Controlling the microdomain orientation in block copolymer thin films via cross-linkable random copolymer neutral layer

Discrete coordination nanochains based on photoluminescent dyes reveal intrachain exciton migration dynamics

Elucidating exciton migration in polymer chains has been one of the major research goals in photophysics for over half a century. While great efforts have been made to understand picosecond phenomena by ultrafast spectroscopy, ambiguous molecular conformations and/or random polymer sequences have hindered the construction of an ideal exciton migration model. Here we present the creation of unique end-capped coordination nanochains and quantitative description of intrachain exciton migration therein. The nanochain features unique molecular architectures in discrete polynuclear complexes, with a linear and rigid structure, the defined number of metal nuclei, and charge neutrality. These features allow well-defined arrangement of emissive dye moieties, making the nanochain a sound platform for studying exciton dynamics. Readily accessible absorption spectroscopy, and photoluminescence lifetime and quantum yield measurements allow the construction of continuous-time Markov chains model, thereby estimating non-trivial exciton migration across the metal center.

Substrate Neutrality for Obtaining Block Copolymer Vertical Orientation

Nanopatterning methods utilizing block copolymer (BCP) self-assembly are attractive for semiconductor fabrication due to their molecular precision and high resolution. Grafted polymer brushes play a crucial role in providing a neutral surface conducive for the orientational control of BCPs. These brushes create a non-preferential substrate, allowing wetting of the distinct chemistries from each block of the BCP. This vertically aligns the BCP self-assembled lattice to create patterns that are useful for semiconductor nanofabrication. In this review, we aim to explore various methods used to tune the substrate and BCP interface toward a neutral template. This review takes a historical perspective on the polymer brush methods developed to achieve substrate neutrality. We divide the approaches into copolymer and blended homopolymer methods. Early attempts to obtain neutral substrates utilized end-grafted random copolymers that consisted of monomers from each block. This evolved into side-group-grafted chains, cross-linked mats, and block cooligomer brushes. Amidst the augmentation of the chain architecture, homopolymer blends were developed as a facile method where polymer chains with each chemistry were mixed and grafted onto the substrate. This was largely believed to be challenging due to the macrophase separation of the chemically incompatible chains. However, innovative methods such as sequential grafting and BCP compatibilizers were utilized to circumvent this problem. The advantages and challenges of each method are discussed in the context of neutrality and feasibility.

Thickness-Dependent Photo-Aligned Thin-Film Morphologies of a Block Copolymer Containing an Azobenzene-Based Liquid Crystalline Polymer and a Poly(ionic liquid)

Photo-induced alignment of the thin-film morphologies of azobenzene-containing block copolymers (BCPs) is an effective method to obtain a uniaxial pattern of nanocylinders. Although film thickness is an important factor affecting the self-assembly of BCP thin films, the influence of film thickness on the photo-induced alignment of BCP thin-film morphology has never been systematically studied. Herein, we report the thickness-dependent photo-aligned film morphologies of the BCP containing an azobenzene-based liquid crystalline polymer and a poly(ionic liquid) (PIL), with a perfect uniaxial pattern of PIL nanocylinders. For films aligned with the unpolarized light (UPL), the out-of-plane PIL nanocylinders can be obtained in the film with a thickness of only 1L0 (∼30 nm, where L0 is the layer spacing of the hexagonally packed cylinder array), which is far lower than the thickness (more than 4L0) of the thermally annealed film needed to obtain the same morphology. This change is attributed to the orientation effect of UPL on azobenzene mesogens that suppresses the excluded volume effect. For the films aligned with linearly polarized light (LPL), to take advantage of the excluded volume effect to obtain the planar orientation of azobenzene mesogens, the thickness should be controlled to be no more than 3L0 to achieve an in-plane uniaxial alignment of PIL nanocylinders. The above relationship between the morphology and thickness of photo-aligned film eliminates the obstacles encountered in preparing films with well-ordered photo-aligned morphologies.

Polystyrene-block-poly(ethylene oxide) Thin Films Fabricated from a Solvent Mixture for the Co-Assembly of Polymers and Proteins

The co-assembly of peptides and proteins in poly(styrene-block-ethylene oxide) (PS-b-PEO) thin films has proven to be a promising method to fabricate polymer-biomolecule functional materials. Contrary to the covalent immobilization of biomolecules on surfaces, co-assembly presents the opportunity to arrange cargo within thin films, which can be released upon exposure to an aqueous environment. The use of a mixed solvent system ensures the solubilization of hydrophobic polymer as well as the solubilization and protection of the biomolecule cargo. However, to produce largely defect-free films of PS-b-PEO from a solvent mixture containing water is challenging due to the narrow range of solvent miscibility and polymer/protein solubility. This work explores the limits of using a benzene/methanol/water solvent mixture for the production of thin PS-b-PEO films and provides a template for the fabrication optimization of block copolymer thin films in different complex solvent systems. The film quality is analyzed using optical microscopy and atomic force microscopy and correlated to the solvent composition. By adjusting the solvent composition to 80/18.8/1.2 vol % benzene/methanol/water, it was possible to reliably fabricate thin films with less than 1% macroscopic defect surface coverage. Using the optimized solvent composition, we also demonstrate the fabrication of ordered PS-b-PEO films containing lysozyme. Furthermore, we show the release of lysozyme into aqueous media, which highlights the potential use of such films for drug delivery applications.

A single-stranded coordination copolymer affords heterostructure observation and photoluminescence intensification

Few artificial systems can be exfoliated into, and observed as, single wires with lengths of more than several micrometers, and no previous example features a copolymer structure; this is in contrast with biopolymers such as single-strand DNAs. Here, we create a set of one-dimensional coordination copolymers featuring bis(dipyrrinato)zinc complex motifs in the main chain. A series of random copolymers is synthesized from two types of bridging dipyrrin proligand and zinc acetate, with various molar ratios between the proligands. Sonication of the bulk solid copolymer in organic solvent exfoliates single strands with lengths of 1.4 to 3.0 μm. Atomic force microscopy at ambient conditions visualizes the copolymer structure as height distributions. The copolymer structure improves its photoluminescence (up to 32%) relative to that of the corresponding homopolymers (3 and 10%). Numerical simulation based on a restricted random walk model reproduces the photoluminescence intensification, suggesting at the same time the existence of fast intrawire exciton hopping.

Thermal Approaches to Perpendicular Block Copolymer Microdomains in Thin Films: A Review and Appraisal

Block copolymer thin films are highly versatile and accessible materials capable of producing nanofeatures in the size regime of a few to hundreds of nanometers by a simple spin-coating-and-anneal process. Unfortunately, this simple protocol usually leads to parallel microdomains, which limits the applicability of such nanofeatures. A great deal of effort has been put into achieving perpendicular microdomains, but those that incorporate thermal annealing are arguably the most practical and reproducible in the lab and industry. This review discusses the recent ongoing efforts on various thermal approaches to achieving perpendicular microdomains in order to provide the readers with a toolbox to work with.

Straightforward Integration Flow of a Silicon-Containing Block Copolymer for Line-Space Patterning

A promising alternative for the next-generation lithography is based on the directed self-assembly of block copolymers (BCPs) used as a bottom-up tool for the definition of nanometric features. Herein, a straightforward integration flow for line-space patterning is reported for a silicon BCP system, that is, poly(1,1-dimethylsilacyclobutane)-b-poly(styrene) (PDMSB-b-PS), able to define sub 15 nm features. Both in-plane cylindrical (L₀ = 20.7 nm) and out-of-plane lamellar structures (L₀ = 23.2 nm) formed through a rapid thermal annealing-10 min at 180 °C-were successfully integrated using graphoepitaxy to provide a long-range ordering of the BCP structure without the use of underlayers or top coats. Subsequent deep transfer into the silicon substrate using the hardened oxidized PDMSB domains as a mask is demonstrated. Combining a rapid self-assembly behavior, straightforward integration, and an excellent etching contrast, PDMSB-b-PS may become a material of choice for the next-generation lithography.