Self-assembled block copolymers: Bulk to thin film

UV-Responsive Adhesive Based on Polystyrene-block-Poly(Ethyl Lipoate) Copolymer

Block copolymers (BCPs), capable of self-assembling into various nanoscale structures, are widely used in adhesives owing to their versatile properties. However, conventional BCP-based adhesives pose environmental concerns: they are petroleum-derived, non-degradable, and have a non-tunable adhesion strength. To address these challenges, a novel BCP is designed comprising a conventional hard segment, polystyrene (PS), and a green rubbery segment, poly(ethyl lipoate) (PEtLp), derived from the bio-based molecule α-lipoic acid. The PS-b-PEtLp is synthesized via the base-catalyzed ring-opening polymerization from thiol-terminated PS. Adhesion tests showed that PS-b-PEtLp with cylindrical nanostructures exhibited higher adhesion strength than that with lamellar structures. Importantly, the dynamic disulfide bonds in PEtLp enable a reversible and adjustable adhesion strength under UV light. Upon UV irradiation, the adhesion strength decreases by approximately half, facilitating easy separation from the adherends. Additionally, the selective depolymerization of the PEtLp block achieves 100% conversion, enabling the recovery of the monomer (EtLp) and macroinitiator (thiol-terminated PS). This study introduces a sustainable, degradable, and reusable adhesive derived from renewable resources, providing a promising solution to the environmental challenges associated with traditional petroleum-based adhesives.

Tetragonally and Rectangularly Packed Hierarchical Cylinders from A1BA2C Tetrablock Terpolymer

Hierarchical cylindrical nanostructures with different diameters (or shapes) have received much attention because of potential applications to next-generation lithography or advanced optical devices. Herein, via small-angle X-ray scattering and transmission electron microscopy, tetragonally and rectangularly packed hierachical cylindrical nanostructures are observed by tailoring the volume fraction of polystyrene mid-block in polystyrene-b-polyisoprene-b-polystyrene-b-poly(2-vinylpyridine) tetrablock terpolymer (S1IS2V). P2VP becomes the main cylinder, while PI forms satellite cylinders surrounding the main P2VP cylinder. When the length of S2 block is relatively short, tetragonal arrangement of cylinders is observed. But, a rectangular arrangement of cylinders is formed for larger S2 block. The experimentally observed hierarchical cylindrical nanostructures are in good agreement with the prediction by the self-consistent field theory.

High-Density Packing of Spherical Microdomains from A(AB3)3 Dendron-like Miktoarm Star Copolymer

An A(AB3)3 dendron-like miktoarm star copolymer consisting of polystyrene (PS, A) and poly(2-vinylpyridine) (P2VP, B) was synthesized using a series of anionic polymerization, atom-transfer radical polymerization (ATRP), and click reaction. The morphology of A(AB3)3 changed greatly depending on the volume fraction of A and the chain asymmetry. Interestingly, a body-centered cubic spherical phase was found even at fA = 0.51 because the chain architecture of A(AB3)3 stabilizes the large interfacial curvature toward A domains. On the other hand, when the length difference between the end and middle A blocks decreased, a hexagonally packed cylindrical phase was formed at fA = 0.50. This is attributed to the fact that the middle A chains are arranged in a more relaxed way, resulting in a milder interfacial curvature toward A domains. The experimental observations are well-consistent with the predictions based on self-consistent-field theory.

Tetragonally Packed Inverted Cylindrical Microdomains from Binary Block Copolymer Blends with Enhanced Hydrogen Bonding

Hexagonally packed (HEX) cylindrical microdomains can be obtained through the self-assembly of block copolymers (BCPs) with a moderately asymmetric volume fraction of one block (f), resulting in the formation of minor cylinders. However, for next-generation lithography and high-density memory devices, it is desirable to obtain densely and tetragonally packed inverted cylindrical microdomains, which are composed of the major block in the minor matrix. The inverted cylinders differ from conventional HEX cylinders, which consist of the minor block in the matrix of the major block. In this study, we achieved this objective by utilizing a binary blend of a polystyrene-b-poly(4-vinylpyridine) copolymer (S4VP) and polystyrene-b-poly(4-hydroxystyrene) copolymer (SHS), where the P4VP block exhibited a strong hydrogen bonding interaction with the PHS block. By carefully controlling the molecular weight ratio of S4VP and SHS as well as the blend composition, we successfully observed tetragonally packed inverted PS cylinders with a square cross-section at a volume fraction of PS of 0.69.

Self-assembled pagoda-like nanostructure-induced vertically stacked split-ring resonators for polarization-sensitive dichroic responses

Stacked split-ring resonators (SSRR) arrays exhibiting polarization-sensitive dichroic responses in both visible and near-infrared wavelengths are realized over a centimeter-scale large area. The SSRR arrays are derived from pagoda-like nanorods fabricated from the self-assembly of a lamellae-forming polystyrene-b-poly (methyl methacrylate) copolymer (PS-b-PMMA) confined in cylindrical pores of anodized aluminum oxide (AAO) template. Along the nanorod direction, PS and PMMA nanodomains were alternately stacked with the same distance. Silver crescents and semi-hemispherical covers, which are essential for SSRR with the polarization sensitivity, were obliquely deposited on the single side of the nanorod after removing the AAO template and reactive-ion etching treatment. These sophisticated nanoscale architectures made by bottom-up fabrication can be applied to structural color, optical anti-counterfeiting, and commercial optical components in a large area.

Multidomain Helical Nanostructure by A1BA2C Tetrablock Terpolymer Self-Assembly

Among many possible nanostructures in block copolymer self-assembly, helical nanostructures are particularly important because of potential applications for heterogeneous catalysts and plasmonic materials. In this work, we investigated, via small-angle X-ray scattering and transmission electron microscopy, the morphology of a polystyrene-block-polyisoprene-block-polystyrene-block-poly(2-vinylpyridine) (S₁IS₂V) tetrablock terpolymer. Very interestingly, when the volume fraction of each block was 0.685, 0.125, 0.060, and 0.130, respectively, a multidomain double-stranded helical nanostructure (MH₂) was formed: P2VP chains became a core helix, and PI chains formed double-stranded helices surrounding the core helix. Core and double-stranded helices are connected by short PS₂ chains, and PS₁ chains become the matrix. The experimentally observed morphology is in good agreement with the prediction by self-consistent field theory. We believe that this multidomain helical structure will be pave the way to the creation of multifunctional helical structures for various applications such as metamaterials.

Graphoepitaxy of Symmetric Six-Arm Star-Shaped Poly(methyl methacrylate)-block-Polystyrene Copolymer Thin Film

The authors perform directed self-assembly based on graphoepitaxy of symmetric six-arm star-shaped poly(methyl methacrylate)-block-polystyrene copolymer [(PMMA-b-PS)₆ ] thin film. The affinity between each block and the trench wall is adjusted by using polymer brushes or selective gold (Au) deposition. When the surface of the trench is strongly selective for the PMMA block, (n+0.75)L₀ thick (n is the number of the lamellae, L₀ is lamellar domain spacing) lamellae parallel to the trench wall are formed at each side, while nanotubes are formed away from the trench wall. However, for a trench grafted with PS brushes, nanotubes are formed beside (n+0.25)L₀ thick lamellar layers. By adjusting the trench width (W) and the affinity between the block and the wall, various dual nanopatterns consisting of lines and nanotubes are fabricated. Moreover, when the trench wall is selectively deposited by Au, asymmetric dual nanopattern is formed, where different numbers of lines exist on each side wall, while nanotubes are formed in the middle of the trench. The observed morphologies depending on the commensurability condition between W and L₀ are consistent with predictions by self-consistent field theory.

Phase manipulation of topologically engineered AB-type multi-block copolymers

Recent advances in the fundamental understanding of the ordered phases of multi-block copolymers (MBCPs) at the molecular level have attracted considerable scientific interest in recent years. Herein, by employing molecular dynamics simulation, we focus on the four typical systems: linear alternating, branch-like, star-like AB-type MBCPs and linear copolymers filled with nanoparticles (NPs). First, we establish the phase diagram for the linear tetrablock copolymers (ABAB) as a function of the composition ratio between A- and B-block, exhibiting six typical phase states. Furthermore, increasing the mutual repulsive interaction strength, the temperature and the periodic dynamic shearing cycle result in the merging of spheres, presenting a clear beginning of the order-to-order transition (OOT) behavior. Second, we examine the branch-like and star-like copolymers and find that increasing branch density significantly leads to the occurrence of phase transition. Particularly, we illustrate that the sphere configurations of the MBCPs can be described in terms of tail, loop and bridge conformations. Increasing the number of distinct blocks in linear alternating copolymers results in an enhancement of the bridge conformation, in which case some spheres are separated to smaller ones. Furthermore, for the tail conformation, we present a unified theoretical framework to rationalize the topological state of the chain arrangements of spheres and infer that the entanglements within the internal reaction layer between different A-blocks result in the inhomogeneous distribution of the spheres sizes even with controlled molecular weight and composition ratio between each block. Finally, we find that the ABAB tetrablock copolymers filled with moderate spherical NPs exhibit a clear OOT from spheres to double gyroid or cylinders. We infer that the maximum amount of the B-block within the second and/or third layers for the filled spherical NPs connects different NPs effectively, leading to the complicated OOT behavior. Generally, this fundamental study could provide some guidelines for designing and fabricating high performance BCPs by manipulating the formation of the ordered phases.

Dual Nanopatterns Consisting of Both Nanodots and Nanoholes on a Single Substrate

Block copolymers (BCPs) with various nanostructures such as spheres, cylinders, gyroid, and lamellae, have received great attention for their application in nanolithography through nanopattern transfer to substrates. However, the fabrication of diverse geometries, shapes and sizes of nanostructure on a single substrate at the desired position could not be achieved because the nanostructure based on BCPs is mainly determined by the volume fraction of one block. Here, we synthesize polystyrene-hv-poly(methyl methacrylate) copolymer (PS-hv-PMMA), which contains a photocleavable linker at the junction point between PS and PMMA blocks. After vertically oriented PMMA cylindrical nanodomains in a thin film on a substrate were obtained, dual nanopatterns composed of high-density array of nanodots and nanoholes were successfully fabricated at the desired area on a single substrate using selective irradiation with a mask. The dual nanopatterns could be used to prepare metal (or metal oxide) nanostructure arrays consisting of both nanodots and nanoholes, which are utilized for smart sensors capable of simultaneously detecting two independent molecules on nanodots and nanoholes.

Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker

Block copolymers with various nanodomains, such as spheres, cylinders, and lamellae, have received attention for their applicability to nanolithography. However, those microdomains are determined by the volume fraction of one block. Meanwhile, nanopatterns with multiple shapes are required for the next-generation nanolithography. Although various methods have been reported to achieve dual nanopatterns, all the methods need sophisticated processes using E-beam. Here, we synthesized a miktoarm block copolymer capable of cleavage of one block by ultraviolet. Original cylindrical nanodomains of synthesized block copolymer were successfully transformed to lamellar nanodomains due to the change of molecular architecture by ultraviolet. We fabricated dual nanopatterns consisting of dots and lines at desired regions on a single substrate. We also prepared dual nanopatterns utilizing another phase transformation from spheres to cylinders in a block copolymer with higher interaction parameter. Since our concept has versatility to any block copolymer, it could be employed as next-generation nanolithography.

Morphological evolution of lamellar forming polystyrene-block-poly(4-vinylpyridine) copolymers under solvent annealing

In this work, we are reporting a very simple and efficient method to form lamellar structures of symmetric polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) copolymer thin films with vertically (to the surface plane) orientated lamellae using a solvent annealing approach. The methodology does not require any brush chemistry to engineer a neutral surface and it is the block neutral nature of the film-solvent vapour interface that defines the orientation of the lamellae. The microphase separated structure of two different molecular weight lamellar forming PS-block-P4VP copolymers formed under solvent vapour annealing was monitored using atomic force microscopy (AFM) so as to understand the morphological changes of the films upon different solvent exposure. In particular, the morphology changes from micellar structures to well-defined microphase separated arrangements. The choice of solvent/s (single and dual solvent exposure) and the solvent annealing conditions (temperature, time etc.) has important effects on structural transitions of the films and it was found that a block neutral solvent was required to realize vertically aligned P4VP lamellae. The results of the structural variation of the phase separated nanostructured films through the exposure to ethanol are also described.

Theoretical simulations of nanostructures self-assembled from copolymer systems

This article provides an overview of recent simulation investigations of the nanostructures and structure–property relationships in copolymer systems.

High-Resolution Metal Nanopatterning by Means of Switchable Block Copolymer Templates

In this review, recent developments in the fabrication of hexagonal and parallel ordered arrays of metallic nanodomains on a substrate are described. We focus on the nanopatterning approach by means of switchable block copolymer thin films. This approach is highly advantageous, because it can lead to extremely regular patterns with metal subunits of only a few nanometers in diameter and center-to-center distances of tens of nanometers. Hence, the resulting 1D or 2D periodic arrays of metal nanodots and nanowires on silicon substrates can be fabricated with extremely high unit densities and on very large areas. The templated deposition of presynthesized metal nanoparticles on functional block copolymers is described in detail. Current challenges are discussed and an outlook for further developments is given.

In situ TEM observation of phase transition of the nanoscopic patterns on baroplastic block copolymer films during nanoindentation

We investigated the in situ phase transition of the nanoscopic patterns on block copolymer thin films during nanoindentation by using a transmission electron microscope (TEM) with a specially designed nanoindenter. For the first time, we observed directly an in situ phase transition from lamellar microdomains to disordered states during the nanoindentation on a baroplastic polystyrene-block-poly(n-pentyl methacrylate) copolymer (PS-b-PnPMA) film. Through the in situ TEM observation, the mechanism of the nanoscopic pattern formation on a block copolymer thin film by indentation is fully understood.