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Wojtecki R, Ma J, Cordova I, Arellano N, Lionti K, Magbitang T, Pattison TG, Zhao X, Delenia E, Lanzillo N, Hess AE, Nathel NF, Bui H, Rettner C, Wallraff G, Naulleau P. Additive Lithography-Organic Monolayer Patterning Coupled with an Area-Selective Deposition. ACS APPLIED MATERIALS & INTERFACES 2021; 13:9081-9090. [PMID: 33471496 DOI: 10.1021/acsami.0c16817] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
The combination of area-selective deposition (ASD) with a patternable organic monolayer provides a versatile additive lithography platform, enabling the generation of a variety of nanoscale feature geometries. Stearate hydroxamic acid self-assembled monolayers (SAMs) were patterned with extreme ultraviolet (λ = 13.5 nm) or electron beam irradiation and developed with ASD to achieve line space patterns as small as 50 nm. Density functional theory was employed to aid in the synthesis of hydroxamic acid derivatives with optimized packing density to enhance the imaging contrast and improve dose sensitivity. Near-edge X-ray absorption fine structure spectroscopy and infrared spectroscopy reveal that the imaging mechanism is based on improved deposition inhibition provided by the cross-linking of the SAM to produce a more effective barrier during a subsequent deposition step. With patterned substrates composed of coplanar copper lines and silicon spacers, hydroxamic acids selectively formed monolayers on the metal portions and could undergo a pattern-wise exposure followed by ASD in the first combination of a patternable monolayer with ASD. This material system presents an additional capability compared to traditional ASD approaches that generally reflect a starting patterned surface. Furthermore, this bottoms-up additive approach to lithography may be a viable alternative to subtractive nanoscale feature generation.
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Affiliation(s)
- Rudy Wojtecki
- International Business Machines-Almaden Research Center, 650 Harry Road, San Jose, California 95110, United States
| | - Jonathan Ma
- Center for X-ray Optics, Materials Science Division, Lawrence Berkeley National Laboratory, 1 Cyclotron Rd., Berkeley, California 94720, United States
| | - Isvar Cordova
- Center for X-ray Optics, Materials Science Division, Lawrence Berkeley National Laboratory, 1 Cyclotron Rd., Berkeley, California 94720, United States
| | - Noel Arellano
- International Business Machines-Almaden Research Center, 650 Harry Road, San Jose, California 95110, United States
| | - Krystelle Lionti
- International Business Machines-Almaden Research Center, 650 Harry Road, San Jose, California 95110, United States
| | - Teddie Magbitang
- International Business Machines-Almaden Research Center, 650 Harry Road, San Jose, California 95110, United States
| | - Thomas G Pattison
- Polymer Science Group, Department of Chemical Engineering, The University of Melbourne, Parkville, Victoria 3010, Australia
| | - Xiao Zhao
- Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States
- Department of Materials Science and Engineering, University of California at Berkeley, Berkeley, California 94720, United States
| | - Eugene Delenia
- International Business Machines-Almaden Research Center, 650 Harry Road, San Jose, California 95110, United States
| | - Nicholas Lanzillo
- International Business Machines-Semiconductor Technology Research, 257 Fuller Road, Albany, New York 12203, United States
| | - Alexander E Hess
- International Business Machines-Almaden Research Center, 650 Harry Road, San Jose, California 95110, United States
| | - Noah Fine Nathel
- International Business Machines-Almaden Research Center, 650 Harry Road, San Jose, California 95110, United States
| | - Holt Bui
- International Business Machines-Almaden Research Center, 650 Harry Road, San Jose, California 95110, United States
| | - Charles Rettner
- International Business Machines-Almaden Research Center, 650 Harry Road, San Jose, California 95110, United States
| | - Gregory Wallraff
- International Business Machines-Almaden Research Center, 650 Harry Road, San Jose, California 95110, United States
| | - Patrick Naulleau
- Center for X-ray Optics, Materials Science Division, Lawrence Berkeley National Laboratory, 1 Cyclotron Rd., Berkeley, California 94720, United States
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She Z, Narouz MR, Smith CA, MacLean A, Loock HP, Kraatz HB, Crudden CM. N-Heterocyclic carbene and thiol micropatterns enable the selective deposition and transfer of copper films. Chem Commun (Camb) 2020; 56:1275-1278. [PMID: 31903463 DOI: 10.1039/c9cc08919e] [Citation(s) in RCA: 18] [Impact Index Per Article: 4.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/05/2023]
Abstract
Microcontact printed patterns of N-heterocyclic carbenes (NHCs) and thiols were prepared on gold substrates and utilized as templates for the creation of metallic Cu structures using electroplating. The presence of the NHC in the pattern is essential to enable the transfer of the resulting copper microstructures to a second substrate.
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Affiliation(s)
- Zhe She
- Department of Physical and Environmental Sciences, University of Toronto Scarborough, 1265 Military Trail, Toronto, Ontario M1C 1A4, Canada.
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She Z, Yao Z, Ménard H, Tobish S, Lahaye D, Champness NR, Buck M. Coordination controlled electrodeposition and patterning of layers of palladium/copper nanoparticles on top of a self-assembled monolayer. NANOSCALE 2019; 11:13773-13782. [PMID: 31305824 DOI: 10.1039/c9nr03927a] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
A scheme for the generation of bimetallic nanoparticles is presented which combines electrodeposition of one type of metal, coordinated to a self-assembled monolayer (SAM), with another metal deposited from the bulk electrolyte. In this way PdCu nanoparticles are generated by initial complexation of Pd2+ to a SAM of 3-(4-(pyridine-4-yl)phenyl)propane-1-thiol (PyP3) on Au/mica and subsequent reduction in an acidic aqueous CuSO4 electrolyte. Cyclic voltammetry reveals that the onset of Cu deposition is triggered by Pd reduction. Scanning tunneling microscopy (STM) shows that layers of connected particles are formed with an average thickness of less than 3 nm and lateral dimensions of particles in the range of 2 to 5 nm. In X-ray photoelectron spectra a range of binding energies for the Pd 3d signal is observed whereas the Cu 2p signal appears at a single binding energy, even though chemically different Cu species are present: normal and more noble Cu. Up to three components are seen in the N 1s signal, one originating from protonated pyridine moieties, the others reflecting the SAM-metal interaction. It is suggested that the coordination controlled electrodeposition yields layers of particles composed of a Pd core and a Cu shell with a transition region of a PdCu alloy. Deposited on top of the PyP3 SAM, the PdCu particles exhibit weak adhesion which is exploited for patterning by selective removal of particles employing scanning probe techniques. The potential for patterning down to the sub-10 nm scale is demonstrated. Harnessing the deposition contrast between native and PdCu loaded PyP3 SAMs, structures thus created can be developed into patterned continuous layers.
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Affiliation(s)
- Zhe She
- EaStCHEM School of Chemistry, University of St. Andrews, North Haugh, St. Andrews, KY16 9ST, UK.
| | - Zhen Yao
- EaStCHEM School of Chemistry, University of St. Andrews, North Haugh, St. Andrews, KY16 9ST, UK.
| | - Hervé Ménard
- Leverhulme Research Centre for Forensic Science, University of Dundee, Dundee, DD1 4HN, UK
| | - Sven Tobish
- Drochaid Research Services, North Haugh, St. Andrews, KY16 9ST, UK
| | - Dorothée Lahaye
- School of Chemistry, University of Nottingham, University Park, Nottingham, NG7 2RD, UK
| | - Neil R Champness
- School of Chemistry, University of Nottingham, University Park, Nottingham, NG7 2RD, UK
| | - Manfred Buck
- EaStCHEM School of Chemistry, University of St. Andrews, North Haugh, St. Andrews, KY16 9ST, UK.
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Maoz R, Berson J, Burshtain D, Nelson P, Zinger A, Bitton O, Sagiv J. Interfacial Electron Beam Lithography: Chemical Monolayer Nanopatterning via Electron-Beam-Induced Interfacial Solid-Phase Oxidation. ACS NANO 2018; 12:9680-9692. [PMID: 30215511 DOI: 10.1021/acsnano.8b03416] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Chemical nanopatterning-the deliberate nanoscale modification of the chemical nature of a solid surface-is conveniently realized using organic monolayer coatings to impart well-defined chemical functionalities to selected surface regions of the coated solid. Most monolayer patterning methods, however, exploit destructive processes that introduce topographic as well as other undesired structural and chemical transformations along with the desired surface chemical modification. In particular in electron beam lithography (EBL), organic monolayers have been used mainly as ultrathin resists capable of improving the resolution of patterning via local deposition or removal of material. On the basis of the recent discovery of a class of radiation-induced interfacial chemical transformations confined to the contact surface between two solids, we have advanced a direct, nondestructive EBL approach to chemical nanopatterning-interfacial electron beam lithography (IEBL)-demonstrated here by the e-beam-induced local oxidation of the -CH3 surface moieties of a highly ordered self-assembled n-alkylsilane monolayer to -COOH while fully preserving the monolayer structural integrity and molecular organization. In this conceptually different EBL process, the traditional resist is replaced by a thin film coating that acts as a site-activated reagent/catalyst in the chemical modification of the coated surface, here the top surface of the to-be-patterned monolayer. Structural and chemical transformations induced in the thin film coating and the underlying monolayer upon exposure to the electron beam were elucidated using a semiquantitative surface characterization methodology that combines multimode AFM imaging with postpatterning surface chemical modifications and quantitative micro-FTIR measurements. IEBL offers attractive opportunities in chemical nanopatterning, for example, by enabling the application of the advanced EBL technology to the straightforward nanoscale functionalization of the simplest commonly used organosilane monolayers.
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Affiliation(s)
- Rivka Maoz
- Department of Materials and Interfaces , Weizmann Institute of Science , Rehovot 7610001 , Israel
| | - Jonathan Berson
- Department of Materials and Interfaces , Weizmann Institute of Science , Rehovot 7610001 , Israel
| | - Doron Burshtain
- Department of Materials and Interfaces , Weizmann Institute of Science , Rehovot 7610001 , Israel
| | - Peter Nelson
- Department of Materials and Interfaces , Weizmann Institute of Science , Rehovot 7610001 , Israel
| | - Ariel Zinger
- Department of Materials and Interfaces , Weizmann Institute of Science , Rehovot 7610001 , Israel
| | - Ora Bitton
- Department of Chemical Research Support , Weizmann Institute of Science , Rehovot 7610001 , Israel
| | - Jacob Sagiv
- Department of Materials and Interfaces , Weizmann Institute of Science , Rehovot 7610001 , Israel
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Paradinas M, Munuera C, Buck M, Ocal C. In-Situ Scrutiny of the Relationship between Polymorphic Phases and Properties of Self-Assembled Monolayers of a Biphenyl Based Thiol. J Phys Chem B 2017; 122:657-665. [DOI: 10.1021/acs.jpcb.7b05958] [Citation(s) in RCA: 6] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
Affiliation(s)
- Markos Paradinas
- Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Campus UAB, Bellaterra 08193-Barcelona, Spain
| | - Carmen Munuera
- Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Campus UAB, Bellaterra 08193-Barcelona, Spain
| | - Manfred Buck
- EaStCHEM
School of Chemistry, University of St. Andrews, North Haugh, St. Andrews, KY169ST, U.K
| | - Carmen Ocal
- Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Campus UAB, Bellaterra 08193-Barcelona, Spain
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Houplin J, Dablemont C, Sala L, Lafosse A, Amiaud L. Electron Processing at 50 eV of Terphenylthiol Self-Assembled Monolayers: Contributions of Primary and Secondary Electrons. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2015; 31:13528-34. [PMID: 26606369 DOI: 10.1021/acs.langmuir.5b02109] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/11/2023]
Abstract
Aromatic self-assembled monolayers (SAMs) can serve as platforms for development of supramolecular assemblies driven by surface templates. For many applications, electron processing is used to locally reinforce the layer. To achieve better control of the irradiation step, chemical transformations induced by electron impact at 50 eV of terphenylthiol SAMs are studied, with these SAMs serving as model aromatic SAMs. High-resolution electron energy loss spectroscopy (HREELS) and electron-stimulated desorption (ESD) of neutral fragment measurements are combined to investigate electron-induced chemical transformation of the layer. The decrease of the CH stretching HREELS signature is mainly attributed to dehydrogenation, without a noticeable hybridization change of the hydrogenated carbon centers. Its evolution as a function of the irradiation dose gives an estimate of the effective hydrogen content loss cross-section, σ = 2.7-4.7 × 10(-17) cm(2). Electron impact ionization is the major primary mechanism involved, with the impact electronic excitation contributing only marginally. Therefore, special attention is given to the contribution of the low-energy secondary electrons to the induced chemistry. The effective cross-section related to dissociative secondary electron attachment at 6 eV is estimated to be 1 order of magnitude smaller. The 1 eV electrons do not induce significant chemical modification for a 2.5 mC cm(-2) dose, excluding their contribution.
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Affiliation(s)
- Justine Houplin
- Institut des Sciences Moléculaires d'Orsay (ISMO), CNRS, Université Paris-Sud, Université Paris-Saclay , F-91405 Orsay, France
| | - Céline Dablemont
- Institut des Sciences Moléculaires d'Orsay (ISMO), CNRS, Université Paris-Sud, Université Paris-Saclay , F-91405 Orsay, France
| | - Leo Sala
- Institut des Sciences Moléculaires d'Orsay (ISMO), CNRS, Université Paris-Sud, Université Paris-Saclay , F-91405 Orsay, France
| | - Anne Lafosse
- Institut des Sciences Moléculaires d'Orsay (ISMO), CNRS, Université Paris-Sud, Université Paris-Saclay , F-91405 Orsay, France
| | - Lionel Amiaud
- Institut des Sciences Moléculaires d'Orsay (ISMO), CNRS, Université Paris-Sud, Université Paris-Saclay , F-91405 Orsay, France
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8
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Houplin J, Amiaud L, Dablemont C, Lafosse A. DOS and electron attachment effects in the electron-induced vibrational excitation of terphenylthiol SAMs. Phys Chem Chem Phys 2015; 17:30721-8. [PMID: 26529112 DOI: 10.1039/c5cp04067a] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 02/02/2023]
Abstract
Low energy electron scattering on terphenylthiol (TPT, HS-(C6H4)2-C6H5) self-assembled monolayers (SAMs) deposited onto gold was investigated using high resolution electron energy loss spectroscopy (HREELS) by recording specular elastic and inelastic excitation functions.
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Affiliation(s)
- J. Houplin
- Univ Paris-Sud
- Institut des Sciences Moléculaires d'Orsay (ISMO)
- UMR 8214
- Orsay
- France
| | - L. Amiaud
- Univ Paris-Sud
- Institut des Sciences Moléculaires d'Orsay (ISMO)
- UMR 8214
- Orsay
- France
| | - C. Dablemont
- Univ Paris-Sud
- Institut des Sciences Moléculaires d'Orsay (ISMO)
- UMR 8214
- Orsay
- France
| | - A. Lafosse
- Univ Paris-Sud
- Institut des Sciences Moléculaires d'Orsay (ISMO)
- UMR 8214
- Orsay
- France
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Shen C, Buck M. Nanoscale patterning of a self-assembled monolayer by modification of the molecule-substrate bond. BEILSTEIN JOURNAL OF NANOTECHNOLOGY 2014; 5:258-267. [PMID: 24778947 PMCID: PMC3999799 DOI: 10.3762/bjnano.5.28] [Citation(s) in RCA: 9] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/21/2013] [Accepted: 02/06/2014] [Indexed: 05/31/2023]
Abstract
The intercalation of Cu at the interface of a self-assembled monolayer (SAM) and a Au(111)/mica substrate by underpotential deposition (UPD) is studied as a means of high resolution patterning. A SAM of 2-(4'-methylbiphenyl-4-yl)ethanethiol (BP2) prepared in a structural phase that renders the Au substrate completely passive against Cu-UPD, is patterned by modification with the tip of a scanning tunneling microscope. The tip-induced defects act as nucleation sites for Cu-UPD. The lateral diffusion of the metal at the SAM-substrate interface and, thus, the pattern dimensions are controlled by the deposition time. Patterning down to the sub-20 nm range is demonstrated. The difference in strength between the S-Au and S-Cu bond is harnessed to develop the latent Cu-UPD image into a patterned binary SAM. Demonstrated by the exchange of BP2 by adamantanethiol (AdSH) this is accomplished by a sequence of reductive desorption of BP2 in Cu free areas followed by adsorption of AdSH. The appearance of Au adatom islands upon the thiol exchange suggests that the interfacial structures of BP2 and AdSH SAMs are different.
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Affiliation(s)
- Cai Shen
- EaStCHEM School of Chemistry, University of St Andrews, St Andrews KY16 9ST, United Kingdom
- Ningbo Institute of Materials Technology & Engineering, Chinese Academy of Sciences, Ningbo, 315201, China
| | - Manfred Buck
- EaStCHEM School of Chemistry, University of St Andrews, St Andrews KY16 9ST, United Kingdom
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Huth M. Radiation-induced nanostructures: Formation processes and applications. BEILSTEIN JOURNAL OF NANOTECHNOLOGY 2012; 3:533-534. [PMID: 23019548 PMCID: PMC3458598 DOI: 10.3762/bjnano.3.61] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/11/2012] [Accepted: 07/13/2012] [Indexed: 06/01/2023]
Affiliation(s)
- Michael Huth
- Physikalisches Institut, Max-von-Laue-Str. 1, Goethe-Universität, 60438 Frankfurt am Main, Germany
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Huang C, Moosmann M, Jin J, Heiler T, Walheim S, Schimmel T. Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers. BEILSTEIN JOURNAL OF NANOTECHNOLOGY 2012; 3:620-8. [PMID: 23019558 PMCID: PMC3458608 DOI: 10.3762/bjnano.3.71] [Citation(s) in RCA: 9] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/17/2012] [Accepted: 08/09/2012] [Indexed: 05/21/2023]
Abstract
A rapid and cost-effective lithographic method, polymer blend lithography (PBL), is reported to produce patterned self-assembled monolayers (SAM) on solid substrates featuring two or three different chemical functionalities. For the pattern generation we use the phase separation of two immiscible polymers in a blend solution during a spin-coating process. By controlling the spin-coating parameters and conditions, including the ambient atmosphere (humidity), the molar mass of the polystyrene (PS) and poly(methyl methacrylate) (PMMA), and the mass ratio between the two polymers in the blend solution, the formation of a purely lateral morphology (PS islands standing on the substrate while isolated in the PMMA matrix) can be reproducibly induced. Either of the formed phases (PS or PMMA) can be selectively dissolved afterwards, and the remaining phase can be used as a lift-off mask for the formation of a nanopatterned functional silane monolayer. This "monolayer copy" of the polymer phase morphology has a topographic contrast of about 1.3 nm. A demonstration of tuning of the PS island diameter is given by changing the molar mass of PS. Moreover, polymer blend lithography can provide the possibility of fabricating a surface with three different chemical components: This is demonstrated by inducing breath figures (evaporated condensed entity) at higher humidity during the spin-coating process. Here we demonstrate the formation of a lateral pattern consisting of regions covered with 1H,1H,2H,2H-perfluorodecyltrichlorosilane (FDTS) and (3-aminopropyl)triethoxysilane (APTES), and at the same time featuring regions of bare SiO(x). The patterning process could be applied even on meter-sized substrates with various functional SAM molecules, making this process suitable for the rapid preparation of quasi two-dimensional nanopatterned functional substrates, e.g., for the template-controlled growth of ZnO nanostructures [1].
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Affiliation(s)
- Cheng Huang
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), 76021 Karlsruhe, Germany
- Institute of Applied Physics and Center for Functional Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), 76128 Karlsruhe, Germany
- Joint Research Laboratory Nanomaterials Karlsruhe Institute of Technology (KIT)/Darmstadt University of Technology, 64287 Darmstadt, Germany
| | - Markus Moosmann
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), 76021 Karlsruhe, Germany
- Institute of Applied Physics and Center for Functional Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), 76128 Karlsruhe, Germany
| | - Jiehong Jin
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), 76021 Karlsruhe, Germany
- Institute of Applied Physics and Center for Functional Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), 76128 Karlsruhe, Germany
| | - Tobias Heiler
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), 76021 Karlsruhe, Germany
- Institute of Applied Physics and Center for Functional Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), 76128 Karlsruhe, Germany
| | - Stefan Walheim
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), 76021 Karlsruhe, Germany
- Institute of Applied Physics and Center for Functional Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), 76128 Karlsruhe, Germany
| | - Thomas Schimmel
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), 76021 Karlsruhe, Germany
- Institute of Applied Physics and Center for Functional Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), 76128 Karlsruhe, Germany
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