On the characterization of a 1 m long, ultra-precise KB-focusing mirror pair for European XFEL by means of slope measuring deflectometry

Recently, the European X-Ray Free Electron Laser (XFEL) has successfully produced its first X-ray photon pulse trains. This unique photon source will provide up to 27 000 photon pulses per second for experiments in different fields of science. In order to accomplish this, ultra-precise mirrors of dedicated shape are used to guide and focus these photons along beamlines of up to 930 m in length from the source in the undulator section to the desired focal point at an experimental station. We will report on a Kirkpatrick-Baez-mirror pair designed to focus hard-X-rays in the energy range from 3 to 16 keV to a 100 nm scale at the SPB/SFX instrument of the European XFEL. Both mirrors are elliptical cylinder-like shaped. The figure error of these 1 m long mirrors was specified to be better than 2 nm pv in terms of the height domain; this corresponds to a slope error of about 50 nrad rms (at least a best effort finishing is requested). This is essential to provide optimal experimental conditions including preservation of brilliance and wavefront. Such large and precise optics represents a challenge for the required deterministic surface polishing technology, elastic emission machining in this case, as well as for the metrology mandatory to enable a precise characterization of the topography on the mirror aperture. Besides the slope errors, the ellipse parameters are also of particular interest. The mirrors were under inspection by means of slope measuring deflectometry at the BESSY-NOM slope measuring profiler at the Helmholtz Zentrum Berlin. The NOM measurements have shown a slope error of 100 nrad rms on a aperture length of 950 mm corresponding to a residual figure deviation ≤20 nm pv for both mirrors. Additionally we found a strong impact of the mirror support conditions on the mirror shape finally measured. We will report on the measurement concept to characterize such mirrors as well as to discuss the achieved results.

Gratings for synchrotron and FEL beamlines: a project for the manufacture of ultra-precise gratings at Helmholtz Zentrum Berlin

Blazed gratings are of dedicated interest for the monochromatization of synchrotron radiation when a high photon flux is required, such as, for example, in resonant inelastic X-ray scattering experiments or when the use of laminar gratings is excluded due to too high flux densities and expected damage, for example at free-electron laser beamlines. Their availability became a bottleneck since the decommissioning of the grating manufacture facility at Carl Zeiss in Oberkochen. To resolve this situation a new technological laboratory was established at the Helmholtz Zentrum Berlin, including instrumentation from Carl Zeiss. Besides the upgraded ZEISS equipment, an advanced grating production line has been developed, including a new ultra-precise ruling machine, ion etching technology as well as laser interference lithography. While the old ZEISS ruling machine GTM-6 allows ruling for a grating length up to 170 mm, the new GTM-24 will have the capacity for 600 mm (24 inch) gratings with groove densities between 50 lines mm^-1 and 1200 lines mm^-1. A new ion etching machine with a scanning radiofrequency excited ion beam (HF) source allows gratings to be etched into substrates of up to 500 mm length. For a final at-wavelength characterization, a new reflectometer at a new Optics beamline at the BESSY-II storage ring is under operation. This paper reports on the status of the grating fabrication, the measured quality of fabricated items by ex situ and in situ metrology, and future development goals.

Highly efficient blazed grating with multilayer coating for tender X-ray energies

For photon energies of 1 - 5 keV, blazed gratings with multilayer coating are ideally suited for the suppression of stray and higher orders light in grating monochromators. We developed and characterized a blazed 2000 lines/mm grating coated with a 20 period Cr/C- multilayer. The multilayer d-spacing of 7.3 nm has been adapted to the line distance of 500 nm and the blaze angle of 0.84° in order to provide highest efficiency in the photon energy range between 1.5 keV and 3 keV. Efficiency of the multilayer grating as well as the reflectance of a witness multilayer which were coated simultaneously have been measured. An efficiency of 35% was measured at 2 keV while a maximum efficiency of 55% was achieved at 4 keV. In addition, a strong suppression of higher orders was observed which makes blazed multilayer gratings a favorable dispersing element also for the low X-ray energy range.