Nanoporous Metal-Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics

Atomic/molecular layer deposition (ALD/MLD) allows for the direct gas-phase synthesis of crystalline metal-organic framework (MOF) thin films. Here, we show for the first time using krypton and methanol physisorption measurements that ALD/MLD-fabricated copper 1,4-benzenedicarboxylate (Cu-BDC) ultrathin films possess accessible porosity matching that of the corresponding bulk MOF.

Atomic/molecular layer deposition of Ni-terephthalate thin films

Atomic/molecular layer deposition (ALD/MLD) is currently strongly emerging as an intriguing route for novel metal-organic thin-film materials. This approach already covers a variety of metal and organic components, and potential applications related to e.g. sustainable energy technologies. Among the 3d metal components, nickel has remained unexplored so far. Here we report a robust and efficient ALD/MLD process for the growth of high-quality nickel terephthalate thin films. The films are deposited from Ni(thd)₂ (thd: 2,2,6,6-tetramethyl-3,5-heptanedionate) and terephthalic acid (1,4-benzenedicarboxylic acid) precursors in the temperature range of 180-280 °C, with appreciably high growth rates up to 2.3 Å per cycle at 200 °C. The films are amorphous but the local structure and chemical state of the films are addressed based on XRR, FTIR and RIXS techniques.

Electrochemically Active In Situ Crystalline Lithium-Organic Thin Films by ALD/MLD

Intercalated metal-organic framework (iMOF) type electrochemically active aromatic metal carboxylates are intriguing material candidates for various energy storage devices and microelectronics. In this work, we grow in situ crystalline thin films of such materials through atomic/molecular layer deposition (ALD/MLD); the remarkable benefit of this approach is the possibility to evaluate their electrochemical properties in a simple cell configuration without any additives. Five organic linkers are investigated in combination with lithium: terephthalic acid (TPA), 3,5-pyridinedicarboxylic acid (PDC), 2,6-naphthalenedicarboxylic acid (NDC), 4,4'-biphenyldicarboxylic acid (BPDC), and 4,4'-azobenzenedicarboxylic acid (AZO). In particular, the electrochemical activity of Li-PDC and the crystal structure of Li-AZO are addressed here for the first time. We believe that the in situ gas-phase thin-film deposition is a crucial requirement to benefit from the iMOF-type electrode materials in, e.g., microelectronics and wearable devices.

Amorphous-to-crystalline transition and photoluminescence switching in guest-absorbing metal–organic network thin films

Amorphous-to-crystalline (aMOF-to-MOF) transition and simultaneous quenching of luminescence are seen upon water absorption for Nd-terephthalate thin films grown using ALD/MLD method.

Composition-tuned metal-organic thin-film structures based on photoswitchable azobenzene by ALD/MLD

We demonstrate the fabrication of in-situ crystalline thin films of various azobenzene (AZO) based metal-organic structures using the atomic/molecular layer deposition (ALD/MLD) technique; these are highly intriguing materials as azobenzene is one of the prototype organic molecules experiencing photoisomerization. Our Li-, Ca and Fe-AZO thin films deposited from Li(thd) (thd = 2,2,6,6-tetramethyl-3,5-heptanedione), Ca(thd)2, FeCl3 and azobenzene-4,4'-dicarboxylic acid precursors in the temperature range of 250-360 °C exhibit metal-AZO structures not known from bulk samples. In all these structures, the AZO linker molecules are free to undergo the characteristic trans-cis photoisomerization reaction upon UV (360 nm) irradiation. However, this lowers the degree of crystallinity. To address the issue, we investigate hetero-organic structures where TPA (terephthalic acid) is used as another linker component together with AZO. This allows the trans-cis reaction of the AZO moieties to occur without compromising the film crystallinity. Finally, we demonstrate the growth of MOF-on-MOF type Ca-ADA@Ca-TPA thin films also showing the efficient photoisomerization reaction.

Controlled formation of ordered coordination polymeric networks using silsesquioxane building blocks

In this report, we synthesized ordered coordination polymers using polyhedral oligomeric silsesquioxanes (POSS) as a building block. A POSS with eight carboxylic terminals was coordinated with copper ions at various temperatures, forming polymeric networks. This novel coordination polymer has a long-range ordered structure.

Low-Temperature Molecular Layer Deposition Using Monofunctional Aromatic Precursors and Ozone-Based Ring-Opening Reactions

Molecular layer deposition (MLD) is an increasingly used deposition technique for producing thin coatings consisting of purely organic or hybrid inorganic-organic materials. When organic materials are prepared, low deposition temperatures are often required to avoid decomposition, thus causing problems with low vapor pressure precursors. Monofunctional compounds have higher vapor pressures than traditional bi- or trifunctional MLD precursors, but do not offer the required functional groups for continuing the MLD growth in subsequent deposition cycles. In this study, we have used high vapor pressure monofunctional aromatic precursors in combination with ozone-triggered ring-opening reactions to achieve sustained sequential growth. MLD depositions were carried out by using three different aromatic precursors in an ABC sequence, namely with TMA + phenol + O₃, TMA + 3-(trifluoromethyl)phenol + O₃, and TMA + 2-fluoro-4-(trifluoromethyl)benzaldehyde + O₃. Furthermore, the effect of hydrogen peroxide as a fourth step was evaluated for all studied processes resulting in a four-precursor ABCD sequence. According to the characterization results by ellipsometry, infrared spectroscopy, and X-ray reflectivity, self-limiting MLD processes could be obtained between 75 and 150 °C with each of the three aromatic precursors. In all cases, the GPC (growth per cycle) decreased with increasing temperature. In situ infrared spectroscopy indicated that ring-opening reactions occurred in each ABC sequence. Compositional analysis using time-of-flight elastic recoil detection indicated that fluorine could be incorporated into the film when 3-(trifluoromethyl)phenol and 2-fluoro-4-(trifluoromethyl)benzaldehyde were used as precursors.

Atomic/molecular layer deposition: a direct gas-phase route to crystalline metal–organic framework thin films

Atomic/molecular layer deposition offers us an elegant way of fabricating crystalline copper(ii)terephthalate metal–organic framework (MOF) thin films on various substrate surfaces.

ALD/MLD processes for Mn and Co based hybrid thin films

New types of transition metal–organic hybrid thin films are fabricated with the emerging atomic/molecular layer deposition (ALD/MLD) technique through sequential gas-surface reactions from Mn(thd)₃, Co(thd)₂, Co(acac)₃ and terephthalic acid (1,4-benzenedicarboxylic acid) precursors.

ALD/MLD fabrication of luminescent Eu-organic hybrid thin films using different aromatic carboxylic acid components with N and O donors

Atomic/molecular layer deposition (ALD/MLD) processes based on Eu(thd)₃ and three different aromatic organic acids with O and N donors as precursors are systematically investigated for the growth of Eu-based inorganic–organic thin-film phosphors.

Growth characteristics of Ti-based fumaric acid hybrid thin films by molecular layer deposition

Ti-based fumaric acid hybrid thin films were successfully prepared using inorganic TiCl₄ and organic fumaric acid as precursors by molecular layer deposition (MLD).

Organic and inorganic-organic thin film structures by molecular layer deposition: A review

The possibility to deposit purely organic and hybrid inorganic-organic materials in a way parallel to the state-of-the-art gas-phase deposition method of inorganic thin films, i.e., atomic layer deposition (ALD), is currently experiencing a strongly growing interest. Like ALD in case of the inorganics, the emerging molecular layer deposition (MLD) technique for organic constituents can be employed to fabricate high-quality thin films and coatings with thickness and composition control on the molecular scale, even on complex three-dimensional structures. Moreover, by combining the two techniques, ALD and MLD, fundamentally new types of inorganic-organic hybrid materials can be produced. In this review article, we first describe the basic concepts regarding the MLD and ALD/MLD processes, followed by a comprehensive review of the various precursors and precursor pairs so far employed in these processes. Finally, we discuss the first proof-of-concept experiments in which the newly developed MLD and ALD/MLD processes are exploited to fabricate novel multilayer and nanostructure architectures by combining different inorganic, organic and hybrid material layers into on-demand designed mixtures, superlattices and nanolaminates, and employing new innovative nanotemplates or post-deposition treatments to, e.g., selectively decompose parts of the structure. Such layer-engineered and/or nanostructured hybrid materials with exciting combinations of functional properties hold great promise for high-end technological applications.