Low-loss silicon slot waveguides and couplers fabricated with optical lithography and atomic layer deposition

We demonstrate low-loss silicon slot waveguides patterned with 248 nm deep-UV lithography and filled with atomic layer deposited aluminum oxide. Propagation losses less than 5 dB/cm are achieved with the waveguides. The devices are fabricated using low-temperature CMOS compatible processes. We also demonstrate simple, compact and efficient strip-to-slot waveguide couplers. With a coupler as short as 10 µm, coupling loss is less than 0.15 dB. The low-index and low-nonlinearity filling material allows nonlinearities nearly two orders of magnitude smaller than in silicon waveguides. Therefore, these waveguides are a good candidate for linear photonic devices on the silicon platform, and for distortion-free signal transmission channels between different parts of a silicon all-optical chip. The low-nonlinearity slot waveguides and robust couplers also facilitate a 50-fold local change of the waveguide nonlinearity within the chip by a simple mask design.

Towards athermal organic-inorganic guided mode resonance filters

We demonstrate guided-mode resonance filters featuring an amorphous TiO(2) layer fabricated by atomic layer deposition on a polymeric substrate. The thermal properties of such filters are studied in detail by taking into account both thermal expansion of the structure and thermo-optic coefficients of the materials. We show both theoretically and experimentally that these two effects partially compensate for each other, leading to nearly athermal devices. The wavelength shift of the resonance reflectance peak (< 1 nm) is a small fraction of the peak width (~11 nm) up to temperatures exceeding the room temperature by tens of degrees centigrade.

Reduced propagation loss in silicon strip and slot waveguides coated by atomic layer deposition

When silicon strip and slot waveguides are coated with a 50 nm amorphous titanium dioxide (TiO2) film, measured losses at a wavelength of 1.55 μm can be as low as (2 ± 1)dB/cm and (7 ± 2)dB/cm, respectively. We use atomic layer deposition (ALD), estimate the effect of ALD growth on the surface roughness, and discuss the effect on the scattering losses. Because the gap between the rails of a slot waveguide narrows by the TiO2 deposition, the effective slot width can be back-end controlled. This is useful for precise adjustment if the slot is to be filled with, e. g., a nonlinear organic material or with a sensitizer for sensors applications.

Atomic layer deposited titanium dioxide and its application in resonant waveguide grating

We demonstrate good optical quality TiO(2) thin films grown by atomic layer deposition at 120 degrees C. The optical properties were studied using spectroscopic ellipsometry and prism coupling methods. The refractive index was 2.27, and the slab waveguide propagation loss was less than 1dB/cm at 1.53microm. A high quality resonant waveguide grating was fabricated using a thin TiO(2) layer on top of a SiO(2) grating.

Angled sidewalls in silicon slot waveguides: conformal filling and mode properties

Effect of angled sidewalls on the filling and properties of silicon slot waveguides is discussed. We demonstrate complete filling of slot waveguide structures with oxide material systems using the atomic layer deposition technique and discuss use of various slot filling materials. Properties of the optical modes in angled-sidewall slot waveguides are studied. Enhanced vertical confinement is obtained with certain waveguide parameters. The reduced effective mode area enhances e.g. nonlinear effects in the waveguide. We discuss the use of atomic layer deposition in realization of filled slot waveguides optimized for all-optical functionalities.