3D nanostructures fabricated by advanced stencil lithography

Plotter Cut Stencil Masks for the Deposition of Organic and Inorganic Materials and a New Rapid, Cost Effective Technique for Antimicrobial Evaluations

Plotter cutters in stencil mask prototyping are underutilized but have several advantages over traditional MEMS techniques. In this paper we investigate the use of a conventional plotter cutter as a highly effective benchtop tool for the rapid prototyping of stencil masks in the sub-250 μm range and characterize patterned layers of organic/inorganic materials. Furthermore, we show a new diagnostic monitoring application for use in healthcare, and a potential replacement of the Standard Kirby-Bauer Diffusion Antibiotic Resistance tests was developed and tested on both Escherichia coli and Xanthomonas alfalfae as pathogens with Oxytetracycline, Streptomycin and Kanamycin. We show that the reduction in area required for the minimum inhibitory concentration tests; allow for three times the number of tests to be performed within the same nutrient agar Petri dish, demonstrated both theoretically and experimentally resulting in correlations of R ≈ 0.96 and 0.985, respectively for both pathogens.

Ultra-sensitive amplitude engineering and sign reversal of circular dichroism in quasi-3D chiral nanostructures

Circular dichroism (CD), as one of the most representative chiroptical effects, provides a simple strategy for the detection and characterization of the molecular chirality. The enhancement and sign reversal of CD are of great importance for its practical applications in chiral bio-sensing, chirality switching and optical filtering, etc. Here, we realize considerable adjustments and the sign reversal of CD in quasi-three-dimensional (quasi-3D) combined Archimedean spiral nanostructures. With special local and lattice configurations, the nanostructures have both right-handed and left-handed geometric chirality, which are designed based on the proximity effect of stencil lithography. We find that the CD response of the nanostructures becomes obvious once its height exceeds 200 nm and can be adjusted by the further increase of the height or the change of the blade spacing of the nanostructures. The CD reversal is achieved by utilizing the competition of two chiral centers when the height or blade spacing exceeds a critical value. Further analysis of the scattering power of multipole moments reveals that the CD modulation is determined by both magnetic dipole moment and electric quadrupole moment. Benefiting from the highly sensitive CD response to the height, the extreme sign reversal of CD is achieved when a sub-10-nm ultrathin medium layer is anchored on the surface of the nanostructures, which provides a promising strategy for ultra-sensitive chiral bio-sensing.

3D Meta-Prisms for Versatile Beam Steering by Hybridizing Plasmonic and Diffractive Effect in the Broadband Visible Regime

As two independent optical sub-fields, diffraction optics and plasmonics both have been used for wavefront shaping and beam steering. However, the two separate concepts have always been developing as two parallel directions, which have not met for studying their structural hybridization to discover new potentials. For instance of the flat metasurfaces, even though the geometric parameters including shape, size, and periodicity have been studied, it remains mostly unexplored for the 3D spatial height variation. Here, a new type of all-metallic 3D meta-prism is proposed and experimentally demonstrated by hybridizing the localized surface plasmonic resonances (LSPR) and the blazed grating diffraction, which enables strong polarization-dependent behaviors to steer broadband visible light to drastically inverse directions. The nanofabrication of 3D meta-prism is achieved by nanostencil lithography with electron-beam evaporation. Such meta-prism could also enable to split different visible light (green, blue, and red) with high-efficiency contrast (≈10). By the mirror-symmetry arrangement, a multifunctional surface is demonstrated with polarization-/wavelength-multiplexing wavefront-shaping functions (concave, convex, or flat mirror). This unique 3D meta-prism enjoys great simplicity and versatility in broadband beam steering through the incorporation of plasmonic and diffractive effects and can be utilized in various applications including dichroic-prism splitters, multifunctional meta-mirrors, etc.

Three-dimensional nanoprinting via charged aerosol jets

Three-dimensional (3D) printing^1-9 has revolutionized manufacturing processes for electronics^10-12, optics^13-15, energy^16,17, robotics¹⁸, bioengineering^19-21 and sensing²². Downscaling 3D printing²³ will enable applications that take advantage of the properties of micro- and nanostructures^24,25. However, existing techniques for 3D nanoprinting of metals require a polymer-metal mixture, metallic salts or rheological inks, limiting the choice of material and the purity of the resulting structures. Aerosol lithography has previously been used to assemble arrays of high-purity 3D metal nanostructures on a prepatterned substrate^26,27, but in limited geometries^26-30. Here we introduce a technique for direct 3D printing of arrays of metal nanostructures with flexible geometry and feature sizes down to hundreds of nanometres, using various materials. The printing process occurs in a dry atmosphere, without the need for polymers or inks. Instead, ions and charged aerosol particles are directed onto a dielectric mask containing an array of holes that floats over a biased silicon substrate. The ions accumulate around each hole, generating electrostatic lenses that focus the charged aerosol particles into nanoscale jets. These jets are guided by converged electric-field lines that form under the hole-containing mask, which acts similarly to the nozzle of a conventional 3D printer, enabling 3D printing of aerosol particles onto the silicon substrate. By moving the substrate during printing, we successfully print various 3D structures, including helices, overhanging nanopillars, rings and letters. In addition, to demonstrate the potential applications of our technique, we printed an array of vertical split-ring resonator structures. In combination with other 3D-printing methods, we expect our 3D-nanoprinting technique to enable substantial advances in nanofabrication.

Polarization-insensitive broadband visible-light steering with tunable direction enabled by scalable plasmonics meta-gratings

As an emerging field in the discipline of optics, plasmonics and metasurfaces have been demonstrated to enable a new degree of freedom to manipulate light for arbitrary beam steering, spectral splitting as well as precise wavefront shaping. However, it has been mostly studied in parallel with the field of diffractive optics, and awaits the unveiling of how the hybridizations between plasmonic effect and diffraction effect interact and impact. Here, we have theoretically proposed a new type of polarization-insensitive meta-grating structure across the broadband visible regime. The structure design combines the width gradient (critical resonant length) from a trapezoid-nanoantenna with the height gradient from a blazed grating profile. The hybridized meta-grating creates both plasmonic effect and grating effect, which enables all the optical incident photons to be directed to the same orientation regardless of the light polarization. As we know, both metasurfaces and diffractive optical elements (such as gratings) are, more often than not, quite sensitive to the incident light polarization. Moreover, if placing our meta-grating on a flexible/stretchable substrate (such as polydimethylsiloxane), the outgoing angle can be effectively adjusted by tuning the period or density of meta-grating arrays. Such meta-grating architectures can be potentially manufactured by existing photolithography and nanoimprint techniques, and can easily find a wide range of practical polarization-insensitive applications, including broadband deflector and emitter, tunable display and imaging device, high signal-to-noise ratio spectrometer, polarization-insensitive plasmonic coupler, etc.

Advancements in fractal plasmonics: structures, optical properties, and applications

Fractal nanostructures exhibit optical properties that span the visible to far-infrared and are emerging as exciting structures for plasmon-mediated applications.

Utilization of Resist Stencil Lithography for Multidimensional Fabrication on a Curved Surface

The limited ability to fabricate nanostructures on nonplanar rugged surfaces has severely hampered the applicability of many emerging technologies. Here we report a resist stencil lithography based approach for in situ fabrication of multidimensional nanostructures on both planar and uneven substrates. By using the resist film as a flexible stencil to form a suspending membrane with predesigned patterns, a variety of nanostructures have been fabricated on curved or uneven substrates of diverse morphologies on demand. The ability to realize 4 in. wafer scale fabrication of nanostructures as well as line width resolution of sub-20 nm is also demonstrated. Its extraordinary capacity is highlighted by the fabrication of three-dimensional wavy nanostructures with diversified cell morphologies on substrates of different curvatures. A robust general scheme is also developed to construct various complex 3D nanostructures. The use of conventional resists and processing ensures the versatility of the method. Such an in situ lithography technique has offered exciting possibilities to construct nanostructures with high dimensionalities that can otherwise not be achieved with existing nanofabrication methods.

Tunable fractional Fourier transform implementation of electronic wave functions in atomically thin materials

A tunable fractional Fourier transform of the quantum wave function of electrons satisfying either the Schrödinger or the Dirac equation can be implemented in an atomically thin material by a parabolic potential distribution applied on a direction transverse to that of electron propagation. The difference between the propagation lengths necessary to obtain a fractional Fourier transform of a given order in these two cases could be seen as a manifestation of the Berry phase. The Fourier transform of the electron wave function is a particular case of the fractional Fourier transform. If the input and output wave functions are discretized, this configuration implements in one step the discrete fractional Fourier transform, in particular the discrete Fourier transform, and thus can act as a coprocessor in integrated logic circuits.

Stencil Lithography for Scalable Micro- and Nanomanufacturing

In this paper, we review the current development of stencil lithography for scalable micro- and nanomanufacturing as a resistless and reusable patterning technique. We first introduce the motivation and advantages of stencil lithography for large-area micro- and nanopatterning. Then we review the progress of using rigid membranes such as SiNx and Si as stencil masks as well as stacking layers. We also review the current use of flexible membranes including a compliant SiNx membrane with springs, polyimide film, polydimethylsiloxane (PDMS) layer, and photoresist-based membranes as stencil lithography masks to address problems such as blurring and non-planar surface patterning. Moreover, we discuss the dynamic stencil lithography technique, which significantly improves the patterning throughput and speed by moving the stencil over the target substrate during deposition. Lastly, we discuss the future advancement of stencil lithography for a resistless, reusable, scalable, and programmable nanolithography method.

Write-Read 3D Patterning with a Dual-Channel Nanopipette

Nanopipettes are becoming extremely versatile and powerful tools in nanoscience for a wide variety of applications from imaging to nanoscale sensing. Herein, the capabilities of nanopipettes to build complex free-standing three-dimensional (3D) nanostructures are demonstrated using a simple double-barrel nanopipette device. Electrochemical control of ionic fluxes enables highly localized delivery of precursor species from one channel and simultaneous (dynamic and responsive) ion conductance probe-to-substrate distance feedback with the other for reliable high-quality patterning. Nanopipettes with 30-50 nm tip opening dimensions of each channel allowed confinement of ionic fluxes for the fabrication of high aspect ratio copper pillar, zigzag, and Γ-like structures, as well as permitted the subsequent topographical mapping of the patterned features with the same nanopipette probe as used for nanostructure engineering. This approach offers versatility and robustness for high-resolution 3D "printing" (writing) and read-out at the nanoscale.