Highly tunable self-assembled nanostructures from a poly(2-vinylpyridine-b-dimethylsiloxane) block copolymer

Illuminating Recent Progress in Nanotransfer Printing: Core Principles, Emerging Applications, and Future Perspectives

As the demand for diverse nanostructures in physical/chemical devices continues to rise, the development of nanotransfer printing (nTP) technology is receiving significant attention due to its exceptional throughput and ease of use. Over the past decade, researchers have attempted to enhance the diversity of materials and substrates used in transfer processes as well as to improve the resolution, reliability, and scalability of nTP. Recent research on nTP has made continuous progress, particularly using the control of the interfacial adhesion force between the donor mold, target material, and receiver substrate, and numerous practical nTP methods with niche applications have been demonstrated. This review article offers a comprehensive analysis of the chronological advancements in nTP technology and categorizes recent strategies targeted for high-yield and versatile printing based on controlling the relative adhesion force depending on interfacial layers. In detail, the advantages and challenges of various nTP approaches are discussed based on their working mechanisms, and several promising solutions to improve morphological/material diversity are presented. Furthermore, this review provides a summary of potential applications of nanostructured devices, along with perspectives on the outlook and remaining challenges, which are expected to facilitate the continued progress of nTP technology and to inspire future innovations.

Coacervate-Assisted Polymerization-Induced Self-Assembly of Chiral Alternating Copolymers into Hierarchical Bishell Capsules with Sub-5 nm Ultrathin Lamellae

Hierarchical self-assembly of synthetic polymers in solution represents one of the sophisticated strategies to replicate the natural superstructures which lay the basis for their superb functions. However, it is still quite challenging to increase the degree of complexity of the as-prepared assemblies, especially in a large scale. Liquid-liquid phase separation (LLPS) widely exists in cells and is assumed to be responsible for the formation of many cellular organelles without membranes. Herein, through integrating LLPS with the polymerization-induced self-assembly (PISA), a coacervate-assisted PISA (CAPISA) methodology to realize the one-pot and scalable preparation of hierarchical bishell capsules (BCs) from nanosheets with ultrathin lamellae phase (sub-5 nm), microflakes, unishell capsules to final BCs in a bottom-up sequence is presented. Both the self-assembled structure and the dynamic formation process of BCs have been disclosed. Since CAPISA has combined the advantages of coacervates, click chemistry, interfacial reaction and PISA, it is believed that it will become a promising option to fabricate biomimetic polymer materials with higher structural complexity and more sophisticated functions.

Synthesis and Structural Insight into poly(dimethylsiloxane)-b-poly(2-vinylpyridine) Copolymers

In this study, the use of anionic polymerization for the synthesis of living poly(dimethylsiloxane) or PDMS-Li+, as well as poly(2-vinylpyridine) or P2VP-Li+ homopolymers, and the subsequent use of chlorosilane chemistry in order for the two blocks to be covalently joined leading to PDMS-b-P2VP copolymers is proposed. High vacuum manipulations enabled the synthesis of well-defined materials with different molecular weights (Μ¯n, from 9.8 to 36.0 kg/mol) and volume fraction ratios (φ, from 0.15 to 0.67). The Μ¯n values, dispersity indices, and composition were determined through membrane/vapor pressure osmometry (MO/VPO), size exclusion chromatography (SEC), and proton nuclear magnetic resonance spectroscopy (1H NMR), respectively, while the thermal transitions were determined via differential scanning calorimetry (DSC). The morphological characterization results suggested that for common composition ratios, lamellar, cylindrical, and spherical phases with domain periodicities ranging from approximately 15 to 39 nm are formed. A post-polymerization chemical modification reaction to quaternize the nitrogen atom in some of the P2VP monomeric units in the copolymer with the highest P2VP content, and the additional characterizations through 1H NMR, infrared spectroscopy, DSC, and contact angle are reported. The synthesis, characterization, and quaternization of the copolymer structure are important findings toward the preparation of functional materials with enhanced properties suitable for various nanotechnology applications.

Self-Assembly of Block Copolymers in Thin Films Swollen-Rich in Solvent Vapors

In this study we have employed a polymer processing method based on solvent vapor annealing in order to condense relatively large amounts of solvent vapors onto thin films of block copolymers and thus to promote their self-assembly into ordered nanostructures. As revealed by the atomic force microscopy, a periodic lamellar morphology of poly(2-vinylpyridine)-b-polybutadiene and an ordered morphology comprised of hexagonally-packed structures made of poly(2-vinylpyridine)-b-poly(cyclohexyl methacrylate) were both successfully generated on solid substrates for the first time.

Dewetting-Induced Hierarchical Self-Assembly of Block Copolymers Templated by Colloidal Crystals

Recent advances in high-performance flexible electronic devices have increased the demand for more diverse and complex nanofabrication methods; high-resolution, high-efficiency, and low-cost patterning strategies for next-generation devices are therefore required. In this study, we demonstrate the formation of dewetting-induced hierarchical patterns using two self-assembled materials: block copolymers (BCPs) and colloidal crystals. The combination of the two self-assembly methods successfully generates multiscale hierarchical patterns because the length scales of the periodic colloidal crystal structures are suitable for templating the BCP patterns. Various concentric ring patterns were observed on the templated BCP films, and a free energy model of the polymer chain was applied to explain the formation of these patterns relative to the template width. Frequently occurring spiral-defective features were also examined and found to be promoted by Y-junction defects.

Processive Pathways to Metastability in Block Copolymer Thin Films

Block copolymers (BCPs) self-assemble into intricate nanostructures that enhance a multitude of advanced applications in semiconductor processing, membrane science, nanopatterned coatings, nanocomposites, and battery research. Kinetics and thermodynamics of self-assembly are crucial considerations in controlling the nanostructure of BCP thin films. The equilibrium structure is governed by a molecular architecture and the chemistry of its repeat units. An enormous library of materials has been synthesized and they naturally produce a rich equilibrium phase diagram. Non-equilibrium phases could potentially broaden the structural diversity of BCPs and relax the synthetic burden of creating new molecules. Furthermore, the reliance on synthesis could be complicated by the scalability and the materials compatibility. Non-equilibrium phases in BCPs, however, are less explored, likely due to the challenges in stabilizing the metastable structures. Over the past few decades, a variety of processing techniques were introduced that influence the phase transformation of BCPs to achieve a wide range of morphologies. Nonetheless, there is a knowledge gap on how different processive pathways can induce and control the non-equilibrium phases in BCP thin films. In this review, we focus on different solvent-induced and thermally induced processive pathways, and their potential to control the non-equilibrium phases with regards to their unique aspects and advantages. Furthermore, we elucidate the limitations of these pathways and discuss the potential avenues for future investigations.

Study of the ordered assembly morphologies of diblock copolymers on the same substrate

With the development of frontier technology in emerging semiconductor processes, self-assembling (SA) and directed self-assembly (DSA) of block copolymers (BCPs) have attracted great attention from scientific researchers and become promising candidates for advanced photolithography. Using an optimal coating and baking process, highly ordered assembly morphologies (e.g., cylinder and lamella) of two BCPs in thin films were obtained without an additional topcoat material layer. Moreover, the whole experimental study also provides an optimal process for integrating the two BCPs into the same topographic guiding pattern substrate fabricated by electron beam lithography (EBL) to achieve specific self-assembly. This topographic guiding substrate achieves not only lamellar micro-domains aligned perpendicular to the sidewalls of trench edges but also cylindrical micro-domains (PMMA phase in a PS matrix) aligned parallel to trench edges respectively, which provides insights and valuable information for further applications in lithography and electronic devices.

Tunable Thermal Switch via Order-Order Transition in Liquid Crystalline Block Copolymer

Organic material-based thermal switch is drawing much attention as one of the key thermal management devices in organic electronic devices. This study aims at tuning the switching temperature (T_S) of thermal conductivity by using liquid crystalline block copolymers (BCs) with different order-order transition temperature (T_tr) related to the types of mesogens in the side chain. The BC films with low T_tr of 363 K and high T_tr of 395 K exhibit reversible thermal conductivity switching behaviors at T_S of ∼360 K and ∼390 K, respectively. The BC films also exhibit thermal conductivity variation originating from the anisotropy of the internal structures: poly(ethylene oxide) domains and liquid crystals. These results demonstrate that the switching behavior is attributed to an order-order transition between BC films with vertically arranged cylinder domains and the ones with ordered sphere domains. This highlights that BCs become a promising thermal conductivity switching material with tailored T_S.

Optimizing Chain Topology of Bottle Brush Copolymer for Promoting the Disorder-to-Order Transition

The order-disorder transitions (ODT) of core-shell bottle brush copolymer and its structural isomers were investigated by dissipative particle dynamics simulations and theoretically by random phase approximation. Introducing a chain topology parameter λ which parametrizes linking points between M diblock chains each with N monomers, the degree of incompatibility at ODT ((χN)ODT; χ being the Flory-Huggins interaction parameter between constituent monomers) was predicted as a function of chain topology parameter (λ) and the number of linked diblock chains per bottle brush copolymer (M). It was found that there exists an optimal chain topology about λ at which (χN)ODT gets a minimum while the domain spacing remains nearly unchanged. The prediction provides a theoretical guideline for designing an optimal copolymer architecture capable of forming sub-10 nm periodic structures even with non-high χ components.

Ordered structure constructed from C2-symmetric hexa-peri-hexabenzocoronene linked with oligo(dimethylsiloxane)

The preparation of sub-5-nm ordered structures is very important to the development of today's nanotechnology. Block molecules have the potential to form structures with significantly small characteristic dimensions. Herein two novel organic-inorganic block molecules composed of a hexa-peri-hexabenzocoronene (HBC) core and two oligo(dimethylsiloxane) (ODMS) tails with C₂ symmetry are reported. A hierarchical lamello-columnar structure with a two-dimensional rectangular lattice where HBC cores adopt a tilted arrangement was obtained from their bulk self-assembly. The feature sizes are all below 5 nm and can be regulated via the number of ODMS chains. Sub-5-nm line structures were obtained through spin-coating of the block molecules onto silicon substrates modified with poly(dimethylsiloxane). As organic-inorganic hybrid materials, these block molecules may be further applied in sub-5-nm nanopatterning.

Heterotelechelic homopolymers mimicking high χ - ultralow N block copolymers with sub-2 nm domain size

Three fluorinated, hydrophobic initiators have been utilised for the synthesis of low molecular mass fluoro-poly(acrylic acid) heterotelechelic homopolymers to mimic high chi (χ)-low N diblock copolymers with ultrafine domains of sub-2 nm length scale. Polymers were obtained by a simple photoinduced copper(ii)-mediated reversible-deactivation radical polymerisation (Cu-RDRP) affording low molecular mass (<3 kDa) and low dispersity (Đ = 1.04-1.21) homopolymers. Heating/cooling ramps were performed on bulk samples (ca. 250 μm thick) to obtain thermodynamically stable nanomorpologies of lamellar (LAM) or hexagonally packed cylinders (HEX), as deduced by small-angle X-ray scattering (SAXS). Construction of the experimental phase diagram alongside a detailed theoretical model demonstrated typical rod-coil block copolymer phase behaviour for these fluoro-poly(acrylic acid) homopolymers, where the fluorinated initiator-derived segment acts as a rod and the poly(acrylic acid) as a coil. This work reveals that these telechelic homopolymers mimic high χ-ultralow N diblock copolymers and enables reproducible targeting of nanomorphologies with incredibly small, tunable domain size.

Selective sequential infiltration synthesis of ZnO in the liquid crystalline phase of silicon-containing rod-coil block copolymers

The combination of block copolymer (BCP) thin film self-assembly and selective infiltration synthesis of inorganic materials into one BCP block provides access to various organic-inorganic hybrids. Here, we apply sequential infiltration synthesis, a vapor-phase hybridization technique, to selectively introduce ZnO into the organic microdomains of silicon-containing rod-coil diblock copolymers and a triblock terpolymer, polydimethylsiloxane (PDMS)-b-poly{2,5-bis[(4-methoxyphenyl)-oxycarbonyl]styrene} (PDMS-b-PMPCS) and PDMS-b-polystyrene-b-PMPCS (PDMS-b-PS-b-PMPCS), in which the PMPCS rod block is a liquid crystalline polymer. The in-plane cylindrical PDMS-b-PMPCS and core-shell cylindrical and hexagonally perforated lamellar PDMS-b-PS-b-PMPCS films were infiltrated with ZnO with high selectivity to the PMPCS. The etching contrast between PDMS, PS and the ZnO-infused PMPCS enables the fabrication of ZnO/SiO_x binary composites by plasma etching and reveals the core-shell morphology of the triblock terpolymer.

Poly(vinylpyridine)-Containing Block Copolymers for Smart, Multicompartment Particles

Multicompartment particles generated by the self-assembly of block copolymers (BCPs) have received considerable attention due to their unique morphologies and functionalities. A class of important building blocks for multicomponent particles...

Fabrication of High χ-Low N Block Copolymers with Thermally Stable Sub-5 nm Microdomains Using Polyzwitterion as a Constituent Block

In this work, we used zwitterionic poly(4-vinylpyridine) propane-1-sulfonate (PVPS) as a constituent block to construct high χ-low N block copolymers (BCPs) with different neutral polymers as the other block, including polystyrene (PS), poly(ethylene oxide) (PEO), and poly(l-lactide) (PLLA). Lamellar structures with sub-5 nm microdomains were observed in all three types of BCPs. Due to the tendency of self-aggregation induced by electrostatic interaction in polyzwitterion, the Flory-Huggins parameters (χ) between PVPS and most neutral polymers are relatively high, which provides a facile and efficient way to fabricate high χ-low N BCPs. In addition, the dimension of the sub-5 nm structures formed in PVPS-containing BCPs showed high thermal stability with a small fluctuation (±0.1 nm) of domain spacings upon heating.

Solvent Vapor Annealing, Defect Analysis, and Optimization of Self-Assembly of Block Copolymers Using Machine Learning Approaches

Self-assembly of block copolymers (BCPs) is an alternative patterning technique that promises high resolution and density multiplication with lower costs. The defectivity of the resulting nanopatterns remains too high for many applications in microelectronics and is exacerbated by small variations of processing parameters, such as film thickness, and fluctuations of solvent vapor pressure and temperature, among others. In this work, a solvent vapor annealing (SVA) flow-controlled system is combined with design of experiments (DOE) and machine learning (ML) approaches. The SVA flow-controlled system enables precise optimization of the conditions of self-assembly of the high Flory-Huggins interaction parameter (χ) hexagonal dot-array forming BCP, poly(styrene-b-dimethylsiloxane) (PS-b-PDMS). The defects within the resulting patterns at various length scales are then characterized and quantified. The results show that the defectivity of the resulting nanopatterned surfaces is highly dependent upon very small variations of the initial film thicknesses of the BCP, as well as the degree of swelling under the SVA conditions. These parameters also significantly contribute to the quality of the resulting pattern with respect to grain coarsening, as well as the formation of different macroscale phases (single and double layers and wetting layers). The results of qualitative and quantitative defect analyses are then compiled into a single figure of merit (FOM) and are mapped across the experimental parameter space using ML approaches, which enable the identification of the narrow region of optimum conditions for SVA for a given BCP. The result of these analyses is a faster and less resource intensive route toward the production of low-defectivity BCP dot arrays via rational determination of the ideal combination of processing factors. The DOE and machine learning-enabled approach is generalizable to the scale-up of self-assembly-based nanopatterning for applications in electronic microfabrication.

Bending Behavior and Directed Self-Assembly of Rod-Coil Block Copolymers

The formation of zigzags, chevrons, Y-junctions, and line segments is demonstrated in thin films formed from cylindrical morphology silicon-containing conformationally asymmetric rod-coil diblock copolymers and triblock terpolymers under solvent annealing. Directed self-assembly of the block copolymers within trenches yields well-ordered cylindrical microdomains oriented either parallel or transverse to the sidewalls depending on the chemical functionalization of the sidewalls, and the location and structure of concentric bends in the cylinders is determined by the shape of the trenches. The innate etching contrast, the spontaneous sharp bends and junctions, and the range of demonstrated periodicity and line/space ratios make these conformationally asymmetric rod-coil polymers attractive for nanoscale pattern generation.

Neutral-layer-free directed self-assembly of block copolymer in trench using capillary force-induced meniscus

We propose trench-directed self-assembly (TDSA) of a block copolymer (BCP) driven by a capillary force-induced meniscus as a facile scalable nanolithography method. Unlike conventional directed self-assembly methods, TDSA enables the achievement of neutral surface-free vertical orientations of the BCP nanopatterns irrespective of the polarizability of the substrate, which may be, for example, a ceramic (SiO₂) on Semiconductor (Si). In our demonstration of the proposed method, we generated various morphologies of the BCP nanopatterns by varying the trench width, and molecular weight of the BCP. The proposed TDSA method is potentially advantageous for the design of a process/device layout required for the development of an effective manufacturing process.

Boundary-directed epitaxy of block copolymers

Directed self-assembly of block copolymers (BCPs) enables nanofabrication at sub-10 nm dimensions, beyond the resolution of conventional lithography. However, directing the position, orientation, and long-range lateral order of BCP domains to produce technologically-useful patterns is a challenge. Here, we present a promising approach to direct assembly using spatial boundaries between planar, low-resolution regions on a surface with different composition. Pairs of boundaries are formed at the edges of isolated stripes on a background substrate. Vertical lamellae nucleate at and are pinned by chemical contrast at each stripe/substrate boundary, align parallel to boundaries, selectively propagate from boundaries into stripe interiors (whereas horizontal lamellae form on the background), and register to wide stripes to multiply the feature density. Ordered BCP line arrays with half-pitch of 6.4 nm are demonstrated on stripes >80 nm wide. Boundary-directed epitaxy provides an attractive path towards assembling, creating, and lithographically defining materials on sub-10 nm scales.

Synthesis of High χ-Low N Diblock Copolymers by Polymerization-Induced Self-Assembly

Polymerization-induced self-assembly (PISA) enables the scalable synthesis of functional block copolymer nanoparticles with various morphologies. Herein we exploit this versatile technique to produce so-called "high χ-low N" diblock copolymers that undergo nanoscale phase separation in the solid state to produce sub-10 nm surface features. By varying the degree of polymerization of the stabilizer and core-forming blocks, PISA provides rapid access to a wide range of diblock copolymers, and enables fundamental thermodynamic parameters to be determined. In addition, the pre-organization of copolymer chains within sterically-stabilized nanoparticles that occurs during PISA leads to enhanced phase separation relative to that achieved using solution-cast molecularly-dissolved copolymer chains.

Vertical Lamellae Formed by Two-Step Annealing of a Rod-Coil Liquid Crystalline Block Copolymer Thin Film

Silicon-containing block copolymer thin films with high interaction parameter and etch contrast are ideal candidates to generate robust nanotemplates for advanced nanofabrication, but they typically form in-plane oriented microdomains as a result of the dissimilar surface energies of the blocks. Here, we describe a two-step annealing method to produce vertically aligned lamellar structures in thin film of a silicon-containing rod-coil thermotropic liquid crystalline block copolymer. The rod-coil block copolymer with the volume fraction of the Si-containing block of 0.22 presents an asymmetrical lamellar structure in which the rod block forms a hexatic columnar nematic liquid crystalline phase. A solvent vapor annealing step first produces well-ordered in-plane cylinders of the Si-containing block, then a subsequent thermal annealing promotes the phase transition from in-plane cylinders to vertical lamellae. The pathways of the order-order transition were examined by microscopy and in situ using grazing incidence small-angle X-ray scattering and wide-angle X-ray scattering.

The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography

The challenges of patterning next generation integrated circuits have driven the semiconductor industry to look outside of traditional lithographic methods in order to continue cost effective size scaling. The directed self-assembly (DSA) of block copolymers (BCPs) is a nanofabrication technique used to reduce the periodicity of patterns prepared with traditional optical methods. BCPs with large interaction parameters (χ eff), provide access to smaller pitches and reduced interface widths. Larger χ eff is also expected to be correlated with reduced line edge roughness (LER), a critical performance parameter in integrated circuits. One approach to increasing χ eff is blending the BCP with a phase selective additive, such as an Ionic liquid (IL). The IL does not impact the etching rates of either phase, and this enables a direct interrogation of whether the change in interface width driven by higher χ eff translates into lower LER. The effect of the IL on the layer thickness and interface width of a BCP are examined, along with the corresponding changes in LER in a DSA patterned sample. The results demonstrate that increased χ eff through additive blending will not necessarily translate to a lower LER, clarifying an important design criterion for future material systems.

Enhanced microphase separation of thin films of low molecular weight block copolymer by the addition of an ionic liquid

We report on the use of a selective, non-volatile ionic liquid (IL) to enhance the self-assembly via solvent annealing of a low molecular weight block copolymer (BCP) of styrene and 2-vinylpyridine (2VP) suitable for generating sub-10 nm features. Diblock and triblock copolymers of different molecular weights of styrene and 2VP are individually blended with the IL and then solvent annealed in acetone, a non-preferential solvent for the BCPs. Differential scanning calorimetry indicates that the IL selectively resides in the 2VP block of the BCP, resulting in a decrease of the block's Tg and an increase of the effective Flory-Huggins parameter (χeff) of the BCP. The influence of the IL on the non-preferential window of a random copolymer brush used to treat the substrate for self-assembly of the BCPs is also analyzed. Well-defined lamellar patterns form when the optimal weight ratio of IL (∼1%) is added to the BCPs. A detailed analysis of the orientational correlation length and pitch size of the BCPs quantitatively shows that the addition of the IL enhanced the microphase separation of the low molecular weight version of the BCP. Subsequent treatment of the self-assembled BCP with sequential infiltration synthesis yields sub-10 nm AlOx lines.

Pattern formation of metal-oxide hybrid nanostructures via the self-assembly of di-block copolymer blends

The templated self-assembly of block copolymers (BCPs) with a high Flory-Huggins interaction parameter (χ) can effectively create ultrafine, well-ordered nanostructures in the range of 5-30 nm. However, the self-assembled BCP patterns remain limited to possible morphological geometries and materials. Here, we introduce a novel and useful self-assembly method of di-BCP blends capable of generating diverse hybrid nanostructures consisting of oxide and metal materials through the rapid microphase separation of A-B/B-C BCP blends. We successfully obtained various hybridized BCP morphologies which cannot be acquired from a single di-BCP, such as hexagonally arranged hybrid dot and dot-in-hole patterns by controlling the mixing ratios of the solvents with a binary solvent annealing process. Furthermore, we demonstrate how the binary solvent vapor annealing process can provide a wide range of pattern geometries to di-BCP blends, showing a well-defined spontaneous one-to-one accommodation in dot-in-hole nanostructures. Specifically, we show clearly how the self-assembled BCPs can be functionalized via selective reduction and/or an oxidation process, resulting in the excellent positioning of confined silica nanodots into each nanospace of a Pt mesh. These results suggest a new method to achieve the pattern formation of more diverse and complex hybrid nanostructures using various blended BCPs.

Temperature-Controlled Solvent Vapor Annealing of Thin Block Copolymer Films

Solvent vapor annealing is as an effective and versatile alternative to thermal annealing to equilibrate and control the assembly of polymer chains in thin films. Here, we present scientific and practical aspects of the solvent vapor annealing method, including the discussion of such factors as non-equilibrium conformational states and chain dynamics in thin films in the presence of solvent. Homopolymer and block copolymer films have been used in model studies to evaluate the robustness and the reproducibility of the solvent vapor processing, as well as to assess polymer-solvent interactions under confinement. Advantages of utilizing a well-controlled solvent vapor environment, including practically interesting regimes of weakly saturated vapor leading to poorly swollen states, are discussed. Special focus is given to dual temperature control over the set-up instrumentation and to the potential of solvo-thermal annealing. The evaluated insights into annealing dynamics derived from the studies on block copolymer films can be applied to improve the processing of thin films of crystalline and conjugated polymers as well as polymer composite in confined geometries.

Shape and Color Switchable Block Copolymer Particles by Temperature and pH Dual Responses

Herein, we report a simple and robust strategy for preparing dual-responsive shape-switchable block copolymer (BCP) particles, which respond to subtle temperature and pH changes near physiological conditions (i.e., human body temperature and neutral pH). The shape transition of polystyrene- b-poly(4-vinylpyridine) BCP particles between lens and football shapes occurs in very narrow temperature and pH ranges: no temperature-based transition for pH 6.0, 40-50 °C transition for pH 6.5, and 25-35 °C for pH 7.0. To achieve these shape transitions, temperature/pH-responsive polymer surfactants of poly( N-(2-(diethylamino)ethyl)acrylamide- r- N-isopropylacrylamide) are designed to induce dramatic changes in relative solubility and their location in response to temperature and pH changes near physiological conditions. In addition, the BCP particles exhibit reversible shape-transforming behavior according to orthogonal temperature and pH changes. Colorimetric measurements of temperature and pH changes are enabled by shape-transforming properties combined with selective positioning of dyes, suggesting promising potential for these particles in clinical and biomedical applications.

Solvent Effect on the Self-Assembly of a Thin Film Consisting of Y-Shaped Copolymer

The self-assembly of an amphiphilic Y-shaped copolymer consisting of two hydrophilic branches and one hydrophobic branch in a thin film is investigated under different conditions by virtue of mesoscopic computer modelling, accompanied by doping with a single solvent, doping with a binary solvent, and those solvent environments together with the introduction of confinement defined by various acting distances and influencing regions. A cylindrical micellar structure is maintained, as it is in the thin film with the doping of either 10% hydrophobic solvent or 10% hydrophilic solvent, whose structure consists of the hydrophobic core and hydrophilic shell. Attributed to the hydrophobicity/hydrophilia nature of the solvents, different solvents play an obvious role on the self-assembled structure, i.e., the hydrophobic solvent presents as a swelling effect, conversely, the hydrophilic solvent presents as a shrinking effect. Further, the synergistic effect of the binary solvents on the self-assembly produces the lowest values in both the average volumetric size and free energy density when the quantity of hydrophobic solvent and hydrophilic solvent is equivalent. Interestingly, the solvent effect becomes more pronounced under the existent of a confinement. When a lateral-oriented confinement is introduced, a periodically fluctuating change in the cylindrical size occurs in two near-wall regions, but the further addition of either hydrophobic or hydrophilic solvent can effectively eliminate such resulting hierarchical-sized cylinders and generate uniform small-sized cylinders. However, with the introduction of a horizontal-orientated confinement, the copolymers self-assemble into the spherical micellar structure. Moreover, the further addition of hydrophobic solvent leads to a decrease in the average size of micelles via coalescence mechanism, in contrast, the further addition of hydrophilic solvent causes an increase in the average size of micelles via splitting mechanism. These findings enrich our knowledge of the potential for the solvent effect on the self-assembly of amphiphilic copolymer system, and then provide theoretical supports on improving and regulating the mesoscopic structure of nanomaterials.

The effect of chain architecture on the phase behavior of A4B4 miktoarm block copolymers

Well-defined miktoarm (polystyrene)₄-(polylactic acid)₄ ((PS)₄-(PLA)₄) block copolymers were synthesized and their phase behaviors were compared with linear PS-b-PLA block copolymers, in which the miktoarm architecture enhanced the phase segregation.