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Johnson MG, Raj Bharath S, Arockiasamy S, Maiyalagan T, Selvakumar J, Nagaraja KS. Development and vapour pressure of metallo-organic precursors of copper for the deposition of copper thin films by a plasma-assisted MOCVD. INORG NANO-MET CHEM 2017. [DOI: 10.1080/24701556.2017.1357591] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/18/2022]
Affiliation(s)
- M. G. Johnson
- Department of Chemistry and Loyola Institute of Frontier Energy (LIFE), Loyola College, Chennai, Tamil Nadu, India
| | - S. Raj Bharath
- Department of Chemistry, School of Advanced Sciences, VIT University Chennai Campus, Chennai, Tamil Nadu, India
| | - S. Arockiasamy
- Department of Chemistry, School of Advanced Sciences, VIT University Chennai Campus, Chennai, Tamil Nadu, India
| | - T. Maiyalagan
- Department of Chemistry, SRM Research Institute, SRM University, Chennai, Tamil Nadu, India
| | - J. Selvakumar
- KNRPC, Bhabha Atomic Research Centre Facilities, Kalpakkam, Tamil Nadu, India
| | - K. S. Nagaraja
- Department of Chemistry and Loyola Institute of Frontier Energy (LIFE), Loyola College, Chennai, Tamil Nadu, India
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Chandrakala C, Sravanthi P, Raj Bharath S, Arockiasamy S, George Johnson M, Nagaraja K, Jeyaraj B. Synthesis, structure, vapour pressure and deposition of ZnO thin film by plasma assisted MOCVD technique using a novel precursor bis[(pentylnitrilomethylidine) (pentylnitrilomethylidine-μ-phenalato)]dizinc(II). J Mol Struct 2017. [DOI: 10.1016/j.molstruc.2016.10.010] [Citation(s) in RCA: 6] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/16/2022]
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Sravanthi P, Chandrakala C, Raj Bharath S, Johnson M, Arokiasamy S, Nagaraja K, Jeyaraj B. Synthesis and crystal structure of cobalt(II) Schiff base precursor for cobalt oxide thin film by thermal chemical vapor deposition. Polyhedron 2016. [DOI: 10.1016/j.poly.2015.12.033] [Citation(s) in RCA: 7] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/22/2022]
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