Superplastic nanoscale pore shaping by ion irradiation

Induced Formation of Plasma Membrane Protrusions with Porous Materials as Instructive Surfaces

The plasma membrane is a vital component in cellular processes, and its structure has a significant impact on cellular behavior. The physical characteristics of the extracellular environment, along with the presence of surface pores, can influence the formation of membrane protrusions. Nanoporous surfaces have demonstrated their capacity to induce membrane protrusions in both adherent and non-adherent cells. This chapter presents a methodology that utilizes a nanoporous substrate with nanotopographical constraints to effectively stimulate the formation of membrane protrusions in cells.

Plasma-Enabled Selective Synthesis of Biobased Phenolics from Lignin-Derived Feedstock

Converting abundant biomass-derived feedstocks into value-added platform chemicals has attracted increasing interest in biorefinery; however, the rigorous operating conditions that are required limit the commercialization of these processes. Nonthermal plasma-based electrification using intermittent renewable energy is an emerging alternative for sustainable next-generation chemical synthesis under mild conditions. Here, we report a hydrogen-free tunable plasma process for the selective conversion of lignin-derived anisole into phenolics with a high selectivity of 86.9% and an anisole conversion of 45.6% at 150 °C. The selectivity to alkylated chemicals can be tuned through control of the plasma alkylation process by changing specific energy input. The combined experimental and computational results reveal that the plasma generated H and CH3 radicals exhibit a "catalytic effect" that reduces the activation energy of the transalkylation reactions, enabling the selective anisole conversion at low temperatures. This work opens the way for the sustainable and selective production of phenolic chemicals from biomass-derived feedstocks under mild conditions.

Electrically Driven Sub-Micrometer Light-Emitting Diode Arrays Using Maskless and Etching-Free Pixelation

For decades, group-III-nitride-based light-emitting diodes (LEDs) have been regarded as a light emitting source for future displays by virtue of their novel properties such as high efficiency, brightness, and stability. Nevertheless, realization of high pixel density displays is still challenging due to limitations of pixelation methods. Here, a maskless and etching-free micro-LED (µLED) pixelation method is developed via tailored He focused ion beam (FIB) irradiation technique, and electrically driven sub-micrometer-scale µLED pixel arrays are demonstrated. It is confirmed that optical quenching and electrical isolation effects are simultaneously induced at a certain ion dose (≈10¹⁴ ions cm^-2 ) without surface damage. Furthermore, highly efficient µLED pixel arrays at sub-micrometer scale (square pixel, 0.5 µm side length) are fabricated. Their pixelation and brightness are verified by various optical measurements such as cathodo-, photo-, and electroluminescence. It is expected that the FIB-induced optical quenching and electrical isolation method can pioneer a new defect engineering technology not only for µLED fabrication, but also for sub-micrometer-scale optoelectronic devices.

Controllable Shrinking Fabrication of Solid-State Nanopores

Nanopores have attracted widespread attention in DNA sequencing and protein or biomarker detection, owning to the single-molecule-scale detection accuracy. Despite the most use of naturally biological nanopores before, solid-state nanopores are widely developed with strong robustness, controllable sizes and geometries, a wide range of materials available, as well as flexible manufacturing. Therefore, various techniques typically based on focused ion beam or electron beam have been explored to drill nanopores directly on free-standing nanofilms. To further reduce and sculpt the pore size and shape for nano or sub-nano space-time sensing precision, various controllable shrinking technologies have been employed. Correspondingly, high-energy-beam-induced contraction with direct visual feedback represents the most widely used. The ability to change the pore diameter was attributed to surface tension induced original material migration into the nanopore center or new material deposition on the nanopore surface. This paper reviews typical solid-state nanopore shrinkage technologies, based on the careful summary of their principles and characteristics in particularly size and morphology changes. Furthermore, the advantages and disadvantages of different methods have also been compared completely. Finally, this review concludes with an optimistic outlook on the future of solid-state nanopores.

Nanoconfinement of microvilli alters gene expression and boosts T cell activation

T cells sense and respond to their local environment at the nanoscale by forming small actin-rich protrusions, called microvilli, which play critical roles in signaling and antigen recognition, particularly at the interface with the antigen presenting cells. However, the mechanism by which microvilli contribute to cell signaling and activation is largely unknown. Here, we present a tunable engineered system that promotes microvilli formation and T cell signaling via physical stimuli. We discovered that nanoporous surfaces favored microvilli formation and markedly altered gene expression in T cells and promoted their activation. Mechanistically, confinement of microvilli inside of nanopores leads to size-dependent sorting of membrane-anchored proteins, specifically segregating CD45 phosphatases and T cell receptors (TCR) from the tip of the protrusions when microvilli are confined in 200-nm pores but not in 400-nm pores. Consequently, formation of TCR nanoclustered hotspots within 200-nm pores allows sustained and augmented signaling that prompts T cell activation even in the absence of TCR agonists. The synergistic combination of mechanical and biochemical signals on porous surfaces presents a straightforward strategy to investigate the role of microvilli in T cell signaling as well as to boost T cell activation and expansion for application in the growing field of adoptive immunotherapy.

Is the Ne operation of the helium ion microscope suitable for electron backscatter diffraction sample preparation?

Electron backscatter diffraction (EBSD) is a powerful characterization technique which allows the study of microstructure, grain size, and orientation as well as strain of a crystallographic sample. In addition, the technique can be used for phase analysis. A mirror-flat sample surface is required for this analysis technique and different polishing approaches have been used over the years. A commonly used approach is the focused ion beam (FIB) polishing. Unfortunately, artefacts that can be easily induced by Ga FIB polishing approaches are seldom published. This work aims to provide a better understanding of the underlying causes for artefact formation and to assess if the helium ion microscope is better suited to achieve the required mirror-flat sample surface when operating the ion source with Ne instead of He. Copper was chosen as a test material and polished using Ga and Ne ions with different ion energies as well as incident angles. The results show that crystal structure alterations and, in some instances, phase transformation of Cu to Cu₃Ga occurred when polishing with Ga ions. Polishing with high-energy Ne ions at a glancing angle maintains the crystal structure and significantly improves indexing in EBSD measurements. By milling down to a depth equaling the depth of the interaction volume, a steady-state condition of ion impurity concentration and number of induced defects is reached. The EBSD measurements and Monte Carlo simulations indicate that when this steady-state condition is reached more quickly, which can be achieved using high-energy Ne ions at a glancing incidence, then the overall damage to the specimen is reduced.

A review of defect engineering, ion implantation, and nanofabrication using the helium ion microscope

The helium ion microscope has emerged as a multifaceted instrument enabling a broad range of applications beyond imaging in which the finely focused helium ion beam is used for a variety of defect engineering, ion implantation, and nanofabrication tasks. Operation of the ion source with neon has extended the reach of this technology even further. This paper reviews the materials modification research that has been enabled by the helium ion microscope since its commercialization in 2007, ranging from fundamental studies of beam-sample effects, to the prototyping of new devices with features in the sub-10 nm domain.

Self-ordered nanospike porous alumina fabricated under a new regime by an anodizing process in alkaline media

High-aspect ratio ordered nanomaterial arrays exhibit several unique physicochemical and optical properties. Porous anodic aluminum oxide (AAO) is one of the most typical ordered porous structures and can be easily fabricated by applying an electrochemical anodizing process to Al. However, the dimensional and structural controllability of conventional porous AAOs is limited to a narrow range because there are only a few electrolytes that work in this process. Here, we provide a novel anodizing method using an alkaline electrolyte, sodium tetraborate (Na₂B₄O₇), for the fabrication of a high-aspect ratio, self-ordered nanospike porous AAO structure. This self-ordered porous AAO structure possesses a wide range of the interpore distance under a new anodizing regime, and highly ordered porous AAO structures can be fabricated using pre-nanotexturing of Al. The vertical pore walls of porous AAOs have unique nanospikes measuring several tens of nanometers in periodicity, and we demonstrate that AAO can be used as a template for the fabrication of nanomaterials with a large surface area. We also reveal that stable anodizing without the occurrence of oxide burning and the subsequent formation of uniform self-ordered AAO structures can be achieved on complicated three-dimensional substrates.

Scanning transmission helium ion microscopy on carbon nanomembranes

A dark-field scanning transmission ion microscopy detector was designed for the helium ion microscope. The detection principle is based on a secondary electron conversion holder with an exchangeable aperture strip allowing its acceptance angle to be tuned from 3 to 98 mrad. The contrast mechanism and performance were investigated using freestanding nanometer-thin carbon membranes. The results demonstrate that the detector can be optimized either for most efficient signal collection or for maximum image contrast. The designed setup allows for the imaging of thin low-density materials that otherwise provide little signal or contrast and for a clear end-point detection in the fabrication of nanopores. In addition, the detector is able to determine the thickness of membranes with sub-nanometer precision by quantitatively evaluating the image signal and comparing the results with Monte Carlo simulations. The thickness determined by the dark-field transmission detector is compared to X-ray photoelectron spectroscopy and energy-filtered transmission electron microscopy measurements.

Neon and helium focused ion beam etching of resist patterns

Helium ion microscopy has attracted many applications in imaging, nanofabrication and analysis. One important field of study in nanofabrication using ion beam is the milling or etching of materials using a helium or neon focused ion beam (FIB), with and without chemical gas assistance. In particular, the neon FIB has a relatively high sputtering rate with a lower probability of swelling and less re-deposition issues compared to a helium FIB. Here, both neon and helium FIB etchings are investigated for milling and repairing electron-beam lithography (EBL) defined hydrogen silsesquioxane (HSQ) and polymethyl methacrylate (PMMA) resist patterns. Different dosages of neon FIB etching result in distinct etching profiles. Using the appropriate doses, arrays of uniform gap with aspect ratio more than 20 can be achieved on HSQ nanostructures. The neon FIB etching has a resolution of 20 nm on HSQ patterns. With XeF₂ assistance, neon FIB etching can be enhanced for etching depth by a factor of ∼1.2. Whereas, helium FIB can also etch thick HSQ patterns, with much lower etch rates. But with XeF₂ assistance, helium FIB etching depth can be enhanced significantly by a factor of around 5. Furthermore, both helium and neon FIB etching methods have been employed to selectively remove residual particles in deep and narrow trenches without affecting the resist patterns. The chemical analysis of these residual particle composition and resist patterns can be also performed using helium ion microscopy coupled with secondary ion mass spectrometry (SIMS) using neon FIB. Besides, a neon FIB can also effectively etch PMMA patterns which are commonly used in nanofabrication and the unwanted connections can be etched away.

Atomic-Scale Carving of Nanopores into a van der Waals Heterostructure with Slow Highly Charged Ions

The growing family of 2D materials led not long ago to combining different 2D layers and building artificial systems in the form of van der Waals heterostructures. Tailoring of heterostructure properties postgrowth would greatly benefit from a modification technique with a monolayer precision. However, appropriate techniques for material modification with this precision are still missing. To achieve such control, slow highly charged ions appear ideal as they carry high amounts of potential energy, which is released rapidly upon ion neutralization at the position of the ion. The resulting potential energy deposition is thus limited to just a few atomic layers (in contrast to the kinetic energy deposition). Here, we irradiated a freestanding van der Waals MoS2/graphene heterostructure with 1.3 keV/amu xenon ions in high charge states of 38, which led to nanometer-sized pores that appear only in the MoS2 facing the ion beam, but not in graphene beneath the hole. Reversing the stacking order leaves both layers undamaged, which we attribute to the high conductivity and carrier mobility in graphene acting as a shield for the MoS2 underneath. Our main focus is here on monolayer MoS2, but we also analyzed areas with few-layer structures and observed that the perforation is limited to the two topmost MoS2 layers, whereas deeper layers remain intact. Our results demonstrate that in addition to already being a valuable tool for materials processing, the usability of ion irradiation can be extended to mono- (or bi)layer manipulation of van der Waals heterostructures when the localized potential energy deposition of highly charged ions is also added to the toolbox.

Localized detection of ions and biomolecules with a force-controlled scanning nanopore microscope

Proteins, nucleic acids and ions secreted from single cells are the key signalling factors that determine the interaction of cells with their environment and the neighbouring cells. It is possible to study individual ion channels by pipette clamping, but it is difficult to dynamically monitor the activity of ion channels and transporters across the cellular membrane. Here we show that a solid-state nanopore integrated in an atomic force microscope can be used for the stochastic sensing of secreted molecules and the activity of ion channels in arbitrary locations both inside and outside a cell. The translocation of biomolecules and ions through the nanopore is observed in real time in live cells. The versatile nature of this approach allows us to detect specific biomolecules under controlled mechanical confinement and to monitor the ion-channel activities of single cells. Moreover, the nanopore microscope was used to image the surface of the nuclear membrane via high-resolution scanning ion conductance measurements.

A Review of Recent Applications of Ion Beam Techniques on Nanomaterial Surface Modification: Design of Nanostructures and Energy Harvesting

Nanomaterials have gained plenty of research interest because of their excellent performance, which is derived from their small size and special structure. In practical applications, to acquire nanomaterials with high performance, many methods have been used to modulate the structure and components of materials. To date, ion beam techniques have extensively been applied for modulating the performance of various nanomaterials. Energetic ion beams can modulate the surface morphology and chemical components of nanomaterials. In addition, ion beam techniques have also been used to fabricate nanomaterials, including 2D materials, nanoparticles, and nanowires. Compared with conventional methods, ion beam techniques, including ion implantation, ion irradiation, and focused ion beam, are all pure physical processes; these processes do not introduce any impurities into the target materials. In addition, ion beam techniques exhibit high controllability and repeatability. Here, recent progress in ion beam techniques for nanomaterial surface modification is systematically summarized and existing challenges and potential solutions are presented.

Enhanced Molten Salt Resistance by Sidewall Pores Repair during Fs Laser Drilling of a Thermal Barrier-Coated Superalloy

In this study, a novel laser-modified drilling method was used to manufacture cooling holes through thermal barrier coatings (TBCs). Due to the "cooling processing" properties during low-frequency femtosecond (LF-fs) laser drilling, the exposure of the sidewall pores, and the interlayer clearance, the inherent characteristics of plasma-sprayed coatings induced sidewall defects in the drilled holes. After drilling, a high-frequency fs (HF-fs) laser was used to repair the sidewall pores and interlayer clearance of the drilled ceramic holes. Then, the pores and microcracks were healed by local melting using the laser. Moreover, instead of obtaining laser-induced periodic surface structures (LIPSSs), refined and homogeneous grains were produced by the HF-fs laser repair treatment at high transient pressure and temperature. The results from a high-temperature corrosion test showed that healing of the open pores and microstructural improvement in the ceramic hole walls prevented the out-diffusion of Y₂O₃ stabilizers and the penetration of molten salt, resulting in less corrosive products and producing corresponding phase-transformation stress. Thus, reducing the stabilizer consumption can moderate corrosion fatigue and prolong the lifetime of a cooling hole and TBCs under service.

Defect Localization and Nanofabrication for Conductive Structures with Voltage Contrast in Helium Ion Microscopy

As the dimensions of feature sizes in electronic devices decrease to nanoscale, an easy method for failure analysis and evaluation of processing steps is required. Gallium-focused ion beam (Ga-FIB) or scanning electron microscope is an efficient approach to detect voltage contrast for addressing failure analysis in semiconductor devices and processing. However, Ga-FIB may cause damage or implantation to the surface of the analyzed area, and its resolution is low. Helium ion microscopy (HIM) uses a light ion beam (helium or neon) for imaging and fabrication at nanoscale. With passive voltage contrast (PVC) in HIM images, the defect localization for failure of conductive structures can be rapidly and easily detected with a sufficient voltage contrast. Furthermore, a defect gap as narrow as sub-10 nm can be investigated with HIM imaging. PVC with HIM is an efficient method for defect localization at nanoscale with a minimal damage to the analyzed area. For circuit edit and failure analysis, it may be necessary to intentionally cut the conductive connection. In this circumstance, final results can be easily verified using PVC imaging with HIM. With XeF₂ gas assistance, both helium and neon ion beams can be used to perform nanofabrication for metal disconnection. XeF₂ gas plays an important role in preventing deposition of conductive materials on etching region and enhancing material removal rates to achieve electrically isolated structures. The etching rate with a neon ion beam is much faster than that of a helium ion beam. PVC in HIM images with controllable operation and dimensions using a helium ion beam with XeF₂ gas assistance could also be used to localize a hidden defect for a single-location-defect situation. With neon ion beam irradiation on a defective location, PVC can be used to find the defect locations in the case of a series of defects.

Silver Nanowires from Sonication-Induced Scission

Silver nanowires (AgNWs) have great potential to be used in the flexible electronics industry for their applications in flexible, transparent conductors due to high conductivity and light reflectivity. Those applications always involve size which strongly affects the optical and electrical properties of AgNWs. AgNWs of mean diameter 70 nm and mean length 12.5 μm were achieved by the polyol solvothermal method. Sonication-induced scission was used to obtain the small size AgNWs. The relationship between the size of AgNWs and the ultrasonic time, ultrasonic power, and concentration of AgNWs were studied. The results show that the length of AgNWs gradually reduces with the increase of the ultrasonic time and ultrasonic power, and with the decrease of concentration of AgNWs. Meanwhile, there is an existence of a limiting length below which fragmentation of AgNWs no longer occurs. Further, the mechanics of sonication-induced scission for the fragmentation of AgNWs was discussed.

Fabrication and Characteristics of SnAgCu Alloy Nanowires for Electrical Connection Application

As electronic products become more functional, the devices are required to provide better performances and meet ever smaller form factor requirements. To achieve a higher I/O density within the smallest form factor package, applying nanotechniques to electronic packaging can be regarded as a possible approach in microelectronic technology. Sn-3.0 wt% Ag-0.5 wt% Cu (SAC305) is a common solder material of electrical connections in microelectronic devices. In this study, SAC305 alloy nanowire was fabricated in a porous alumina membrane with a pore diameter of 50 nm by the pressure casting method. The crystal structure and composition analyses of SAC305 nanowires show that the main structure of the nanowire is β-Sn, and the intermetallic compound, Ag₃Sn, locates randomly but always appears on the top of the nanowire. Furthermore, differential scanning calorimetry (DSC) results indicate the melting point of SAC305 alloy nanowire is around 227.7 °C. The melting point of SAC305 alloy nanowire is significantly higher than that of SAC305 bulk alloy (219.4 °C). It is supposed that the non-uniform phase distribution and composite difference between the nanowires causes the change of melting temperature.

Advanced Nanoscale Approaches to Single-(Bio)entity Sensing and Imaging

Individual (bio)chemical entities could show a very heterogeneous behaviour under the same conditions that could be relevant in many biological processes of significance in the life sciences. Conventional detection approaches are only able to detect the average response of an ensemble of entities and assume that all entities are identical. From this perspective, important information about the heterogeneities or rare (stochastic) events happening in individual entities would remain unseen. Some nanoscale tools present interesting physicochemical properties that enable the possibility to detect systems at the single-entity level, acquiring richer information than conventional methods. In this review, we introduce the foundations and the latest advances of several nanoscale approaches to sensing and imaging individual (bio)entities using nanoprobes, nanopores, nanoimpacts, nanoplasmonics and nanomachines. Several (bio)entities such as cells, proteins, nucleic acids, vesicles and viruses are specifically considered. These nanoscale approaches provide a wide and complete toolbox for the study of many biological systems at the single-entity level.

Two step porosification of biomimetic thin-film hydroxyapatite/alpha-tri calcium phosphate coatings by pulsed electron beam irradiation

Here we show a new and effective methodology for rapid/controllable porosification of thin-film ceramics, which may be applied in medical devices/electronics and membrane nano-filtration. Dense hydroxyapatite applied to Ti6Al4V by plasma-assisted PVD was electron-beam irradiated to induce flash melting/boiling. Deposited coatings contained amorphous and nano-crystalline/stoichiometric hydroxyapatite (~35 nm). Irradiation (voltages 13-29 kV) led to ablation (up to 45% mass loss) and average/maximum pore areas from (0.07-1.66)/(0.69-92.53) μm2, mimicking the human cortical bone. Vitrification above 1150 °C formed (~62-30 nm) crystallites of α-Tri Calcium Phosphate. Unique porosification resulted from irradiation-induced sub-surface boiling and limited thermal conductivity of hydroxyapatite, causing material to expand/explode through the more quickly solidified top surface. Commercially applicable, roughened Ti6Al4V exacerbated the heating and boiling explosion phenomenon in certain regions, producing an array of pore sizes. Scaffold-like morphologies were generated by interconnection of micron/sub-micron porosity, showing great potential for facile generation of a biomimetic surface treatment for osseointegration.