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Chiodini S, Venturi G, Kerfoot J, Zhang J, Alexeev EM, Taniguchi T, Watanabe K, Ferrari AC, Ambrosio A. Electromechanical Response of Saddle Points in Twisted hBN Moiré Superlattices. ACS NANO 2025; 19:16297-16306. [PMID: 40268288 PMCID: PMC12060643 DOI: 10.1021/acsnano.4c12315] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 09/03/2024] [Revised: 03/18/2025] [Accepted: 03/19/2025] [Indexed: 04/25/2025]
Abstract
In twisted layered materials (t-LMs), an interlayer rotation can break inversion symmetry and create an interfacial array of staggered out-of-plane polarization due to AB/BA stacking registries. This symmetry breaking can also trigger the formation of edge in-plane polarizations localized along the perimeter of AB/BA regions (i.e., saddle point domains). However, a comprehensive experimental investigation of these features is still lacking. Here, we use piezo force microscopy to probe the electromechanical behavior of twisted hexagonal boron nitride (t-hBN). For parallel stacking alignment of t-hBN, we reveal very narrow (width ∼ 10 nm) saddle point in-plane polarizations, which we also measure in the antiparallel configuration. These localized polarizations can still be found on a multiply stacked t-hBN structure, determining the formation of a double moiré. Our findings imply that polarizations in t-hBN do not only point in the out-of-plane direction but also show an in-plane component, giving rise to a much more complex 3D polarization field.
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Affiliation(s)
- Stefano Chiodini
- Center
for Nano Science and Technology, Fondazione Istituto Italiano di Tecnologia, Via Rubattino 81, 20134 Milan, Italy
| | - Giacomo Venturi
- Center
for Nano Science and Technology, Fondazione Istituto Italiano di Tecnologia, Via Rubattino 81, 20134 Milan, Italy
| | - James Kerfoot
- Cambridge
Graphene Centre, University of Cambridge, 9, JJ Thomson Avenue, CB3 0FA Cambridge, United Kingdom
| | - Jincan Zhang
- Cambridge
Graphene Centre, University of Cambridge, 9, JJ Thomson Avenue, CB3 0FA Cambridge, United Kingdom
| | - Evgeny M. Alexeev
- Cambridge
Graphene Centre, University of Cambridge, 9, JJ Thomson Avenue, CB3 0FA Cambridge, United Kingdom
| | - Takashi Taniguchi
- Center
for Materials Nanoarchitectonics, National Institute for Materials
Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Kenji Watanabe
- Research
Center for Functional Materials, National Institute for Materials
Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Andrea C. Ferrari
- Cambridge
Graphene Centre, University of Cambridge, 9, JJ Thomson Avenue, CB3 0FA Cambridge, United Kingdom
| | - Antonio Ambrosio
- Center
for Nano Science and Technology, Fondazione Istituto Italiano di Tecnologia, Via Rubattino 81, 20134 Milan, Italy
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Summonte C, Borgatti F, Albonetti C. Thickness-Dependent Relative Dielectric Constant of Organic Ultrathin Films. Chemphyschem 2024; 25:e202400580. [PMID: 39016162 DOI: 10.1002/cphc.202400580] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/23/2024] [Revised: 07/15/2024] [Accepted: 07/16/2024] [Indexed: 07/18/2024]
Abstract
In formulas employed for analysis of organic electronic devices, the relative dielectric constant value of the semiconductor organic films is often assumed rather than measured, even though it is a fundamental parameter for a correct interpretation. This is particularly true for ultrathin films made of discrete molecular layers. In this work, Spectroscopy Ellipsometry and Scanning Capacitance Microscopy were used to study thin films made of N,N'-bis(n-octyl)-x:y,dicyanoperylene-3,4 : 9,10-bis(dicarboximide). The relative dielectric constant presents a non-monotonic trend with thickness: it is equal to 2.1 for one molecular layer, saturating at 3.2 for increasing thickness. This maximum value, equivalent to the bulk one, occurs when the coverage is in between the third to the fourth layer. In this range, the growth switches from a Frank-Van der Merwe (2D growth) to a Volmer-Weber mode (3D growth); in addition, the molecular configuration assumes a bent/distorted geometry with respect to the initial edge-on one. These results establish a morphological dependence of the dielectric constant, especially in the vicinity of the substrate interface, that disappears at a certain distance from it.
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Affiliation(s)
- Caterina Summonte
- Consiglio Nazionale delle Ricerche - Istituto per la Microelettronica e Microsistemi (CNR-IMM), Via Gobetti 101, 40129, Bologna, Italy
| | - Francesco Borgatti
- Consiglio Nazionale delle Ricerche - Istituto per lo Studio dei Materiali Nanostrutturati (CNR-ISMN), Via Gobetti 101, 40129, Bologna, Italy
| | - Cristiano Albonetti
- Consiglio Nazionale delle Ricerche - Istituto per lo Studio dei Materiali Nanostrutturati (CNR-ISMN), Via Gobetti 101, 40129, Bologna, Italy
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Della Ciana M, Kovtun A, Summonte C, Candini A, Cavalcoli D, Gentili D, Nipoti R, Albonetti C. Native Silicon Oxide Properties Determined by Doping. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2023; 39:12430-12451. [PMID: 37608587 DOI: 10.1021/acs.langmuir.3c01652] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 08/24/2023]
Abstract
The physico-chemical properties of native oxide layers, spontaneously forming on crystalline Si wafers in air, can be strictly correlated to the dopant type and doping level. In particular, our investigations focused on oxide layers formed upon air exposure in a clean room after Si wafer production, with dopant concentration levels from ≈1013 to ≈1019 cm-3. In order to determine these correlations, we studied the surface, the oxide bulk, and its interface with Si. The surface was investigated using the contact angle, thermal desorption, and atomic force microscopy measurements which provided information on surface energy, cleanliness, and morphology, respectively. Thickness was measured with ellipsometry and chemical composition with X-ray photoemission spectroscopy. Electrostatic charges within the oxide layer and at the Si interface were studied with Kelvin probe microscopy. Some properties such as thickness, showed an abrupt change, while others, including silanol concentration and Si intermediate-oxidation states, presented maxima at a critical doping concentration of ≈2.1 × 1015 cm-3. Additionally, two electrostatic contributions were found to originate from silanols present on the surface and the net charge distributed within the oxide layer. Lastly, surface roughness was also found to depend upon dopant concentration, showing a minimum at the same critical dopant concentration. These findings were reproduced for oxide layers regrown in a clean room after chemical etching of the native ones.
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Affiliation(s)
- Michele Della Ciana
- Consiglio Nazionale delle Ricerche - Istituto per lo Studio dei Materiali Nanostrutturati (CNR-ISMN), via P. Gobetti 101, 40129 Bologna, Italy
| | - Alessandro Kovtun
- Consiglio Nazionale delle Ricerche - Istituto per la Sintesi Organica e la Fotoreattività (CNR-ISOF), via P. Gobetti 101, 40129 Bologna, Italy
| | - Caterina Summonte
- Consiglio Nazionale delle Ricerche - Istituto per la Microelettronica e Microsistemi (CNR-IMM), via P. Gobetti 101, 40129 Bologna, Italy
| | - Andrea Candini
- Consiglio Nazionale delle Ricerche - Istituto per la Sintesi Organica e la Fotoreattività (CNR-ISOF), via P. Gobetti 101, 40129 Bologna, Italy
| | - Daniela Cavalcoli
- Department of Physics and Astronomy, University of Bologna, Viale Berti Pichat 6/2, 40127 Bologna, Italy
| | - Denis Gentili
- Consiglio Nazionale delle Ricerche - Istituto per lo Studio dei Materiali Nanostrutturati (CNR-ISMN), via P. Gobetti 101, 40129 Bologna, Italy
| | - Roberta Nipoti
- Consiglio Nazionale delle Ricerche - Istituto per la Microelettronica e Microsistemi (CNR-IMM), via P. Gobetti 101, 40129 Bologna, Italy
| | - Cristiano Albonetti
- Consiglio Nazionale delle Ricerche - Istituto per lo Studio dei Materiali Nanostrutturati (CNR-ISMN), via P. Gobetti 101, 40129 Bologna, Italy
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Kilpatrick JI, Kargin E, Rodriguez BJ. Comparing the performance of single and multifrequency Kelvin probe force microscopy techniques in air and water. BEILSTEIN JOURNAL OF NANOTECHNOLOGY 2022; 13:922-943. [PMID: 36161252 PMCID: PMC9490074 DOI: 10.3762/bjnano.13.82] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 05/09/2022] [Accepted: 08/04/2022] [Indexed: 06/16/2023]
Abstract
In this paper, we derive and present quantitative expressions governing the performance of single and multifrequency Kelvin probe force microscopy (KPFM) techniques in both air and water. Metrics such as minimum detectable contact potential difference, minimum required AC bias, and signal-to-noise ratio are compared and contrasted both off resonance and utilizing the first two eigenmodes of the cantilever. These comparisons allow the reader to quickly and quantitatively identify the parameters for the best performance for a given KPFM-based experiment in a given environment. Furthermore, we apply these performance metrics in the identification of KPFM-based modes that are most suitable for operation in liquid environments where bias application can lead to unwanted electrochemical reactions. We conclude that open-loop multifrequency KPFM modes operated with the first harmonic of the electrostatic response on the first eigenmode offer the best performance in liquid environments whilst needing the smallest AC bias for operation.
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Affiliation(s)
- Jason I Kilpatrick
- School of Physics and Conway Institute of Biomolecular and Biomedical Research, University College Dublin, Belfield, Dublin, D04 V1W8, Ireland
| | - Emrullah Kargin
- School of Physics and Conway Institute of Biomolecular and Biomedical Research, University College Dublin, Belfield, Dublin, D04 V1W8, Ireland
| | - Brian J Rodriguez
- School of Physics and Conway Institute of Biomolecular and Biomedical Research, University College Dublin, Belfield, Dublin, D04 V1W8, Ireland
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Scaini D, Biscarini F, Casalis L, Albonetti C. Substrate roughness influence on the order of nanografted Self-Assembled Monolayers. Chem Phys Lett 2022. [DOI: 10.1016/j.cplett.2022.139819] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/03/2022]
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Luo G, Zhang Q, Li M, Chen K, Zhou W, Luo Y, Li Z, Wang L, Zhao L, Teh KS, Jiang Z. A flexible electrostatic nanogenerator and self-powered capacitive sensor based on electrospun polystyrene mats and graphene oxide films. NANOTECHNOLOGY 2021; 32. [PMID: 34192681 DOI: 10.1088/1361-6528/ac1019] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/24/2021] [Accepted: 06/30/2021] [Indexed: 05/11/2023]
Abstract
Electrostatic nanogenerators or capacitive sensors that leverage electrostatic induction for power generation or sensing, has attracted significant interests due to their simple structure, ease of fabrication, and high device stability. However, in order for such devices to work, an additional power source or a post-charging process is necessary to activate the electrostatic effect. In this work, an electrostatic nanogenerator is fabricated using electrospun polystyrene (PS) mats and dip-coated graphene oxide (GO) films as the self-charged components. The electret performances of the PS mats and GO films are characterized via the electrostatic force microscopy phase shift and surface potential measurements. With a multilayer device structure that consists of top electrodes/GO films/spacer/electrospun PS mats/bottom electrodes, the resultant device acts as an electrostatic generator that operates in the noncontact mode. The nanogenerator can output a peak voltage of ca. 6.41 V and a peak current of ca. 6.57 nA at a rate of 1 Hz of mechanical compression, and with no attenuation of electrical outputs even after 50 000 cycles over a 13 h period. Furthermore, this as-prepared device is also capable of serving as a self-powered capacitive sensor for detection of tiny mechanical impacts and measurement of human finger bending. This results of this work provides a new avenue to easily fabricate electrostatic nanogenerators with high durability and self-powered capacitive sensors for the detection of small impacts.
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Affiliation(s)
- Guoxi Luo
- State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
- School of Mechanical Engineering, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
- Xi'an Jiaotong University, Suzhou Institute, Suzhou, Jiangsu 215123, People's Republic of China
| | - Qiankun Zhang
- State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
- School of Mechanical Engineering, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
| | - Min Li
- State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
- School of Mechanical Engineering, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
| | - Ke Chen
- State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
- School of Mechanical Engineering, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
| | - Wenke Zhou
- State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
- School of Mechanical Engineering, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
| | - Yunyun Luo
- State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
- School of Mechanical Engineering, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
| | - Zhikang Li
- State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
- School of Mechanical Engineering, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
| | - Lu Wang
- State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
- School of Mechanical Engineering, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
| | - Libo Zhao
- State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
- School of Mechanical Engineering, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
- Xi'an Jiaotong University, Suzhou Institute, Suzhou, Jiangsu 215123, People's Republic of China
| | - Kwok Siong Teh
- School of Engineering, San Francisco State University, San Francisco, CA 94132, United States of America
| | - Zhuangde Jiang
- State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
- School of Mechanical Engineering, Xi'an Jiaotong University, Xi'an, Shannxi 710049, People's Republic of China
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Synthetic Data in Quantitative Scanning Probe Microscopy. NANOMATERIALS 2021; 11:nano11071746. [PMID: 34361132 PMCID: PMC8308173 DOI: 10.3390/nano11071746] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 05/06/2021] [Revised: 06/28/2021] [Accepted: 06/29/2021] [Indexed: 12/28/2022]
Abstract
Synthetic data are of increasing importance in nanometrology. They can be used for development of data processing methods, analysis of uncertainties and estimation of various measurement artefacts. In this paper we review methods used for their generation and the applications of synthetic data in scanning probe microscopy, focusing on their principles, performance, and applicability. We illustrate the benefits of using synthetic data on different tasks related to development of better scanning approaches and related to estimation of reliability of data processing methods. We demonstrate how the synthetic data can be used to analyse systematic errors that are common to scanning probe microscopy methods, either related to the measurement principle or to the typical data processing paths.
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8
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Albonetti C, ValdrÈ G. Preface to StSPM2019EV special issue. J Microsc 2021; 280:181-182. [PMID: 33180974 DOI: 10.1111/jmi.12966] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
Affiliation(s)
- C Albonetti
- Institute for the Study on Nanostructured Materials ISMN, National Research Council of Italy (CNR), Bologna, Italy
| | - G ValdrÈ
- Dipartimento di Scienze Biologiche, Geologiche e Ambientali, Università di Bologna 'Alma Mater Studiorum' Piazza di Porta San Donato 1, Bologna, Italy.,Centro di Ricerca Interdisciplinare di Biomineralogia, Cristallografia e Biomateriali, Università di Bologna 'Alma Mater Studiorum' Piazza di Porta San Donato 1, Bologna, Italy
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