Processive Pathways to Metastability in Block Copolymer Thin Films

Substrate Neutrality for Obtaining Block Copolymer Vertical Orientation

Nanopatterning methods utilizing block copolymer (BCP) self-assembly are attractive for semiconductor fabrication due to their molecular precision and high resolution. Grafted polymer brushes play a crucial role in providing a neutral surface conducive for the orientational control of BCPs. These brushes create a non-preferential substrate, allowing wetting of the distinct chemistries from each block of the BCP. This vertically aligns the BCP self-assembled lattice to create patterns that are useful for semiconductor nanofabrication. In this review, we aim to explore various methods used to tune the substrate and BCP interface toward a neutral template. This review takes a historical perspective on the polymer brush methods developed to achieve substrate neutrality. We divide the approaches into copolymer and blended homopolymer methods. Early attempts to obtain neutral substrates utilized end-grafted random copolymers that consisted of monomers from each block. This evolved into side-group-grafted chains, cross-linked mats, and block cooligomer brushes. Amidst the augmentation of the chain architecture, homopolymer blends were developed as a facile method where polymer chains with each chemistry were mixed and grafted onto the substrate. This was largely believed to be challenging due to the macrophase separation of the chemically incompatible chains. However, innovative methods such as sequential grafting and BCP compatibilizers were utilized to circumvent this problem. The advantages and challenges of each method are discussed in the context of neutrality and feasibility.

Revealing the Kinetic Phase Behavior of Block Copolymer Complexes Using Solvent Vapor Absorption-Desorption Isotherms

Controlling the self-assembled morphologies in block copolymers heavily depends on their molecular architecture and processing conditions. Solvent vapor annealing is a versatile processive pathway to obtain highly periodic self-assemblies from high chi (χ) block copolymers (BCPs) and supramolecular BCP complexes. Despite the importance of navigating the energy landscape, controlled solvent vapor annealing (SVA) has not been investigated in BCP complexes, partly due to its intricate multicomponent nature. We introduce characteristic absorption-desorption solvent vapor isotherms as an effective way to understand swelling behavior and follow the morphological evolution of the polystyrene-block-poly(4-vinylpyridine) block copolymer complexed with pentadecylphenol (PS-b-P4VP(PDP)). Using the sorption isotherms, we identify the glass transition points, polymer-solvent interaction parameters, and bulk modulus. These parameters indicate that complexation completely screens the polymer interchain interactions. Furthermore, we established that the sorption isotherm of the homopolymer blocks serves to deconvolute the intricacy of BCP complexes. We applied our findings by developing annealing pathways for grain coarsening while preventing macroscopic film dewetting under SVA. Here, grain coarsening obeyed a power law and the growth exponent revealed a kinetic transition point for rapid self-assembly. Overall, SVA-based sorption isotherms have emerged as a critical method for understanding and developing annealing pathways for BCP complexes.