1
|
Cao B, Dong J, Wang Z, Wang L. Large-Scale Non-Adiabatic Dynamics Simulation Based on Machine Learning Hamiltonian and Force Field: The Case of Charge Transport in Monolayer MoS 2. J Phys Chem Lett 2025; 16:4907-4920. [PMID: 40346030 DOI: 10.1021/acs.jpclett.5c01037] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 05/11/2025]
Abstract
We present an efficient and reliable large-scale non-adiabatic dynamics simulation method based on machine learning Hamiltonian and force field. The quasi-diabatic Hamiltonian network (DHNet) is trained in the Wannier basis based on well-designed translation and rotation invariant structural descriptors, which can effectively capture both local and nonlocal environmental information. Using the representative two-dimensional transition metal dichalcogenide MoS2 as an illustration, we show that density functional theory (DFT) calculations of only ten structures are sufficient to generate the training set for DHNet due to the high efficiency of Wannier analysis and orbital classification in sampling the interorbital couplings. DHNet demonstrates good transferability, thus enabling direct construction of the electronic Hamiltonian matrices for large systems. Compared with direct DFT calculations, DHNet significantly reduces the computational cost by about 5 orders of magnitude. By combining DHNet with the DeePMD machine learning force field, we successfully simulate electron transport in monolayer MoS2 with up to 3675 atoms and 13475 electronic levels by using a state-of-the-art surface hopping method. The electron mobility is calculated to be 110 cm2/(V s), which is in good agreement with the extensive experimental results in the range of 3-200 cm2/(V s) during 2013-2023. Due to the high performance, the proposed DHNet and large-scale non-adiabatic dynamics methods have great potential to be applied to study charge carrier dynamics in a wide range of material systems.
Collapse
Affiliation(s)
- Bichuan Cao
- Zhejiang Key Laboratory of Excited-State Energy Conversion and Energy Storage, Department of Chemistry, Zhejiang University, Hangzhou 310058, China
| | - Jiawei Dong
- Zhejiang Key Laboratory of Excited-State Energy Conversion and Energy Storage, Department of Chemistry, Zhejiang University, Hangzhou 310058, China
| | - Zedong Wang
- Zhejiang Key Laboratory of Excited-State Energy Conversion and Energy Storage, Department of Chemistry, Zhejiang University, Hangzhou 310058, China
| | - Linjun Wang
- Zhejiang Key Laboratory of Excited-State Energy Conversion and Energy Storage, Department of Chemistry, Zhejiang University, Hangzhou 310058, China
| |
Collapse
|
2
|
Rasyotra A, Das M, Sen D, Zhang Z, Pannone A, Chen C, Redwing JM, Yang Y, Jasuja K, Das S. Nanosheets Derived from Titanium Diboride as Gate Insulators for Atomically Thin Transistors. ACS NANO 2025. [PMID: 40387442 DOI: 10.1021/acsnano.4c18634] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/20/2025]
Abstract
Development and integration of gate insulators that offer a low equivalent oxide thickness (EOT) while maintaining a physically thicker layer are critical for advancing transistor technology as device dimensions continue to shrink. Such materials can deliver high gate capacitance and yet reduce gate leakage, thereby minimizing static power dissipation without compromising performance. These insulators should also provide the necessary interface quality, thermal stability, switching endurance, and reliability. Here, we demonstrate that nanosheets derived from titanium diboride (NDTD), synthesized at room temperature using a scalable dissolution-recrystallization method, exhibit EOT ∼ 2 nm irrespective of the physical thickness when used as top gate dielectrics for monolayer MoS2 field effect transistors (FETs). Furthermore, these nanosheets enable near-ideal subthreshold swing of 60 mV/decade, low gate leakage current (<10-4 A/cm2), and current on/off ratio of 106 at a supply voltage of 1 V, indicating clean interface and excellent electrostatic control. These titanium diboride (TiB2) derived nanosheet-gated MoS2 FETs also demonstrate stable operation at 125 °C and switching endurance in excess of 109 cycles. While nanosheets derived from metal diborides have been employed in energy storage, catalysis, and CO2 capture, this study showcases their potential as excellent gate insulators for microelectronics.
Collapse
Affiliation(s)
- Anshul Rasyotra
- Engineering Science and Mechanics, Penn State University, University Park 16802, United States
- Chemical Engineering, Indian Institute of Technology Gandhinagar, Palaj, Gandhinagar, Gujarat 382355, India
| | - Mayukh Das
- Engineering Science and Mechanics, Penn State University, University Park 16802, United States
| | - Dipanjan Sen
- Engineering Science and Mechanics, Penn State University, University Park 16802, United States
| | - Zhiyu Zhang
- Engineering Science and Mechanics, Penn State University, University Park 16802, United States
| | - Andrew Pannone
- Engineering Science and Mechanics, Penn State University, University Park 16802, United States
| | - Chen Chen
- 2D Crystal Consortium Materials Innovation Platform, Penn State University, University Park 16802, United States
| | - Joan M Redwing
- 2D Crystal Consortium Materials Innovation Platform, Penn State University, University Park 16802, United States
- Materials Science and Engineering, Penn State University, University Park 16802, United States
- Electrical Engineering, Penn State University, University Park 16802, United States
- Materials Research Institute, Penn State University, University Park 16802, United States
| | - Yang Yang
- Engineering Science and Mechanics, Penn State University, University Park 16802, United States
- Materials Research Institute, Penn State University, University Park 16802, United States
- Nuclear Engineering, Penn State University, University Park, Pennsylvania 16802, United States
| | - Kabeer Jasuja
- Chemical Engineering, Indian Institute of Technology Gandhinagar, Palaj, Gandhinagar, Gujarat 382355, India
| | - Saptarshi Das
- Engineering Science and Mechanics, Penn State University, University Park 16802, United States
- Materials Science and Engineering, Penn State University, University Park 16802, United States
- Electrical Engineering, Penn State University, University Park 16802, United States
- Materials Research Institute, Penn State University, University Park 16802, United States
| |
Collapse
|
3
|
Chen S, Huang S, Son J, Han E, Watanabe K, Taniguchi T, Huang PY, King WP, van der Zande AM, Bashir R. Detecting DNA translocation through a nanopore using a van der Waals heterojunction diode. Proc Natl Acad Sci U S A 2025; 122:e2422135122. [PMID: 40310455 PMCID: PMC12067215 DOI: 10.1073/pnas.2422135122] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/25/2024] [Accepted: 04/04/2025] [Indexed: 05/02/2025] Open
Abstract
A long-unrealized goal in solid-state nanopore sensing is to achieve out-of-plane electrical sensing and control of DNA during translocation, which is a prerequisite for base-by-base ratcheting that enables DNA sequencing in biological nanopores. Two-dimensional (2D) heterostructures, with their capability to construct out-of-plane electronics with atomic layer precision, are ideal yet unexplored candidates for use as electrical sensing membranes. Here, we demonstrate a nanopore architecture using a vertical 2D heterojunction diode consisting of p-type WSe2 on n-type MoS2. This diode exhibits rectified interlayer tunneling currents modulated by ionic potential, while the heterojunction potential reciprocally rectifies ionic transport through the nanopore. We achieve concurrent detection of DNA translocation using both ionic and diode currents and demonstrate a 2.3-fold electrostatic slowing of average translocation speed. Encapsulation layers enhance chemical and mechanical stability and durability while preserving the spatial resolution of atomically sharp 2D heterointerface for sensing. These results establish a paradigm for out-of-plane electrical sensing of single biomolecules.
Collapse
Affiliation(s)
- Sihan Chen
- Holonyak Micro and Nanotechnology Laboratory, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
| | - Siyuan Huang
- Department of Mechanical Science and Engineering, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
| | - Jangyup Son
- Department of Mechanical Science and Engineering, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
| | - Edmund Han
- Department of Materials Science and Engineering, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
| | - Kenji Watanabe
- Research Center for Electronic and Optical Materials, National Institute for Materials Science, Tsukuba305-0044, Ibaraki, Japan
| | - Takashi Taniguchi
- Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba305-0044, Ibaraki, Japan
| | - Pinshane Y. Huang
- Department of Materials Science and Engineering, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
- Materials Research Laboratory, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
| | - William P. King
- Holonyak Micro and Nanotechnology Laboratory, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
- Department of Mechanical Science and Engineering, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
- Department of Materials Science and Engineering, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
- Materials Research Laboratory, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
- Department of Biomedical and Translational Science, The Carle Illinois College of Medicine, University of Illinois Urbana-Champaign, Urbana, IL61801
| | - Arend M. van der Zande
- Holonyak Micro and Nanotechnology Laboratory, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
- Department of Mechanical Science and Engineering, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
- Department of Materials Science and Engineering, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
- Materials Research Laboratory, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
| | - Rashid Bashir
- Holonyak Micro and Nanotechnology Laboratory, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
- Department of Mechanical Science and Engineering, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
- Department of Materials Science and Engineering, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
- Materials Research Laboratory, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
- Department of Biomedical and Translational Science, The Carle Illinois College of Medicine, University of Illinois Urbana-Champaign, Urbana, IL61801
- Department of Bioengineering, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Urbana, IL61801
- Chan Zuckerberg Biohub Chicago, Chicago, IL60642
- Carl R. Woese Institute for Genomic Biology, University of Illinois Urbana-Champaign, Urbana, IL61801
| |
Collapse
|
4
|
Niu Z, Shan W, Wang X, Zhang X, Shi A, Zhang Y, Niu X. Single-Elemental Seamless Metal-Semiconductor Junctions Based on 2D Bi or Sb: Carrier Transport and Ultrafast Dynamics Study. J Phys Chem Lett 2025; 16:4057-4065. [PMID: 40233198 DOI: 10.1021/acs.jpclett.5c00706] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 04/17/2025]
Abstract
Two-dimensional (2D) metal-semiconductor (MS) junctions with their atomically thin nature are crucial for nanoelectronics. However, van der Waals (vdW) junctions face interfacial tunneling barriers, and lateral junctions suffer from chemical bonding disorders, both limiting carrier transport. Herein, based on the layer-dependent semiconductor-to-semimetal transition in 2D bismuthene (Bi) and antimonene (Sb), lateral seamless MS junctions with native chemical bonds are constructed to inhibit tunneling barriers and produce high-quality interfaces. These coherent junctions exhibit superior transport properties, yielding a significant current response at moderate bias as continuous covalent bonding removes vdW gaps and defects. In optoelectronic applications, the photogenerated carrier lifetimes in Bi and Sb reach 61.62 and 286.16 ns owing to weak electron-phonon coupling. Furthermore, the transport and optoelectronic properties of these MS junctions exhibit superior environmental resistance, while O2-induced trap states in Sb enhance photoconductive gain. This work provides a theoretical foundation for designing high-performance electronic and optoelectronic devices.
Collapse
Affiliation(s)
- Zifan Niu
- School of Science, and College of Electronic and Optical Engineering & College of Flexible Electronics (Future Technology), Nanjing University of Posts & Telecommunications, Nanjing 210023, China
| | - Wenchao Shan
- School of Science, and College of Electronic and Optical Engineering & College of Flexible Electronics (Future Technology), Nanjing University of Posts & Telecommunications, Nanjing 210023, China
| | - Xinxin Wang
- School of Physics and Engineering, and Henan Key Laboratory of Photoelectric Energy Storage Materials and Applications, Henan University of Science and Technology, Luoyang 471023, China
| | - Xiuyun Zhang
- College of Physics Science and Technology, Yangzhou University, Yangzhou 225002, China
| | - Anqi Shi
- School of Science, and College of Electronic and Optical Engineering & College of Flexible Electronics (Future Technology), Nanjing University of Posts & Telecommunications, Nanjing 210023, China
| | - Ying Zhang
- School of Science, and College of Electronic and Optical Engineering & College of Flexible Electronics (Future Technology), Nanjing University of Posts & Telecommunications, Nanjing 210023, China
| | - Xianghong Niu
- School of Science, and College of Electronic and Optical Engineering & College of Flexible Electronics (Future Technology), Nanjing University of Posts & Telecommunications, Nanjing 210023, China
| |
Collapse
|
5
|
Wang YJ, Chuang C, Chung CC, Chu PC, Lin WC, Zhang JW, Chueh YL, Yang Z, Huang R, Chang KH, Liu HJ, Liu HL, Sun JY, Chang XY, Chan HC, Luo CW, Sheu YM, Wu JM, Chen YC, Chu YH. Epitaxial Antiferroelectric Bi 2O 2S Films with Superior Photoresponse. ACS APPLIED MATERIALS & INTERFACES 2025; 17:21392-21400. [PMID: 40148227 PMCID: PMC11986903 DOI: 10.1021/acsami.4c22419] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/20/2024] [Revised: 03/06/2025] [Accepted: 03/20/2025] [Indexed: 03/29/2025]
Abstract
Two-dimensional bismuth oxychalcogenide is a rising material system with superior electronic properties. However, a lack of high-quality synthesis impedes the exploration of fundamental understanding and practical applications. This work presents high-quality epitaxial Bi2O2S films on (LaAlO3)0.3(Sr2TaAlO6)0.7 with diverse properties by taking advantage of lattice compatibility. The atomically resolved sharp interface of Bi2O2S/(LaAlO3)0.3(Sr2TaAlO6)0.7 heteroepitaxy is observed with the verification of centrosymmetric breaking through microscopic evidence and macroscopic characterizations. Such an epitaxial feature of the Bi2O2S film provides an essential step for applications compared to those of chemically synthesized nanomaterials. The interior polarization and piezoelectricity can be investigated through atomic-scale observation and RhB degradation of BOS. Meanwhile, this synthesized system can achieve a strong photoresponse with an on/off ratio of ∼104 and a responsivity of ∼60 mA/W in the range of red light (620-750 nm). With these advantages, the demonstrated epitaxial Bi2O2S shows a huge potential for applications in high-performance optoelectronic devices.
Collapse
Affiliation(s)
- Yong-Jyun Wang
- Department
of Materials Science and Engineering, National
Tsing Hua University, Hsinchu 300044, Taiwan
| | - Chuan Chuang
- Department
of Materials Science and Engineering, National
Tsing Hua University, Hsinchu 300044, Taiwan
| | - Chia-Chen Chung
- Department
of Materials Science and Engineering, National
Tsing Hua University, Hsinchu 300044, Taiwan
| | - Po-Chih Chu
- Department
of Photonics, National Sun Yat-sen University, Kaohsiung 804201, Taiwan
| | - Wei-Chun Lin
- Department
of Photonics, National Sun Yat-sen University, Kaohsiung 804201, Taiwan
| | - Jian-Wei Zhang
- Key Laboratory
of Polar Materials and Devices (MOE) and Department of Electronics, East China Normal University, Shanghai 201203, China
| | - Yu-Lun Chueh
- Department
of Materials Science and Engineering, National
Tsing Hua University, Hsinchu 300044, Taiwan
| | - Zhenzhong Yang
- Key Laboratory
of Polar Materials and Devices (MOE) and Department of Electronics, East China Normal University, Shanghai 201203, China
| | - Rong Huang
- Key Laboratory
of Polar Materials and Devices (MOE) and Department of Electronics, East China Normal University, Shanghai 201203, China
| | - Keng-Hung Chang
- Department
of Materials Science and Engineering, National
Chung Hsing University, Taichung 402202, Taiwan
| | - Heng-Jui Liu
- Department
of Materials Science and Engineering, National
Chung Hsing University, Taichung 402202, Taiwan
| | - Hsiang-Lin Liu
- Department
of Physics, National Taiwan Normal University, Taipei 111396, Taiwan
| | - Jia-Yuan Sun
- Department
of Electrophysics, National Yang Ming Chiao
Tung University, Hsinchu 300093, Taiwan
| | - Xin-Yun Chang
- Department
of Electrophysics, National Yang Ming Chiao
Tung University, Hsinchu 300093, Taiwan
| | - Hao-Che Chan
- Department
of Electrophysics, National Yang Ming Chiao
Tung University, Hsinchu 300093, Taiwan
| | - Chih-Wei Luo
- Department
of Electrophysics, National Yang Ming Chiao
Tung University, Hsinchu 300093, Taiwan
- Institute
of Physics, National Yang Ming Chiao Tung
University, Hsinchu 300093, Taiwan
- National
Synchrotron Radiation Research Center, Hsinchu 300092, Taiwan
| | - Yu-Miin Sheu
- Department
of Electrophysics, National Yang Ming Chiao
Tung University, Hsinchu 300093, Taiwan
| | - Jyh-Ming Wu
- Department
of Materials Science and Engineering, National
Tsing Hua University, Hsinchu 300044, Taiwan
| | - Yi-Cheng Chen
- Department
of Materials Science and Engineering, National
Tsing Hua University, Hsinchu 300044, Taiwan
| | - Ying-Hao Chu
- Department
of Materials Science and Engineering, National
Tsing Hua University, Hsinchu 300044, Taiwan
- Department
of Electrophysics, National Yang Ming Chiao
Tung University, Hsinchu 300093, Taiwan
| |
Collapse
|
6
|
Tian Z, He D, Huang M, Wu W, Zhang Y, Liu X, Ren F, Wang J, Li G, Zhao K, Wang Y, Zhang X. Regulating transient optical responses in twisted bilayer WS 2. NANOTECHNOLOGY 2025; 36:185202. [PMID: 40152364 DOI: 10.1088/1361-6528/adc311] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/06/2025] [Accepted: 03/20/2025] [Indexed: 03/29/2025]
Abstract
The optical response manipulation of two-dimensional materials is crucial for designing and optimizing high-performance optoelectronic devices. Previously, optical modulation in two-dimensional semiconductors primarily relied on adjusting carrier density through optical excitation or charge injection using the energy band-filling effect. Recently, twist angle has been found to tune the optical and optoelectronic properties of van der Waals structure, but its impact on the transient optical response remains unexplored. Herein, we demonstrate that twist angle can effectively regulate carrier behaviors by tracing the evolution of optical responses in twisted bilayer WS2from 0° to 60°. Both Raman and PL spectra consistently show that the optical responses of WS2bilayers are highly dependent on the twist angle. Exciton behavior and phonon modes exhibit similarity at twist angles near 0° and 60°, but significantly change as the angle approaches 30°. Moreover, the impact of the twist angle on the transient optical responses was carefully investigated using a femtosecond pump-probe technique. The results reveal a significant decrease in carrier thermalization/relaxation time and exciton formation/recombination time at the WS2bilayers with twist angle of ∼31.0°, as compared to twist angles of ∼2.9° and ∼58.9°, which can be attributed to the accumulation of intralayer carriers due to weakened interlayer coupling. These results demonstrate that twist angle can effectively modulate the optical response of twisted 2D materials. Our study elucidates the dynamic carrier behavior in twisted bilayer WS2and provides new insights for designing future optoelectronic and photonic devices.
Collapse
Affiliation(s)
- Zhiwen Tian
- Key Laboratory of Luminescence and Optical Information, Ministry of Education, Institute of Optoelectronic Technology, Beijing Jiaotong University, Beijing 100044, People's Republic of China
| | - Dawei He
- Key Laboratory of Luminescence and Optical Information, Ministry of Education, Institute of Optoelectronic Technology, Beijing Jiaotong University, Beijing 100044, People's Republic of China
| | - Mohan Huang
- Department of Optical Engineering, Zhejiang A&F University, Lin'an 311300, People's Republic of China
| | - Wenwen Wu
- Key Laboratory of Luminescence and Optical Information, Ministry of Education, Institute of Optoelectronic Technology, Beijing Jiaotong University, Beijing 100044, People's Republic of China
| | - Yinglin Zhang
- Key Laboratory of Luminescence and Optical Information, Ministry of Education, Institute of Optoelectronic Technology, Beijing Jiaotong University, Beijing 100044, People's Republic of China
| | - Xiaojing Liu
- Key Laboratory of Luminescence and Optical Information, Ministry of Education, Institute of Optoelectronic Technology, Beijing Jiaotong University, Beijing 100044, People's Republic of China
| | - Fangying Ren
- Key Laboratory of Luminescence and Optical Information, Ministry of Education, Institute of Optoelectronic Technology, Beijing Jiaotong University, Beijing 100044, People's Republic of China
| | - Jiarong Wang
- Key Laboratory of Luminescence and Optical Information, Ministry of Education, Institute of Optoelectronic Technology, Beijing Jiaotong University, Beijing 100044, People's Republic of China
| | - Guili Li
- Key Laboratory of Luminescence and Optical Information, Ministry of Education, Institute of Optoelectronic Technology, Beijing Jiaotong University, Beijing 100044, People's Republic of China
| | - Kun Zhao
- Key Laboratory of Luminescence and Optical Information, Ministry of Education, Institute of Optoelectronic Technology, Beijing Jiaotong University, Beijing 100044, People's Republic of China
| | - Yongsheng Wang
- Key Laboratory of Luminescence and Optical Information, Ministry of Education, Institute of Optoelectronic Technology, Beijing Jiaotong University, Beijing 100044, People's Republic of China
| | - Xiaoxian Zhang
- Key Laboratory of Luminescence and Optical Information, Ministry of Education, Institute of Optoelectronic Technology, Beijing Jiaotong University, Beijing 100044, People's Republic of China
| |
Collapse
|
7
|
Jiang H, Zhang X, Chen K, He X, Liu Y, Yu H, Gao L, Hong M, Wang Y, Zhang Z, Zhang Y. Two-dimensional Czochralski growth of single-crystal MoS 2. NATURE MATERIALS 2025; 24:188-196. [PMID: 39794636 DOI: 10.1038/s41563-024-02069-7] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/14/2024] [Accepted: 10/29/2024] [Indexed: 01/13/2025]
Abstract
Batch production of single-crystal two-dimensional (2D) transition metal dichalcogenides is one prerequisite for the fabrication of next-generation integrated circuits. Contemporary strategies for the wafer-scale high-quality crystallinity of 2D materials centre on merging unidirectionally aligned, differently sized domains. However, an imperfectly merged area with a translational lattice brings about a high defect density and low device uniformity, which restricts the application of the 2D materials. Here we establish a liquid-to-solid crystallization in 2D space that can rapidly grow a centimetre-scale single-crystal MoS2 domain with no grain boundaries. The large MoS2 single crystal obtained shows superb uniformity and high quality with an ultra-low defect density. A statistical analysis of field effect transistors fabricated from the MoS2 reveals a high device yield and minimal variation in mobility, positioning this FET as an advanced standard monolayer MoS2 device. This 2D Czochralski method has implications for fabricating high-quality and scalable 2D semiconductor materials and devices.
Collapse
Affiliation(s)
- He Jiang
- Academy for Advanced Interdisciplinary Science and Technology, Key Laboratory of Advanced Materials and Devices for Post-Moore Chips Ministry of Education, State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing, P. R. China
- Beijing Advanced Innovation Center for Materials Genome Engineering, School of Materials Science and Engineering, Beijing Key Laboratory for Advanced Energy Materials and Technologies, University of Science and Technology Beijing, Beijing, P. R. China
| | - Xiankun Zhang
- Academy for Advanced Interdisciplinary Science and Technology, Key Laboratory of Advanced Materials and Devices for Post-Moore Chips Ministry of Education, State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing, P. R. China
- Beijing Advanced Innovation Center for Materials Genome Engineering, School of Materials Science and Engineering, Beijing Key Laboratory for Advanced Energy Materials and Technologies, University of Science and Technology Beijing, Beijing, P. R. China
| | - Kuanglei Chen
- Academy for Advanced Interdisciplinary Science and Technology, Key Laboratory of Advanced Materials and Devices for Post-Moore Chips Ministry of Education, State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing, P. R. China
- Beijing Advanced Innovation Center for Materials Genome Engineering, School of Materials Science and Engineering, Beijing Key Laboratory for Advanced Energy Materials and Technologies, University of Science and Technology Beijing, Beijing, P. R. China
| | - Xiaoyu He
- Academy for Advanced Interdisciplinary Science and Technology, Key Laboratory of Advanced Materials and Devices for Post-Moore Chips Ministry of Education, State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing, P. R. China
- Beijing Advanced Innovation Center for Materials Genome Engineering, School of Materials Science and Engineering, Beijing Key Laboratory for Advanced Energy Materials and Technologies, University of Science and Technology Beijing, Beijing, P. R. China
| | - Yihe Liu
- Academy for Advanced Interdisciplinary Science and Technology, Key Laboratory of Advanced Materials and Devices for Post-Moore Chips Ministry of Education, State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing, P. R. China
- Beijing Advanced Innovation Center for Materials Genome Engineering, School of Materials Science and Engineering, Beijing Key Laboratory for Advanced Energy Materials and Technologies, University of Science and Technology Beijing, Beijing, P. R. China
| | - Huihui Yu
- Academy for Advanced Interdisciplinary Science and Technology, Key Laboratory of Advanced Materials and Devices for Post-Moore Chips Ministry of Education, State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing, P. R. China
- Beijing Advanced Innovation Center for Materials Genome Engineering, School of Materials Science and Engineering, Beijing Key Laboratory for Advanced Energy Materials and Technologies, University of Science and Technology Beijing, Beijing, P. R. China
| | - Li Gao
- Academy for Advanced Interdisciplinary Science and Technology, Key Laboratory of Advanced Materials and Devices for Post-Moore Chips Ministry of Education, State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing, P. R. China
- Beijing Advanced Innovation Center for Materials Genome Engineering, School of Materials Science and Engineering, Beijing Key Laboratory for Advanced Energy Materials and Technologies, University of Science and Technology Beijing, Beijing, P. R. China
| | - Mengyu Hong
- Academy for Advanced Interdisciplinary Science and Technology, Key Laboratory of Advanced Materials and Devices for Post-Moore Chips Ministry of Education, State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing, P. R. China
- Beijing Advanced Innovation Center for Materials Genome Engineering, School of Materials Science and Engineering, Beijing Key Laboratory for Advanced Energy Materials and Technologies, University of Science and Technology Beijing, Beijing, P. R. China
| | - Yunan Wang
- Academy for Advanced Interdisciplinary Science and Technology, Key Laboratory of Advanced Materials and Devices for Post-Moore Chips Ministry of Education, State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing, P. R. China
- Beijing Advanced Innovation Center for Materials Genome Engineering, School of Materials Science and Engineering, Beijing Key Laboratory for Advanced Energy Materials and Technologies, University of Science and Technology Beijing, Beijing, P. R. China
| | - Zheng Zhang
- Academy for Advanced Interdisciplinary Science and Technology, Key Laboratory of Advanced Materials and Devices for Post-Moore Chips Ministry of Education, State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing, P. R. China.
- Beijing Advanced Innovation Center for Materials Genome Engineering, School of Materials Science and Engineering, Beijing Key Laboratory for Advanced Energy Materials and Technologies, University of Science and Technology Beijing, Beijing, P. R. China.
| | - Yue Zhang
- Academy for Advanced Interdisciplinary Science and Technology, Key Laboratory of Advanced Materials and Devices for Post-Moore Chips Ministry of Education, State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing, P. R. China.
- Beijing Advanced Innovation Center for Materials Genome Engineering, School of Materials Science and Engineering, Beijing Key Laboratory for Advanced Energy Materials and Technologies, University of Science and Technology Beijing, Beijing, P. R. China.
| |
Collapse
|
8
|
Hadke S, Kang MA, Sangwan VK, Hersam MC. Two-Dimensional Materials for Brain-Inspired Computing Hardware. Chem Rev 2025; 125:835-932. [PMID: 39745782 DOI: 10.1021/acs.chemrev.4c00631] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/23/2025]
Abstract
Recent breakthroughs in brain-inspired computing promise to address a wide range of problems from security to healthcare. However, the current strategy of implementing artificial intelligence algorithms using conventional silicon hardware is leading to unsustainable energy consumption. Neuromorphic hardware based on electronic devices mimicking biological systems is emerging as a low-energy alternative, although further progress requires materials that can mimic biological function while maintaining scalability and speed. As a result of their diverse unique properties, atomically thin two-dimensional (2D) materials are promising building blocks for next-generation electronics including nonvolatile memory, in-memory and neuromorphic computing, and flexible edge-computing systems. Furthermore, 2D materials achieve biorealistic synaptic and neuronal responses that extend beyond conventional logic and memory systems. Here, we provide a comprehensive review of the growth, fabrication, and integration of 2D materials and van der Waals heterojunctions for neuromorphic electronic and optoelectronic devices, circuits, and systems. For each case, the relationship between physical properties and device responses is emphasized followed by a critical comparison of technologies for different applications. We conclude with a forward-looking perspective on the key remaining challenges and opportunities for neuromorphic applications that leverage the fundamental properties of 2D materials and heterojunctions.
Collapse
Affiliation(s)
- Shreyash Hadke
- Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States
| | - Min-A Kang
- Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States
| | - Vinod K Sangwan
- Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States
| | - Mark C Hersam
- Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States
- Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States
- Department of Electrical Engineering and Computer Science, Northwestern University, Evanston, Illinois 60208, United States
| |
Collapse
|
9
|
Ding G, Li H, Zhao J, Zhou K, Zhai Y, Lv Z, Zhang M, Yan Y, Han ST, Zhou Y. Nanomaterials for Flexible Neuromorphics. Chem Rev 2024; 124:12738-12843. [PMID: 39499851 DOI: 10.1021/acs.chemrev.4c00369] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/07/2024]
Abstract
The quest to imbue machines with intelligence akin to that of humans, through the development of adaptable neuromorphic devices and the creation of artificial neural systems, has long stood as a pivotal goal in both scientific inquiry and industrial advancement. Recent advancements in flexible neuromorphic electronics primarily rely on nanomaterials and polymers owing to their inherent uniformity, superior mechanical and electrical capabilities, and versatile functionalities. However, this field is still in its nascent stage, necessitating continuous efforts in materials innovation and device/system design. Therefore, it is imperative to conduct an extensive and comprehensive analysis to summarize current progress. This review highlights the advancements and applications of flexible neuromorphics, involving inorganic nanomaterials (zero-/one-/two-dimensional, and heterostructure), carbon-based nanomaterials such as carbon nanotubes (CNTs) and graphene, and polymers. Additionally, a comprehensive comparison and summary of the structural compositions, design strategies, key performance, and significant applications of these devices are provided. Furthermore, the challenges and future directions pertaining to materials/devices/systems associated with flexible neuromorphics are also addressed. The aim of this review is to shed light on the rapidly growing field of flexible neuromorphics, attract experts from diverse disciplines (e.g., electronics, materials science, neurobiology), and foster further innovation for its accelerated development.
Collapse
Affiliation(s)
- Guanglong Ding
- State Key Laboratory of Radio Frequency Heterogeneous Integration, Shenzhen University, Shenzhen 518060, PR China
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen 518060, PR China
| | - Hang Li
- Institute for Advanced Study, Shenzhen University, Shenzhen 518060, PR China
| | - JiYu Zhao
- Institute for Advanced Study, Shenzhen University, Shenzhen 518060, PR China
- State Key Laboratory of Fine Chemicals, Frontiers Science Center for Smart Materials, Dalian University of Technology, Dalian 116024, China
| | - Kui Zhou
- Institute for Advanced Study, Shenzhen University, Shenzhen 518060, PR China
- The Construction Quality Supervision and Inspection Station of Zhuhai, Zhuhai 519000, PR China
| | - Yongbiao Zhai
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen 518060, PR China
| | - Ziyu Lv
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen 518060, PR China
| | - Meng Zhang
- State Key Laboratory of Radio Frequency Heterogeneous Integration, Shenzhen University, Shenzhen 518060, PR China
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen 518060, PR China
| | - Yan Yan
- State Key Laboratory of Radio Frequency Heterogeneous Integration, Shenzhen University, Shenzhen 518060, PR China
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen 518060, PR China
| | - Su-Ting Han
- Department of Applied Biology and Chemical Technology, The Hong Kong Polytechnic University, Hung Hom 999077, Hong Kong SAR PR China
| | - Ye Zhou
- State Key Laboratory of Radio Frequency Heterogeneous Integration, Shenzhen University, Shenzhen 518060, PR China
- Institute for Advanced Study, Shenzhen University, Shenzhen 518060, PR China
| |
Collapse
|
10
|
Yu Z, Huang X, Bian J, He Y, Lu X, Zheng Q, Xu Z. On-Device Pressure-Tunable Moving Schottky Contacts. NANO LETTERS 2024; 24:12179-12187. [PMID: 39298785 DOI: 10.1021/acs.nanolett.4c03084] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 09/22/2024]
Abstract
Contact engineering enhances electronic device performance and functions but often involves costly, inconvenient fabrication and material replacement processes. We develop an in situ, reversible, full-device-scale approach to reconfigurable 2D van der Waals contacts. Ideal p-type Schottky contacts free from surface dangling bonds and Fermi-level pinning are constructed at structurally superlubric graphite-MoS2 interfaces. Pressure control is introduced, beyond a threshold of which tunneling across the contact can be activated and amplified at higher loads. Record-high figures of merits such an ideality factor nearing 1 and an off-state current of 10-11 A were reported. The concept of on-device moving contacts is demonstrated through a wearless Schottky generator, operating with an optimized overall efficiency of 50% in converting weak, random external stimuli into electricity. The device combines generator and pressure-sensor functions, achieving a high current density of 31 A/m2 and withstanding over 120,000 cycles, making it ideal for neuromorphic computing and mechanosensing applications.
Collapse
Affiliation(s)
- Zhaokuan Yu
- Center for Correlated Matter, School of Physics, Zhejiang University, Hangzhou 310058, China
- Center for Nano and Micro Mechanics, Tsinghua University, Beijing 100084, China
| | - Xuanyu Huang
- Center for Nano and Micro Mechanics, Tsinghua University, Beijing 100084, China
- State Key Laboratory of Tribology and Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China
- Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China
| | - Jinbo Bian
- Applied Mechanics Laboratory, Department of Engineering Mechanics, Tsinghua University, Beijing 100084, China
| | - Yuqing He
- Center for Nano and Micro Mechanics, Tsinghua University, Beijing 100084, China
- State Key Laboratory of Tribology and Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China
- Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China
| | - Xin Lu
- Center for Correlated Matter, School of Physics, Zhejiang University, Hangzhou 310058, China
| | - Quanshui Zheng
- Center for Nano and Micro Mechanics, Tsinghua University, Beijing 100084, China
- State Key Laboratory of Tribology and Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China
- Applied Mechanics Laboratory, Department of Engineering Mechanics, Tsinghua University, Beijing 100084, China
- Institute of Superlubricity Technology, Research Institute of Tsinghua University in Shenzhen, Shenzhen 518057, China
| | - Zhiping Xu
- Center for Nano and Micro Mechanics, Tsinghua University, Beijing 100084, China
- Applied Mechanics Laboratory, Department of Engineering Mechanics, Tsinghua University, Beijing 100084, China
| |
Collapse
|
11
|
Ming Z, Sun H, Wang H, Sheng Z, Wang Y, Zhang Z. Full Two-Dimensional Ambipolar Field-Effect Transistors for Transparent and Flexible Electronics. ACS APPLIED MATERIALS & INTERFACES 2024; 16:45131-45138. [PMID: 39145480 DOI: 10.1021/acsami.4c06602] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 08/16/2024]
Abstract
The unique features of two-dimensional (2D) materials provide significant opportunities for the development of transparent and flexible electronics. Recently, ambipolar 2D semiconductors have advanced innovative applications such as CMOS-like circuits, reconfigurable circuits, and ultrafast neuromorphic image sensors. Here, we report on the fabrication of full 2D ambipolar field-effect transistors (FETs), in which graphene serves as the source/drain/gate electrodes, WSe2 is for the channel, and h-BN is for the dielectric. The produced ambipolar FETs exhibit comparable on-currents in the n-branch and p-branch with on/off ratios up to 108. By using two ambipolar FETs in series, a CMOS-like inverter is demonstrated with a maximum gain of up to 147, which can work in both the first and third quadrants by controlling the supply voltages and input voltages. The full 2D ambipolar FETs yield a transmittance of over 70% for visible light on transparent glass and achieve a curvature radius of less than 0.5 cm for bending on polyethylene terephthalate (PET) substrate. The work is helpful for the application of ambipolar 2D materials-based devices in transparent and flexible electronics.
Collapse
Affiliation(s)
- Ziyu Ming
- School of Microelectronics, Fudan University, Shanghai 200433, China
| | - Haoran Sun
- School of Microelectronics, Fudan University, Shanghai 200433, China
| | - Hu Wang
- School of Microelectronics, Fudan University, Shanghai 200433, China
| | - Zhe Sheng
- School of Microelectronics, Fudan University, Shanghai 200433, China
| | - Yue Wang
- School of Microelectronics, Fudan University, Shanghai 200433, China
| | - Zengxing Zhang
- School of Microelectronics, Fudan University, Shanghai 200433, China
- National Integrated Circuit Innovation Center, Shanghai 201203, China
| |
Collapse
|
12
|
Qin T, Zhao X, Sui Y, Wang D, Chen W, Zhang Y, Luo S, Pan W, Guo Z, Leung DYC. Heterointerfaces: Unlocking Superior Capacity and Rapid Mass Transfer Dynamics in Energy Storage Electrodes. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2402644. [PMID: 38822769 DOI: 10.1002/adma.202402644] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/21/2024] [Revised: 05/05/2024] [Indexed: 06/03/2024]
Abstract
Heterogeneous electrode materials possess abundant heterointerfaces with a localized "space charge effect", which enhances capacity output and accelerates mass/charge transfer dynamics in energy storage devices (ESDs). These promising features open new possibilities for demanding applications such as electric vehicles, grid energy storage, and portable electronics. However, the fundamental principles and working mechanisms that govern heterointerfaces are not yet fully understood, impeding the rational design of electrode materials. In this study, the heterointerface evolution during charging and discharging process as well as the intricate interaction between heterointerfaces and charge/mass transport phenomena, is systematically discussed. Guidelines along with feasible strategies for engineering structural heterointerfaces to address specific challenges encountered in various application scenarios, are also provided. This review offers innovative solutions for the development of heterogeneous electrode materials, enabling more efficient energy storage beyond conventional electrochemistry. Furthermore, it provides fresh insights into the advancement of clean energy conversion and storage technologies. This review contributes to the knowledge and understanding of heterointerfaces, paving the way for the design and optimization of next-generation energy storage materials for a sustainable future.
Collapse
Affiliation(s)
- Tingting Qin
- Department of Mechanical Engineering, The University of Hong Kong, Hong Kong, 999077, China
| | - Xiaolong Zhao
- Department of Mechanical Engineering, The University of Hong Kong, Hong Kong, 999077, China
| | - Yiming Sui
- Department of Chemistry, Oregon State University, Corvallis, OR, 97331-4003, USA
| | - Dong Wang
- Key Laboratory of Automobile Materials of MOE School of Materials Science and Engineering and Jilin Provincial International Cooperation Key Laboratory of High-Efficiency Clean Energy Materials, Jilin University, Changchun, 130013, China
| | - Weicheng Chen
- Department of Mechanical Engineering, The University of Hong Kong, Hong Kong, 999077, China
| | - Yingguang Zhang
- Department of Mechanical Engineering, The University of Hong Kong, Hong Kong, 999077, China
| | - Shijing Luo
- Department of Mechanical Engineering, The University of Hong Kong, Hong Kong, 999077, China
| | - Wending Pan
- Department of Mechanical Engineering, The University of Hong Kong, Hong Kong, 999077, China
| | - Zhenbin Guo
- Institute of Semiconductor Manufacturing Research, Shenzhen University, Shenzhen, 518060, China
| | - Dennis Y C Leung
- Department of Mechanical Engineering, The University of Hong Kong, Hong Kong, 999077, China
| |
Collapse
|
13
|
Yan W, Liu A, Luo Y, Chen Z, Wu G, Chen J, Huang Q, Yang Y, Ye M, Guo W. A Highly Sensitive and Stretchable Core-Shell Fiber Sensor for Gesture Recognition and Surface Pressure Distribution Monitoring. Macromol Rapid Commun 2024; 45:e2400109. [PMID: 38594026 DOI: 10.1002/marc.202400109] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 02/24/2024] [Revised: 04/04/2024] [Indexed: 04/11/2024]
Abstract
This work reports a highly-strain flexible fiber sensor with a core-shell structure utilizes a unique swelling diffusion technique to infiltrate carbon nanotubes (CNTs) into the surface layer of Ecoflex fibers. Compared with traditional blended Ecoflex/CNTs fibers, this manufacturing process ensures that the sensor maintains the mechanical properties (923% strain) of the Ecoflex fiber while also improving sensitivity (gauge factor is up to 3716). By adjusting the penetration time during fabrication, the sensor can be customized for different uses. As an application demonstration, the fiber sensor is integrated into the glove to develop a wearable gesture language recognition system with high sensitivity and precision. Additionally, the authors successfully monitor the pressure distribution on the curved surface of a soccer ball by winding the fiber sensor along the ball's surface.
Collapse
Affiliation(s)
- Weizhe Yan
- Research Institute for Biomimetics and Soft Matter, Fujian Provincial Key Laboratory for Soft Functional Materials Research, Department of Physics, Xiamen University, Xiamen, 361005, P. R. China
- Jiujiang Research Institute, Xiamen University, Jiujiang, 332000, P. R. China
| | - Andeng Liu
- Research Institute for Biomimetics and Soft Matter, Fujian Provincial Key Laboratory for Soft Functional Materials Research, Department of Physics, Xiamen University, Xiamen, 361005, P. R. China
- Jiujiang Research Institute, Xiamen University, Jiujiang, 332000, P. R. China
| | - Yingjin Luo
- Research Institute for Biomimetics and Soft Matter, Fujian Provincial Key Laboratory for Soft Functional Materials Research, Department of Physics, Xiamen University, Xiamen, 361005, P. R. China
- Jiujiang Research Institute, Xiamen University, Jiujiang, 332000, P. R. China
| | - Zhuomin Chen
- Research Institute for Biomimetics and Soft Matter, Fujian Provincial Key Laboratory for Soft Functional Materials Research, Department of Physics, Xiamen University, Xiamen, 361005, P. R. China
| | - Guoxu Wu
- Research Institute for Biomimetics and Soft Matter, Fujian Provincial Key Laboratory for Soft Functional Materials Research, Department of Physics, Xiamen University, Xiamen, 361005, P. R. China
| | - Jianfeng Chen
- Research Institute for Biomimetics and Soft Matter, Fujian Provincial Key Laboratory for Soft Functional Materials Research, Department of Physics, Xiamen University, Xiamen, 361005, P. R. China
| | - Qiaoling Huang
- Research Institute for Biomimetics and Soft Matter, Fujian Provincial Key Laboratory for Soft Functional Materials Research, Department of Physics, Xiamen University, Xiamen, 361005, P. R. China
- Jiujiang Research Institute, Xiamen University, Jiujiang, 332000, P. R. China
| | - Yun Yang
- Research Institute for Biomimetics and Soft Matter, Fujian Provincial Key Laboratory for Soft Functional Materials Research, Department of Physics, Xiamen University, Xiamen, 361005, P. R. China
| | - Meidan Ye
- Research Institute for Biomimetics and Soft Matter, Fujian Provincial Key Laboratory for Soft Functional Materials Research, Department of Physics, Xiamen University, Xiamen, 361005, P. R. China
| | - Wenxi Guo
- Research Institute for Biomimetics and Soft Matter, Fujian Provincial Key Laboratory for Soft Functional Materials Research, Department of Physics, Xiamen University, Xiamen, 361005, P. R. China
- Jiujiang Research Institute, Xiamen University, Jiujiang, 332000, P. R. China
| |
Collapse
|
14
|
Assi DS, Huang H, Karthikeyan V, Theja VCS, de Souza MM, Roy VAL. Topological Quantum Switching Enabled Neuroelectronic Synaptic Modulators for Brain Computer Interface. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2306254. [PMID: 38532608 DOI: 10.1002/adma.202306254] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/28/2023] [Revised: 03/06/2024] [Indexed: 03/28/2024]
Abstract
Aging and genetic-related disorders in the human brain lead to impairment of daily cognitive functions. Due to their neural synaptic complexity and the current limits of knowledge, reversing these disorders remains a substantial challenge for brain-computer interfaces (BCI). In this work, a solution is provided to potentially override aging and neurological disorder-related cognitive function loss in the human brain through the application of the authors' quantum synaptic device. To illustrate this point, a quantum topological insulator (QTI) Bi2Se2Te-based synaptic neuroelectronic device, where the electric field-induced tunable topological surface edge states and quantum switching properties make them a premier option for establishing artificial synaptic neuromodulation approaches, is designed and developed. Leveraging these unique quantum synaptic properties, the developed synaptic device provides the capability to neuromodulate distorted neural signals, leading to the reversal of age-related disorders via BCI. With the synaptic neuroelectronic characteristics of this device, excellent efficacy in treating cognitive neural dysfunctions through modulated neuromorphic stimuli is demonstrated. As a proof of concept, real-time neuromodulation of electroencephalogram (EEG) deduced distorted event-related potentials (ERP) is demonstrated by modulation of the synaptic device array.
Collapse
Affiliation(s)
- Dani S Assi
- School of Science and Technology, Hong Kong Metropolitan University, Ho Man Tin, Hong Kong, China
| | - Hongli Huang
- Electronics and Nanoscale Engineering, James Watt School of Engineering, University of Glasgow, Glasgow, G12 8QQ, U.K
| | - Vaithinathan Karthikeyan
- School of Science and Technology, Hong Kong Metropolitan University, Ho Man Tin, Hong Kong, China
| | - Vaskuri C S Theja
- Department of Mechanical Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong, China
| | - Maria Merlyne de Souza
- Electronics and Electrical Engineering, The University of Sheffield, Sheffield, S3 7HQ, U.K
| | - Vellaisamy A L Roy
- School of Science and Technology, Hong Kong Metropolitan University, Ho Man Tin, Hong Kong, China
| |
Collapse
|
15
|
Emelianov AV, Pettersson M, Bobrinetskiy II. Ultrafast Laser Processing of 2D Materials: Novel Routes to Advanced Devices. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2402907. [PMID: 38757602 DOI: 10.1002/adma.202402907] [Citation(s) in RCA: 8] [Impact Index Per Article: 8.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/26/2024] [Revised: 04/23/2024] [Indexed: 05/18/2024]
Abstract
Ultrafast laser processing has emerged as a versatile technique for modifying materials and introducing novel functionalities. Over the past decade, this method has demonstrated remarkable advantages in the manipulation of 2D layered materials, including synthesis, structuring, functionalization, and local patterning. Unlike continuous-wave and long-pulsed optical methods, ultrafast lasers offer a solution for thermal heating issues. Nonlinear interactions between ultrafast laser pulses and the atomic lattice of 2D materials substantially influence their chemical and physical properties. This paper highlights the transformative role of ultrafast laser pulses in maskless green technology, enabling subtractive, and additive processes that unveil ways for advanced devices. Utilizing the synergetic effect between the energy states within the atomic layers and ultrafast laser irradiation, it is feasible to achieve unprecedented resolutions down to several nanometers. Recent advancements are discussed in functionalization, doping, atomic reconstruction, phase transformation, and 2D and 3D micro- and nanopatterning. A forward-looking perspective on a wide array of applications of 2D materials, along with device fabrication featuring novel physical and chemical properties through direct ultrafast laser writing, is also provided.
Collapse
Affiliation(s)
- Aleksei V Emelianov
- Nanoscience Center, Department of Chemistry, University of Jyväskylä, Jyväskylä, FI-40014, Finland
| | - Mika Pettersson
- Nanoscience Center, Department of Chemistry, University of Jyväskylä, Jyväskylä, FI-40014, Finland
| | - Ivan I Bobrinetskiy
- BioSense Institute - Research and Development Institute for Information Technologies in Biosystems, University of Novi Sad, Novi Sad, 21000, Serbia
| |
Collapse
|
16
|
Kang T, Park J, Jung H, Choi H, Lee SM, Lee N, Lee RG, Kim G, Kim SH, Kim HJ, Yang CW, Jeon J, Kim YH, Lee S. High-κ Dielectric (HfO 2)/2D Semiconductor (HfSe 2) Gate Stack for Low-Power Steep-Switching Computing Devices. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2312747. [PMID: 38531112 DOI: 10.1002/adma.202312747] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/26/2023] [Revised: 02/20/2024] [Indexed: 03/28/2024]
Abstract
Herein, a high-quality gate stack (native HfO2 formed on 2D HfSe2) fabricated via plasma oxidation is reported, realizing an atomically sharp interface with a suppressed interface trap density (Dit ≈ 5 × 1010 cm-2 eV-1). The chemically converted HfO2 exhibits dielectric constant, κ ≈ 23, resulting in low gate leakage current (≈10-3 A cm-2) at equivalent oxide thickness ≈0.5 nm. Density functional calculations indicate that the atomistic mechanism for achieving a high-quality interface is the possibility of O atoms replacing the Se atoms of the interfacial HfSe2 layer without a substitution energy barrier, allowing layer-by-layer oxidation to proceed. The field-effect-transistor-fabricated HfO2/HfSe2 gate stack demonstrates an almost ideal subthreshold slope (SS) of ≈61 mV dec-1 (over four orders of IDS) at room temperature (300 K), along with a high Ion/Ioff ratio of ≈108 and a small hysteresis of ≈10 mV. Furthermore, by utilizing a device architecture with separately controlled HfO2/HfSe2 gate stack and channel structures, an impact ionization field-effect transistor is fabricated that exhibits n-type steep-switching characteristics with a SS value of 3.43 mV dec-1 at room temperature, overcoming the Boltzmann limit. These results provide a significant step toward the realization of post-Si semiconducting devices for future energy-efficient data-centric computing electronics.
Collapse
Affiliation(s)
- Taeho Kang
- SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, 16419, South Korea
- Department of Nano Science and Technology, Sungkyunkwan University, Suwon, 16419, South Korea
| | - Joonho Park
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, South Korea
| | - Hanggyo Jung
- Department of Semiconductor Convergence Engineering, Sungkyunkwan University, Suwon, 16419, South Korea
| | - Haeju Choi
- SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, 16419, South Korea
- Department of Nano Science and Technology, Sungkyunkwan University, Suwon, 16419, South Korea
| | - Sang-Min Lee
- SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, 16419, South Korea
- Department of Nano Science and Technology, Sungkyunkwan University, Suwon, 16419, South Korea
| | - Nayeong Lee
- SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, 16419, South Korea
- Department of Nano Science and Technology, Sungkyunkwan University, Suwon, 16419, South Korea
| | - Ryong-Gyu Lee
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, South Korea
| | - Gahye Kim
- Department of Advanced Materials Science & Engineering, Sungkyunkwan University, Suwon, 16419, South Korea
| | - Seung-Hwan Kim
- Center for Spintronics, Korea Institute of Science and Technology/Hwarang-ro 14-gil, Seongbuk-gu, Seoul, 02792, South Korea
| | - Hyung-Jun Kim
- Center for Spintronics, Korea Institute of Science and Technology/Hwarang-ro 14-gil, Seongbuk-gu, Seoul, 02792, South Korea
| | - Cheol-Woong Yang
- Department of Advanced Materials Science & Engineering, Sungkyunkwan University, Suwon, 16419, South Korea
| | - Jongwook Jeon
- School of Electronic and Electrical Engineering, Sungkyunkwan University, Suwon, 16419, South Korea
| | - Yong-Hoon Kim
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, South Korea
| | - Sungjoo Lee
- SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, 16419, South Korea
- Department of Nano Science and Technology, Sungkyunkwan University, Suwon, 16419, South Korea
- Department of Nano Engineering, Sungkyunkwan University, Suwon, 16419, South Korea
| |
Collapse
|
17
|
Josline MJ, Ghods S, Kosame S, Choi JH, Kim W, Kim S, Chang S, Hyun SH, Kim SI, Moon JY, Park HG, Cho SB, Ju H, Lee JH. Uniform Synthesis of Bilayer Hydrogen Substituted Graphdiyne for Flexible Piezoresistive Applications. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024; 20:e2307276. [PMID: 38196162 DOI: 10.1002/smll.202307276] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/22/2023] [Revised: 12/21/2023] [Indexed: 01/11/2024]
Abstract
Graphdiyne (GDY) has garnered significant attention as a cutting-edge 2D material owing to its distinctive electronic, optoelectronic, and mechanical properties, including high mobility, direct bandgap, and remarkable flexibility. One of the key challenges hindering the implementation of this material in flexible applications is its large area and uniform synthesis. The facile growth of centimeter-scale bilayer hydrogen substituted graphdiyne (Bi-HsGDY) on germanium (Ge) substrate is achieved using a low-temperature chemical vapor deposition (CVD) method. This material's field effect transistors (FET) showcase a high carrier mobility of 52.6 cm2 V-1 s-1 and an exceptionally low contact resistance of 10 Ω µm. By transferring the as-grown Bi-HsGDY onto a flexible substrate, a long-distance piezoresistive strain sensor is demonstrated, which exhibits a remarkable gauge factor of 43.34 with a fast response time of ≈275 ms. As a proof of concept, communication by means of Morse code is implemented using a Bi-HsGDY strain sensor. It is believed that these results are anticipated to open new horizons in realizing Bi-HsGDY for innovative flexible device applications.
Collapse
Affiliation(s)
- Mukkath Joseph Josline
- Department of Materials Science and Engineering, Ajou University, Suwon, 16499, South Korea
- Department of Energy Systems Research, Ajou University, Suwon, 16499, South Korea
| | - Soheil Ghods
- Department of Materials Science and Engineering, Ajou University, Suwon, 16499, South Korea
- Department of Energy Systems Research, Ajou University, Suwon, 16499, South Korea
| | - Saikiran Kosame
- Department of Energy Systems Research, Ajou University, Suwon, 16499, South Korea
- Department of Physics, Gachon University, Seongnam, South Korea
| | - Jun-Hui Choi
- Department of Materials Science and Engineering, Ajou University, Suwon, 16499, South Korea
- Department of Energy Systems Research, Ajou University, Suwon, 16499, South Korea
| | - Woongchan Kim
- Department of Materials Science and Engineering, Ajou University, Suwon, 16499, South Korea
- Department of Energy Systems Research, Ajou University, Suwon, 16499, South Korea
| | - Sein Kim
- Department of Materials Science and Engineering, Ajou University, Suwon, 16499, South Korea
- Department of Energy Systems Research, Ajou University, Suwon, 16499, South Korea
| | - SooHyun Chang
- Department of Materials Science and Engineering, Ajou University, Suwon, 16499, South Korea
- Department of Energy Systems Research, Ajou University, Suwon, 16499, South Korea
| | - Sang Hwa Hyun
- Department of Materials Science and Engineering, Ajou University, Suwon, 16499, South Korea
- Department of Energy Systems Research, Ajou University, Suwon, 16499, South Korea
| | - Seung-Il Kim
- Department of Materials Science and Engineering, Ajou University, Suwon, 16499, South Korea
- Department of Energy Systems Research, Ajou University, Suwon, 16499, South Korea
- Department of Mechanical Engineering and Materials Science, Washington University in Saint Louis, Saint Louis, MO, USA
| | - Ji-Yun Moon
- Department of Mechanical Engineering and Materials Science, Washington University in Saint Louis, Saint Louis, MO, USA
| | - Hyeong Gi Park
- AI-Superconvergence KIURI Translational Research Center, Ajou University, School of Medicine, Suwon, 16499, South Korea
| | - Sung Beom Cho
- Department of Materials Science and Engineering, Ajou University, Suwon, 16499, South Korea
- Department of Energy Systems Research, Ajou University, Suwon, 16499, South Korea
| | - Heongkyu Ju
- Department of Physics, Gachon University, Seongnam, South Korea
| | - Jae-Hyun Lee
- Department of Materials Science and Engineering, Ajou University, Suwon, 16499, South Korea
- Department of Energy Systems Research, Ajou University, Suwon, 16499, South Korea
| |
Collapse
|
18
|
Choi GS, Park S, An ES, Bae J, Shin I, Kang BT, Won CJ, Cheong SW, Lee HW, Lee GH, Cho WJ, Kim JS. Highly Efficient Room-Temperature Spin-Orbit-Torque Switching in a Van der Waals Heterostructure of Topological Insulator and Ferromagnet. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2024; 11:e2400893. [PMID: 38520060 DOI: 10.1002/advs.202400893] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/01/2024] [Indexed: 03/25/2024]
Abstract
All-Van der Waals (vdW)-material-based heterostructures with atomically sharp interfaces offer a versatile platform for high-performing spintronic functionalities at room temperature. One of the key components is vdW topological insulators (TIs), which can produce a strong spin-orbit-torque (SOT) through the spin-momentum locking of their topological surface state (TSS). However, the relatively low conductance of the TSS introduces a current leakage problem through the bulk states of the TI or the adjacent ferromagnetic metal layers, reducing the interfacial charge-to-spin conversion efficiency (qICS). Here, a vdW heterostructure is used consisting of atomically-thin layers of a bulk-insulating TI Sn-doped Bi1.1Sb0.9Te2S1 and a room-temperature ferromagnet Fe3GaTe2, to enhance the relative current ratio on the TSS up to ≈20%. The resulting qICS reaches ≈1.65 nm-1 and the critical current density Jc ≈0.9 × 106 Acm-2 at 300 K, surpassing the performance of TI-based and heavy-metal-based SOT devices. These findings demonstrate that an all-vdW heterostructure with thickness optimization offers a promising platform for efficient current-controlled magnetization switching at room temperature.
Collapse
Affiliation(s)
- Gyu Seung Choi
- Department of Physics, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea
- Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS), Pohang, 37673, Republic of Korea
| | - Sungyu Park
- Department of Physics, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea
| | - Eun-Su An
- Department of Physics, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea
- Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS), Pohang, 37673, Republic of Korea
| | - Juhong Bae
- Department of Physics, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea
| | - Inseob Shin
- Department of Physics, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea
| | - Beom Tak Kang
- Department of Physics, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea
- Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS), Pohang, 37673, Republic of Korea
| | - Choong Jae Won
- Center for Complex Phase of Materials, Max Planck POSTECH/Korea Research Initiative, Pohang, 37673, Republic of Korea
- Laboratory for Pohang Emergent Materials, Department of Physics, POSTECH, Pohang, 37673, Republic of Korea
| | - Sang-Wook Cheong
- Center for Complex Phase of Materials, Max Planck POSTECH/Korea Research Initiative, Pohang, 37673, Republic of Korea
- Laboratory for Pohang Emergent Materials, Department of Physics, POSTECH, Pohang, 37673, Republic of Korea
- Rutgers Center for Emergent Materials and Department of Physics and Astronomy, Rutgers University, Piscataway, NJ, 08854, USA
| | - Hyun-Woo Lee
- Department of Physics, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea
| | - Gil-Ho Lee
- Department of Physics, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea
| | - Won Joon Cho
- Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics Co., Ltd, 130 Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, 16678, Republic of Korea
| | - Jun Sung Kim
- Department of Physics, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea
- Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS), Pohang, 37673, Republic of Korea
| |
Collapse
|
19
|
Zou T, Heo S, Byeon G, Yoo S, Kim M, Reo Y, Kim S, Liu A, Noh YY. Two-Dimensional Tunneling Memtransistor with Thin-Film Heterostructure for Low-Power Logic-in-Memory Complementary Metal-Oxide Semiconductor. ACS NANO 2024; 18:13849-13857. [PMID: 38748609 DOI: 10.1021/acsnano.4c02711] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/29/2024]
Abstract
With the demand for high-performance and miniaturized semiconductor devices continuously rising, the development of innovative tunneling transistors via efficient stacking methods using two-dimensional (2D) building blocks has paramount importance in the electronic industry. Hence, 2D semiconductors with atomically thin geometries hold significant promise for advancements in electronics. In this study, we introduced tunneling memtransistors with a thin-film heterostructure composed of 2D semiconducting MoS2 and WSe2. Devices with the dual function of tuning and memory operation were realized by the gate-regulated modulation of the barrier height at the heterojunction and manipulation of intrinsic defects within the exfoliated nanoflakes using solution processes. Further, our investigation revealed extensive edge defects and four distinct defect types, namely monoselenium vacancies, diselenium vacancies, tungsten vacancies, and tungsten adatoms, in the interior of electrochemically exfoliated WSe2 nanoflakes. Additionally, we constructed complementary metal-oxide semiconductor-based logic-in-memory devices with a small static power in the range of picowatts using the developed tunneling memtransistors, demonstrating a promising approach for next-generation low-power nanoelectronics.
Collapse
Affiliation(s)
- Taoyu Zou
- Department of Chemical Engineering, Pohang University of Science and Technology, 77 Cheongam-Ro, Nam-Gu, Pohang 37673, Republic of Korea
| | - Seongmin Heo
- Department of Chemical Engineering, Pohang University of Science and Technology, 77 Cheongam-Ro, Nam-Gu, Pohang 37673, Republic of Korea
| | - Gwon Byeon
- Department of Chemical Engineering, Pohang University of Science and Technology, 77 Cheongam-Ro, Nam-Gu, Pohang 37673, Republic of Korea
| | - Soohwan Yoo
- Department of Chemical Engineering, Pohang University of Science and Technology, 77 Cheongam-Ro, Nam-Gu, Pohang 37673, Republic of Korea
| | - Mingyu Kim
- Department of Chemical Engineering, Pohang University of Science and Technology, 77 Cheongam-Ro, Nam-Gu, Pohang 37673, Republic of Korea
| | - Youjin Reo
- Department of Chemical Engineering, Pohang University of Science and Technology, 77 Cheongam-Ro, Nam-Gu, Pohang 37673, Republic of Korea
| | - Soonhyo Kim
- Department of Chemical Engineering, Pohang University of Science and Technology, 77 Cheongam-Ro, Nam-Gu, Pohang 37673, Republic of Korea
| | - Ao Liu
- Institute of Fundamental and Frontier Sciences, University of Electronic Science and Technology of China, Chengdu 611731, China
| | - Yong-Young Noh
- Department of Chemical Engineering, Pohang University of Science and Technology, 77 Cheongam-Ro, Nam-Gu, Pohang 37673, Republic of Korea
| |
Collapse
|
20
|
Ji Y, Yang S, Ahn HB, Moon KW, Ju TS, Im MY, Han HS, Lee J, Park SY, Lee C, Kim KJ, Hwang C. Direct Observation of Room-Temperature Magnetic Skyrmion Motion Driven by Ultra-Low Current Density in Van Der Waals Ferromagnets. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2312013. [PMID: 38270245 DOI: 10.1002/adma.202312013] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/12/2023] [Revised: 01/05/2024] [Indexed: 01/26/2024]
Abstract
The recent discovery of room-temperature ferromagnetism in 2D van der Waals (vdW) materials, such as Fe3GaTe2 (FGaT), has garnered significant interest in offering a robust platform for 2D spintronic applications. Various fundamental operations essential for the realization of 2D spintronics devices are experimentally confirmed using these materials at room temperature, such as current-induced magnetization switching or tunneling magnetoresistance. Nevertheless, the potential applications of magnetic skyrmions in FGaT systems at room temperature remain unexplored. In this work, the current-induced generation of magnetic skyrmions in FGaT flakes employing high-resolution magnetic transmission soft X-ray microscopy is introduced, supported by a feasible mechanism based on thermal effects. Furthermore, direct observation of the current-induced magnetic skyrmion motion at room temperature in FGaT flakes is presented with ultra-low threshold current density. This work highlights the potential of FGaT as a foundation for room-temperature-operating 2D skyrmion device applications.
Collapse
Affiliation(s)
- Yubin Ji
- Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon, 34141, Republic of Korea
| | - Seungmo Yang
- Quantum Spin Team, Korea Research Institute of Standards and Science, Daejeon, 34113, Republic of Korea
| | - Hyo-Bin Ahn
- SKKU Advanced Institute of Nanotechnology, Sungkyunkwan University, Suwon, 16419, Republic of Korea
| | - Kyoung-Woong Moon
- Quantum Spin Team, Korea Research Institute of Standards and Science, Daejeon, 34113, Republic of Korea
| | - Tae-Seong Ju
- Quantum Spin Team, Korea Research Institute of Standards and Science, Daejeon, 34113, Republic of Korea
| | - Mi-Young Im
- Center for X-ray Optics, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA
| | - Hee-Sung Han
- Center for X-ray Optics, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA
- Department of Materials Science and Engineering, Korea National University of Transportation, Chungju, 27469, Republic of Korea
| | - Jisung Lee
- Center for scientific instrumentation, Korea Basic Science Institute, Daejeon, 34133, Republic of Korea
| | - Seung-Young Park
- Center for scientific instrumentation, Korea Basic Science Institute, Daejeon, 34133, Republic of Korea
| | - Changgu Lee
- School of Mechanical Engineering, Sungykunkwan University, Suwon, 16419, Republic of Korea
| | - Kab-Jin Kim
- Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon, 34141, Republic of Korea
| | - Chanyong Hwang
- Quantum Spin Team, Korea Research Institute of Standards and Science, Daejeon, 34113, Republic of Korea
| |
Collapse
|
21
|
Yu L, Liu X, Chen M, Peng J, Xu T, Gao W, Yang M, Du C, Yao J, Song W, Dong H, Li J, Zheng Z. Activation of the Photosensitive Potential of 2D GaSe by Interfacial Engineering. ACS APPLIED MATERIALS & INTERFACES 2024; 16:22207-22216. [PMID: 38629723 DOI: 10.1021/acsami.4c03191] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/03/2024]
Abstract
Two-dimensional (2D) gallium selenide (GaSe) holds great promise for pioneering advancements in photodetection due to its exceptional electronic and optoelectronic properties. However, in conventional photodetectors, 2D GaSe only functions as a photosensitive layer, failing to fully exploit its inherent photosensitive potential. Herein, we propose an ultrasensitive photodetector based on out-of-plane 2D GaSe/MoSe2 heterostructure. Through interfacial engineering, 2D GaSe serves not only as the photosensitive layer but also as the photoconductive gain and passivation layer, introducing a photogating effect and extending the lifetime of photocarriers. Capitalizing on these features, the device exhibits exceptional photodetection performance, including a responsivity of 28 800 A/W, specific detectivity of 7.1 × 1014 Jones, light on/off ratio of 1.2 × 106, and rise/fall time of 112.4/426.8 μs. Moreover, high-resolution imaging under various wavelengths is successfully demonstrated using this device. Additionally, we showcase the generality of this device design by activating the photosensitive potential of 2D GaSe with other transition metal dichalcogenides (TMDCs) such as WSe2, WS2, and MoS2. This work provides inspiration for future development in high-performance photodetectors, shining a spotlight on the potential of 2D GaSe and its heterostructure.
Collapse
Affiliation(s)
- Liang Yu
- Guangdong Provincial Key Laboratory of Information Photonics Technology, School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, Guangdong, P. R. China
- School of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou 510006, P. R. China
| | - Xinyue Liu
- Guangdong Provincial Key Laboratory of Nanophotonic Manipulation, Institute of Nanophotonics, Jinan University, Guangzhou 511443, P. R. China
| | - Meifei Chen
- Guangdong Provincial Key Laboratory of Information Photonics Technology, School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, Guangdong, P. R. China
| | - Junhao Peng
- School of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou 510006, P. R. China
| | - Ting Xu
- School of Material Science & Engineering, Shaanxi University of Science & Technology, Xi'an 710021, P. R. China
| | - Wei Gao
- School of Semiconductor Science and Technology, South China Normal University, Foshan 528225, Guangdong, P.R. China
| | - Mengmeng Yang
- School of Semiconductor Science and Technology, South China Normal University, Foshan 528225, Guangdong, P.R. China
| | - Chun Du
- Guangdong Provincial Key Laboratory of Optical Fiber Sensing and Communication, Institute of Photonics Technology, Jinan University, Guangzhou 510632, P. R. China
| | - Jiandong Yao
- State Key Laboratory of Optoelectronic Materials and Technologies, Nanotechnology Research Center, School of Materials Science & Engineering, Sun Yat-sen University, Guangzhou 510275, Guangdong, P. R. China
| | - Wei Song
- Analysis and Test Center, Guangdong University of Technology, Guangzhou 510006, Guangdong, P. R. China
| | - Huafeng Dong
- School of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou 510006, P. R. China
| | - Jingbo Li
- College of Optical Science and Engineering, Zhejiang University, Hangzhou 310027, Zhejiang, P. R. China
| | - Zhaoqiang Zheng
- Guangdong Provincial Key Laboratory of Information Photonics Technology, School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, Guangdong, P. R. China
| |
Collapse
|
22
|
Wang J, Huang C, Xing Y, Shao X. Facet-Dependent Interfacial Charge Transfer between T-Phase VS 2 Nanoflakes and Rutile TiO 2 Single Crystals. ACS APPLIED MATERIALS & INTERFACES 2024. [PMID: 38621278 DOI: 10.1021/acsami.4c01437] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 04/17/2024]
Abstract
The hybridizations of two-dimensional (2D) metallic materials with semiconducting transition metal oxides (TMOs) register attractive heterojunctions, which can find various applications in photostimulated circumstances. In this work, we developed an ambient-pressure chemical vapor deposition method to directly grow T-VS2 on atomically smooth rutile TiO2 single crystals with different terminations and thus successfully constructed a heterojunction model of VS2/TiO2 with a well-defined clean interface. Detailed measurements with Kelvin probe force microscopy revealed the facet-dependent charge transfer occurring at the VS2/TiO2 interfaces, seeing variations not only in the amount and direction of the transferred electrons but also in the photoinduced surface potential changes and the dynamics of photogenerated charge carriers under ultraviolet irradiation. Interestingly, ultrathin T-VS2 was found with considerable magnetism at room temperature, disregarding the charge exchange with the TiO2 substrates. These results may bring deep insights into the photoinspired functionalities of the hybridized system combining metallic transition metal dichalcogenides and TMO materials.
Collapse
Affiliation(s)
- Jingjing Wang
- Department of Chemical Physics, Key Laboratory of Precision and Intelligent Chemistry, University of Science and Technology of China, Hefei, Anhui 230026, China
| | - Chenxi Huang
- Department of Chemical Physics, Key Laboratory of Precision and Intelligent Chemistry, University of Science and Technology of China, Hefei, Anhui 230026, China
| | - Yue Xing
- Department of Chemical Physics, Key Laboratory of Precision and Intelligent Chemistry, University of Science and Technology of China, Hefei, Anhui 230026, China
| | - Xiang Shao
- Department of Chemical Physics, Key Laboratory of Precision and Intelligent Chemistry, University of Science and Technology of China, Hefei, Anhui 230026, China
| |
Collapse
|
23
|
Song S, Kim SH, Han KH, Kim HJ, Yu HY. In-Depth Analysis on Self Alignment Effect of the Fermi-Level Using Graphene on Both n- and p-Type Semiconductors. ACS APPLIED MATERIALS & INTERFACES 2023. [PMID: 38033204 DOI: 10.1021/acsami.3c14386] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/02/2023]
Abstract
Optimizing the contact structure while reducing the contact resistance in advanced transistors has become an extremely challenging problem. Because the existing techniques are limited to controlling only one semiconductor type, either n- or p-type, owing to their work function differences, significant challenges are encountered in the integration of a contact structure and metal suitable for both n- and p-type semiconductors. This is a formidable drawback of the complementary metal-oxide-semiconductor (CMOS) technology. In this paper, we demonstrate the effectiveness of a metal/graphene/semiconductor (MGrS) as a universal source/drain contact structure for both n- and p-type transistors. The MGrS contact structure significantly enhanced the reverse current density (JR) and reduced the Schottky barrier height (SBH) for both semiconductor types. From the analysis of the SBH values and their relationship with the metal work function, which refers to the S-parameter, the van der Waals contact of graphene (Gr) effectively alleviated the Fermi level (FL) pinning for both semiconductor types, reducing the metal-induced gap states (MIGS) at the Gr/semiconductor interface. Furthermore, Gr effectively modulated the work function of the contact metal to yield a position favorable for each semiconductor type. Consequently, a single MGrS contact structure on a Si substrate resulted in excellent Ohmic contacts in both n- and p-type Si, with SBH values reduced to 0.012 and 0.024 eV for n- and p-type Si, respectively. This new approach for integrating the contact structures of semiconductor types will lead to extended capabilities for high-performance device applications and CMOS logical circuitry.
Collapse
Affiliation(s)
- Sungjoo Song
- Department of Semiconductor Systems Engineering, Korea University, Seoul 02841, Korea
| | - Seung-Hwan Kim
- Center for Spintronics, Korea Institute of Science and Technology (KIST), Seoul 02792, Korea
| | - Kyu-Hyun Han
- Department of Electrical Engineering, Korea University, Seoul 02841, Korea
| | - Hyung-Jun Kim
- Center for Spintronics, Korea Institute of Science and Technology (KIST), Seoul 02792, Korea
- Division of Nano & Information Technology, KIST School, Korea University of Science & Technology (UST), Seoul 02792, Republic of Korea
| | - Hyun-Yong Yu
- Department of Semiconductor Systems Engineering, Korea University, Seoul 02841, Korea
- Department of Electrical Engineering, Korea University, Seoul 02841, Korea
| |
Collapse
|
24
|
Lee GS, Kim JG, Kim JT, Lee CW, Cha S, Choi GB, Lim J, Padmajan Sasikala S, Kim SO. 2D Materials Beyond Post-AI Era: Smart Fibers, Soft Robotics, and Single Atom Catalysts. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023:e2307689. [PMID: 37777874 DOI: 10.1002/adma.202307689] [Citation(s) in RCA: 6] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/01/2023] [Revised: 09/18/2023] [Indexed: 10/02/2023]
Abstract
Recent consecutive discoveries of various 2D materials have triggered significant scientific and technological interests owing to their exceptional material properties, originally stemming from 2D confined geometry. Ever-expanding library of 2D materials can provide ideal solutions to critical challenges facing in current technological trend of the fourth industrial revolution. Moreover, chemical modification of 2D materials to customize their physical/chemical properties can satisfy the broad spectrum of different specific requirements across diverse application areas. This review focuses on three particular emerging application areas of 2D materials: smart fibers, soft robotics, and single atom catalysts (SACs), which hold immense potentials for academic and technological advancements in the post-artificial intelligence (AI) era. Smart fibers showcase unconventional functionalities including healthcare/environmental monitoring, energy storage/harvesting, and antipathogenic protection in the forms of wearable fibers and textiles. Soft robotics aligns with future trend to overcome longstanding limitations of hard-material based mechanics by introducing soft actuators and sensors. SACs are widely useful in energy storage/conversion and environmental management, principally contributing to low carbon footprint for sustainable post-AI era. Significance and unique values of 2D materials in these emerging applications are highlighted, where the research group has devoted research efforts for more than a decade.
Collapse
Affiliation(s)
- Gang San Lee
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon, 34141, Republic of Korea
- KAIST Institute for Nanocentry, KAIST, Daejeon, 34141, Republic of Korea
| | - Jin Goo Kim
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon, 34141, Republic of Korea
- KAIST Institute for Nanocentry, KAIST, Daejeon, 34141, Republic of Korea
| | - Jun Tae Kim
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon, 34141, Republic of Korea
- KAIST Institute for Nanocentry, KAIST, Daejeon, 34141, Republic of Korea
| | - Chan Woo Lee
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon, 34141, Republic of Korea
- KAIST Institute for Nanocentry, KAIST, Daejeon, 34141, Republic of Korea
| | - Sujin Cha
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon, 34141, Republic of Korea
- KAIST Institute for Nanocentry, KAIST, Daejeon, 34141, Republic of Korea
| | - Go Bong Choi
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon, 34141, Republic of Korea
- KAIST Institute for Nanocentry, KAIST, Daejeon, 34141, Republic of Korea
| | - Joonwon Lim
- Department of Information Display, Kyung Hee University, Seoul, 02447, Republic of Korea
- KHU-KIST Department of Converging Science and Technology, Kyung Hee University, Seoul, 02447, Republic of Korea
| | - Suchithra Padmajan Sasikala
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon, 34141, Republic of Korea
- KAIST Institute for Nanocentry, KAIST, Daejeon, 34141, Republic of Korea
| | - Sang Ouk Kim
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon, 34141, Republic of Korea
- KAIST Institute for Nanocentry, KAIST, Daejeon, 34141, Republic of Korea
- Materials Creation, Seoul, 06179, Republic of Korea
| |
Collapse
|
25
|
Zheng T, Yang M, Pan Y, Zheng Z, Sun Y, Li L, Huo N, Luo D, Gao W, Li J. Self-Powered Photodetector with High Efficiency and Polarization Sensitivity Enabled by WSe 2/Ta 2NiSe 5/WSe 2 van der Waals Dual Heterojunction. ACS APPLIED MATERIALS & INTERFACES 2023. [PMID: 37294943 DOI: 10.1021/acsami.3c04147] [Citation(s) in RCA: 16] [Impact Index Per Article: 8.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Self-powered photodetectors have triggered widespread attention because of the requirement of Internet of Things (IoT) application and low power consumption. However, it is challenging to simultaneously implement miniaturization, high quantum efficiency, and multifunctionalization. Here, we report a high-efficiency and polarization-sensitive photodetector enabled by two-dimensional (2D) WSe2/Ta2NiSe5/WSe2 van der Waals (vdW) dual heterojunctions (DHJ) along with a sandwich-like electrode pair. On account of enhanced light collection efficiency and two opposite built-in electric fields at the hetero-interfaces, the DHJ device achieves not only a broadband spectral response of 400-1550 nm but outstanding performance under 635 nm light illumination including an ultrahigh external quantum efficiency (EQE) of 85.5%, a pronounced power conversion efficiency (PCE) of 1.9%, and a fast response speed of 420/640 μs, which is much better than that of the WSe2/Ta2NiSe5 single heterojunction (SHJ). Significantly, based on the strong in-plane anisotropy of 2D Ta2NiSe5 nanosheets, the DHJ device shows competitive polarization sensitivities of 13.9 and 14.8 under 635 and 808 nm light, respectively. Furthermore, an excellent self-powered visible imaging capability based on the DHJ device is demonstrated. These results pave a promising platform for realizing self-powered photodetectors with high performance and multifunctionality.
Collapse
Affiliation(s)
- Tao Zheng
- Guangdong Provincial Key Laboratory of Chip and Integration Technology, School of Semiconductor Science and Technology, South China Normal University, Foshan 528225, P. R. China
| | - Mengmeng Yang
- Guangdong Provincial Key Laboratory of Chip and Integration Technology, School of Semiconductor Science and Technology, South China Normal University, Foshan 528225, P. R. China
| | - Yuan Pan
- Guangdong Provincial Key Laboratory of Chip and Integration Technology, School of Semiconductor Science and Technology, South China Normal University, Foshan 528225, P. R. China
| | - Zhaoqiang Zheng
- College of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, P. R. China
| | - Yiming Sun
- Guangdong Provincial Key Laboratory of Chip and Integration Technology, School of Semiconductor Science and Technology, South China Normal University, Foshan 528225, P. R. China
| | - Ling Li
- Guangdong Provincial Key Laboratory of Chip and Integration Technology, School of Semiconductor Science and Technology, South China Normal University, Foshan 528225, P. R. China
| | - Nengjie Huo
- Guangdong Provincial Key Laboratory of Chip and Integration Technology, School of Semiconductor Science and Technology, South China Normal University, Foshan 528225, P. R. China
| | - Dongxiang Luo
- Huangpu Hydrogen Innovation Center/Guangzhou Key Laboratory for Clean Energy and Materials, School of Chemistry and Chemical Engineering, Guangzhou University, Guangzhou 510006, P. R. China
| | - Wei Gao
- Guangdong Provincial Key Laboratory of Chip and Integration Technology, School of Semiconductor Science and Technology, South China Normal University, Foshan 528225, P. R. China
| | - Jingbo Li
- Guangdong Provincial Key Laboratory of Chip and Integration Technology, School of Semiconductor Science and Technology, South China Normal University, Foshan 528225, P. R. China
| |
Collapse
|