Palladium nanoparticle formation on TiO₂(110) by thermal decomposition of palladium(II) hexafluoroacetylacetonate

A Systemic Review on the Synthesis, Characterization, and Applications of Palladium Nanoparticles in Biomedicine

Palladium nanoparticles (Pd NPs) have been considered as a potential candidate in the field of biomedical applications due to its unique properties such as huge catalytic, hydrogen storage, and sensing behavior. Therefore, Pd NPs have shown to have a significant potential for the development of antimicrobials, wound healing, antioxidant, and anticancer property in recent days. There are plenty of reports that showed superior properties of noble metals. However, only very few studies have been undertaken to explore the advantage of Pd NPs in the field of biomedical applications. This review reports detailed and comprehensive studies comprising of the synthesis, characterization, and potential applications of Pd NPs in biomedicine. This report provides evidences in the literature documented by early researchers to understand the potential applications of Pd NPs to be explored in various fields.

Structural and Chemical Transformations of Zinc Oxide Ultrathin Films on Pd(111) Surfaces

Structural and chemical transformations of ultrathin oxide films on transition metals lie at the heart of many complex phenomena in heterogeneous catalysis, such as the strong metal-support interaction (SMSI). However, there is limited atomic-scale understanding of these transformations, especially for irreducible oxides such as ZnO. Here, by combining density functional theory calculations and surface science techniques, including scanning tunneling microscopy, X-ray photoelectron spectroscopy, high-resolution electron energy loss spectroscopy, and low-energy electron diffraction, we investigated the interfacial interaction of well-defined ultrathin ZnO_xH_y films on Pd(111) under varying gas-phase conditions [ultrahigh vacuum (UHV), 5 × 10^-7 mbar of O₂, and a D₂/O₂ mixture] to shed light on the SMSI effect of irreducible oxides. Sequential treatment of submonolayer zinc oxide films in a D₂/O₂ mixture (1:4) at 550 K evoked reversible structural transformations from a bilayer to a monolayer and further to a Pd-Zn near-surface alloy, demonstrating that zinc oxide, as an irreducible oxide, can spread on metal surfaces and show an SMSI-like behavior in the presence of hydrogen. A mixed canonical-grand canonical phase diagram was developed to bridge the gap between UHV conditions and true SMSI environments, revealing that, in addition to surface alloy formation, certain ZnO_xH_y films with stoichiometries that do not exist in bulk are stabilized by Pd in the presence of hydrogen. Based on the combined theoretical and experimental observations, we propose that SMSI metal nanoparticle encapsulation for irreducible oxide supports such as ZnO involves both surface (hydroxy)oxide and surface alloy formation, depending on the environmental conditions.

Atomic layer deposition of rhodium and palladium thin film using low-concentration ozone

Rhodium (Rh) and palladium (Pd) thin films have been fabricated using an atomic layer deposition (ALD) process using Rh(acac)3 and Pd(hfac)2 as the respective precursors and using short-pulse low-concentration ozone as the co-reactant. This method of fabrication does away with the need for combustible reactants such as hydrogen or oxygen, either as a precursor or as an annealing agent. All previous studies using only ozone could not yield metallic films, and required post treatment using hydrogen or oxygen. In this work, it was discovered that the concentration level of ozone used in the ALD process was critical in determining whether the pure metal film was formed, and whether the metal film was oxidized. By controlling the ozone concentration under a critical limit, the fabrication of these noble metal films was successful. Rhodium thin films were deposited between 200 and 220 °C, whereas palladium thin films were deposited between 180 and 220 °C. A precisely controlled low ozone concentration of 1.22 g m-3 was applied to prevent the oxidation of the noble metallic film, and to ensure fast growth rates of 0.42 Å per cycle for Rh, and 0.22 Å per cycle for Pd. When low-concentration ozone was applied to react with ligand, no excess ozone was available to oxidize the metal products. The surfaces of deposited films obtained the RMS roughness values of 0.30 nm for Rh and 0.13 nm for Pd films. The resistivities of 18 nm Rh and 22 nm Pd thin films were 17 μΩ cm and 63 μΩ cm.

Controlling palladium morphology in electrodeposition from nanoparticles to dendrites via the use of mixed solvents

By changing the mole fraction of water (χwater) in the solvent acetonitrile (MeCN), we report a simple procedure to control nanostructure morphology during electrodeposition. We focus on the electrodeposition of palladium (Pd) on electron beam transparent boron-doped diamond (BDD) electrodes. Three solutions are employed, MeCN rich (90% v/v MeCN, χwater = 0.246), equal volumes (50% v/v MeCN, χwater = 0.743) and water rich (10% v/v MeCN, χwater = 0.963), with electrodeposition carried out under a constant, and high overpotential (-1.0 V), for fixed time periods (50, 150 and 300 s). Scanning transmission electron microscopy (STEM) reveals that in MeCN rich solution, Pd atoms, amorphous atom clusters and (majority) nanoparticles (NPs) result. As water content is increased, NPs are again evident but also elongated and defected nanostructures which grow in prominence with time. In the water rich environment, NPs and branched, concave and star-like Pd nanostructures are now seen, which with time translate to aggregated porous structures and ultimately dendrites. We attribute these observations to the role MeCN adsorption on Pd surfaces plays in retarding metal nucleation and growth.

The co-reactant role during plasma enhanced atomic layer deposition of palladium

Atomic layer deposition (ALD) of noble metals is an attractive technology potentially applied in nanoelectronics and catalysis. Unlike the combustion-like mechanism shown by other noble metal ALD processes, the main palladium (Pd) ALD process using palladium(ii)hexafluoroacetylacetonate [Pd(hfac)2] as precursor is based on true reducing surface chemistry. In this work, a thorough investigation of plasma-enhanced Pd ALD is carried out by employing this precursor with different plasmas (H2*, NH3*, O2*) and plasma sequences (H2* + O2*, O2* + H2*) as co-reactants at varying temperatures, providing insights in the co-reactant and temperature dependence of the Pd growth per cycle (GPC). At all temperatures, films grown with only reducing co-reactants contain a large amount of carbon, while an additional O2* in the co-reactant sequence helps to obtain Pd films with much lower impurity concentrations. Remarkably, in situ XRD and SEM show an abrupt release of the carbon impurities during annealing at moderate temperatures in different atmospheres. In vacuo XPS measurements reveal the remaining species on the as-deposited surface after every exposure. Links are established between the particular surface termination prior to the precursor pulse and the observed differences in GPC, highlighting hydrogen as the key growth facilitator and carbon and oxygen as growth inhibitors. The increase in GPC with temperature for ALD sequences with H2* or NH3* prior to the precursor pulse is explained by an increase in the amount of hydrogen species that reside on the Pd surface which are available for reaction with the Pd(hfac)2 precursor.

Deposition of copper from Cu(i) and Cu(ii) precursors onto HOPG surface: Role of surface defects and choice of a precursor

The surface reactivity of two copper-containing precursors, (Cu(hfac)₂ and Cu(hfac)VTMS, where hfac is hexafluoroacetyloacetonate and VTMS is vinyltrimethylsilane), was investigated by dosing the precursors onto a surface of highly ordered pyrolytic graphite (HOPG) at room temperature. The behavior of these precursors on a pristine HOPG was compared to that on a surface activated by ion sputtering and subsequent oxidation to induce controlled surface defects. X-ray photoelectron spectroscopy and energy dispersive X-ray spectroscopy were used to confirm copper deposition and its surface distribution, and to compare with the results of scanning electron microscopy and atomic force microscopy investigations. As expected, surface defects promote copper deposition; however, the specific structures deposited depend on the deposition precursor. Density functional theory was used to mimic the reactions of each precursor molecule on this surface and to determine the origins of this different reactivity.

Tunable superoleophobicity via harnessing the surface chemistry of UV responsive titania coatings

Superoleophobic surfaces exhibiting tunable wettability are prepared by the combination of simple spray coating of Ultra Violet (UV) responsive titania nanoparticles and a low surface energy coating of a self-assembled monolayer (SAM) of 1H,1H,2H,2H-perflurodecyltrichlorosilane (PFDTS). Spray coating creates random micron-sized roughness with reentrant geometry, a necessary requirement for the superoleophobic surface, and a porous network at the nanometer size level, confirmed by the field emission scanning electron microscope (FE-SEM) images. By employing the rough surface and a low surface energy monolayer, the substrates possess superhydrophobicity with a water (γ = 72 mN m-1) contact angle of 163° and superoleophobicity with a decane (γ = 23 mN m-1) contact angle of 144°. Wettability of these surfaces is completely reversed to the superoleophilic state upon 6 h of UV irradiation. A quantitative X-ray photoelectron spectroscopy (XPS) analysis has confirmed the mechanism of decomposition of PFDTS molecules on the superoleophilic surfaces via interaction with the defect Ti3+ states of titania upon UV exposure. Furthermore, the superoleophobicity is restored to complete the transition cycle by changing the surface chemistry of the UV exposed surface via annealing and regrafting of the PFDTS monolayer.

Catalytic Palladium Film Deposited by Scalable Low-Temperature Aqueous Combustion

This article describes a novel method for depositing a dense, high quality palladium thin film via a one-step aqueous combustion process which can be easily scaled up. Film deposition of Pd from aqueous solutions by conventional chemical or electrochemical methods is inhibited by hydrogen embrittlement, thus resulting in a brittle palladium film. The method outlined in this work allows a direct aqueous solution deposition of a mirror-bright, durable Pd film on substrates including glass and glassy carbon. This simple procedure has many advantages including a very high deposition rate (>10 cm² min^-1) and a relatively low deposition temperature (250 °C), which makes it suitable for large-scale industrial applications. Although preparation of various high-quality oxide films has been successfully accomplished via solution combustion synthesis (SCS) before, this article presents the first report on direct SCS production of a metallic film. The mechanism of Pd film formation is discussed with the identification of a complex formed between palladium nitrate and glycine at low temperature. The catalytic properties and stability of films are successfully tested in alcohol electrooxidation and electrochemical oxygen reduction reaction. It was observed that combustion deposited Pd film on a glassy carbon electrode showed excellent catalytic activity in ethanol oxidation without using any binder or additive. We also report for the first time the concept of a reusable "catalytic flask" as illustrated by the Suzuki-Miyaura cross-coupling reaction. The Pd film uniformly covers the inner walls of the flask and eliminates the catalyst separation step. We believe the innovative concept of a reusable catalytic flask is very promising and has the required features to become a commercial product in the future.

Surface chemistry of black phosphorus under a controlled oxidative environment

Black phosphorus (BP), the bulk counterpart of monolayer phosphorene, is a relatively stable phosphorus allotrope at room temperature. However, monolayer phosphorene and ultra-thin BP layers degrade in ambient atmosphere. In this paper, we report the investigation of BP oxidation and discuss the reaction mechanism based on the x-ray photoelectron spectroscopy (XPS) data. The kinetics of BP oxidation was examined under various well-controlled conditions, namely in 5% O₂/Ar, 2.3% H₂O/Ar, and 5% O₂ and 2.3% H₂O/Ar. At room temperature, the BP surface is demonstrated not to be oxidized at a high oxidation rate in 5% O₂/Ar nor in 2.3% H₂O/Ar, according to XPS, with the thickness of the oxidized phosphorus layer <5 Å for 5 h. On the other hand, in the O₂/H₂O mixture, a 30 Å thickness oxide layer was detected already after 2 h of the treatment. This result points to a synergetic effect of water and oxygen in the BP oxidation. The oxidation effect was also studied in applications to the electrical measurements of BP field-effect transistors (FETs) with or without passivation. The electrical performance of BP FETs with atomic layer deposition (ALD) dielectric passivation or h-BN passivation formed in a glove-box environment are also presented.

Towards ALD thin film stabilized single-atom Pd1 catalysts

Supported precious metal single-atom catalysts have shown interesting activity and selectivity in recent studies. However, agglomeration of these highly mobile mononuclear surface species can eliminate their unique catalytic properties. Here we study a strategy for synthesizing thin film stabilized single-atom Pd1 catalysts using atomic layer deposition (ALD). The thermal stability of the Pd1 catalysts is significantly enhanced by creating a nanocavity thin film structure. In situ infrared spectroscopy and Pd K-edge X-ray absorption spectroscopy (XAS) revealed that the Pd1 was anchored on the surface through chlorine sites. The thin film stabilized Pd1 catalysts were thermally stable under both oxidation and reduction conditions. The catalytic performance in the methanol decomposition reaction is found to depend on the thickness of protecting layers. While Pd1 catalysts showed promising activity at low temperature in a methanol decomposition reaction, 14 cycle TiO2 protected Pd1 was less active at high temperature. Pd L3 edge XAS indicated that the low reactivity compared with Pd nanoparticles is due to the strong adsorption of carbon monoxide even at 250 °C. These results clearly show that the ALD nanocavities provide a basis for future design of single-atom catalysts that are highly efficient and stable.

Transmetalation Process as a Route for Preparation of Zinc-Oxide-Supported Copper Nanoparticles

Supported nanoparticulate materials have a variety of uses, from energy storage to catalysis. In preparing such materials, precision control can often be achieved by applying chemical deposition methods. However, ligand removal following the initial deposition presents a substantial challenge because of potential surface contamination. Traditional approaches normally include multistep processing and require a substantial thermal budget. Using transmetalation chemistry, it is possible to circumvent both disadvantages and prepare chemically reactive copper nanoparticles supported on a commercially available ZnO powder material by metalorganic vapor copper deposition followed by very mild annealing to 350 K. The self-limiting copper deposition reaction is used to demonstrate the utility of this approach for hexafluoroacetylacetonate-copper-vinyltrimethylsilane, Cu(hfac)VTMS, reacting with ZnO. The low-temperature transmetalation is confirmed by a combination of spectroscopic studies. Model density functional theory calculations are consistent with a thermodynamic driving force for the process.

Chemical vapor deposition-prepared sub-nanometer Zr clusters on Pd surfaces: promotion of methane dry reforming

An inverse Pd–Zr model catalyst was prepared by chemical vapor deposition (CVD) using zirconium-t-butoxide (ZTB) as an organometallic precursor.

Design and synthesis of model and practical palladium catalysts using atomic layer deposition

We investigated the “one-batch” synthesis of model and practical palladium catalysts using atomic layer deposition (ALD).

Role of the Deposition Precursor Molecules in Defining Oxidation State of Deposited Copper in Surface Reduction Reactions on H-Terminated Si(111) Surface

Surface-limited deposition reactions leading to the formation of copper nanoparticles on H-terminated Si(111) surface can serve as a model for understanding the role of structure of the deposition precursor molecules in determining the oxidation state of the metal deposited. This study compares three different precursor molecules: Cu(acac)₂ (Cu(II) acetylacetonate), Cu(hfac)₂, and Cu(hfac)VTMS (Cu(I)-(hexafluoroacetylacetonato)-vinyltrimethylsilane) as copper deposition sources in a process with a controlled oxidation state of copper. X-ray photoelectron spectroscopy suggests that single-electron reduction governs the deposition of Cu(I) from the first two precursor molecules and that the last of the precursors studied yields predominantly metallic copper. Time-of-fight secondary ion mass spectrometry (ToF-SIMS) and infrared spectroscopy are utilized to interrogate surface species produced. Atomic force microscopy is used to quantify the deposition process and to follow the size distribution of the deposited copper containing nanoparticles. A plausible explanation supported by density functional theory calculations is offered on the basis of the difference in the reaction pathways for Cu(I) and Cu(II) precursors.

Selectivity and Mechanism of Thermal Decomposition of β-diketones on ZnO Powder

The thermal chemistry of β-diketones underlies a number of catalytic processes related both to the catalytic reactions yielding commodity chemicals and to the production of supported transition metal catalysts themselves. The mechanisms of decomposition during thermal transformation of three β-diketones, acetylacetone (acacH), 1,1,1-trifluoroacetylacetone (tfacH), and 1,1,1,5,5,5-hexafluoroacetylacetone (hfacH), were studied on ZnO powder surface using Fourier-transform infrared spectroscopy (FT-IR), X-ray photoelectron spectroscopy (XPS), and Density functional theory (DFT) computational investigation. The initial O-H dissociation leads to the formation of corresponding β-diketonates in all the cases investigated. These diketonates are important surface intermediates that can be generated in a controlled manner in these experiments. The presence on the C-CF₃ entity determines the preferred thermal decomposition pathways, as the C-C bond in this group starts to react with a surface of ZnO around 400 K, followed by immediate decomposition of the resulting CF₃ group. Above 600 K, the presence of the CF₃-substituent leads to the formation of ketene-like structures observed by vibrational spectroscopy. The reaction mechanisms examined with the help of DFT calculations are correlated with vibrational signatures of the species produced and with the F-containing species recorded by XPS.

Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111)

Atomic layer deposition (ALD) of alumina using trimethylaluminum (TMA) has technological importance in microelectronics. This process has demonstrated a high potential in applications of protective coatings on Cu surfaces for control of diffusion of Cu in Cu2S films in photovoltaic devices and sintering of Cu-based nanoparticles in liquid phase hydrogenation reactions. With this motivation in mind, the reaction between TMA and oxygen was investigated on Cu(111) and Cu2O/Cu(111) surfaces. TMA did not adsorb on the Cu(111) surface, a result consistent with density functional theory (DFT) calculations predicting that TMA adsorption and decomposition are thermodynamically unfavorable on pure Cu(111). On the other hand, TMA readily adsorbed on the Cu2O/Cu(111) surface at 473 K resulting in the reduction of some surface Cu(1+) to metallic copper (Cu(0)) and the formation of a copper aluminate, most likely CuAlO2. The reaction is limited by the amount of surface oxygen. After the first TMA half-cycle on Cu2O/Cu(111), two-dimensional (2D) islands of the aluminate were observed on the surface by scanning tunneling microscopy (STM). According to DFT calculations, TMA decomposed completely on Cu2O/Cu(111). High-resolution electron energy loss spectroscopy (HREELS) was used to distinguish between tetrahedrally (Altet) and octahedrally (Aloct) coordinated Al(3+) in surface adlayers. TMA dosing produced an aluminum oxide film, which contained more octahedrally coordinated Al(3+) (Altet/Aloct HREELS peak area ratio ≈ 0.3) than did dosing O2 (Altet/Aloct HREELS peak area ratio ≈ 0.5). After the first ALD cycle, TMA reacted with both Cu2O and aluminum oxide surfaces in the absence of hydroxyl groups until film closure by the fourth ALD cycle. Then, TMA continued to react with surface Al-O, forming stoichiometric Al2O3. O2 half-cycles at 623 K were more effective for carbon removal than O2 half-cycles at 473 K or water half-cycles at 623 K. The growth rate was approximately 3-4 Å/cycle for TMA+O2 ALD (O2 half-cycles at 623 K). No preferential growth of Al2O3 on the steps of Cu(111) was observed. According to STM, Al2O3 grows homogeneously on Cu(111) terraces.

Synthesis of palladium nanoparticles on TiO2(110) using a beta-diketonate precursor

Combined STM and DFT studies reveal the adsorption sites of Pd precursors and nucleation of Pd nanoparticles on TiO₂surface.