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Cater HL, Allen MJ, Linnell MI, Rylski AK, Wu Y, Lien HM, Mangolini F, Freeman BD, Page ZA. Supersoft Norbornene-Based Thermoplastic Elastomers with High Strength and Upper Service Temperature. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024:e2402431. [PMID: 38718377 DOI: 10.1002/adma.202402431] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/16/2024] [Revised: 05/06/2024] [Indexed: 05/23/2024]
Abstract
With over 6 million tons produced annually, thermoplastic elastomers (TPEs) have become ubiquitous in modern society, due to their unique combination of elasticity, toughness, and reprocessability. Nevertheless, industrial TPEs display a tradeoff between softness and strength, along with low upper service temperatures, typically ≤100 °C. This limits their utility, such as in bio-interfacial applications where supersoft deformation is required in tandem with strength, in addition to applications that require thermal stability (e.g., encapsulation of electronics, seals/joints for aeronautics, protective clothing for firefighting, and biomedical devices that can be subjected to steam sterilization). Thus, combining softness, strength, and high thermal resistance into a single versatile TPE has remained an unmet opportunity. Through de novo design and synthesis of novel norbornene-based ABA triblock copolymers, this gap is filled. Ring-opening metathesis polymerization is employed to prepare TPEs with an unprecedented combination of properties, including skin-like moduli (<100 kPa), strength competitive with commercial TPEs (>5 MPa), and upper service temperatures akin to high-performance plastics (≈260 °C). Furthermore, the materials are elastic, tough, reprocessable, and shelf stable (≥2 months) without incorporation of plasticizer. Structure-property relationships identified herein inform development of next-generation TPEs that are both biologically soft yet thermomechanically durable.
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Affiliation(s)
- Henry L Cater
- Department of Chemistry, The University of Texas at Austin, Austin, TX, 78712, USA
| | - Marshall J Allen
- McKetta Department of Chemical Engineering, The University of Texas at Austin, Austin, TX, 78712, USA
| | - Mark I Linnell
- McKetta Department of Chemical Engineering, The University of Texas at Austin, Austin, TX, 78712, USA
| | - Adrian K Rylski
- Department of Chemistry, The University of Texas at Austin, Austin, TX, 78712, USA
| | - Yudian Wu
- Department of Chemistry, The University of Texas at Austin, Austin, TX, 78712, USA
| | - Hsu-Ming Lien
- Texas Materials Institute, The University of Texas at Austin, Austin, TX, 78712, USA
| | - Filippo Mangolini
- Texas Materials Institute, The University of Texas at Austin, Austin, TX, 78712, USA
- Walker Department of Mechanical Engineering, The University of Texas at Austin, Austin, TX, 78712, USA
| | - Benny D Freeman
- McKetta Department of Chemical Engineering, The University of Texas at Austin, Austin, TX, 78712, USA
| | - Zachariah A Page
- Department of Chemistry, The University of Texas at Austin, Austin, TX, 78712, USA
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2
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Fontelo R, Reis RL, Novoa-Carballal R, Pashkuleva I. Preparation, Properties, and Bioapplications of Block Copolymer Nanopatterns. Adv Healthc Mater 2024; 13:e2301810. [PMID: 37737834 DOI: 10.1002/adhm.202301810] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/07/2023] [Revised: 08/28/2023] [Indexed: 09/23/2023]
Abstract
Block copolymer (BCP) self-assembly has emerged as a feasible method for large-scale fabrication with remarkable precision - features that are not common for most of the nanofabrication techniques. In this review, recent advancements in the molecular design of BCP along with state-of-the-art processing methodologies based on microphase separation alone or its combination with different lithography methods are presented. Furthermore, the bioapplications of the generated nanopatterns in the development of protein arrays, cell-selective surfaces, and antibacterial coatings are explored. Finally, the current challenges in the field are outlined and the potential breakthroughs that can be achieved by adopting BCP approaches already applied in the fabrication of electronic devices are discussed.
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Affiliation(s)
- Raul Fontelo
- 3B's Research Group, I3Bs - Research Institute on Biomaterials, Biodegradables and Biomimetics, University of Minho, Headquarters of the European Institute of Excellence on Tissue Engineering and Regenerative Medicine, AvePark, Parque de Ciência e Tecnologia, Barco, Guimarães, 4805-017, Portugal
- ICVS/3B's-PT Government Associate Laboratory, Braga/Guimarães, Portugal
| | - Rui L Reis
- 3B's Research Group, I3Bs - Research Institute on Biomaterials, Biodegradables and Biomimetics, University of Minho, Headquarters of the European Institute of Excellence on Tissue Engineering and Regenerative Medicine, AvePark, Parque de Ciência e Tecnologia, Barco, Guimarães, 4805-017, Portugal
- ICVS/3B's-PT Government Associate Laboratory, Braga/Guimarães, Portugal
| | - Ramon Novoa-Carballal
- 3B's Research Group, I3Bs - Research Institute on Biomaterials, Biodegradables and Biomimetics, University of Minho, Headquarters of the European Institute of Excellence on Tissue Engineering and Regenerative Medicine, AvePark, Parque de Ciência e Tecnologia, Barco, Guimarães, 4805-017, Portugal
- ICVS/3B's-PT Government Associate Laboratory, Braga/Guimarães, Portugal
- CINBIO, University of Vigo, Campus Universitario de Vigo, Vigo, Pontevedra, 36310, Spain
| | - Iva Pashkuleva
- 3B's Research Group, I3Bs - Research Institute on Biomaterials, Biodegradables and Biomimetics, University of Minho, Headquarters of the European Institute of Excellence on Tissue Engineering and Regenerative Medicine, AvePark, Parque de Ciência e Tecnologia, Barco, Guimarães, 4805-017, Portugal
- ICVS/3B's-PT Government Associate Laboratory, Braga/Guimarães, Portugal
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3
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Sharma K, Agrawal A, Masud A, Satija SK, Ankner JF, Douglas JF, Karim A. Hiking down the Free Energy Landscape Using Sequential Solvent and Thermal Processing for Versatile Ordering of Block Copolymer Films. ACS APPLIED MATERIALS & INTERFACES 2023; 15:21562-21574. [PMID: 37083352 DOI: 10.1021/acsami.2c21924] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/03/2023]
Abstract
The kinetics and morphology of the ordering of block copolymer (BCP) films are highly dependent on the processing pathway, as the enthalpic and entropic forces driving the ordering processes can be quite different depending on process history. We may gain some understanding and control of this variability of BCP morphology with processing history through a consideration of the free energy landscape of the BCP material and a consideration of how the processing procedure moves the system through this energy landscape in a way that avoids having the system becoming trapped into well-defined metastable minima having a higher free energy than the target low free energy ordered structure. It is well known that standard thermal annealing (TA) of BCPs leads to structures corresponding to a well-defined stable free energy minimum; however, the BCP must be annealed for a very long time before the target low free energy structures can be achieved. Herein, we show that the same target low-energy structure can be achieved relatively quickly by subjecting as-cast films to an initial solvent annealing [direct immersion annealing (DIA) or solvent vapor annealing (SVA)] procedure, followed by a short period of TA. This process relies on lowering the activation energy barrier by reducing the glass-transition temperature through DIA (or SVA), followed by a multi-interface chain rearrangement through sequential TA. This energy landscape approach to ordering should be applicable to the process design for ordering many other complex materials.
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Affiliation(s)
- Kshitij Sharma
- William A. Brookshire, Department of Chemical & Biomolecular Engineering, University of Houston, Houston, Texas 77204, United States
| | - Aman Agrawal
- William A. Brookshire, Department of Chemical & Biomolecular Engineering, University of Houston, Houston, Texas 77204, United States
| | - Ali Masud
- William A. Brookshire, Department of Chemical & Biomolecular Engineering, University of Houston, Houston, Texas 77204, United States
| | - Sushil K Satija
- National Institute of Standards and Technology, Center for Neutron Research, Gaithersburg, Maryland 20899, United States
| | - John F Ankner
- Second Target Station Project, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830, United States
| | - Jack F Douglas
- Materials Science and Engineering Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States
| | - Alamgir Karim
- William A. Brookshire, Department of Chemical & Biomolecular Engineering, University of Houston, Houston, Texas 77204, United States
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4
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Hendeniya N, Hillery K, Chang BS. Processive Pathways to Metastability in Block Copolymer Thin Films. Polymers (Basel) 2023; 15:polym15030498. [PMID: 36771799 PMCID: PMC9920306 DOI: 10.3390/polym15030498] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 12/08/2022] [Revised: 01/02/2023] [Accepted: 01/04/2023] [Indexed: 01/19/2023] Open
Abstract
Block copolymers (BCPs) self-assemble into intricate nanostructures that enhance a multitude of advanced applications in semiconductor processing, membrane science, nanopatterned coatings, nanocomposites, and battery research. Kinetics and thermodynamics of self-assembly are crucial considerations in controlling the nanostructure of BCP thin films. The equilibrium structure is governed by a molecular architecture and the chemistry of its repeat units. An enormous library of materials has been synthesized and they naturally produce a rich equilibrium phase diagram. Non-equilibrium phases could potentially broaden the structural diversity of BCPs and relax the synthetic burden of creating new molecules. Furthermore, the reliance on synthesis could be complicated by the scalability and the materials compatibility. Non-equilibrium phases in BCPs, however, are less explored, likely due to the challenges in stabilizing the metastable structures. Over the past few decades, a variety of processing techniques were introduced that influence the phase transformation of BCPs to achieve a wide range of morphologies. Nonetheless, there is a knowledge gap on how different processive pathways can induce and control the non-equilibrium phases in BCP thin films. In this review, we focus on different solvent-induced and thermally induced processive pathways, and their potential to control the non-equilibrium phases with regards to their unique aspects and advantages. Furthermore, we elucidate the limitations of these pathways and discuss the potential avenues for future investigations.
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5
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Polymer-grafted nanoparticle superlattice monolayers over 100 cm2 through a modified Langmuir-Blodgett method. POLYMER 2022. [DOI: 10.1016/j.polymer.2022.125308] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/22/2022]
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6
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Yun HS, Kim DH, Kwon HG, Choi HK. Centrifugal Force-Induced Alignment in the Self-Assembly of Block Copolymers. Macromolecules 2022. [DOI: 10.1021/acs.macromol.2c00325] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
Affiliation(s)
- Hyun Su Yun
- Division of Advanced Materials Engineering, Kongju National University, Cheonan 31080, Republic of Korea
| | - Dong Hwan Kim
- Division of Advanced Materials Engineering, Kongju National University, Cheonan 31080, Republic of Korea
| | - Hong Gu Kwon
- Division of Advanced Materials Engineering, Kongju National University, Cheonan 31080, Republic of Korea
| | - Hong Kyoon Choi
- Center for Advanced Materials and Parts of Powder, Kongju National University, Cheonan 31080, Republic of Korea
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7
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Pula P, Leniart A, Majewski PW. Solvent-assisted self-assembly of block copolymer thin films. SOFT MATTER 2022; 18:4042-4066. [PMID: 35608282 DOI: 10.1039/d2sm00439a] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
Solvent-assisted block copolymer self-assembly is a compelling method for processing and advancing practical applications of these materials due to the exceptional level of the control of BCP morphology and significant acceleration of ordering kinetics. Despite substantial experimental and theoretical efforts devoted to understanding of solvent-assisted BCP film ordering, the development of a universal BCP patterning protocol remains elusive; possibly due to a multitude of factors which dictate the self-assembly scenario. The aim of this review is to aggregate both seminal reports and the latest progress in solvent-assisted directed self-assembly and to provide the reader with theoretical background, including the outline of BCP ordering thermodynamics and kinetics phenomena. We also indicate significant BCP research areas and emerging high-tech applications where solvent-assisted processing might play a dominant role.
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Affiliation(s)
- Przemyslaw Pula
- Department of Chemistry, University of Warsaw, Warsaw 02089, Poland.
| | - Arkadiusz Leniart
- Department of Chemistry, University of Warsaw, Warsaw 02089, Poland.
| | - Pawel W Majewski
- Department of Chemistry, University of Warsaw, Warsaw 02089, Poland.
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8
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Kulkarni AA, Doerk GS. Thin film block copolymer self-assembly for nanophotonics. NANOTECHNOLOGY 2022; 33:292001. [PMID: 35358955 DOI: 10.1088/1361-6528/ac6315] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/19/2021] [Accepted: 03/31/2022] [Indexed: 06/14/2023]
Abstract
The nanophotonic engineering of light-matter interactions has profoundly changed research behind the design and fabrication of optical materials and devices. Metasurfaces-arrays of subwavelength nanostructures that interact resonantly with electromagnetic radiation-have emerged as an integral nanophotonic platform for a new generation of ultrathin lenses, displays, polarizers and other devices. Their success hinges on advances in lithography and nanofabrication in recent decades. While existing nanolithography techniques are suitable for basic research and prototyping, issues of cost, throughput, scalability, and substrate compatibility may preclude their use for many metasurface applications. Patterning via spontaneous self-assembly of block copolymer thin films offers an enticing alternative for nanophotonic manufacturing that is rapid, inexpensive, and applicable to large areas and diverse substrates. This review discusses the advantages and disadvantages of block copolymer-based nanopatterning and highlights recent progress in their use for broadband antireflection, surface enhanced Raman spectroscopy, and other nanophotonic applications. Recent advances in diversification of self-assembled block copolymer nanopatterns and improved processes for enhanced scalability of self-assembled nanopatterning using block copolymers are also discussed, with a spotlight on directions for future research that would enable a wider array of nanophotonic applications.
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Affiliation(s)
- Ashish A Kulkarni
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY 11973, United States of America
| | - Gregory S Doerk
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY 11973, United States of America
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9
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Ohke M, Matsui J. Rapid Formation of a Lamellar Structure in an Amphiphilic Comb‐Shaped Polymer by Nanophase Separation Using Microwave–Humidity Annealing. MACROMOL CHEM PHYS 2021. [DOI: 10.1002/macp.202100404] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/07/2022]
Affiliation(s)
- Mizuki Ohke
- Graduate School of Science and Engineering, Yamagata University 1‐4‐12 Kojirakawa‐machi Yamagata 990‐8560 Japan
| | - Jun Matsui
- Faculty of Science, Yamagata University 1‐4‐12 Kojirakawa‐machi Yamagata 990‐8560 Japan
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10
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Neppalli SN, Collins TW, Gholamvand Z, Cummins C, Morris MA, Mokarian-Tabari P. Defining Swelling Kinetics in Block Copolymer Thin Films: The Critical Role of Temperature and Vapour Pressure Ramp. Polymers (Basel) 2021; 13:4238. [PMID: 34883741 PMCID: PMC8659708 DOI: 10.3390/polym13234238] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/15/2021] [Revised: 11/26/2021] [Accepted: 11/30/2021] [Indexed: 11/25/2022] Open
Abstract
We studied the kinetics of swelling in high-χ lamellar-forming poly(styrene)-block- poly(lactic acid) (PS-b-PLA) block copolymer (BCP) by varying the heating rate and monitoring the solvent vapour pressure and the substrate temperature in situ during solvo-thermal vapour annealing (STVA) in an oven, and analysing the resulting morphology. Our results demonstrate that there is not only a solvent vapour pressure threshold (120 kPa), but also that the rate of reaching this pressure threshold has a significant effect on the microphase separation and the resulting morphologies. To study the heating rate effect, identical films were annealed in a tetrahydrofuran (THF) vapour environment under three different ramp regimes, low (rT<1 °C/min), medium (2
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Affiliation(s)
- Sudhakara Naidu Neppalli
- School of Chemistry, The University of Dublin, Trinity College Dublin, D02 PN40 Dublin, Ireland; (S.N.N.); (Z.G.); (M.A.M.)
- Advance Material and BioEngineering Research (AMBER) Centre and CRANN, Trinity College Dublin, D02 PN40 Dublin, Ireland
| | - Timothy W. Collins
- Department of Chemistry, University College Cork, Tyndall National Institute, T12 K8AF Cork, Ireland;
| | - Zahra Gholamvand
- School of Chemistry, The University of Dublin, Trinity College Dublin, D02 PN40 Dublin, Ireland; (S.N.N.); (Z.G.); (M.A.M.)
- Advance Material and BioEngineering Research (AMBER) Centre and CRANN, Trinity College Dublin, D02 PN40 Dublin, Ireland
| | - Cian Cummins
- Centre de Recherche Paul Pascal (CRPP), The French National Centre for Scientific Research (CNRS), University of Bordeaux, UMR 5031, 115 Avenue Schweitzer, 33600 Pessac, France;
- Laboratoire de Chimie des Polymeres Organiques (LCPO), University of Bordeaux, CNRS, Bordeaux INP, 16 Avenue Pey-Berland, CEDEX, 33607 Pessac, France
| | - Michael A. Morris
- School of Chemistry, The University of Dublin, Trinity College Dublin, D02 PN40 Dublin, Ireland; (S.N.N.); (Z.G.); (M.A.M.)
- Department of Chemistry, University College Cork, Tyndall National Institute, T12 K8AF Cork, Ireland;
| | - Parvaneh Mokarian-Tabari
- School of Chemistry, The University of Dublin, Trinity College Dublin, D02 PN40 Dublin, Ireland; (S.N.N.); (Z.G.); (M.A.M.)
- Advance Material and BioEngineering Research (AMBER) Centre and CRANN, Trinity College Dublin, D02 PN40 Dublin, Ireland
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11
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Nian S, Fan Z, Freychet G, Zhernenkov M, Redemann S, Cai LH. Self-Assembly of Flexible Linear–Semiflexible Bottlebrush–Flexible Linear Triblock Copolymers. Macromolecules 2021. [DOI: 10.1021/acs.macromol.1c01911] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Shifeng Nian
- Soft Biomatter Laboratory, Department of Materials Science and Engineering, University of Virginia, Charlottesville, Virginia 22904, United States
| | - Zhouhao Fan
- Department of Chemical Engineering, University of Virginia, Charlottesville, Virginia 22904, United States
| | - Guillaume Freychet
- National Synchrotron Light Source-II, Brookhaven National Laboratory, Upton, New York 11973, United States
| | - Mikhail Zhernenkov
- National Synchrotron Light Source-II, Brookhaven National Laboratory, Upton, New York 11973, United States
| | - Stefanie Redemann
- Department of Molecular Physiology and Biological Physics, University of Virginia, Charlottesville, Virginia 22903, United States
- Department of Cell Biology, University of Virginia, Charlottesville, Virginia 22903, United States
- Center for Membrane and Cell Physiology, University of Virginia, Charlottesville, Virginia 22903, United States
| | - Li-Heng Cai
- Soft Biomatter Laboratory, Department of Materials Science and Engineering, University of Virginia, Charlottesville, Virginia 22904, United States
- Department of Chemical Engineering, University of Virginia, Charlottesville, Virginia 22904, United States
- Department of Biomedical Engineering, University of Virginia, Charlottesville, Virginia 22904, United States
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12
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Robertson M, Zhou Q, Ye C, Qiang Z. Developing Anisotropy in Self-Assembled Block Copolymers: Methods, Properties, and Applications. Macromol Rapid Commun 2021; 42:e2100300. [PMID: 34272778 DOI: 10.1002/marc.202100300] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/10/2021] [Revised: 06/23/2021] [Indexed: 01/03/2023]
Abstract
Block copolymers (BCPs) self-assembly has continually attracted interest as a means to provide bottom-up control over nanostructures. While various methods have been demonstrated for efficiently ordering BCP nanodomains, most of them do not generically afford control of nanostructural orientation. For many applications of BCPs, such as energy storage, microelectronics, and separation membranes, alignment of nanodomains is a key requirement for enabling their practical use or enhancing materials performance. This review focuses on summarizing research progress on the development of anisotropy in BCP systems, covering a variety of topics from established aligning techniques, resultant material properties, and the associated applications. Specifically, the significance of aligning nanostructures and the anisotropic properties of BCPs is discussed and highlighted by demonstrating a few promising applications. Finally, the challenges and outlook are presented to further implement aligned BCPs into practical nanotechnological applications, where exciting opportunities exist.
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Affiliation(s)
- Mark Robertson
- School of Polymer Science and Engineering, University of Southern Mississippi, Hattiesburg, MS, 39406, USA
| | - Qingya Zhou
- State Key Laboratory for Modification of Chemical Fibers and Polymer Materials, College of Materials Science and Engineering, Donghua University, Shanghai, 201620, China
| | - Changhuai Ye
- State Key Laboratory for Modification of Chemical Fibers and Polymer Materials, College of Materials Science and Engineering, Donghua University, Shanghai, 201620, China
| | - Zhe Qiang
- School of Polymer Science and Engineering, University of Southern Mississippi, Hattiesburg, MS, 39406, USA
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13
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Annohene G, Tepper GC. Efficient perovskite solar cells processed in supercritical carbon dioxide. J Supercrit Fluids 2021. [DOI: 10.1016/j.supflu.2021.105203] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/22/2022]
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14
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Mullen E, Morris MA. Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective. NANOMATERIALS (BASEL, SWITZERLAND) 2021; 11:1085. [PMID: 33922231 PMCID: PMC8146645 DOI: 10.3390/nano11051085] [Citation(s) in RCA: 14] [Impact Index Per Article: 4.7] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 02/28/2021] [Revised: 04/06/2021] [Accepted: 04/09/2021] [Indexed: 12/24/2022]
Abstract
The turn of the 21st century heralded in the semiconductor age alongside the Anthropocene epoch, characterised by the ever-increasing human impact on the environment. The ecological consequences of semiconductor chip manufacturing are the most predominant within the electronics industry. This is due to current reliance upon large amounts of solvents, acids and gases that have numerous toxicological impacts. Management and assessment of hazardous chemicals is complicated by trade secrets and continual rapid change in the electronic manufacturing process. Of the many subprocesses involved in chip manufacturing, lithographic processes are of particular concern. Current developments in bottom-up lithography, such as directed self-assembly (DSA) of block copolymers (BCPs), are being considered as a next-generation technology for semiconductor chip production. These nanofabrication techniques present a novel opportunity for improving the sustainability of lithography by reducing the number of processing steps, energy and chemical waste products involved. At present, to the extent of our knowledge, there is no published life cycle assessment (LCA) evaluating the environmental impact of new bottom-up lithography versus conventional lithographic techniques. Quantification of this impact is central to verifying whether these new nanofabrication routes can replace conventional deposition techniques in industry as a more environmentally friendly option.
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Affiliation(s)
- Eleanor Mullen
- CRANN and AMBER Research Centres, School of Chemistry, Trinity College Dublin, D02 W085 Dublin, Ireland
| | - Michael A. Morris
- CRANN and AMBER Research Centres, School of Chemistry, Trinity College Dublin, D02 W085 Dublin, Ireland
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15
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Structural Evolution of Nanophase Separated Block Copolymer Patterns in Supercritical CO 2. NANOMATERIALS 2021; 11:nano11030669. [PMID: 33800510 PMCID: PMC7998665 DOI: 10.3390/nano11030669] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 02/05/2021] [Revised: 03/01/2021] [Accepted: 03/04/2021] [Indexed: 11/16/2022]
Abstract
Nanopatterns can readily be formed by annealing block copolymers (BCPs) in organic solvents at moderate or high temperatures. However, this approach can be challenging from an environmental and industrial point of view. Herein, we describe a simple and environmentally friendly alternative to achieve periodically ordered nanoscale phase separated BCP structures. Asymmetric polystyrene-b-poly(ethylene oxide) (PS-b-PEO) thin film patterns of different molecular weight were achieved by annealing in supercritical carbon dioxide (sc-CO2). Microphase separation of PS-b-PEO (16,000–5000) film patterns were achieved by annealing in scCO2 at a relatively low temperature was previously reported by our group. The effects of annealing temperature, time and depressurisation rates for the polymer system were also discussed. In this article, we have expanded this study to create new knowledge on the structural and dimensional evolution of nanohole and line/space surface periodicity of four other different molecular weights PS-b-PEO systems. Periodic, well defined, hexagonally ordered films of line and hole patterns were obtained at low CO2 temperatures (35–40 °C) and pressures (1200–1300 psi). Further, the changes in morphology, ordering and feature sizes for a new PS-b-PEO system (42,000–11,500) are discussed in detail upon changing the scCO2 annealing parameters (temperature, film thickness, depressurization rates, etc.). In relation to our previous reports, the broad annealing temperature and depressurisation rate were explored together for different film thicknesses. In addition, the effects of SCF annealing for three other BCP systems (PEO-b-PS, PS-b-PDMS, PS-b-PLA) is also investigated with similar processing conditions. The patterns were also generated on a graphoepitaxial substrate for device application.
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16
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Shi LY, Yin C, Zhou B, Xia W, Weng L, Ross CA. Annealing Process Dependence of the Self-Assembly of Rod–Coil Block Copolymer Thin Films. Macromolecules 2021. [DOI: 10.1021/acs.macromol.0c02712] [Citation(s) in RCA: 6] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Ling-Ying Shi
- College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu 610065, China
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
| | - Chengxiao Yin
- College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu 610065, China
| | - Bo Zhou
- College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu 610065, China
| | - Wei Xia
- College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu 610065, China
| | - Lin Weng
- College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu 610065, China
| | - Caroline A. Ross
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
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17
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Effect of Polymer Removal on the Morphology and Phase of the Nanoparticles in All-Inorganic Heterostructures Synthesized via Two-Step Polymer Infiltration. Molecules 2021; 26:molecules26030679. [PMID: 33525515 PMCID: PMC7865626 DOI: 10.3390/molecules26030679] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 12/22/2020] [Revised: 01/22/2021] [Accepted: 01/25/2021] [Indexed: 11/16/2022] Open
Abstract
Polymer templates play an essential role in the robust infiltration-based synthesis of functional multicomponent heterostructures with controlled structure, porosity, and composition. Such heterostructures are be used as hybrid organic-inorganic composites or as all-inorganic systems once the polymer templates are removed. Using iron oxide/alumina heterostructures formed by two-step infiltration of polystyrene-block-polyvinyl pyridine block copolymer with iron and aluminum precursors from the solution and vapor-phases, respectively, we show that the phase and morphology of iron oxide nanoparticles dramatically depend on the approach used to remove the polymer. We demonstrate that thermal and plasma oxidative treatments result in iron oxide nanoparticles with either solid or hollow morphologies, respectively, that lead to different magnetic properties of the resulting materials. Our study extends the boundaries of structure manipulations in multicomponent heterostructures synthesized using polymer infiltration synthesis, and hence their properties.
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18
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Zenati A, Kada I, Zaouia GK. Thermal Properties and Self-Assembly Behaviors of Triblock Copolymers Consisting of PEG Segment and Acrylamide-Based Block Bearing Alkyl Side Chains Prepared by RAFT Method. Macromolecules 2021. [DOI: 10.1021/acs.macromol.0c02229] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
Affiliation(s)
- Athmen Zenati
- Central Directorate of Research and Development, Sonatrach, Avenue du 1er Novembre, Boumerdes 35000, Algeria
- Refining and Petrochemistry, Division of Method and Operation, Sonatrach, Arzew 31200, Algeria
| | - Ismail Kada
- Department of Chemical Engineering and Environment, Faculty of Science & Technology, University of Oran, Oran 31000, Algeria
| | - Gherici-Kaddour Zaouia
- Department of Mechanical Engineering, Faculty of Science & Technology, University of Mascara, Mascara 29000, Algeria
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19
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Leniart A, Pula P, Tsai EHR, Majewski PW. Large-Grained Cylindrical Block Copolymer Morphologies by One-Step Room-Temperature Casting. Macromolecules 2020; 53:11178-11189. [PMID: 33380751 PMCID: PMC7759006 DOI: 10.1021/acs.macromol.0c02026] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/03/2020] [Revised: 11/13/2020] [Indexed: 12/11/2022]
Abstract
We report a facile method of ordering block copolymer (BCP) morphologies in which the conventional two-step casting and annealing steps are replaced by a single-step process where microphase separation and grain coarsening are seamlessly integrated within the casting protocol. This is achieved by slowing down solvent evaporation during casting by introducing a nonvolatile solvent into the BCP casting solution that effectively prolongs the duration of the grain-growth phase. We demonstrate the utility of this solvent evaporation annealing (SEA) method by producing well-ordered large-molecular-weight BCP thin films in a total processing time shorter than 3 min without resorting to any extra laboratory equipment other than a basic casting device, i.e., spin- or blade-coater. By analyzing the morphologies of the quenched samples, we identify a relatively narrow range of polymer concentration in the wet film, just above the order-disorder concentration, to be critical for obtaining large-grained morphologies. This finding is corroborated by the analysis of the grain-growth kinetics of horizontally oriented cylindrical domains where relatively large growth exponents (1/2) are observed, indicative of a more rapid defect-annihilation mechanism in the concentrated BCP solution than in thermally annealed BCP melts. Furthermore, the analysis of temperature-resolved kinetics data allows us to calculate the Arrhenius activation energy of the grain coarsening in this one-step BCP ordering process.
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Affiliation(s)
| | - Przemyslaw Pula
- Department
of Chemistry, University of Warsaw, Warsaw 02089, Poland
| | - Esther H. R. Tsai
- Center
for Functional Nanomaterials, Brookhaven
National Laboratory, Upton, New York 11973, United States
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20
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Tu KH, Huang H, Lee S, Lee W, Sun Z, Alexander-Katz A, Ross CA. Machine Learning Predictions of Block Copolymer Self-Assembly. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2020; 32:e2005713. [PMID: 33206426 DOI: 10.1002/adma.202005713] [Citation(s) in RCA: 21] [Impact Index Per Article: 5.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/22/2020] [Revised: 10/15/2020] [Indexed: 06/11/2023]
Abstract
Directed self-assembly of block copolymers is a key enabler for nanofabrication of devices with sub-10 nm feature sizes, allowing patterning far below the resolution limit of conventional photolithography. Among all the process steps involved in block copolymer self-assembly, solvent annealing plays a dominant role in determining the film morphology and pattern quality, yet the interplay of the multiple parameters during solvent annealing, including the initial thickness, swelling, time, and solvent ratio, makes it difficult to predict and control the resultant self-assembled pattern. Here, machine learning tools are applied to analyze the solvent annealing process and predict the effect of process parameters on morphology and defectivity. Two neural networks are constructed and trained, yielding accurate prediction of the final morphology in agreement with experimental data. A ridge regression model is constructed to identify the critical parameters that determine the quality of line/space patterns. These results illustrate the potential of machine learning to inform nanomanufacturing processes.
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Affiliation(s)
- Kun-Hua Tu
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA
| | - Hejin Huang
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA
| | - Sangho Lee
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA
| | - Wonmoo Lee
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA
| | - Zehao Sun
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA
| | - Alfredo Alexander-Katz
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA
| | - Caroline A Ross
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA
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21
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Huang H, Liu R, Ross CA, Alexander-Katz A. Self-Directed Self-Assembly of 3D Tailored Block Copolymer Nanostructures. ACS NANO 2020; 14:15182-15192. [PMID: 33074654 DOI: 10.1021/acsnano.0c05417] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Directed self-assembly (DSA) of block copolymers (BCPs) provides a powerful tool to fabricate various 2D nanostructures. However, it still remains a challenge to extend DSA to make uniform and complex 3D nanostructures through BCP self-assembly. In this paper, we introduce a method to fabricate various nanostructures in 3D and test it using simulations. In particular, we employ dissipative particle dynamics (DPD) simulation to demonstrate that uniform multilayer nanostructures can be achieved by alternating the stacking of two "orthogonal" BCPs films, AB copolymer film and AC copolymer film, without the need to cross-link or etch any of the components. The assembly of a new layer occurs on top of the previous bottom layer, and thus the structural information from the substrate is propagated upward in the film, a process we refer to as self-directed self-assembly (SDSA). If this process is repeated many times, one can have tailored multilayer nanostructures. Furthermore, the natural (bulk) phases of the block copolymers in each layer do not need to be the same, so one can achieve complex 3D assemblies that are not possible with a single-phase 3D system. This method in conjunction with grapho (or chemo) epitaxy is able to evolve a surface pattern into a 3D nanostructure. Here we show several examples of nanostructures fabricated by this process, which include aligned cylinders, spheres on top of cylinders, and orthogonal nanomeshes. Our work should be useful for creating complex 3D nanostructures using self-assembly.
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Affiliation(s)
- Hejin Huang
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Runze Liu
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Caroline A Ross
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Alfredo Alexander-Katz
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
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22
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Cummins C, Mantione D, Cruciani F, Pino G, Demazy N, Shi Y, Portale G, Hadziioannou G, Fleury G. Rapid Self-Assembly and Sequential Infiltration Synthesis of High χ Fluorine-Containing Block Copolymers. Macromolecules 2020. [DOI: 10.1021/acs.macromol.0c01148] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/04/2023]
Affiliation(s)
- Cian Cummins
- CNRS, Bordeaux INP, LCPO, UMR 5629, Univ. Bordeaux, F-33600 Pessac, France
- CNRS, Centre de Recherche Paul Pascal, UMR 5031Univ. Bordeaux, 115 Avenue Schweitzer, 33600 Pessac, France
| | - Daniele Mantione
- CNRS, Bordeaux INP, LCPO, UMR 5629, Univ. Bordeaux, F-33600 Pessac, France
| | - Federico Cruciani
- CNRS, Bordeaux INP, LCPO, UMR 5629, Univ. Bordeaux, F-33600 Pessac, France
| | - Guillaume Pino
- CNRS, Bordeaux INP, LCPO, UMR 5629, Univ. Bordeaux, F-33600 Pessac, France
| | - Nils Demazy
- CNRS, Bordeaux INP, LCPO, UMR 5629, Univ. Bordeaux, F-33600 Pessac, France
| | - Yulin Shi
- Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, NL-9747 AG Groningen, The Netherlands
| | - Giuseppe Portale
- Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, NL-9747 AG Groningen, The Netherlands
| | | | - Guillaume Fleury
- CNRS, Bordeaux INP, LCPO, UMR 5629, Univ. Bordeaux, F-33600 Pessac, France
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23
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Jung FA, Berezkin AV, Tejsner TB, Posselt D, Smilgies D, Papadakis CM. Solvent Vapor Annealing of a Diblock Copolymer Thin Film with a Nonselective and a Selective Solvent: Importance of Pathway for the Morphological Changes. Macromol Rapid Commun 2020; 41:e2000150. [DOI: 10.1002/marc.202000150] [Citation(s) in RCA: 9] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/24/2020] [Revised: 05/15/2020] [Indexed: 11/07/2022]
Affiliation(s)
- Florian A. Jung
- Technische Universität München Physik‐Department Physik der weichen Materie James‐Franck‐Str. 1 Garching 85748 Germany
| | - Anatoly V. Berezkin
- Technische Universität München Physik‐Department Physik der weichen Materie James‐Franck‐Str. 1 Garching 85748 Germany
| | - Tim B. Tejsner
- IMFUFA Department of Science and Environment Roskilde University P.O. Box 260 Roskilde 4000 Denmark
| | - Dorthe Posselt
- IMFUFA Department of Science and Environment Roskilde University P.O. Box 260 Roskilde 4000 Denmark
| | - Detlef‐M. Smilgies
- Cornell High Energy Synchrotron Source (CHESS) Wilson Laboratory Cornell University Ithaca NY 14853 USA
| | - Christine M. Papadakis
- Technische Universität München Physik‐Department Physik der weichen Materie James‐Franck‐Str. 1 Garching 85748 Germany
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24
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Leniart A, Pula P, Sitkiewicz A, Majewski PW. Macroscopic Alignment of Block Copolymers on Silicon Substrates by Laser Annealing. ACS NANO 2020; 14:4805-4815. [PMID: 32159943 PMCID: PMC7497666 DOI: 10.1021/acsnano.0c00696] [Citation(s) in RCA: 21] [Impact Index Per Article: 5.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/24/2020] [Accepted: 03/11/2020] [Indexed: 05/07/2023]
Abstract
Laser annealing is a competitive alternative to conventional oven annealing of block copolymer (BCP) thin films enabling rapid acceleration and precise spatial control of the self-assembly process. Localized heating by a moving laser beam (zone annealing), taking advantage of steep temperature gradients, can additionally yield aligned morphologies. In its original implementation it was limited to specialized germanium-coated glass substrates, which absorb visible light and exhibit low-enough thermal conductivity to facilitate heating at relatively low irradiation power density. Here, we demonstrate a recent advance in laser zone annealing, which utilizes a powerful fiber-coupled near-IR laser source allowing rapid BCP annealing over a large area on conventional silicon wafers. The annealing coupled with photothermal shearing yields macroscopically aligned BCP films, which are used as templates for patterning metallic nanowires. We also report a facile method of transferring laser-annealed BCP films onto arbitrary surfaces. The transfer process allows patterning substrates with a highly corrugated surface and single-step rapid fabrication of multilayered nanomaterials with complex morphologies.
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Affiliation(s)
| | - Przemyslaw Pula
- Department
of Chemistry, University of Warsaw, Warsaw, 02089, Poland
| | | | - Pawel W. Majewski
- Department
of Chemistry, University of Warsaw, Warsaw, 02089, Poland
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25
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Lee YAL, Pryamitsyn V, Rhee D, de la Cruz MO, Odom TW. Strain-Dependent Nanowrinkle Confinement of Block Copolymers. NANO LETTERS 2020; 20:1433-1439. [PMID: 31927935 DOI: 10.1021/acs.nanolett.9b05189] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
This paper describes an all-soft, templated assembly of block copolymers (BCPs) with programmable alignment. Using polymeric nanowrinkles as a confining scaffold, poly(styrene)-block-poly(dimethylsiloxane) (PS-b-PDMS) BCPs were assembled to be parallel or perpendicular to the wrinkle orientation by manipulating the substrate strain. Self-consistent field theory modeling revealed that wrinkle curvature and surface affinity govern the BCP structural formation. Furthermore, control of BCP alignment was demonstrated for complex wrinkle geometries, various copolymer molecular weights, and functional wrinkle skin layers. This integration of BCP patterning with flexible 3D architectures offers a promising nanolithography approach for next-generation soft electronics.
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26
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Annohene G, Pascucci J, Pestov D, Tepper GC. Supercritical fluid-assisted crystallization of CH3NH3PbI3 perovskite films. J Supercrit Fluids 2020. [DOI: 10.1016/j.supflu.2019.104684] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
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27
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Cao W, Xia S, Appold M, Saxena N, Bießmann L, Grott S, Li N, Gallei M, Bernstorff S, Müller-Buschbaum P. Self-Assembly in ultrahigh molecular weight sphere-forming diblock copolymer thin films under strong confinement. Sci Rep 2019; 9:18269. [PMID: 31797983 PMCID: PMC6892843 DOI: 10.1038/s41598-019-54648-3] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/06/2019] [Accepted: 11/12/2019] [Indexed: 11/09/2022] Open
Abstract
Ultrahigh molecular weight (UHMW) diblock copolymers (DBCs) have emerged as a promising template for fabricating large-sized nanostructures. Therefore, it is of high significance to systematically study the influence of film thickness and solvent vapor annealing (SVA) on the structure evolution of UHMW DBC thin films. In this work, spin coating of an asymmetric linear UHMW polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) DBC is used to fabricate thin films, which are spherically structured with an inter-domain distance larger than 150 nm. To enhance the polymer chain mobility and facilitate approaching equilibrium nanostructures, SVA is utilized as a post-treatment of the spin coated films. With increasing film thickness, a local hexagonal packing of PMMA half-spheres on the surface can be obtained, and the order is improved at larger thickness, as determined by grazing incidence small angle X-ray scattering (GISAXS). Additionally, the films with locally hexagonal packed half-spherical morphology show a poor order-order-poor order transition upon SVA, indicating the realization of ordered structure using suitable SVA parameters.
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Affiliation(s)
- Wei Cao
- Technische Universität München, Physik-Department, Lehrstuhl für Funktionelle Materialien, James-Franck-Straße 1, 85748, Garching, Germany
| | - Senlin Xia
- Technische Universität München, Physik-Department, Lehrstuhl für Funktionelle Materialien, James-Franck-Straße 1, 85748, Garching, Germany
| | - Michael Appold
- Technische Universität Darmstadt, Ernst-Berl-Institute for Technical and Macromolecular Chemistry, Alarich-Weiss-Straße 4, 64287, Darmstadt, Germany
| | - Nitin Saxena
- Technische Universität München, Physik-Department, Lehrstuhl für Funktionelle Materialien, James-Franck-Straße 1, 85748, Garching, Germany
| | - Lorenz Bießmann
- Technische Universität München, Physik-Department, Lehrstuhl für Funktionelle Materialien, James-Franck-Straße 1, 85748, Garching, Germany
| | - Sebastian Grott
- Technische Universität München, Physik-Department, Lehrstuhl für Funktionelle Materialien, James-Franck-Straße 1, 85748, Garching, Germany
| | - Nian Li
- Technische Universität München, Physik-Department, Lehrstuhl für Funktionelle Materialien, James-Franck-Straße 1, 85748, Garching, Germany
| | - Markus Gallei
- Saarland University, Chair in Polymer Chemistry, Campus C4 2, 66123, Saarbrücken, Germany
| | - Sigrid Bernstorff
- Elettra-Sincrotrone Trieste S.C.p.A., Strada Statale 14, km 163.5, in AREA Science Park, 34149, Trieste, Italy
| | - Peter Müller-Buschbaum
- Technische Universität München, Physik-Department, Lehrstuhl für Funktionelle Materialien, James-Franck-Straße 1, 85748, Garching, Germany.
- Technische Universität München, Heinz Maier-Leibnitz Zentrum (MLZ), Lichtenbergstr. 1, 85748, Garching, Germany.
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28
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Zhang C, Li H, Li Z, Li Y, Zhang Q, Lu J. Solvent‐Vapor Annealing of Amphiphile/Metal Interface for Orientated Molecular Stacking and Upgraded Resistive Memory Performance. MACROMOL CHEM PHYS 2019. [DOI: 10.1002/macp.201900334] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/06/2022]
Affiliation(s)
- Cheng Zhang
- College of ChemistryChemical Engineering and Materials ScienceCollaborative Innovation Center of Suzhou Nano Science and TechnologySoochow University Suzhou 215123 P. R. China
| | - Hua Li
- College of ChemistryChemical Engineering and Materials ScienceCollaborative Innovation Center of Suzhou Nano Science and TechnologySoochow University Suzhou 215123 P. R. China
| | - Zhuang Li
- College of ChemistryChemical Engineering and Materials ScienceCollaborative Innovation Center of Suzhou Nano Science and TechnologySoochow University Suzhou 215123 P. R. China
| | - Yang Li
- Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy ApplicationSchool of Mathematics and PhysicsSuzhou University of Science and Technology Suzhou Jiangsu 215009 P. R. China
| | - Qi‐jian Zhang
- College of ChemistryChemical Engineering and Materials ScienceCollaborative Innovation Center of Suzhou Nano Science and TechnologySoochow University Suzhou 215123 P. R. China
| | - Jian‐mei Lu
- College of ChemistryChemical Engineering and Materials ScienceCollaborative Innovation Center of Suzhou Nano Science and TechnologySoochow University Suzhou 215123 P. R. China
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29
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Cheng X, Böker A, Tsarkova L. Temperature-Controlled Solvent Vapor Annealing of Thin Block Copolymer Films. Polymers (Basel) 2019; 11:E1312. [PMID: 31390732 PMCID: PMC6722758 DOI: 10.3390/polym11081312] [Citation(s) in RCA: 11] [Impact Index Per Article: 2.2] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/07/2019] [Revised: 08/01/2019] [Accepted: 08/03/2019] [Indexed: 12/05/2022] Open
Abstract
Solvent vapor annealing is as an effective and versatile alternative to thermal annealing to equilibrate and control the assembly of polymer chains in thin films. Here, we present scientific and practical aspects of the solvent vapor annealing method, including the discussion of such factors as non-equilibrium conformational states and chain dynamics in thin films in the presence of solvent. Homopolymer and block copolymer films have been used in model studies to evaluate the robustness and the reproducibility of the solvent vapor processing, as well as to assess polymer-solvent interactions under confinement. Advantages of utilizing a well-controlled solvent vapor environment, including practically interesting regimes of weakly saturated vapor leading to poorly swollen states, are discussed. Special focus is given to dual temperature control over the set-up instrumentation and to the potential of solvo-thermal annealing. The evaluated insights into annealing dynamics derived from the studies on block copolymer films can be applied to improve the processing of thin films of crystalline and conjugated polymers as well as polymer composite in confined geometries.
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Affiliation(s)
- Xiao Cheng
- Fraunhofer Institute for Applied Polymer Research IAP, Geiselbergstr. 69, 14476 Potsdam-Golm, Germany
- Lehrstuhl für Polymermaterialien und Polymertechnologie, University of Potsdam, 14476 Potsdam-Golm, Germany
| | - Alexander Böker
- Fraunhofer Institute for Applied Polymer Research IAP, Geiselbergstr. 69, 14476 Potsdam-Golm, Germany
- Lehrstuhl für Polymermaterialien und Polymertechnologie, University of Potsdam, 14476 Potsdam-Golm, Germany
| | - Larisa Tsarkova
- Deutsches Textilforschungszentrum Nord-West (DNTW), Adlerstr. 1, 47798 Krefeld, Germany.
- Chair of Colloid Chemistry, Department of Chemistry, Moscow State University, Leninskie Gory 1-3, 119991 Moscow, Russia.
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30
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Jung H, Shin WH, Park TW, Choi YJ, Yoon YJ, Park SH, Lim JH, Kwon JD, Lee JW, Kwon SH, Seong GH, Kim KH, Park WI. Hierarchical multi-level block copolymer patterns by multiple self-assembly. NANOSCALE 2019; 11:8433-8441. [PMID: 30985848 DOI: 10.1039/c9nr00774a] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Uniform, well-ordered sub-20 nm patterns can be generated by the templated self-assembly of block copolymers (BCPs) with a high Flory-Huggins interaction parameter (χ). However, the self-assembled BCP monolayers remain limited in the possible structural geometries. Here, we introduce a multiple self-assembly method which uses di-BCPs to produce diverse morphologies, such as dot, dot-in-honeycomb, line-on-dot, double-dot, pondering, dot-in-pondering, and line-on-pondering patterns. To improve the diversity of BCP morphological structures, we employed sphere-forming and cylinder-forming poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) BCPs with a high χ. The self-assembled mono-layer and double-layer SiOx dot patterns were modified at a high temperature (∼800 °C), showing hexagonally arranged (dot) and double-hexagonally arranged (pondering) SiOx patterns, respectively. We successfully obtained additional new nanostructures (big-dot, dot-in-honeycomb, line-on-dot, pondering, dot-in-pondering, and line-on-pondering types) through a second self-assembly of cylinder-forming BCPs using the dot and pondering patterns as guiding templates. This simple approach can likely be extended to the multiple self-assembly of many other BCPs with good functionality, significantly contributing to the development of various nanodevices.
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Affiliation(s)
- Hyunsung Jung
- Electronic Convergence Materials Division, Korea Institute of Ceramic Engineering & Technology (KICET) 101 Soho-ro, Jinju 52851, Republic of Korea.
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31
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Yue B, Jin X, Zhao P, Zhu M, Zhu L. Directed Self-Assembly of Templatable Block Copolymers by Easily Accessible Magnetic Control. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2019; 15:e1804572. [PMID: 30673173 DOI: 10.1002/smll.201804572] [Citation(s) in RCA: 13] [Impact Index Per Article: 2.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/01/2018] [Revised: 01/10/2019] [Indexed: 06/09/2023]
Abstract
Magnetic control has been a prosperous and powerful contactless approach in arraying materials into high-order nanostructures. However, it is tremendously difficult to control organic polymers in this way on account of the weak magnetic response. The preparation of block copolymers (BCPs) with high magnetostatic energy is reported here, relying on an effective electrostatic coupling between paramagnetic ions and polymer side chains. As a result, the BCPs undergo a magnetically directed self-assembly to form microphase-segregated nanostructures with long-range order. It is emphasized that such a precisely controlled alignment of the BCPs is performed upon a single commercial magnet with low-intensity field (0.35 Tesla). This strategy is profoundly easy-to-handle in contrast to routine electromagnetic methods with high-intensity field (5-10 Tesla). More significantly, the paramagnetic metal component in the BCP samples can be smartly removed, providing a template effect with a preservation of the directed self-assembled nanofeatures for patterning follow-up functionalized species through the original binding site.
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Affiliation(s)
- Bingbing Yue
- Key Laboratory of Molecular Engineering of Polymer Department of Macromolecular Science, Fudan University, Shanghai, 200438, China
| | - Xin Jin
- Shanghai Synchrotron Radiation Facility, Chinese Academy of Sciences, Shanghai, 201204, China
| | - Pei Zhao
- Key Laboratory of Molecular Engineering of Polymer Department of Macromolecular Science, Fudan University, Shanghai, 200438, China
| | - Mingjie Zhu
- Key Laboratory of Molecular Engineering of Polymer Department of Macromolecular Science, Fudan University, Shanghai, 200438, China
| | - Liangliang Zhu
- Key Laboratory of Molecular Engineering of Polymer Department of Macromolecular Science, Fudan University, Shanghai, 200438, China
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32
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Han J, Kim JS, Shin JM, Yun H, Kim Y, Park H, Kim BJ. Rapid solvo-microwave annealing for optimizing ordered nanostructures and crystallization of regioregular polythiophene-based block copolymers. Polym Chem 2019. [DOI: 10.1039/c9py00871c] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/23/2022]
Abstract
Solvo-microwave annealing is an effective method for producing thin films of polythiophene-based block copolymers with ordered structures and high crystallinity in a very short processing time (∼3 min).
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Affiliation(s)
- Junghun Han
- Department of Chemical and Biomolecular Engineering
- Korea Advanced Institute of Science and Technology (KAIST)
- Daejeon 34141
- Republic of Korea
| | - Jin-Seong Kim
- Department of Chemical and Biomolecular Engineering
- Korea Advanced Institute of Science and Technology (KAIST)
- Daejeon 34141
- Republic of Korea
| | - Jae Man Shin
- Department of Chemical and Biomolecular Engineering
- Korea Advanced Institute of Science and Technology (KAIST)
- Daejeon 34141
- Republic of Korea
| | - Hongseok Yun
- Department of Chemical and Biomolecular Engineering
- Korea Advanced Institute of Science and Technology (KAIST)
- Daejeon 34141
- Republic of Korea
| | - Youngkwon Kim
- Department of Chemical and Biomolecular Engineering
- Korea Advanced Institute of Science and Technology (KAIST)
- Daejeon 34141
- Republic of Korea
| | - Hyeonjung Park
- Department of Chemical and Biomolecular Engineering
- Korea Advanced Institute of Science and Technology (KAIST)
- Daejeon 34141
- Republic of Korea
| | - Bumjoon J. Kim
- Department of Chemical and Biomolecular Engineering
- Korea Advanced Institute of Science and Technology (KAIST)
- Daejeon 34141
- Republic of Korea
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33
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Merekalov AS, Derikov YI, Ezhov AA, Govorun EN, Kudryavtsev YV. Evolution of Microstructure in Block Copolymer Thin Films during Zone Annealing. POLYMER SCIENCE SERIES A 2018. [DOI: 10.1134/s0965545x18060068] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/23/2022]
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34
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Modi A, Karim A, Tsige M. Solvent and Substrate Induced Synergistic Ordering in Block Copolymer Thin Films. Macromolecules 2018. [DOI: 10.1021/acs.macromol.8b00816] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
Affiliation(s)
- Arvind Modi
- College of Polymer Science and Polymer Engineering, The University of Akron, Akron, Ohio 44325, United States
| | - Alamgir Karim
- College of Polymer Science and Polymer Engineering, The University of Akron, Akron, Ohio 44325, United States
| | - Mesfin Tsige
- College of Polymer Science and Polymer Engineering, The University of Akron, Akron, Ohio 44325, United States
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35
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Xiong S, Li D, Hur SM, Craig GSW, Arges CG, Qu XP, Nealey PF. The Solvent Distribution Effect on the Self-Assembly of Symmetric Triblock Copolymers during Solvent Vapor Annealing. Macromolecules 2018. [DOI: 10.1021/acs.macromol.8b01275] [Citation(s) in RCA: 13] [Impact Index Per Article: 2.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/27/2023]
Affiliation(s)
| | | | - Su-Mi Hur
- School of Polymer Science and Engineering, Chonnam National University, Gwangju, 61186 Korea
| | - Gordon S. W. Craig
- Institute for Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States
| | - Christopher G. Arges
- Cain Department of Chemical Engineering, Louisiana State University, Baton Rouge, Louisiana 70803, United States
| | | | - Paul F. Nealey
- Institute for Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States
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36
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Lee S, Cheng LC, Gadelrab KR, Ntetsikas K, Moschovas D, Yager KG, Avgeropoulos A, Alexander-Katz A, Ross CA. Double-Layer Morphologies from a Silicon-Containing ABA Triblock Copolymer. ACS NANO 2018; 12:6193-6202. [PMID: 29856599 DOI: 10.1021/acsnano.8b02851] [Citation(s) in RCA: 14] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/21/2023]
Abstract
A combined experimental and self-consistent-field theoretical (SCFT) investigation of the phase behavior of poly(stryrene- b-dimethylsiloxane- b-styrene) (PS- b-PDMS- b-PS, or SDS32) thin films during solvent vapor annealing is presented. The morphology of the triblock copolymer is described as a function of the as-cast film thickness and the ratio of two different solvent vapors, toluene and heptane. SDS32 formed terraced bilayer morphologies even when the film thickness was much lower than the commensurate thickness. The morphology transitioned between bilayer cylinders, bilayer perforated lamellae, and bilayer lamellae, including mixed structures such as a perforated lamella on top of a layer of in-plane cylinders, as the heptane fraction during solvent annealing increased. SCFT modeling showed the same morphological trends as a function of the block volume fraction. In comparison with diblock PS- b-PDMS with the same molecular weight, the SDS32 offers a simple route to produce a diversity of well-ordered bilayer structures with smaller feature sizes, including the formation of bilayer perforated lamellae over a large process window.
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Affiliation(s)
- Sangho Lee
- Department of Materials Science and Engineering , Massachusetts Institute of Technology , Cambridge , Massachusetts 02139 , United States
| | - Li-Chen Cheng
- Department of Materials Science and Engineering , Massachusetts Institute of Technology , Cambridge , Massachusetts 02139 , United States
| | - Karim R Gadelrab
- Department of Materials Science and Engineering , Massachusetts Institute of Technology , Cambridge , Massachusetts 02139 , United States
| | - Konstantinos Ntetsikas
- Department of Materials Science Engineering , University of Ioannina , University Campus-Dourouti , 45110 Ioannina , Greece
| | - Dimitrios Moschovas
- Department of Materials Science Engineering , University of Ioannina , University Campus-Dourouti , 45110 Ioannina , Greece
| | - Kevin G Yager
- Center for Functional Nanomaterials , Brookhaven National Laboratory , Upton , New York 11973 , United States
| | - Apostolos Avgeropoulos
- Department of Materials Science Engineering , University of Ioannina , University Campus-Dourouti , 45110 Ioannina , Greece
| | - Alfredo Alexander-Katz
- Department of Materials Science and Engineering , Massachusetts Institute of Technology , Cambridge , Massachusetts 02139 , United States
| | - Caroline A Ross
- Department of Materials Science and Engineering , Massachusetts Institute of Technology , Cambridge , Massachusetts 02139 , United States
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37
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Gadelrab KR, Ding Y, Pablo-Pedro R, Chen H, Gotrik KW, Tempel DG, Ross CA, Alexander-Katz A. Limits of Directed Self-Assembly in Block Copolymers. NANO LETTERS 2018; 18:3766-3772. [PMID: 29775312 DOI: 10.1021/acs.nanolett.8b00997] [Citation(s) in RCA: 9] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Understanding the conditions under which defects appear in self-assembling soft-matter systems is of great importance, for example, in the development of block-copolymer (BCP) nanolithography. Here, we explore the limits of the directed self-assembly of BCPs by deliberately adding random imperfections to the template. Our results show that defects emerge due to local "shear-like" distortions of the polymer-template system, a new mechanism that is fundamentally different from the canonical mechanisms of 2D melting. Furthermore, our results provide a general criterion for melting, obtaining the highest tolerance to random deviations from the perfect template at about 0.1 L0, where L0 is the natural BCP periodicity. These findings establish the limits of directed self-assembly of BCPs and can be extended to other classes of materials with soft interactions.
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38
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Lundy R, Flynn SP, Cummins C, Kelleher SM, Collins MN, Dalton E, Daniels S, Morris MA, Enright R. Controlled solvent vapor annealing of a high χ block copolymer thin film. Phys Chem Chem Phys 2018; 19:2805-2815. [PMID: 28067366 DOI: 10.1039/c6cp07633e] [Citation(s) in RCA: 31] [Impact Index Per Article: 5.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
Molecular self-assembling block copolymers (BCPs) have shown promise as a next generation bottom-up lithography technology. However, a critical step in advancing this approach is the elimination of polymer dewetting due to bulk solvent nucleation and thermodynamically driven film rupture that can occur during the solvent vapor annealing process. We report on the pattern formation via phase segregation of spin coated diblock copolymer films through the investigation of annealing parameters in the limit of high solvent vapor saturation conditions that results in wafer-scale patterning without observing polymer dewetting defects. Specifically, the work addresses polymer dewetting in diblock copolymer nanodot templates through the use of a "neutral" functionalization layer and the development of a custom-built solvent vapor annealing chamber to precisely control saturation conditions. Furthermore, the long anneal times (4 h) using a standard static solvent vapor annealing procedure were reduced to ∼15-30 minutes with our dynamic solvent vapor annealing system for the high χ, cylindrical forming poly(styrene)-block-poly(4-vinyl-pyridine) [PS-b-P4VP] diblock copolymer system. We discuss the kinetic mechanism governing the phase segregation process that highlights the small processing window bounded by long phase segregation timescales (≳1 min) on one side and the initiation of polymer film dewetting on the other. These results demonstrate a key step towards realizing a high fidelity, low cost BCP patterning technique for large-scale "bottom-up" feature definition at nanometer length scales.
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Affiliation(s)
- Ross Lundy
- Thermal Management Research Group, Efficient Energy Transfer (ηET) Dept., Bell Labs Ireland, Nokia, Blanchardstown Business & Technology Park, Snugborough Rd., Dublin 15, Ireland. and Stokes Laboratories, University of Limerick, Co., Limerick, Ireland
| | - Shauna P Flynn
- National Centre for Plasma Science and Technology, Dublin City University, Glasnevin, Dublin 9, Ireland
| | - Cian Cummins
- AMBER@CRANN, Trinity College Dublin, Dublin, Ireland
| | - Susan M Kelleher
- National Centre for Plasma Science and Technology, Dublin City University, Glasnevin, Dublin 9, Ireland
| | | | - Eric Dalton
- Stokes Laboratories, University of Limerick, Co., Limerick, Ireland
| | - Stephen Daniels
- National Centre for Plasma Science and Technology, Dublin City University, Glasnevin, Dublin 9, Ireland
| | | | - Ryan Enright
- Thermal Management Research Group, Efficient Energy Transfer (ηET) Dept., Bell Labs Ireland, Nokia, Blanchardstown Business & Technology Park, Snugborough Rd., Dublin 15, Ireland.
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39
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Park WI, Choi YJ, Yuk JM, Seo HK, Kim KH. Enhanced self-assembly of block copolymers by surface modification of a guiding template. Polym J 2017. [DOI: 10.1038/s41428-017-0007-5] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
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40
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Giammaria TJ, Ferrarese Lupi F, Seguini G, Sparnacci K, Antonioli D, Gianotti V, Laus M, Perego M. Effect of Entrapped Solvent on the Evolution of Lateral Order in Self-Assembled P(S-r-MMA)/PS-b-PMMA Systems with Different Thicknesses. ACS APPLIED MATERIALS & INTERFACES 2017; 9:31215-31223. [PMID: 28195457 DOI: 10.1021/acsami.6b14332] [Citation(s) in RCA: 11] [Impact Index Per Article: 1.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/21/2023]
Abstract
Block copolymers (BCPs) are emerging as a cost-effective nanofabrication tool to complement conventional optical lithography because they self-assemble in highly ordered polymeric templates with well-defined sub-20-nm periodic features. In this context, cylinder-forming polystyrene-block-poly(methyl methacrylate) BCPs are revealed as an interesting material of choice because the orientation of the nanostructures with respect to the underlying substrate can be effectively controlled by a poly(styrene-random-methyl methacrylate) random copolymer (RCP) brush layer grafted to the substrate prior to BCP deposition. In this work, we investigate the self-assembly process and lateral order evolution in RCP + BCP systems consisting of cylinder-forming PS-b-PMMA (67 kg mol-1, PS fraction of ∼70%) films with thicknesses of 30, 70, 100, and 130 nm deposited on RCP brush layers having thicknesses ranging from 2 to 20 nm. The self-assembly process is promoted by a rapid thermal processing machine operating at 250 °C for 300 s. The level of lateral order is determined by measuring the correlation length (ξ) in the self-assembled BCP films. Moreover, the amount of solvent (Φ) retained in the RCP + BCP systems is measured as a function of the thicknesses of the RCP and BCP layers, respectively. In the 30-nm-thick BCP films, an increase in Φ as a function of the thickness of the RCP brush layer significantly affects the self-assembly kinetics and the final extent of the lateral order in the BCP films. Conversely, no significant variations of ξ are observed in the 70-, 100-, and 130-nm-thick BCP films with increasing Φ.
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Affiliation(s)
- Tommaso Jacopo Giammaria
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
- Dipartimento di Scienze e Innovazione Tecnologica, Università del Piemonte orientale ''A. Avogadro'' , Viale T. Michel 11, 15121 Alessandria, Italy
| | | | - Gabriele Seguini
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
| | - Katia Sparnacci
- Dipartimento di Scienze e Innovazione Tecnologica, Università del Piemonte orientale ''A. Avogadro'' , Viale T. Michel 11, 15121 Alessandria, Italy
| | - Diego Antonioli
- Dipartimento di Scienze e Innovazione Tecnologica, Università del Piemonte orientale ''A. Avogadro'' , Viale T. Michel 11, 15121 Alessandria, Italy
| | - Valentina Gianotti
- Dipartimento di Scienze e Innovazione Tecnologica, Università del Piemonte orientale ''A. Avogadro'' , Viale T. Michel 11, 15121 Alessandria, Italy
| | - Michele Laus
- Dipartimento di Scienze e Innovazione Tecnologica, Università del Piemonte orientale ''A. Avogadro'' , Viale T. Michel 11, 15121 Alessandria, Italy
| | - Michele Perego
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
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41
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Wang N, Wang T, Hu Y. Tailoring Membrane Surface Properties and Ultrafiltration Performances via the Self-Assembly of Polyethylene Glycol-block-Polysulfone-block-Polyethylene Glycol Block Copolymer upon Thermal and Solvent Annealing. ACS APPLIED MATERIALS & INTERFACES 2017; 9:31018-31030. [PMID: 28805367 DOI: 10.1021/acsami.7b06997] [Citation(s) in RCA: 28] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
Recently, ultrafiltration (UF) membranes have faced great challenges including the fine control of membrane surfaces for high filtration performances and antifouling properties in treating complex solution systems. Here, a particular type of amphiphilic block copolymer polyethylene glycol-block-polysulfone-block-polyethylene glycol (PEG-b-PSf-b-PEG) was synthesized through one-pot step-growth polymerization with mPEG [monomethylpoly(ethylene glycol)] as two ends to achieve the mobility of hydrophilic polymer chains. Without any other polymers or additives involved, the PEG-b-PSf-b-PEG triblock copolymer UF membrane was fabricated through the non-solvent-induced phase separation (NIPS) method. The surface properties and filtration performances of UF membranes were tailored through the self-assembly of PEG-b-PSf-b-PEG triblock copolymers combining the thermal and solvent annealing treatments in water at 90 °C for 16 h. The annealed PEG-b-PSf-b-PEG triblock copolymer membrane significantly enhanced its water flux resulting from the increased mean pore size with the improved porosity, as well as the decreased skin layer thickness, upon annealing. More importantly, the PEG-b-PSf-b-PEG triblock copolymer membrane surface turned from hydrophobic to hydrophilic upon annealing with the PEG enrichment on the surface, and exhibited improved protein antifouling performances. Our research opens a new avenue to tailor the membrane structure and surface properties by self-assembly of amphiphilic block copolymers upon thermal and solvent annealing treatments.
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Affiliation(s)
- Ning Wang
- CAS Key Laboratory of Coastal Environmental Processes and Ecological Remediation, Research Center for Coastal Environmental Engineering and Technology of Shandong Province, Yantai Institute of Coastal Zone Research, Chinese Academy of Sciences , Yantai, Shandong Province 264003, P. R. China
| | - Tao Wang
- CAS Key Laboratory of Coastal Environmental Processes and Ecological Remediation, Research Center for Coastal Environmental Engineering and Technology of Shandong Province, Yantai Institute of Coastal Zone Research, Chinese Academy of Sciences , Yantai, Shandong Province 264003, P. R. China
| | - Yunxia Hu
- CAS Key Laboratory of Coastal Environmental Processes and Ecological Remediation, Research Center for Coastal Environmental Engineering and Technology of Shandong Province, Yantai Institute of Coastal Zone Research, Chinese Academy of Sciences , Yantai, Shandong Province 264003, P. R. China
- State Key Laboratory of Separation Membranes and Membrane Processes, Tianjin Polytechnic University , Tianjin 300387, P. R. China
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42
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Jin HM, Park DY, Jeong SJ, Lee GY, Kim JY, Mun JH, Cha SK, Lim J, Kim JS, Kim KH, Lee KJ, Kim SO. Flash Light Millisecond Self-Assembly of High χ Block Copolymers for Wafer-Scale Sub-10 nm Nanopatterning. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2017; 29:1700595. [PMID: 28635174 DOI: 10.1002/adma.201700595] [Citation(s) in RCA: 25] [Impact Index Per Article: 3.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/30/2017] [Revised: 05/01/2017] [Indexed: 05/23/2023]
Abstract
One of the fundamental challenges encountered in successful incorporation of directed self-assembly in sub-10 nm scale practical nanolithography is the process compatibility of block copolymers with a high Flory-Huggins interaction parameter (χ). Herein, reliable, fab-compatible, and ultrafast directed self-assembly of high-χ block copolymers is achieved with intense flash light. The instantaneous heating/quenching process over an extremely high temperature (over 600 °C) by flash light irradiation enables large grain growth of sub-10 nm scale self-assembled nanopatterns without thermal degradation or dewetting in a millisecond time scale. A rapid self-assembly mechanism for a highly ordered morphology is identified based on the kinetics and thermodynamics of the block copolymers with strong segregation. Furthermore, this novel self-assembly mechanism is combined with graphoepitaxy to demonstrate the feasibility of ultrafast directed self-assembly of sub-10 nm nanopatterns over a large area. A chemically modified graphene film is used as a flexible and conformal light-absorbing layer. Subsequently, transparent and mechanically flexible nanolithography with a millisecond photothermal process is achieved leading the way for roll-to-roll processability.
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Affiliation(s)
- Hyeong Min Jin
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon, 34141, Republic of Korea
| | - Dae Yong Park
- Department of Materials Science and Engineering, KAIST, Daejeon, 34141, Republic of Korea
| | - Seong-Jun Jeong
- Device Laboratory, Device & System Research Center, Samsung Advanced Institute and Technology, Suwon, 16678, Republic of Korea
| | - Gil Yong Lee
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon, 34141, Republic of Korea
| | - Ju Young Kim
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon, 34141, Republic of Korea
| | - Jeong Ho Mun
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon, 34141, Republic of Korea
| | - Seung Keun Cha
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon, 34141, Republic of Korea
| | - Joonwon Lim
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon, 34141, Republic of Korea
| | - Jun Soo Kim
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon, 34141, Republic of Korea
| | - Kwang Ho Kim
- Department of Materials Science and Engineering, Pusan National University, Pusan, 46241, Republic of Korea
| | - Keon Jae Lee
- Department of Materials Science and Engineering, KAIST, Daejeon, 34141, Republic of Korea
| | - Sang Ouk Kim
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon, 34141, Republic of Korea
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43
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Zhou Z, Liu G. Controlling the Pore Size of Mesoporous Carbon Thin Films through Thermal and Solvent Annealing. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2017; 13:1603107. [PMID: 28151575 DOI: 10.1002/smll.201603107] [Citation(s) in RCA: 15] [Impact Index Per Article: 2.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/16/2016] [Revised: 12/15/2016] [Indexed: 05/19/2023]
Abstract
Herein an approach to controlling the pore size of mesoporous carbon thin films from metal-free polyacrylonitrile-containing block copolymers is described. A high-molecular-weight poly(acrylonitrile-block-methyl methacrylate) (PAN-b-PMMA) is synthesized via reversible addition-fragmentation chain transfer (RAFT) polymerization. The authors systematically investigate the self-assembly behavior of PAN-b-PMMA thin films during thermal and solvent annealing, as well as the pore size of mesoporous carbon thin films after pyrolysis. The as-spin-coated PAN-b-PMMA is microphase-separated into uniformly spaced globular nanostructures, and these globular nanostructures evolve into various morphologies after thermal or solvent annealing. Surprisingly, through thermal annealing and subsequent pyrolysis of PAN-b-PMMA into mesoporous carbon thin films, the pore size and center-to-center spacing increase significantly with thermal annealing temperature, different from most block copolymers. In addition, the choice of solvent in solvent annealing strongly influences the block copolymer nanostructure and the pore size of mesoporous carbon thin films. The discoveries herein provide a simple strategy to control the pore size of mesoporous carbon thin films by tuning thermal or solvent annealing conditions, instead of synthesizing a series of block copolymers of various molecular weights and compositions.
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Affiliation(s)
- Zhengping Zhou
- Department of Chemistry and Macromolecules Innovation Institute, Virginia Tech, Blacksburg, VA, 24061, USA
| | - Guoliang Liu
- Department of Chemistry and Macromolecules Innovation Institute, Virginia Tech, Blacksburg, VA, 24061, USA
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44
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Singer JP. Thermocapillary approaches to the deliberate patterning of polymers. ACTA ACUST UNITED AC 2017. [DOI: 10.1002/polb.24298] [Citation(s) in RCA: 29] [Impact Index Per Article: 4.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/29/2023]
Affiliation(s)
- Jonathan Phillip Singer
- Department of Mechanical and Aerospace Engineering; Rutgers, the State University of New Jersey, 98 Brett Road; Piscataway New Jersey 08854
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45
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Lee K, Kreider M, Bai W, Cheng LC, Dinachali SS, Tu KH, Huang T, Ntetsikas K, Liontos G, Avgeropoulos A, Ross CA. UV-solvent annealing of PDMS-majority and PS-majority PS-b-PDMS block copolymer films. NANOTECHNOLOGY 2016; 27:465301. [PMID: 27736809 DOI: 10.1088/0957-4484/27/46/465301] [Citation(s) in RCA: 7] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
The response of polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) thin films to UV exposure during solvent vapor annealing is described, in order to improve their applicability in nanolithography and nanofabrication. Two BCPs were examined, one with the PS block as majority (f PS = 68%, M n = 53 kg mol-1), the other with PDMS block as majority (f PDMS = 67%, M n = 44 kg mol-1). A 5 min UV irradiation was applied during solvent vapor annealing which led to both partial crosslinking of the polymer and a small increase in the temperature of the annealing chamber. This approach was effective for improving the correlation length of the self-assembled microdomain arrays and in limiting subsequent flow of the PDMS in the PDMS-majority BCP to preserve the post-anneal morphology. Ordering and orientation of microdomains were controlled by directed self-assembly of the BCPs in trench substrates. Highly-ordered perpendicular nanochannel arrays were obtained in the PDMS-majority BCP.
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Affiliation(s)
- Keehong Lee
- Department of Materials Science and Engineering, MIT, Cambridge MA 02139, USA. Semiconductor R&D Center, Samsung Electronics, Hwasung-City, Gyeonggi-do, Korea
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46
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Block copolymer thin films: Characterizing nanostructure evolution with in situ X-ray and neutron scattering. POLYMER 2016. [DOI: 10.1016/j.polymer.2016.06.069] [Citation(s) in RCA: 26] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/17/2022]
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47
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Shelton CK, Jones RL, Dura JA, Epps TH. Tracking Solvent Distribution in Block Polymer Thin Films during Solvent Vapor Annealing with in Situ Neutron Scattering. Macromolecules 2016. [DOI: 10.1021/acs.macromol.6b02046] [Citation(s) in RCA: 14] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
Affiliation(s)
- Cameron K. Shelton
- Department of Chemical and Biomolecular Engineering and ‡Department of Materials Science
and Engineering, University of Delaware, Newark, Delaware 19716, United States
- Materials Science and Engineering Division and ∥NIST Center for
Neutron Research, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States
| | - Ronald L. Jones
- Department of Chemical and Biomolecular Engineering and ‡Department of Materials Science
and Engineering, University of Delaware, Newark, Delaware 19716, United States
- Materials Science and Engineering Division and ∥NIST Center for
Neutron Research, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States
| | - Joseph A. Dura
- Department of Chemical and Biomolecular Engineering and ‡Department of Materials Science
and Engineering, University of Delaware, Newark, Delaware 19716, United States
- Materials Science and Engineering Division and ∥NIST Center for
Neutron Research, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States
| | - Thomas H. Epps
- Department of Chemical and Biomolecular Engineering and ‡Department of Materials Science
and Engineering, University of Delaware, Newark, Delaware 19716, United States
- Materials Science and Engineering Division and ∥NIST Center for
Neutron Research, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States
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48
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Cummins C, Ghoshal T, Holmes JD, Morris MA. Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2016; 28:5586-618. [PMID: 26749571 DOI: 10.1002/adma.201503432] [Citation(s) in RCA: 41] [Impact Index Per Article: 5.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/16/2015] [Revised: 10/07/2015] [Indexed: 05/12/2023]
Abstract
Block copolymers (BCPs) and their directed self-assembly (DSA) has emerged as a realizable complementary tool to aid optical patterning of device elements for future integrated circuit advancements. Methods to enhance BCP etch contrast for DSA application and further potential applications of inorganic nanomaterial features (e.g., semiconductor, dielectric, metal and metal oxide) are examined. Strategies to modify, infiltrate and controllably deposit inorganic materials by utilizing neat self-assembled BCP thin films open a rich design space to fabricate functional features in the nanoscale regime. An understanding and overview on innovative ways for the selective inclusion/infiltration or deposition of inorganic moieties in microphase separated BCP nanopatterns is provided. Early initial inclusion methods in the field and exciting contemporary reports to further augment etch contrast in BCPs for pattern transfer application are described. Specifically, the use of evaporation and sputtering methods, atomic layer deposition, sequential infiltration synthesis, metal-salt inclusion and aqueous metal reduction methodologies forming isolated nanofeatures are highlighted in di-BCP systems. Functionalities and newly reported uses for electronic and non-electronic technologies based on the inherent properties of incorporated inorganic nanostructures using di-BCP templates are highlighted. We outline the potential for extension of incorporation methods to triblock copolymer features for more diverse applications. Challenges and emerging areas of interest for inorganic infiltration of BCPs are also discussed.
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Affiliation(s)
- Cian Cummins
- Materials Research Group, Department of Chemistry and Tyndall National Institute, University College Cork, Cork, Ireland
- AMBER@CRANN, Trinity College Dublin, Dublin, Ireland
| | - Tandra Ghoshal
- Materials Research Group, Department of Chemistry and Tyndall National Institute, University College Cork, Cork, Ireland
- AMBER@CRANN, Trinity College Dublin, Dublin, Ireland
| | - Justin D Holmes
- AMBER@CRANN, Trinity College Dublin, Dublin, Ireland
- Materials Chemistry and Analysis Group, Department of Chemistry and Tyndall National Institute, University College Cork, Cork, Ireland
| | - Michael A Morris
- Materials Research Group, Department of Chemistry and Tyndall National Institute, University College Cork, Cork, Ireland
- AMBER@CRANN, Trinity College Dublin, Dublin, Ireland
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Ghoshal T, Chaudhari A, Cummins C, Shaw MT, Holmes JD, Morris MA. Morphological evolution of lamellar forming polystyrene-block-poly(4-vinylpyridine) copolymers under solvent annealing. SOFT MATTER 2016; 12:5429-5437. [PMID: 27240904 DOI: 10.1039/c6sm00815a] [Citation(s) in RCA: 11] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
In this work, we are reporting a very simple and efficient method to form lamellar structures of symmetric polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) copolymer thin films with vertically (to the surface plane) orientated lamellae using a solvent annealing approach. The methodology does not require any brush chemistry to engineer a neutral surface and it is the block neutral nature of the film-solvent vapour interface that defines the orientation of the lamellae. The microphase separated structure of two different molecular weight lamellar forming PS-block-P4VP copolymers formed under solvent vapour annealing was monitored using atomic force microscopy (AFM) so as to understand the morphological changes of the films upon different solvent exposure. In particular, the morphology changes from micellar structures to well-defined microphase separated arrangements. The choice of solvent/s (single and dual solvent exposure) and the solvent annealing conditions (temperature, time etc.) has important effects on structural transitions of the films and it was found that a block neutral solvent was required to realize vertically aligned P4VP lamellae. The results of the structural variation of the phase separated nanostructured films through the exposure to ethanol are also described.
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Affiliation(s)
- Tandra Ghoshal
- Department of Chemistry and Tyndall National Institute, University College Cork, Cork, Ireland.
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Garnier J, Arias-Zapata J, Marconot O, Arnaud S, Böhme S, Girardot C, Buttard D, Zelsmann M. Sub-10 nm Silicon Nanopillar Fabrication Using Fast and Brushless Thermal Assembly of PS-b-PDMS Diblock Copolymer. ACS APPLIED MATERIALS & INTERFACES 2016; 8:9954-9960. [PMID: 27020847 DOI: 10.1021/acsami.6b01255] [Citation(s) in RCA: 11] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
A new approach to obtaining spherical nanodomains using polystyrene-block-polydimethylsiloxane (PS-b-PDMS) is proposed. To reduce drastically the process time, we blended a copolymer with cylindrical morphology with a PS homopolymer. Adding PS homopolymer into a low-molar-mass cylindrical morphology PS-b-PDMS system drives it toward a spherical morphology. Besides, by controlling the as-spun state, spherical PDMS nanodomains could be kept and thermally arranged. This PS-homopolymer addition allows not only an efficient, purely thermal arrangement process of spheres but also the ability to work directly on nontreated silicon substrates. Indeed, as shown by STEM measurements, no PS brush surface treatment was necessary in our study to avoid a PDMS wetting layer at the interface with the Si substrate. Our approach was compared to a sphere-forming diblock copolymer, which needs a longer thermal annealing. Furthermore, GISAXS measurements provided complete information on PDMS sphere features. Excellent long-range order spherical microdomains were therefore produced on flat surfaces and inside graphoepitaxy trenches with a period of 21 nm, as were in-plane spheres with a diameter of 8 nm with a 15 min thermal annealing. Finally, direct plasma-etching transfer into the silicon substrate was demonstrated, and 20 nm high silicon nanopillars were obtained, which are very promising results for various nanopatterning applications.
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Affiliation(s)
- Jérôme Garnier
- Université Grenoble Alpes , F-38000 Grenoble, France
- CNRS, LTM , F-38000 Grenoble, France
- CEA, LETI , MINATEC Campus, F-38054 Grenoble, France
| | - Javier Arias-Zapata
- Université Grenoble Alpes , F-38000 Grenoble, France
- CNRS, LTM , F-38000 Grenoble, France
- CEA, LETI , MINATEC Campus, F-38054 Grenoble, France
| | - Olivier Marconot
- Université Grenoble Alpes , F-38000 Grenoble, France
- CEA, INAC-SP2M , F-38000 Grenoble, France
| | - Sandrine Arnaud
- Université Grenoble Alpes , F-38000 Grenoble, France
- CNRS, LTM , F-38000 Grenoble, France
- CEA, LETI , MINATEC Campus, F-38054 Grenoble, France
| | - Sophie Böhme
- Université Grenoble Alpes , F-38000 Grenoble, France
- CNRS, LTM , F-38000 Grenoble, France
- CEA, LETI , MINATEC Campus, F-38054 Grenoble, France
| | - Cécile Girardot
- Université Grenoble Alpes , F-38000 Grenoble, France
- CNRS, LTM , F-38000 Grenoble, France
- CEA, LETI , MINATEC Campus, F-38054 Grenoble, France
| | - Denis Buttard
- Université Grenoble Alpes , F-38000 Grenoble, France
- CEA, INAC-SP2M , F-38000 Grenoble, France
- IUT-1 , 17 quai C. Bernard, F-38000 Grenoble, France
| | - Marc Zelsmann
- Université Grenoble Alpes , F-38000 Grenoble, France
- CNRS, LTM , F-38000 Grenoble, France
- CEA, LETI , MINATEC Campus, F-38054 Grenoble, France
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