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Is F, Mohanta MK, Sarkar AD. Insights into selected 2D piezo Rashba semiconductors for self-powered flexible piezo spintronics: material to contact properties. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2023; 35:253001. [PMID: 36958043 DOI: 10.1088/1361-648x/acc70f] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/19/2022] [Accepted: 03/23/2023] [Indexed: 06/18/2023]
Abstract
The new paradigm in electronics consists in realizing the seamless integration of many properties latent in nanomaterials, such as mechanical flexibility, strong spin-orbit coupling (Rashba spin splitting-RSS), and piezoelectricity. Taking cues from the pointers given on 1D ZnO nanowires (ACS Nano2018121811-20), the concept can be extended to multifunctional two-dimensional (2D) materials, which can serve as an ideal platform in next-generation electronics such as self-powered flexible piezo-spintronic device. However, a microscopically clear understanding reachable from the state-of-the-art density functional theory-based approaches is a prerequisite to advancing this research domain. Atomic-scale insights gained from meticulously performed scientific computations can firmly anchor the growth of this important research field, and that is of undeniable relevance from scientific and technological outlooks. This article reviews the scientific advance in understanding 2D materials hosting all the essential properties, i.e. flexibility, piezoelectricity, and RSS. Important 2D semiconducting monolayers that deserve a special mention, include monolayers of buckled MgX (X = S, Se, Te), CdTe, ZnTe, Janus structures of transition metal trichalcogenides, Janus tellurene and 2D perovskites. van Der Waals multilayers are also built to design multifunctional materials via modulation of the stacking sequence and interlayer coupling between the constituent layers. External electric field, strain engineering and charge doping are perturbations mainly used to tune the spintronic properties. Finally, the contact properties of these monolayers are also crucial for their actual implementation in electronic devices. The nature of the contacts, Schottky/Ohmic, needs to be carefully examined first as it controls the device's performance. In this regard, the rare occurrence of Ohmic contact in graphene/MgS van der Waals hetero bilayer has been presented in this review article.
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Affiliation(s)
- Fathima Is
- Institute of Nano Science and Technology, Knowledge City, Sector 81, Mohali, Punjab 140306, India
| | - Manish Kumar Mohanta
- Institute of Nano Science and Technology, Knowledge City, Sector 81, Mohali, Punjab 140306, India
| | - Abir De Sarkar
- Institute of Nano Science and Technology, Knowledge City, Sector 81, Mohali, Punjab 140306, India
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Wang Q, Song Z, Tao J, Jin H, Li S, Wang Y, Liu X, Zhang L. Interface contact and modulated electronic properties by in-plain strains in a graphene-MoS 2 heterostructure. RSC Adv 2023; 13:2903-2911. [PMID: 36756432 PMCID: PMC9850458 DOI: 10.1039/d2ra07949f] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 12/13/2022] [Accepted: 01/10/2023] [Indexed: 01/21/2023] Open
Abstract
Designing a specific heterojunction by assembling suitable two-dimensional (2D) semiconductors has shown significant potential in next-generation micro-nano electronic devices. In this paper, we study the structural and electronic properties of graphene-MoS2 (Gr-MoS2) heterostructures with in-plain biaxial strain using density functional theory. It is found that the interaction between graphene and monolayer MoS2 is characterized by a weak van der Waals interlayer coupling with the stable layer spacing of 3.39 Å and binding energy of 0.35 J m-2. In the presence of MoS2, the linear bands on the Dirac cone of graphene are slightly split. A tiny band gap about 1.2 meV opens in the Gr-MoS2 heterojunction due to the breaking of sublattice symmetry, and it could be effectively modulated by strain. Furthermore, an n-type Schottky contact is formed at the Gr-MoS2 interface with a Schottky barrier height of 0.33 eV, which can be effectively modulated by in-plane strain. Especially, an n-type ohmic contact is obtained when 6% tensile strain is imposed. The appearance of the non-zero band gap in graphene has opened up new possibilities for its application and the ohmic contact predicts the Gr-MoS2 van der Waals heterojunction nanocomposite as a competitive candidate in next-generation optoelectronics and Schottky devices.
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Affiliation(s)
- Qian Wang
- School of Physics and Mechanical & Electrical Engineering, Hubei Engineering Technology Research Center of Environmental Purification Materials, Hubei University of Education Wuhan 430000 China
| | - Zhenjun Song
- School of Parmaceutical and Materials Engineering, Taizhou University Taizhou 318000 PR China
| | - Junhui Tao
- School of Physics and Mechanical & Electrical Engineering, Hubei Engineering Technology Research Center of Environmental Purification Materials, Hubei University of Education Wuhan 430000 China
| | - Haiqin Jin
- School of Physics and Mechanical & Electrical Engineering, Hubei Engineering Technology Research Center of Environmental Purification Materials, Hubei University of Education Wuhan 430000 China
| | - Sha Li
- School of Physics and Mechanical & Electrical Engineering, Hubei Engineering Technology Research Center of Environmental Purification Materials, Hubei University of Education Wuhan 430000 China
| | - Yuran Wang
- School of Physics and Mechanical & Electrical Engineering, Hubei Engineering Technology Research Center of Environmental Purification Materials, Hubei University of Education Wuhan 430000 China
| | - Xuejuan Liu
- College of Physics and Engineering, Chengdu Normal University Chengdu 611130 China
| | - Lin Zhang
- School of Physics and Mechanical & Electrical Engineering, Hubei Engineering Technology Research Center of Environmental Purification Materials, Hubei University of Education Wuhan 430000 China
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Guo H, Lang X, Tian X, Jiang W, Wang G. Tunable Schottky barrier in Janus- XGa 2Y/Graphene ( X/ Y = S, Se, Te; X≠ Y) van der Waals heterostructures. NANOTECHNOLOGY 2022; 33:425704. [PMID: 35817003 DOI: 10.1088/1361-6528/ac800d] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/30/2022] [Accepted: 07/11/2022] [Indexed: 06/15/2023]
Abstract
Two-dimensional (2D) Janus materials have attracted significant attention due to their asymmetrical structures and unique electronic properties. In this work, by using the first-principles calculation based on density functional theory, we systematically investigate the electronic properties of 6 types of Janus-XGa2Y/Graphene van der Waals heterostructures (vdWHs). The results show that the Janus-XGa2Y/Graphene vdWHs are connected by weak interlayer vdW forces and can form n-type Schottky contact, p-type Schottky contact or Ohmic contact when the spin-orbit coupling (SOC) is not considered. However, when considering SOC, only the SeGa2S/G and G/SeGa2S vdWHs show n-type Schottky contact, and other vdWHs show Ohmic contacts. In addition, the Schottky barriers and contact types of SeGa2S/Graphene and Graphene/SeGa2S vdWHs can be effectively modulated by interlayer distance and biaxial strain. They can be transformed from intrinsic n-type Schottky contact to p-type Schottky contact when the interlayer distances are smaller than 2.65 Å and 2.90 Å, respectively. They can also be transformed to Ohmic contact by applying external biaxial strain. Our work can provide useful guidelines for designing Schottky nanodiodes, field effect transistors or other low-resistance nanodevices based on the 2D vdWHs.
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Affiliation(s)
- Hao Guo
- School of Urban Construction, Hebei Normal University of Science & Technology, Qinhuangdao 066004, People's Republic of China
- Material Simulation and Computing Laboratory, Department of Physics, Hebei Normal University of Science & Technology, Qinghuangdao 066004, People's Republic of China
| | - Xiufeng Lang
- Material Simulation and Computing Laboratory, Department of Physics, Hebei Normal University of Science & Technology, Qinghuangdao 066004, People's Republic of China
| | - Xiaobao Tian
- Department of Mechanics and Engineering, Sichuan University, Chengdu 610065, People's Republic of China
| | - Wentao Jiang
- Department of Mechanics and Engineering, Sichuan University, Chengdu 610065, People's Republic of China
| | - Guangzhao Wang
- Key Laboratory of Micro Nano Optoelectronic Devices and Intelligent Perception Systems, Key Laboratory of Extraordinary Bond Engineering and Advanced Materials Technology of Chongqing, School of Electronic Information Engineering, Yangtze Normal University, Chongqing 408100, People's Republic of China
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Šolajić A, Pešić J. Novel wide spectrum light absorber heterostructures based on hBN/In(Ga)Te. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2022; 34:345301. [PMID: 35709717 DOI: 10.1088/1361-648x/ac7996] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/20/2022] [Accepted: 06/16/2022] [Indexed: 06/15/2023]
Abstract
Two-dimensional group III monochalcogenides have recently attracted quite attention for their wide spectrum of optical and electric properties, being promising candidates for optoelectronic and novel electrical applications. However, in their pristine form they are extremely sensitive and vulnerable to oxygen in air and need good mechanical protection and passivization. In this work we modeled and studied two newly designed van der Waals (vdW) heterostructures based on layer of hexagonal boron nitride (hBN) and GaTe or InTe monolayer. Using density functional theory, we investigate electronic and optical properties of those structures. Their moderate band gap and excellent absorption coefficient makes them ideal candidate for broad spectrum absorbers, covering all from part of IR to far UV spectrum, with particularly good absorption of UV light. The hBN layer, which can be beneficial for protection of sensitive GaTe and InTe, does not only preserve their optical properties but also enhances it by changing the band gap width and enhancing absorption in low-energy part of spectrum. Calculated binding energies prove that all three stacking types are possible to obtain experimentally, with H-top as the preferable stacking position. Moreover, it is shown that type of stacking does not affect any relevant properties and bandstructure does not reveal any significant change for each stacking type.
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Affiliation(s)
- A Šolajić
- Center for Solid State Physics and New Materials, Institute of Physics Belgrade, University of Belgrade, Pregrevica 118, 11080 Belgrade, Serbia
| | - J Pešić
- Center for Solid State Physics and New Materials, Institute of Physics Belgrade, University of Belgrade, Pregrevica 118, 11080 Belgrade, Serbia
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Li J, Guo X, Cai B, Hu Y, Liu G, Guo T, Song X, Zeng H, Zhang S. Interfacial electronic properties of metal/CsSnBr 3heterojunctions. NANOTECHNOLOGY 2022; 33:345706. [PMID: 35584638 DOI: 10.1088/1361-6528/ac70e6] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/06/2022] [Accepted: 05/17/2022] [Indexed: 06/15/2023]
Abstract
All-inorganic lead-free perovskite CsSnBr3, has been proved good stability and optoelectronic properties in theory and experiment. However, the interfacial electronic properties of metal/CsSnBr3are still unclear in electronic devices. Herein, we systematically investigate the interfacial properties of metal electrodes (Al, Ag and Au) and CsSnBr3with different atomic terminals (SnBr2-T and CsBr-T) through the first-principles calculation. SnBr2-T and CsBr-T have various contact types and Schottky barriers due to their different interaction strengths with metals. In particular, the moderate interlayer coupling strength with Al leads to the ultra-low Schottky barrier and tunneling barrier, which makes Al possess the best contact performance among the studied metals. Furthermore, the external electric field can be effective in regulating the Schottky barrier and realizing the Ohmic contact. These findings provide useful guidance for the design of perovskite-based nanoelectronic devices with high performance.
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Affiliation(s)
- Jing Li
- MIIT Key Laboratory of Advanced Display Materials and Devices, School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing 210094, People's Republic of China
| | - Xinwei Guo
- MIIT Key Laboratory of Advanced Display Materials and Devices, School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing 210094, People's Republic of China
| | - Bo Cai
- MIIT Key Laboratory of Advanced Display Materials and Devices, School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing 210094, People's Republic of China
| | - Yang Hu
- MIIT Key Laboratory of Advanced Display Materials and Devices, School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing 210094, People's Republic of China
| | - Gaoyu Liu
- MIIT Key Laboratory of Advanced Display Materials and Devices, School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing 210094, People's Republic of China
| | - Tingting Guo
- MIIT Key Laboratory of Advanced Display Materials and Devices, School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing 210094, People's Republic of China
| | - Xiufeng Song
- MIIT Key Laboratory of Advanced Display Materials and Devices, School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing 210094, People's Republic of China
| | - Haibo Zeng
- MIIT Key Laboratory of Advanced Display Materials and Devices, School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing 210094, People's Republic of China
| | - Shengli Zhang
- MIIT Key Laboratory of Advanced Display Materials and Devices, School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing 210094, People's Republic of China
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Caglayan R, Guler HE, Mogulkoc Y. An analysis of Schottky barrier in silicene/Ga 2SeS heterostructures by employing electric field and strain. Phys Chem Chem Phys 2022; 24:10210-10221. [PMID: 35420606 DOI: 10.1039/d2cp00228k] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/06/2023]
Abstract
Two-dimensional materials are leading the way in nanodevice applications thanks to their various advantages. Although two-dimensional materials show promise for many applications, they have certain limitations. In the last decade, the increasing demand for the applications of novel two-dimensional materials has accelerated heterostructure studies in this field. Hence, restoring the combination of two-dimensional heterostructured materials has been reported. In this paper, we show that the effect of the external electric field and biaxial strain on the silicene/Ga2SeS heterostructure has a critical impact on the tuning of the Schottky barrier height. The findings such as the variation of the electronic band gap, interlayer charge transfer, total dipole moment, and n-type/p-type Schottky barrier transitions of the silicene/Ga2SeS heterostructure under external effects imply that the device performance can be adjusted with Janus 2D materials.
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Affiliation(s)
- R Caglayan
- Department of Physics, Faculty of Science, Ankara University, 06100, Ankara, Turkey
| | - H E Guler
- Department of Physics, Faculty of Science, Ankara University, 06100, Ankara, Turkey
| | - Y Mogulkoc
- Department of Physics Engineering, Faculty of Engineering, Ankara University, 06100, Ankara, Turkey.
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Ju W, Wang D, Zhou Q, Kang D, Li T, Hu G, Li H. Interface dependence of electrical contact and graphene doping in graphene/XPtY (X, Y = S, Se, and Te) heterostructures. Phys Chem Chem Phys 2021; 23:19297-19307. [PMID: 34524280 DOI: 10.1039/d1cp01292d] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
The electrical contact and graphene (Gr) doping for Gr/XPtY (X, Y = S, Se, and Te) van der Waals (vdW) heterostructures are studied by using first-principles methods. The intrinsic electronic properties of Gr and PtXY are preserved due to the weak vdW interactions. We find that the types of interfacial electrical contact and Gr doping are closely related to the interface chalcogen atoms. The n-type Ohmic contact is formed in the Gr/SPtY (Y = S, Se, and Te) systems. The n-type and p-type Schottky contacts are realized in the Gr/SePtY and Gr/TePtY systems, respectively. The physical mechanism of different contact types can be analyzed based on the charge transfer between the Gr and XPtY layers. For all the heterostructures, the contact type and Schottky barrier height can be effectively modulated by the external electric field and interlayer coupling. The Gr doping type and charge-carrier concentration are also investigated. The p-doping, p-doping, and n-doping are obtained in Gr for the Gr/SPtY, Gr/SePtY, and Gr/TePtY systems, respectively. The highest carrier concentration of the Gr layer can reach 1.69 × 1013 cm-2 for the Gr/TePtTe system. The results indicate that Gr/XPtY heterostructures are potential candidates for improving the performance of high-efficiency nano electronic devices.
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Affiliation(s)
- Weiwei Ju
- College of Physics and Engineering, Henan University of Science and Technology, Luoyang 471023, China. .,Provincial and Ministerial Co-construction of Collaborative Innovation Center for Non-ferrous Metal New Materials and Advanced Processing Technology, Luoyang 471023, China
| | - Donghui Wang
- College of Physics and Engineering, Henan University of Science and Technology, Luoyang 471023, China.
| | - Qingxiao Zhou
- College of Physics and Engineering, Henan University of Science and Technology, Luoyang 471023, China.
| | - Dawei Kang
- College of Physics and Engineering, Henan University of Science and Technology, Luoyang 471023, China.
| | - Tongwei Li
- College of Physics and Engineering, Henan University of Science and Technology, Luoyang 471023, China.
| | - Guangxiong Hu
- College of Physics and Engineering, Henan University of Science and Technology, Luoyang 471023, China.
| | - Haisheng Li
- College of Physics and Engineering, Henan University of Science and Technology, Luoyang 471023, China.
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Liu C, Yuan Y, Zhang X, Su J, Song X, Ling H, Liao Y, Zhang H, Zheng Y, Li J. Ta Doping Effect on Structural and Optical Properties of InTe Thin Films. NANOMATERIALS 2020; 10:nano10091887. [PMID: 32967127 PMCID: PMC7558691 DOI: 10.3390/nano10091887] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 08/19/2020] [Revised: 09/16/2020] [Accepted: 09/17/2020] [Indexed: 12/02/2022]
Abstract
The objective of this work was to study the influence of Ta doping on the structural, transmittance properties, linear absorption parameter, and nonlinear absorption properties of InTe thin films. The as-deposited samples with different Ta doping concentrations were prepared by a magnetron co-sputtering technique and then annealed in nitrogen atmosphere. Structural investigations by X-ray diffraction revealed the tetragonal structure of InTe samples and that the crystallinity decreases with increasing Ta doping concentration. Further structural analysis by Raman spectra also showed good agreement with X-ray diffraction results. The Ta doping concentration and sample thickness determined by energy-dispersive X-ray spectroscopy and scanning electron microscopy increased as Ta dopant increased. In addition, X-ray photoelectron spectroscopic was carried out to analyze the chemical states of the elements. UV–VIS–NIR transmittance spectra were applied to study the transmittance properties and calculate the linear absorption coefficient. Due to Burstein–Moss effect, the absorption edge moved to shorter wavelengths. Meanwhile, the values of band gap were found to increase from 1.71 ± 0.02 eV to 1.85 ± 0.01 eV with the increase of Ta doping concentration. By performing an open aperture Z-scan technique, we found that all Ta-doped InTe samples exhibited two-photon absorption behaviors. The nonlinear optical absorption parameters, such as modulation depth, two-photon absorption coefficient, and two-photon absorption cross-section, decrease with increasing Ta concentration, whereas the damage threshold increases from 176 ± 0.5 GW/cm2 to 242 ± 0.5 GW/cm2. These novel properties show the potential for applications in traditional optoelectronic devices and optical limiters.
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Affiliation(s)
- Chunmin Liu
- Department of Optical Science and Engineering, Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Fudan University, Shanghai 200433, China; (C.L.); (Y.Y.); (X.Z.); (J.S.); (X.S.); (H.L.); (Y.L.); (H.Z.); (Y.Z.)
| | - Yafei Yuan
- Department of Optical Science and Engineering, Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Fudan University, Shanghai 200433, China; (C.L.); (Y.Y.); (X.Z.); (J.S.); (X.S.); (H.L.); (Y.L.); (H.Z.); (Y.Z.)
- Department of Electronic Engineering, Center for Intelligent Medical Electronics, Fudan University, Shanghai 200433, China
| | - Xintong Zhang
- Department of Optical Science and Engineering, Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Fudan University, Shanghai 200433, China; (C.L.); (Y.Y.); (X.Z.); (J.S.); (X.S.); (H.L.); (Y.L.); (H.Z.); (Y.Z.)
| | - Jing Su
- Department of Optical Science and Engineering, Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Fudan University, Shanghai 200433, China; (C.L.); (Y.Y.); (X.Z.); (J.S.); (X.S.); (H.L.); (Y.L.); (H.Z.); (Y.Z.)
| | - Xiaoxiao Song
- Department of Optical Science and Engineering, Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Fudan University, Shanghai 200433, China; (C.L.); (Y.Y.); (X.Z.); (J.S.); (X.S.); (H.L.); (Y.L.); (H.Z.); (Y.Z.)
| | - Hang Ling
- Department of Optical Science and Engineering, Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Fudan University, Shanghai 200433, China; (C.L.); (Y.Y.); (X.Z.); (J.S.); (X.S.); (H.L.); (Y.L.); (H.Z.); (Y.Z.)
| | - Yuanjie Liao
- Department of Optical Science and Engineering, Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Fudan University, Shanghai 200433, China; (C.L.); (Y.Y.); (X.Z.); (J.S.); (X.S.); (H.L.); (Y.L.); (H.Z.); (Y.Z.)
| | - Hao Zhang
- Department of Optical Science and Engineering, Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Fudan University, Shanghai 200433, China; (C.L.); (Y.Y.); (X.Z.); (J.S.); (X.S.); (H.L.); (Y.L.); (H.Z.); (Y.Z.)
| | - Yuxiang Zheng
- Department of Optical Science and Engineering, Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Fudan University, Shanghai 200433, China; (C.L.); (Y.Y.); (X.Z.); (J.S.); (X.S.); (H.L.); (Y.L.); (H.Z.); (Y.Z.)
| | - Jing Li
- Department of Optical Science and Engineering, Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Fudan University, Shanghai 200433, China; (C.L.); (Y.Y.); (X.Z.); (J.S.); (X.S.); (H.L.); (Y.L.); (H.Z.); (Y.Z.)
- Correspondence:
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