Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application

Constructing a Comprehensive Nanopattern Library through Morphological Transitions of Block Copolymer Surface Micelles via Direct Solvent Immersion

This study establishes a comprehensive library of nanopatterns achievable by a single block copolymer (BCP), ranging from spheres to complex structures like split micelles, flower-like clusters, toroids, disordered micelle arrays, and unspecified unique shapes. The ordinary nanostructures of polystyrene-b-poly(2-vinylpyridine) (PS-b-P2VP) surface micelles deposited on a SiOx surface undergo a unique morphology transformation when immersed directly in solvents. Investigating parameters such as immersion solvents, BCP molecular weight, substrate interactions, and temperature, this work reveals the influence of these parameters on the thermodynamics and kinetics governing the morphology transformation. Additionally, the practical application of BCP nanopattern templates for fabricating metal nanostructures through direct solvent immersion of surface micelles is demonstrated. This approach offers an efficient and effective method for producing diverse nanostructures, with the potential to be employed in nanolithography, catalysts, electronics, membranes, plasmonics, and photonics.

Directed Self-Assembly of Diamond Networks in Triblock Terpolymer Films on Patterned Substrates

Block copolymers (BCPs) are particularly effective in creating soft nanostructured templates for transferring complex 3D network structures into inorganic materials that are difficult to fabricate by other methods. However, achieving control of the local ordering within these 3D networks over large areas remains a significant obstacle to advancing material properties. Here, we address this challenge by directing the self-assembly of a 3D alternating diamond morphology by solvent vapor annealing of a triblock terpolymer film on a chemically patterned substrate. The hexagonal substrate patterns were designed to match a (111) plane of the diamond lattice. Commensurability between the sparse substrate pattern and the BCP lattice produced a uniformly ordered diamond network within the polymer film, as confirmed by a combination of atomic force microscopy and cross-sectional imaging using focused ion beam scanning electron microscopy. The successful replication of the complex and well-ordered 3D network structure in gold promises to advance optical metamaterials and has potential applications in nanophotonics.

High Aspect Ratio Nanoscale Pores through BCP-Based Metal Oxide Masks and Advanced Dry Etching

The reliable and regular modification of the surface properties of substrates plays a crucial role in material research and the development of functional surfaces. A key aspect of this is the development of the surface pores and topographies. These can confer specific advantages such as high surface area as well as specific functions such as hydrophobic properties. Here, we introduce a combination of nanoscale self-assembled block-copolymer-based metal oxide masks with optimized deep reactive ion etching (DRIE) of silicon to permit the fabrication of porous topographies with aspect ratios of up to 50. Following the evaluation of our procedure and involved parameters using various techniques, such as AFM or SEM, the suitability of our features for applications relying on high light absorption as well as efficient thermal management is explored and discussed in further detail.

Block Copolymer-Templated, Single-Step Synthesis of Transition Metal Oxide Nanostructures for Sensing Applications

The synthesis of transition metal oxide nanostructures, thanks to their high surface-to-volume ratio and the resulting large fraction of surface atoms with high catalytic activity, is of prime importance for the development of new sensors and catalytic materials. Here, we report an economical, time-efficient, and easily scalable method of fabricating nanowires composed of vanadium, chromium, manganese, iron, and cobalt oxides by employing simultaneous block copolymer (BCP) self-assembly and selective sequestration of metal-organic acetylacetonate complexes within one of the BCP blocks. We discuss the mechanism and the primary factors that are responsible for the sequestration and conformal replication of the BCP template by the inorganic material that is obtained after the polymer template is removed. X-ray photoelectron spectroscopy (XPS) and powder X-ray diffraction (PXRD) studies indicate that the metal oxidation state in the nanowires produced by plasma ashing the BCP template closely matches that of the precursor complex and that their structure is amorphous, thus requiring high-temperature annealing in order to sinter them into a crystalline form. Finally, we demonstrate how the developed nanowire array fabrication scheme can be used to rapidly pattern a multilayered iron oxide nanomesh, which we then used to construct a prototype volatile organic compound sensor.

Morphology Engineering of the Asymmetric PS-b-P4VP Block Copolymer: From Porous to Nanodot Oxide Structures

In the present work, we demonstrate the formation of oxide porous and nanodot structures from the same block copolymer (BCP) by the phase inversion of a BCP template. We investigated the effect of solvent annealing time on the ordering of asymmetric, cylinder forming, polystyrene-b-poly(4-vinylpyridine) (PS-b-P4VP) BCP. Phase separation of PS-b-P4VP was achieved by solvent vapor annealing (SVA) in a solvent atmosphere that is (partially) selective to P4VP to initially generate hexagonally arranged, cylindrical arrays of the expected structure. The morphology of the BCP changed from P4VP hexagonally packed cylinders to an 'inverse' structure with PS cylinders embedded in a P4VP matrix. This suggests that selective swelling occurs over time such that the swollen P4VP phase becomes the majority volume component. Metal ions (Ga3+, In3+) were infiltrated into the BCP templates by a solution-mediated infiltration approach, followed by an ultraviolet-ozone treatment to remove the polymer and oxidize the metallic ions to their oxides. The findings show that a single BCP can be used to create both metal oxide arrays and porous structures of metal oxides by simply varying the duration of the solvent annealing process. The resulting structures were analyzed through several methods including scanning electron microscopy, atomic force microscopy, X-ray photoelectron spectroscopy (XPS), transmission electron microscopy, and energy-dispersive X-ray spectroscopy. XPS analyses confirmed the complete elimination of the BCP template and the presence of metal oxides. This study provides important insights into the development of functional BCP materials with inverse structures.

Synthesis and Structural Insight into poly(dimethylsiloxane)-b-poly(2-vinylpyridine) Copolymers

In this study, the use of anionic polymerization for the synthesis of living poly(dimethylsiloxane) or PDMS-Li+, as well as poly(2-vinylpyridine) or P2VP-Li+ homopolymers, and the subsequent use of chlorosilane chemistry in order for the two blocks to be covalently joined leading to PDMS-b-P2VP copolymers is proposed. High vacuum manipulations enabled the synthesis of well-defined materials with different molecular weights (Μ¯n, from 9.8 to 36.0 kg/mol) and volume fraction ratios (φ, from 0.15 to 0.67). The Μ¯n values, dispersity indices, and composition were determined through membrane/vapor pressure osmometry (MO/VPO), size exclusion chromatography (SEC), and proton nuclear magnetic resonance spectroscopy (1H NMR), respectively, while the thermal transitions were determined via differential scanning calorimetry (DSC). The morphological characterization results suggested that for common composition ratios, lamellar, cylindrical, and spherical phases with domain periodicities ranging from approximately 15 to 39 nm are formed. A post-polymerization chemical modification reaction to quaternize the nitrogen atom in some of the P2VP monomeric units in the copolymer with the highest P2VP content, and the additional characterizations through 1H NMR, infrared spectroscopy, DSC, and contact angle are reported. The synthesis, characterization, and quaternization of the copolymer structure are important findings toward the preparation of functional materials with enhanced properties suitable for various nanotechnology applications.

Developing Quantitative Nondestructive Characterization of Nanomaterials: A Case Study on Sequential Infiltration Synthesis of Block Copolymers

The sequential infiltration synthesis (SIS) of inorganic materials in nanostructured block copolymer templates has rapidly progressed in the last few years to develop functional nanomaterials with controllable properties. To assist this rapid evolution, expanding the capabilities of nondestructive methods for quantitative characterization of the materials properties is required. In this paper, we characterize the SIS process on three model polymers with different infiltration profiles through ex situ quantification by reference-free grazing incidence X-ray fluorescence. More qualitative depth distribution results were validated by means of X-ray photoelectron spectroscopy and scanning transmission electron microscopy combined with energy-dispersive X-ray spectroscopy.

Competitive Registration Fields for The Development of Complex Block Copolymer Structures by A Layer-by-Layer Approach

Block copolymer (BCP) self-assembly in thin films is an elegant method to generate nanometric features with tunable geometrical configurations. By combining directed assembly and hybridization methods, advances in nano-manufacturing have been attested over the past decades with flagship applications in lithography and optics. Nevertheless, the range of geometrical configurations is limited by the accessible morphologies inherent to the energy minimization process involved in BCP self-assembly. Layering of nanostructured BCP thin films has been recently proposed in order to enrich the span of nanostructures derived from BCP self-assembly with the formation of non-native heterostructures such as double-layered arrays of nanowires or dots-on-line and dots-in-hole hierarchical structures. In this work, the layer-by-layer method is further exploited for the generation of nano-mesh arrays using nanostructured BCP thin films. In particular, a subtle combination of chemical and topographical fields is leveraged in order to demonstrate design rules for the controlled registration of a BCP layer on top of an underneath immobilized one by the precise tuning of the interfacial chemical field between the two BCP layers.

Highly Efficient Production of Nanoporous Block Copolymers with Arbitrary Structural Characteristics for Advanced Membranes

The great significance of boosting the design of percolating nanopore structures in block copolymers (BCPs) for various cases has been widely demonstrated in the past several decades. However, it still remains challenging to prepare the desired porous structures in a rapid, facile, and universal manner. Here we have developed an unconventional and benchtop strategy to rapidly generate the nanoporous polystyrene-based BCPs with arbitrary structural characteristics regardless of the BCP bulk morphology. This universal pore-forming strategy enables the sustainable CO2 -based BCPs to form advanced membranes after 1 s soaking for efficiently rejecting 94.2 % brilliant blue R (826 g mol-1 ). Meanwhile, the water permeance retains around 1020 L (m2  h bar)-1 , which is 1-3 orders of magnitude higher than that of other membranes. This strategy may offer an excellent opportunity to introduce percolating pore structures in those newly developed BCPs with which the previously reported pore-forming methods may not deal.

Universal fast mode regime in wetting kinetics

We present simulation results from a comprehensive molecular dynamics (MD) study of surface-directed spinodal decomposition (SDSD) in unstable symmetric binary mixtures at wetting surfaces. We consider long-ranged and short-ranged surface fields to investigate the early stage wetting kinetics. The attractive part of the long-ranged potential is of the form V(z)∼z^{-n}, where z is the distance from the surface and n is the power-law exponent. We find that the wetting-layer thickness R_{1}(t) at very early times exhibits a power-law growth with an exponent α=1/(n+2). It then crosses over to a universal fast-mode regime with α=3/2. In contrast, for the short-ranged surface potential, a logarithmic behavior in R_{1}(t) is observed at initial times. Remarkably, similar rapid growth is seen in this case too. We provide phenomenological arguments to understand these growth laws. Our MD results firmly establish the existence of universal fast-mode kinetics and settle the related controversy.

Solvent-Induced Swelling Behaviors of Microphase-Separated Polystyrene-block-Poly(ethylene oxide) Thin Films Investigated Using In Situ Spectroscopic Ellipsometry and Single-Molecule Fluorescence Microscopy

Block copolymers have attracted considerable interest in the fields of nanoscience and nanotechnology because these polymers afford well-defined nanostructures via self-assembly. An in-depth understanding of solvent effects on the physicochemical properties of these microdomains is crucial for their preparation and utilization. Herein, we employed in situ spectroscopic ellipsometry and single-molecule fluorescence techniques to gain detailed insights into microdomain properties in polystyrene-block-poly(ethylene oxide) (PS-b-PEO) films exposed to ethanol- and water-saturated N₂. We observed a quick increase and a subsequent gradual decrease in the ellipsometric thickness of PS-b-PEO films upon exposure to ethanol-saturated N₂. This observation was unexpected because ethanol-saturated N₂ induced negligible thickness change for PS and PEO homopolymer films. The similarity in maximum thickness gain observed under ethanol- and water-saturated N₂ implied the swelling of PEO microdomains. Ethanol vapor permeation through the PEO microdomains was supported by the redshift of the ensemble and single-molecule fluorescence emission of Nile red in PS-b-PEO films. Single-molecule tracking data showed the initial enhancement and subsequent reduction of the diffusion of hydrophilic sulforhodamine B molecules in PS-b-PEO films upon exposure to ethanol-saturated N₂, consistent with the spectroscopic ellipsometry results. The higher ethanol susceptibility of the PEO microdomains was attributable to their amorphous nature, as shown by FTIR data.

Liquid Phase Infiltration of Block Copolymers

Novel materials with defined composition and structures at the nanoscale are increasingly desired in several research fields spanning a wide range of applications. The development of new approaches of synthesis that provide such control is therefore required in order to relate the material properties to its functionalities. Self-assembling materials such as block copolymers (BCPs), in combination with liquid phase infiltration (LPI) processes, represent an ideal strategy for the synthesis of inorganic materials into even more complex and functional features. This review provides an overview of the mechanism involved in the LPI, outlining the role of the different polymer infiltration parameters on the resulting material properties. We report newly developed methodologies that extend the LPI to the realisation of multicomponent and 3D inorganic nanostructures. Finally, the recently reported implementation of LPI into different applications such as photonics, plasmonics and electronics are highlighted.

Weak Polyelectrolytes as Nanoarchitectonic Design Tools for Functional Materials: A Review of Recent Achievements

The ionization degree, charge density, and conformation of weak polyelectrolytes can be adjusted through adjusting the pH and ionic strength stimuli. Such polymers thus offer a range of reversible interactions, including electrostatic complexation, H-bonding, and hydrophobic interactions, which position weak polyelectrolytes as key nano-units for the design of dynamic systems with precise structures, compositions, and responses to stimuli. The purpose of this review article is to discuss recent examples of nanoarchitectonic systems and applications that use weak polyelectrolytes as smart components. Surface platforms (electrodeposited films, brushes), multilayers (coatings and capsules), processed polyelectrolyte complexes (gels and membranes), and pharmaceutical vectors from both synthetic or natural-type weak polyelectrolytes are discussed. Finally, the increasing significance of block copolymers with weak polyion blocks is discussed with respect to the design of nanovectors by micellization and film/membrane nanopatterning via phase separation.

Self-Assembly and -Cross-Linking Lamellar Films by Nanophase Separation with Solvent-Induced Anisotropic Structural Changes

In this study, we have prepared thermally and chemically stable lamellar polymer films via humid annealing. The amphiphilic polymer poly(N-dodecyl acrylamide-stat-3-(trimethoxysilyl)propyl acrylate) [p(DDA/TMSPA)] forms a self-assembled lamellar structure via annealing at 60 °C under 98% relative humidity (humid annealing) due to nanophase separation between the hydrophobic dodecyl side and main chains with the amide groups that contain adsorbed water. Moreover, a self-cross-linking reaction of TMSPA proceeds during the humid annealing. As a result, the lamellar films maintain their structure even when annealed above their glass-transition temperature. On the other hand, the films swell when immersed in toluene. The highly ordered lamellar structure collapses due to the swelling but can be re-established by subsequent humid annealing. A multilayer freestanding film can be exfoliated via sonication in toluene. The exfoliated multilayer films initially form a dome-shaped structure, which is converted to a plate-shaped structure upon humid annealing. In their entirety, these results reveal that the molecular-scale movement associated with the formation of the lamellar structure induces a macroscopic structural change. Consequently, p(DDA/TMSPA) can be considered as a new stimulus-responsive polymer.

Dimensional Design for Surface-Enhanced Raman Spectroscopy

Surface-enhanced Raman spectroscopy (SERS) is a vibrational spectroscopy technique that enables specific identification of target analytes with sensitivity down to the single-molecule level by harnessing metal nanoparticles and nanostructures. Excitation of localized surface plasmon resonance of a nanostructured surface and the associated huge local electric field enhancement lie at the heart of SERS, and things will become better if strong chemical enhancement is also available simultaneously. Thus, the precise control of surface characteristics of enhancing substrates plays a key role in broadening the scope of SERS for scientific purposes and developing SERS into a routine analytical tool. In this review, the development of SERS substrates is outlined with some milestones in the nearly half-century history of SERS. In particular, these substrates are classified into zero-dimensional, one-dimensional, two-dimensional, and three-dimensional substrates according to their geometric dimension. We show that, in each category of SERS substrates, design upon the geometric and composite configuration can be made to achieve an optimized enhancement factor for the Raman signal. We also show that the temporal dimension can be incorporated into SERS by applying femtosecond pulse laser technology, so that the SERS technique can be used not only to identify the chemical structure of molecules but also to uncover the ultrafast dynamics of molecular structural changes. By adopting SERS substrates with the power of four-dimensional spatiotemporal control and design, the ultimate goal of probing the single-molecule chemical structural changes in the femtosecond time scale, watching the chemical reactions in four dimensions, and visualizing the elementary reaction steps in chemistry might be realized in the near future.

Block Copolymer Nanopatterning for Nonsemiconductor Device Applications

Block copolymer (BCP) nanopatterning has emerged as a versatile nanoscale fabrication tool for semiconductor devices and other applications, because of its ability to organize well-defined, periodic nanostructures with a critical dimension of 5-100 nm. While the most promising application field of BCP nanopatterning has been semiconductor devices, the versatility of BCPs has also led to enormous interest from a broad spectrum of other application areas. In particular, the intrinsically low cost and straightforward processing of BCP nanopatterning have been widely recognized for their large-area parallel formation of dense nanoscale features, which clearly contrasts that of sophisticated processing steps of the typical photolithographic process, including EUV lithography. In this Review, we highlight the recent progress in the field of BCP nanopatterning for various nonsemiconductor applications. Notable examples relying on BCP nanopatterning, including nanocatalysts, sensors, optics, energy devices, membranes, surface modifications and other emerging applications, are summarized. We further discuss the current limitations of BCP nanopatterning and suggest future research directions to open up new potential application fields.

Sequential Infiltration Synthesis into Maltoheptaose and Poly(styrene): Implications for Sub-10 nm Pattern Transfer

Vapor phase infiltration into a self-assembled block copolymer (BCP) to create a hybrid material in one of the constituent blocks can enhance the etch selectivity for pattern transfer. Multiple pulse infiltration into carbohydrate-based high-χ BCP has previously been shown to enable sub-10 nm feature pattern transfer. By optimizing the amount of infiltrated material, the etch selectivity should be further improved. Here, an investigation of semi-static sequential infiltration synthesis of trimethyl aluminum (TMA) and water into maltoheptaose (MH) films, and into hydroxyl-terminated poly(styrene) (PS-OH) films, was performed, by varying the process parameters temperature, precursor pulse duration, and precursor exposure length. It was found that, by decreasing the exposure time from 100 to 20 s, the volumetric percentage on included pure Al₂O₃ in MH could be increased from 2 to 40 vol% at the expense of a decreased infiltration depth. Furthermore, the degree of infiltration was minimally affected by temperature between 64 and 100 °C. Shorter precursor pulse durations of 10 ms TMA and 5 ms water, as well as longer precursor pulses of 75 ms TMA and 45 ms water, were both shown to promote a higher degree, 40 vol%, of infiltrated alumina in MH. As proof of concept, 12 nm pitch pattern transfer into silicon was demonstrated using the method and can be concluded to be one of few studies showing pattern transfer at such small pitch. These results are expected to be of use for further understanding of the mechanisms involved in sequential infiltration synthesis of TMA/water into MH, and for further optimization of carbohydrate-based etch masks for sub-10 nm pattern transfer. Enabling techniques for high aspect ratio pattern transfer at the single nanometer scale could be of high interest, e.g., in the high-end transistor industry.

Selective sequential infiltration synthesis of ZnO in the liquid crystalline phase of silicon-containing rod-coil block copolymers

The combination of block copolymer (BCP) thin film self-assembly and selective infiltration synthesis of inorganic materials into one BCP block provides access to various organic-inorganic hybrids. Here, we apply sequential infiltration synthesis, a vapor-phase hybridization technique, to selectively introduce ZnO into the organic microdomains of silicon-containing rod-coil diblock copolymers and a triblock terpolymer, polydimethylsiloxane (PDMS)-b-poly{2,5-bis[(4-methoxyphenyl)-oxycarbonyl]styrene} (PDMS-b-PMPCS) and PDMS-b-polystyrene-b-PMPCS (PDMS-b-PS-b-PMPCS), in which the PMPCS rod block is a liquid crystalline polymer. The in-plane cylindrical PDMS-b-PMPCS and core-shell cylindrical and hexagonally perforated lamellar PDMS-b-PS-b-PMPCS films were infiltrated with ZnO with high selectivity to the PMPCS. The etching contrast between PDMS, PS and the ZnO-infused PMPCS enables the fabrication of ZnO/SiO_x binary composites by plasma etching and reveals the core-shell morphology of the triblock terpolymer.

Rectangular Cylinders Formed by Compositionally Bidisperse ABC Triblock Terpolymer Blends: A Self-Consistent Field Theory Study

Compared with traditional cylinders that have circular cross-sections, cylinders with rectangular cross-sections can endow nanomaterials with various novel optical properties and functions. In this work, the formation of the rectangular cylinders self-assembled by compositionally bidisperse ABC triblock terpolymer blends has been investigated via numerical simulations based on self-consistent field theory. The specially designed blending systems are composed of two types of linear ABC triblock terpolymers that have the same total chain lengths and the middle B block chain lengths, but different chain lengths of the side A/C blocks. By tuning the chain length fractions and the interactions between different blocks, rectangular cylinders with a fourfold symmetry pattern were successfully obtained in our simulations. Each rectangular phase domain is self-assembled together by the short and long side blocks of the same species. The simulation results indicate that the selective aggregation of the short side blocks determines the formation of the rectangular cylindrical phase, i.e., the short side blocks prefer to aggregate at the four corners within a rectangular cylindrical phase domain. This simulation result reveals a formation mechanism that is different from the mechanism proposed in previous experiments [Asai ACS Macro Lett., 2014, 3, 166-169]. Moreover, under different middle B block chain length fractions, phase diagrams as a function of the interaction parameter between different blocks and the short side block chain length fraction have been constructed. The phase diagrams show that the parameter window of the rectangular cylinders is considerably expanded by increasing the chain length fraction of the middle B blocks. Our simulation works can provide a theoretical basis for molecular design to regulate and fabricate nanomaterials with nontraditional phase domains in future experiments.

An Ultra-Thin Near-Perfect Absorber via Block Copolymer Engineered Metasurfaces

Producing ultrathin light absorber layers is attractive towards the integration of lightweight planar components in electronic, photonic, and sensor devices. In this work, we report the experimental demonstration of a thin gold (Au) metallic metasurface with near-perfect visible absorption (∼95 %). Au nanoresonators possessing heights from 5 - 15 nm with sub-50 nm diameters were engineered by block copolymer (BCP) templating. The Au nanoresonators were fabricated on an alumina (Al₂O₃) spacer layer and a reflecting Au mirror, in a film-coupled nanoparticle design. The BCP nanopatterning strategy to produce desired heights of Au nanoresonators was tailored to achieve near-perfect absorption at ≈ 600 nm. The experimental insight described in this work is a step forward towards realizing large area flat optics applications derived from subwavelength-thin metasurfaces.

Templating Functional Materials Using Self-Assembled Block Copolymer Thin-Film for Nanodevices

The nanomorphologies and nanoarchitectures that can be synthesized using block copolymer (BCP) thin-film self-assembly have inspired a variety of new applications, which offer various advantages, such as, small device footprint, low operational power and enhanced device performance. Imperative for these applications, however, is the ability to transform these small polymeric patterns into useful inorganic structures. BCP-templated inorganic nanostructures have shown the potential for use as active materials in various electronic device applications, including, field-effect transistors, photodetectors, gas sensors and many more. This article reviews various strategies that have been implemented in the past decade to fabricate devices at nanoscale using block copolymer thin films.

Poly(styrene)-block-Maltoheptaose Films for Sub-10 nm Pattern Transfer: Implications for Transistor Fabrication

Sequential infiltration synthesis (SIS) into poly(styrene)-block-maltoheptaose (PS-b-MH) block copolymer using vapors of trimethyl aluminum and water was used to prepare nanostructured surface layers. Prior to the infiltration, the PS-b-MH had been self-assembled into 12 nm pattern periodicity. Scanning electron microscopy indicated that horizontal alumina-like cylinders of 4.9 nm diameter were formed after eight infiltration cycles, while vertical cylinders were 1.3 nm larger. Using homopolymer hydroxyl-terminated poly(styrene) (PS-OH) and MH films, specular neutron reflectometry revealed a preferential reaction of precursors in the MH compared to PS-OH. The infiltration depth into the maltoheptaose homopolymer film was found to be 2.0 nm after the first couple of cycles. It reached 2.5 nm after eight infiltration cycles, and the alumina incorporation within this infiltrated layer corresponded to 23 vol % Al2O3. The alumina-like material, resulting from PS-b-MH infiltration, was used as an etch mask to transfer the sub-10 nm pattern into the underlying silicon substrate, to an aspect ratio of approximately 2:1. These results demonstrate the potential of exploiting SIS into carbohydrate-based polymers for nanofabrication and high pattern density applications, such as transistor devices.

Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective

The turn of the 21st century heralded in the semiconductor age alongside the Anthropocene epoch, characterised by the ever-increasing human impact on the environment. The ecological consequences of semiconductor chip manufacturing are the most predominant within the electronics industry. This is due to current reliance upon large amounts of solvents, acids and gases that have numerous toxicological impacts. Management and assessment of hazardous chemicals is complicated by trade secrets and continual rapid change in the electronic manufacturing process. Of the many subprocesses involved in chip manufacturing, lithographic processes are of particular concern. Current developments in bottom-up lithography, such as directed self-assembly (DSA) of block copolymers (BCPs), are being considered as a next-generation technology for semiconductor chip production. These nanofabrication techniques present a novel opportunity for improving the sustainability of lithography by reducing the number of processing steps, energy and chemical waste products involved. At present, to the extent of our knowledge, there is no published life cycle assessment (LCA) evaluating the environmental impact of new bottom-up lithography versus conventional lithographic techniques. Quantification of this impact is central to verifying whether these new nanofabrication routes can replace conventional deposition techniques in industry as a more environmentally friendly option.

Enhanced Ordering of Block Copolymer Thin Films upon Addition of Magnetic Nanoparticles

The influence of magnetite nanoparticles coated with poly(acrylic acid) (Fe₃O₄@PAA NPs) on the organization of block copolymer thin films via a self-assembly process was investigated. Polystyrene-b-poly(4-vinylpyridine) films were obtained by the dip-coating method and thoroughly examined by X-ray reflectivity, transmission electron microscopy, atomic force microscopy, and grazing incidence small-angle scattering. Magnetic properties of the films were probed via superconducting quantum interference device (SQUID) magnetometry. It was demonstrated that due to the hydrogen bonding between P4VP and PAA, the Fe₃O₄@PAA NPs segregate selectively inside P4VP domains, enhancing the microphase separation process. This in turn, together with employing carefully optimized dip-coating parameters, results in the formation of hybrid thin films with highly ordered nanostructures. The addition of Fe₃O₄@PAA nanoparticles does not change the average interdomain spacing in the film lateral nanostructure. Moreover, it was shown that the nanoparticles can easily be removed to obtain well-ordered nanoporous templates.

Optimization and Control of Large Block Copolymer Self-Assembly via Precision Solvent Vapor Annealing

The self-assembly of ultra-high molecular weight (UHMW) block copolymers (BCPs) remains a complex and time-consuming endeavor owing to the high kinetic penalties associated with long polymer chain entanglement. In this work, we report a unique strategy of overcoming these kinetic barriers through precision solvent annealing of an UHMW polystyrene-block-poly(2-vinylpyridine) BCP system (M w: ∼800 kg/mol) by fast swelling to very high levels of solvent concentration (ϕs). Phase separation on timescales of ∼10 min is demonstrated once a thickness-dependent threshold ϕs value of ∼0.80-0.86 is achieved, resulting in lamellar feature spacings of over 190 nm. The threshold ϕs value was found to be greater for films with higher dry thickness (D 0) values. Tunability of the domain morphology is achieved through controlled variation of both D 0 and ϕs, with the kinetically unstable hexagonal perforated lamellar (HPL) phase observed at ϕs values of ∼0.67 and D 0 values of 59-110 nm. This HPL phase can be controllably induced into an order-order transition to a lamellar morphology upon further increase of ϕs to 0.80 or above. As confirmed by grazing-incidence small-angle X-ray scattering, the lateral ordering of the lamellar domains is shown to improve with increasing ϕs up to a maximum value at which the films transition to a disordered state. Thicker films are shown to possess a higher maximum ϕs value before transitioning to a disordered state. The swelling rate is shown to moderately influence the lateral ordering of the phase-separated structures, while the amount of hold time at a particular value of ϕs does not notably enhance the phase separation process. These large period self-assembled lamellar domains are then employed to facilitate pattern transfer using a liquid-phase infiltration method, followed by plasma etching, generating ordered, high aspect ratio Si nanowall structures with spacings of ∼190 nm and heights of up to ∼500 nm. This work underpins the feasibility of a room-temperature, solvent-based annealing approach for the reliable and scalable fabrication of sub-wavelength nanostructures via BCP lithography.

Strategy for Enhancing Ultrahigh-Molecular-Weight Block Copolymer Chain Mobility to Access Large Period Sizes (>100 nm)

Assembling ultrahigh-molecular-weight (UHMW) block copolymers (BCPs) in rapid time scales is perceived as a grand challenge in polymer science due to slow kinetics. Through surface engineering and identifying a nonvolatile solvent (propylene glycol methyl ether acetate, PGMEA), we showcase the impressive ability of a series of lamellar poly(styrene)-block-poly(2-vinylpyridine) (PS-b-P2VP) BCPs to self-assemble directly after spin-coating. In particular, we show the formation of large-period (≈111 nm) lamellar structures from a neat UHMW PS-b-P2VP BCP. The significant influence of solvent-polymer solubility parameters are explored to enhance the polymer chain mobility. After optimization using solvent vapor annealing, increased feature order of ultralarge-period PS-b-P2VP BCP patterns in 1 h is achieved. Isolated metallic and dielectric features are also demonstrated to exemplify the promise that large BCP periods offer for functional applications. The methods described in this article center on industry-compatible patterning schemes, solvents, and deposition techniques. Thus, our straightforward UHMW BCP strategy potentially paves a viable and practical path forward for large-scale integration in various sectors, e.g., photonic band gaps, polarizers, and membranes that demand ultralarge period sizes.

Large area Al2O3-Au raspberry-like nanoclusters from iterative block-copolymer self-assembly

In the field of functional nanomaterials, core–satellite nanoclusters have recently elicited great interest due to their unique optoelectronic properties. However, core–satellite synthetic routes to date are hampered by delicate and multistep reaction conditions and no practical method has been reported for the ordering of these structures onto a surface monolayer. Herein we show a reproducible and simplified thin film process to fabricate bimetallic raspberry nanoclusters using block copolymer (BCP) lithography. The fabricated inorganic raspberry nanoclusters consisted of a ∼36 nm alumina core decorated with ∼15 nm Au satellites after infusing multilayer BCP nanopatterns. A series of cylindrical BCPs with different molecular weights allowed us to dial in specific nanodot periodicities (from 30 to 80 nm). Highly ordered BCP nanopatterns were then selectively infiltrated with alumina and Au species to develop multi-level bimetallic raspberry features. Microscopy and X-ray reflectivity analysis were used at each fabrication step to gain further mechanistic insights and understand the infiltration process. Furthermore, grazing-incidence small-angle X-ray scattering studies of infiltrated films confirmed the excellent order and vertical orientation over wafer scale areas of Al₂O₃/Au raspberry nanoclusters. We believe our work demonstrates a robust strategy towards designing hybrid nanoclusters since BCP blocks can be infiltrated with various low cost salt-based precursors. The highly controlled nanocluster strategy disclosed here could have wide ranging uses, in particular for metasurface and optical based sensor applications.

Large area Al₂O₃–Au raspberry-like nanoclusters and other complex structures have been created by iterative block-copolymer self-assembly, paving the way to a new generation of on-demand metallic architectures.

Nanoporous Thin Films Formed from Photocleavable Diblock Copolymers on Gold Substrates Modified with Thiolate Self-Assembled Monolayers

Nanoporous thin films formed on electrodes are considered functional elements of electrochemical sensing systems, thus motivating methods for their development. We report a preparative strategy detailing the effects of surface modification of gold substrates with thiolate self-assembled monolayers (SAMs) on the properties of nanoporous thin films derived from polystyrene-block-poly(ethylene oxide) having a photocleavable o-nitrobenzyl ester junction (PS-hν-PEO). Two PS-hν-PEO having similar PEO volume fractions (≈0.2) but different molecular weights (10 and 23 kg/mol) were used to prepare films (30-100 nm thick) spin-cast on gold substrates unmodified and modified with cysteamine, thioctic acid, and 6-hydroxy-1-hexanethiol SAMs. Solvent vapor annealing followed by PEO removal led to the formation of nanopores with average diameters of 12 and 19 nm from the smaller and larger PS-hν-PEO, respectively. Cyclic voltammograms of 1,1'-ferrocenedimethanol showed that nanoporous films on cysteamine SAMs afforded nanopores reaching the underlying substrates at higher density than those on the other substrates. This result was attributed to balanced affinity of the cysteamine SAM surface with PS and PEO, which enhanced the vertical orientation of PEO microdomains. The generation of carboxyl groups associated with the photocleavage reaction was revealed by pH-dependent changes in the voltammogram of Fe(CN)₆^3- that reflected electrostatic effects regulated by the protonation state of the carboxyl groups. The SAMs underneath the nanoporous films could be replaced by treatment with a thiol solution, as verified by voltammograms of l-ascorbic acid. These results suggest that thiolate SAM modification provides a simple means to control the interfacial orientation of PEO microdomains in thin PS-hν-PEO films.

Feature size control using surface reconstruction temperature in block copolymer lithography for InAs nanowire growth

Here we present a method to control the size of the openings in hexagonally organized BCP thin films of poly(styrene)-block-poly(4-vinylpyridine) (PS-b-P4VP) by using surface reconstruction. The surface reconstruction is based on selective swelling of the P4VP block in ethanol, and its extraction to the surface of the film, resulting in pores upon drying. We found that the BCP pore diameter increases with ethanol immersion temperature. In our case, the temperature range 18 to 60 °C allowed fine-tuning of the pore size between 14 and 22 nm. A conclusion is that even though the molecular weight of the respective polymer blocks is fixed, the PS-b-P4VP pore diameter can be tuned by controlling temperature during surface reconstruction. These results can be used for BCP-based nanofabrication in general, and for vertical nanowire growth in particular, where high pattern density and diameter control are of importance. Finally, we demonstrate successful growth of indium arsenide InAs vertical nanowires by selective-area metal-organic vapor phase epitaxy (MOVPE), using a silicon nitride mask patterned by the proposed PS-b-P4VP surface reconstruction lithography method.

Impact of particle arrays on phase separation composition patterns

We examine the symmetry-breaking effect of fixed constellations of particles on the surface-directed spinodal decomposition of binary blends in the presence of particles whose surfaces have a preferential affinity for one of the components. Our phase-field simulations indicate that the phase separation morphology in the presence of particle arrays can be tuned to have a continuous, droplet, lamellar, or hybrid morphology depending on the interparticle spacing, blend composition, and time. In particular, when the interparticle spacing is large compared to the spinodal wavelength, a transient target pattern composed of alternate rings of preferred and non-preferred phases emerges at early times, tending to adopt the symmetry of the particle configuration. We reveal that such target patterns stabilize for certain characteristic length, time, and composition scales characteristic of the pure phase-separating mixture. To illustrate the general range of phenomena exhibited by mixture-particle systems, we simulate the effects of single-particle, multi-particle, and cluster-particle systems having multiple geometrical configurations of the particle characteristic of pattern substrates on phase separation. Our simulations show that tailoring the particle configuration, or substrate pattern configuration, a relative fluid-particle composition should allow the desirable control of the phase separation morphology as in block copolymer materials, but where the scales accessible to this approach of organizing phase-separated fluids usually are significantly larger. Limited experiments confirm the trends observed in our simulations, which should provide some guidance in engineering patterned blend and other mixtures of technological interest.

Block Copolymer Derived Vertically Coupled Plasmonic Arrays for Surface-Enhanced Raman Spectroscopy

A surface-enhanced Raman spectroscopy sensing template consisting of gold-covered nanopillars is developed. The plasmonic slab consists of a perforated gold film at the base of the nanopillars and a Babinet complementary dot array on top of the pillars. The nanopillars were fabricated by the incorporation of an iron salt precursor into a self-assembled block copolymer thin film and subsequent reactive ion etching. The preparation is easy, scalable, and cost-effective. We report on the increase in surface-enhanced Raman scattering efficiency for smaller pillar heights and stronger coupling between the dot array and perforated gold film with average enhancement factors as high as 10⁷. In addition, the block copolymer-derived templates show an excellent relative standard deviation of 8% in the measurement of the Raman intensity. Finite difference time domain simulations were performed to investigate the nature of the electromagnetic near-field enhancement and to identify plasmonic hot spots.

Perpendicularly aligned nanodomains on versatile substrates via rapid thermal annealing assisted by liquid crystalline ordering in block copolymer films

The highly ordered perpendicularly aligned cylindrical and lamellar microdomains within block copolymer (BCP) films have important applications in diverse fields. However, the fast normal orientation of self-assembled nanostructures on arbitrary substrates without tedious pre- and postprocessing has been a challenging issue in manufacturing miniaturized devices. Here, we outline the potential for extending the hierarchical self-assembly within azobenzene-containing PS-b-PMA(Az) films to inherently assist in the formation of normally aligned domains using a rapid thermal annealing process (140 °C for 5 min). Liquid crystalline (LC) mesogens in PS-b-PMA(Az) films self-assemble to form a parallelly aligned sematic phase after thermal annealing, as confirmed by grazing-incidence small-angle X-ray scattering (GISAXS), wide-angle X-ray diffraction (WAXD) and ultraviolet-visible (UV-vis) spectra. This sub-phase contributes to broadening of the PS-cylinder-phase window (0.083 ≤ f _PS < 0.49) and ∼12 nm PS cylinder structures. Perpendicular cylinders or lamellae are observed on various substrates, such as silicon wafers, flexible polyethylene terephthalate (PET) sheets and conductive aluminum foils. Additionally, the good reactive ion etching (RIE) rate difference between the two blocks makes these BCPs more attractive for advancing the field of BCP lithographic applications for fabricating flexible microelectronic devices.

Enhanced Hybridization and Nanopatterning via Heated Liquid-Phase Infiltration into Self-Assembled Block Copolymer Thin Films

Organic-inorganic hybrids featuring tunable material properties can be readily generated by applying vapor- or liquid-phase infiltration (VPI or LPI) of inorganic materials into organic templates, with resulting properties controlled by type and quantity of infiltrated inorganics. While LPI offers more diverse choices of infiltratable elements, it tends to yield smaller infiltration amount than VPI, but the attempt to address the issue has been rarely reported. Here, we demonstrate a facile temperature-enhanced LPI method to control and drastically increase the quantity and kinetics of Pt infiltration into self-assembled polystyrene-block-poly(2-vinylpyridine) block copolymer (BCP) thin films. By applying LPI at mildly elevated temperatures (40-80 °C), we showcase controllable optical functionality of hybrid BCP films along with conductive three-dimensional (3D) inorganic nanostructures. Structural analysis reveals enhanced metal loading into the BCP matrix at higher LPI temperatures, suggesting multiple metal ion infiltration per monomer of P2VP. Combining temperature-enhanced LPI with hierarchical multilayer BCP self-assembly, we generate BCP-metal hybrid optical coatings featuring tunable antireflective properties as well as scalable conductive 3D Pt nanomesh structures. Enhanced material infiltration and control by temperature-enhanced LPI not only enables tunability of organic-inorganic hybrid nanostructures and properties but also expands the application of BCPs for generating uniquely functional inorganic nanostructures.

Polymer-guided assembly of inorganic nanoparticles

The self-assembly of inorganic nanoparticles is of great importance in realizing their enormous potentials for broad applications due to the advanced collective properties of nanoparticle ensembles. Various molecular ligands (e.g., small molecules, DNAs, proteins, and polymers) have been used to assist the organization of inorganic nanoparticles into functional structures at different hierarchical levels. Among others, polymers are particularly attractive for use in nanoparticle assembly, because of the complex architectures and rich functionalities of assembled structures enabled by polymers. Polymer-guided assembly of nanoparticles has emerged as a powerful route to fabricate functional materials with desired mechanical, optical, electronic or magnetic properties for a broad range of applications such as sensing, nanomedicine, catalysis, energy storage/conversion, data storage, electronics and photonics. In this review article, we summarize recent advances in the polymer-guided self-assembly of inorganic nanoparticles in both bulk thin films and solution, with an emphasis on the role of polymers in the assembly process and functions of resulting nanostructures. Precise control over the location/arrangement, interparticle interaction, and packing of inorganic nanoparticles at various scales are highlighted.

Tin oxide nanostructure fabrication via sequential infiltration synthesis in block copolymer thin films

Tin oxide (SnO₂) nanostructures are attractive for sensing, catalysis, and optoelectronic applications. Here we investigate the fabrication of SnO_x nanostructures through sequential infiltration synthesis (SIS) in block copolymer (BCP) film templates. While the growth of metal and metal oxides within polymers and BCP films via SIS has been demonstrated until now using small precursors such as trimethyl aluminum and diethyl zinc, we hypothesize that SIS can be performed using larger precursors and demonstrate SnO_x SIS with tetrakis(dimethylamino)tin (TDMASn) and hydrogen peroxide. Tuning the SIS reaction and BCP chemistry resulted in highly ordered, polystyrene-block-poly(2-vinyl pyridine) (P2VP)-templated porous SnO_x - AlO_x and SnO_x nanostructures. Detailed investigation using in-situ microbalance, high resolution electron microscopy, elemental analysis and infra-red spectroscopy shows that SnO_x can directly grow within P2VP homopolymer and BCP films. Simultaneously with the growth, SnO_x SIS process also contributes to the polymer etch. Performing SnO_x SIS with pretreatment of a single AlO_x SIS cycle increases the SnO_x growth and protects the BCP template from etching. This is the first report of SnO_x SIS opening a pathway for additional tetrakis-based organometallic precursors to be utilized in growth processes within polymers.

Temperature-Controlled Solvent Vapor Annealing of Thin Block Copolymer Films

Solvent vapor annealing is as an effective and versatile alternative to thermal annealing to equilibrate and control the assembly of polymer chains in thin films. Here, we present scientific and practical aspects of the solvent vapor annealing method, including the discussion of such factors as non-equilibrium conformational states and chain dynamics in thin films in the presence of solvent. Homopolymer and block copolymer films have been used in model studies to evaluate the robustness and the reproducibility of the solvent vapor processing, as well as to assess polymer-solvent interactions under confinement. Advantages of utilizing a well-controlled solvent vapor environment, including practically interesting regimes of weakly saturated vapor leading to poorly swollen states, are discussed. Special focus is given to dual temperature control over the set-up instrumentation and to the potential of solvo-thermal annealing. The evaluated insights into annealing dynamics derived from the studies on block copolymer films can be applied to improve the processing of thin films of crystalline and conjugated polymers as well as polymer composite in confined geometries.

Spatial arrangement of block copolymer nanopatterns using a photoactive homopolymer substrate

Spatial control of the orientation of block copolymers (BCPs) in thin films offers enormous opportunities for practical nanolithography applications. In this study, we demonstrate the use of a substrate comprised of poly(4-acetoxystyrene) to spatially control interfacial interactions and block copolymer orientation over different length scales. Upon UV irradiation poly(4-acetoxystyrene) undergoes a photo-Fries rearrangement yielding phenolic groups available for further functionalization. The wetting behaviour of PS-b-PMMA deposited on the poly(4-acetoxystyrene) films could be precisely controlled through controlling the UV irradiation dose. After exposure, and a mild post-exposure treatment, the substrate switches from asymmetric, to neutral and then to symmetric wetting. Upon exposure through photomasks, a range of high fidelity micro-patterns consisting of perpendicularly oriented lamellar microdomains were generated. Furthermore, the resolution of chemically patterned poly(4-acetoxystyrene) substrate could be further narrowed to submicrometer scale using electron beam lithography. When the BCP was annealed on an e-beam modified poly(4-acetoxystyrene) surface, the interface between domains of parallel and perpendicular orientation of the BCPs was well defined, especially when compared with the substrates patterned using the photomask.

Three-dimensional electroactive ZnO nanomesh directly derived from hierarchically self-assembled block copolymer thin films

Three-dimensional (3D) nanoarchitectures can offer enhanced material properties, such as large surface areas that amplify the structures' interaction with environments making them useful for various sensing applications. Self-assembled block copolymers (BCPs) can readily generate various 3D nanomorphologies, but their conversion to useful inorganic materials remains one of the critical challenges against the practical application of self-assembled BCPs. This work reports the vapor-phase infiltration synthesis of optoelectrically active, 3D ZnO nanomesh architectures by combining hierarchical successive stacking of self-assembled, lamellar-phase polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP) BCP thin films and a modified block-selective vapor-phase material infiltration protocol. The 3D ZnO nanomesh exhibits optoelectrical functionality, featuring stack-layer-number-dependent electrical conductance resembling the percolative transport originating from the intrinsic morphological network connectivity of the lamellar BCP pattern with symmetric block ratio. The results not only illustrate the first demonstration of electrical functionality based on the ZnO nanoarchitecture directly generated by the infiltration synthesis in self-assembled BCP thin films but also present a new, large-area scalable, metal oxide thin film nanoarchitecture fabrication method utilizing industry-compatible polymer solution coating and atomic layer deposition. Given the large surface area, three-dimensional porosity, and readily scalable fabrication procedures, the generated ZnO nanomesh promises potential applications as an efficient active medium in chemical and optical sensors.

Probing the multi-step crystallization dynamics of micelle templated nanoparticles: structural evolution of single crystalline γ-Fe2O3

Iron oxide nanoparticles synthesized with narrow size distribution were characterized using Raman spectroscopy, transmission electron microscopy and a superconducting quantum interference device magnetometer to investigate their composition, crystal structure and magnetic properties. Raman allowed us to explore the polymorphous transition of the iron oxide from the beginning of the synthesis process, as Raman can be used to monitor the precursors, the diblock-copolymer micelles and the resultant particles simultaneously under various processing steps. As different polymorphs possess distinct Raman active phonon modes, it also allows the identification of the exact phases of the resultant nanoparticles. Consequently, we show that the reverse micelle process results in pure phase nanoparticles only under certain conditions. Using insights obtained from examining the entire synthesis process, we can adjust the structure of small nanoparticles (∼6 nm) to achieve coercivity and saturation magnetization values that are usually only obtainable from larger particles (25 nm or larger). In this way, we show a route to tunable magnetic response based on the purity of the crystal phase rather than the particle size. By understanding the evolution of the entire synthesis process, it is possible to adjust the processing conditions to yield monodisperse single crystal phase nanoparticles for widespread use in a variety of applications.