Metallic nanowires by full wafer stencil lithography

Facile Fabrication of Flexible Polymeric Membranes with Micro and Nano Apertures over Large Areas

Freestanding, flexible and open through-hole polymeric micro- and nanostructured membranes were successfully fabricated over large areas (>16 cm2) via solvent removal of sacrificial scaffolds filled with polymer resin by spontaneous capillary flow. Most of the polymeric membranes were obtained through a rapid UV curing processes via cationic or free radical UV polymerisation. Free standing microstructured membranes were fabricated across a range of curable polymer materials, including: EBECRYL3708 (radical UV polymerisation), CUVR1534 (cationic UV polymerisation) UV lacquer, fluorinated perfluoropolyether urethane methacrylate UV resin (MD700), optical adhesive UV resin with high refractive index (NOA84) and medical adhesive UV resin (1161-M). The present method was also extended to make a thermal set polydimethylsiloxane (PDMS) membranes. The pore sizes for the as-fabricated membranes ranged from 100 µm down to 200 nm and membrane thickness could be varied from 100 µm down to 10 µm. Aspect ratios as high as 16.7 were achieved for the 100 µm thick membranes for pore diameters of approximately 6 µm. Wide-area and uniform, open through-hole 30 µm thick membranes with 15 µm pore size were fabricated over 44 × 44 mm2 areas. As an application example, arrays of Au nanodots and Pd nanodots, as small as 130 nm, were deposited on Si substrates using a nanoaperture polymer through-hole membrane as a stencil.

Tuning spin wave modes in yttrium iron garnet films with stray fields

The nanopatterning of Yttrium Iron Garnets (YIGs) has proven to be a non-trivial problem even with advances in modern lithography techniques due to non-compatibility with a conventional complementary metal oxide semiconductor platform. In an attempt to circumvent this problem, we demonstrate a simple and reliable method to indirectly pattern YIG films on a Gadolinium Gallium Garnet (GGG) substrate. We fabricated exchange-coupled arrays of Py dots onto the underlying YIG films using nanostencil lithography. The stray fields generated from the Py dots were used to transfer patterned magnetic information to the underlying YIG films. The static and dynamic properties of the fabricated hybrid YIG/Py dot structure and reference YIG film were characterized using the focused magneto-optic Kerr effect and by broadband ferromagnetic resonance spectroscopy. For the reference YIG film, as expected, a single field-dependent resonance mode with a narrow linewidth was observed in contrast to the splitting into three distinct resonance modes for the YIG/Py dot structure as predicted by micromagnetic simulations. We have thus shown that it is possible to utilize stray field effects from easily patternable magnetic materials for the development of future YIG-based magnonic devices.

Drawing at the Nanoscale through Macroscopic Movement

Nanopatterns are important for applications in various nanodevice fields. Existing nanopatterning techniques mainly directly manufacture the nanopatterns through various lithographic methods, which usually are laborious, time-consuming, and need expensive equipment. Here, an extremely simple drawing at the nanoscale (DAN) concept to indirectly fabricate rational nanopatterns through controlling the macroscopic movement of the substrate , is demonstrated. The structure of the nanopatterns is completely determined by and can be shrunk by millions of times from the moving track of the substrate. Multiple surface nanopatterns of different materials with accurately tailorable relative positions can be simply stacked together by moving the substrate by macroscopic distances during different DAN processes. In combination with sophisticated lithographic methods, the DAN method is anticipated to enable substantial advances in nanofabrication.

Thermal conductivity of individual Si and SiGe epitaxially integrated NWs by scanning thermal microscopy

Semiconductor nanowires have demonstrated fascinating properties with application in a wide range of fields including energy and information technologies. In particular, increasing attention has been focused on Si and SiGe nanowires for application in thermoelectric generation after recent successful implementation in miniaturized devices. Despite this interest, an appropriate evaluation of thermal conductivity in such nanostructures still poses a great challenge, especially if the characterization of the device-integrated nanowire is desired. In this work, a spatially resolved technique based on scanning thermal microscopy has been demonstrated for the assessment of the thermal conductivity of Si and SiGe nanowires integrated in thermoelectrical microgenerators. Thermal conductivity values of 15.8 ± 0.8 W m^-1 K^-1 and 4.2 ± 0.3 W m^-1 K^-1 were measured for Si and SiGe nanowires, respectively, epitaxially grown on silicon microstructures. Moreover, the range of applicability according to the sample thermal conductance and associated errors are discussed to establish the potential of the novel technique. The results presented here show the remarkable utility of scanning thermal microscopy for the challenging thermal characterization of integrated nanostructures and the development of multiple devices such as thermoelectric generators or photovoltaic cells.

Scalable Manufacturing of Single Nanowire Devices Using Crack-Defined Shadow Mask Lithography

Single nanowires (NWs) have a broad range of applications in nanoelectronics, nanomechanics, and nanophotonics, but, to date, no technique can produce single sub-20 nm wide NWs with electrical connections in a scalable fashion. In this work, we combine conventional optical and crack lithographies to generate single NW devices with controllable and predictable dimensions and placement and with individual electrical contacts to the NWs. We demonstrate NWs made of gold, platinum, palladium, tungsten, tin, and metal oxides. We have used conventional i-line stepper lithography with a nominal resolution of 365 nm to define crack lithography structures in a shadow mask for large-scale manufacturing of sub-20 nm wide NWs, which is a 20-fold improvement over the resolution that is possible with the utilized stepper lithography. Overall, the proposed method represents an effective approach to generate single NW devices with useful applications in electrochemistry, photonics, and gas- and biosensing.

Fabrication and design of mechanically stable and free-standing polymeric membrane with two-level apertures

Herein, we report the fabrication process and the investigation of mechanically stable, flexible and free-standing polymeric membranes with two-level apertures. By using overlapped oxygen inhibition layers (OILs) with variation in diameters of the micro-sized supporting layer, we successfully fabricated the mechanically stable and free-standing polymeric membrane with micro/nano two-level apertures. The nano aperture membrane was stably sustained on the micro aperture membrane with a diameter of 50 μm and 100 μm, but was torn off in the case of 300 μm and 500 μm sized supporting layers. To analyze the results, we propose a simple model to set the criteria of the geometrical features which are mechanically stable during the demolding process. It is worth noting that an appropriate material modulus, length, and thickness of the membrane are required for designing and achieving the robust free-standing hierarchical polymeric membrane.

Top-down fabrication of shape-controlled, monodisperse nanoparticles for biomedical applications

Nanoparticles for biomedical applications are generally formed by bottom-up approaches such as self-assembly, emulsification and precipitation. But these methods usually have critical limitations in fabrication of nanoparticles with controllable morphologies and monodispersed size. Compared with bottom-up methods, top-down nanofabrication techniques offer advantages of high fidelity and high controllability. This review focuses on top-down nanofabrication techniques for engineering particles along with their biomedical applications. We present several commonly used top-down nanofabrication techniques that have the potential to fabricate nanoparticles, including photolithography, interference lithography, electron beam lithography, mold-based lithography (nanoimprint lithography and soft lithography), nanostencil lithography, and nanosphere lithography. Varieties of current and emerging applications are also covered: (i) targeting, (ii) drug and gene delivery, (iii) imaging, and (iv) therapy. Finally, a future perspective of the nanoparticles fabricated by the top-down techniques in biomedicine is also addressed.

Disc Antenna Enhanced Infrared Spectroscopy: From Self-Assembled Monolayers to Membrane Proteins

Plasmonic surfaces have emerged as a powerful platform for biomolecular sensing applications and can be designed to optimize the plasmonic resonance for probing molecular vibrations at utmost sensitivity. Here, we present a facile procedure to generate metallic microdisc antenna arrays that are employed in surface-enhanced infrared absorption (SEIRA) spectroscopy of biomolecules. Transmission electron microscopy (TEM) grids are used as shadow mask deployed during physical vapor deposition of gold. The resulting disc-shaped antennas exhibit enhancement factors of the vibrational bands of 4 × 10⁴ giving rise to a detection limit <1 femtomol (10^-15 mol) of molecules. Surface-bound monolayers of 4-mercaptobenzoic acid show polyelectrolyte behavior when titrated with cations in the aqueous medium. Conformational rigidity of the self-assembled monolayer is validated by density functional theory calculations. The membrane protein sensory rhodopsin II is tethered to the disc antenna arrays and is fully functional as inferred from the light-induced SEIRA difference spectra. As an advance to previous studies, the accessible frequency range is improved and extended into the fingerprint region.

Stencil Lithography for Scalable Micro- and Nanomanufacturing

In this paper, we review the current development of stencil lithography for scalable micro- and nanomanufacturing as a resistless and reusable patterning technique. We first introduce the motivation and advantages of stencil lithography for large-area micro- and nanopatterning. Then we review the progress of using rigid membranes such as SiNx and Si as stencil masks as well as stacking layers. We also review the current use of flexible membranes including a compliant SiNx membrane with springs, polyimide film, polydimethylsiloxane (PDMS) layer, and photoresist-based membranes as stencil lithography masks to address problems such as blurring and non-planar surface patterning. Moreover, we discuss the dynamic stencil lithography technique, which significantly improves the patterning throughput and speed by moving the stencil over the target substrate during deposition. Lastly, we discuss the future advancement of stencil lithography for a resistless, reusable, scalable, and programmable nanolithography method.

Electrical transport properties of single-crystal Al nanowires

Single-crystal Al nanowires (NWs) were fabricated by thermally induced substitution of vapor-liquid-solid grown Ge NWs by Al. The resistivity of the crystalline Al (c-Al) NWs was determined to be ρ = (131 ± 27) × 10(-9) Ω m, i.e. approximately five times higher than for bulk Al, but they withstand remarkably high current densities of up to 1.78 × 10(12) A m(-2) before they ultimately melt due to Joule heating. The maximum current density before failure correlates with the NW diameter, with thinner NWs tolerating significantly higher current densities due to efficient heat dissipation and the reduced lattice heating in structures smaller than the electron-phonon scattering length. The outstanding current-carrying capacity of the c-Al NWs clearly exceeds those of common conductors and surpasses requirements for metallization of future high-performance devices. The linear temperature coefficient of the resistance of c-Al NWs appeared to be lower than for bulk Al and a transition to a superconducting state in c-Al NWs was observed at a temperature of 1.46 K.

Self-aligned grating couplers on template-stripped metal pyramids via nanostencil lithography

We combine nanostencil lithography and template stripping to create self-aligned patterns about the apex of ultrasmooth metal pyramids with high throughput. Three-dimensional patterns such as spiral and asymmetric linear gratings, which can couple incident light into a hot spot at the tip, are presented as examples of this fabrication method. Computer simulations demonstrate that spiral and linear diffraction grating patterns are both effective at coupling light to the tip. The self-aligned stencil lithography technique can be useful for integrating plasmonic couplers with sharp metallic tips for applications such as near-field optical spectroscopy, tip-based optical trapping, plasmonic sensing, and heat-assisted magnetic recording.

3D nanostructures fabricated by advanced stencil lithography

This letter reports on a novel fabrication method for 3D metal nanostructures using high-throughput nanostencil lithography. Aperture clogging, which occurs on the stencil membranes during physical vapor deposition, is leveraged to create complex topographies on the nanoscale. The precision of the 3D nanofabrication method is studied in terms of geometric parameters and material types. The versatility of the technique is demonstrated by various symmetric and chiral patterns made of Al and Au.

Modelling the Size Effects on the Mechanical Properties of Micro/Nano Structures

Experiments on micro- and nano-mechanical systems (M/NEMS) have shown that their behavior under bending loads departs in many cases from the classical predictions using Euler-Bernoulli theory and Hooke's law. This anomalous response has usually been seen as a dependence of the material properties on the size of the structure, in particular thickness. A theoretical model that allows for quantitative understanding and prediction of this size effect is important for the design of M/NEMS. In this paper, we summarize and analyze the five theories that can be found in the literature: Grain Boundary Theory (GBT), Surface Stress Theory (SST), Residual Stress Theory (RST), Couple Stress Theory (CST) and Surface Elasticity Theory (SET). By comparing these theories with experimental data we propose a simplified model combination of CST and SET that properly fits all considered cases, therefore delivering a simple (two parameters) model that can be used to predict the mechanical properties at the nanoscale.

Mask-Free Patterning of High-Conductivity Metal Nanowires in Open Air by Spatially Modulated Femtosecond Laser Pulses

A novel high-resolution nanowire fabrication method is developed by thin-film patterning using a spatially modulated femtosecond laser pulse. Deep subwavelength (≈1/13 of the laser wavelength) and high conductivity (≈1/4 of the bulk gold) nanowires are fabricated in the open air without using masks, which offers a single-step arbitrary direct patterning approach for electronics, plasmonics, and optoelectronics nanodevices.

Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications

A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications.

Patterning gold nanoparticles in liquid environment with high ionic strength for local fabrication of up to 100 μm long metallic interconnections

Metallic interconnections were fabricated in situ using the FluidFM as scanning probe lithography tool. In contrast to other SPL tools, the closed fluidic circuit of the FluidFM enables a pressure-controlled deposition of metallic nanoparticles in liquid environment. Taking advantage of the salt concentration of the liquid environment (i.e. the ionic strength) to tailor the resulting particle density in the deposited layer, a protocol was established for direct patterning of conductive interconnecting structures. The FluidFM microchannel was filled with an aqueous solution of negatively charged gold nanoparticles (AuNPs) to be delivered onto a glass surface coated with a polycation favoring electrostatic adhesion. The deposited structures were analyzed both topographically and electrically to optimize the external parameters such as contact time, salt concentration of the liquid environment and size of the AuNPs. Using this optimized protocol we succeeded in the local fabrication of conductive metallic wires between two prefabricated macroelectrodes in liquid environment. In a subsequent step, the conductivity of the deposited structure was improved by gold annealing.

Nanofabrication on unconventional substrates using transferred hard masks

A major challenge in nanofabrication is to pattern unconventional substrates that cannot be processed for a variety of reasons, such as incompatibility with spin coating, electron beam lithography, optical lithography, or wet chemical steps. Here, we present a versatile nanofabrication method based on re-usable silicon membrane hard masks, patterned using standard lithography and mature silicon processing technology. These masks, transferred precisely onto targeted regions, can be in the millimetre scale. They allow for fabrication on a wide range of substrates, including rough, soft, and non-conductive materials, enabling feature linewidths down to 10 nm. Plasma etching, lift-off, and ion implantation are realized without the need for scanning electron/ion beam processing, UV exposure, or wet etching on target substrates.

Electrical contacts to individual SWCNTs: A review

Owing to their superior electrical characteristics, nanometer dimensions and definable lengths, single-walled carbon nanotubes (SWCNTs) are considered as one of the most promising materials for various types of nanodevices. Additionally, they can be used as either passive or active elements. To be integrated into circuitry or devices, they are typically connected with metal leads to provide electrical contacts. The properties and quality of these electrical contacts are important for the function and performance of SWCNT-based devices. Since carbon nanotubes are quasi-one-dimensional structures, contacts to them are different from those for bulk semiconductors. Additionally, some techniques used in Si-based technology are not compatible with SWCNT-based device fabrication, such as the contact area cleaning technique. In this review, an overview of the investigations of metal-SWCNT contacts is presented, including the principle of charge carrier injection through the metal-SWCNT contacts and experimental achievements. The methods for characterizing the electrical contacts are discussed as well. The parameters which influence the contact properties are summarized, mainly focusing on the contact geometry, metal type and the cleanliness of the SWCNT surface affected by the fabrication processes. Moreover, the challenges for widespread application of CNFETs are additionally discussed.

Nanoscale lithography of LaAlO₃/SrTiO₃ wires using silicon stencil masks

We have developed a process to fabricate low-stress, fully crystalline silicon nanostencils, based on ion irradiation and the electrochemical anodization of p-type silicon. These nanostencils can be patterned with arbitrary feature shapes with openings hundreds of micrometers wide connected to long channels of less than 100 nm in width. These nanostencils have been used to deposit (2.5 μm- to 150 nm-wide) lines of LaAlO3 (LAO) on a SrTiO3 (STO) substrate, forming a confined electron layer at the interface arising from oxygen vacancies on the STO surface. Electrical characterization of the transport properties of the resulting LAO/STO nanowires exhibited a large electric field effect through back-gating using the STO as the dielectric, demonstrating electron confinement. Stencil lithography incorporating multiple feature sizes in a single mask shows great potential for future development of oxide electronics.

A variable-temperature nanostencil compatible with a low-temperature scanning tunneling microscope/atomic force microscope

We describe a nanostencil lithography tool capable of operating at variable temperatures down to 30 K. The setup is compatible with a combined low-temperature scanning tunneling microscope/atomic force microscope located within the same ultra-high-vacuum apparatus. The lateral movement capability of the mask allows the patterning of complex structures. To demonstrate operational functionality of the tool and estimate temperature drift and blurring, we fabricated LiF and NaCl nanostructures on Cu(111) at 77 K.

A versatile strategy to the selective synthesis of Cu nanocrystals and the in situ conversion to CuRu nanotubes

Compared with Ag, Au, Pt and Pd, the synthesis of Cu nanocrystals that exhibit well-defined structures and surface properties has achieved limited success. Herein, we report an etching and protecting strategy to prepare Cu nanostructures with controllable shapes, crystalline nature and surface properties. In the developed strategy, the selective use of different additives is critical to the successful synthesis of the Cu nanocrystals: while NH4Cl (or hexadecyltrimethylammonium chloride (CTAC)) functions as an etchant by a Cl(-)-O2 pair that can selectively remove twinned nuclei and induce the formation of single nanocrystals with a cubic morphology, the addition of RuCl3 (or FeCl3, FeCl2) can protect the multiply twinned seeds from being etched, and leads to the formation of 5-fold twined nanowires. The controlling strategy reported herein is highlighted by its simplicity and versatility. By further increasing the reaction temperature and prolonging the reaction time, bimetallic CuRu nanotubes can be readily prepared. The applications of these well-defined nanostructures and the developed strategy in controlling other metals are currently under investigation.

Scalable and number-controlled synthesis of carbon nanotubes by nanostencil lithography

Controlled synthesis and integration of carbon nanotubes (CNTs) remain important areas of study to develop practical carbon-based nanodevices. A method of controlling the number of CNTs synthesized depending on the size of the catalyst was characterized using nanostencil lithography, and the critical dimension for the nanoaperture produced on a stencil mask used for growing individual CNTs was studied. The stencil mask was fabricated as a nanoaperture array down to 40 nm in diameter on a low-stress silicon nitride membrane. An iron catalyst used to synthesize CNTs was deposited through submicron patterns in the stencil mask onto a silicon substrate, and the profile of the patterned iron catalyst was analyzed using atomic force microscopy. The feasibility toward a scalable, number-, and location-controlled synthesis of CNTs was experimentally demonstrated based on the diameter and geometry of the apertures in the stencil mask.

Controlled deterministic implantation by nanostencil lithography at the limit of ion-aperture straggling

Solid state electronic devices fabricated in silicon employ many ion implantation steps in their fabrication. In nanoscale devices deterministic implants of dopant atoms with high spatial precision will be needed to overcome problems with statistical variations in device characteristics and to open new functionalities based on controlled quantum states of single atoms. However, to deterministically place a dopant atom with the required precision is a significant technological challenge. Here we address this challenge with a strategy based on stepped nanostencil lithography for the construction of arrays of single implanted atoms. We address the limit on spatial precision imposed by ion straggling in the nanostencil-fabricated with the readily available focused ion beam milling technique followed by Pt deposition. Two nanostencils have been fabricated; a 60 nm wide aperture in a 3 μm thick Si cantilever and a 30 nm wide aperture in a 200 nm thick Si3N4 membrane. The 30 nm wide aperture demonstrates the fabricating process for sub-50 nm apertures while the 60 nm aperture was characterized with 500 keV He(+) ion forward scattering to measure the effect of ion straggling in the collimator and deduce a model for its internal structure using the GEANT4 ion transport code. This model is then applied to simulate collimation of a 14 keV P(+) ion beam in a 200 nm thick Si3N4 membrane nanostencil suitable for the implantation of donors in silicon. We simulate collimating apertures with widths in the range of 10-50 nm because we expect the onset of J-coupling in a device with 30 nm donor spacing. We find that straggling in the nanostencil produces mis-located implanted ions with a probability between 0.001 and 0.08 depending on the internal collimator profile and the alignment with the beam direction. This result is favourable for the rapid prototyping of a proof-of-principle device containing multiple deterministically implanted dopants.

Reusable nanostencils for creating multiple biofunctional molecular nanopatterns on polymer substrate

In this paper, we demonstrate a novel method for high throughput patterning of bioprobes with nanoscale features on biocompatible polymer substrate. Our technique, based on nanostencil lithography, employs high resolution and robust masks integrated with array of reservoirs. We show that the smallest pattern size can reach down to 100 nm. We also show that different types of biomolecules can be patterned on the same substrate simultaneously. Furthermore, the stencil can be reused multiple times to generate a series of identical patterns at low cost. Finally, we demonstrate that biomolecules can be covalently patterned on the surface while retaining their biofunctionalities. By offering the flexibility on the nanopattern design and enabling the reusability of the stencil, our approach significantly simplifies the bionanopatterning process and therefore could have profound implications in diverse biological and medical applications.

Microfabrication technologies in dielectrophoresis applications--a review

DEP is an established technique for particle manipulation. Although first demonstrated in the 1950s, it was not until the development of miniaturization techniques in the 1990s that DEP became a popular research field. The 1990s saw an explosion of DEP publications using microfabricated metal electrode arrays to sort a wide variety of cells. The concurrent development of microfluidics enabled devices for flow management and better understanding of the interaction between hydrodynamic and electrokinetic forces. Starting in the 2000s, alternative techniques have arisen to overcome common problems in metal-electrode DEP, such as electrode fouling, and to increase the throughput of the system. Insulator-based DEP and light-induced DEP are the most significant examples. Most recently, new 3D techniques such as carbon-electrode DEP, contactless DEP, and the use of doped PDMS have further simplified the fabrication process. The constant desire of the community to develop practical solutions has led to devices which are more user friendly, less expensive, and are capable of higher throughput. The state-of-the-art of fabricating DEP devices is critically reviewed in this work. The focus is on how different fabrication techniques can boost the development of practical DEP devices to be used in different settings such as clinical cell sorting and infection diagnosis, industrial food safety, and enrichment of particle populations for drug development.

High-resolution resistless nanopatterning on polymer and flexible substrates for plasmonic biosensing using stencil masks

The development of nanoscale lithographic methods on polymer materials is a key requirement to improve the spatial resolution and performance of flexible devices. Here, we report the fabrication of metallic nanostructures down to 20 and 50 nm in size on polymer materials such as polyimide, parylene, SU-8, and PDMS substrates without any resist processing using stencil lithography. Metallic nanodot array analysis of their localized surface plasmon spectra is included. We demonstrate plasmon resonance detection of biotin and streptavidin using a PDMS flexible film with gold nanodots. We also demonstrate the fabrication of metallic nanowires on polyimide substrates with their electrical characteristics showing an ohmic behavior. These results demonstrate high-resolution nanopatterning and device nanofabrication capability of stencil lithography on polymer and flexible substrates.

Engineering metallic nanostructures for plasmonics and nanophotonics

Metallic nanostructures now play an important role in many applications. In particular, for the emerging fields of plasmonics and nanophotonics, the ability to engineer metals on nanometric scales allows the development of new devices and the study of exciting physics. This review focuses on top-down nanofabrication techniques for engineering metallic nanostructures, along with computational and experimental characterization techniques. A variety of current and emerging applications are also covered.

Compliant membranes improve resolution in full-wafer micro/nanostencil lithography

This work reports on a considerable resolution improvement of micro/nanostencil lithography when applied on full-wafer scale by using compliant membranes to reduce gap-induced pattern blurring. Silicon nitride (SiN) membranes are mechanically decoupled from a rigid silicon (Si) frame by means of four compliant, protruding cantilevers. When pressing the stencil into contact with a surface to be patterned, the membranes thus adapt to the surface independently and reduce the gap between the membrane and the substrate even over large, uneven surfaces. Finite element modeling (FEM) simulations show that compliant membranes can deflect vertically 40 μm which is a typical maximal non-planarity observed in standard Si wafers, due to polishing. Microapertures in the stencil membrane are defined by UV lithography and nanoapertures, down to 200 nm in diameter, using focused ion beam (FIB). A thin aluminium (Al) layer is deposited through both compliant and non-compliant membranes on a Si wafer, for comparison. The blurring in the case of compliant membranes is up to 95% reduced on full-wafer scale compared to standard (non-compliant) membranes.

Nano-stenciled RGD-gold patterns that inhibit focal contact maturation induce lamellipodia formation in fibroblasts

Cultured fibroblasts adhere to extracellular substrates by means of cell-matrix adhesions that are assembled in a hierarchical way, thereby gaining in protein complexity and size. Here we asked how restricting the size of cell-matrix adhesions affects cell morphology and behavior. Using a nanostencil technique, culture substrates were patterned with gold squares of a width and spacing between 250 nm and 2 µm. The gold was functionalized with RGD peptide as ligand for cellular integrins, and mouse embryo fibroblasts were plated. Limiting the length of cell-matrix adhesions to 500 nm or less disturbed the maturation of vinculin-positive focal complexes into focal contacts and fibrillar adhesions, as indicated by poor recruitment of α5-integrin. We found that on sub-micrometer patterns, fibroblasts spread extensively, but did not polarize. Instead, they formed excessive numbers of lamellipodia and a fine actin meshwork without stress fibers. Moreover, these cells showed aberrant fibronectin fibrillogenesis, and their speed of directed migration was reduced significantly compared to fibroblasts on 2 µm square patterns. Interference with RhoA/ROCK signaling eliminated the pattern-dependent differences in cell morphology. Our results indicate that manipulating the maturation of cell-matrix adhesions by nanopatterned surfaces allows to influence morphology, actin dynamics, migration and ECM assembly of adhering fibroblasts.

General theories for the electrical transport properties of carbon nanotubes

We have shown that the general theories of metals and semiconductors can be employed to understand the diameter and voltage dependency of current through metallic and semiconducting carbon nanotubes, respectively. The current through a semiconducting multiwalled carbon nanotube (MWCNT) is associated with the energy gap that is different for different shells. The contribution of the outermost shell is larger as compared to the inner shells. The general theories can also explain the diameter dependency of maximum current through nanotubes. We have also compared the current carrying ability of a MWCNT and an array of the same diameter of single wall carbon nanotubes (SWCNTs) and found that MWCNTs are better suited and deserve further investigation for possible applications as interconnects.

Qplus AFM driven nanostencil

We describe the development of a novel setup, in which large stencils with suspended silicon nitride membranes are combined with atomic force microscopy (AFM) regulation by using tuning forks. This system offers the possibility to perform separate AFM and nanostencil operations, as well as combined modes when using stencil chips with integrated tips. The flexibility and performances are demonstrated through a series of examples, including wide AFM scans in closed loop mode, probe positioning repeatability of a few tens of nanometer, simultaneous evaporation of large (several hundred of micron square) and nanoscopic metals and fullerene patterns in static, multistep, and dynamic modes. This approach paves the way for further developments, as it fully combines the advantages of conventional stenciling with the ones of an AFM driven shadow mask.

Metallic nanodot arrays by stencil lithography for plasmonic biosensing applications

The fabrication of gold nanodots by stencil lithography and its application for optical biosensing based on localized surface plasmon resonance are presented. Arrays of 50-200 nm wide nanodots with different spacing of 50-300 nm are fabricated without any resist, etching, or lift-off process. The dimensions and morphology of the nanodots were characterized by scanning electron and atomic force microscopy. The fabricated nanodots showed localized surface plasmon resonance in their extinction spectra in the visible range. The resonance wavelength depends on the periodicity and dimensions of the nanodots. Bulk refractive index measurements and model biosensing of streptavidin were successfully performed based on the plasmon resonance shift induced by local refractive index change when biomolecules are adsorbed on the nanodots. These results demonstrate the potential of stencil lithography for the realization of plasmon-based biosensing devices.

Transistors formed from a single lithography step using information encoded in topography

This paper describes a strategy for the fabrication of functional electronic components (transistors, capacitors, resistors, conductors, and logic gates but not, at present, inductors) that combines a single layer of lithography with angle-dependent physical vapor deposition; this approach is named topographically encoded microlithography (abbreviated as TEMIL). This strategy extends the simple concept of 'shadow evaporation' to reduce the number and complexity of the steps required to produce isolated devices and arrays of devices, and eliminates the need for registration (the sequential stacking of patterns with correct alignment) entirely. The defining advantage of this strategy is that it extracts information from the 3D topography of features in photoresist, and combines this information with the 3D information from the angle-dependent deposition (the angle and orientation used for deposition from a collimated source of material), to create 'shadowed' and 'illuminated' regions on the underlying substrate. It also takes advantage of the ability of replica molding techniques to produce 3D topography in polymeric resists. A single layer of patterned resist can thus direct the fabrication of a nearly unlimited number of possible shapes, composed of layers of any materials that can be deposited by vapor deposition. The sequential deposition of various shapes (by changing orientation and material source) makes it possible to fabricate complex structures-including interconnected transistors-using a single layer of topography. The complexity of structures that can be fabricated using simple lithographic features distinguishes this procedure from other techniques based on shadow evaporation.

High-throughput nanofabrication of infrared plasmonic nanoantenna arrays for vibrational nanospectroscopy

The introduction of high-throughput and high-resolution nanofabrication techniques operating at low cost and low complexity is essential for the advancement of nanoplasmonic and nanophotonic fields. In this paper, we demonstrate a novel fabrication approach based on nanostencil lithography for high-throughput fabrication of engineered infrared plasmonic nanorod antenna arrays. The technique relying on deposition of materials through a shadow mask enables plasmonic substrates supporting spectrally sharp collective resonances. We show that reflectance spectra of these antenna arrays are comparable to that of arrays fabricated by electron beam lithography. We also show that nanostencils can be reused multiple times to fabricate a series of infrared nanoantenna arrays with identical optical responses. Finally, we demonstrate fabrication of plasmonic nanostructures in a variety of shapes with a single metal deposition step on different substrates, including nonconducting ones. Our approach, by enabling the reusability of the stencil and offering flexibility on the substrate choice and nanopattern design, could facilitate the transition of plasmonic technologies to the real-world applications.

Dewetting of copper nanolayers on silica in oxygen: towards preparation of copper meso/nanowires by self-organization

The present study has examined the thermal behavior of copper on silicon oxide to clarify the diffusion of copper on dielectrics in an oxygen environment. Films of copper-deposited silicon oxide were prepared on silicon wafers and then annealed in oxygen. Self-organization of copper occurred to form line structures of multiple strips in a specific oxygen pressure range. The line orientation of the produced structures was related to the line defects formed from termination of stacking faults and dislocations at the wafer surface. The line density was determined by the oxygen pressure used. The results underline a possibility of synthesizing copper meso/nanowires on dielectrics via self-organization.

Analysis of the blurring in stencil lithography

A quantitative analysis of blurring and its dependence on the stencil-substrate gap and the deposition parameters in stencil lithography, a high resolution shadow mask technique, is presented. The blurring is manifested in two ways: first, the structure directly deposited on the substrate is larger than the stencil aperture due to geometrical factors, and second, a halo of material is formed surrounding the deposited structure, presumably due to surface diffusion. The blurring is studied as a function of the gap using dedicated stencils that allow a controlled variation of the gap. Our results show a linear relationship between the gap and the blurring of the directly deposited structure. In our configuration, with a material source of approximately 5 mm and a source-substrate distance of 1 m, we find that a gap size of approximately 10 microm enlarges the directly deposited structures by approximately 50 nm. The measured halo varies from 0.2 to 3 microm in width depending on the gap, the stencil aperture size and other deposition parameters. We also show that the blurring can be reduced by decreasing the nominal deposition thickness, the deposition rate and the substrate temperature.

The controlled growth of single metallic and conducting polymer nanowires via gate-assisted electrochemical deposition

The fabrication of nanowires with well-controlled lengths and diameters is the basis of the application of one-dimensional nanostructures in more sophisticated electronic and biomolecular device systems. A wide variety of materials, including metals and conducting polymers, have been utilized in nanowire arrays as building blocks for chemical or biomolecular sensors. Thus far, the cheapest and most effective way of nanowire synthesis is electrochemical deposition. In this work, we investigate a new method of electrochemical deposition using two-dimensional electric fields instead of the conventional one-directional electric field between working electrodes. Reproducible fabrication of metallic (palladium) and conducting polymer (polypyrrole) single nanowires with diameters down to 30-50 nm is achieved by application of a vertical gate electric field in addition to the lateral one between the two working electrodes. Diameters and lengths of the nanowires can be easily controlled by varying the dimensions of the nanochannels in which the nanowires are grown. A good ohmic contact between the nanowire and gold electrodes is also obtained, indicating the feasibility of electronic devices based on the single nanowires synthesized via this method. In conjunction with experimental findings of nanowire growth mechanism under two-dimensional electric field, molecular dynamic simulations are employed to further understand the deposition process. This improved electrochemical deposition is applicable for controlled and simple fabrication of a wide range of metallic and conducting polymeric nanowires with small diameters.