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Dong X, Sun H, Lai X, Yang F, Ma T, Zhang X, Chen J, Zhao Y, Chen J, Zhang X, Li Y. MoO x Synaptic Memristor with Programmable Multilevel Conductance for Reliable Neuromorphic Hardware. J Phys Chem Lett 2024; 15:3668-3676. [PMID: 38535723 DOI: 10.1021/acs.jpclett.4c00600] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 04/05/2024]
Abstract
Memristor holds great potential for enabling next-generation neuromorphic computing hardware. Controlling the interfacial characteristics of the device is critical for seamlessly integrating and replicating the synaptic dynamic behaviors; however, it is commonly overlooked. Herein, we report the straightforward oxidation of a Mo electrode in air to design MoOx memristors that exhibit nonvolatile ultrafast switching (0.6-0.8 mV/decade, <1 mV/decade) with a high on/off ratio (>104), a long durability (>104 s), a low power consumption (17.9 μW), excellent device-to-device uniformity, ingeniously synaptic behavior, and finely programmable multilevel analog switching. The analyzed physical mechanism of the observed resistive switching behavior might be the conductive filaments formed by the oxygen vacancies. Intriguingly, upon organization into memristor-based crossbar arrays, in addition to simulated multipattern memorization, edge detection on random images can be implemented well by parallel processing of pixels using a 3 × 3 × 2 array of Prewitt filter groups. These are vital functions for neural system hardware in efficient in-memory computing neural systems with massive parallelism beyond a von Neumann architecture.
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Affiliation(s)
- Xiaofei Dong
- Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province, College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou 730070, China
| | - Hao Sun
- Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province, College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou 730070, China
| | - Xinhua Lai
- Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province, College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou 730070, China
| | - Fengxia Yang
- Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province, College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou 730070, China
| | - Tingting Ma
- Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province, College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou 730070, China
| | - Xiang Zhang
- Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province, College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou 730070, China
| | - Jianbiao Chen
- Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province, College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou 730070, China
| | - Yun Zhao
- Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province, College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou 730070, China
| | - Jiangtao Chen
- Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province, College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou 730070, China
| | - Xuqiang Zhang
- Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province, College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou 730070, China
| | - Yan Li
- Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province, College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou 730070, China
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2
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Martins RA, Carlos E, Kiazadeh A, Martins R, Deuermeier J. Low-Temperature Solution-Based Molybdenum Oxide Memristors. ACS APPLIED ENGINEERING MATERIALS 2024; 2:298-304. [PMID: 38419978 PMCID: PMC10897879 DOI: 10.1021/acsaenm.3c00535] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 09/08/2023] [Revised: 12/15/2023] [Accepted: 12/15/2023] [Indexed: 03/02/2024]
Abstract
Solution-based memristors have gained significant attention in recent years due to their potential for the low-cost, scalable, and environmentally friendly fabrication of resistive switching devices. This study is focused on the fabrication and characterization of solution-based molybdenum trioxide (MoO3) memristors under different annealing temperatures (200 to 400 °C). A MoO3 ink recipe is developed using water as the main solvent, enabling a simplified and cost-effective fabrication process. Material analysis reveals the presence of a Mo6+ oxidation state and an amorphous structure in the films annealed up to 250 °C. Electrical tests confirm a bipolar resistive switching behavior in the memristors according to the valence change mechanism (VCM). Endurance tests demonstrate stable memristors, indicating their robust nature after multiple cycles. Memristors annealed at 250 °C exhibit a nonvolatile behavior with a retention time up to 105 s under ambient air conditions. The high reproducibility observed in these memristors highlights their potential for practical applications and scalability.
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Affiliation(s)
- Raquel Azevedo Martins
- CENIMAT|i3N, Department of Materials Science, School of Science and Technology, NOVA University Lisbon and CEMOP/UNINOVA, 2829-516 Caparica, Portugal
| | - Emanuel Carlos
- CENIMAT|i3N, Department of Materials Science, School of Science and Technology, NOVA University Lisbon and CEMOP/UNINOVA, 2829-516 Caparica, Portugal
| | - Asal Kiazadeh
- CENIMAT|i3N, Department of Materials Science, School of Science and Technology, NOVA University Lisbon and CEMOP/UNINOVA, 2829-516 Caparica, Portugal
| | - Rodrigo Martins
- CENIMAT|i3N, Department of Materials Science, School of Science and Technology, NOVA University Lisbon and CEMOP/UNINOVA, 2829-516 Caparica, Portugal
| | - Jonas Deuermeier
- CENIMAT|i3N, Department of Materials Science, School of Science and Technology, NOVA University Lisbon and CEMOP/UNINOVA, 2829-516 Caparica, Portugal
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3
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Sunny MM, Thamankar R. Spike rate dependent synaptic characteristics in lamellar, multilayered alpha-MoO 3 based two-terminal devices - efficient way to control the synaptic amplification. RSC Adv 2024; 14:2518-2528. [PMID: 38226148 PMCID: PMC10788777 DOI: 10.1039/d3ra07757h] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/13/2023] [Accepted: 12/19/2023] [Indexed: 01/17/2024] Open
Abstract
Brain-inspired computing systems require a rich variety of neuromorphic devices using multi-functional materials operating at room temperature. Artificial synapses which can be operated using optical and electrical stimuli are in high demand. In this regard, layered materials have attracted a lot of attention due to their tunable energy gap and exotic properties. In the current study, we report the growth of layered MoO3 using the chemical vapor deposition (CVD) technique. MoO3 has an energy gap of 3.22 eV and grows with a large aspect ratio, as seen through optical and scanning electron microscopy. We used transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy for complete characterisation. The two-terminal devices using platinum (Pt/MoO3/Pt) exhibit superior memory with the high-resistance state (HRS) and low-resistance state (LRS) differing by a large resistance (∼MΩ). The devices also show excellent synaptic characteristics. Both optical and electrical pulses can be utilised to stimulate the synapse. Consistent learning (potentiation) and forgetting (depression) curves are measured. Transition from long term depression to long term potentiation can be achieved using the spike frequency dependent pulsing scheme. We have found that the amplification of postsynaptic current can be tuned using such frequency dependent spikes. This will help us to design neuromorphic devices with the required synaptic amplification.
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Affiliation(s)
- Meenu Maria Sunny
- Department of Physics, Vellore Institute of Technology Vellore TN India
- Centre for Functional Materials, Vellore Institute of Technology Vellore TN India
| | - R Thamankar
- Centre for Functional Materials, Vellore Institute of Technology Vellore TN India
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4
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Zhao J, Zheng S, Zhou L, Mi W, Ding Y, Wang M. An artificial optoelectronic synapse based on MoO xfilm. NANOTECHNOLOGY 2023; 34:145201. [PMID: 36630707 DOI: 10.1088/1361-6528/acb217] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/26/2022] [Accepted: 01/11/2023] [Indexed: 06/17/2023]
Abstract
Artificial optoelectronic synapses have the advantages of large bandwidth, low power consumption and low crosstalk, and are considered to be the basic building blocks of neuromorphic computing. In this paper, a two-terminal optoelectronic synaptic device with ITO-MoOx-Pt structure is prepared by magnetron sputtering. The performance of resistive switching (RS) and the photo plastic properties of the device are analyzed and demonstrated. Electrical characterization tests show that the device has a resistive HRS/LRS ratio of about 90, stable endurance, and retention characteristics of more than 104s (85 °C). The physical mechanism of the device is elucidated by a conducting filament composed of oxygen vacancies. Furthermore, the function of various synaptic neural morphologies is successfully mimicked using UV light as the stimulation source. Including short-term/long-term memory, paired-pulse facilitation, the transition from short-term to long-term memory, and 'learning-experience' behavior. Integrated optical sensing and electronic data storage devices have great potential for future artificial intelligence, which will facilitate the rapid development of retina-like visual sensors and low-power neuromorphic systems.
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Affiliation(s)
- Jinshi Zhao
- Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Integrated Circuit Science and Engineering, Tianjin University of Technology, No. 391 Bin Shui Xi Dao Road, Xi qing District, Tianjin, 300384, People's Republic of China
| | - ShuTong Zheng
- Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Integrated Circuit Science and Engineering, Tianjin University of Technology, No. 391 Bin Shui Xi Dao Road, Xi qing District, Tianjin, 300384, People's Republic of China
| | - Liwei Zhou
- Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Integrated Circuit Science and Engineering, Tianjin University of Technology, No. 391 Bin Shui Xi Dao Road, Xi qing District, Tianjin, 300384, People's Republic of China
| | - Wei Mi
- Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Integrated Circuit Science and Engineering, Tianjin University of Technology, No. 391 Bin Shui Xi Dao Road, Xi qing District, Tianjin, 300384, People's Republic of China
| | - Yue Ding
- Tianjin Key Laboratory of Film Electronic & Communication Devices, School of Integrated Circuit Science and Engineering, Tianjin University of Technology, No. 391 Bin Shui Xi Dao Road, Xi qing District, Tianjin, 300384, People's Republic of China
| | - Meng Wang
- Innetech Electronics CO. Ltd, Building B, No. 4, Tianzhi Industrial Park, No. 12, Hongyuan Road, Xiqing Economic Development Zone, Tianjin, People's Republic of China
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5
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Milano G, Aono M, Boarino L, Celano U, Hasegawa T, Kozicki M, Majumdar S, Menghini M, Miranda E, Ricciardi C, Tappertzhofen S, Terabe K, Valov I. Quantum Conductance in Memristive Devices: Fundamentals, Developments, and Applications. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2201248. [PMID: 35404522 DOI: 10.1002/adma.202201248] [Citation(s) in RCA: 15] [Impact Index Per Article: 7.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/07/2022] [Revised: 03/23/2022] [Indexed: 06/14/2023]
Abstract
Quantum effects in novel functional materials and new device concepts represent a potential breakthrough for the development of new information processing technologies based on quantum phenomena. Among the emerging technologies, memristive elements that exhibit resistive switching, which relies on the electrochemical formation/rupture of conductive nanofilaments, exhibit quantum conductance effects at room temperature. Despite the underlying resistive switching mechanism having been exploited for the realization of next-generation memories and neuromorphic computing architectures, the potentialities of quantum effects in memristive devices are still rather unexplored. Here, a comprehensive review on memristive quantum devices, where quantum conductance effects can be observed by coupling ionics with electronics, is presented. Fundamental electrochemical and physicochemical phenomena underlying device functionalities are introduced, together with fundamentals of electronic ballistic conduction transport in nanofilaments. Quantum conductance effects including quantum mode splitting, stability, and random telegraph noise are analyzed, reporting experimental techniques and challenges of nanoscale metrology for the characterization of memristive phenomena. Finally, potential applications and future perspectives are envisioned, discussing how memristive devices with controllable atomic-sized conductive filaments can represent not only suitable platforms for the investigation of quantum phenomena but also promising building blocks for the realization of integrated quantum systems working in air at room temperature.
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Affiliation(s)
- Gianluca Milano
- Advanced Materials Metrology and Life Sciences Division, INRiM (Istituto Nazionale di Ricerca Metrologica), Strada delle Cacce 91, Torino, 10135, Italy
| | - Masakazu Aono
- International Center for Materials Nanoarchitectonics (WPI-MANA), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki, 305-0044, Japan
| | - Luca Boarino
- Advanced Materials Metrology and Life Sciences Division, INRiM (Istituto Nazionale di Ricerca Metrologica), Strada delle Cacce 91, Torino, 10135, Italy
| | - Umberto Celano
- IMEC, Kapeldreef 75, Heverlee, Leuven, B-3001, Belgium
- Faculty of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, Enschede, NB, 7522, The Netherlands
| | - Tsuyoshi Hasegawa
- Faculty of Science and Engineering, Waseda University, 3-4-1 Okubo, Shinjuku-ku, Tokyo, 169-8555, Japan
| | - Michael Kozicki
- School of Electrical, Computer and Energy Engineering, Arizona State University, Tempe, AZ, 85287, USA
| | - Sayani Majumdar
- VTT Technical Research Centre of Finland Ltd., VTT, P.O. Box 1000, Espoo, FI-02044, Finland
| | | | - Enrique Miranda
- Departament d'Enginyeria Electrònica, Universitat Autònoma de Barcelona (UAB), Barcelona, 08193, Spain
| | - Carlo Ricciardi
- Department of Applied Science and Technology, Politecnico di Torino, C.so Duca degli Abruzzi 24, Torino, 10129, Italy
| | - Stefan Tappertzhofen
- Chair for Micro- and Nanoelectronics, Department of Electrical Engineering and Information Technology, TU Dortmund University, Emil-Figge-Straße 68, D-44227, Dortmund, Germany
| | - Kazuya Terabe
- International Center for Materials Nanoarchitectonics (WPI-MANA), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki, 305-0044, Japan
| | - Ilia Valov
- JARA - Fundamentals for Future Information Technology, 52425, Jülich, Germany
- Peter-Grünberg-Institut (PGI 7), Forschungszentrum Jülich, Wilhelm-Johnen-Straße, 52425, Jülich, Germany
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6
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Mobtakeri S, Habashyani S, Gür E. Highly Responsive Pd-Decorated MoO 3 Nanowall H 2 Gas Sensors Obtained from In-Situ-Controlled Thermal Oxidation of Sputtered MoS 2 Films. ACS APPLIED MATERIALS & INTERFACES 2022; 14:25741-25752. [PMID: 35608898 PMCID: PMC9185678 DOI: 10.1021/acsami.2c04804] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 03/21/2022] [Accepted: 05/09/2022] [Indexed: 06/15/2023]
Abstract
Among transition metal oxides, MoO3 is a promising material due to its layered structure and different oxidation states, making it suitable for different device applications. One of the methods used to grow MoO3 is radio frequency magnetron sputtering (RFMS), which is the most compatible method in industry. However, obtaining nanostructures by RFMS for metal oxides is challenging because of compact morphology film formation. In this study, α-MoO3 with vertical nanowalls is obtained by a two-step process; deposition of magnetron-sputtered MoS2 vertical nanowalls and postoxidation of these structures without changing the morphology. In situ transmittance and electrical measurements are performed to control the oxidation process, which shed light on understanding the oxidation of MoS2 nanowalls. The transition from MoS2 to α-MoO3 is investigated with partially oxidized MoS2/MoO3 samples with different thicknesses. It is also concluded that oxidation starts from nanowalls perpendicular to the substrate and lasts with oxidation of basal planes. Four different thicknesses of α-MoO3 nanowall samples are fabricated for H2 gas sensors. Also, the effect of Pd deposition on the H2-sensing properties of sensors is deeply investigated. An outstanding response of 3.3 × 105 as well as the response and recovery times of 379 and 304 s, respectively, are achieved from the thinnest Pd-loaded sample. Also, the gas-sensing mechanism is explored by gasochromic measurements to investigate the sensor behaviors under the conditions of dry air and N2 gas as the carrier gas.
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Affiliation(s)
- Soheil Mobtakeri
- Department
of Nanoscience and Nanoengineering, Graduate School of Natural and
Applied Science, Atatürk University, Erzurum 25240, Turkey
| | - Saman Habashyani
- Department
of Nanoscience and Nanoengineering, Graduate School of Natural and
Applied Science, Atatürk University, Erzurum 25240, Turkey
| | - Emre Gür
- Department
of Nanoscience and Nanoengineering, Graduate School of Natural and
Applied Science, Atatürk University, Erzurum 25240, Turkey
- Department
of Physics, Faculty of Science, Ataturk
University, Erzurum 25250, Turkey
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7
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Alam MH, Chowdhury S, Roy A, Wu X, Ge R, Rodder MA, Chen J, Lu Y, Stern C, Houben L, Chrostowski R, Burlison SR, Yang SJ, Serna MI, Dodabalapur A, Mangolini F, Naveh D, Lee JC, Banerjee SK, Warner JH, Akinwande D. Wafer-Scalable Single-Layer Amorphous Molybdenum Trioxide. ACS NANO 2022; 16:3756-3767. [PMID: 35188367 DOI: 10.1021/acsnano.1c07705] [Citation(s) in RCA: 6] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
Molybdenum trioxide (MoO3), an important transition metal oxide (TMO), has been extensively investigated over the past few decades due to its potential in existing and emerging technologies, including catalysis, energy and data storage, electrochromic devices, and sensors. Recently, the growing interest in two-dimensional (2D) materials, often rich in interesting properties and functionalities compared to their bulk counterparts, has led to the investigation of 2D MoO3. However, the realization of large-area true 2D (single to few atom layers thick) MoO3 is yet to be achieved. Here, we demonstrate a facile route to obtain wafer-scale monolayer amorphous MoO3 using 2D MoS2 as a starting material, followed by UV-ozone oxidation at a substrate temperature as low as 120 °C. This simple yet effective process yields smooth, continuous, uniform, and stable monolayer oxide with wafer-scale homogeneity, as confirmed by several characterization techniques, including atomic force microscopy, numerous spectroscopy methods, and scanning transmission electron microscopy. Furthermore, using the subnanometer MoO3 as the active layer sandwiched between two metal electrodes, we demonstrate the thinnest oxide-based nonvolatile resistive switching memory with a low voltage operation and a high ON/OFF ratio. These results (potentially extendable to other TMOs) will enable further exploration of subnanometer stoichiometric MoO3, extending the frontiers of ultrathin flexible oxide materials and devices.
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Affiliation(s)
- Md Hasibul Alam
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Sayema Chowdhury
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Anupam Roy
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Xiaohan Wu
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Ruijing Ge
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Michael A Rodder
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Jun Chen
- Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, United Kingdom
| | - Yang Lu
- Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, United Kingdom
| | - Chen Stern
- Faculty of Engineering, Bar-Ilan University, IL 52900, Israel
- Institute for Nanotechnology and Advanced Materials, Bar-Ilan University, IL 5290002, Israel
| | - Lothar Houben
- Chemical Research Support, Weizmann Institute of Science, Rehovot, IL 76100, Israel
| | - Robert Chrostowski
- Texas Material Institute, The University of Texas at Austin, Austin, Texas 78712, United States
- Materials Science and Engineering Program, The University of Texas at Austin, Austin, Texas 78712, United States
| | - Scott R Burlison
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Sung Jin Yang
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Martha I Serna
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Ananth Dodabalapur
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Filippo Mangolini
- Texas Material Institute, The University of Texas at Austin, Austin, Texas 78712, United States
- Walker Department of Mechanical Engineering, The University of Texas at Austin, Austin, Texas 78712, United States
| | - Doron Naveh
- Faculty of Engineering, Bar-Ilan University, IL 52900, Israel
- Institute for Nanotechnology and Advanced Materials, Bar-Ilan University, IL 5290002, Israel
| | - Jack C Lee
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Sanjay K Banerjee
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Jamie H Warner
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
- Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, United Kingdom
- Texas Material Institute, The University of Texas at Austin, Austin, Texas 78712, United States
| | - Deji Akinwande
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
- Texas Material Institute, The University of Texas at Austin, Austin, Texas 78712, United States
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8
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Wang T, Cui Z, Liu Y, Lu D, Wang M, Wan C, Leow WR, Wang C, Pan L, Cao X, Huang Y, Liu Z, Tok AIY, Chen X. Mechanically Durable Memristor Arrays Based on a Discrete Structure Design. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2106212. [PMID: 34738253 DOI: 10.1002/adma.202106212] [Citation(s) in RCA: 11] [Impact Index Per Article: 5.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/09/2021] [Revised: 10/19/2021] [Indexed: 06/13/2023]
Abstract
Memristors constitute a promising functional component for information storage and in-memory computing in flexible and stretchable electronics including wearable devices, prosthetics, and soft robotics. Despite tremendous efforts made to adapt conventional rigid memristors to flexible and stretchable scenarios, stretchable and mechanical-damage-endurable memristors, which are critical for maintaining reliable functions under unexpected mechanical attack, have never been achieved. Here, the development of stretchable memristors with mechanical damage endurance based on a discrete structure design is reported. The memristors possess large stretchability (40%) and excellent deformability (half-fold), and retain stable performances under dynamic stretching and releasing. It is shown that the memristors maintain reliable functions and preserve information after extreme mechanical damage, including puncture (up to 100 times) and serious tearing situations (fully diagonally cut). The structural strategy offers new opportunities for next-generation stretchable memristors with mechanical damage endurance, which is vital to achieve reliable functions for flexible and stretchable electronics even in extreme and highly dynamic environments.
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Affiliation(s)
- Ting Wang
- Innovative Centre for Flexible Devices (iFLEX), Max Planck-NTU Joint Lab for Artificial Senses, School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore, 639798, Singapore
| | - Zequn Cui
- Innovative Centre for Flexible Devices (iFLEX), Max Planck-NTU Joint Lab for Artificial Senses, School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore, 639798, Singapore
| | - Yaqing Liu
- Key Laboratory of Colloid and Interface Chemistry of the Ministry of Education, School of Chemistry and Chemical Engineering, Shandong University, Jinan, Shandong, 250100, China
| | - Dingjie Lu
- Institute of High Performance Computing, Agency for Science Technology and Research, 1 Fusionopolis Way, Singapore, 138632, Singapore
| | - Ming Wang
- Innovative Centre for Flexible Devices (iFLEX), Max Planck-NTU Joint Lab for Artificial Senses, School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore, 639798, Singapore
| | - Changjin Wan
- Innovative Centre for Flexible Devices (iFLEX), Max Planck-NTU Joint Lab for Artificial Senses, School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore, 639798, Singapore
| | - Wan Ru Leow
- Institute of Materials Research and Engineering (IMRE), Agency for Science Technology and Research, 2 Fusionopolis Way, Innovis, #08-03, Singapore, 138634, Singapore
| | - Changxian Wang
- Innovative Centre for Flexible Devices (iFLEX), Max Planck-NTU Joint Lab for Artificial Senses, School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore, 639798, Singapore
| | - Liang Pan
- Innovative Centre for Flexible Devices (iFLEX), Max Planck-NTU Joint Lab for Artificial Senses, School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore, 639798, Singapore
| | - Xun Cao
- School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore, 639798, Singapore
| | - Yizhong Huang
- School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore, 639798, Singapore
| | - Zhuangjian Liu
- Institute of High Performance Computing, Agency for Science Technology and Research, 1 Fusionopolis Way, Singapore, 138632, Singapore
| | - Alfred Iing Yoong Tok
- School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore, 639798, Singapore
| | - Xiaodong Chen
- Innovative Centre for Flexible Devices (iFLEX), Max Planck-NTU Joint Lab for Artificial Senses, School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore, 639798, Singapore
- Institute of Materials Research and Engineering (IMRE), Agency for Science Technology and Research, 2 Fusionopolis Way, Innovis, #08-03, Singapore, 138634, Singapore
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9
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Yang L, Chen W, Huang J, Tang X, Yang R, Zhang H, Tang Z, Gui X. Resistance Switching and Failure Behavior of the MoO x/Mo 2C Heterostructure. ACS APPLIED MATERIALS & INTERFACES 2021; 13:41857-41865. [PMID: 34432418 DOI: 10.1021/acsami.1c06663] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
With the rapid demand for high-performance and power-efficient memristive and synaptic systems, more 2D heterostructures with improved resistance switching (RS) properties are still urgently in need for next-generation devices. Here, we report the RS behaviors of vertical MoOx/Mo2C heterostructures fabricated by controllable thermal oxidation and uncover the failure behavior for the first time. It is found that the MoOx/Mo2C heterostructure exhibits bipolar RS with a low set/reset voltage of +0.5/-0.3 V, an ultralow power consumption of 5 × 10-8 W, and an on/off ratio of 102, which is ascribed to the transport of the internal oxygen ions of MoOx. Furthermore, the failure behavior of RS behaviors of the MoOx/Mo2C heterostructure under a higher work voltage is revealed. It indicates that the amorphization of the pristine crystalline MoOx layer could block the movement of the internal oxygen ions in the vertical direction. The excellent RS performance induced by the synergy of MoOx and Mo2C and the demonstration of the failure behavior enable the potential applications of the 2D heterostructure in related memory devices and biological neural networks.
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Affiliation(s)
- Leilei Yang
- State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-sen University, Guangzhou 510275, China
| | - Wenjun Chen
- School of Electronic and Information Engineering, Foshan University, Foshan 528000, China
| | - Junhua Huang
- State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-sen University, Guangzhou 510275, China
| | - Xin Tang
- State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-sen University, Guangzhou 510275, China
| | - Rongliang Yang
- State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-sen University, Guangzhou 510275, China
| | - Hao Zhang
- Instrumental Analysis and Research Center (IARC), Sun Yat-sen University, Guangzhou 510275, China
| | - Zikang Tang
- Institute of Applied Physics and Materials Engineering, University of Macau, Avenida da Universidade, Taipa, Macau 999078, China
| | - Xuchun Gui
- State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-sen University, Guangzhou 510275, China
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10
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Kondori A, Jiang Z, Esmaeilirad M, Tamadoni Saray M, Kakekhani A, Kucuk K, Navarro Munoz Delgado P, Maghsoudipour S, Hayes J, Johnson CS, Segre CU, Shahbazian-Yassar R, Rappe AM, Asadi M. Kinetically Stable Oxide Overlayers on Mo 3 P Nanoparticles Enabling Lithium-Air Batteries with Low Overpotentials and Long Cycle Life. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2020; 32:e2004028. [PMID: 33169392 DOI: 10.1002/adma.202004028] [Citation(s) in RCA: 10] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/12/2020] [Revised: 10/03/2020] [Indexed: 06/11/2023]
Abstract
The main drawbacks of today's state-of-the-art lithium-air (Li-air) batteries are their low energy efficiency and limited cycle life due to the lack of earth-abundant cathode catalysts that can drive both oxygen reduction and evolution reactions (ORR and OER) at high rates at thermodynamic potentials. Here, inexpensive trimolybdenum phosphide (Mo3 P) nanoparticles with an exceptional activity-ORR and OER current densities of 7.21 and 6.85 mA cm-2 at 2.0 and 4.2 V versus Li/Li+ , respectively-in an oxygen-saturated non-aqueous electrolyte are reported. The Tafel plots indicate remarkably low charge transfer resistance-Tafel slopes of 35 and 38 mV dec-1 for ORR and OER, respectively-resulting in the lowest ORR overpotential of 4.0 mV and OER overpotential of 5.1 mV reported to date. Using this catalyst, a Li-air battery cell with low discharge and charge overpotentials of 80 and 270 mV, respectively, and high energy efficiency of 90.2% in the first cycle is demonstrated. A long cycle life of 1200 is also achieved for this cell. Density functional theory calculations of ORR and OER on Mo3 P (110) reveal that an oxide overlayer formed on the surface gives rise to the observed high ORR and OER electrocatalytic activity and small discharge/charge overpotentials.
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Affiliation(s)
- Alireza Kondori
- Department of Chemical and Biological Engineering, Illinois Institute of Technology, Chicago, IL, 60616, USA
| | - Zhen Jiang
- Department of Chemistry, University of Pennsylvania, Philadelphia, PA, 19104-6323, USA
| | - Mohammadreza Esmaeilirad
- Department of Chemical and Biological Engineering, Illinois Institute of Technology, Chicago, IL, 60616, USA
| | - Mahmoud Tamadoni Saray
- Department of Mechanical and Industrial Engineering, University of Illinois at Chicago, Chicago, IL, 60607, USA
| | - Arvin Kakekhani
- Department of Chemistry, University of Pennsylvania, Philadelphia, PA, 19104-6323, USA
| | - Kamil Kucuk
- Department of Physics and CSRRI, Illinois Institute of Technology, Chicago, IL, 60616, USA
| | - Pablo Navarro Munoz Delgado
- Department of Chemical and Biological Engineering, Illinois Institute of Technology, Chicago, IL, 60616, USA
| | - Sadaf Maghsoudipour
- Department of Chemical and Biological Engineering, Illinois Institute of Technology, Chicago, IL, 60616, USA
| | - John Hayes
- Department of Chemical and Biological Engineering, Illinois Institute of Technology, Chicago, IL, 60616, USA
| | - Christopher S Johnson
- Chemical Sciences and Engineering Division, Argonne National Laboratory, Lemont, IL, 60439, USA
| | - Carlo U Segre
- Department of Physics and CSRRI, Illinois Institute of Technology, Chicago, IL, 60616, USA
| | - Reza Shahbazian-Yassar
- Department of Mechanical and Industrial Engineering, University of Illinois at Chicago, Chicago, IL, 60607, USA
| | - Andrew M Rappe
- Department of Chemistry, University of Pennsylvania, Philadelphia, PA, 19104-6323, USA
| | - Mohammad Asadi
- Department of Chemical and Biological Engineering, Illinois Institute of Technology, Chicago, IL, 60616, USA
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11
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Abstract
In this paper, we investigate the effects of operational conditions on structural, electronic and electrochemical properties on molybdenum suboxides (MoO3-δ) thin films. The films are prepared using pulsed-laser deposition by varying the deposition temperature (Ts), laser fluence (Φ), the partial oxygen pressure (PO2) and annealing temperature (Ta). We find that three classes of samples are obtained with different degrees of stoichiometric deviation without post-treatment: (i) amorphous MoO3-δ (δ < 0.05) (ii) nearly-stoichiometric samples (δ ≈ 0) and (iii) suboxides MoO3-δ (δ > 0.05). The suboxide films 0.05 ≤ δ ≤ 0.25 deposited on Au/Ti/SiO2/flexible-Si substrates with appropriate processing conditions show high electrochemical performance as an anode layer for lithium planar microbatteries. In the realm of simple synthesis, the MoO3-δ film deposited at 450 °C under oxygen pressure of 13 Pa is a mixture of α-MoO3 and Mo8O23 phases (15:85). The electrochemical test of the 0.15MoO3-0.85Mo8O23 film shows a specific capacity of 484 µAh cm−2 µm−1 after 100 cycles of charge-discharge at a constant current of 0.5 A cm−2 in the potential range 3.0-0.05 V.
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12
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Arash A, Tawfik SA, Spencer MJS, Kumar Jain S, Arash S, Mazumder A, Mayes E, Rahman F, Singh M, Bansal V, Sriram S, Walia S, Bhaskaran M, Balendhran S. Electrically Activated UV-A Filters Based on Electrochromic MoO 3-x. ACS APPLIED MATERIALS & INTERFACES 2020; 12:16997-17003. [PMID: 32203662 DOI: 10.1021/acsami.9b20916] [Citation(s) in RCA: 11] [Impact Index Per Article: 2.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/11/2023]
Abstract
Chromism-based optical filters is a niche field of research, due to there being only a handful of electrochromic materials. Typically, electrochromic transition metal oxides such as MoO3 and WO3 are utilized in applications such as smart windows and electrochromic devices (ECD). Herein, we report MoO3-x-based electrically activated ultraviolet (UV) filters. The MoO3-x grown on indium tin oxide (ITO) substrate is mechanically assembled onto an electrically activated proton exchange membrane. Reversible H+ injection/extraction in MoO3-x is employed to switch the optical transmittance, enabling an electrically activated optical filter. The devices exhibit broadband transmission modulation (325-800 nm), with a peak of ∼60% in the UV-A range (350-392 nm). Comparable switching times of 8 s and a coloration efficiency of up to 116 cm2 C-1 are achieved.
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Affiliation(s)
- Aram Arash
- Functional Materials and Microsystems Research Group and the Micro Nano Research Facility, RMIT University, Melbourne, VIC 3001, Australia
| | | | | | - Shubhendra Kumar Jain
- Functional Materials and Microsystems Research Group and the Micro Nano Research Facility, RMIT University, Melbourne, VIC 3001, Australia
| | - Saba Arash
- Department of Physics and Astronomy, University of South Carolina, Columbia, South Carolina 29208, United States of America
| | - Aishani Mazumder
- Functional Materials and Microsystems Research Group and the Micro Nano Research Facility, RMIT University, Melbourne, VIC 3001, Australia
| | - Edwin Mayes
- RMIT Microscopy and Microanalysis Facility, School of Sciences, RMIT University, Melbourne, VIC 3001, Australia
| | - Fahmida Rahman
- Functional Materials and Microsystems Research Group and the Micro Nano Research Facility, RMIT University, Melbourne, VIC 3001, Australia
| | - Mandeep Singh
- Sir Ian Potter NanoBioSensing Facility, NanoBiotechnology Research Laboratory (NBRL), School of Sciences, RMIT University, Melbourne, VIC 3001, Australia
| | - Vipul Bansal
- Sir Ian Potter NanoBioSensing Facility, NanoBiotechnology Research Laboratory (NBRL), School of Sciences, RMIT University, Melbourne, VIC 3001, Australia
| | - Sharath Sriram
- Functional Materials and Microsystems Research Group and the Micro Nano Research Facility, RMIT University, Melbourne, VIC 3001, Australia
| | - Sumeet Walia
- Functional Materials and Microsystems Research Group and the Micro Nano Research Facility, RMIT University, Melbourne, VIC 3001, Australia
| | - Madhu Bhaskaran
- Functional Materials and Microsystems Research Group and the Micro Nano Research Facility, RMIT University, Melbourne, VIC 3001, Australia
| | - Sivacarendran Balendhran
- Functional Materials and Microsystems Research Group and the Micro Nano Research Facility, RMIT University, Melbourne, VIC 3001, Australia
- School of Physics, The University of Melbourne, Parkville, VIC 3010, Australia
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13
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Rodríguez B, Hidalgo P, Piqueras J, Méndez B. Influence of an external electric field on the rapid synthesis of MoO 3 micro- and nanostructures by Joule heating of Mo wires. RSC Adv 2020; 10:11892-11897. [PMID: 35496611 PMCID: PMC9050611 DOI: 10.1039/d0ra01825b] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 02/26/2020] [Accepted: 03/13/2020] [Indexed: 11/21/2022] Open
Abstract
The growth mechanism of layered α-MoO3 nano- and microplates on the surface of Mo wires during Joule heating has been investigated by application of an external electric field to the current carrying wire. The observed rapid growth of the structures, involving enhanced diffusion processes associated to the intense electric current, is further enhanced by the external field leading to a near instantaneous formation of MoO3 plates. Thermally assisted electromigration in the Mo wire with the additional effect of the electric field appears as a very time effective method to grow MoO3 layered low dimensional structures. Other molybdenum oxide nanostructures, such as nanospheres and nanocrystallites with different shapes, have been found to grow by deposition from the Mo wire on the electrodes used to apply the external electric field. The growth on the electrodes takes place by a thermally assisted electric-field-driven process.
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Affiliation(s)
- B Rodríguez
- Department of Materials Physics, Faculty of Physical Sciences, University Complutense of Madrid E-28040 Madrid Spain
| | - P Hidalgo
- Department of Materials Physics, Faculty of Physical Sciences, University Complutense of Madrid E-28040 Madrid Spain
| | - J Piqueras
- Department of Materials Physics, Faculty of Physical Sciences, University Complutense of Madrid E-28040 Madrid Spain
| | - B Méndez
- Department of Materials Physics, Faculty of Physical Sciences, University Complutense of Madrid E-28040 Madrid Spain
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14
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Rahman MA, Tawfik SA, Ahmed T, Spencer MJS, Walia S, Sriram S, Bhaskaran M. Differential Work-Function Enabled Bifunctional Switching in Strontium Titanate Flexible Resistive Memories. ACS APPLIED MATERIALS & INTERFACES 2020; 12:7326-7333. [PMID: 31976656 DOI: 10.1021/acsami.9b20585] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Multifunctional electronic memories capable of demonstrating both analog and digital switching on-demand are extremely attractive for miniaturization of electronics without significant drain on energy consumption. Simultaneously translating functionality onto mechanically conformable platforms will further enhance their suitability. Here, we demonstrate the ability to engineer multifunctionality in strontium titanate (STO)-based resistive random-access memories (ReRAM) on a flexible polyimide platform. By utilizing different bottom electrodes of various work functions while the top electrode is fixed, differential work functions are induced in STO, to induce bipolar or complementary switching behaviors whenever required. This work-function difference-induced bifunctional switching on the flexible platform reveals a streamlined route for achieving flexible artificial neural networks, high density integration, and logic operation using a single ReRAM.
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Affiliation(s)
- Md Ataur Rahman
- Functional Materials and Microsystems Research Group and the Micro Nano Research Facility , RMIT University , Melbourne , Victoria 3001 , Australia
| | | | - Taimur Ahmed
- Functional Materials and Microsystems Research Group and the Micro Nano Research Facility , RMIT University , Melbourne , Victoria 3001 , Australia
| | - Michelle J S Spencer
- School of Science , RMIT University , GPO Box 2476, Melbourne , Victoria 3001 , Australia
| | - Sumeet Walia
- Functional Materials and Microsystems Research Group and the Micro Nano Research Facility , RMIT University , Melbourne , Victoria 3001 , Australia
| | - Sharath Sriram
- Functional Materials and Microsystems Research Group and the Micro Nano Research Facility , RMIT University , Melbourne , Victoria 3001 , Australia
| | - Madhu Bhaskaran
- Functional Materials and Microsystems Research Group and the Micro Nano Research Facility , RMIT University , Melbourne , Victoria 3001 , Australia
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15
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Wang J, Wang F, Yin L, Sendeku MG, Zhang Y, Cheng R, Wang Z, Li N, Huang W, He J. A unipolar nonvolatile resistive switching behavior in a layered transition metal oxide. NANOSCALE 2019; 11:20497-20506. [PMID: 31657429 DOI: 10.1039/c9nr07456b] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Two-dimensional layered materials have been considered as promising candidates for resistive random access memory, one of the most promising next-generation nonvolatile memories. However, due to the types of defects, most of the devices still suffer from poor environmental stability, defects inducing complexity, and uncontrollability. Here, we fabricate memory cells based on synthesized high-quality two-dimensional layered transition-metal oxide (α-MoO3) nanosheets which can be thinned to 8.68 nm (∼6 layers) and find a unipolar nonvolatile resistive switching behavior. Driven by the migration of intrinsic oxygen vacancies, the devices show a large memory window (∼105), good memory voltage stability, long-term endurance (for durations of over 3 days and 50 manual DC switching cycles) and multi-bit memory states. Furthermore, we find the devices with an excellent temperature tolerance of lower SET/RESET voltages and a larger memory window (>104 at 380 K) at higher temperatures, suggesting their potential in practical applications. Finally, all 2D memory devices are demonstrated using graphene/α-MoO3/graphene heterostructures.
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Affiliation(s)
- Junjun Wang
- CAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing 100190, China. and Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Feng Wang
- CAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing 100190, China.
| | - Lei Yin
- CAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing 100190, China. and Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Marshet Getaye Sendeku
- CAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing 100190, China. and Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Yu Zhang
- CAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing 100190, China.
| | - Ruiqing Cheng
- CAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing 100190, China. and Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Zhenxing Wang
- CAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing 100190, China.
| | - Ningning Li
- CAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing 100190, China. and Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China and Sino-Danish Center for Education and Research, Beijing 100190, P. R. China
| | - Wenhao Huang
- CAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing 100190, China. and Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Jun He
- CAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing 100190, China. and Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China and School of Physics and Technology, Wuhan University, Wuhan 430072, P. R. China
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16
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Rahman F, Zavabeti A, Rahman MA, Arash A, Mazumder A, Walia S, Sriram S, Bhaskaran M, Balendhran S. Dual Selective Gas Sensing Characteristics of 2D α-MoO 3-x via a Facile Transfer Process. ACS APPLIED MATERIALS & INTERFACES 2019; 11:40189-40195. [PMID: 31590483 DOI: 10.1021/acsami.9b11311] [Citation(s) in RCA: 17] [Impact Index Per Article: 3.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/13/2023]
Abstract
Metal oxide-based gas sensor technology is promising due to their practical applications in toxic and hazardous gas detection. Orthorhombic α-MoO3 is a planar metal oxide with a unique layered structure, which can be obtained in a two-dimensional (2D) form. In the 2D form, the larger surface area-to-volume ratio of the material facilitates significantly higher interaction with gas molecules while exhibiting exceptional transport properties. The presence of oxygen vacancies results in nonstoichiometric MoO3 (MoO3-x), which further enhances the charge carrier mobility. Here, we study dual gas sensing characteristics and mechanism of 2D α-MoO3-x. Herein, conductometric dual gas sensors based on chemical vapor deposited 2D α-MoO3-x are developed and demonstrated. A facile transfer process is established to integrate the material into any arbitrary substrate. The sensors show high selectivity toward NO2 and H2S gases with response and recovery rates of 295.0 and 276.0 kΩ/s toward NO2 and 28.5 and 48.0 kΩ/s toward H2S, respectively. These gas sensors also show excellent cyclic endurance with a variation in ΔR ∼ 112 ± 1.64 and 19.5 ± 1.13 MΩ for NO2 and H2S, respectively. As such, this work presents the viability of planar 2D α-MoO3-x as a dual selective gas sensor.
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17
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Zhou G, Wu J, Wang L, Sun B, Ren Z, Xu C, Yao Y, Liao L, Wang G, Zheng S, Mazumder P, Duan S, Song Q. Evolution map of the memristor: from pure capacitive state to resistive switching state. NANOSCALE 2019; 11:17222-17229. [PMID: 31531487 DOI: 10.1039/c9nr05550a] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Memristors possess great application prospects in terabit nonvolatile storage devices, memory-in-logic algorithmic chips and bio-inspired artificial neural network systems. However, "what is the origin state of the memristor?" has remained an unanswered question for half a century. While many applications rely on the memristor, its origin state is becoming a fundamental issue. Herein, we reveal a new state, the pure capacitance state (PCS), which occurs before the memristor is triggered, and the origin state of the memristor can be verified in the memory cells through controlling the ambience parameters. Discovery of the PCS, a missing earlier stage of the memristor, completes the whole evolution map of the memristor from the very beginning to the final developed state.
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Affiliation(s)
- Guangdong Zhou
- School of Mathematic and Statistic, School of Materials and Energy, College of Electronic and Information Engineering, School of Artificial Intelligence, Southwest University, Chongqing, 400715, China.
| | - Jinggao Wu
- School of Mathematic and Statistic, School of Materials and Energy, College of Electronic and Information Engineering, School of Artificial Intelligence, Southwest University, Chongqing, 400715, China.
| | - Lidan Wang
- School of Mathematic and Statistic, School of Materials and Energy, College of Electronic and Information Engineering, School of Artificial Intelligence, Southwest University, Chongqing, 400715, China.
| | - Bai Sun
- School of Physical Science and Technology, Southwest Jiaotong University, Chengdu 610031, China
| | - Zhijun Ren
- School of Mathematic and Statistic, School of Materials and Energy, College of Electronic and Information Engineering, School of Artificial Intelligence, Southwest University, Chongqing, 400715, China.
| | - Cunyun Xu
- School of Mathematic and Statistic, School of Materials and Energy, College of Electronic and Information Engineering, School of Artificial Intelligence, Southwest University, Chongqing, 400715, China.
| | - Yanqing Yao
- School of Mathematic and Statistic, School of Materials and Energy, College of Electronic and Information Engineering, School of Artificial Intelligence, Southwest University, Chongqing, 400715, China.
| | - Liping Liao
- School of Mathematic and Statistic, School of Materials and Energy, College of Electronic and Information Engineering, School of Artificial Intelligence, Southwest University, Chongqing, 400715, China.
| | - Gang Wang
- School of Mathematic and Statistic, School of Materials and Energy, College of Electronic and Information Engineering, School of Artificial Intelligence, Southwest University, Chongqing, 400715, China.
| | - Shaohui Zheng
- School of Mathematic and Statistic, School of Materials and Energy, College of Electronic and Information Engineering, School of Artificial Intelligence, Southwest University, Chongqing, 400715, China.
| | - Pinaki Mazumder
- Department of Electrical Engineering and Computer Science, University of Michigan, 48109, USA.
| | - Shukai Duan
- School of Mathematic and Statistic, School of Materials and Energy, College of Electronic and Information Engineering, School of Artificial Intelligence, Southwest University, Chongqing, 400715, China.
| | - Qunliang Song
- School of Mathematic and Statistic, School of Materials and Energy, College of Electronic and Information Engineering, School of Artificial Intelligence, Southwest University, Chongqing, 400715, China.
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