 31 Leninsky pr., 119991 Moscow, Russia; (N.A.F.); (T.L.S.); (A.S.M.); (E.P.S.); (V.G.S.); (N.T.K.)
| | - Artem S. Mokrushin
- Kurnakov Institute of General and Inorganic Chemistry, Russian Academy of Sciences, 31 Leninsky pr., 119991 Moscow, Russia; (N.A.F.); (T.L.S.); (A.S.M.); (E.P.S.); (V.G.S.); (N.T.K.)
| | - Elizaveta P. Simonenko
- Kurnakov Institute of General and Inorganic Chemistry, Russian Academy of Sciences, 31 Leninsky pr., 119991 Moscow, Russia; (N.A.F.); (T.L.S.); (A.S.M.); (E.P.S.); (V.G.S.); (N.T.K.)
| | - Ghenadii Korotcenkov
- Department of Theoretical Physics, Moldova State University, 2009 Chisinau, Moldova;
| | - Victor V. Sysoev
- Department of Physics, Yuri Gagarin State Technical University of Saratov, 77 Polytechnicheskaya Str., 410054 Saratov, Russia
| | - Vladimir G. Sevastyanov
- Kurnakov Institute of General and Inorganic Chemistry, Russian Academy of Sciences, 31 Leninsky pr., 119991 Moscow, Russia; (N.A.F.); (T.L.S.); (A.S.M.); (E.P.S.); (V.G.S.); (N.T.K.)
| | - Nikolay T. Kuznetsov
- Kurnakov Institute of General and Inorganic Chemistry, Russian Academy of Sciences, 31 Leninsky pr., 119991 Moscow, Russia; (N.A.F.); (T.L.S.); (A.S.M.); (E.P.S.); (V.G.S.); (N.T.K.)
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Rengaraj A, Bosc L, Machillot P, McGuckin C, Milet C, Forraz N, Paliard P, Barbier D, Picart C. Engineering of a Microscale Niche for Pancreatic Tumor Cells Using Bioactive Film Coatings Combined with 3D-Architectured Scaffolds. ACS APPLIED MATERIALS & INTERFACES 2022; 14:13107-13121. [PMID: 35275488 PMCID: PMC7614000 DOI: 10.1021/acsami.2c01747] [Citation(s) in RCA: 5] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
Two-photon polymerization has recently emerged as a promising technique to fabricate scaffolds for three-dimensional (3D) cell culture and tissue engineering. Here, we combined 3D-printed microscale scaffolds fabricated using two-photon polymerization with a bioactive layer-by-layer film coating. This bioactive coating consists of hyaluronic acid and poly(l-lysine) of controlled stiffness, loaded with fibronectin and bone morphogenic proteins 2 and 4 (BMP2 and BMP4) as matrix-bound proteins. Planar films were prepared using a liquid handling robot directly in 96-well plates to perform high-content studies of cellular processes, especially cell adhesion, proliferation, and BMP-induced signaling. The behaviors of two human pancreatic cell lines PANC1 (immortalized) and PAN092 (patient-derived cell line) were systematically compared and revealed important context-specific cell responses, notably in response to film stiffness and matrix-bound BMPs (bBMPs). Fibronectin significantly increased cell adhesion, spreading, and proliferation for both cell types on soft and stiff films; BMP2 increased cell adhesion and inhibited proliferation of PANC1 cells and PAN092 on soft films. BMP4 enhanced cell adhesion and proliferation of PANC1 and showed a bipolar effect on PAN092. Importantly, PANC1 exhibited a strong dose-dependent BMP response, notably for bBMP2, while PAN092 was insensitive to BMPs. Finally, we proved that it is possible to combine a microscale 3D Ormocomp scaffold fabricated using the two-photon polymerization technique with the bioactive film coating to form a microscale tumor tissue and mimic the early stages of metastatic cancer.
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Affiliation(s)
- Arunkumar Rengaraj
- Univ. Grenoble Alpes, INSERM U1292, CEA, CNRS EMR 5000 BRM, IRIG Institute, CEA, Bât C3, 17 rue des Martyrs, 38054, Grenoble, France
- Grenoble Institute of Engineering, CNRS UMR 5628, LMGP, 3 parvis Louis Néel, 38016 Grenoble, France
| | - Lauriane Bosc
- Univ. Grenoble Alpes, INSERM U1292, CEA, CNRS EMR 5000 BRM, IRIG Institute, CEA, Bât C3, 17 rue des Martyrs, 38054, Grenoble, France
- Grenoble Institute of Engineering, CNRS UMR 5628, LMGP, 3 parvis Louis Néel, 38016 Grenoble, France
| | - Paul Machillot
- Univ. Grenoble Alpes, INSERM U1292, CEA, CNRS EMR 5000 BRM, IRIG Institute, CEA, Bât C3, 17 rue des Martyrs, 38054, Grenoble, France
- Grenoble Institute of Engineering, CNRS UMR 5628, LMGP, 3 parvis Louis Néel, 38016 Grenoble, France
| | - Colin McGuckin
- Cell Therapy Research Institute, CTIBiotech, 5 avenue Lionel Terray, 69330 Meyzieu, France
| | - Clément Milet
- Cell Therapy Research Institute, CTIBiotech, 5 avenue Lionel Terray, 69330 Meyzieu, France
| | - Nico Forraz
- Cell Therapy Research Institute, CTIBiotech, 5 avenue Lionel Terray, 69330 Meyzieu, France
| | - Philippe Paliard
- Microlight 3D, 5 avenue du Grand Sablon, 38700 La Tronche, France
| | - Denis Barbier
- Microlight 3D, 5 avenue du Grand Sablon, 38700 La Tronche, France
| | - Catherine Picart
- Univ. Grenoble Alpes, INSERM U1292, CEA, CNRS EMR 5000 BRM, IRIG Institute, CEA, Bât C3, 17 rue des Martyrs, 38054, Grenoble, France
- Grenoble Institute of Engineering, CNRS UMR 5628, LMGP, 3 parvis Louis Néel, 38016 Grenoble, France
- Institut Universitaire de France (IUF), Ministère de l’Enseignement Supérieur, de la Recherche et de I’Industrie, 1 rue Descartes, 75 231 Paris Cedex 05, France
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