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Arabchigavkani N, Somphonsane R, Ramamoorthy H, He G, Nathawat J, Yin S, Barut B, He K, Randle MD, Dixit R, Sakanashi K, Aoki N, Zhang K, Wang L, Mei WN, Dowben PA, Fransson J, Bird JP. Remote Mesoscopic Signatures of Induced Magnetic Texture in Graphene. Phys Rev Lett 2021; 126:086802. [PMID: 33709762 DOI: 10.1103/physrevlett.126.086802] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/15/2020] [Accepted: 01/19/2021] [Indexed: 06/12/2023]
Abstract
Mesoscopic conductance fluctuations are a ubiquitous signature of phase-coherent transport in small conductors, exhibiting universal character independent of system details. In this Letter, however, we demonstrate a pronounced breakdown of this universality, due to the interplay of local and remote phenomena in transport. Our experiments are performed in a graphene-based interaction-detection geometry, in which an artificial magnetic texture is induced in the graphene layer by covering a portion of it with a micromagnet. When probing conduction at some distance from this region, the strong influence of remote factors is manifested through the appearance of giant conductance fluctuations, with amplitude much larger than e^{2}/h. This violation of one of the fundamental tenets of mesoscopic physics dramatically demonstrates how local considerations can be overwhelmed by remote signatures in phase-coherent conductors.
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Affiliation(s)
- N Arabchigavkani
- Department of Physics, University at Buffalo, the State University of New York, Buffalo, New York 14260, USA
| | - R Somphonsane
- Department of Physics, King Mongkut's Institute of Technology Ladkrabang, Bangkok 10520, Thailand
| | - H Ramamoorthy
- Department of Electronics Engineering, King Mongkut's Institute of Technology Ladkrabang, Bangkok 10520, Thailand
| | - G He
- Department of Electrical Engineering, University at Buffalo, the State University of New York, Buffalo, New York 14260, USA
| | - J Nathawat
- Department of Electrical Engineering, University at Buffalo, the State University of New York, Buffalo, New York 14260, USA
| | - S Yin
- Department of Electrical Engineering, University at Buffalo, the State University of New York, Buffalo, New York 14260, USA
| | - B Barut
- Department of Physics, University at Buffalo, the State University of New York, Buffalo, New York 14260, USA
| | - K He
- Department of Electrical Engineering, University at Buffalo, the State University of New York, Buffalo, New York 14260, USA
| | - M D Randle
- Department of Electrical Engineering, University at Buffalo, the State University of New York, Buffalo, New York 14260, USA
| | - R Dixit
- Department of Electrical Engineering, University at Buffalo, the State University of New York, Buffalo, New York 14260, USA
| | - K Sakanashi
- Department of Materials Science, Chiba University, Chiba 263-8522, Japan
| | - N Aoki
- Department of Materials Science, Chiba University, Chiba 263-8522, Japan
| | - K Zhang
- Department of Materials Science and Engineering, University of Science and Technology of China, Hefei, Anhui 230026, China
| | - L Wang
- Department of Materials Science and Engineering, University of Science and Technology of China, Hefei, Anhui 230026, China
| | - W-N Mei
- Department of Physics, University of Nebraska Omaha, Omaha, Nebraska 68182, USA
| | - P A Dowben
- Department of Physics and Astronomy, Theodore Jorgensen Hall, University of Nebraska Lincoln, Lincoln, Nebraska 68588-0299, USA
| | - J Fransson
- Department of Physics and Astronomy, Uppsala University, Box 516, SE-751 21 Uppsala, Sweden
| | - J P Bird
- Department of Electrical Engineering, University at Buffalo, the State University of New York, Buffalo, New York 14260, USA
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Somphonsane R, Ramamoorthy H, He G, Nathawat J, Yin S, Kwan CP, Arabchigavkani N, Barut B, Zhao M, Jin Z, Fransson J, Bird JP. Universal scaling of weak localization in graphene due to bias-induced dispersion decoherence. Sci Rep 2020; 10:5611. [PMID: 32221340 PMCID: PMC7101405 DOI: 10.1038/s41598-020-62313-3] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 02/27/2019] [Accepted: 03/11/2020] [Indexed: 11/29/2022] Open
Abstract
The differential conductance of graphene is shown to exhibit a zero-bias anomaly at low temperatures, arising from a suppression of the quantum corrections due to weak localization and electron interactions. A simple rescaling of these data, free of any adjustable parameters, shows that this anomaly exhibits a universal, temperature- (T) independent form. According to this, the differential conductance is approximately constant at small voltages (V < kBT/e), while at larger voltages it increases logarithmically with the applied bias. For theoretical insight into the origins of this behaviour, which is inconsistent with electron heating, we formulate a model for weak-localization in the presence of nonequilibrium transport. According to this model, the applied voltage causes unavoidable dispersion decoherence, which arises as diffusing electron partial waves, with a spread of energies defined by the value of the applied voltage, gradually decohere with one another as they diffuse through the system. The decoherence yields a universal scaling of the conductance as a function of eV/kBT, with a logarithmic variation for eV/kBT > 1, variations in accordance with the results of experiment. Our theoretical description of nonequilibrium transport in the presence of this source of decoherence exhibits strong similarities with the results of experiment, including the aforementioned rescaling of the conductance and its logarithmic variation as a function of the applied voltage.
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Affiliation(s)
- R Somphonsane
- Department of Physics, King Mongkut's Institute of Technology Ladkrabang, Bangkok, 10520, Thailand.
- Thailand Center of Excellence in Physics, Commission on Higher Education, 328 Si Ayutthaya Road, Bangkok, 10400, Thailand.
| | - H Ramamoorthy
- Department of Electronic Engineering, King Mongkut's Institute of Technology Ladkrabang, Bangkok, 10520, Thailand
| | - G He
- Department of Electrical Engineering, University at Buffalo, The State University of New York, Buffalo, NY, 14260-1900, USA
| | - J Nathawat
- Department of Electrical Engineering, University at Buffalo, The State University of New York, Buffalo, NY, 14260-1900, USA
| | - S Yin
- Department of Electrical Engineering, University at Buffalo, The State University of New York, Buffalo, NY, 14260-1900, USA
| | - C-P Kwan
- Department of Physics, University at Buffalo, The State University of New York, Buffalo, NY, 14260-1500, USA
| | - N Arabchigavkani
- Department of Physics, University at Buffalo, The State University of New York, Buffalo, NY, 14260-1500, USA
| | - B Barut
- Department of Physics, University at Buffalo, The State University of New York, Buffalo, NY, 14260-1500, USA
| | - M Zhao
- High-Frequency High-Voltage Device and Integrated Circuits Center, Institute of Microelectronics of Chinese Academy of Sciences, 3 Beitucheng West Road, Chaoyang District, Beijing, PR China
| | - Z Jin
- High-Frequency High-Voltage Device and Integrated Circuits Center, Institute of Microelectronics of Chinese Academy of Sciences, 3 Beitucheng West Road, Chaoyang District, Beijing, PR China
| | - J Fransson
- Department of Physics and Astronomy, Uppsala University, Box 516, SE-751 21, Uppsala, Sweden
| | - J P Bird
- Department of Electrical Engineering, University at Buffalo, The State University of New York, Buffalo, NY, 14260-1900, USA
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He G, Ramamoorthy H, Kwan CP, Lee YH, Nathawat J, Somphonsane R, Matsunaga M, Higuchi A, Yamanaka T, Aoki N, Gong Y, Zhang X, Vajtai R, Ajayan PM, Bird JP. Thermally Assisted Nonvolatile Memory in Monolayer MoS 2 Transistors. Nano Lett 2016; 16:6445-6451. [PMID: 27680095 DOI: 10.1021/acs.nanolett.6b02905] [Citation(s) in RCA: 17] [Impact Index Per Article: 2.1] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
We demonstrate a novel form of thermally-assisted hysteresis in the transfer curves of monolayer MoS2 FETs, characterized by the appearance of a large gate-voltage window and distinct current levels that differ by a factor of ∼102. The hysteresis emerges for temperatures in excess of 400 K and, from studies in which the gate-voltage sweep parameters are varied, appears to be related to charge injection into the SiO2 gate dielectric. The thermally-assisted memory is strongly suppressed in equivalent measurements performed on bilayer transistors, suggesting that weak screening in the monolayer system plays a vital role in generating its strongly sensitive response to the charge-injection process. By exploiting the full features of the hysteretic transfer curves, programmable memory operation is demonstrated. The essential principles demonstrated here point the way to a new class of thermally assisted memories based on atomically thin two-dimensional semiconductors.
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Affiliation(s)
- G He
- Department of Electrical Engineering, University at Buffalo, The State University of New York , Buffalo, New York 14260-1900, United States
| | - H Ramamoorthy
- Department of Electrical Engineering, University at Buffalo, The State University of New York , Buffalo, New York 14260-1900, United States
| | - C-P Kwan
- Department of Physics, University at Buffalo, The State University of New York , Buffalo, New York 14260-1500, United States
| | - Y-H Lee
- Department of Electrical Engineering, University at Buffalo, The State University of New York , Buffalo, New York 14260-1900, United States
| | - J Nathawat
- Department of Electrical Engineering, University at Buffalo, The State University of New York , Buffalo, New York 14260-1900, United States
| | - R Somphonsane
- Department of Physics, King Mongkut's Institute of Technology Ladkrabang , Bangkok 10520, Thailand
| | - M Matsunaga
- Graduate School of Advanced Integration Science, Chiba University , 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522, Japan
| | - A Higuchi
- Graduate School of Advanced Integration Science, Chiba University , 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522, Japan
| | - T Yamanaka
- Graduate School of Advanced Integration Science, Chiba University , 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522, Japan
| | - N Aoki
- Graduate School of Advanced Integration Science, Chiba University , 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522, Japan
| | - Y Gong
- Department of Materials Science and NanoEngineering, Rice University , Houston, Texas 77005, United States
| | - X Zhang
- Department of Materials Science and NanoEngineering, Rice University , Houston, Texas 77005, United States
| | - R Vajtai
- Department of Materials Science and NanoEngineering, Rice University , Houston, Texas 77005, United States
| | - P M Ajayan
- Department of Materials Science and NanoEngineering, Rice University , Houston, Texas 77005, United States
| | - J P Bird
- Department of Electrical Engineering, University at Buffalo, The State University of New York , Buffalo, New York 14260-1900, United States
- Graduate School of Advanced Integration Science, Chiba University , 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522, Japan
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