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Aguirre F, Sebastian A, Le Gallo M, Song W, Wang T, Yang JJ, Lu W, Chang MF, Ielmini D, Yang Y, Mehonic A, Kenyon A, Villena MA, Roldán JB, Wu Y, Hsu HH, Raghavan N, Suñé J, Miranda E, Eltawil A, Setti G, Smagulova K, Salama KN, Krestinskaya O, Yan X, Ang KW, Jain S, Li S, Alharbi O, Pazos S, Lanza M. Hardware implementation of memristor-based artificial neural networks. Nat Commun 2024; 15:1974. [PMID: 38438350 PMCID: PMC10912231 DOI: 10.1038/s41467-024-45670-9] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/08/2023] [Accepted: 02/01/2024] [Indexed: 03/06/2024] Open
Abstract
Artificial Intelligence (AI) is currently experiencing a bloom driven by deep learning (DL) techniques, which rely on networks of connected simple computing units operating in parallel. The low communication bandwidth between memory and processing units in conventional von Neumann machines does not support the requirements of emerging applications that rely extensively on large sets of data. More recent computing paradigms, such as high parallelization and near-memory computing, help alleviate the data communication bottleneck to some extent, but paradigm- shifting concepts are required. Memristors, a novel beyond-complementary metal-oxide-semiconductor (CMOS) technology, are a promising choice for memory devices due to their unique intrinsic device-level properties, enabling both storing and computing with a small, massively-parallel footprint at low power. Theoretically, this directly translates to a major boost in energy efficiency and computational throughput, but various practical challenges remain. In this work we review the latest efforts for achieving hardware-based memristive artificial neural networks (ANNs), describing with detail the working principia of each block and the different design alternatives with their own advantages and disadvantages, as well as the tools required for accurate estimation of performance metrics. Ultimately, we aim to provide a comprehensive protocol of the materials and methods involved in memristive neural networks to those aiming to start working in this field and the experts looking for a holistic approach.
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Affiliation(s)
- Fernando Aguirre
- Physical Science and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
- Departament d'Enginyeria Electrònica, Universitat Autònoma de Barcelona (UAB), 08193, Barcelona, Spain
| | | | | | - Wenhao Song
- Department of Electrical and Computer Engineering, University of Southern California (USC), Los Angeles, CA, 90089, USA
| | - Tong Wang
- Department of Electrical and Computer Engineering, University of Southern California (USC), Los Angeles, CA, 90089, USA
| | - J Joshua Yang
- Department of Electrical and Computer Engineering, University of Southern California (USC), Los Angeles, CA, 90089, USA
| | - Wei Lu
- Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, MI, 48109, USA
| | - Meng-Fan Chang
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu, 30013, Taiwan
| | - Daniele Ielmini
- Dipartimento di Elettronica, Informazione e Bioingegneria, Politecnico di Milano and IUNET, Piazza L. da Vinci 32, 20133, Milano, Italy
| | - Yuchao Yang
- School of Electronic and Computer Engineering, Peking University, Shenzhen, China
| | - Adnan Mehonic
- Department of Electronic and Electrical Engineering, University College London (UCL), Torrington Place, WC1E 7JE, London, UK
| | - Anthony Kenyon
- Department of Electronic and Electrical Engineering, University College London (UCL), Torrington Place, WC1E 7JE, London, UK
| | - Marco A Villena
- Physical Science and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
| | - Juan B Roldán
- Departamento de Electrónica y Tecnología de Computadores, Facultad de Ciencias, Universidad de Granada, Avenida Fuentenueva s/n, 18071, Granada, Spain
| | - Yuting Wu
- Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, MI, 48109, USA
| | - Hung-Hsi Hsu
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu, 30013, Taiwan
| | - Nagarajan Raghavan
- Engineering Product Development (EPD) Pillar, Singapore University of Technology & Design, 8 Somapah Road, 487372, Singapore, Singapore
| | - Jordi Suñé
- Departament d'Enginyeria Electrònica, Universitat Autònoma de Barcelona (UAB), 08193, Barcelona, Spain
| | - Enrique Miranda
- Departament d'Enginyeria Electrònica, Universitat Autònoma de Barcelona (UAB), 08193, Barcelona, Spain
| | - Ahmed Eltawil
- Computer, Electrical and Mathematical Sciences and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
| | - Gianluca Setti
- Computer, Electrical and Mathematical Sciences and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
| | - Kamilya Smagulova
- Computer, Electrical and Mathematical Sciences and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
| | - Khaled N Salama
- Computer, Electrical and Mathematical Sciences and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
| | - Olga Krestinskaya
- Computer, Electrical and Mathematical Sciences and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
| | - Xiaobing Yan
- Key Laboratory of Brain-Like Neuromorphic Devices and Systems of Hebei Province, Hebei University, Baoding, 071002, China
| | - Kah-Wee Ang
- Department of Electrical and Computer Engineering, College of Design and Engineering, National University of Singapore (NUS), Singapore, Singapore
| | - Samarth Jain
- Department of Electrical and Computer Engineering, College of Design and Engineering, National University of Singapore (NUS), Singapore, Singapore
| | - Sifan Li
- Department of Electrical and Computer Engineering, College of Design and Engineering, National University of Singapore (NUS), Singapore, Singapore
| | - Osamah Alharbi
- Physical Science and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
| | - Sebastian Pazos
- Physical Science and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
| | - Mario Lanza
- Physical Science and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia.
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Lee J, Yang K, Kwon JY, Kim JE, Han DI, Lee DH, Yoon JH, Park MH. Role of oxygen vacancies in ferroelectric or resistive switching hafnium oxide. NANO CONVERGENCE 2023; 10:55. [PMID: 38038784 PMCID: PMC10692067 DOI: 10.1186/s40580-023-00403-4] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/22/2023] [Accepted: 11/08/2023] [Indexed: 12/02/2023]
Abstract
HfO2 shows promise for emerging ferroelectric and resistive switching (RS) memory devices owing to its excellent electrical properties and compatibility with complementary metal oxide semiconductor technology based on mature fabrication processes such as atomic layer deposition. Oxygen vacancy (Vo), which is the most frequently observed intrinsic defect in HfO2-based films, determines the physical/electrical properties and device performance. Vo influences the polymorphism and the resulting ferroelectric properties of HfO2. Moreover, the switching speed and endurance of ferroelectric memories are strongly correlated to the Vo concentration and redistribution. They also strongly influence the device-to-device and cycle-to-cycle variability of integrated circuits based on ferroelectric memories. The concentration, migration, and agglomeration of Vo form the main mechanism behind the RS behavior observed in HfO2, suggesting that the device performance and reliability in terms of the operating voltage, switching speed, on/off ratio, analog conductance modulation, endurance, and retention are sensitive to Vo. Therefore, the mechanism of Vo formation and its effects on the chemical, physical, and electrical properties in ferroelectric and RS HfO2 should be understood. This study comprehensively reviews the literature on Vo in HfO2 from the formation and influencing mechanism to material properties and device performance. This review contributes to the synergetic advances of current knowledge and technology in emerging HfO2-based semiconductor devices.
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Affiliation(s)
- Jaewook Lee
- Department of Materials Science and Engineering and Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Gwanak-Ro 1, Gwanak-Gu, Seoul, 08826, Republic of Korea
| | - Kun Yang
- Department of Materials Science and Engineering and Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Gwanak-Ro 1, Gwanak-Gu, Seoul, 08826, Republic of Korea
| | - Ju Young Kwon
- Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul, 02791, Republic of Korea
| | - Ji Eun Kim
- Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul, 02791, Republic of Korea
| | - Dong In Han
- Department of Materials Science and Engineering and Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Gwanak-Ro 1, Gwanak-Gu, Seoul, 08826, Republic of Korea
| | - Dong Hyun Lee
- Department of Materials Science and Engineering and Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Gwanak-Ro 1, Gwanak-Gu, Seoul, 08826, Republic of Korea
| | - Jung Ho Yoon
- Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul, 02791, Republic of Korea.
| | - Min Hyuk Park
- Department of Materials Science and Engineering and Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Gwanak-Ro 1, Gwanak-Gu, Seoul, 08826, Republic of Korea.
- Research Institute of Advanced Materials, Seoul National University, Gwanak-Ro 1, Gwanak-Gu, Seoul, 08826, Republic of Korea.
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Wang L, Zuo Z, Wen D. Realization of Artificial Nerve Synapses Based on Biological Threshold Resistive Random Access Memory. Adv Biol (Weinh) 2023; 7:e2200298. [PMID: 36650948 DOI: 10.1002/adbi.202200298] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/07/2022] [Revised: 12/09/2022] [Indexed: 01/19/2023]
Abstract
A one-selector one resistor (1S1R) array formed of a selector and resistive random access memory (RRAM) is an important way to achieve high-density storage and neuromorphic computing. However, the low durability and poor consistency of the selector limit its practical application. The fabrication of a selector based on egg albumen (EA) is reported in this paper. The device exhibits excellent bidirectional threshold switching characteristics, including a low leakage current (10-7 A), a high ON/OFF current ratio (106 ), and good endurance (>700 days). It is used as a selector to form a 1S1R unit in combination with an EA-based RRAM to effectively solve the leakage current in a crossbar array. A feasible solution is provided for the realization of a protein-based 1S1R array to achieve high-density storage. The 1S1R unit shows characteristics similar to those of synapses in the human brain under impulse excitation and has great potential in simulating the human brain for neuromorphic calculations.).
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Affiliation(s)
- Lu Wang
- School of Electronic Engineering, Heilongjiang University, Harbin, 150080, P. R. China
| | - Ze Zuo
- School of Electronic Engineering, Heilongjiang University, Harbin, 150080, P. R. China
| | - Dianzhong Wen
- School of Electronic Engineering, Heilongjiang University, Harbin, 150080, P. R. China
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Kim D, Lee HJ, Yang TJ, Choi WS, Kim C, Choi SJ, Bae JH, Kim DM, Kim S, Kim DH. Effect of Post-Annealing on Barrier Modulations in Pd/IGZO/SiO 2/p +-Si Memristors. NANOMATERIALS (BASEL, SWITZERLAND) 2022; 12:3582. [PMID: 36296772 PMCID: PMC9610976 DOI: 10.3390/nano12203582] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 09/19/2022] [Revised: 10/07/2022] [Accepted: 10/10/2022] [Indexed: 06/16/2023]
Abstract
In this article, we study the post-annealing effect on the synaptic characteristics in Pd/IGZO/SiO2/p+-Si memristor devices. The O-H bond in IGZO films affects the switching characteristics that can be controlled by the annealing process. We propose a switching model based on using a native oxide as the Schottky barrier. The barrier height is extracted by the conduction mechanism of thermionic emission in samples with different annealing temperatures. Additionally, the change in conductance is explained by an energy band diagram including trap models. The activation energy is obtained by the depression curve of the samples with different annealing temperatures to better understand the switching mechanism. Moreover, our results reveal that the annealing temperature and retention can affect the linearity of potentiation and depression. Finally, we investigate the effect of the annealing temperature on the recognition rate of MNIST in the proposed neural network.
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Affiliation(s)
- Donguk Kim
- School of Electrical Engineering, Kookmin University, Seoul 02707, Korea
| | - Hee Jun Lee
- School of Electrical Engineering, Kookmin University, Seoul 02707, Korea
| | - Tae Jun Yang
- School of Electrical Engineering, Kookmin University, Seoul 02707, Korea
| | - Woo Sik Choi
- School of Electrical Engineering, Kookmin University, Seoul 02707, Korea
| | - Changwook Kim
- School of Electrical Engineering, Kookmin University, Seoul 02707, Korea
| | - Sung-Jin Choi
- School of Electrical Engineering, Kookmin University, Seoul 02707, Korea
| | - Jong-Ho Bae
- School of Electrical Engineering, Kookmin University, Seoul 02707, Korea
| | - Dong Myong Kim
- School of Electrical Engineering, Kookmin University, Seoul 02707, Korea
| | - Sungjun Kim
- Division of Electronics and Electrical Engineering, Dongguk University, Seoul 04620, Korea
| | - Dae Hwan Kim
- School of Electrical Engineering, Kookmin University, Seoul 02707, Korea
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Yoon C, Oh G, Park BH. Ion-Movement-Based Synaptic Device for Brain-Inspired Computing. NANOMATERIALS 2022; 12:nano12101728. [PMID: 35630952 PMCID: PMC9148095 DOI: 10.3390/nano12101728] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 04/21/2022] [Revised: 05/13/2022] [Accepted: 05/16/2022] [Indexed: 02/04/2023]
Abstract
As the amount of data has grown exponentially with the advent of artificial intelligence and the Internet of Things, computing systems with high energy efficiency, high scalability, and high processing speed are urgently required. Unlike traditional digital computing, which suffers from the von Neumann bottleneck, brain-inspired computing can provide efficient, parallel, and low-power computation based on analog changes in synaptic connections between neurons. Synapse nodes in brain-inspired computing have been typically implemented with dozens of silicon transistors, which is an energy-intensive and non-scalable approach. Ion-movement-based synaptic devices for brain-inspired computing have attracted increasing attention for mimicking the performance of the biological synapse in the human brain due to their low area and low energy costs. This paper discusses the recent development of ion-movement-based synaptic devices for hardware implementation of brain-inspired computing and their principles of operation. From the perspective of the device-level requirements for brain-inspired computing, we address the advantages, challenges, and future prospects associated with different types of ion-movement-based synaptic devices.
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Impact of Electrolyte Incorporation in Anodized Niobium on Its Resistive Switching. NANOMATERIALS 2022; 12:nano12050813. [PMID: 35269300 PMCID: PMC8912554 DOI: 10.3390/nano12050813] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 01/21/2022] [Revised: 02/09/2022] [Accepted: 02/23/2022] [Indexed: 11/16/2022]
Abstract
The aim of this study was to develop memristors based on Nb2O5 grown by a simple and inexpensive electrochemical anodization process. It was confirmed that the electrolyte selection plays a crucial role in resistive switching due to electrolyte species incorporation in oxide, thus influencing the formation of conductive filaments. Anodic memristors grown in phosphate buffer showed improved electrical characteristics, while those formed in citrated buffer exhibited excellent memory capabilities. The chemical composition of oxides was successfully determined using HAXPES, while their phase composition and crystal structure with conductive filaments was assessed by TEM at the nanoscale. Overall, understanding the switching mechanism leads towards a wide range of possible applications for Nb memristors either as selector devices or nonvolatile memories.
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Effect of Oxygen Vacancy on the Conduction Modulation Linearity and Classification Accuracy of Pr 0.7Ca 0.3MnO 3 Memristor. NANOMATERIALS 2021; 11:nano11102684. [PMID: 34685125 PMCID: PMC8538184 DOI: 10.3390/nano11102684] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 09/03/2021] [Revised: 10/05/2021] [Accepted: 10/08/2021] [Indexed: 11/21/2022]
Abstract
An amorphous Pr0.7Ca0.3MnO3 (PCMO) film was grown on a TiN/SiO2/Si (TiN–Si) substrate at 300 °C and at an oxygen pressure (OP) of 100 mTorr. This PCMO memristor showed typical bipolar switching characteristics, which were attributed to the generation and disruption of oxygen vacancy (OV) filaments. Fabrication of the PCMO memristor at a high OP resulted in nonlinear conduction modulation with the application of equivalent pulses. However, the memristor fabricated at a low OP of 100 mTorr exhibited linear conduction modulation. The linearity of this memristor improved because the growth and disruption of the OV filaments were mostly determined by the redox reaction of OV owing to the presence of numerous OVs in this PCMO film. Furthermore, simulation using a convolutional neural network revealed that this PCMO memristor has enhanced classification performance owing to its linear conduction modulation. This memristor also exhibited several biological synaptic characteristics, indicating that an amorphous PCMO thin film fabricated at a low OP would be a suitable candidate for artificial synapses.
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Palhares JHQ, Beilliard Y, Alibart F, Bonturim E, de Florio DZ, Fonseca FC, Drouin D, Ferlauto AS. Oxygen vacancy engineering of TaO x-based resistive memories by Zr doping for improved variability and synaptic behavior. NANOTECHNOLOGY 2021; 32:405202. [PMID: 34167106 DOI: 10.1088/1361-6528/ac0e67] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/21/2021] [Accepted: 06/23/2021] [Indexed: 06/13/2023]
Abstract
Resistive switching (RS) devices are promising forms of non-volatile memory. However, one of the biggest challenges for RS memory applications is the device-to-device (D2D) variability, which is related to the intrinsic stochastic formation and configuration of oxygen vacancy (VO) conductive filaments (CFs). In order to reduce the D2D variability, control over the formation and configuration of oxygen vacancies is paramount. In this study, we report on the Zr doping of TaOx-based RS devices prepared by pulsed-laser deposition as an efficient means of reducing the VOformation energy and increasing the confinement of CFs, thus reducing D2D variability. Our findings were supported by XPS, spectroscopic ellipsometry and electronic transport analysis. Zr-doped films showed increased VOconcentration and more localized VOs, due to the interaction with Zr. DC and pulse mode electrical characterization showed that the D2D variability was decreased by a factor of seven, the resistance window was doubled, and a more gradual and monotonic long-term potentiation/depression in pulse switching was achieved in forming-free Zr:TaOxdevices, thus displaying promising performance for artificial synapse applications.
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Affiliation(s)
- João H Quintino Palhares
- CECS, Federal University of ABC, Santo André 09210-580, SP, Brazil
- Institut Interdisciplinaire d'Innovation Technologique (3IT), Université de Sherbrooke, Sherbrooke J1K 0A5, Canada
| | - Yann Beilliard
- Institut Interdisciplinaire d'Innovation Technologique (3IT), Université de Sherbrooke, Sherbrooke J1K 0A5, Canada
- Laboratoire Nanotechnologies Nanosystèmes (LN2)-CNRS UMI-3463-3IT, CNRS, Sherbrooke J1K 0A5, Canada
- Institut Quantique (IQ), Université de Sherbrooke, Sherbrooke J1K 2R1, Canada
| | - Fabien Alibart
- Institut Interdisciplinaire d'Innovation Technologique (3IT), Université de Sherbrooke, Sherbrooke J1K 0A5, Canada
- Laboratoire Nanotechnologies Nanosystèmes (LN2)-CNRS UMI-3463-3IT, CNRS, Sherbrooke J1K 0A5, Canada
- Institute of Electronics, Microelectronics and Nanotechnology (IEMN), Université de Lille, F-59650, Villeneuve d'Ascq, France
| | - Everton Bonturim
- Department of Chemistry, School of Engineering, Mackenzie Presbyterian University, 01302907, São Paulo, SP, Brazil
| | | | - Fabio C Fonseca
- Nuclear and Energy Research Institute, IPEN-CNEN, São Paulo, 05508-000, Brazil
| | - Dominique Drouin
- Institut Interdisciplinaire d'Innovation Technologique (3IT), Université de Sherbrooke, Sherbrooke J1K 0A5, Canada
- Laboratoire Nanotechnologies Nanosystèmes (LN2)-CNRS UMI-3463-3IT, CNRS, Sherbrooke J1K 0A5, Canada
- Institut Quantique (IQ), Université de Sherbrooke, Sherbrooke J1K 2R1, Canada
| | - Andre S Ferlauto
- CECS, Federal University of ABC, Santo André 09210-580, SP, Brazil
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