Tip-Based Nanofabrication for Scalable Manufacturing

Tip-based Lithography with a Sacrificial Layer

The fabrication of a highly controlled gold (Au) nanohole (NH) array via tip-based lithography is improved by incorporating a sacrificial layer-a tip-crash buffer layer. This inclusion mitigates scratches during the nano-indentation process by employing a 300 nm thick poly(methyl methacrylate) layer as a sacrificial layer on top of the Au film. Such a precaution ensures minimal scratches on the Au film, facilitating the creation of sub-50 nm Au NHs with a 15 nm gap between the Au NHs. The precision of this method exceeds that of fabricating Au NHs without a sacrificial layer. Demonstrating its versatility, this Au NH array is utilized in two distinct applications: as a dry etching mask to form a molybdenum disulfide hole array and as a catalyst in metal-assisted chemical etching, resulting in conical-shaped silicon nanostructures. Additionally, a significant electric field is generated when Au nanoparticles (NPs) are placed within the Au NHs. This effect arises from coupling electromagnetic waves, concentrated by the Au NHs and amplified by the Au NPs. A notable result of this configuration is the enhancement factor of surface-enhanced Raman scattering, which is an order of magnitude greater than that observed with just Au NHs and Au NPs alone.

Alkene-Catalyzed Rapid Layer-by-Layer Thinning of Black Phosphorus for Precise Nanomanufacturing

Black phosphorus (BP) is a promising material for electronic and optoelectronic applications. However, it is still challenging to obtain geometrically well-defined BP with desirable thickness. The method involving rapid BP surface reaction via alkene-catalyzed oxidation and easy removal of reactants by a mechanical effect was proposed to achieve the precise layer-by-layer thinning and real-time thickness monitoring of BP for nanopatterning with high spatial resolution based on mechanical scanning probe nanolithography. The enhanced electron affinity of oxygen with the assistance of a carbon-carbon double bond (C═C) in the alkene was demonstrated by density functional theory calculations, shortening the BP surface oxidation period by 99%, which provides access for the rapid thinning. The few-layer BP nanoflake with nested structure and arbitrary thickness on various substrates and the nanopatterned heterojunctions (BP/graphene and BP/hexagonal boron nitride) can be precisely fabricated by the adjustment of scanning number under a small load. This thinning technology was efficient and universal, which could be used to fabricate a BP field-effect transistor with a thinned channel to enhance the capability for current modulation, showing great potential applications for designing high-performance nanodevices.

Printing Technologies as an Emerging Approach in Gas Sensors: Survey of Literature

Herein, we review printing technologies which are commonly approbated at recent time in the course of fabricating gas sensors and multisensor arrays, mainly of chemiresistive type. The most important characteristics of the receptor materials, which need to be addressed in order to achieve a high efficiency of chemisensor devices, are considered. The printing technologies are comparatively analyzed with regard to, (i) the rheological properties of the employed inks representing both reagent solutions or organometallic precursors and disperse systems, (ii) the printing speed and resolution, and (iii) the thickness of the formed coatings to highlight benefits and drawbacks of the methods. Particular attention is given to protocols suitable for manufacturing single miniature devices with unique characteristics under a large-scale production of gas sensors where the receptor materials could be rather quickly tuned to modify their geometry and morphology. We address the most convenient approaches to the rapid printing single-crystal multisensor arrays at lab-on-chip paradigm with sufficiently high resolution, employing receptor layers with various chemical composition which could replace in nearest future the single-sensor units for advancing a selectivity.

"Writing biochips": high-resolution droplet-to-droplet manufacturing of analytical platforms

The development of high-resolution molecular printing allows the engineering of analytical platforms enabling applications at the interface between chemistry and biology, i.e. in biosensing, electronics, single-cell biology, and point-of-care diagnostics. Their successful implementation stems from the combination of large area printing at resolutions from sub-100 nm up to macroscale, whilst controlling the composition and volume of the ink, and reconfiguring the deposition features in due course. Similar to handwriting pens, the engineering of continuous writing systems tackles the issue of the tedious ink replenishment between different printing steps. To this aim, this review article provides an unprecedented analysis of the latest continuous printing methods for bioanalytical chemistry, focusing on ink deposition systems based on specific sets of technologies that have been developed to this aim, namely nanofountain probes, microcantilever spotting, capillary-based polymer pens and continuous 3D printing. Each approach will be discussed revealing the most important applications in the fields of biosensors, lab-on-chips and diagnostics.

Pulse-Atomic Force Lithography: A Powerful Nanofabrication Technique to Fabricate Constant and Varying-Depth Nanostructures

The widespread use of nanotechnology in different application fields, resulting in the integration of nanostructures in a plethora of devices, has addressed the research toward novel and easy-to-setup nanofabrication techniques to realize nanostructures with high spatial resolution and reproducibility. Owing to countless applications in molecular electronics, data storage, nanoelectromechanical, and systems for the Internet of Things, in recent decades, the scientific community has focused on developing methods suitable for nanopattern polymers. To this purpose, Atomic Force Microscopy-based nanolithographic techniques are effective methods that are relatively less complex and inexpensive than equally resolute and accurate techniques, such as Electron Beam lithography and Focused Ion Beam lithography. In this work, we propose an evolution of nanoindentation, named Pulse-Atomic Force Microscopy, to obtain continuous structures with a controlled depth profile, either constant or variable, on a polymer layer. Due to the modulation of the characteristics of voltage pulses fed to the AFM piezo-scanner and distance between nanoindentations, it was possible to indent sample surface with high spatial control and fabricate highly resolved 2.5D nanogrooves. That is the real strength of the proposed technique, as no other technique can achieve similar results in tailor-made graded nanogrooves without the need for additional manufacturing steps.

Ns-pulsewidth pulsed power supply by regulating electrical parameters for AFM nano EDM of nm-removal-resolution

Nano electro discharge machining (nano EDM), as a frontier processing method in the research stage of exploration, has an important application prospect in the machining of metal and alloy materials for achieving nanoscale removal resolution. A pulsed power supply used in nano EDM is expected to limit a single pulse energy to nJ order of magnitude for improving the removal resolution of single pulsed discharge even to nanoscale. One developing direction is to decrease pulsewidth of the pulsed power supply. Conventional pulsed power supplies hardly output a single pulse and continuous pulses with nanosecond (ns) pulsewidth, resulting in too large single pulsed energy ofμJ order of magnitude usually. In this research, a novel pulsed power supply is designed for realizing the ns-pulsewidth with controllable pulsewidth and peak voltage. The key novelty lies in a cascaded circuit with two triodes working in the state of ultra-fast avalanche conduction, where pF capacitors are applied to adjust the pulsewidth and pulsed energy precisely. Performance tests verified that a single pulse of 5 ns pulsewidth or continuous pulses up to 9 MHz can be outputted. Furthermore, nano EDM experiments of single pulsed discharge are carried out under the conditions of nanometer (nm) discharge gap and nm-tip tool electrode based on an atomic force microscope (AFM) system. The special results are achieved: a single pulsed energy can reach down to 1.75 nJ by outputting a pulsewidth of 10 ns, and a nano-EDM crater is only about 182 nm in diameter with regular shape and little recasting. Those results verify the possibility of AFM-tip-based nano EDM for machining nanostructures.

Thermal scanning probe lithography-a review

Fundamental aspects and state-of-the-art results of thermal scanning probe lithography (t-SPL) are reviewed here. t-SPL is an emerging direct-write nanolithography method with many unique properties which enable original or improved nano-patterning in application fields ranging from quantum technologies to material science. In particular, ultrafast and highly localized thermal processing of surfaces can be achieved through the sharp heated tip in t-SPL to generate high-resolution patterns. We investigate t-SPL as a means of generating three types of material interaction: removal, conversion, and addition. Each of these categories is illustrated with process parameters and application examples, as well as their respective opportunities and challenges. Our intention is to provide a knowledge base of t-SPL capabilities and current limitations and to guide nanoengineers to the best-fitting approach of t-SPL for their challenges in nanofabrication or material science. Many potential applications of nanoscale modifications with thermal probes still wait to be explored, in particular when one can utilize the inherently ultrahigh heating and cooling rates.

Visual Servo Control System of a Piezoelectric2-Degree-of-Freedom Nano-Stepping Motor

A nano-stepping motor can translate or rotate when its piezoelectric element pair is electrically driven in-phase or anti-phase. It offers millimeter-level stroke, sub-micron-level stepping size, and sub-nanometer-level scanning resolution. This article proposes a visual servo system to control the nano-stepping motor, since its stepping size is not consistent due to changing contact friction, using a custom built microscopic instrument and image recognition software. Three kinds of trajectories-straight lines, circles, and pentagrams-are performed successfully. The smallest straightness and roundness ever tested are 0.291 µm and 2.380 µm. Experimental results show that the proposed controller can effectively compensate for the error and precisely navigate the rotor along a desired trajectory.

Simulations of the effect of an oxide on contact area measurements from conductive atomic force microscopy

Nanoscale contact area in conductive atomic force microscopy can be determined by analyzing current flow using electron transport theories. However, it is recognized that native oxides on the conductive tip will reduce current flow, thus degrading the accuracy of the measured contact area. To quantify the adverse effect of an oxide on contact area measurements, we use molecular dynamics simulations of an oxide-coated platinum tip and a crystalline platinum substrate, where both the contact size and conductance can be inferred from the positions of atoms in the interface. We develop a method to approximate conductance based on the distance between atoms in platinum channels across the contact. Then, the contact area calculated from conductance using ballistic transport and tunneling theories is compared to that obtained using the known positions of atoms in the contact. The difference is small for very thin (<0.1 nm) or very thick (>1.0 nm) oxides, where ballistic transport and tunneling theories work well; however, the difference is significant for oxides between these limits, which is expected to be the case for platinum in many practical applications.

Charged particle single nanometre manufacturing

Following a brief historical summary of the way in which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the subject of a recently completed European Union Project entitled "Single Nanometre Manufacturing: Beyond CMOS". Scanning helium ion beam lithography has the advantages of virtually zero proximity effect, nanoscale patterning capability and high sensitivity in combination with a novel fullerene resist based on the sub-nanometre C₆₀ molecule. The shot noise-limited minimum linewidth achieved to date is 6 nm. The second technology, focused electron induced processing (FEBIP), uses a nozzle-dispensed precursor gas either to etch or to deposit patterns on the nanometre scale without the need for resist. The process has potential for high throughput enhancement using multiple electron beams and a system employing up to 196 beams is under development based on a commercial SEM platform. Among its potential applications is the manufacture of templates for nanoimprint lithography, NIL. This is also a target application for the third and final charged particle technology, viz. field emission electron scanning probe lithography, FE-eSPL. This has been developed out of scanning tunneling microscopy using lower-energy electrons (tens of electronvolts rather than the tens of kiloelectronvolts of the other techniques). It has the considerable advantage of being employed without the need for a vacuum system, in ambient air and is capable of sub-10 nm patterning using either developable resists or a self-developing mode applicable for many polymeric resists, which is preferred. Like FEBIP it is potentially capable of massive parallelization for applications requiring high throughput.

Manipulation of the Superhydrophobicity of Plasma-Etched Polymer Nanostructures

The manipulation of droplet mobility on a nanotextured surface by oxygen plasma is demonstrated by modulating the modes of hydrophobic coatings and controlling the hierarchy of nanostructures. The spin-coating of polytetrafluoroethylene (PTFE) allows for heterogeneous hydrophobization of the high-aspect-ratio nanostructures and provides the nanostructured surface with "sticky hydrophobicity", whereas the self-assembled monolayer coating of perfluorodecyltrichlorosilane (FDTS) results in homogeneous hydrophobization and "slippery superhydrophobicity". While the high droplet adhesion (stickiness) on a nanostructured surface with the spin-coating of PTFE is maintained, the droplet contact angle is enhanced by creating hierarchical nanostructures via the combination of oxygen plasma etching with laser interference lithography to achieve "sticky superhydrophobicity". Similarly, the droplet mobility on a slippery nanostructured surface with the self-assembled monolayer coating of FDTS is also enhanced by employing the hierarchical nanostructures to achieve "slippery superhydrophobicity" with modulated slipperiness.

Selective hierarchical patterning of silicon nanostructures via soft nanostencil lithography

It is challenging to hierarchically pattern high-aspect-ratio nanostructures on microstructures using conventional lithographic techniques, where photoresist (PR) film is not able to uniformly cover on the microstructures as the aspect ratio increases. Such non-uniformity causes poor definition of nanopatterns over the microstructures. Nanostencil lithography can provide an alternative means to hierarchically construct nanostructures on microstructures via direct deposition or plasma etching through a free-standing nanoporous membrane. In this work, we demonstrate the multiscale hierarchical fabrication of high-aspect-ratio nanostructures on microstructures of silicon using a free-standing nanostencil, which is a nanoporous membrane consisting of metal (Cr), PR, and anti-reflective coating. The nanostencil membrane is used as a deposition mask to define Cr nanodot patterns on the predefined silicon microstructures. Then, deep reactive ion etching is used to hierarchically create nanostructures on the microstructures using the Cr nanodots as an etch mask. With simple modification of the main fabrication processes, high-aspect-ratio nanopillars are selectively defined only on top of the microstructures, on bottom, or on both top and bottom.

Sub-10 nm patterning with DNA nanostructures: a short perspective

DNA is the hereditary material that contains our unique genetic code. Since the first demonstration of two-dimensional (2D) nanopatterns by using designed DNA origami ∼10 years ago, DNA has evolved into a novel technique for 2D and 3D nanopatterning. It is now being used as a template for the creation of sub-10 nm structures via either 'top-down' or 'bottom-up' approaches for various applications spanning from nanoelectronics, plasmonic sensing, and nanophotonics. This perspective starts with an histroric overview and discusses the current state-of-the-art in DNA nanolithography. Emphasis is put on the challenges and prospects of DNA nanolithography as the next generation nanomanufacturing technique.

Large-Area Patterning of Metal Nanostructures by Dip-Pen Nanodisplacement Lithography for Optical Applications

Au nanostructures are remarkably important in a wide variety of fields for decades. The fabrication of Au nanostructures typically requires time-consuming and expensive electron-beam lithography (EBL) that operates in vacuum. To address this challenge, this paper reports the development of massive dip-pen nanodisplacement lithography (DNL) as a desktop fabrication tool, which allows high-throughput and rational design of arbitrary Au nanopatterns in ambient condition. Large-area (1 cm² ) and uniform (<10% variation) Au nanostructures as small as 70 nm are readily fabricated, with a throughput 100-fold higher than that of conventional EBL. As a proof-of-concept of the applications in the opitcal field, we fabricate discrete Au nanorod arrays that show significant plasmonic resonance in the visible range, and interconnected Au nanomeshes that are used for transparent conductive electrode of solar cells.

The Rise of Scalable Micro/Nanopatterning

This is the golden age of scalable micro/nanopatterning, as these methods emerge as an answer to produce industrial-scale nano-objects with a focus on economical sustainability and reliability.[...].