1
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Kisiel E, Salev P, Poudyal I, Alspaugh DJ, Carneiro F, Qiu E, Rodolakis F, Zhang Z, Shpyrko OG, Rozenberg M, Schuller IK, Islam Z, Frano A. High-Resolution Full-Field Structural Microscopy of the Voltage-Induced Filament Formation in VO 2-Based Neuromorphic Devices. ACS NANO 2025. [PMID: 40227001 DOI: 10.1021/acsnano.4c14696] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 04/15/2025]
Abstract
In order to make neuromorphic functions in memristive devices more efficient, information about the structural properties of filament formation at the micro- and mesoscopic scales is necessary. Despite extensive research on VO2, a key material due to its filament formation, local operando structural measurements remain challenging and often involve destructive specimen preparation and long rastering times, greatly limiting the scope of experimental studies. Utilizing dark-field X-ray microscopy (DFXM), a full-field imaging modality, structural signatures of the filament formation process operando are revealed in VO2 devices. DFXM experiments illustrate that rutile filaments contain isolated monoclinic clusters, indicating structural nonuniformity interior to the filament. The formation of the rutile phase beneath device electrodes was shown to precede filament development, followed by the formation of filament paths guided by nucleation sites within the device. Finally, a medium-term (<30 min) memory mechanism is observed in VO2, mediated by sites within the device gap that tend to switch at significantly lower voltages after electrical cycling, a tendency that persists through a brief thermal reset. High spatial resolution, large field-of-view, structure selectivity, and fast signal acquisition of DFXM provided insight into structural features of the filamentary channel and surrounding regions during voltage cycling.
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Affiliation(s)
- Elliot Kisiel
- Physics Department, University of California San Diego, La Jolla, California 92093, United States
- X-ray Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - Pavel Salev
- Department Physics and Astronomy, University of Denver, Denver, Colorado 80210, United States
| | - Ishwor Poudyal
- X-ray Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States
- Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - David J Alspaugh
- Physics Department, University of California San Diego, La Jolla, California 92093, United States
| | - Fellipe Carneiro
- Materials Physics and Applications, Los Alamos National Laboratory, Los Alamos, New Mexico 87544, United States
- Centro Brasileiro de Pesquisas Físicas, Rio de Janeiro, RJ 22290-180, Brazil
| | - Erbin Qiu
- Physics Department, University of California San Diego, La Jolla, California 92093, United States
| | - Fanny Rodolakis
- X-ray Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - Zhan Zhang
- X-ray Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - Oleg G Shpyrko
- Physics Department, University of California San Diego, La Jolla, California 92093, United States
| | - Marcelo Rozenberg
- Physics Department, University of California San Diego, La Jolla, California 92093, United States
- Laboratoire de Physique des Solides, CNRS-UMR 8502, Université Paris-Sud, Orsay 91405, France
| | - Ivan K Schuller
- Physics Department, University of California San Diego, La Jolla, California 92093, United States
| | - Zahir Islam
- X-ray Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - Alex Frano
- Physics Department, University of California San Diego, La Jolla, California 92093, United States
- Program in Materials Science and Engineering, University of California San Diego, La Jolla, California 92093-0418, United States
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2
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Dragoman M, Dragoman D, Modreanu M, Vulpe S, Romanitan C, Aldrigo M, Dinescu A. Electric-Field-Induced Metal-Insulator Transition for Low-Power and Ultrafast Nanoelectronics. NANOMATERIALS (BASEL, SWITZERLAND) 2025; 15:589. [PMID: 40278455 DOI: 10.3390/nano15080589] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/03/2025] [Revised: 04/01/2025] [Accepted: 04/10/2025] [Indexed: 04/26/2025]
Abstract
We present here a comprehensive review of various classes of electric-field-induced reversible Mott metal-insulator materials, which have many applications in ultrafast switches, reconfigurable high-frequency devices up to THz, and photonics. Various types of Mott transistors are analyzed, and their applications are discussed. This paper introduces new materials that demonstrate the Mott transition at very low DC voltage levels, induced by an external electric field. The final section of the paper examines ferroelectric Mott transistors and these innovative ferroelectric Mott materials.
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Affiliation(s)
- Mircea Dragoman
- National Institute for Research and Development in Microtechnologies, Str. Erou Iancu Nicolae 126A, 077190 Voluntari, Romania
| | - Daniela Dragoman
- Physics Faculty, University of Bucharest, PO Box MG-11, 077125 Bucharest, Romania
- Academy of Romanian Scientists, Str. Ilfov 3, 050044 Bucharest, Romania
| | - Mircea Modreanu
- Tyndall National Institute, University College Cork, Lee Maltings, Dyke Parade, T12 R5CP Cork, Ireland
| | - Silviu Vulpe
- National Institute for Research and Development in Microtechnologies, Str. Erou Iancu Nicolae 126A, 077190 Voluntari, Romania
| | - Cosmin Romanitan
- National Institute for Research and Development in Microtechnologies, Str. Erou Iancu Nicolae 126A, 077190 Voluntari, Romania
| | - Martino Aldrigo
- National Institute for Research and Development in Microtechnologies, Str. Erou Iancu Nicolae 126A, 077190 Voluntari, Romania
| | - Adrian Dinescu
- National Institute for Research and Development in Microtechnologies, Str. Erou Iancu Nicolae 126A, 077190 Voluntari, Romania
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3
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Shao Z, Luo A, Barazani E, Zhou T, Cai Z, Holt MV, Kalcheim Y, Singer A. X-ray Nanoimaging of a Heterogeneous Structural Phase Transition in V 2O 3. NANO LETTERS 2025; 25:1466-1472. [PMID: 39804721 DOI: 10.1021/acs.nanolett.4c05387] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 01/16/2025]
Abstract
Controlling the Mott transition through strain engineering is crucial for advancing the development of memristive and neuromorphic computing devices. Yet, Mott insulators are heterogeneous due to intrinsic phase boundaries and extrinsic defects, posing significant challenges to fully understanding the impact of microscopic distortions on the local Mott transition. Here, using a synchrotron-based scanning X-ray nanoprobe, we studied the real-space structural heterogeneity during the structural phase transition in a V2O3 thin film. Through temperature-dependent metal-insulator phase coexistence mapping, we report a variation in the local transition temperature up to 7 K across the film and nanoscale transition hysteresis. Furthermore, we reveal that the spatial heterogeneity of the transition is closely tied to the tilting of crystallographic planes. Our work highlights the impact of local heterogeneity on the Mott transition and lays the groundwork for future innovations in harnessing strain heterogeneity within Mott systems for the next-generation computational technologies.
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Affiliation(s)
- Ziming Shao
- Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, United States
| | - Aileen Luo
- Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, United States
| | - Eti Barazani
- Department of Materials Science and Engineering, Technion, Israel Institute of Technology, Haifa 3200003, Israel
| | - Tao Zhou
- Center for Nanoscale Materials, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - Zhonghou Cai
- Advanced Photon Source, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - Martin V Holt
- Center for Nanoscale Materials, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - Yoav Kalcheim
- Department of Materials Science and Engineering, Technion, Israel Institute of Technology, Haifa 3200003, Israel
| | - Andrej Singer
- Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, United States
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4
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Milloch A, Figueruelo-Campanero I, Hsu WF, Mor S, Mellaerts S, Maccherozzi F, Veiga LSI, Dhesi SS, Spera M, Seo JW, Locquet JP, Fabrizio M, Menghini M, Giannetti C. Mott resistive switching initiated by topological defects. Nat Commun 2024; 15:9414. [PMID: 39482287 PMCID: PMC11527880 DOI: 10.1038/s41467-024-53726-z] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/16/2024] [Accepted: 10/15/2024] [Indexed: 11/03/2024] Open
Abstract
Avalanche resistive switching is the fundamental process that triggers the sudden change of the electrical properties in solid-state devices under the action of intense electric fields. Despite its relevance for information processing, ultrafast electronics, neuromorphic devices, resistive memories and brain-inspired computation, the nature of the local stochastic fluctuations that drive the formation of metallic regions within the insulating state has remained hidden. Here, using operando X-ray nano-imaging, we have captured the origin of resistive switching in a V2O3-based device under working conditions. V2O3 is a paradigmatic Mott material, which undergoes a first-order metal-to-insulator phase transition together with a lattice transformation that breaks the threefold rotational symmetry of the rhombohedral metallic phase. We reveal a new class of volatile electronic switching triggered by nanoscale topological defects appearing in the shear-strain based order parameter that describes the insulating phase. Our results pave the way to the use of strain engineering approaches to manipulate such topological defects and achieve the full dynamical control of the electronic Mott switching. Topology-driven, reversible electronic transitions are relevant across a broad range of quantum materials, comprising transition metal oxides, chalcogenides and kagome metals.
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Grants
- 2020JLZ52N 003 Ministero dell'Istruzione, dell'Università e della Ricerca (Ministry of Education, University and Research)
- 20172H2SC4 005 Ministero dell'Istruzione, dell'Università e della Ricerca (Ministry of Education, University and Research)
- 20172H2SC4 005 Ministero dell'Istruzione, dell'Università e della Ricerca (Ministry of Education, University and Research)
- 2020JLZ52N 003 Ministero dell'Istruzione, dell'Università e della Ricerca (Ministry of Education, University and Research)
- 2020JLZ52N 003 Ministero dell'Istruzione, dell'Università e della Ricerca (Ministry of Education, University and Research)
- 20172H2SC4 005 Ministero dell'Istruzione, dell'Università e della Ricerca (Ministry of Education, University and Research)
- 20228YCYY7 European Commission (EC)
- 20228YCYY7 European Commission (EC)
- 20228YCYY7 European Commission (EC)
- ECoSOx-ECLIPSE Ministry of Economy and Competitiveness | Agencia Estatal de Investigación (Spanish Agencia Estatal de Investigación)
- PRE2020-092625 Ministry of Economy and Competitiveness | Agencia Estatal de Investigación (Spanish Agencia Estatal de Investigación)
- CEX2020-001039-S Ministry of Economy and Competitiveness | Agencia Estatal de Investigación (Spanish Agencia Estatal de Investigación)
- ECoSOx-ECLIPSE Ministry of Economy and Competitiveness | Agencia Estatal de Investigación (Spanish Agencia Estatal de Investigación)
- CEX2020-001039-S Ministry of Economy and Competitiveness | Agencia Estatal de Investigación (Spanish Agencia Estatal de Investigación)
- C14/21/083 KU Leuven (Katholieke Universiteit Leuven)
- iBOF/21/084 KU Leuven (Katholieke Universiteit Leuven)
- KAC24/18/056 KU Leuven (Katholieke Universiteit Leuven)
- C14/17/080 KU Leuven (Katholieke Universiteit Leuven)
- C14/21/083 KU Leuven (Katholieke Universiteit Leuven)
- iBOF/21/084 KU Leuven (Katholieke Universiteit Leuven)
- KAC24/18/056 KU Leuven (Katholieke Universiteit Leuven)
- C14/17/080 KU Leuven (Katholieke Universiteit Leuven)
- C14/21/083 KU Leuven (Katholieke Universiteit Leuven)
- iBOF/21/084 KU Leuven (Katholieke Universiteit Leuven)
- KAC24/18/056 KU Leuven (Katholieke Universiteit Leuven)
- C14/17/080 KU Leuven (Katholieke Universiteit Leuven)
- C14/21/083 KU Leuven (Katholieke Universiteit Leuven)
- iBOF/21/084 KU Leuven (Katholieke Universiteit Leuven)
- KAC24/18/056 KU Leuven (Katholieke Universiteit Leuven)
- C14/17/080 KU Leuven (Katholieke Universiteit Leuven)
- AKUL/13/19 Fonds Wetenschappelijk Onderzoek (Research Foundation Flanders)
- AKUL/19/023 Fonds Wetenschappelijk Onderzoek (Research Foundation Flanders)
- AKUL/13/19 Fonds Wetenschappelijk Onderzoek (Research Foundation Flanders)
- AKUL/19/023 Fonds Wetenschappelijk Onderzoek (Research Foundation Flanders)
- AKUL/13/19 Fonds Wetenschappelijk Onderzoek (Research Foundation Flanders)
- AKUL/19/023 Fonds Wetenschappelijk Onderzoek (Research Foundation Flanders)
- AKUL/13/19 Fonds Wetenschappelijk Onderzoek (Research Foundation Flanders)
- AKUL/19/023 Fonds Wetenschappelijk Onderzoek (Research Foundation Flanders)
- Finanziamenti ponte per bandi esterni Università Cattolica del Sacro Cuore (Catholic University of the Sacred Heart)
- INTERREG-E-TEST Project, EMR113 INTERREG-VL-VL-PATHFINDER Project, 0559
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Affiliation(s)
- Alessandra Milloch
- Department of Mathematics and Physics, Università Cattolica del Sacro Cuore, Brescia, Italy.
- Department of Physics and Astronomy, KU Leuven, Leuven, Belgium.
- ILAMP (Interdisciplinary Laboratories for Advanced Materials Physics), Università Cattolica del Sacro Cuore, Brescia, Italy.
| | - Ignacio Figueruelo-Campanero
- IMDEA Nanociencia, Cantoblanco, Madrid, Spain.
- Facultad Ciencias Físicas, Universidad Complutense, Madrid, Spain.
| | - Wei-Fan Hsu
- Department of Physics and Astronomy, KU Leuven, Leuven, Belgium
| | - Selene Mor
- Department of Mathematics and Physics, Università Cattolica del Sacro Cuore, Brescia, Italy
- ILAMP (Interdisciplinary Laboratories for Advanced Materials Physics), Università Cattolica del Sacro Cuore, Brescia, Italy
| | - Simon Mellaerts
- Department of Physics and Astronomy, KU Leuven, Leuven, Belgium
| | | | | | | | - Mauro Spera
- Department of Mathematics and Physics, Università Cattolica del Sacro Cuore, Brescia, Italy
| | - Jin Won Seo
- Department of Materials Engineering, KU Leuven, Leuven, Belgium
| | | | - Michele Fabrizio
- Scuola Internazionale Superiore di Studi Avanzati (SISSA), Via Bonomea 265, Trieste, Italy
| | | | - Claudio Giannetti
- Department of Mathematics and Physics, Università Cattolica del Sacro Cuore, Brescia, Italy.
- ILAMP (Interdisciplinary Laboratories for Advanced Materials Physics), Università Cattolica del Sacro Cuore, Brescia, Italy.
- CNR-INO (National Institute of Optics), via Branze 45, Brescia, Italy.
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5
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Salev P, Kisiel E, Sasaki D, Gunn B, He W, Feng M, Li J, Tamura N, Poudyal I, Islam Z, Takamura Y, Frano A, Schuller IK. Local strain inhomogeneities during electrical triggering of a metal-insulator transition revealed by X-ray microscopy. Proc Natl Acad Sci U S A 2024; 121:e2317944121. [PMID: 39145937 PMCID: PMC11348337 DOI: 10.1073/pnas.2317944121] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/15/2023] [Accepted: 07/05/2024] [Indexed: 08/16/2024] Open
Abstract
Electrical triggering of a metal-insulator transition (MIT) often results in the formation of characteristic spatial patterns such as a metallic filament percolating through an insulating matrix or an insulating barrier splitting a conducting matrix. When MIT triggering is driven by electrothermal effects, the temperature of the filament or barrier can be substantially higher than the rest of the material. Using X-ray microdiffraction and dark-field X-ray microscopy, we show that electrothermal MIT triggering leads to the development of an inhomogeneous strain profile across the switching device, even when the material does not undergo a pronounced, discontinuous structural transition coinciding with the MIT. Diffraction measurements further reveal evidence of unique features associated with MIT triggering including lattice distortions, tilting, and twinning, which indicate structural nonuniformity of both low- and high-resistance regions inside the switching device. Such lattice deformations do not occur under equilibrium, zero-voltage conditions, highlighting the qualitative difference between states achieved through increasing temperature and applying voltage in nonlinear electrothermal materials. Electrically induced strain, lattice distortions, and twinning could have important contributions in the MIT triggering process and drive the material into nonequilibrium states, providing an unconventional pathway to explore the phase space in strongly correlated electronic systems.
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Affiliation(s)
- Pavel Salev
- Department of Physics and Astronomy, University of Denver, Denver, CO80210
| | - Elliot Kisiel
- Department of Physics, University of California San Diego, La Jolla, CA92093
- X-ray Science Division, Argonne National Laboratory, Argonne, IL60439
| | - Dayne Sasaki
- Department of Materials Science and Engineering, University of California Davis, Davis, CA95616
| | - Brandon Gunn
- Department of Physics, University of California San Diego, La Jolla, CA92093
| | - Wei He
- Department of Physics, University of California San Diego, La Jolla, CA92093
| | - Mingzhen Feng
- Department of Materials Science and Engineering, University of California Davis, Davis, CA95616
| | - Junjie Li
- Department of Physics, University of California San Diego, La Jolla, CA92093
| | - Nobumichi Tamura
- Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA94720
| | - Ishwor Poudyal
- X-ray Science Division, Argonne National Laboratory, Argonne, IL60439
| | - Zahirul Islam
- X-ray Science Division, Argonne National Laboratory, Argonne, IL60439
| | - Yayoi Takamura
- Department of Materials Science and Engineering, University of California Davis, Davis, CA95616
| | - Alex Frano
- Department of Physics, University of California San Diego, La Jolla, CA92093
| | - Ivan K. Schuller
- Department of Physics, University of California San Diego, La Jolla, CA92093
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6
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Stone G, Shi Y, Jerry M, Stoica V, Paik H, Cai Z, Schlom DG, Engel-Herbert R, Datta S, Wen H, Chen LQ, Gopalan V. In-Operando Spatiotemporal Imaging of Coupled Film-Substrate Elastodynamics During an Insulator-to-Metal Transition. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2312673. [PMID: 38441355 DOI: 10.1002/adma.202312673] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/24/2023] [Revised: 01/31/2024] [Indexed: 03/19/2024]
Abstract
The drive toward non-von Neumann device architectures has led to an intense focus on insulator-to-metal (IMT) and the converse metal-to-insulator (MIT) transitions. Studies of electric field-driven IMT in the prototypical VO2 thin-film channel devices are largely focused on the electrical and elastic responses of the films, but the response of the corresponding TiO2 substrate is often overlooked, since it is nominally expected to be electrically passive and elastically rigid. Here, in-operando spatiotemporal imaging of the coupled elastodynamics using X-ray diffraction microscopy of a VO2 film channel device on TiO2 substrate reveals two new surprises. First, the film channel bulges during the IMT, the opposite of the expected shrinking in the film undergoing IMT. Second, a microns thick proximal layer in the substrate also coherently bulges accompanying the IMT in the film, which is completely unexpected. Phase-field simulations of coupled IMT, oxygen vacancy electronic dynamics, and electronic carrier diffusion incorporating thermal and strain effects suggest that the observed elastodynamics can be explained by the known naturally occurring oxygen vacancies that rapidly ionize (and deionize) in concert with the IMT (MIT). Fast electrical-triggering of the IMT via ionizing defects and an active "IMT-like" substrate layer are critical aspects to consider in device applications.
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Affiliation(s)
- Greg Stone
- Department of Materials Science and Engineering and Electrical Engineering, Pennsylvania State University, University Park, Pennsylvania, 16802, USA
| | - Yin Shi
- Department of Materials Science and Engineering and Electrical Engineering, Pennsylvania State University, University Park, Pennsylvania, 16802, USA
| | - Matthew Jerry
- Department of Materials Science and Engineering and Electrical Engineering, Pennsylvania State University, University Park, Pennsylvania, 16802, USA
| | - Vladimir Stoica
- Department of Materials Science and Engineering and Electrical Engineering, Pennsylvania State University, University Park, Pennsylvania, 16802, USA
| | - Hanjong Paik
- Department of Materials Science and Engineering, Cornell University, Ithaca, NY, 14853, USA
| | - Zhonghou Cai
- Advanced Photon Source, Argonne National Laboratory, Lemont, IL, 60439, USA
| | - Darrell G Schlom
- Department of Materials Science and Engineering, Cornell University, Ithaca, NY, 14853, USA
| | - Roman Engel-Herbert
- Paul-Drude-Institut für Festkörperelektronik, Leibniz-Institut im Forschungsverbund Berlin e.V, Hausvogteiplatz 5, 10117, Berlin, Germany
| | - Suman Datta
- School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, GA, 30332, USA
| | - Haidan Wen
- Materials Science Division and Advanced Photon Source, Argonne National Laboratory, Lemont, IL, 60439, USA
| | - Long-Qing Chen
- Department of Materials Science and Engineering and Electrical Engineering, Pennsylvania State University, University Park, Pennsylvania, 16802, USA
| | - Venkatraman Gopalan
- Department of Materials Science and Engineering and Electrical Engineering, Pennsylvania State University, University Park, Pennsylvania, 16802, USA
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7
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Bidoul N, Roisin N, Flandre D. Tuning the Intrinsic Stochasticity of Resistive Switching in VO 2 Microresistors. NANO LETTERS 2024; 24:6201-6209. [PMID: 38757925 DOI: 10.1021/acs.nanolett.4c00184] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/18/2024]
Abstract
Vanadium dioxide (VO2) microresistors exhibit resistive switching above a certain threshold voltage, allowing them to emulate neurons in neuromorphic systems. However, such devices present intrinsic cycle-to-cycle variations in their resistances and threshold voltages, which can be detrimental or beneficial, depending on their use. Here, we study this stochasticity in VO2 microresistors with various grain sizes and dimensions, through high-resolution electrical and optical measurements across numerous cycles. Our results highlight that the cycle-to-cycle variations in threshold voltage increase as the grain size becomes comparable to the device dimensions. We also present observations of multimodal threshold voltage distributions in the smaller-length resistors. To understand the underlying phenomenon, we investigate the relationship between the device insulating resistance and threshold voltage distributions, showing that these modes could correspond to distinct percolation paths and filaments. Our findings provide the first experimentally verified guidelines for designing VO2 devices with minimized/maximized stochasticity, depending on the targeted application.
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Affiliation(s)
- Noémie Bidoul
- Institute for Information and Communication Technologies, Electronics and Applied Mathematics (ICTEAM), UCLouvain, Louvain-la-Neuve 1348, Belgium
| | - Nicolas Roisin
- Institute for Information and Communication Technologies, Electronics and Applied Mathematics (ICTEAM), UCLouvain, Louvain-la-Neuve 1348, Belgium
| | - Denis Flandre
- Institute for Information and Communication Technologies, Electronics and Applied Mathematics (ICTEAM), UCLouvain, Louvain-la-Neuve 1348, Belgium
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8
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Biswas S, Naushad N, S K, Kamble VB. Resistive Avalanches in La 1-xSr xCoO 3-δ ( x = 0, 0.3) Thin Films and Their Reversible Evolution by Tuning Lattice Oxygen Vacancies (δ). ACS MATERIALS AU 2024; 4:308-323. [PMID: 38737118 PMCID: PMC11083121 DOI: 10.1021/acsmaterialsau.3c00101] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 11/23/2023] [Revised: 01/18/2024] [Accepted: 01/23/2024] [Indexed: 05/14/2024]
Abstract
Strong correlations are often manifested by exotic electronic phases and phase transitions. LaCoO3-δ (LCO) is a system that exhibits such strong electronic correlations with lattice-spin-charge-orbital degrees of freedom. Here, we show that mesoscopic oxygen-deficient LCO films show resistive avalanches of about 2 orders of magnitude due to the metal-insulator transition (MIT) of the film at about 372 K for the 25 W RF power-deposited LCO film on the Si/SiO2 substrate. In bulk, this transition is otherwise gradual and occurs over a very large temperature range. In thin films of LCO, the oxygen deficiency (0 < δ < 0.5) is more easily reversibly tuned, resulting in avalanches. The avalanches disappear after vacuum annealing, and the films behave like normal insulators (δ ∼0.5) with Co2+ in charge ordering alternatively with Co3+. This oxidation state change induces spin state crossovers that result in a spin blockade in the insulating phase, while the conductivity arises from hole hopping among the allowed cobalt Co4+ ion spin states at high temperature. The chemical pressure (strain) of 30% Sr2+ doping at the La3+ site results in reduction in the avalanche magnitude as well as their retention in subsequent heating cycles. The charge nonstoichiometry arising due to Sr2+ doping is found to contribute toward hole doping (i.e., Co3+ oxidation to Co4+) and thereby the retention of the hole percolation pathway. This is also manifested in energies of crossover from the 3D variable range hopping (VRH) type transport observed in the temperature range of 300-425 K, while small polaron hopping (SPH) is observed in the temperature range of 600-725 K for LCO. On the other hand, Sr-doped LCO does not show any crossover and only the VRH type of transport. The strain due to Sr2+ doping refrains the lattice from complete conversion of δ going to 0.5, retaining the avalanches.
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Affiliation(s)
- Soumya Biswas
- School of Physics, Indian Institute
of Science Education and Research, Thiruvananthapuram 695551, India
| | - Noora Naushad
- School of Physics, Indian Institute
of Science Education and Research, Thiruvananthapuram 695551, India
| | - Kalyani S
- School of Physics, Indian Institute
of Science Education and Research, Thiruvananthapuram 695551, India
| | - Vinayak B. Kamble
- School of Physics, Indian Institute
of Science Education and Research, Thiruvananthapuram 695551, India
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9
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Lu C, Yang F, Gao M, Wang X, Lin Y. Cooperative Thermal-Electric Field Control of Infrared Modulation Using a Vanadium Dioxide Film-Based Modulator. ACS OMEGA 2023; 8:46399-46405. [PMID: 38107882 PMCID: PMC10720291 DOI: 10.1021/acsomega.3c02469] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 04/11/2023] [Revised: 09/19/2023] [Accepted: 10/31/2023] [Indexed: 12/19/2023]
Abstract
Vanadium dioxide (VO2) has garnered significant attention as a material for actively tunable infrared (IR) modulators due to its reversible and responsive modulation effect on IR radiation, which is accompanied by its intrinsic insulator-metal phase transition (IMT). Here, we propose a multilayer device structure that integrates VO2 film with microheater and interdigitated electrodes for cooperative thermal-electric field control of IMT. Our results demonstrate that while intense electric fields can trigger abrupt IMT, deep modulation of IR radiation requires energy integration through Joule heating, which limits the response time of IR transmission controlled by electric field. Thus, cooperative thermal-electric field control, which provides a constant, uniform temperature field while electrically switching the IMT, is more effective for achieving a faster response time and retaining the intrinsic modulation depth of VO2-based IR modulators. Our findings offer valuable insights for the development of VO2-based IR modulators with improved performance.
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Affiliation(s)
- Chang Lu
- Department
of Electronic Communication and Technology, Shenzhen Institute of Information Technology, Shenzhen 518029, China
- School
of Materials and Energy, University of Electronic
Science and Technology of China, Chengdu 610054, China
| | - Fan Yang
- School
of Materials and Energy, University of Electronic
Science and Technology of China, Chengdu 610054, China
| | - Min Gao
- School
of Materials and Energy, University of Electronic
Science and Technology of China, Chengdu 610054, China
| | - Xinzhong Wang
- Department
of Electronic Communication and Technology, Shenzhen Institute of Information Technology, Shenzhen 518029, China
| | - Yuan Lin
- School
of Materials and Energy, University of Electronic
Science and Technology of China, Chengdu 610054, China
- Engineering
Cooperation on Applied Medicine Research Center, University of Electronic Science and Technology of China, Chengdu 610054, China
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10
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Liu H, Qin Y, Chen HY, Wu J, Ma J, Du Z, Wang N, Zou J, Lin S, Zhang X, Zhang Y, Wang H. Artificial Neuronal Devices Based on Emerging Materials: Neuronal Dynamics and Applications. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2205047. [PMID: 36609920 DOI: 10.1002/adma.202205047] [Citation(s) in RCA: 21] [Impact Index Per Article: 10.5] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/03/2022] [Revised: 12/02/2022] [Indexed: 06/17/2023]
Abstract
Artificial neuronal devices are critical building blocks of neuromorphic computing systems and currently the subject of intense research motivated by application needs from new computing technology and more realistic brain emulation. Researchers have proposed a range of device concepts that can mimic neuronal dynamics and functions. Although the switching physics and device structures of these artificial neurons are largely different, their behaviors can be described by several neuron models in a more unified manner. In this paper, the reports of artificial neuronal devices based on emerging volatile switching materials are reviewed from the perspective of the demonstrated neuron models, with a focus on the neuronal functions implemented in these devices and the exploitation of these functions for computational and sensing applications. Furthermore, the neuroscience inspirations and engineering methods to enrich the neuronal dynamics that remain to be implemented in artificial neuronal devices and networks toward realizing the full functionalities of biological neurons are discussed.
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Affiliation(s)
- Hefei Liu
- Ming Hsieh Department of Electrical and Computer Engineering, University of Southern California, Los Angeles, CA, 90089, USA
| | - Yuan Qin
- Center for Power Electronics Systems, Bradley Department of Electrical and Computer Engineering, Virginia Polytechnic Institute and State University, Blacksburg, VA, 24060, USA
| | - Hung-Yu Chen
- Ming Hsieh Department of Electrical and Computer Engineering, University of Southern California, Los Angeles, CA, 90089, USA
| | - Jiangbin Wu
- Ming Hsieh Department of Electrical and Computer Engineering, University of Southern California, Los Angeles, CA, 90089, USA
| | - Jiahui Ma
- Ming Hsieh Department of Electrical and Computer Engineering, University of Southern California, Los Angeles, CA, 90089, USA
| | - Zhonghao Du
- Ming Hsieh Department of Electrical and Computer Engineering, University of Southern California, Los Angeles, CA, 90089, USA
| | - Nan Wang
- Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, CA, 90089, USA
| | - Jingyi Zou
- Department of Electrical and Computer Engineering, Carnegie Mellon University, Pittsburgh, PA, 15213, USA
| | - Sen Lin
- Department of Electrical and Computer Engineering, Carnegie Mellon University, Pittsburgh, PA, 15213, USA
| | - Xu Zhang
- Department of Electrical and Computer Engineering, Carnegie Mellon University, Pittsburgh, PA, 15213, USA
| | - Yuhao Zhang
- Center for Power Electronics Systems, Bradley Department of Electrical and Computer Engineering, Virginia Polytechnic Institute and State University, Blacksburg, VA, 24060, USA
| | - Han Wang
- Ming Hsieh Department of Electrical and Computer Engineering, University of Southern California, Los Angeles, CA, 90089, USA
- Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, CA, 90089, USA
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11
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Qaderi F, Rosca T, Burla M, Leuthold J, Flandre D, Ionescu AM. Millimeter-wave to near-terahertz sensors based on reversible insulator-to-metal transition in VO 2. COMMUNICATIONS MATERIALS 2023; 4:34. [PMID: 38665394 PMCID: PMC11041681 DOI: 10.1038/s43246-023-00350-x] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 06/06/2022] [Accepted: 03/21/2023] [Indexed: 04/28/2024]
Abstract
In the quest for low power bio-inspired spiking sensors, functional oxides like vanadium dioxide are expected to enable future energy efficient sensing. Here, we report uncooled millimeter-wave spiking detectors based on the sensitivity of insulator-to-metal transition threshold voltage to the incident wave. The detection concept is demonstrated through actuation of biased VO2 switches encapsulated in a pair of coupled antennas by interrupting coplanar waveguides for broadband measurements, on silicon substrates. Ultimately, we propose an electromagnetic-wave-sensitive voltage-controlled spike generator based on VO2 switches in an astable spiking circuit. The fabricated sensors show responsivities of around 66.3 MHz.W-1 at 1 μW, with a low noise equivalent power of 5 nW.Hz-0.5 at room temperature, for a footprint of 2.5 × 10-5 mm2. The responsivity in static characterizations is 76 kV.W-1. Based on experimental statistical data measured on robust fabricated devices, we discuss stochastic behavior and noise limits of VO2 -based spiking sensors applicable for wave power sensing in mm-wave and sub-terahertz range.
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Affiliation(s)
- Fatemeh Qaderi
- Nanoelectronic devices laboratory (Nanolab), Department of Electrical Engineering, École polytechnique fédérale de Lausanne (EPFL), EPFL STI IEL NANOLAB, ELB 335, Station 11, Lausanne, 1015 Switzerland
| | - Teodor Rosca
- Nanoelectronic devices laboratory (Nanolab), Department of Electrical Engineering, École polytechnique fédérale de Lausanne (EPFL), EPFL STI IEL NANOLAB, ELB 335, Station 11, Lausanne, 1015 Switzerland
| | - Maurizio Burla
- Institute of Electromagnetic Fields (IEF), Eidgenössische Technische Hochschule Zürich (ETHZ), ETZ K 82, Gloriastrasse 35, Zürich, 8092 Switzerland
| | - Juerg Leuthold
- Institute of Electromagnetic Fields (IEF), Eidgenössische Technische Hochschule Zürich (ETHZ), ETZ K 82, Gloriastrasse 35, Zürich, 8092 Switzerland
| | - Denis Flandre
- ICTEAM, Ecole Polytechnique de Louvain (UCLouvain), ELEN, Place du Levant 3/L5.03.02, Louvain-la-Neuve, 1348 Belgium
| | - Adrian M. Ionescu
- Nanoelectronic devices laboratory (Nanolab), Department of Electrical Engineering, École polytechnique fédérale de Lausanne (EPFL), EPFL STI IEL NANOLAB, ELB 335, Station 11, Lausanne, 1015 Switzerland
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12
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Jaman A, Goossens AS, van Rijn JJL, van der Zee L, Banerjee T. Morphology control of volatile resistive switching in La0.67Sr0.33MnO3 thin films on LaAlO3 (001). FRONTIERS IN NANOTECHNOLOGY 2023. [DOI: 10.3389/fnano.2023.1121492] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 03/08/2023] Open
Abstract
The development of in-memory computing hardware components based on different types of resistive materials is an active research area. These materials usually exhibit analog memory states originating from a wide range of physical mechanisms and offer rich prospects for their integration in artificial neural networks. The resistive states are classified as either non-volatile or volatile, and switching occurs when the material properties are triggered by an external stimulus such as temperature, current, voltage, or electric field. The non-volatile resistance state change is typically achieved by the switching layer’s local redox reaction that involves both electronic and ionic movement. In contrast, a volatile change in the resistance state arises due to the transition of the switching layer from an insulator to a metal. Here, we demonstrate volatile resistive switching in twinned LaAlO3 onto which strained thin films of La0.67Sr0.33MnO3 (LSMO) are deposited. An electric current induces phase transition that triggers resistive switching, close to the competing phase transition temperature in LSMO, enabled by the strong correlation between the electronic and magnetic ground states, intrinsic to such materials. This phase transition, characterized by an abrupt resistance change, is typical of a metallic to insulating behavior, due to Joule heating, and manifested as a sharp increase in the voltage with accompanying hysteresis. Our results show that such Joule heating-induced hysteretic resistive switching exhibits different profiles that depend on the substrate texture along the current path, providing an interesting direction toward new multifunctional in-memory computing devices.
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13
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Kim D, Shin EC, Lee Y, Lee YH, Zhao M, Kim YH, Yang H. Atomic-scale thermopower in charge density wave states. Nat Commun 2022; 13:4516. [PMID: 35922417 PMCID: PMC9349257 DOI: 10.1038/s41467-022-32226-y] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 02/24/2022] [Accepted: 07/21/2022] [Indexed: 11/09/2022] Open
Abstract
The microscopic origins of thermopower have been investigated to design efficient thermoelectric devices, but strongly correlated quantum states such as charge density waves and Mott insulating phase remain to be explored for atomic-scale thermopower engineering. Here, we report on thermopower and phonon puddles in the charge density wave states in 1T-TaS2, probed by scanning thermoelectric microscopy. The Star-of-David clusters of atoms in 1T-TaS2 exhibit counterintuitive variations in thermopower with broken three-fold symmetry at the atomic scale, originating from the localized nature of valence electrons and their interlayer coupling in the Mott insulating charge density waves phase of 1T-TaS2. Additionally, phonon puddles are observed with a spatial range shorter than the conventional mean free path of phonons, revealing the phonon propagation and scattering in the subsurface structures of 1T-TaS2.
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Affiliation(s)
- Dohyun Kim
- Department of Energy Science, Sungkyunkwan University, Suwon, Korea
| | - Eui-Cheol Shin
- Department of Physics, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Korea
| | - Yongjoon Lee
- Department of Physics, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Korea
| | - Young Hee Lee
- Department of Energy Science, Sungkyunkwan University, Suwon, Korea.,Center for Integrated Nanostructure Physics (CINAP), Institute for Basic Science, Suwon, Korea
| | - Mali Zhao
- Interdisciplinary Materials Research Center, College of Materials Science and Engineering, Tongji University, Shanghai, People's Republic of China.
| | - Yong-Hyun Kim
- Department of Physics, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Korea.
| | - Heejun Yang
- Department of Physics, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Korea.
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14
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Nanoscale self-organization and metastable non-thermal metallicity in Mott insulators. Nat Commun 2022; 13:3730. [PMID: 35764628 PMCID: PMC9240065 DOI: 10.1038/s41467-022-31298-0] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/27/2021] [Accepted: 06/10/2022] [Indexed: 11/08/2022] Open
Abstract
Mott transitions in real materials are first order and almost always associated with lattice distortions, both features promoting the emergence of nanotextured phases. This nanoscale self-organization creates spatially inhomogeneous regions, which can host and protect transient non-thermal electronic and lattice states triggered by light excitation. Here, we combine time-resolved X-ray microscopy with a Landau-Ginzburg functional approach for calculating the strain and electronic real-space configurations. We investigate V2O3, the archetypal Mott insulator in which nanoscale self-organization already exists in the low-temperature monoclinic phase and strongly affects the transition towards the high-temperature corundum metallic phase. Our joint experimental-theoretical approach uncovers a remarkable out-of-equilibrium phenomenon: the photo-induced stabilisation of the long sought monoclinic metal phase, which is absent at equilibrium and in homogeneous materials, but emerges as a metastable state solely when light excitation is combined with the underlying nanotexture of the monoclinic lattice.
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15
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Huang T, Zhang R, Zhang L, Xu P, Shao Y, Yang W, Chen Z, Chen X, Dai N. Energy-adaptive resistive switching with controllable thresholds in insulator–metal transition. RSC Adv 2022; 12:35579-35586. [DOI: 10.1039/d2ra06866d] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/31/2022] [Accepted: 12/07/2022] [Indexed: 12/14/2022] Open
Abstract
Adaptive energy-scaling resistive switching with active response and self-regulation via controllable insulator–metal transition shows promise in energy-efficient devices.
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Affiliation(s)
- Tiantian Huang
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China
- University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Rui Zhang
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China
- University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Lepeng Zhang
- College of Materials Science and Engineering, Zhengzhou University, Zhengzhou 450052, China
| | - Peiran Xu
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China
| | - Yunkai Shao
- Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou 310024, China
| | - Wanli Yang
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China
| | - Zhimin Chen
- College of Materials Science and Engineering, Zhengzhou University, Zhengzhou 450052, China
| | - Xin Chen
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China
- Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou 310024, China
- University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Ning Dai
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China
- Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou 310024, China
- University of Chinese Academy of Sciences, Beijing, 100049, China
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16
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Thees M, Lee MH, Bouwmeester RL, Rezende-Gonçalves PH, David E, Zimmers A, Fortuna F, Frantzeskakis E, Vargas NM, Kalcheim Y, Le Fèvre P, Horiba K, Kumigashira H, Biermann S, Trastoy J, Rozenberg MJ, Schuller IK, Santander-Syro AF. Imaging the itinerant-to-localized transmutation of electrons across the metal-to-insulator transition in V 2O 3. SCIENCE ADVANCES 2021; 7:eabj1164. [PMID: 34730993 PMCID: PMC8565841 DOI: 10.1126/sciadv.abj1164] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 04/21/2021] [Accepted: 09/14/2021] [Indexed: 06/13/2023]
Abstract
In solids, strong repulsion between electrons can inhibit their movement and result in a “Mott” metal-to-insulator transition (MIT), a fundamental phenomenon whose understanding has remained a challenge for over 50 years. A key issue is how the wave-like itinerant electrons change into a localized-like state due to increased interactions. However, observing the MIT in terms of the energy- and momentum-resolved electronic structure of the system, the only direct way to probe both itinerant and localized states, has been elusive. Here we show, using angle-resolved photoemission spectroscopy (ARPES), that in V2O3, the temperature-induced MIT is characterized by the progressive disappearance of its itinerant conduction band, without any change in its energy-momentum dispersion, and the simultaneous shift to larger binding energies of a quasi-localized state initially located near the Fermi level.
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Affiliation(s)
- Maximilian Thees
- Université Paris-Saclay, CNRS, Institut des Sciences Moléculaires d'Orsay, 91405 Orsay, France
| | - Min-Han Lee
- Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093, USA
| | - Rosa Luca Bouwmeester
- Faculty of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, 7500 AE Enschede, Netherlands
| | - Pedro H. Rezende-Gonçalves
- Université Paris-Saclay, CNRS, Institut des Sciences Moléculaires d'Orsay, 91405 Orsay, France
- Departamento de Física, Universidade Federal de Minas Gerais, Av. Pres. Antonio Carlos, 6627 Belo Horizonte, Brazil
| | - Emma David
- Université Paris-Saclay, CNRS, Institut des Sciences Moléculaires d'Orsay, 91405 Orsay, France
| | - Alexandre Zimmers
- LPEM, ESPCI Paris, PSL Research University, CNRS, Sorbonne Université, 75005 Paris, France
| | - Franck Fortuna
- Université Paris-Saclay, CNRS, Institut des Sciences Moléculaires d'Orsay, 91405 Orsay, France
| | - Emmanouil Frantzeskakis
- Université Paris-Saclay, CNRS, Institut des Sciences Moléculaires d'Orsay, 91405 Orsay, France
| | - Nicolas M. Vargas
- Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093, USA
| | - Yoav Kalcheim
- Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093, USA
| | - Patrick Le Fèvre
- Synchrotron SOLEIL, L'Orme des Merisiers, Saint-Aubin-BP48, 91192 Gif-sur-Yvette, France
| | - Koji Horiba
- Photon Factory, Institute of Materials Structure Science, High Energy Accelerator Research Organization (KEK), 1-1 Oho, Tsukuba 305-0801, Japan
| | - Hiroshi Kumigashira
- Photon Factory, Institute of Materials Structure Science, High Energy Accelerator Research Organization (KEK), 1-1 Oho, Tsukuba 305-0801, Japan
- Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, Sendai 980-8577, Japan
| | - Silke Biermann
- CPHT, CNRS, Ecole Polytechnique, Institut Polytechnique de Paris, F-91128 Palaiseau, France
- Collège de France, 11 place Marcelin Berthelot, 75005 Paris, France
- Department of Physics, Division of Mathematical Physics, Lund University, Professorsgatan 1, 22363 Lund, Sweden
| | - Juan Trastoy
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Sud, Université Paris-Saclay, 91767 Palaiseau, France
| | - Marcelo J. Rozenberg
- Université Paris-Saclay, CNRS, Laboratoire de Physique des Solides, 91405 Orsay, France
| | - Ivan K. Schuller
- Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093, USA
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17
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Bayram F, Gajula D, Khan D, Uppalapati B, Azad S, Koley G. Voltage triggered near-infrared light modulation using VO 2 thin film. OPTICS EXPRESS 2021; 29:32124-32134. [PMID: 34615290 DOI: 10.1364/oe.432245] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/25/2021] [Accepted: 08/31/2021] [Indexed: 06/13/2023]
Abstract
Development of compact and fast modulators of infrared light has garnered strong research interests in recent years due to their potential applications in communication, imaging, and sensing. In this study, electric field induced fast modulation near-infrared light caused by phase change in VO2 thin films grown on GaN suspended membranes has been reported. It was observed that metal insulator transition caused by temperature change or application of electric field, using an interdigitated finger geometry, resulted in 7% and 14% reduction in transmitted light intensity at near-infrared wavelengths of 790 and 1550 nm, respectively. Near-infrared light modulation has been demonstrated with voltage pulse widths down to 300 µs at 25 V magnitude. Finite element simulations performed on the suspended membrane modulator indicate a combination of the Joule heating and electric field is responsible for the phase transition.
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18
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Salev P, Fratino L, Sasaki D, Berkoun R, Del Valle J, Kalcheim Y, Takamura Y, Rozenberg M, Schuller IK. Transverse barrier formation by electrical triggering of a metal-to-insulator transition. Nat Commun 2021; 12:5499. [PMID: 34535660 PMCID: PMC8448889 DOI: 10.1038/s41467-021-25802-1] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/16/2020] [Accepted: 08/19/2021] [Indexed: 11/08/2022] Open
Abstract
Application of an electric stimulus to a material with a metal-insulator transition can trigger a large resistance change. Resistive switching from an insulating into a metallic phase, which typically occurs by the formation of a conducting filament parallel to the current flow, is a highly active research topic. Using the magneto-optical Kerr imaging, we found that the opposite type of resistive switching, from a metal into an insulator, occurs in a reciprocal characteristic spatial pattern: the formation of an insulating barrier perpendicular to the driving current. This barrier formation leads to an unusual N-type negative differential resistance in the current-voltage characteristics. We further demonstrate that electrically inducing a transverse barrier enables a unique approach to voltage-controlled magnetism. By triggering the metal-to-insulator resistive switching in a magnetic material, local on/off control of ferromagnetism is achieved using a global voltage bias applied to the whole device.
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Affiliation(s)
- Pavel Salev
- Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA, USA.
| | - Lorenzo Fratino
- Université Paris-Saclay, CNRS Laboratoire de Physique des Solides, 91405, Orsay, France
| | - Dayne Sasaki
- Department of Materials Science and Engineering, University of California Davis, Davis, CA, USA
| | - Rani Berkoun
- Université Paris-Saclay, CNRS Laboratoire de Physique des Solides, 91405, Orsay, France
| | - Javier Del Valle
- Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA, USA
- Department of Quantum Matter Physics, University of Geneva, Geneva, Switzerland
| | - Yoav Kalcheim
- Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA, USA
- Department of Materials Science and Engineering, Technion-Israel Institute of Technology, Haifa, Israel
| | - Yayoi Takamura
- Department of Materials Science and Engineering, University of California Davis, Davis, CA, USA
| | - Marcelo Rozenberg
- Université Paris-Saclay, CNRS Laboratoire de Physique des Solides, 91405, Orsay, France
| | - Ivan K Schuller
- Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA, USA
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19
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Cheng S, Lee MH, Tran R, Shi Y, Li X, Navarro H, Adda C, Meng Q, Chen LQ, Dynes RC, Ong SP, Schuller IK, Zhu Y. Inherent stochasticity during insulator-metal transition in VO 2. Proc Natl Acad Sci U S A 2021; 118:e2105895118. [PMID: 34493666 PMCID: PMC8449351 DOI: 10.1073/pnas.2105895118] [Citation(s) in RCA: 10] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/10/2021] [Accepted: 08/04/2021] [Indexed: 11/18/2022] Open
Abstract
Vanadium dioxide (VO2), which exhibits a near-room-temperature insulator-metal transition, has great potential in applications of neuromorphic computing devices. Although its volatile switching property, which could emulate neuron spiking, has been studied widely, nanoscale studies of the structural stochasticity across the phase transition are still lacking. In this study, using in situ transmission electron microscopy and ex situ resistive switching measurement, we successfully characterized the structural phase transition between monoclinic and rutile VO2 at local areas in planar VO2/TiO2 device configuration under external biasing. After each resistive switching, different VO2 monoclinic crystal orientations are observed, forming different equilibrium states. We have evaluated a statistical cycle-to-cycle variation, demonstrated a stochastic nature of the volatile resistive switching, and presented an approach to study in-plane structural anisotropy. Our microscopic studies move a big step forward toward understanding the volatile switching mechanisms and the related applications of VO2 as the key material of neuromorphic computing.
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Affiliation(s)
- Shaobo Cheng
- Department of Condensed Matter Physics and Materials Science, Brookhaven National Laboratory, Upton, NY 11973
| | - Min-Han Lee
- Materials Science and Engineering Program, University of California San Diego, La Jolla, CA 92093
- Department of Physics, Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093
| | - Richard Tran
- Department of NanoEngineering, University of California San Diego, La Jolla, CA 92093
| | - Yin Shi
- Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA 16802
| | - Xing Li
- Key Laboratory of Material Physics, Ministry of Education, School of Physics and Microelectronics, Zhengzhou University, Zhengzhou 450052, People's Republic of China
| | - Henry Navarro
- Department of Physics, Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093
| | - Coline Adda
- Department of Physics, Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093
| | - Qingping Meng
- Department of Condensed Matter Physics and Materials Science, Brookhaven National Laboratory, Upton, NY 11973
| | - Long-Qing Chen
- Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA 16802
| | - R C Dynes
- Department of Physics, Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093;
| | - Shyue Ping Ong
- Department of NanoEngineering, University of California San Diego, La Jolla, CA 92093
| | - Ivan K Schuller
- Materials Science and Engineering Program, University of California San Diego, La Jolla, CA 92093
- Department of Physics, Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093
| | - Yimei Zhu
- Department of Condensed Matter Physics and Materials Science, Brookhaven National Laboratory, Upton, NY 11973;
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20
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Del Valle J, Vargas NM, Rocco R, Salev P, Kalcheim Y, Lapa PN, Adda C, Lee MH, Wang PY, Fratino L, Rozenberg MJ, Schuller IK. Spatiotemporal characterization of the field-induced insulator-to-metal transition. Science 2021; 373:907-911. [PMID: 34301856 DOI: 10.1126/science.abd9088] [Citation(s) in RCA: 27] [Impact Index Per Article: 6.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/20/2020] [Accepted: 07/08/2021] [Indexed: 12/14/2022]
Abstract
Many correlated systems feature an insulator-to-metal transition that can be triggered by an electric field. Although it is known that metallization takes place through filament formation, the details of how this process initiates and evolves remain elusive. We use in-operando optical reflectivity to capture the growth dynamics of the metallic phase with space and time resolution. We demonstrate that filament formation is triggered by nucleation at hotspots, with a subsequent expansion over several decades in time. By comparing three case studies (VO2, V3O5, and V2O3), we identify the resistivity change across the transition as the crucial parameter governing this process. Our results provide a spatiotemporal characterization of volatile resistive switching in Mott insulators, which is important for emerging technologies, such as optoelectronics and neuromorphic computing.
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Affiliation(s)
- Javier Del Valle
- Department of Material Science and Engineering, Technion - Israel Institute of Technology, Haifa 32000, Israel. .,Université Paris-Saclay, CNRS Laboratoire de Physique des Solides, 91405, Orsay, France.,Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093, USA.,Department of Quantum Matter Physics, University of Geneva, 1211 Geneva, Switzerland
| | - Nicolas M Vargas
- Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093, USA
| | - Rodolfo Rocco
- Université Paris-Saclay, CNRS Laboratoire de Physique des Solides, 91405, Orsay, France.,Materials Science and Engineering Program, University of California San Diego, La Jolla, CA 92093, USA.,Université Paris-Saclay, CNRS Laboratoire de Physique des Solides, 91405, Orsay, France
| | - Pavel Salev
- Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093, USA
| | - Yoav Kalcheim
- Department of Quantum Matter Physics, University of Geneva, 1211 Geneva, Switzerland.,Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093, USA.,Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093, USA.,Department of Material Science and Engineering, Technion - Israel Institute of Technology, Haifa 32000, Israel
| | - Pavel N Lapa
- Department of Quantum Matter Physics, University of Geneva, 1211 Geneva, Switzerland.,Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093, USA
| | - Coline Adda
- Department of Material Science and Engineering, Technion - Israel Institute of Technology, Haifa 32000, Israel.,Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093, USA
| | - Min-Han Lee
- Department of Quantum Matter Physics, University of Geneva, 1211 Geneva, Switzerland.,Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093, USA.,Materials Science and Engineering Program, University of California San Diego, La Jolla, CA 92093, USA
| | - Paul Y Wang
- Department of Material Science and Engineering, Technion - Israel Institute of Technology, Haifa 32000, Israel.,Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093, USA
| | - Lorenzo Fratino
- Materials Science and Engineering Program, University of California San Diego, La Jolla, CA 92093, USA.,Université Paris-Saclay, CNRS Laboratoire de Physique des Solides, 91405, Orsay, France
| | - Marcelo J Rozenberg
- Materials Science and Engineering Program, University of California San Diego, La Jolla, CA 92093, USA.,Université Paris-Saclay, CNRS Laboratoire de Physique des Solides, 91405, Orsay, France
| | - Ivan K Schuller
- Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, CA 92093, USA
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21
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Operando characterization of conductive filaments during resistive switching in Mott VO 2. Proc Natl Acad Sci U S A 2021; 118:2013676118. [PMID: 33622788 DOI: 10.1073/pnas.2013676118] [Citation(s) in RCA: 8] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/18/2022] Open
Abstract
Vanadium dioxide (VO2) has attracted much attention owing to its metal-insulator transition near room temperature and the ability to induce volatile resistive switching, a key feature for developing novel hardware for neuromorphic computing. Despite this interest, the mechanisms for nonvolatile switching functioning as synapse in this oxide remain not understood. In this work, we use in situ transmission electron microscopy, electrical transport measurements, and numerical simulations on Au/VO2/Ge vertical devices to study the electroforming process. We have observed the formation of V5O9 conductive filaments with a pronounced metal-insulator transition and that vacancy diffusion can erase the filament, allowing for the system to "forget." Thus, both volatile and nonvolatile switching can be achieved in VO2, useful to emulate neuronal and synaptic behaviors, respectively. Our systematic operando study of the filament provides a more comprehensive understanding of resistive switching, key in the development of resistive switching-based neuromorphic computing.
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22
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Lu C, Lu Q, Gao M, Lin Y. Dynamic Manipulation of THz Waves Enabled by Phase-Transition VO 2 Thin Film. NANOMATERIALS (BASEL, SWITZERLAND) 2021; 11:E114. [PMID: 33419046 PMCID: PMC7825355 DOI: 10.3390/nano11010114] [Citation(s) in RCA: 14] [Impact Index Per Article: 3.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 11/22/2020] [Revised: 12/27/2020] [Accepted: 12/31/2020] [Indexed: 11/26/2022]
Abstract
The reversible and multi-stimuli responsive insulator-metal transition of VO2, which enables dynamic modulation over the terahertz (THz) regime, has attracted plenty of attention for its potential applications in versatile active THz devices. Moreover, the investigation into the growth mechanism of VO2 films has led to improved film processing, more capable modulation and enhanced device compatibility into diverse THz applications. THz devices with VO2 as the key components exhibit remarkable response to external stimuli, which is not only applicable in THz modulators but also in rewritable optical memories by virtue of the intrinsic hysteresis behaviour of VO2. Depending on the predesigned device structure, the insulator-metal transition (IMT) of VO2 component can be controlled through thermal, electrical or optical methods. Recent research has paid special attention to the ultrafast modulation phenomenon observed in the photoinduced IMT, enabled by an intense femtosecond laser (fs laser) which supports "quasi-simultaneous" IMT within 1 ps. This progress report reviews the current state of the field, focusing on the material nature that gives rise to the modulation-allowed IMT for THz applications. An overview is presented of numerous IMT stimuli approaches with special emphasis on the underlying physical mechanisms. Subsequently, active manipulation of THz waves through pure VO2 film and VO2 hybrid metamaterials is surveyed, highlighting that VO2 can provide active modulation for a wide variety of applications. Finally, the common characteristics and future development directions of VO2-based tuneable THz devices are discussed.
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Affiliation(s)
- Chang Lu
- School of Materials and Energy, University of Electronic Science and Technology of China, Chengdu 610054, China; (C.L.); (Q.L.)
- State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China
| | - Qingjian Lu
- School of Materials and Energy, University of Electronic Science and Technology of China, Chengdu 610054, China; (C.L.); (Q.L.)
- State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China
| | - Min Gao
- School of Materials and Energy, University of Electronic Science and Technology of China, Chengdu 610054, China; (C.L.); (Q.L.)
- State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China
| | - Yuan Lin
- School of Materials and Energy, University of Electronic Science and Technology of China, Chengdu 610054, China; (C.L.); (Q.L.)
- State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China
- Medico-Engineering Cooperation on Applied Medicine Research Center, University of Electronic Science and Technology of China, Chengdu 610054, China
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23
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Chen YC, Lin CC, Chang YF. Post-Moore Memory Technology: Sneak Path Current (SPC) Phenomena on RRAM Crossbar Array and Solutions. MICROMACHINES 2021; 12:mi12010050. [PMID: 33401642 PMCID: PMC7823919 DOI: 10.3390/mi12010050] [Citation(s) in RCA: 12] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 12/14/2020] [Accepted: 12/29/2020] [Indexed: 12/03/2022]
Abstract
The sneak path current (SPC) is the inevitable issue in crossbar memory array while implementing high-density storage configuration. The crosstalks are attracting much attention, and the read accuracy in the crossbar architecture is deteriorated by the SPC. In this work, the sneak path current problem is observed and investigated by the electrical experimental measurements in the crossbar array structure with the half-read scheme. The read margin of the selected cell is improved by the bilayer stacked structure, and the sneak path current is reduced ~20% in the bilayer structure. The voltage-read stress-induced read margin degradation has also been investigated, and less voltage stress degradation is showed in bilayer structure due to the intrinsic nonlinearity. The oxide-based bilayer stacked resistive random access memory (RRAM) is presented to offer immunity toward sneak path currents in high-density memory integrations when implementing the future high-density storage and in-memory computing applications.
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Affiliation(s)
- Ying-Chen Chen
- School of Informatics, Computing and Cyber Systems, Northern Arizona University, Flagstaff, AZ 86011, USA
| | - Chao-Cheng Lin
- Taiwan Semiconductor Research Institute, National Applied Research Laboratories, Hsinchu 30078, Taiwan
| | - Yao-Feng Chang
- Department of Electrical and Computing Engineering, The University of Texas at Austin, Austin, TX 78712, USA
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24
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Li B, Hu M, Ren H, Hu C, Li L, Zhang G, Jiang J, Zou C. Atomic Origin for Hydrogenation Promoted Bulk Oxygen Vacancies Removal in Vanadium Dioxide. J Phys Chem Lett 2020; 11:10045-10051. [PMID: 33179929 DOI: 10.1021/acs.jpclett.0c02773] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Oxygen vacancies (VO), a common type of point defect in metal oxides materials, play important roles in the physical and chemical properties. To obtain stoichiometric oxide crystal, the pre-existing VO is always removed via careful post-annealing treatment at high temperature in an air or oxygen atmosphere. However, the annealing conditions are difficult to control, and the removal of VO in the bulk phase is restrained because of the high energy barrier of VO migration. Here, we selected VO2 crystal film as the model system and developed an alternative annealing treatment aided by controllable hydrogen doping, which can realize effective removal of VO defects in the VO2-δ crystal at a lower temperature. This finding is attributed to the hydrogenation accelerated oxygen vacancies recovery in the VO2-δ crystal. Theoretical calculations revealed that the H-doping-induced electrons are prone to accumulate around the oxygen defects in the VO2-δ film, which facilitates the diffusion of VO and thus makes it easier to be removed. The methodology is expected to be applied to other metal oxides for oxygen-related point defects control.
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Affiliation(s)
- Bowen Li
- National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, P. R. China
| | - Min Hu
- Hefei National Laboratory for Physical Sciences at the Microscale, Collaborative Innovation Center of Chemistry for Energy Materials, CAS Center for Excellence in Nanoscience, School of Chemistry and Materials Science, University of Science and Technology of China, Hefei, Anhui 230026, P. R. China
| | - Hui Ren
- National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, P. R. China
| | - Changlong Hu
- National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, P. R. China
| | - Liang Li
- National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, P. R. China
| | - Guozhen Zhang
- Hefei National Laboratory for Physical Sciences at the Microscale, Collaborative Innovation Center of Chemistry for Energy Materials, CAS Center for Excellence in Nanoscience, School of Chemistry and Materials Science, University of Science and Technology of China, Hefei, Anhui 230026, P. R. China
| | - Jun Jiang
- Hefei National Laboratory for Physical Sciences at the Microscale, Collaborative Innovation Center of Chemistry for Energy Materials, CAS Center for Excellence in Nanoscience, School of Chemistry and Materials Science, University of Science and Technology of China, Hefei, Anhui 230026, P. R. China
| | - Chongwen Zou
- National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, P. R. China
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25
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Bayram F, Gajula D, Khan D, Koley G. Investigation of AlGaN/GaN HFET and VO 2 Thin Film Based Deflection Transducers Embedded in GaN Microcantilevers. MICROMACHINES 2020; 11:mi11090875. [PMID: 32962251 PMCID: PMC7570367 DOI: 10.3390/mi11090875] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 08/06/2020] [Revised: 09/08/2020] [Accepted: 09/18/2020] [Indexed: 11/16/2022]
Abstract
The static and dynamic deflection transducing performances of piezotransistive AlGaN/GaN heterojunction field effect transistors (HFET) and piezoresistive VO2 thin films, fabricated on GaN microcantilevers of similar dimensions, were investigated. Deflection sensitivities were tuned with the gate bias and operating temperature for embedded AlGaN/GaN HFET and VO2 thin film transducers, respectively. The GaN microcantilevers were excited with a piezoactuator in their linear and nonlinear oscillation regions of the fundamental oscillatory mode. In the linear regime, the maximum deflection sensitivity of piezotransistive AlGaN/GaN HFET reached up to a 0.5% change in applied drain voltage, while the responsivity of the piezoresistive VO2 thin film based deflection transducer reached a maximum value of 0.36% change in applied drain current. The effects of the gate bias and the operation temperature on nonlinear behaviors of the microcantilevers were also experimentally examined. Static deflection sensitivity measurements demonstrated a large change of 16% in drain-source resistance of the AlGaN/GaN HFET, and a similarly high 11% change in drain-source resistance in the VO2 thin film, corresponding to a 10 μm downward step bending of the cantilever free end.
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Affiliation(s)
- Ferhat Bayram
- Holcombe Department of Electrical and Computer Engineering, Clemson University, Clemson, SC 29634, USA; (D.K.); (G.K.)
- Correspondence: ; Tel.: +1-(864)-650-5196
| | - Durga Gajula
- School of Electrical and Computer Engineering Georgia Institute of Technology, Atlanta, GA 30332, USA;
| | - Digangana Khan
- Holcombe Department of Electrical and Computer Engineering, Clemson University, Clemson, SC 29634, USA; (D.K.); (G.K.)
| | - Goutam Koley
- Holcombe Department of Electrical and Computer Engineering, Clemson University, Clemson, SC 29634, USA; (D.K.); (G.K.)
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26
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Zhang J, Peng Y, Ma H, Zhang S, Hu Y, Zeng X, Deng X, Guan C, Chen R, Hu Y, Karim A, Tao K, Zhang M, Zhang X. Magnetotransport Mechanism of Individual Nanostructures via Direct Magnetoresistance Measurement in situ SEM. ACS APPLIED MATERIALS & INTERFACES 2020; 12:39798-39806. [PMID: 32805913 DOI: 10.1021/acsami.0c09773] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
The accurate magnetoresistance (MR) measurement of individual nanostructures is essential and important for either the enrichment of fundamental knowledge of the magnetotransport mechanism or the facilitation of desired design of magnetic nanostructures for various technological applications. Herein, we report a deep investigation on the magnetotransport mechanism of a single CoCu/Cu multilayered nanowire via direct MR measurement using our invented magnetotransport instrument in situ scanning electron microscope. Off-axis electron holography experiments united with micromagnetic simulation prove that the CoCu layers in CoCu/Cu multilayered nanowires form a single-domain structure, in which the alignment of magnetic moments is mainly determined by shape anisotropy. The MR of the single CoCu/Cu multilayered nanowire is measured to be only 1.14% when the varied external field is applied along the nanowire length axis, which matches with the theoretical prediction of the granular film model. Density functional theory calculations further disclose that spin-dependent scattering at the interface between magnetic and nonmagnetic layers is responsible for the intrinsic magnetotransport mechanism.
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Affiliation(s)
- Junwei Zhang
- Key Laboratory of Magnetism and Magnetic Materials of the Ministry of Education, School of Physical Science and Technology and Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
| | - Yong Peng
- Key Laboratory of Magnetism and Magnetic Materials of the Ministry of Education, School of Physical Science and Technology and Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
| | - Hongbin Ma
- Qinghai Provincial Key Laboratory of New Light Alloys, Qinghai Provincial Engineering Research Center of High Performance Light Metal Alloys and Forming, Qinghai University, Xining 810016, PR China
| | - Senfu Zhang
- King Abdullah University of Science and Technology (KAUST), Physical Science and Engineering (PSE) Division, Thuwal 23955-6900, Saudi Arabia
| | - Yang Hu
- Key Laboratory of Magnetism and Magnetic Materials of the Ministry of Education, School of Physical Science and Technology and Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
| | - Xue Zeng
- School of Mathematics and Physics, Lanzhou Jiaotong University, Lanzhou 730070, PR China
| | - Xia Deng
- School of Life Science and Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
| | - Chaoshuai Guan
- Key Laboratory of Magnetism and Magnetic Materials of the Ministry of Education, School of Physical Science and Technology and Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
| | - Rongrong Chen
- Key Laboratory of Magnetism and Magnetic Materials of the Ministry of Education, School of Physical Science and Technology and Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
| | - Yue Hu
- Key Laboratory of Magnetism and Magnetic Materials of the Ministry of Education, School of Physical Science and Technology and Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
| | - Abdul Karim
- Key Laboratory of Magnetism and Magnetic Materials of the Ministry of Education, School of Physical Science and Technology and Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
- Department Physics, Karakorum International University Gilgit-Baltistan 15100, Pakistan
| | - Kun Tao
- Key Laboratory of Magnetism and Magnetic Materials of the Ministry of Education, School of Physical Science and Technology and Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
| | - Mingjie Zhang
- Key Lab of Mineral Resources in Western China (Gansu), School of Earth Sciences, Lanzhou University, Lanzhou 730000, China
| | - Xixiang Zhang
- King Abdullah University of Science and Technology (KAUST), Physical Science and Engineering (PSE) Division, Thuwal 23955-6900, Saudi Arabia
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