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Bissolo M, Hanke M, Calarco R, Finley JJ, Koblmüller G, Lopes JMJ, Zallo E. Van der Waals Epitaxy of 2D Gallium Telluride on Graphene: Growth Dynamics and Principal Component Analysis. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2025:e2503993. [PMID: 40317916 DOI: 10.1002/smll.202503993] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/30/2025] [Indexed: 05/07/2025]
Abstract
A scalable epitaxy of 2D layered materials and heterostructures constitutes a crucial step in developing novel optoelectronic applications based on high-crystalline quality 2D materials. Here, the formation of continuous, strain-free, high-crystalline quality 2D hexagonal gallium telluride (h-GaTe) directly on epitaxial graphene using molecular beam epitaxy is demonstrated. Morphological and structural characterizations evidence a coherent layer at the heterostructure interface having an in-plane lattice constant of 4.05 ± 0.01 A ̇ $\dot{\textrm {A}}$ . The few-layer thick graphene determines the epitaxial registry of the h-GaTe with grains of sixfold symmetry and a multilayer-type homoepitaxial growth. Deposition temperature- and time-dependent surface topography indicate that the interlayer diffusion of adatoms plays a crucial role in achieving smooth GaTe films. Contrastive principal component analysis allows for screening large in situ diffraction data as a function of growth parameters. In this way, the trajectory of the 2D h-GaTe growth is mapped through phase space. These results are relevant for integrating epitaxial material in the fabrication of high-performance multifunctional devices.
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Affiliation(s)
- Michele Bissolo
- Walter-Schottky-Institut and TUM School of Natural Sciences, Technische Universität München, Am Coulombwall 4, 85748, Garching, Germany
| | - Michael Hanke
- Paul-Drude-Institut für Festkörperelektronik, Leibniz-Institut im Forschungsverbund Berlin e.V., Hausvogteiplatz 5-7, 10117, Berlin, Germany
| | - Raffaella Calarco
- Paul-Drude-Institut für Festkörperelektronik, Leibniz-Institut im Forschungsverbund Berlin e.V., Hausvogteiplatz 5-7, 10117, Berlin, Germany
- Institute for Microelectronics and Microsystems (IMM), Consiglio Nazionale delle Ricerche (CNR), Via del Fosso del Cavaliere 100, Rome, 00133, Italy
| | - Jonathan J Finley
- Walter-Schottky-Institut and TUM School of Natural Sciences, Technische Universität München, Am Coulombwall 4, 85748, Garching, Germany
| | - Gregor Koblmüller
- Walter-Schottky-Institut and TUM School of Natural Sciences, Technische Universität München, Am Coulombwall 4, 85748, Garching, Germany
- Institute of Solid State Physics, Technical University Berlin, Hardenbergstrasse 36, 10623, Berlin, Germany
| | - J Marcelo J Lopes
- Paul-Drude-Institut für Festkörperelektronik, Leibniz-Institut im Forschungsverbund Berlin e.V., Hausvogteiplatz 5-7, 10117, Berlin, Germany
| | - Eugenio Zallo
- Walter-Schottky-Institut and TUM School of Natural Sciences, Technische Universität München, Am Coulombwall 4, 85748, Garching, Germany
- Paul-Drude-Institut für Festkörperelektronik, Leibniz-Institut im Forschungsverbund Berlin e.V., Hausvogteiplatz 5-7, 10117, Berlin, Germany
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2
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Kim SI, Moon JY, Bae S, Xu Z, Meng Y, Park JW, Lee JH, Bae SH. Freestanding Wide-Bandgap Semiconductors Nanomembrane from 2D to 3D Materials and Their Applications. SMALL METHODS 2025; 9:e2401551. [PMID: 39763129 DOI: 10.1002/smtd.202401551] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/21/2024] [Revised: 12/16/2024] [Indexed: 05/26/2025]
Abstract
Wide-bandgap semiconductors (WBGS) with energy bandgaps larger than 3.4 eV for GaN and 3.2 eV for SiC have gained attention for their superior electrical and thermal properties, which enable high-power, high-frequency, and harsh-environment devices beyond the capabilities of conventional semiconductors. Pushing the potential of WBGS boundaries, current research is redefining the field by broadening the material landscape and pioneering sophisticated synthesis techniques tailored for state-of-the-art device architectures. Efforts include the growth of freestanding nanomembranes, the leveraging of unique interfaces such as van der Waals (vdW) heterostructure, and the integration of 2D with 3D materials. This review covers recent advances in the synthesis and applications of freestanding WBGS nanomembranes, from 2D to 3D materials. Growth techniques for WBGS, such as liquid metal and epitaxial methods with vdW interfaces, are discussed, and the role of layer lift-off processes for producing freestanding nanomembranes is investigated. The review further delves into electronic devices, including field-effect transistors and high-electron-mobility transistors, and optoelectronic devices, such as photodetectors and light-emitting diodes, enabled by freestanding WBGS nanomembranes. Finally, this review explores new avenues for research, highlighting emerging opportunities and addressing key challenges that will shape the future of the field.
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Affiliation(s)
- Seung-Il Kim
- Department of Mechanical Engineering and Materials Science and Institute of Materials Science and Engineering Washington University in St. Louis St. Louis, MO, 63130, USA
- Department of Energy Systems Research and Department of Materials Science and Engineering Ajou University, Suwon, 16499, South Korea
| | - Ji-Yun Moon
- Department of Mechanical Engineering and Materials Science and Institute of Materials Science and Engineering Washington University in St. Louis St. Louis, MO, 63130, USA
| | - Sanggeun Bae
- Department of Mechanical Engineering and Materials Science and Institute of Materials Science and Engineering Washington University in St. Louis St. Louis, MO, 63130, USA
| | - Zhihao Xu
- Department of Mechanical Engineering and Materials Science and Institute of Materials Science and Engineering Washington University in St. Louis St. Louis, MO, 63130, USA
| | - Yuan Meng
- Department of Mechanical Engineering and Materials Science and Institute of Materials Science and Engineering Washington University in St. Louis St. Louis, MO, 63130, USA
| | - Ji-Won Park
- R&D Center of JB Lab Corporation, Gwanak‑Gu, Seoul, 08788, Republic of Korea
| | - Jae-Hyun Lee
- Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon, 16419, South Korea
| | - Sang-Hoon Bae
- Department of Mechanical Engineering and Materials Science and Institute of Materials Science and Engineering Washington University in St. Louis St. Louis, MO, 63130, USA
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3
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Hao Y, Li T, Hong X. Interface phenomena and emerging functionalities in ferroelectric oxide based heterostructures. Chem Commun (Camb) 2025; 61:4924-4950. [PMID: 40062386 DOI: 10.1039/d4cc05836d] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 03/26/2025]
Abstract
Capitalizing on the nonvolatile, nanoscale controllable polarization, ferroelectric perovskite oxides can be integrated with various functional materials for designing emergent phenomena enabled by charge, lattice, and polar symmetry mediated interfacial coupling, as well as for constructing novel energy-efficient electronics and nanophotonics with programmable functionalities. When prepared in thin film or membrane forms, the ferroelectric instability of these materials is highly susceptible to the interfacial electrostatic and mechanical boundary conditions, resulting in tunable polarization fields and Curie temperatures and domain formation. This review focuses on two types of ferroelectric oxide-based heterostructures: the epitaxial perovskite oxide heterostructures and the ferroelectric oxides interfaced with two-dimensional van der Waals materials. The topics covered include the basic synthesis methods for ferroelectric oxide thin films, membranes, and heterostructures, characterization of their properties, and various emergent phenomena hosted by the heterostructures, including the polarization-controlled metal-insulator transition and magnetic anisotropy, negative capacitance effect, domain-imposed one-dimensional graphene superlattices, programmable second harmonic generation, and interface-enhanced polar alignment and piezoelectric response, as well as their applications in nonvolatile memory, logic, and reconfigurable optical devices. Possible future research directions are also outlined, encompassing the synthesis via remote epitaxy and oxide moiré engineering, incorporation of binary ferroelectric oxides, realization of topological properties, and functional design of oxygen octahedral rotation.
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Affiliation(s)
- Yifei Hao
- Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE, 68588-0299, USA.
| | - Tianlin Li
- Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE, 68588-0299, USA.
| | - Xia Hong
- Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE, 68588-0299, USA.
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4
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Rong C, Su T, Chu T, Zhu M, Zhang B, Xuan FZ. Tradeoff between Mechanical Strength and Electrical Conductivity of MXene Films by Nacre-Inspired Subtractive Manufacturing. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2025; 21:e2411329. [PMID: 39937436 DOI: 10.1002/smll.202411329] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/26/2024] [Revised: 01/29/2025] [Indexed: 02/13/2025]
Abstract
Traditional strategies, by additive manufacturing, for integrating monolayer Ti3C2Tx nanosheets into macroscopic films with binders can effectively improve their mechanical strength, but the electrical conductivity is often sacrificed. Herein, inspired by the aligned nano-compacted feature of nacre, a flexible subtractive manufacturing strategy is reported to squeeze the interlayer 2D spacings by removing the nanoconfined water and interface terminations, leading to the improvement of mechanical strength and stability of Ti3C2Tx layered films without sacrificing the electrical conductivity. After the vacuum annealing of Ti3C2Tx films at 300 °C (A300), the interlayer 2D spacing decreased ≈0.1 nm with the surface functional groups (═O, ─OH, ─F) and interlayer water molecules greatly removed. The tensile strength (95.59 MPa) and Young's modulus (9.59 GPa) of A300 are ≈3 and ≈2 times improved, respectively. Moreover, the A300 films maintain a metallic electrical conductivity (2276 S cm-1) and show greatly enhanced stability. Compared to the original films, the mechanical strength of the A300 films is enhanced by increasing the interlayer friction and energy dissipation with the decrease of interlayer 2D spacings. This work provides a new way for engineering the self-assembled films with more functions for broad applications.
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Affiliation(s)
- Chao Rong
- Shanghai Key Laboratory of Intelligent Sensing and Detection Technology, East China University of Science and Technology, Shanghai, 200237, P. R. China
- Key Laboratory of Pressure Systems and Safety of Ministry of Education, East China University of Science and Technology, Shanghai, 200237, P. R. China
- School of Mechanical and Power Engineering, East China University of Science and Technology, Shanghai, 200237, P. R. China
| | - Ting Su
- Shanghai Key Laboratory of Intelligent Sensing and Detection Technology, East China University of Science and Technology, Shanghai, 200237, P. R. China
- Key Laboratory of Pressure Systems and Safety of Ministry of Education, East China University of Science and Technology, Shanghai, 200237, P. R. China
- School of Mechanical and Power Engineering, East China University of Science and Technology, Shanghai, 200237, P. R. China
| | - Tianshu Chu
- Shanghai Key Laboratory of Intelligent Sensing and Detection Technology, East China University of Science and Technology, Shanghai, 200237, P. R. China
- Key Laboratory of Pressure Systems and Safety of Ministry of Education, East China University of Science and Technology, Shanghai, 200237, P. R. China
- School of Mechanical and Power Engineering, East China University of Science and Technology, Shanghai, 200237, P. R. China
| | - Mingliang Zhu
- Shanghai Key Laboratory of Intelligent Sensing and Detection Technology, East China University of Science and Technology, Shanghai, 200237, P. R. China
- Key Laboratory of Pressure Systems and Safety of Ministry of Education, East China University of Science and Technology, Shanghai, 200237, P. R. China
- School of Mechanical and Power Engineering, East China University of Science and Technology, Shanghai, 200237, P. R. China
| | - Bowei Zhang
- Shanghai Key Laboratory of Intelligent Sensing and Detection Technology, East China University of Science and Technology, Shanghai, 200237, P. R. China
- Key Laboratory of Pressure Systems and Safety of Ministry of Education, East China University of Science and Technology, Shanghai, 200237, P. R. China
- School of Mechanical and Power Engineering, East China University of Science and Technology, Shanghai, 200237, P. R. China
| | - Fu-Zhen Xuan
- Shanghai Key Laboratory of Intelligent Sensing and Detection Technology, East China University of Science and Technology, Shanghai, 200237, P. R. China
- Key Laboratory of Pressure Systems and Safety of Ministry of Education, East China University of Science and Technology, Shanghai, 200237, P. R. China
- School of Mechanical and Power Engineering, East China University of Science and Technology, Shanghai, 200237, P. R. China
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5
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Liu Z, Ju W, Fang Y, Sun D, Zheng X, Hou J, Dai N, Zhang K, Shan Y, Liu Y. In-Plane Adaptive Heteroepitaxy of 2D Cesium Bismuth Halides with Engineered Bandgaps on c-Sapphire. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2025; 37:e2413852. [PMID: 39629554 DOI: 10.1002/adma.202413852] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/13/2024] [Revised: 11/05/2024] [Indexed: 02/06/2025]
Abstract
The heteroepitaxy of 2D materials with engineered bandgaps are crucial to broaden the spectral response for their integrated optoelectronic devices. However, it is a challenge to achieve the high-oriented epitaxy and integration of multicomponent 2D materials with varying lattice constants on the same substrate due to the limitation of lattice matching. Here, in-plane adaptive heteroepitaxy of a series of high-oriented 2D cesium bismuth halide (Cs3Bi2X9, X = I, Br, Cl) single crystals with varying lattice constants from 8.41 to 7.71 Å is achieved on c-plane sapphire with distinct lattice constant of 4.76 Å at a low temperature of 160 °C in an air ambient, benefiting from tolerable interfacial strain by switching compressive stress to tensile stress during a 30° rotation of crystal orientation. First-principles calculation demonstrates that those are all thermodynamically stable phases, deriving from multiple minima of interfacial energy between single crystals and sapphire substrate. The detectivity of Cs3Bi2I9 photodetector reaches up to 3.7 × 1012 Jones, deriving from high single-crystal quality. This work provides a promising experimental strategy and basic theory to boost the heteroepitaxy and integration of 2D single crystals with varying lattice constants on low-cost dielectric substrate, paving the way for their applications in integrated optoelectronics.
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Affiliation(s)
- Zhenyu Liu
- School of Materials Science and Engineering, Shanghai Institute of Technology, Shanghai, 200235, P. R. China
- Shanghai Engineering Research Center of Photodetection Materials and Devices, Shanghai Institute of Technology, Shanghai, 200235, P. R. China
- School of Microelectronics, MOE Engineering Research Center of Integrated Circuits for Next Generation Communications, Southern University of Science and Technology, Shenzhen, Guangdong, 518000, P. R. China
| | - Wei Ju
- School of Materials Science and Engineering, Shanghai Institute of Technology, Shanghai, 200235, P. R. China
- Shanghai Engineering Research Center of Photodetection Materials and Devices, Shanghai Institute of Technology, Shanghai, 200235, P. R. China
| | - Yongzheng Fang
- School of Materials Science and Engineering, Shanghai Institute of Technology, Shanghai, 200235, P. R. China
- Shanghai Engineering Research Center of Photodetection Materials and Devices, Shanghai Institute of Technology, Shanghai, 200235, P. R. China
| | - Dingyue Sun
- School of Materials Science and Engineering, Shanghai Institute of Technology, Shanghai, 200235, P. R. China
- Shanghai Engineering Research Center of Photodetection Materials and Devices, Shanghai Institute of Technology, Shanghai, 200235, P. R. China
| | - Xiaohong Zheng
- School of Materials Science and Engineering, Shanghai Institute of Technology, Shanghai, 200235, P. R. China
- Shanghai Engineering Research Center of Photodetection Materials and Devices, Shanghai Institute of Technology, Shanghai, 200235, P. R. China
| | - Jingshan Hou
- School of Materials Science and Engineering, Shanghai Institute of Technology, Shanghai, 200235, P. R. China
- Shanghai Engineering Research Center of Photodetection Materials and Devices, Shanghai Institute of Technology, Shanghai, 200235, P. R. China
| | - Ning Dai
- Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, 310024, P. R. China
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, P. R. China
| | - Kenan Zhang
- Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA
| | - Yufeng Shan
- Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, 310024, P. R. China
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, P. R. China
| | - Yufeng Liu
- School of Materials Science and Engineering, Shanghai Institute of Technology, Shanghai, 200235, P. R. China
- Shanghai Engineering Research Center of Photodetection Materials and Devices, Shanghai Institute of Technology, Shanghai, 200235, P. R. China
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6
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Fu JH, Chen DC, Wu YJ, Tung V. Constructing Two-Dimensional, Ordered Networks of Carbon-Carbon Bonds with Precision. PRECISION CHEMISTRY 2025; 3:3-9. [PMID: 39886374 PMCID: PMC11775848 DOI: 10.1021/prechem.4c00070] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 09/04/2024] [Revised: 11/19/2024] [Accepted: 11/20/2024] [Indexed: 02/01/2025]
Abstract
Organic semiconducting nanomembranes (OSNMs), particularly carbon-based ones, are at the forefront of next-generation two-dimensional (2D) semiconductor research. These materials offer remarkable promise due to their diverse chemical properties and unique functionalities, paving the way for innovative applications across advanced semiconductor material sectors. Graphene stands out for its extraordinary mechanical strength, thermal conductivity, and superior charge transport capabilities, inspiring extensive research into other 2D carbon allotropes like graphyne and graphdiyne. With its high electron mobility and tunable bandgap, graphdiyne is particularly attractive for power-efficient electronic devices. However, synthesizing graphdiyne presents significant challenges, primarily due to the difficulty in achieving precise and deterministic control over the coupling of its monomers. This precision is crucial for determining the material's porosity, periodicity, and overall functionality. Innovative approaches have been developed to address these challenges, such as the strategic assembly of molecular building blocks at heterogeneous interfaces. Furthermore, data-driven techniques, such as machine learning and artificial intelligence (AI), are proving invaluable in this field, assisting in screening precursors, optimizing structural configurations, and predicting novel properties of these materials. These advancements are essential for producing durable monolayer sheets that can be integrated into existing electronic components. Despite these advancements, the integration of graphdiyne into semiconductor technology remains complex. Achieving long-range coherence in bonding configurations and enhancing charge transport characteristics are significant hurdles. Continued research into robust and controllable synthesis techniques is essential for unlocking the full potential of graphdiyne and other 2D materials, leading to more efficient, faster, and mechanically robust electronics.
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Affiliation(s)
- Jui-Han Fu
- Department
of Chemical System Engineering, School of Engineering, The University of Tokyo, Tokyo 113-8656, Japan
| | - De-Chian Chen
- Department
of Chemical System Engineering, School of Engineering, The University of Tokyo, Tokyo 113-8656, Japan
| | - Yen-Ju Wu
- Center
for Basic Research on Materials, National
Institute for Materials Science (NIMS), 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
| | - Vincent Tung
- Department
of Chemical System Engineering, School of Engineering, The University of Tokyo, Tokyo 113-8656, Japan
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7
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Liu C, Li X, Wang Y, Zheng Z, Wu B, He W, Dong X, Zhang Z, Chen B, Huang J, An Z, Zheng C, Huang G, Mei Y. Remote epitaxy and exfoliation of vanadium dioxide via sub-nanometer thick amorphous interlayer. Nat Commun 2025; 16:150. [PMID: 39747045 PMCID: PMC11696154 DOI: 10.1038/s41467-024-55402-8] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/22/2024] [Accepted: 12/11/2024] [Indexed: 01/04/2025] Open
Abstract
The recently emerged remote epitaxy technique, utilizing 2D materials (mostly graphene) as interlayers between the epilayer and the substrate, enables the exfoliation of crystalline nanomembranes from the substrate, expanding the range of potential device applications. However, remote epitaxy has been so far applied to a limited range of material systems, owing to the need of stringent growth conditions to avoid graphene damaging, and has therefore remained challenging for the synthesis of oxide nanomembranes. Here, we demonstrate the remote epitaxial growth of an oxide nanomembrane (vanadium dioxide, VO2) with a sub-nanometer thick amorphous interlayer, which can withstand potential sputtering-induced damage and oxidation. By removing the amorphous interlayer, a 4-inch wafer-scale freestanding VO2 nanomembrane can be obtained, exhibiting intact crystalline structure and physical properties. In addition, multi-shaped freestanding infrared bolometers are fabricated based on the epitaxial VO2 nanomembranes, showing high detectivity and low current noise. Our strategy provides a promising way to explore various freestanding heteroepitaxial oxide materials for future large-scale integrated circuits and functional devices.
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Affiliation(s)
- Chang Liu
- Department of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan University, Shanghai, 200438, People's Republic of China
- Yiwu Research Institute of Fudan University, Yiwu, 322000, Zhejiang, People's Republic of China
| | - Xing Li
- Department of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan University, Shanghai, 200438, People's Republic of China
- Yiwu Research Institute of Fudan University, Yiwu, 322000, Zhejiang, People's Republic of China
| | - Yang Wang
- Department of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan University, Shanghai, 200438, People's Republic of China
- Yiwu Research Institute of Fudan University, Yiwu, 322000, Zhejiang, People's Republic of China
| | - Zhi Zheng
- Department of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan University, Shanghai, 200438, People's Republic of China
- Yiwu Research Institute of Fudan University, Yiwu, 322000, Zhejiang, People's Republic of China
| | - Binmin Wu
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, People's Republic of China
| | - Wenhao He
- State Key Laboratory of Surface Physics and Department of Physics, Fudan University, Shanghai, 200433, People's Republic of China
| | - Xiang Dong
- Department of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan University, Shanghai, 200438, People's Republic of China
- Yiwu Research Institute of Fudan University, Yiwu, 322000, Zhejiang, People's Republic of China
| | - Ziyu Zhang
- Department of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan University, Shanghai, 200438, People's Republic of China
- Yiwu Research Institute of Fudan University, Yiwu, 322000, Zhejiang, People's Republic of China
| | - Bingxin Chen
- State Key Laboratory of Surface Physics & Institute for Nanoelectronic Devices and Quantum Computing, Department of Physics, Fudan University, Shanghai, 200438, People's Republic of China
| | - Jiayuan Huang
- Department of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan University, Shanghai, 200438, People's Republic of China
- Yiwu Research Institute of Fudan University, Yiwu, 322000, Zhejiang, People's Republic of China
| | - Zhenghua An
- State Key Laboratory of Surface Physics & Institute for Nanoelectronic Devices and Quantum Computing, Department of Physics, Fudan University, Shanghai, 200438, People's Republic of China
| | - Changlin Zheng
- State Key Laboratory of Surface Physics and Department of Physics, Fudan University, Shanghai, 200433, People's Republic of China
| | - Gaoshan Huang
- Department of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan University, Shanghai, 200438, People's Republic of China
- Yiwu Research Institute of Fudan University, Yiwu, 322000, Zhejiang, People's Republic of China
| | - Yongfeng Mei
- Department of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan University, Shanghai, 200438, People's Republic of China.
- Yiwu Research Institute of Fudan University, Yiwu, 322000, Zhejiang, People's Republic of China.
- Shanghai Frontiers Science Research Base of Intelligent Optoelectronics and Perception, Institute of Optoelectronics, Fudan University, Shanghai, 200438, People's Republic of China.
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8
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Choo S, Varshney S, Liu H, Sharma S, James RD, Jalan B. From oxide epitaxy to freestanding membranes: Opportunities and challenges. SCIENCE ADVANCES 2024; 10:eadq8561. [PMID: 39661695 PMCID: PMC11633760 DOI: 10.1126/sciadv.adq8561] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/03/2024] [Accepted: 11/04/2024] [Indexed: 12/13/2024]
Abstract
Motivated by the growing demand to integrate functional oxides with dissimilar materials, numerous studies have been undertaken to detach a functional oxide film from its original substrate, effectively forming a membrane, which can then be affixed to the desired host material. This review article is centered on the synthesis of functional oxide membranes, encompassing various approaches to their synthesis, exfoliation, and transfer techniques. First, we explore the characteristics of thin-film growth techniques with emphasis on molecular beam epitaxy. We then examine the fundamental principles and pivotal factors underlying three key approaches of creating membranes: (i) chemical lift-off, (ii) the two-dimensional layer-assisted lift-off, and (iii) spalling. We review the methods of exfoliation and transfer for each approach. Last, we provide an outlook into the future of oxide membranes, highlighting their applications and emerging properties.
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Affiliation(s)
- Sooho Choo
- Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455, USA
| | - Shivasheesh Varshney
- Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455, USA
| | - Huan Liu
- Department of Aerospace Engineering and Mechanics, University of Minnesota, Minneapolis, MN 55455, USA
| | - Shivam Sharma
- Department of Aerospace Engineering and Mechanics, University of Minnesota, Minneapolis, MN 55455, USA
| | - Richard D. James
- Department of Aerospace Engineering and Mechanics, University of Minnesota, Minneapolis, MN 55455, USA
| | - Bharat Jalan
- Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455, USA
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9
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Lee S, Zhang X, Abdollahi P, Barone MR, Dong C, Yoo YJ, Song MK, Lee D, Ryu JE, Choi JH, Lee JH, Robinson JA, Schlom DG, Kum HS, Chang CS, Seo A, Kim J. Route to Enhancing Remote Epitaxy of Perovskite Complex Oxide Thin Films. ACS NANO 2024; 18:31225-31233. [PMID: 39471046 DOI: 10.1021/acsnano.4c09445] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/01/2024]
Abstract
Remote epitaxy is taking center stage in creating freestanding complex oxide thin films with high crystallinity that could serve as an ideal building block for stacking artificial heterostructures with distinctive functionalities. However, there exist technical challenges, particularly in the remote epitaxy of perovskite oxides associated with their harsh growth environments, making the graphene interlayer difficult to survive. Transferred graphene, typically used for creating a remote epitaxy template, poses limitations in ensuring the yield of perovskite films, especially when pulsed laser deposition (PLD) growth is carried out, since graphene degradation can be easily observed. Here, we employ spectroscopic ellipsometry to determine the critical factors that damage the integrity of graphene during PLD by tracking the change in optical properties of graphene in situ. To mitigate the issues observed in the PLD process, we propose an alternative growth strategy based on molecular beam epitaxy to produce single-crystalline perovskite membranes.
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Affiliation(s)
- Sangho Lee
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Xinyuan Zhang
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Pooya Abdollahi
- Department of Physics and Astronomy, University of Kentucky, Lexington, Kentucky 40506, United States
| | - Matthew R Barone
- Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14850, United States
| | - Chengye Dong
- Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- 2-Dimensional Crystal Consortium, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - Young Jin Yoo
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Min-Kyu Song
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Doyoon Lee
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Jung-El Ryu
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Jun-Hui Choi
- Department of Energy Systems Research and Department of Materials Science and Engineering, Ajou University, Suwon 16499, Republic of Korea
| | - Jae-Hyun Lee
- Department of Energy Systems Research and Department of Materials Science and Engineering, Ajou University, Suwon 16499, Republic of Korea
| | - Joshua A Robinson
- Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- 2-Dimensional Crystal Consortium, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - Darrell G Schlom
- Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14850, United States
| | - Hyun S Kum
- Department of Electrical and Electronic Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Celesta S Chang
- Department of Physics and Astronomy, Seoul National University, Seoul 08826, Republic of Korea
| | - Ambrose Seo
- Department of Physics and Astronomy, University of Kentucky, Lexington, Kentucky 40506, United States
| | - Jeehwan Kim
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
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10
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Cheng T, Meng Y, Luo M, Xian J, Luo W, Wang W, Yue F, Ho JC, Yu C, Chu J. Advancements and Challenges in the Integration of Indium Arsenide and Van der Waals Heterostructures. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024; 20:e2403129. [PMID: 39030967 PMCID: PMC11600706 DOI: 10.1002/smll.202403129] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/18/2024] [Revised: 06/17/2024] [Indexed: 07/22/2024]
Abstract
The strategic integration of low-dimensional InAs-based materials and emerging van der Waals systems is advancing in various scientific fields, including electronics, optics, and magnetics. With their unique properties, these InAs-based van der Waals materials and devices promise further miniaturization of semiconductor devices in line with Moore's Law. However, progress in this area lags behind other 2D materials like graphene and boron nitride. Challenges include synthesizing pure crystalline phase InAs nanostructures and single-atomic-layer 2D InAs films, both vital for advanced van der Waals heterostructures. Also, diverse surface state effects on InAs-based van der Waals devices complicate their performance evaluation. This review discusses the experimental advances in the van der Waals epitaxy of InAs-based materials and the working principles of InAs-based van der Waals devices. Theoretical achievements in understanding and guiding the design of InAs-based van der Waals systems are highlighted. Focusing on advancing novel selective area growth and remote epitaxy, exploring multi-functional applications, and incorporating deep learning into first-principles calculations are proposed. These initiatives aim to overcome existing bottlenecks and accelerate transformative advancements in integrating InAs and van der Waals heterostructures.
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Affiliation(s)
- Tiantian Cheng
- School of Microelectronics and School of Integrated CircuitsSchool of Information Science and TechnologyNantong UniversityNantong226019P. R. China
| | - Yuxin Meng
- School of Microelectronics and School of Integrated CircuitsSchool of Information Science and TechnologyNantong UniversityNantong226019P. R. China
| | - Man Luo
- School of Microelectronics and School of Integrated CircuitsSchool of Information Science and TechnologyNantong UniversityNantong226019P. R. China
- Department of Materials Science and Engineering and State Key Laboratory of Terahertz and Millimeter WavesCity University of Hong KongHong Kong SAR999077P. R. China
| | - Jiachi Xian
- School of Microelectronics and School of Integrated CircuitsSchool of Information Science and TechnologyNantong UniversityNantong226019P. R. China
| | - Wenjin Luo
- Department of Physics and JILAUniversity of ColoradoBoulderCO80309USA
| | - Weijun Wang
- Department of Materials Science and Engineering and State Key Laboratory of Terahertz and Millimeter WavesCity University of Hong KongHong Kong SAR999077P. R. China
| | - Fangyu Yue
- School of Physics and Electronic ScienceEast China Normal UniversityShanghai200241P. R. China
| | - Johnny C. Ho
- Department of Materials Science and Engineering and State Key Laboratory of Terahertz and Millimeter WavesCity University of Hong KongHong Kong SAR999077P. R. China
| | - Chenhui Yu
- School of Microelectronics and School of Integrated CircuitsSchool of Information Science and TechnologyNantong UniversityNantong226019P. R. China
| | - Junhao Chu
- School of Physics and Electronic ScienceEast China Normal UniversityShanghai200241P. R. China
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11
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Jankauskas Š, Meškinis Š, Žurauskienė N, Guobienė A. Influence of Synthesis Parameters on Structure and Characteristics of the Graphene Grown Using PECVD on Sapphire Substrate. NANOMATERIALS (BASEL, SWITZERLAND) 2024; 14:1635. [PMID: 39452971 PMCID: PMC11509920 DOI: 10.3390/nano14201635] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/10/2024] [Revised: 10/08/2024] [Accepted: 10/10/2024] [Indexed: 10/26/2024]
Abstract
The high surface area and transfer-less growth of graphene on dielectric materials is still a challenge in the production of novel sensing devices. We demonstrate a novel approach to graphene synthesis on a C-plane sapphire substrate, involving the microwave plasma-enhanced chemical vapor deposition (MW-PECVD) technique. The decomposition of methane, which is used as a precursor gas, is achieved without the need for remote plasma. Raman spectroscopy, atomic force microscopy and resistance characteristic measurements were performed to investigate the potential of graphene for use in sensing applications. We show that the thickness and quality of graphene film greatly depend on the CH4/H2 flow ratio, as well as on chamber pressure during the synthesis. By varying these parameters, the intensity ratio of Raman D and G bands of graphene varied between ~1 and ~4, while the 2D to G band intensity ratio was found to be 0.05-0.5. Boundary defects are the most prominent defect type in PECVD graphene, giving it a grainy texture. Despite this, the samples exhibited sheet resistance values as low as 1.87 kΩ/□. This reveals great potential for PECVD methods and could contribute toward efficient and straightforward graphene growth on various substrates.
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Affiliation(s)
- Šarūnas Jankauskas
- Institute of Materials Science, Kaunas University of Technology, K. Baršausko St. 59, LT-51423 Kaunas, Lithuania; (Š.J.); (Š.M.)
| | - Šarūnas Meškinis
- Institute of Materials Science, Kaunas University of Technology, K. Baršausko St. 59, LT-51423 Kaunas, Lithuania; (Š.J.); (Š.M.)
| | - Nerija Žurauskienė
- Department of Functional Materials and Electronics, Center for Physical Sciences and Technology, Saulėtekio av. 3, LT-10257 Vilnius, Lithuania;
| | - Asta Guobienė
- Institute of Materials Science, Kaunas University of Technology, K. Baršausko St. 59, LT-51423 Kaunas, Lithuania; (Š.J.); (Š.M.)
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12
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LaDuca Z, Samanta T, Hagopian N, Jung T, Su K, Genser K, Rabe KM, Voyles PM, Arnold MS, Kawasaki JK. Cold Seeded Epitaxy and Flexomagnetism in GdAuGe Membranes Exfoliated From Graphene/Ge(111). NANO LETTERS 2024; 24:10284-10289. [PMID: 39133900 DOI: 10.1021/acs.nanolett.4c02731] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 08/22/2024]
Abstract
Remote and van der Waals epitaxy are promising approaches for synthesizing single crystalline membranes for flexible electronics and discovery of new properties via extreme strain; however, a fundamental challenge is that most materials do not wet the graphene surface. We develop a cold seed approach for synthesizing smooth intermetallic films on graphene that can be exfoliated to form few nanometer thick single crystalline membranes. Our seeded GdAuGe films have narrow X-ray rocking curve widths of 9-24 arc seconds, which is 2 orders of magnitude lower than their counterparts grown by typical high temperature methods, and have atomically sharp interfaces observed by transmission electron microscopy. Upon exfoliation and rippling, strain gradients in GdAuGe membranes induce an antiferromagnetic to ferri/ferromagnetic transition. Our smooth, ultrathin membranes provide a clean platform for discovering new flexomagnetic effects in quantum materials.
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Affiliation(s)
- Zachary LaDuca
- Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States of America
| | - Tamalika Samanta
- Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States of America
| | - Nicholas Hagopian
- Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States of America
| | - Taehwan Jung
- Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States of America
| | - Katherine Su
- Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States of America
| | - Konrad Genser
- Physics and Astronomy, Rutgers University, New Brunswick, New Jersey 08854, United States of America
| | - Karin M Rabe
- Physics and Astronomy, Rutgers University, New Brunswick, New Jersey 08854, United States of America
| | - Paul M Voyles
- Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States of America
| | - Michael S Arnold
- Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States of America
| | - Jason K Kawasaki
- Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States of America
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13
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Lee S, Song MK, Zhang X, Suh JM, Ryu JE, Kim J. Mixed-Dimensional Integration of 3D-on-2D Heterostructures for Advanced Electronics. NANO LETTERS 2024. [PMID: 39037750 DOI: 10.1021/acs.nanolett.4c02663] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 07/23/2024]
Abstract
Two-dimensional (2D) materials have garnered significant attention due to their exceptional properties requisite for next-generation electronics, including ultrahigh carrier mobility, superior mechanical flexibility, and unusual optical characteristics. Despite their great potential, one of the major technical difficulties toward lab-to-fab transition exists in the seamless integration of 2D materials with classic material systems, typically composed of three-dimensional (3D) materials. Owing to the self-passivated nature of 2D surfaces, it is particularly challenging to achieve well-defined interfaces when forming 3D materials on 2D materials (3D-on-2D) heterostructures. Here, we comprehensively review recent progress in 3D-on-2D incorporation strategies, ranging from direct-growth- to layer-transfer-based approaches and from non-epitaxial to epitaxial integration methods. Their technological advances and obstacles are rigorously discussed to explore optimal, yet viable, integration strategies of 3D-on-2D heterostructures. We conclude with an outlook on mixed-dimensional integration processes, identifying key challenges in state-of-the-art technology and suggesting potential opportunities for future innovation.
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Affiliation(s)
- Sangho Lee
- Department of Mechanical Engineering, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
| | - Min-Kyu Song
- Department of Mechanical Engineering, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
| | - Xinyuan Zhang
- Research Laboratory of Electronics, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
- Department of Materials Science and Engineering, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
| | - Jun Min Suh
- Department of Mechanical Engineering, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
| | - Jung-El Ryu
- Department of Mechanical Engineering, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
| | - Jeehwan Kim
- Department of Mechanical Engineering, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
- Department of Materials Science and Engineering, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
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14
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Lee J, Woo G, Lee G, Jeon J, Lee S, Wang Z, Shin H, Lee GW, Kim YJ, Lee DH, Kim MJ, Kim E, Seok H, Cho J, Kang B, No YS, Jang WJ, Kim T. Ultrastable 3D Heterogeneous Integration via N-Heterocyclic Carbene Self-Assembled Nanolayers. ACS APPLIED MATERIALS & INTERFACES 2024; 16:35505-35515. [PMID: 38935928 DOI: 10.1021/acsami.4c04665] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/29/2024]
Abstract
The commercialization of 3D heterogeneous integration through hybrid bonding has accelerated, and accordingly, Cu-polymer bonding has gained significant attention as a means of overcoming the limitations of conventional Cu-SiO2 hybrid bonding, offering high compatibility with other fabrication processes. Polymers offer robust bonding strength and a low dielectric constant, enabling high-speed signal transmission with high reliability, but suffer from low thermomechanical stability. Thermomechanical stability of polymers was not achieved previously because of thermal degradation and unstable anchoring. To overcome these limitations, wafer-scale Cu-polymer bonding via N-heterocyclic carbene (NHC) nanolayers was presented for 3D heterogeneous integration, affording ultrastable packing density, crystallinity, and thermal properties. NHC nanolayers were deposited on copper electrodes via electrochemical deposition, and wafer-scale 3D heterogeneous integration was achieved by adhesive bonding at 170 °C for 1 min. Ultrastable conductivity and thermomechanical properties were observed by the spatial mapping of conductivity, work function, and force-distance curves. With regard to the characterization of NHC nanolayers, low-temperature bonding, robust corrosion inhibition, enhanced electrical conductivity, back-end-of-line process compatibility, and fabrication process reduction, NHC Cu/polymer bonding provides versatile advances in 3D heterogeneous integration, indicating that NHC Cu/polymer bonding can be utilized as a platform for future 3D vertical chip architectures.
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Affiliation(s)
- Jinhyoung Lee
- School of Mechanical Engineering, Sungkyunkwan University (SKKU), Suwon-si, Gyeonggi-do 16419, Republic of Korea
- Center for Quantum Nanoscience, Institute for Basic Science (IBS), Seoul 03760, Republic of Korea
| | - Gunhoo Woo
- SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon-si, Gyeonggi-do 16419, Republic of Korea
- Department of Nano Science and Technology, Sungkyunkwan University, Suwon-si, Gyeonggi-do 16419, Republic of Korea
| | - Gyuyoung Lee
- School of Mechanical Engineering, Sungkyunkwan University (SKKU), Suwon-si, Gyeonggi-do 16419, Republic of Korea
| | - Jongyeong Jeon
- School of Mechanical Engineering, Sungkyunkwan University (SKKU), Suwon-si, Gyeonggi-do 16419, Republic of Korea
| | - Seunghwan Lee
- School of Mechanical Engineering, Sungkyunkwan University (SKKU), Suwon-si, Gyeonggi-do 16419, Republic of Korea
| | - Ziyang Wang
- School of Mechanical Engineering, Sungkyunkwan University (SKKU), Suwon-si, Gyeonggi-do 16419, Republic of Korea
| | - Hyelim Shin
- Department of Semiconductor Convergence Engineering, Suwon-si, Gyeonggi-do 16419, Republic of Korea
| | - Gil-Woo Lee
- School of Mechanical Engineering, Sungkyunkwan University (SKKU), Suwon-si, Gyeonggi-do 16419, Republic of Korea
- Department of Physics, Konkuk University, Seoul 05029, Republic of Korea
| | - Yeon-Ji Kim
- School of Mechanical Engineering, Sungkyunkwan University (SKKU), Suwon-si, Gyeonggi-do 16419, Republic of Korea
- Department of Physics, Konkuk University, Seoul 05029, Republic of Korea
| | - Do-Hyun Lee
- School of Mechanical Engineering, Sungkyunkwan University (SKKU), Suwon-si, Gyeonggi-do 16419, Republic of Korea
- Department of Physics, Konkuk University, Seoul 05029, Republic of Korea
| | - Min-Jae Kim
- SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon-si, Gyeonggi-do 16419, Republic of Korea
- Department of Nano Science and Technology, Sungkyunkwan University, Suwon-si, Gyeonggi-do 16419, Republic of Korea
| | - Eungchul Kim
- AVP Process Development Team, Samsung Electronics, Chungcheongnam-do, Cheonan-si 31086, South Korea
| | - Hyunho Seok
- SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon-si, Gyeonggi-do 16419, Republic of Korea
- Department of Nano Science and Technology, Sungkyunkwan University, Suwon-si, Gyeonggi-do 16419, Republic of Korea
| | - Jinill Cho
- School of Mechanical Engineering, Sungkyunkwan University (SKKU), Suwon-si, Gyeonggi-do 16419, Republic of Korea
| | - Boseok Kang
- SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon-si, Gyeonggi-do 16419, Republic of Korea
- Department of Nano Science and Technology, Sungkyunkwan University, Suwon-si, Gyeonggi-do 16419, Republic of Korea
- Department of Nano Engineering, Sungkyunkwan University, Suwon-si, Gyeonggi-do 16419, Republic of Korea
| | - You-Shin No
- Department of Physics, Konkuk University, Seoul 05029, Republic of Korea
| | - Won-Jun Jang
- Center for Quantum Nanoscience, Institute for Basic Science (IBS), Seoul 03760, Republic of Korea
- Department of Physics, Ewha Womans University, Seoul 03760, Republic of Korea
| | - Taesung Kim
- School of Mechanical Engineering, Sungkyunkwan University (SKKU), Suwon-si, Gyeonggi-do 16419, Republic of Korea
- SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon-si, Gyeonggi-do 16419, Republic of Korea
- Department of Nano Science and Technology, Sungkyunkwan University, Suwon-si, Gyeonggi-do 16419, Republic of Korea
- Department of Semiconductor Convergence Engineering, Suwon-si, Gyeonggi-do 16419, Republic of Korea
- Department of Nano Engineering, Sungkyunkwan University, Suwon-si, Gyeonggi-do 16419, Republic of Korea
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15
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Wright S, Brea C, Baxter JS, Saini S, Alsaç EP, Yoon SG, Boebinger MG, Hu G, McDowell MT. Epitaxial Metal Electrodeposition Controlled by Graphene Layer Thickness. ACS NANO 2024; 18:13866-13875. [PMID: 38751199 PMCID: PMC11140832 DOI: 10.1021/acsnano.4c02981] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/03/2024] [Revised: 05/02/2024] [Accepted: 05/09/2024] [Indexed: 05/29/2024]
Abstract
Control over material structure and morphology during electrodeposition is necessary for material synthesis and energy applications. One approach to guide crystallite formation is to take advantage of epitaxy on a current collector to facilitate crystallographic control. Single-layer graphene on metal foils can promote "remote epitaxy" during Cu and Zn electrodeposition, resulting in growth of metal that is crystallographically aligned to the substrate beneath graphene. However, the substrate-graphene-deposit interactions that allow for epitaxial electrodeposition are not well understood. Here, we investigate how different graphene layer thicknesses (monolayer, bilayer, trilayer, and graphite) influence the electrodeposition of Zn and Cu. Scanning transmission electron microscopy and electron backscatter diffraction are leveraged to understand metal morphology and structure, demonstrating that remote epitaxy occurs on mono- and bilayer graphene but not trilayer or thicker. Density functional theory (DFT) simulations reveal the spatial electronic interactions through thin graphene that promote remote epitaxy. This work advances our understanding of electrochemical remote epitaxy and provides strategies for improving control over electrodeposition.
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Affiliation(s)
- Salem
C. Wright
- School
of Materials Science and Engineering, Georgia
Institute of Technology, Atlanta, Georgia 30332, United States
| | - Courtney Brea
- Department
of Chemistry and Biochemistry, Queens College
of the City University of New York, New York, New York 11367, United States
| | - Jefferey S. Baxter
- Center
for Nanophase Materials Sciences, Oak Ridge
National Laboratory, Oak Ridge, Tennessee 37830, United States
| | - Sonakshi Saini
- School
of Materials Science and Engineering, Georgia
Institute of Technology, Atlanta, Georgia 30332, United States
| | - Elif Pınar Alsaç
- George
W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States
| | - Sun Geun Yoon
- George
W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States
| | - Matthew G. Boebinger
- Center
for Nanophase Materials Sciences, Oak Ridge
National Laboratory, Oak Ridge, Tennessee 37830, United States
| | - Guoxiang Hu
- School
of Materials Science and Engineering, Georgia
Institute of Technology, Atlanta, Georgia 30332, United States
| | - Matthew T. McDowell
- School
of Materials Science and Engineering, Georgia
Institute of Technology, Atlanta, Georgia 30332, United States
- George
W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States
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16
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Park BI, Kim J, Lu K, Zhang X, Lee S, Suh JM, Kim DH, Kim H, Kim J. Remote Epitaxy: Fundamentals, Challenges, and Opportunities. NANO LETTERS 2024; 24:2939-2952. [PMID: 38477054 DOI: 10.1021/acs.nanolett.3c04465] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 03/14/2024]
Abstract
Advanced heterogeneous integration technologies are pivotal for next-generation electronics. Single-crystalline materials are one of the key building blocks for heterogeneous integration, although it is challenging to produce and integrate these materials. Remote epitaxy is recently introduced as a solution for growing single-crystalline thin films that can be exfoliated from host wafers and then transferred onto foreign platforms. This technology has quickly gained attention, as it can be applied to a wide variety of materials and can realize new functionalities and novel application platforms. Nevertheless, remote epitaxy is a delicate process, and thus, successful execution of remote epitaxy is often challenging. Here, we elucidate the mechanisms of remote epitaxy, summarize recent breakthroughs, and discuss the challenges and solutions in the remote epitaxy of various material systems. We also provide a vision for the future of remote epitaxy for studying fundamental materials science, as well as for functional applications.
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Affiliation(s)
- Bo-In Park
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Jekyung Kim
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Kuangye Lu
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Xinyuan Zhang
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Sangho Lee
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Jun Min Suh
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Dong-Hwan Kim
- School of Chemical Engineering, Sungkyunkwan University (SKKU), Suwon 16419, Republic of Korea
- Biomedical Institute for Convergence at SKKU (BICS), Sungkyunkwan University (SKKU), Suwon 16419, Republic of Korea
| | - Hyunseok Kim
- Department of Electrical and Computer Engineering, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States
- Nick Holonyak, Jr. Micro and Nanotechnology Laboratory, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States
| | - Jeehwan Kim
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
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