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Lee Y, Hong S, Moon I, Kim CJ, Lee Y, Hong BH. Laser-assisted synthesis and modification of 2D materials. NANOTECHNOLOGY 2024; 36:052003. [PMID: 39433061 DOI: 10.1088/1361-6528/ad892a] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/15/2023] [Accepted: 10/21/2024] [Indexed: 10/23/2024]
Abstract
Two-dimensional (2D) materials with unique physical, electronic, and optical properties have been intensively studied to be utilized for the next-generation electronic and optical devices, and the use of laser energy in the synthesis and modification of 2D materials is advantageous due to its convenient and fast fabrication processes as well as selective, controllable, and cost-effective characteristics allowing the precise control in materials properties. This paper summarizes the recent progress in utilizations of laser technology in synthesizing, doping, etching, transfer and strain engineering of 2D materials, which is expected to provide an insight for the future applications across diverse research areas.
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Affiliation(s)
- Yejun Lee
- Department of Chemistry, Seoul National University, Seoul 08826, Republic of Korea
| | - Sunhwa Hong
- Department of Chemistry, Seoul National University, Seoul 08826, Republic of Korea
| | - Issac Moon
- Department of Chemistry, Seoul National University, Seoul 08826, Republic of Korea
| | - Chan-Jin Kim
- Department of Chemistry, Seoul National University, Seoul 08826, Republic of Korea
| | - Yunseok Lee
- Department of Chemistry, Seoul National University, Seoul 08826, Republic of Korea
| | - Byung Hee Hong
- Department of Chemistry, Seoul National University, Seoul 08826, Republic of Korea
- Graphene Research Center & Graphene Square Inc., Advanced Institute of Convergence Technology, Suwon 16229, Republic of Korea
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2
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Chen J, Sun MY, Wang ZH, Zhang Z, Zhang K, Wang S, Zhang Y, Wu X, Ren TL, Liu H, Han L. Performance Limits and Advancements in Single 2D Transition Metal Dichalcogenide Transistor. NANO-MICRO LETTERS 2024; 16:264. [PMID: 39120835 PMCID: PMC11315877 DOI: 10.1007/s40820-024-01461-x] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/10/2024] [Accepted: 06/13/2024] [Indexed: 08/10/2024]
Abstract
Two-dimensional (2D) transition metal dichalcogenides (TMDs) allow for atomic-scale manipulation, challenging the conventional limitations of semiconductor materials. This capability may overcome the short-channel effect, sparking significant advancements in electronic devices that utilize 2D TMDs. Exploring the dimension and performance limits of transistors based on 2D TMDs has gained substantial importance. This review provides a comprehensive investigation into these limits of the single 2D-TMD transistor. It delves into the impacts of miniaturization, including the reduction of channel length, gate length, source/drain contact length, and dielectric thickness on transistor operation and performance. In addition, this review provides a detailed analysis of performance parameters such as source/drain contact resistance, subthreshold swing, hysteresis loop, carrier mobility, on/off ratio, and the development of p-type and single logic transistors. This review details the two logical expressions of the single 2D-TMD logic transistor, including current and voltage. It also emphasizes the role of 2D TMD-based transistors as memory devices, focusing on enhancing memory operation speed, endurance, data retention, and extinction ratio, as well as reducing energy consumption in memory devices functioning as artificial synapses. This review demonstrates the two calculating methods for dynamic energy consumption of 2D synaptic devices. This review not only summarizes the current state of the art in this field but also highlights potential future research directions and applications. It underscores the anticipated challenges, opportunities, and potential solutions in navigating the dimension and performance boundaries of 2D transistors.
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Affiliation(s)
- Jing Chen
- Institute of Marine Science and Technology, Shandong University, Qingdao, 266237, Shandong, People's Republic of China
- BNRist, Tsinghua University, Beijing, 100084, People's Republic of China
| | - Ming-Yuan Sun
- Institute of Marine Science and Technology, Shandong University, Qingdao, 266237, Shandong, People's Republic of China
| | - Zhen-Hua Wang
- Institute of Marine Science and Technology, Shandong University, Qingdao, 266237, Shandong, People's Republic of China
| | - Zheng Zhang
- Institute of Marine Science and Technology, Shandong University, Qingdao, 266237, Shandong, People's Republic of China
| | - Kai Zhang
- Institute of Marine Science and Technology, Shandong University, Qingdao, 266237, Shandong, People's Republic of China
| | - Shuai Wang
- Institute of Marine Science and Technology, Shandong University, Qingdao, 266237, Shandong, People's Republic of China
| | - Yu Zhang
- Institute of Marine Science and Technology, Shandong University, Qingdao, 266237, Shandong, People's Republic of China
- Shenzhen Research Institute of Shandong University, Shenzhen, 518057, People's Republic of China
| | - Xiaoming Wu
- School of Integrated Circuits and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100084, People's Republic of China
| | - Tian-Ling Ren
- School of Integrated Circuits and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100084, People's Republic of China.
| | - Hong Liu
- State Key Laboratory of Crystal Materials, Shandong University, Jinan, 250100, Shandong, People's Republic of China
| | - Lin Han
- Institute of Marine Science and Technology, Shandong University, Qingdao, 266237, Shandong, People's Republic of China.
- State Key Laboratory of Crystal Materials, Shandong University, Jinan, 250100, Shandong, People's Republic of China.
- Shenzhen Research Institute of Shandong University, Shenzhen, 518057, People's Republic of China.
- Shandong Engineering Research Center of Biomarker and Artificial Intelligence Application, Jinan, 250100, People's Republic of China.
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3
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Okello ON, Yang DH, Seo SY, Park J, Moon G, Shin D, Chu YS, Yang S, Mizoguchi T, Jo MH, Choi SY. Atomistic Probing of Defect-Engineered 2H-MoTe 2 Monolayers. ACS NANO 2024; 18:6927-6935. [PMID: 38374663 PMCID: PMC10919086 DOI: 10.1021/acsnano.3c08606] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/09/2023] [Revised: 02/01/2024] [Accepted: 02/05/2024] [Indexed: 02/21/2024]
Abstract
Point defects dictate various physical, chemical, and optoelectronic properties of two-dimensional (2D) materials, and therefore, a rudimentary understanding of the formation and spatial distribution of point defects is a key to advancement in 2D material-based nanotechnology. In this work, we performed the demonstration to directly probe the point defects in 2H-MoTe2 monolayers that are tactically exposed to (i) 200 °C-vacuum-annealing and (ii) 532 nm-laser-illumination; and accordingly, we utilize a deep learning algorithm to classify and quantify the generated point defects. We discovered that tellurium-related defects are mainly generated in both 2H-MoTe2 samples; but interestingly, 200 °C-vacuum-annealing and 532 nm-laser-illumination modulate a strong n-type and strong p-type 2H-MoTe2, respectively. While 200 °C-vacuum-annealing generates tellurium vacancies or tellurium adatoms, 532 nm-laser-illumination prompts oxygen atoms to be adsorbed/chemisorbed at tellurium vacancies, giving rise to the p-type characteristic. This work significantly advances the current understanding of point defect engineering in 2H-MoTe2 monolayers and other 2D materials, which is critical for developing nanoscale devices with desired functionality.
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Affiliation(s)
- Odongo
Francis Ngome Okello
- Department
of Materials Science and Engineering, Pohang
University of Science and Technology (POSTECH), 77 Cheongam-ro, Nam-gu, Pohang-si 37673, Republic of Korea
- Samsung
Electronics, Foundry Analysis & Engineering Team, Global Manufacturing & Infra Technology, Samsungjeonja-ro 1, Hwaseong-si 18448, Republic
of Korea
| | - Dong-Hwan Yang
- Department
of Materials Science and Engineering, Pohang
University of Science and Technology (POSTECH), 77 Cheongam-ro, Nam-gu, Pohang-si 37673, Republic of Korea
- Center
for Van der Waals Quantum Solids, Institute
of Basic Science (IBS), 77 Cheongam-ro, Nam-gu, Pohang-si 37673, Republic of Korea
| | - Seung-Young Seo
- Department
of Materials Science and Engineering, Pohang
University of Science and Technology (POSTECH), 77 Cheongam-ro, Nam-gu, Pohang-si 37673, Republic of Korea
| | - Jewook Park
- Department
of Materials Science and Engineering, Pohang
University of Science and Technology (POSTECH), 77 Cheongam-ro, Nam-gu, Pohang-si 37673, Republic of Korea
- Center
for Van der Waals Quantum Solids, Institute
of Basic Science (IBS), 77 Cheongam-ro, Nam-gu, Pohang-si 37673, Republic of Korea
| | - Gunho Moon
- Department
of Materials Science and Engineering, Pohang
University of Science and Technology (POSTECH), 77 Cheongam-ro, Nam-gu, Pohang-si 37673, Republic of Korea
- Center
for Van der Waals Quantum Solids, Institute
of Basic Science (IBS), 77 Cheongam-ro, Nam-gu, Pohang-si 37673, Republic of Korea
| | - Dongwon Shin
- Materials
Science and Technology Division, Oak Ridge
National Laboratory (ORNL), Oak Ridge, Tennessee 37831, United States
| | - Yu-Seong Chu
- Division
of Biomedical Engineering, College of Health Sciences, Yonsei University, 1, Yeonsedae-gil, Heungeop-myeon, Wonju-si 26493, Republic of Korea
| | - Sejung Yang
- Department
of Precision Medicine, Yonsei University,
Wonju College of Medicine, 20 Ilsan-ro, Wonju-si 26426, Republic of Korea
- Department
of Medical Informatics and Biostatistics, Graduate School, Yonsei University, 20 Ilsan-ro, Wonju-si 26426, Republic
of Korea
| | - Teruyasu Mizoguchi
- Institute
of Industrial Science, The University of
Tokyo, Komaba, Meguro 4-6-1, Tokyo 153-8505, Japan
| | - Moon-Ho Jo
- Department
of Materials Science and Engineering, Pohang
University of Science and Technology (POSTECH), 77 Cheongam-ro, Nam-gu, Pohang-si 37673, Republic of Korea
- Center
for Van der Waals Quantum Solids, Institute
of Basic Science (IBS), 77 Cheongam-ro, Nam-gu, Pohang-si 37673, Republic of Korea
| | - Si-Young Choi
- Department
of Materials Science and Engineering, Pohang
University of Science and Technology (POSTECH), 77 Cheongam-ro, Nam-gu, Pohang-si 37673, Republic of Korea
- Center
for Van der Waals Quantum Solids, Institute
of Basic Science (IBS), 77 Cheongam-ro, Nam-gu, Pohang-si 37673, Republic of Korea
- Department
of Semiconductor Engineering, POSTECH, 77 Cheongam-ro, Nam-gu, Pohang-si 37673, Republic of Korea
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Yan Z, Yang H, Yang Z, Ji C, Zhang G, Tu Y, Du G, Cai S, Lin S. Emerging Two-Dimensional Tellurene and Tellurides for Broadband Photodetectors. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2022; 18:e2200016. [PMID: 35244332 DOI: 10.1002/smll.202200016] [Citation(s) in RCA: 18] [Impact Index Per Article: 6.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/03/2022] [Revised: 01/30/2022] [Indexed: 06/14/2023]
Abstract
As with all stylish 2D functional materials, tellurene and tellurides possessing excellent physical and chemical properties such as high environmental stability, tunable narrow bandgap, and lower thermal conductivity, have aroused the great interest of the researchers. These properties of such materials also form the basis for relatively newfangled scholarly fields involving advanced topics, especially for broadband photodetectors. Integrating the excellent properties of many 2D materials, tellurene/telluride-based photodetectors show great flexibility, higher frequency response or faster time response, high signal-to-noise ratio, and so on, which make them leading the frontier of photodetector research. To fully understand the excellent properties of tellurene/tellurides and their optoelectronic applications, the recent advances in tellurene/telluride-based photodetectors are maximally summarized. Benefiting from the solid research in this field, the challenges and opportunities of tellurene/tellurides for future optoelectronic applications are also discussed in this review, which might provide possibilities for the realization of state-of-the-art high-performance tellurene/telluride-based devices.
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Affiliation(s)
- Zihan Yan
- Songshan Lake Materials Laboratory, Dongguan, 523808, China
- College of Physics Science and Technology, Yangzhou University, Jiangsu, 225009, China
| | - Hao Yang
- College of Physics Science and Technology, Yangzhou University, Jiangsu, 225009, China
| | - Zhuo Yang
- College of Physics Science and Technology, Yangzhou University, Jiangsu, 225009, China
| | - Chengao Ji
- College of Physics Science and Technology, Yangzhou University, Jiangsu, 225009, China
| | - Guangyu Zhang
- Songshan Lake Materials Laboratory, Dongguan, 523808, China
| | - Yusong Tu
- College of Physics Science and Technology, Yangzhou University, Jiangsu, 225009, China
| | - Guangyu Du
- Songshan Lake Materials Laboratory, Dongguan, 523808, China
- Department of Applied Physics, The Hong Kong Polytechnic University, Hunghom, Kowloon, 999077, Hong Kong
| | - Songhua Cai
- Department of Applied Physics, The Hong Kong Polytechnic University, Hunghom, Kowloon, 999077, Hong Kong
| | - Shenghuang Lin
- Songshan Lake Materials Laboratory, Dongguan, 523808, China
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Wang Y, Zhang M, Xue Z, Chen X, Mei Y, Chu PK, Tian Z, Wu X, Di Z. Atomistic Observation of the Local Phase Transition in MoTe 2 for Application in Homojunction Photodetectors. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2022; 18:e2200913. [PMID: 35411673 DOI: 10.1002/smll.202200913] [Citation(s) in RCA: 8] [Impact Index Per Article: 2.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/11/2022] [Revised: 03/26/2022] [Indexed: 06/14/2023]
Abstract
Direct atomic-scale observation of the local phase transition in transition metal dichalcogenides (TMDCs) is critically required to carry out in-depth studies of their atomic structures and electronic features. However, the structural aspects including crystal symmetries tend to be unclear and unintuitive in real-time monitoring of the phase transition process. Herein, by using in situ transmission electron microscopy, information about the phase transition mechanism of MoTe2 from hexagonal structure (2H phase) to monoclinic structure (1T' phase) driven by sublimation of Te atoms after a spike annealing is obtained directly. Furthermore, with the control of Te atom sublimation by modulating the hexagonal boron nitride (h-BN) coverage in the desired area, the lateral 1T'-enriched MoTe2 /2H MoTe2 homojunction can be one-step constructed via an annealing treatment. Owing to the gradient bandgap provided by 1T'-enriched MoTe2 and 2H MoTe2 , the photodetector composed of the 1T'-enriched MoTe2 /2H MoTe2 homojunction shows fast photoresponse and ten times larger photocurrents than that consisting of a pure 2H MoTe2 channel. The study reveals a route to improve the performance of optoelectronic and electronic devices based on TMDCs with both semiconducting and semimetallic phases.
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Affiliation(s)
- Yalan Wang
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, P. R. China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, 100049, P. R. China
| | - Miao Zhang
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, P. R. China
| | - Zhongying Xue
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, P. R. China
| | - Xinqian Chen
- Shanghai Key Laboratory of Multidimensional Information Processing, School of Communication and Electronic Engineering, East China Normal University, 500 Dongchuan Road, Shanghai, 200241, P. R. China
| | - Yongfeng Mei
- Department of Materials Science, State Key Laboratory of ASIC and Systems, Fudan University, Shanghai, 200433, P. R. China
| | - Paul K Chu
- Department of Physics, Department of Materials Science and Engineering, and Department of Biomedical Engineering, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong, 999077, P. R. China
| | - Ziao Tian
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, P. R. China
| | - Xing Wu
- Shanghai Key Laboratory of Multidimensional Information Processing, School of Communication and Electronic Engineering, East China Normal University, 500 Dongchuan Road, Shanghai, 200241, P. R. China
| | - Zengfeng Di
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, P. R. China
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Wu X, Chen X, Yang R, Zhan J, Ren Y, Li K. Recent Advances on Tuning the Interlayer Coupling and Properties in van der Waals Heterostructures. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2022; 18:e2105877. [PMID: 35044721 DOI: 10.1002/smll.202105877] [Citation(s) in RCA: 7] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/25/2021] [Revised: 11/25/2021] [Indexed: 06/14/2023]
Abstract
2D van der Waals (vdW) heterostructures are receiving increasing research attention due to the theoretically amazing properties and unprecedented application potential. However, the as-synthesized heterostructures are generally underperforming due to the weak interlayer coupling, which inspires the researchers to find ways to modulate the interlayer coupling and properties, realizing the tailored performance for actual applications. There have been a lot of publications regarding the controllable regulation of the structures and properties of 2D vdW heterostructures in the past few years, while a review work summarizing the current advances is not yet available, though it is significant. This paper conducts a state-of-the-art review regarding the current research progress of performance modulation of vdW heterostructures by different techniques. First, the general synthesis methods of vdW heterostructures are summarized. Then, different performance modulation techniques, that is, mechanical-based, external fields-assisted, and particle beam irradiation-based methods, are discussed and compared in detail. Some of the newly proposed concepts are described. Thereafter, applications of vdW heterostructures with tailored properties are reviewed for the application prospects of the topic around this area. Moreover, the future research challenges and prospects are discussed, aiming at triggering more research interest and device applications around this topic.
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Affiliation(s)
- Xin Wu
- School of Chemical Engineering and Technology, Sun Yat-sen University, Zhuhai, Guangdong, 519082, China
| | - Xiyue Chen
- School of Chemical Engineering and Technology, Sun Yat-sen University, Zhuhai, Guangdong, 519082, China
| | - Ruxue Yang
- School of Chemical Engineering and Technology, Sun Yat-sen University, Zhuhai, Guangdong, 519082, China
| | - Jianbin Zhan
- State Key Laboratory of Mechanical Transmission, Chongqing University, Chongqing, 400044, China
| | - Yingzhi Ren
- State Key Laboratory of Mechanical Transmission, Chongqing University, Chongqing, 400044, China
| | - Kun Li
- State Key Laboratory of Mechanical Transmission, Chongqing University, Chongqing, 400044, China
- Chongqing Key Laboratory of Metal Additive Manufacturing (3D Printing), Chongqing University, Chongqing, 400044, China
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7
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Ghosh S, Varghese A, Jawa H, Yin Y, Medhekar NV, Lodha S. Polarity-Tunable Photocurrent through Band Alignment Engineering in a High-Speed WSe 2/SnSe 2 Diode with Large Negative Responsivity. ACS NANO 2022; 16:4578-4587. [PMID: 35188740 DOI: 10.1021/acsnano.1c11110] [Citation(s) in RCA: 17] [Impact Index Per Article: 5.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
Excellent light-matter interaction and a wide range of thickness-tunable bandgaps in layered vdW materials coupled by the facile fabrication of heterostructures have enabled several avenues for optoelectronic applications. Realization of high photoresponsivity at fast switching speeds is a critical challenge for 2D optoelectronics to enable high-performance photodetection for optical communication. Moving away from conventional type-II heterostructure pn junctions towards a WSe2/SnSe2 type-III configuration, we leverage the steep change in tunneling current along with a light-induced heterointerface band shift to achieve high negative photoresponsivity, while the fast carrier transport under tunneling results in high speed. In addition, the photocurrent can be controllably switched from positive to negative values, with ∼104× enhancement in responsivity, by engineering the band alignment from type-II to type-III using either the drain or the gate bias. This is further reinforced by electric-field dependent interlayer band structure calculations using density functional theory. The high negative responsivity of 2 × 104 A/W and fast response time of ∼1 μs coupled with a polarity-tunable photocurrent can lead to the development of next-generation multifunctional optoelectronic devices.
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Affiliation(s)
- Sayantan Ghosh
- Department of Electrical Engineering, IIT Bombay, Mumbai 400076, India
| | - Abin Varghese
- Department of Electrical Engineering, IIT Bombay, Mumbai 400076, India
- Department of Materials Science and Engineering, Monash University, Clayton, Victoria 3800, Australia
- IITB-Monash Research Academy, IIT Bombay, Mumbai 400076, India
| | - Himani Jawa
- Department of Electrical Engineering, IIT Bombay, Mumbai 400076, India
| | - Yuefeng Yin
- Department of Materials Science and Engineering, Monash University, Clayton, Victoria 3800, Australia
| | - Nikhil V Medhekar
- Department of Materials Science and Engineering, Monash University, Clayton, Victoria 3800, Australia
| | - Saurabh Lodha
- Department of Electrical Engineering, IIT Bombay, Mumbai 400076, India
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Xiang D, Cao Y, Wang K, Han Z, Liu T, Chen W. Artificially created interfacial states enabled van der Waals heterostructure memory device. NANOTECHNOLOGY 2022; 33:175201. [PMID: 35026752 DOI: 10.1088/1361-6528/ac4b2f] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/11/2021] [Accepted: 01/13/2022] [Indexed: 06/14/2023]
Abstract
Two-dimensional (2D) interface plays a predominate role in determining the performance of a device that is configured as a van der Waals heterostructure (vdWH). Intensive efforts have been devoted to suppressing the emergence of interfacial states during vdWH stacking process, which facilitates the charge interaction and transfer between the heterostructure layers. However, the effective generation and modulation of the vdWH interfacial states could give rise to a new design and architecture of 2D functional devices. Here, we report a 2D non-volatile vdWH memory device enabled by the artificially created interfacial states between hexagonal boron nitride (hBN) and molybdenum ditelluride (MoTe2). The memory originates from the microscopically coupled optical and electrical responses of the vdWH, with the high reliability reflected by its long data retention time over 104s and large write-erase cyclic number exceeding 100. Moreover, the storage currents in the memory can be precisely controlled by the writing and erasing gates, demonstrating the tunability of its storage states. The vdWH memory also exhibits excellent robustness with wide temperature endurance window from 100 K to 380 K, illustrating its potential application in harsh environment. Our findings promise interfacial-states engineering as a powerful approach to realize high performance vdWH memory device, which opens up new opportunities for its application in 2D electronics and optoelectronics.
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Affiliation(s)
- Du Xiang
- Frontier Institute of Chip and System, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200438, People's Republic of China
| | - Yi Cao
- Frontier Institute of Chip and System, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200438, People's Republic of China
| | - Kun Wang
- Institute of Optoelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200438, People's Republic of China
| | - Zichao Han
- Institute of Optoelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200438, People's Republic of China
| | - Tao Liu
- Institute of Optoelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200438, People's Republic of China
| | - Wei Chen
- Department of Chemistry, National University of Singapore, Singapore 117543, Singapore
- Department of Physics, National University of Singapore, Singapore 117542, Singapore
- National University of Singapore (Suzhou) Research Institute, 377 Lin Quan Street, Suzhou Industrial Park, Suzhou 215123, People's Republic of China
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