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Mei T, Chen F, Huang T, Feng Z, Wan T, Han Z, Li Z, Hu L, Lin CH, Lu Y, Cheng W, Qi DC, Chu D. Ion-Electron Interactions in 2D Nanomaterials-Based Artificial Synapses for Neuromorphic Applications. ACS NANO 2025; 19:17140-17172. [PMID: 40297996 DOI: 10.1021/acsnano.5c02397] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 04/30/2025]
Abstract
With the increasing limitations of conventional computing techniques, particularly the von Neumann bottleneck, the brain's seamless integration of memory and processing through synapses offers a valuable model for technological innovation. Inspired by biological synapse facilitating adaptive, low-power computation by modulating signal transmission via ionic conduction, iontronic synaptic devices have emerged as one of the most promising candidates for neuromorphic computing. Meanwhile, the atomic-scale thickness and tunable electronic properties of van der Waals two-dimensional (2D) materials enable the possibility of designing highly integrated, energy-efficient devices that closely replicate synaptic plasticity. This review comprehensively analyzes advancements in iontronic synaptic devices based on 2D materials, focusing on electron-ion interactions in both iontronic transistors and memristors. The challenges of material stability, scalability, and device integration are evaluated, along with potential solutions and future research directions. By highlighting these developments, this review offers insights into the potential of 2D materials in advancing neuromorphic systems.
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Affiliation(s)
- Tingting Mei
- School of Materials Science and Engineering, University of New South Wales (UNSW), Sydney, NSW 2052, Australia
| | - Fandi Chen
- School of Materials Science and Engineering, University of New South Wales (UNSW), Sydney, NSW 2052, Australia
| | - Tianxu Huang
- School of Materials Science and Engineering, University of New South Wales (UNSW), Sydney, NSW 2052, Australia
| | - Zijian Feng
- School of Materials Science and Engineering, University of New South Wales (UNSW), Sydney, NSW 2052, Australia
| | - Tao Wan
- School of Materials Science and Engineering, University of New South Wales (UNSW), Sydney, NSW 2052, Australia
| | - Zhaojun Han
- School of Mechanical, Medical and Process Engineering, Queensland University of Technology, Brisbane 4000, Australia
| | - Zhi Li
- School of Materials Science and Engineering, University of New South Wales (UNSW), Sydney, NSW 2052, Australia
| | - Long Hu
- School of Materials Science and Engineering, University of New South Wales (UNSW), Sydney, NSW 2052, Australia
| | - Chun-Ho Lin
- School of Materials Science and Engineering, University of New South Wales (UNSW), Sydney, NSW 2052, Australia
| | - Yuerui Lu
- School of Engineering, College of Engineering, Computing and Cybernetics, The Australian National University, Canberra, ACT 0200, Australia
| | - Wenlong Cheng
- School of Biomedical Engineering, University of Sydney, Darlington, NSW 2008, Australia
| | - Dong-Chen Qi
- School of Chemistry and Physics, Queensland University of Technology, Brisbane, QLD 4001, Australia
| | - Dewei Chu
- School of Materials Science and Engineering, University of New South Wales (UNSW), Sydney, NSW 2052, Australia
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2
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Wang F, Zhang L, Deng H, Wee ATS. High-Performance Photoresponse and Nonvolatile Photomemory Effect in a Partially Gated MoS 2/α-In 2Se 3 Heterojunction Photodetector. ACS APPLIED MATERIALS & INTERFACES 2025. [PMID: 40359338 DOI: 10.1021/acsami.5c02897] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/15/2025]
Abstract
2D ferroelectric materials exhibit exceptional properties such as atomically thin layers, strong ferroelectric polarization, high carrier mobility, and suitable band gaps, making them highly promising for electronics, optoelectronics, ferroelectronics, and nonvolatile memory applications. In this study, we present a partially gated MoS2/α-In2Se3 heterojunction photodetector that allows the manipulation of ferroelectric polarization in α-In2Se3 by both gate and drain voltages. The device shows excellent photoresponse performance and a nonvolatile photomemory effect. It achieves a maximum photoresponsivity of ∼698 A/W at 405 nm, ∼1210 A/W at 473 nm, ∼1076 A/W at 515 nm, and ∼1306 A/W at 638 nm. By enhancing the ferroelectric polarization of α-In2Se3, the photoresponsivity, external quantum efficiency, and detectivity are greatly improved. The photomemory effect has an extremely long retention time exceeding 4000 s with an expected information retention rate of over 95% after 10 years. The device performance is a result of the combined effects of vertical-electric-field-controlled ferroelectric polarization, horizontal-electric-field-controlled ferroelectric polarization, and light-induced depolarization. The proposed partially gated MoS2/α-In2Se3 heterostructure provides a new perspective for designing 2D ferroelectric devices with significant potential for optoelectronics and nonvolatile memory applications.
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Affiliation(s)
- Fangjie Wang
- Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117551, Singapore
- College of Electronics and Information Engineering, Sichuan University, Chengdu 610064, China
| | - Lei Zhang
- Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117551, Singapore
| | - Hongshan Deng
- Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117551, Singapore
| | - Andrew T S Wee
- Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117551, Singapore
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3
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Wang B, He X, Luo J, Chen Y, Zhang Z, Wang D, Lan S, Wang P, Han X, Zhao Y, Li Z, Hu H, Xu Y, Luo Z, Hu W, Zhu B, Sun J, Liu Y, Han G, Zhang X, Yu B, Chang K, Xue F. Ultralow-pressure mechanical-motion switching of ferroelectric polarization. SCIENCE ADVANCES 2025; 11:eadr5337. [PMID: 40305611 PMCID: PMC12042875 DOI: 10.1126/sciadv.adr5337] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/07/2024] [Accepted: 03/25/2025] [Indexed: 05/02/2025]
Abstract
Ferroelectric polarization switching, achieved by mechanical forces, enables the storage of stress information in ferroelectrics and holds promise for human interface applications. The prevailing mechanical approach is locally induced flexoelectricity with large strain gradients. However, this approach usually requires huge mechanical forces, which greatly impede device applications. Here, we report an approach of using triboelectric effect to mechanically, reversibly switch ferroelectric polarization across α-In2Se3 ferroelectric memristors. Through contact electrification and electrostatic induction effects, triboelectric units are used to sensitively detect mechanical forces and generate electrical voltage pulses to trigger α-In2Se3 resistance switching. We realize multilevel resistance states under different mechanical forces, by which a neuromorphic stress system is demonstrated. Notably, we achieve the reversal of α-In2Se3 ferroelectric polarization with a record-low mechanical force of ~10 kilopascals and even with tactile touches. Our work provides a fundamental but pragmatic strategy for creating mechanical tactile ferroelectric memory devices.
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Affiliation(s)
- Baoyu Wang
- College of Integrated Circuits, ZJU-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou 311215, China
- Center for Quantum Matter, School of Physics, Zhejiang University, Hangzhou 310027, China
| | - Xin He
- College of Integrated Circuits, ZJU-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou 311215, China
- Center for Quantum Matter, School of Physics, Zhejiang University, Hangzhou 310027, China
| | - Jianjun Luo
- CAS Center for Excellence in Nanoscience, Beijing Key Laboratory of Micro-nano Energy and Sensor, Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 100083, China
| | - Yitong Chen
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou 310024, China
| | - Zhixiang Zhang
- College of Integrated Circuits, ZJU-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou 311215, China
| | - Ding Wang
- College of Integrated Circuits, ZJU-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou 311215, China
| | - Shangui Lan
- College of Integrated Circuits, ZJU-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou 311215, China
- Center for Quantum Matter, School of Physics, Zhejiang University, Hangzhou 310027, China
| | - Peijian Wang
- College of Integrated Circuits, ZJU-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou 311215, China
| | - Xun Han
- College of Integrated Circuits, ZJU-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou 311215, China
| | - Yuda Zhao
- College of Integrated Circuits, ZJU-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou 311215, China
| | - Zheng Li
- College of Integrated Circuits, ZJU-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou 311215, China
| | - Huan Hu
- ZJUI Institute, International Campus, Zhejiang University, Haining 314400, China
| | - Yang Xu
- College of Integrated Circuits, ZJU-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou 311215, China
| | - Zhengdong Luo
- Hangzhou Institute of Technology, Xidian University, Hangzhou 311200, China
- State Key Discipline Laboratory of Wide BandGap Semiconductor Technology, School of Microelectronics, Xidian University, Xi’an 710071, China
| | - Weijin Hu
- Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences (IMR, CAS), Shenyang 110016, China
| | - Bowen Zhu
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou 310024, China
| | - Jian Sun
- School of Physics, Central South University, Changsha 410083, China
| | - Yan Liu
- Hangzhou Institute of Technology, Xidian University, Hangzhou 311200, China
- State Key Discipline Laboratory of Wide BandGap Semiconductor Technology, School of Microelectronics, Xidian University, Xi’an 710071, China
| | - Genquan Han
- Hangzhou Institute of Technology, Xidian University, Hangzhou 311200, China
- State Key Discipline Laboratory of Wide BandGap Semiconductor Technology, School of Microelectronics, Xidian University, Xi’an 710071, China
| | - Xixiang Zhang
- Physical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal 23955-6900, Saudi Arabia
| | - Bin Yu
- College of Integrated Circuits, ZJU-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou 311215, China
| | - Kai Chang
- Center for Quantum Matter, School of Physics, Zhejiang University, Hangzhou 310027, China
| | - Fei Xue
- College of Integrated Circuits, ZJU-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou 311215, China
- Center for Quantum Matter, School of Physics, Zhejiang University, Hangzhou 310027, China
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Cheng J, Ouyang X, Tang X, Qin B, Liu S, Chen H, Song B, Zheng Y. 2D Reconfigurable Memory for Integrated Optical Sensing and Multifunctional Image Processing. ACS APPLIED MATERIALS & INTERFACES 2025; 17:25467-25477. [PMID: 40237180 DOI: 10.1021/acsami.5c01496] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 04/18/2025]
Abstract
Recently, the growing demand for data-centric applications has significantly accelerated progress to overcome the "memory wall" caused by the separation of image sensing, memory, and computing units. However, despite advancements in novel devices driving the development of the in-sensor computing paradigm, achieving seamless integration of optical sensing, storage, and image processing within a single device remains challenging. This study demonstrates an in-sensor computing architecture using a ferroelectric-defined reconfigurable α-In2Se3 phototransistor. The three polarization states of the device exhibit a linear and distinguishable photoresponse, with a maximum photoresponse current difference of 2.17 × 10-6 A and a retention time exceeding 500 s. The nonvolatile weight and synaptic properties are programmed by external electrical stimulation, enabling 112 distinct conductance states with a nonlinearity of 0.12. Additionally, the device supports efficient optical writing, electrical erasing, optoelectronic logic, and decoding via combined optoelectronic control. In-sensor computation for image edge detection is simulated by embedding a nonvolatile Prewitt convolution kernel into a 3 × 3 device array. The integrated structure and array design highlight the strong potential of 2D ferroelectric semiconductors for in-sensor computing, providing a promising platform for next-generation multifunctional artificial vision systems.
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Affiliation(s)
- Jie Cheng
- The State Key Laboratory of Precision Manufacturing for Extreme Service Performance, College of Mechanical and Electrical Engineering, Central South University, Changsha 410073, China
| | - Xinyu Ouyang
- The State Key Laboratory of Precision Manufacturing for Extreme Service Performance, College of Mechanical and Electrical Engineering, Central South University, Changsha 410073, China
| | - Xin Tang
- The State Key Laboratory of Precision Manufacturing for Extreme Service Performance, College of Mechanical and Electrical Engineering, Central South University, Changsha 410073, China
| | - Bingdong Qin
- The State Key Laboratory of Precision Manufacturing for Extreme Service Performance, College of Mechanical and Electrical Engineering, Central South University, Changsha 410073, China
| | - Shu Liu
- The State Key Laboratory of Precision Manufacturing for Extreme Service Performance, College of Mechanical and Electrical Engineering, Central South University, Changsha 410073, China
| | - Hu Chen
- College of Electronic Science and Technology, National University of Defense Technology, Changsha 410073, China
| | - Bing Song
- College of Electronic Science and Technology, National University of Defense Technology, Changsha 410073, China
| | - Yu Zheng
- The State Key Laboratory of Precision Manufacturing for Extreme Service Performance, College of Mechanical and Electrical Engineering, Central South University, Changsha 410073, China
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5
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Wen Z, Chen J, Zhang Q, Wang G, Wang X, Yang F, Liu Q, Luo X, Liu F. 2D Van Der Waals Ferroelectric Materials and Devices for Neuromorphic Computing. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2025:e2412761. [PMID: 40123312 DOI: 10.1002/smll.202412761] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/29/2024] [Revised: 02/10/2025] [Indexed: 03/25/2025]
Abstract
2D van der Waals (vdW) ferroelectric materials are emerging as transformative components in modern electronics and neuromorphic computing. The atomic-scale thickness, coupled with robust ferroelectric properties and seamless integration into vdW engineering, offers unprecedented opportunities for the development of high-performance and low-power devices. Notably, 2D ferroelectric devices excel in enabling multistate storage and neuromorphic functionalities in emulating synapses or retinas, positioning them as prime candidates for next-generation in-sensor-and-memory units. Despite ongoing challenges such as scalability, material stability, and uniformity, rapid interdisciplinary advancements and advancing nanofabrication processes are driving the field forward. This review delves into the fundamental principles of 2D ferroelectricity, highlights typical materials, and examines key device structures along with their applications in non-von Neumann architecture development and neuromorphic computing. By providing an in-depth overview, this work underscores the potential of 2D ferroelectric materials to revolutionize the future of electronics.
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Affiliation(s)
- Zhixing Wen
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 611731, China
- Yangtze Delta Region Institute (Huzhou), University of Electronic Science and Technology of China, Huzhou, 313001, China
| | - Jiangang Chen
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Qirui Zhang
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Ge Wang
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Xuemei Wang
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Fan Yang
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Qing Liu
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Xiao Luo
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Fucai Liu
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 611731, China
- State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, 611731, China
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6
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Zhang J, Wang L, Lü J, Wang Z, Wu H, Zhu G, Wang N, Xue F, Zeng X, Zhu L, Hu Y, Deng X, Guan C, Yang C, Lin Z, Wang P, Zhou B, Lü J, Zhu W, Zhang X, Huang Y, Huang W, Peng Y, Duan X. Interlayer reconstruction phase transition in van der Waals materials. NATURE MATERIALS 2025; 24:369-376. [PMID: 39856414 DOI: 10.1038/s41563-024-02082-w] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/21/2024] [Accepted: 11/13/2024] [Indexed: 01/27/2025]
Abstract
Van der Waals materials display rich structural polymorphs with distinct physical properties. An atomistic understanding of the phase-transition dynamics, propagation pathway and associated evolution of physical properties is essential for capturing their potential in practical technologies. However, direct visualization of the rapid phase-transition process is fundamentally challenging due to the inherent trade-offs among atomic resolution, field of view and imaging frame rate. Here we exploit a controllable current-driven phase transition and utilize in situ scanning transmission electron microscopy to visualize dynamic atomic rearrangements during the 2H-α to 2H-β transition in layered In2Se3. We identify a unique intralayer-splitting (unzipping) and interlayer-reconstruction (zipping) pathway, driven by an energy-cascading mechanism through which bond formation across the van der Waals gap facilitates bond cleavage in the covalent layers. We also observe current-direction-dependent asymmetric phase-transition propagation and attribute it to a temperature profile induced by the Peltier effect at the heterophase interface. These findings provide insights that are essential for designing tailored structural phase transitions in advanced technologies.
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Affiliation(s)
- Junwei Zhang
- School of Materials and Energy, or Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou, China
| | - Laiyuan Wang
- Department of Chemistry and Biochemistry, University of California, Los Angeles, Los Angeles, CA, USA.
| | - Jingtao Lü
- School of Physics and Wuhan National High Magnetic Field Center, Huazhong University of Science and Technology, Wuhan, China
| | - Zhe Wang
- Department of Physics, University of Science and Technology of China, Hefei, China
| | - Huan Wu
- School of Engineering and Applied Science, University of California, Los Angeles, Los Angeles, CA, USA
| | - Guilin Zhu
- School of Physics and Wuhan National High Magnetic Field Center, Huazhong University of Science and Technology, Wuhan, China
| | - Nan Wang
- School of Materials and Energy, or Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou, China
| | - Fei Xue
- Physical Science and Engineering (PSE) Division, King Abdullah University of Science and Technology (KAUST), Thuwal, Saudi Arabia
| | - Xue Zeng
- School of Mathematics and Physics, Lanzhou Jiaotong University, Lanzhou, China
| | - Liu Zhu
- School of Materials and Energy, or Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou, China
| | - Yang Hu
- School of Materials and Energy, or Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou, China
| | - Xia Deng
- School of Materials and Energy, or Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou, China
| | - Chaoshuai Guan
- School of Materials and Energy, or Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou, China
| | - Chen Yang
- Department of Physics, Peking University, Beijing, China
| | - Zhaoyang Lin
- Department of Chemistry and Biochemistry, University of California, Los Angeles, Los Angeles, CA, USA
| | - Peiqi Wang
- Department of Chemistry and Biochemistry, University of California, Los Angeles, Los Angeles, CA, USA
| | - Boxuan Zhou
- Department of Materials Science and Engineering, University of California, Los Angeles, Los Angeles, CA, USA
| | - Jing Lü
- Department of Physics, Peking University, Beijing, China
| | - Wenguang Zhu
- Department of Physics, University of Science and Technology of China, Hefei, China
| | - Xixiang Zhang
- Physical Science and Engineering (PSE) Division, King Abdullah University of Science and Technology (KAUST), Thuwal, Saudi Arabia
| | - Yu Huang
- Department of Materials Science and Engineering, University of California, Los Angeles, Los Angeles, CA, USA
| | - Wei Huang
- School of Flexible Electronics and State Key Laboratory of Optoelectronic Materials and Technologies, Sun Yat-sen University, Shenzhen, China
| | - Yong Peng
- School of Materials and Energy, or Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou, China.
| | - Xiangfeng Duan
- Department of Chemistry and Biochemistry, University of California, Los Angeles, Los Angeles, CA, USA.
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7
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Zhao C, Gao Z, Hong Z, Guo H, Cheng Z, Li Y, Shang L, Zhu L, Zhang J, Hu Z. Ferroelectric and Optoelectronic Coupling Effects in Layered Ferroelectric Semiconductor-Based FETs for Visual Simulation. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2025; 12:e2413808. [PMID: 39840540 PMCID: PMC11923961 DOI: 10.1002/advs.202413808] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/28/2024] [Revised: 12/25/2024] [Indexed: 01/23/2025]
Abstract
Controlling polarization states of ferroelectrics can enrich optoelectronic properties and functions, offering a new avenue for designing advanced electronic and optoelectronic devices. Here, ferroelectric semiconductor-based field-effect transistors (FeSFETs) are fabricated, where the channel is a ferroelectric semiconductor (e.g., α-In2Se3). Multiple conductance states are achieved in α-In2Se3-based FeSFETs by controlling the ferroelectric polarization. The on/off current ratio (Ion/Ioff) is ≈105 with a dark current of ≈10-11 A by applying a single positive gate voltage pulse. Moreover, the device shows excellent endurance and retention performance. In a further step, the carrier transports and corresponding physics mechanism in various polarization states are studied by using Kelvin probe force microscopy (KPFM) and optoelectronic measurements. Finally, the α-In2Se3-based FETs can be trained. It can recognize handwritten digit images from MNIST dataset with a successful recognition accuracy of ≈95.5%. This work provides a new design idea and theoretical support for advanced optoelectronic devices in the field of in-memory sensing and computing.
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Affiliation(s)
- Can Zhao
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai, 200241, China
| | - Zhaotan Gao
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai, 200241, China
| | - Zian Hong
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai, 200241, China
| | - Hongzhi Guo
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai, 200241, China
| | - Zhili Cheng
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai, 200241, China
| | - Yawei Li
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai, 200241, China
| | - Liyan Shang
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai, 200241, China
| | - Liangqing Zhu
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai, 200241, China
| | - Jinzhong Zhang
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai, 200241, China
| | - Zhigao Hu
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai, 200241, China
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8
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Zheng T, Xie X, Shi Q, Wu J, Yu C. Self-Powered Artificial Neuron Devices: Towards the All-In-One Perception and Computation System. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2025; 37:e2416897. [PMID: 39967364 DOI: 10.1002/adma.202416897] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/03/2024] [Revised: 02/07/2025] [Indexed: 02/20/2025]
Abstract
The increasing demand for energy supply in sensing units and the computational efficiency of computation units has prompted researchers to explore novel, integrated technology that offers high efficiency and low energy consumption. Self-powered sensing technology enables environmental perception without external energy sources, while neuromorphic computation provides energy-efficient and high-performance computing capabilities. The integration of self-powered sensing technology and neuromorphic computation presents a promising solution for an all-in-one system. This review examines recent developments and advancements in self-powered artificial neuron devices based on triboelectric, piezoelectric, and photoelectric effects, focusing on their structures, mechanisms, and functions. Furthermore, it compares the electrical characteristics of various types of self-powered artificial neuron devices and discusses effective methods for enhancing their performance. Additionally, this review provides a comprehensive summary of self-powered perception systems, encompassing tactile, visual, and auditory perception systems. Moreover, it elucidates recently integrated systems that combine perception, computing, and actuation units into all-in-one configurations, aspiring to realize closed-loop control. The seamless integration of self-powered sensing and neuromorphic computation holds significant potential for shaping a more intelligent future for humanity.
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Affiliation(s)
- Tong Zheng
- College of Electrical Science and Engineering, Southeast university, Nanjing, 210000, China
| | - Xinkai Xie
- College of Electrical Science and Engineering, Southeast university, Nanjing, 210000, China
| | - Qiongfeng Shi
- College of Electrical Science and Engineering, Southeast university, Nanjing, 210000, China
| | - Jun Wu
- College of Electrical Science and Engineering, Southeast university, Nanjing, 210000, China
| | - Cunjiang Yu
- Department of Electrical and Computer Engineering, Department of Mechanical Science and Engineering, Department of Materials Science and Engineering, Department of Bioengineering, Beckman Institute for Advanced Science and Technology, Materials Research Laboratory, University of Illinois, Urbana-Champaign, Urbana, IL, 61801, USA
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9
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Ma Y, Chen M, Aguirre F, Yan Y, Pazos S, Liu C, Wang H, Yang T, Wang B, Gong C, Liu K, Liu JZ, Lanza M, Xue F, Zhang X. Van der Waals Engineering of One-Transistor-One-Ferroelectric-Memristor Architecture for an Energy-Efficient Neuromorphic Array. NANO LETTERS 2025; 25:2528-2537. [PMID: 39898965 PMCID: PMC11827105 DOI: 10.1021/acs.nanolett.4c06118] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/03/2024] [Revised: 01/21/2025] [Accepted: 01/24/2025] [Indexed: 02/04/2025]
Abstract
Two-dimensional-material-based memristor arrays hold promise for data-centric applications such as artificial intelligence and big data. However, accessing individual memristor cells and effectively controlling sneak current paths remain challenging. Here, we propose a van der Waals engineering approach to create one-transistor-one-memristor (1T1M) cells by assembling the emerging two-dimensional ferroelectric CuCrP2S6 with MoS2 and h-BN. The memory cell exhibits high resistance tunability (106), low sneak current (120 fA), and low static power (12 fW). A neuromorphic array with greatly reduced crosstalk is experimentally demonstrated. The nonvolatile resistance switching is driven by electric-field-induced ferroelectric polarization reversal. This van der Waals engineering approach offers a universal solution for creating compact and energy-efficient 2D in-memory computation systems for next-generation artificial neural networks.
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Affiliation(s)
- Yinchang Ma
- Physical
Science and Engineering Division, King Abdullah
University of Science and Technology, Thuwal 23955-6900, Saudi Arabia
| | - Maolin Chen
- Physical
Science and Engineering Division, King Abdullah
University of Science and Technology, Thuwal 23955-6900, Saudi Arabia
| | - Fernando Aguirre
- Intrinsic
Semiconductor Technologies, Ltd., Buckinghamshire HP18 9SU, United Kingdom
| | - Yuan Yan
- Department
of Mechanical Engineering, The University
of Melbourne, Parkville, VIC 3010, Australia
| | - Sebastian Pazos
- Physical
Science and Engineering Division, King Abdullah
University of Science and Technology, Thuwal 23955-6900, Saudi Arabia
| | - Chen Liu
- Physical
Science and Engineering Division, King Abdullah
University of Science and Technology, Thuwal 23955-6900, Saudi Arabia
| | - Heng Wang
- Electrical
and Computer Engineering, King Abdullah
University of Science and Technology, Thuwal 23955-6900, Saudi Arabia
| | - Tao Yang
- Physical
Science and Engineering Division, King Abdullah
University of Science and Technology, Thuwal 23955-6900, Saudi Arabia
| | - Baoyu Wang
- ZJU-Hangzhou
Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou 311215, China
| | - Cheng Gong
- Department
of Electrical and Computer Engineering and Quantum Technology Center, University of Maryland, College Park, Maryland 20742, United States
| | - Kai Liu
- Physics
Department, Georgetown University, Washington, D.C. 20057, United States
| | - Jefferson Zhe Liu
- Department
of Mechanical Engineering, The University
of Melbourne, Parkville, VIC 3010, Australia
| | - Mario Lanza
- Department
of Materials Science and Engineering, National
University of Singapore, Singapore 117575, Singapore
- Singapore
Institute for Functional Intelligent Materials, National University of Singapore, Singapore 117544, Singapore
| | - Fei Xue
- Center
for
Quantum Matter, School of Physics, Zhejiang
University, Hangzhou 311215, China
- ZJU-Hangzhou
Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou 311215, China
| | - Xixiang Zhang
- Physical
Science and Engineering Division, King Abdullah
University of Science and Technology, Thuwal 23955-6900, Saudi Arabia
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10
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Zhang Z, Xia J, Li J, Li X, Tian L, Cao J, Li Y, Meng X. Robust Ferroelectricity in Nonstoichiometric 2D AgCr 1-xS 2 via Chemical Vapor Deposition. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2025; 21:e2409004. [PMID: 39676387 DOI: 10.1002/smll.202409004] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/01/2024] [Revised: 12/05/2024] [Indexed: 12/17/2024]
Abstract
Ferroelectricity in two-dimensional (2D) materials at room temperature has attracted significant interest due to their substantial potential for applications in non-volatile memory, nanoelectronics, and optoelectronics. The intrinsic tendency of 2D materials toward nonstoichiometry results in atomic configurations that differ from those of their stoichiometric counterparts, thereby giving rise to potential ferroelectric polarization properties. However, reports on the emergence of room temperature ferroelectric effects in nonstoichiometric 2D materials remain limited. This study reports the observation of room temperature ferroelectricity in nonstoichiometric AgCr1-xS2 ternary 2D transition metal dichalcogenides synthesized via chemical vapor deposition. The noncentrosymmetric crystal structure and switchable ferroelectric polarization are confirmed through second harmonic generation (SHG) and piezoresponse force microscopy (PFM) measurements. It is determined that the primary cause of ferroelectric polarization is the interlayer movement of ordered asymmetric Ag atoms under the influence of numerous chromium (Cr) vacancies along with interlayer atom displacement. Furthermore, two types of electrical devices based on in-plane (IP) and out-of-plane (OOP) polarization are demonstrated. This work offers a new perspective for fabricating ternary ultrathin 2D transition metal dichalcogenides ferroelectric materials and presents a potential pathway for creating exceptional multifunctional materials.
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Affiliation(s)
- Zhongshi Zhang
- Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, 100190, China
- School of Future Technology, University of Chinese Academy of Science, Beijing, 10049, China
| | - Jing Xia
- Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, 100190, China
| | - Jing Li
- Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, 100190, China
| | - Xuanze Li
- Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, 100190, China
| | - Lifeng Tian
- Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, 100190, China
| | - Jianyu Cao
- Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, 100190, China
- School of Future Technology, University of Chinese Academy of Science, Beijing, 10049, China
| | - Yuye Li
- Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, 100190, China
| | - Xiangmin Meng
- Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, 100190, China
- School of Future Technology, University of Chinese Academy of Science, Beijing, 10049, China
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11
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Zhao X, Wang Z, Deng X, Li H, Wang N, Zeng X, Zhang P, Yao Y, Peng R, Jiang S, Xie S, Si M, Zhang J, Peng Y. Direct Observation of Dipole Interlocking Effect Occurrence in Two-Dimensional Ferroelectricity. NANO LETTERS 2025; 25:1567-1574. [PMID: 39819011 DOI: 10.1021/acs.nanolett.4c05644] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 01/19/2025]
Abstract
The electric dipole in materials is closely associated with their electronic transport, optical properties, and mechanical behavior. Here, we have employed the differential phase contrast (DPC) technique of the scanning transmission electron microscopy technique (STEM) to directly analyze the local electric dipole at the sub-Angstrom scale. By utilizing DPC-STEM technology, we successfully visualized the ferroelectric polarization of van der Waals material 3R α-In2Se3 and directly confirmed the dipole interlocking effect (DIE) between in-plane (IP) and out-of-plane (OOP) polarizations. Through density functional theory (DFT) calculations and structural analysis, we discovered that this DIE is caused by the central asymmetry of the middle Se atoms of each monolayer and that the reversal of polarization is accompanied by the emergence of an intermediate phase, β-In2Se3. Leveraging the DIE, we developed a multidirectional ferroelectric memristor that can effectively modulate the IP polarization by applying an OOP pulse voltage.
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Affiliation(s)
- Xinrui Zhao
- School of Materials and Energy or Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
| | - Zhe Wang
- School of Space Science and Technology, Shandong University, Weihai 264209, People's Republic of China
| | - Xia Deng
- School of Materials and Energy or Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
| | - Hongli Li
- State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China
| | - Nan Wang
- School of Materials and Energy or Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
| | - Xue Zeng
- School of Materials Science and Engineering, Lanzhou Jiaotong University, Lanzhou, Gansu 730070, China
| | - Peng Zhang
- School of Space Science and Technology, Shandong University, Weihai 264209, People's Republic of China
| | - Yang Yao
- School of Materials and Energy or Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
| | - Rong Peng
- School of Materials and Energy or Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
| | - Shuo Jiang
- School of Materials and Energy or Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
| | - Shibiao Xie
- School of Materials and Energy or Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
| | - Mingsu Si
- School of Materials and Energy or Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
| | - Junwei Zhang
- School of Materials and Energy or Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
| | - Yong Peng
- School of Materials and Energy or Electron Microscopy Centre of Lanzhou University, Lanzhou University, Lanzhou 730000, P. R. China
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12
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Hadke S, Kang MA, Sangwan VK, Hersam MC. Two-Dimensional Materials for Brain-Inspired Computing Hardware. Chem Rev 2025; 125:835-932. [PMID: 39745782 DOI: 10.1021/acs.chemrev.4c00631] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/23/2025]
Abstract
Recent breakthroughs in brain-inspired computing promise to address a wide range of problems from security to healthcare. However, the current strategy of implementing artificial intelligence algorithms using conventional silicon hardware is leading to unsustainable energy consumption. Neuromorphic hardware based on electronic devices mimicking biological systems is emerging as a low-energy alternative, although further progress requires materials that can mimic biological function while maintaining scalability and speed. As a result of their diverse unique properties, atomically thin two-dimensional (2D) materials are promising building blocks for next-generation electronics including nonvolatile memory, in-memory and neuromorphic computing, and flexible edge-computing systems. Furthermore, 2D materials achieve biorealistic synaptic and neuronal responses that extend beyond conventional logic and memory systems. Here, we provide a comprehensive review of the growth, fabrication, and integration of 2D materials and van der Waals heterojunctions for neuromorphic electronic and optoelectronic devices, circuits, and systems. For each case, the relationship between physical properties and device responses is emphasized followed by a critical comparison of technologies for different applications. We conclude with a forward-looking perspective on the key remaining challenges and opportunities for neuromorphic applications that leverage the fundamental properties of 2D materials and heterojunctions.
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Affiliation(s)
- Shreyash Hadke
- Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States
| | - Min-A Kang
- Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States
| | - Vinod K Sangwan
- Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States
| | - Mark C Hersam
- Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States
- Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States
- Department of Electrical Engineering and Computer Science, Northwestern University, Evanston, Illinois 60208, United States
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13
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Jiang S, Wang Y, Zheng G. Two-Dimensional Ferroelectric Materials: From Prediction to Applications. NANOMATERIALS (BASEL, SWITZERLAND) 2025; 15:109. [PMID: 39852724 PMCID: PMC11767678 DOI: 10.3390/nano15020109] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/19/2024] [Revised: 01/07/2025] [Accepted: 01/11/2025] [Indexed: 01/26/2025]
Abstract
Ferroelectric materials hold immense potential for diverse applications in sensors, actuators, memory storage, and microelectronics. The discovery of two-dimensional (2D) ferroelectrics, particularly ultrathin compounds with stable crystal structure and room-temperature ferroelectricity, has led to significant advancements in the field. However, challenges such as depolarization effects, low Curie temperature, and high energy barriers for polarization reversal remain in the development of 2D ferroelectrics with high performance. In this review, recent progress in the discovery and design of 2D ferroelectric materials is discussed, focusing on their properties, underlying mechanisms, and applications. Based on the work discussed in this review, we look ahead to theoretical prediction for 2D ferroelectric materials and their potential applications, such as the application in nonlinear optics. The progress in theoretical and experimental research could lead to the discovery and design of next-generation nanoelectronic and optoelectronic devices, facilitating the applications of 2D ferroelectric materials in emerging advanced technologies.
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Affiliation(s)
- Shujuan Jiang
- Collaborative Innovation Center of Steel Technology, University of Science and Technology Beijing, Beijing 100083, China;
- Department of Mechanical Engineering, Hong Kong Polytechnic University, Hong Kong 999077, China
| | - Yongwei Wang
- Collaborative Innovation Center of Steel Technology, University of Science and Technology Beijing, Beijing 100083, China;
| | - Guangping Zheng
- Department of Mechanical Engineering, Hong Kong Polytechnic University, Hong Kong 999077, China
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14
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Roux S, Fraunié J, Watanabe K, Taniguchi T, Lassagne B, Robert C. Optical Detection of Sliding Ferroelectric Switching in hBN with a WSe 2 Monolayer. NANO LETTERS 2025; 25:321-326. [PMID: 39686753 DOI: 10.1021/acs.nanolett.4c05062] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/18/2024]
Abstract
When two BN layers are stacked in parallel in an AB or BA arrangement, a spontaneous out-of-plane electric polarization arises due to charge transfer in the out-of-plane B-N bonds. The ferroelectric switching from AB to BA (or BA to AB) can be achieved with a relatively small out-of-plane electric field through the in-plane sliding of one atomic layer over the other. However, the optical detection of such ferroelectric switching in hBN has not yet been demonstrated. In this study, we utilize an adjacent WSe2 monolayer to detect the ferroelectric switching in BN. This dynamic coupling between a two-dimensional (2D) ferroelectric and a 2D semiconductor allows for the fundamental investigation of the ferroelectric material using a nondestructive, local optical probe, offering promising applications for compact and nonvolatile memory devices.
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Affiliation(s)
- Sébastien Roux
- Université de Toulouse, INSA-CNRS-UPS, LPCNO, 135 Av. Rangueil, 31077 Toulouse, France
| | - Jules Fraunié
- Université de Toulouse, INSA-CNRS-UPS, LPCNO, 135 Av. Rangueil, 31077 Toulouse, France
| | - Kenji Watanabe
- Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Takashi Taniguchi
- Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Benjamin Lassagne
- Université de Toulouse, INSA-CNRS-UPS, LPCNO, 135 Av. Rangueil, 31077 Toulouse, France
| | - Cedric Robert
- Université de Toulouse, INSA-CNRS-UPS, LPCNO, 135 Av. Rangueil, 31077 Toulouse, France
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15
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Chen C, Zhou Y, Tong L, Pang Y, Xu J. Emerging 2D Ferroelectric Devices for In-Sensor and In-Memory Computing. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2025; 37:e2400332. [PMID: 38739927 PMCID: PMC11733831 DOI: 10.1002/adma.202400332] [Citation(s) in RCA: 15] [Impact Index Per Article: 15.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/08/2024] [Revised: 04/19/2024] [Indexed: 05/16/2024]
Abstract
The quantity of sensor nodes within current computing systems is rapidly increasing in tandem with the sensing data. The presence of a bottleneck in data transmission between the sensors, computing, and memory units obstructs the system's efficiency and speed. To minimize the latency of data transmission between units, novel in-memory and in-sensor computing architectures are proposed as alternatives to the conventional von Neumann architecture, aiming for data-intensive sensing and computing applications. The integration of 2D materials and 2D ferroelectric materials has been expected to build these novel sensing and computing architectures due to the dangling-bond-free surface, ultra-fast polarization flipping, and ultra-low power consumption of the 2D ferroelectrics. Here, the recent progress of 2D ferroelectric devices for in-sensing and in-memory neuromorphic computing is reviewed. Experimental and theoretical progresses on 2D ferroelectric devices, including passive ferroelectrics-integrated 2D devices and active ferroelectrics-integrated 2D devices, are reviewed followed by the integration of perception, memory, and computing application. Notably, 2D ferroelectric devices have been used to simulate synaptic weights, neuronal model functions, and neural networks for image processing. As an emerging device configuration, 2D ferroelectric devices have the potential to expand into the sensor-memory and computing integration application field, leading to new possibilities for modern electronics.
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Affiliation(s)
- Chunsheng Chen
- Department of Electronic Engineering and Materials Science and Technology Research CenterThe Chinese University of Hong KongHong Kong SARChina
| | - Yaoqiang Zhou
- Department of Electronic Engineering and Materials Science and Technology Research CenterThe Chinese University of Hong KongHong Kong SARChina
| | - Lei Tong
- Department of Electronic Engineering and Materials Science and Technology Research CenterThe Chinese University of Hong KongHong Kong SARChina
| | - Yue Pang
- Department of Electronic Engineering and Materials Science and Technology Research CenterThe Chinese University of Hong KongHong Kong SARChina
| | - Jianbin Xu
- Department of Electronic Engineering and Materials Science and Technology Research CenterThe Chinese University of Hong KongHong Kong SARChina
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16
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Kim JY, Hwang W, Han SY, Jung YS, Pang F, Shen W, Park C, Kim S, Soon A, Cho YS. Oxygen-Doped 2D In 2Se 3 Nanosheets with Extended In-Plane Lattice Strain for Highly Efficient Piezoelectric Energy Harvesting. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2025; 12:e2410851. [PMID: 39587991 PMCID: PMC11744569 DOI: 10.1002/advs.202410851] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/06/2024] [Revised: 11/08/2024] [Indexed: 11/27/2024]
Abstract
With the emergence of electromechanical devices, considerable efforts have been devoted to improving the piezoelectricity of 2D materials. Herein, an anion-doping approach is proposed as an effective way to enhance the piezoelectricity of α-In2Se3 nanosheets, which has a rare asymmetric structure in both the in-plane and out-of-plane directions. As the O2 plasma treatment gradually substitutes selenium with oxygen, it changes the crystal structure, creating a larger lattice distortion and, thus, an extended dipole moment. Prior to the O2 treatment, the lattice extension is deliberately maximized in the lateral direction by imposing in situ tensile strain during the exfoliation process for preparing the nanosheets. Combining doping and strain engineering substantially enhances the piezoelectric coefficient and electromechanical energy conversion. As a result, the optimal harvester with a 0.9% in situ strain and 10 min plasma exposure achieves the highest piezoelectric energy harvesting values of ≈13.5 nA and ≈420 µW cm-2 under bending operation, outperforming all previously reported 2D materials. Theoretical estimation of the structural changes and polarization with gradual oxygen substitution supports the observed dependence of the electromechanical performance.
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Affiliation(s)
- Ji Yeon Kim
- Department of Materials Science and EngineeringYonsei UniversitySeoul03722Republic of Korea
| | - Woohyun Hwang
- Department of Materials Science and EngineeringYonsei UniversitySeoul03722Republic of Korea
| | - Seo Yeon Han
- Department of Materials Science and EngineeringYonsei UniversitySeoul03722Republic of Korea
| | - Ye Seul Jung
- Department of Materials Science and EngineeringYonsei UniversitySeoul03722Republic of Korea
- SK HynixIcheonGyeonggi‐do17336Republic of Korea
| | - Fengyi Pang
- Department of Materials Science and EngineeringYonsei UniversitySeoul03722Republic of Korea
| | - Wenhu Shen
- Department of Materials Science and EngineeringYonsei UniversitySeoul03722Republic of Korea
| | - Cheolmin Park
- Department of Materials Science and EngineeringYonsei UniversitySeoul03722Republic of Korea
| | - Sang‐Woo Kim
- Department of Materials Science and EngineeringYonsei UniversitySeoul03722Republic of Korea
| | - Aloysius Soon
- Department of Materials Science and EngineeringYonsei UniversitySeoul03722Republic of Korea
| | - Yong Soo Cho
- Department of Materials Science and EngineeringYonsei UniversitySeoul03722Republic of Korea
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17
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Wu Y, Zhang T, Guo D, Li B, Pei K, You W, Du Y, Xing W, Lai Y, Ji W, Zhao Y, Che R. Stacking selected polarization switching and phase transition in vdW ferroelectric α-In 2Se 3 junction devices. Nat Commun 2024; 15:10481. [PMID: 39622832 PMCID: PMC11612147 DOI: 10.1038/s41467-024-54841-7] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/06/2024] [Accepted: 11/22/2024] [Indexed: 12/06/2024] Open
Abstract
The structure and dynamics of ferroelectric domain walls are essential for polarization switching in ferroelectrics, which remains relatively unexplored in two-dimensional ferroelectric α-In2Se3. Interlayer interactions engineering via selecting the stacking order in two-dimensional materials allows modulation of ferroelectric properties. Here, we report stacking-dependent ferroelectric domain walls in 2H and 3R stacked α-In2Se3, elucidating the resistance switching mechanism in ferroelectric semiconductor-metal junction devices. In 3R α-In2Se3, the in-plane movement of out-of-plane ferroelectric domain walls yield a large hysteresis window. Conversely, 2H α-In2Se3 devices favor in-plane domain walls and out-of-plane domain wall motion, producing a small hysteresis window. High electric fields induce a ferro-paraelectric phase transition of In2Se3, where 3R In2Se3 reaches the transition through intralayer atomic gliding, while 2H In2Se3 undergoes a complex process comprising intralayer bond dissociation and interlayer bond reconstruction. Our findings demonstrate tunable ferroelectric properties via stacking configurations, offering an expanded dimension for material engineering in ferroelectric devices.
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Affiliation(s)
- Yuyang Wu
- Laboratory of Advanced Materials, Shanghai Key Lab of Molecular Catalysis and Innovative Materials, Academy for Engineering & Technology, Fudan University, Shanghai, China
| | - Tianjiao Zhang
- College of Integrated Circuits, ZJU-Hangzhou Global Scientific and Technological Innovation Centre, Zhejiang University, Hangzhou, China
| | - Deping Guo
- College of Physics and Electronic Engineering, Center for Computational Sciences, Sichuan Normal University, Chengdu, China
- Beiing Key Laboratory of Optoelectronic Functional Materials & Micro-Nano Devices, School of Physics, Renmin University of China, Beijing, China
- Key Laboratory of Quantum State Construction and Manipulaton (Ministry of Education), Renmin University of China, Beijing, China
| | - Bicheng Li
- Laboratory of Advanced Materials, Shanghai Key Lab of Molecular Catalysis and Innovative Materials, Academy for Engineering & Technology, Fudan University, Shanghai, China
| | - Ke Pei
- Laboratory of Advanced Materials, Shanghai Key Lab of Molecular Catalysis and Innovative Materials, Academy for Engineering & Technology, Fudan University, Shanghai, China
| | - Wenbin You
- Laboratory of Advanced Materials, Shanghai Key Lab of Molecular Catalysis and Innovative Materials, Academy for Engineering & Technology, Fudan University, Shanghai, China
| | - Yiqian Du
- Laboratory of Advanced Materials, Shanghai Key Lab of Molecular Catalysis and Innovative Materials, Academy for Engineering & Technology, Fudan University, Shanghai, China
| | - Wanchen Xing
- College of Physics, Donghua University, Shanghai, China
| | - Yuxiang Lai
- Pico Electron Microscopy Center, Innovation Institute for Ocean Materials Characterization, Center for Advanced Studies in Precision Instruments, Hainan University, Haikou, China
| | - Wei Ji
- Beiing Key Laboratory of Optoelectronic Functional Materials & Micro-Nano Devices, School of Physics, Renmin University of China, Beijing, China.
- Key Laboratory of Quantum State Construction and Manipulaton (Ministry of Education), Renmin University of China, Beijing, China.
| | - Yuda Zhao
- College of Integrated Circuits, ZJU-Hangzhou Global Scientific and Technological Innovation Centre, Zhejiang University, Hangzhou, China.
| | - Renchao Che
- Laboratory of Advanced Materials, Shanghai Key Lab of Molecular Catalysis and Innovative Materials, Academy for Engineering & Technology, Fudan University, Shanghai, China.
- College of Physics, Donghua University, Shanghai, China.
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18
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Sun H, Tian H, Hu Y, Cui Y, Chen X, Xu M, Wang X, Zhou T. Bio-Plausible Multimodal Learning with Emerging Neuromorphic Devices. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2024; 11:e2406242. [PMID: 39258724 PMCID: PMC11615814 DOI: 10.1002/advs.202406242] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/06/2024] [Revised: 08/02/2024] [Indexed: 09/12/2024]
Abstract
Multimodal machine learning, as a prospective advancement in artificial intelligence, endeavors to emulate the brain's multimodal learning abilities with the objective to enhance interactions with humans. However, this approach requires simultaneous processing of diverse types of data, leading to increased model complexity, longer training times, and higher energy consumption. Multimodal neuromorphic devices have the capability to preprocess spatio-temporal information from various physical signals into unified electrical signals with high information density, thereby enabling more biologically plausible multimodal learning with low complexity and high energy-efficiency. Here, this work conducts a comparison between the expression of multimodal machine learning and multimodal neuromorphic computing, followed by an overview of the key characteristics associated with multimodal neuromorphic devices. The bio-plausible operational principles and the multimodal learning abilities of emerging devices are examined, which are classified into heterogeneous and homogeneous multimodal neuromorphic devices. Subsequently, this work provides a detailed description of the multimodal learning capabilities demonstrated by neuromorphic circuits and their respective applications. Finally, this work highlights the limitations and challenges of multimodal neuromorphic computing in order to hopefully provide insight into potential future research directions.
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Affiliation(s)
- Haonan Sun
- School of Automation EngineeringUniversity of Electronic Science and Technology of ChinaChengdu611731China
- State Key Laboratory of Electronic Thin Film and Integrated DevicesUniversity of Electronic Science and Technology of ChinaChengdu611731China
| | - Haoxiang Tian
- State Key Laboratory of Electronic Thin Film and Integrated DevicesUniversity of Electronic Science and Technology of ChinaChengdu611731China
| | - Yihao Hu
- School of Automation EngineeringUniversity of Electronic Science and Technology of ChinaChengdu611731China
- State Key Laboratory of Electronic Thin Film and Integrated DevicesUniversity of Electronic Science and Technology of ChinaChengdu611731China
| | - Yi Cui
- State Key Laboratory of Electronic Thin Film and Integrated DevicesUniversity of Electronic Science and Technology of ChinaChengdu611731China
| | - Xinrui Chen
- State Key Laboratory of Electronic Thin Film and Integrated DevicesUniversity of Electronic Science and Technology of ChinaChengdu611731China
| | - Minyi Xu
- State Key Laboratory of Electronic Thin Film and Integrated DevicesUniversity of Electronic Science and Technology of ChinaChengdu611731China
| | - Xianfu Wang
- State Key Laboratory of Electronic Thin Film and Integrated DevicesUniversity of Electronic Science and Technology of ChinaChengdu611731China
| | - Tao Zhou
- School of Automation EngineeringUniversity of Electronic Science and Technology of ChinaChengdu611731China
- State Key Laboratory of Electronic Thin Film and Integrated DevicesUniversity of Electronic Science and Technology of ChinaChengdu611731China
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19
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Kim JH, Kim SH, Yu HY. Enhanced Electrical Polarization in van der Waals α-In 2Se 3 Ferroelectric Semiconductor Field-Effect Transistors by Eliminating Surface Screening Charge. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024; 20:e2405459. [PMID: 39358931 DOI: 10.1002/smll.202405459] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/03/2024] [Revised: 09/18/2024] [Indexed: 10/04/2024]
Abstract
A van der Waals (vdW) α-In2Se3 ferroelectric semiconductor channel-based field-effect transistor (FeS-FET) has emerged as a next-generation electronic device owing to its versatility in various fields, including neuromorphic computing, nonvolatile memory, and optoelectronics. However, screening charges cause by the imperfect surface morphology of vdW α-In2Se3 inhibiting electrical polarization remain an unresolved issue. In this study, for the first time, a method is elucidated to recover the inherent electric polarization in both in- and out-of-plane directions of the α-In2Se3 channel based on post-exfoliation annealing (PEA) and improve the electrical performance of vdW FeS-FETs. Following PEA, an ultra-thin In2Se3-3xO3x layer formed on the top surface of the α-In2Se3 channel is demonstrated to passivate surface defects and enhance the electrical performance of FeS-FETs. The on/off current ratio of the α-In2Se3 FeS-FET has increased from 5.99 to 1.84 × 106, and the magnitude of ferroelectric resistance switching has increased from 1.20 to 26.01. Moreover, the gate-modulated artificial synaptic operation of the α-In2Se3 FeS-FET is demonstrated and illustrate the significance of the engineered interface in the vdW FeS-FET for its application to multifunctional devices. The proposed α-In2Se3 FeS-FET is expected to provide a significant breakthrough for advanced memory devices and neuromorphic computing.
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Affiliation(s)
- Jong-Hyun Kim
- Department of Semiconductor Systems Engineering, Korea University, 145, Anam-ro, Seongbuk-gu, Seoul, 02841, South Korea
| | - Seung-Hwan Kim
- Center for Spintronics, Korea Institute of Science and Technology (KIST), 5, Hwarang-ro 14-gil, Seongbuk-gu, Seoul, 02792, South Korea
| | - Hyun-Yong Yu
- Department of Semiconductor Systems Engineering, Korea University, 145, Anam-ro, Seongbuk-gu, Seoul, 02841, South Korea
- School of Electrical Engineering, Korea University, 145, Anam-ro, Seongbuk-gu, Seoul, 02841, South Korea
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20
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Wang W, Luo W, Zhang S, Zeng C, Xie F, Deng C, Wang G, Peng G. Reversible Tuning Electrical Properties in Ferroelectric SnS with NH 3 Adsorption and Desorption. NANOMATERIALS (BASEL, SWITZERLAND) 2024; 14:1638. [PMID: 39452974 PMCID: PMC11510606 DOI: 10.3390/nano14201638] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/17/2024] [Accepted: 10/09/2024] [Indexed: 10/26/2024]
Abstract
Two-dimensional (2D) ferroelectrics usually exhibit instability or a tendency toward degradation when exposed to the ambient atmosphere, and the mechanism behind this phenomenon remains unclear. To unravel this affection mechanism, we have undertaken an investigation utilizing NH3 and two-dimensional ferroelectric SnS. Herein, the adsorption and desorption of NH3 molecules can reversibly modulate the electrical properties of SnS, encompassing I-V curves and transfer curves. The response time for NH3 adsorption is approximately 1.12 s, which is much quicker than that observed in other two-dimensional materials. KPFM characterizations indicate that air molecules' adsorption alters the surface potentials of SiO2, SnS, metal electrodes, and contacts with minimal impact on the electrode contact surface potential. Upon the adsorption of NH3 molecules or air molecules, the hole concentration within the device decreases. These findings elucidate the adsorption mechanism of NH3 molecules on SnS, potentially fostering the advancement of rapid gas sensing applications utilizing two-dimensional ferroelectrics.
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Affiliation(s)
| | - Wei Luo
- Correspondence: (W.L.); (G.P.)
| | | | | | | | | | | | - Gang Peng
- College of Science, National University of Defense Technology, Changsha 410073, China; (W.W.); (S.Z.); (C.Z.); (F.X.); (C.D.); (G.W.)
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21
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Bae J, Won J, Kim T, Choi S, Kim H, Oh SHV, Lee G, Lee E, Jeon S, Kim M, Do HW, Seo D, Kim S, Cho Y, Kang H, Kim B, Choi H, Han J, Kim T, Nemati N, Park C, Lee K, Moon H, Kim J, Lee H, Davies DW, Kim D, Kang S, Yu BK, Kim J, Cho MK, Bae JH, Park S, Kim J, Sung HJ, Jung MC, Chung I, Choi H, Choi H, Kim D, Baik H, Lee JH, Yang H, Kim Y, Park HG, Lee W, Chang KJ, Kim M, Chun DW, Han MJ, Walsh A, Soon A, Cheon J, Park C, Kim JY, Shim W. Cation-eutaxy-enabled III-V-derived van der Waals crystals as memristive semiconductors. NATURE MATERIALS 2024; 23:1402-1410. [PMID: 39198713 DOI: 10.1038/s41563-024-01986-x] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/14/2021] [Accepted: 07/31/2024] [Indexed: 09/01/2024]
Abstract
Novel two-dimensional semiconductor crystals can exhibit diverse physical properties beyond their inherent semiconducting attributes, making their pursuit paramount. Memristive properties, as exemplars of these attributes, are predominantly manifested in wide-bandgap materials. However, simultaneously harnessing semiconductor properties alongside memristive characteristics to produce memtransistors is challenging. Herein we prepared a class of semiconducting III-V-derived van der Waals crystals, specifically the HxA1-xBX form, exhibiting memristive characteristics. To identify candidates for the material synthesis, we conducted a systematic high-throughput screening, leading us to 44 prospective III-V candidates; of these, we successfully synthesized ten, including nitrides, phosphides, arsenides and antimonides. These materials exhibited intriguing characteristics such as electrochemical polarization and memristive phenomena while retaining their semiconductive attributes. We demonstrated the gate-tunable synaptic and logic functions within single-gate memtransistors, capitalizing on the synergistic interplay between the semiconducting and memristive properties of our two-dimensional crystals. Our approach guides the discovery of van der Waals materials with unique properties from unconventional crystal symmetries.
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Affiliation(s)
- Jihong Bae
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
- Center for Multi-Dimensional Materials, Yonsei University, Seoul, Korea
| | - Jongbum Won
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
- Center for Multi-Dimensional Materials, Yonsei University, Seoul, Korea
| | - Taeyoung Kim
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
- Center for Multi-Dimensional Materials, Yonsei University, Seoul, Korea
| | - Sangjin Choi
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
- Center for Multi-Dimensional Materials, Yonsei University, Seoul, Korea
| | - Hyesoo Kim
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
- Center for Multi-Dimensional Materials, Yonsei University, Seoul, Korea
| | - Seung-Hyun Victor Oh
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
| | - Giyeok Lee
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
| | - Eunsil Lee
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
- Center for Multi-Dimensional Materials, Yonsei University, Seoul, Korea
- Icheon Branch, Korea Institute of Ceramic Engineering and Technology, Icheon, Korea
| | - Sijin Jeon
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
- Center for Multi-Dimensional Materials, Yonsei University, Seoul, Korea
- Icheon Branch, Korea Institute of Ceramic Engineering and Technology, Icheon, Korea
| | - Minjung Kim
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
- Center for Multi-Dimensional Materials, Yonsei University, Seoul, Korea
| | - Hyung Wan Do
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
- Center for Multi-Dimensional Materials, Yonsei University, Seoul, Korea
| | - Dongchul Seo
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
- Center for Multi-Dimensional Materials, Yonsei University, Seoul, Korea
- Center for Nanomedicine, Institute for Basic Science (IBS), Seoul, Korea
- Graduate Program of Nano Biomedical Engineering (NanoBME), Advanced Science Institute, Yonsei University, Seoul, Korea
| | - Sungsoon Kim
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
- Center for Multi-Dimensional Materials, Yonsei University, Seoul, Korea
| | - Youngjun Cho
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
- Center for Multi-Dimensional Materials, Yonsei University, Seoul, Korea
| | - Hyeonsoo Kang
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
- Center for Multi-Dimensional Materials, Yonsei University, Seoul, Korea
| | - Bokyeong Kim
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
- Center for Multi-Dimensional Materials, Yonsei University, Seoul, Korea
| | - Hong Choi
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
- Center for Multi-Dimensional Materials, Yonsei University, Seoul, Korea
| | - Jihoon Han
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
- Center for Multi-Dimensional Materials, Yonsei University, Seoul, Korea
| | - Taehoon Kim
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
- Center for Multi-Dimensional Materials, Yonsei University, Seoul, Korea
| | - Narguess Nemati
- Department of Mechanical and Production Engineering, Aarhus University, Aarhus, Denmark
| | - Chanho Park
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
| | - Kyuho Lee
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
| | - Hongjae Moon
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
| | - Jeongmin Kim
- Division of Nanotechnology, DGIST, Daegu, South Korea
| | - Hyunggeun Lee
- Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon, Korea
| | - Daniel W Davies
- Thomas Young Centre and Department of Materials, Imperial College London, London, UK
| | - Dohyun Kim
- Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon, Korea
| | - Seunghun Kang
- School of Advanced Materials and Engineering, Sungkyunkwan University, Suwon, Korea
| | - Byung-Kyu Yu
- Center for Nanomedicine, Institute for Basic Science (IBS), Seoul, Korea
- Graduate Program of Nano Biomedical Engineering (NanoBME), Advanced Science Institute, Yonsei University, Seoul, Korea
| | - Jaegyeom Kim
- Icheon Branch, Korea Institute of Ceramic Engineering and Technology, Icheon, Korea
| | - Min Kyung Cho
- Advanced Analysis Center, Korea Institute of Science and Technology, Seoul, Korea
| | - Jee-Hwan Bae
- Advanced Analysis Center, Korea Institute of Science and Technology, Seoul, Korea
| | - Soohyung Park
- Advanced Analysis Center, Korea Institute of Science and Technology, Seoul, Korea
| | - Jungkil Kim
- Department of Physics, Jeju National University, Jeju, Korea
| | - Ha-Jun Sung
- Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon, Korea
| | - Myung-Chul Jung
- Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon, Korea
| | - In Chung
- School of Chemical and Biological Engineering, and Institute of Chemical Process, Seoul National University, Seoul, Korea
| | - Heonjin Choi
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
| | - Hyunyong Choi
- Department of Physics and Astronomy, and Institute of Applied Physics, Seoul National University, Seoul, Korea
| | - Dohun Kim
- Department of Physics and Astronomy, and Institute of Applied Physics, Seoul National University, Seoul, Korea
| | | | - Jae-Hyun Lee
- Center for Nanomedicine, Institute for Basic Science (IBS), Seoul, Korea
- Graduate Program of Nano Biomedical Engineering (NanoBME), Advanced Science Institute, Yonsei University, Seoul, Korea
| | - Heejun Yang
- Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon, Korea
| | - Yunseok Kim
- School of Advanced Materials and Engineering, Sungkyunkwan University, Suwon, Korea
| | - Hong-Gyu Park
- Department of Physics and Astronomy, and Institute of Applied Physics, Seoul National University, Seoul, Korea
| | - Wooyoung Lee
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
| | - Kee Joo Chang
- Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon, Korea
| | - Miso Kim
- School of Advanced Materials and Engineering, Sungkyunkwan University, Suwon, Korea
| | - Dong Won Chun
- Advanced Analysis Center, Korea Institute of Science and Technology, Seoul, Korea
| | - Myung Joon Han
- Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon, Korea
| | - Aron Walsh
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
- Thomas Young Centre and Department of Materials, Imperial College London, London, UK
| | - Aloysius Soon
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea.
| | - Jinwoo Cheon
- Center for Nanomedicine, Institute for Basic Science (IBS), Seoul, Korea.
- Graduate Program of Nano Biomedical Engineering (NanoBME), Advanced Science Institute, Yonsei University, Seoul, Korea.
- Department of Chemistry, Yonsei University, Seoul, Korea.
| | - Cheolmin Park
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea.
| | - Jong-Young Kim
- Icheon Branch, Korea Institute of Ceramic Engineering and Technology, Icheon, Korea.
| | - Wooyoung Shim
- Department of Materials Science and Engineering, Yonsei University, Seoul, Korea.
- Center for Multi-Dimensional Materials, Yonsei University, Seoul, Korea.
- Center for Nanomedicine, Institute for Basic Science (IBS), Seoul, Korea.
- Graduate Program of Nano Biomedical Engineering (NanoBME), Advanced Science Institute, Yonsei University, Seoul, Korea.
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22
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Wu J, Jian J, Ma H, Ye Y, Tang B, Qian Z, Deng Q, Sun B, Liu S, Lin H, Li L. Nonvolatile Electro-optic Response of Graphene Driven by Ferroelectric Polarization. NANO LETTERS 2024; 24:11469-11475. [PMID: 39225660 DOI: 10.1021/acs.nanolett.4c02625] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 09/04/2024]
Abstract
Two-dimensional materials (2DMs) have exhibited remarkably tunable optical characteristics, which have been applied for significant applications in communications, sensing, and computing. However, the reported tunable optical properties of 2DMs are almost volatile, impeding them in the applications of multifarious emerging frameworks such as programmable operation and neuromorphic computing. In this work, nonvolatile electro-optic response is developed by the graphene-Al2O3-In2Se3 heterostructure integrating with microring resonators (MRRs). In such compact devices, the optical absorption coefficient of graphene is substantially tuned by the out-of-plane ferroelectric polarization in α-In2Se3, resulting in a nonvolatile optical transmission in MRRs. This work demonstrates that integrating graphene with ferroelectric materials paves the way to develop nonvolatile devices in photonic circuits for emerging applications such as optical neural networks.
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Affiliation(s)
- Jianghong Wu
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou 310024, China
- Institute of Advanced Technology, Westlake Institute for Advanced Study, Hangzhou 310024, China
- Department of Applied Physics, The Hongkong Polytechnic University, Hong Kong 999077, China
| | - Jialing Jian
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou 310024, China
- Institute of Advanced Technology, Westlake Institute for Advanced Study, Hangzhou 310024, China
| | - Hui Ma
- State Key Laboratory of Modern Optical Instrumentation, College of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China
| | - Yuting Ye
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou 310024, China
- Institute of Advanced Technology, Westlake Institute for Advanced Study, Hangzhou 310024, China
| | - Bo Tang
- Institute of Microelectronics, Chinese Academic Society, Beijing 100029, China
| | - Zhuang Qian
- Key Laboratory for Quantum Materials of Zhejiang Province, Department of Physics, School of Science, Westlake University, Hangzhou 310024, China
- Institute of Natural Sciences, Westlake Institute for Advanced Study, Hangzhou 310024, China
| | - Qingyan Deng
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou 310024, China
- Institute of Advanced Technology, Westlake Institute for Advanced Study, Hangzhou 310024, China
| | - Boshu Sun
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou 310024, China
- Institute of Advanced Technology, Westlake Institute for Advanced Study, Hangzhou 310024, China
| | - Shi Liu
- Key Laboratory for Quantum Materials of Zhejiang Province, Department of Physics, School of Science, Westlake University, Hangzhou 310024, China
- Institute of Natural Sciences, Westlake Institute for Advanced Study, Hangzhou 310024, China
| | - Hongtao Lin
- State Key Laboratory of Modern Optical Instrumentation, College of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China
| | - Lan Li
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou 310024, China
- Westlake Institute for Optoelectronics, Fuyang, Hangzhou 311421, China
- Institute of Advanced Technology, Westlake Institute for Advanced Study, Hangzhou 310024, China
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23
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Bai C, Wu G, Yang J, Zeng J, Liu Y, Wang J. 2D materials-based photodetectors combined with ferroelectrics. NANOTECHNOLOGY 2024; 35:352001. [PMID: 38697050 DOI: 10.1088/1361-6528/ad4652] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/14/2023] [Accepted: 05/01/2024] [Indexed: 05/04/2024]
Abstract
Photodetectors are essential optoelectronic devices that play a critical role in modern technology by converting optical signals into electrical signals, which are one of the most important sensors of the informational devices in current 'Internet of Things' era. Two-dimensional (2D) material-based photodetectors have excellent performance, simple design and effortless fabrication processes, as well as enormous potential for fabricating highly integrated and efficient optoelectronic devices, which has attracted extensive research attention in recent years. The introduction of spontaneous polarization ferroelectric materials further enhances the performance of 2D photodetectors, moreover, companying with the reduction of power consumption. This article reviews the recent advances of materials, devices in ferroelectric-modulated photodetectors. This review starts with the introduce of the basic terms and concepts of the photodetector and various ferroelectric materials applied in 2D photodetectors, then presents a variety of typical device structures, fundamental mechanisms and potential applications under ferroelectric polarization modulation. Finally, we summarize the leading challenges currently confronting ferroelectric-modulated photodetectors and outline their future perspectives.
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Affiliation(s)
- Chongyang Bai
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Science, East China Normal University, Shanghai 200241, People's Republic of China
| | - Guangjian Wu
- State Key Laboratory of Integrated Chips and Systems, Frontier Institute of Chip and System, Fudan University, Shanghai 200433, People's Republic of China
| | - Jing Yang
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Science, East China Normal University, Shanghai 200241, People's Republic of China
- Chongqing Key Laboratory of Precision Optics, Chongqing Institute of East China Normal University, Chongqing 401120, People's Republic of China
| | - Jinhua Zeng
- State Key Laboratory of Integrated Chips and Systems, Frontier Institute of Chip and System, Fudan University, Shanghai 200433, People's Republic of China
| | - Yihan Liu
- State Key Laboratory of Integrated Chips and Systems, Frontier Institute of Chip and System, Fudan University, Shanghai 200433, People's Republic of China
| | - Jianlu Wang
- State Key Laboratory of Integrated Chips and Systems, Frontier Institute of Chip and System, Fudan University, Shanghai 200433, People's Republic of China
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24
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Chen Z, Li YC, Kong TL, Lv YY, Fa W, Chen S. Computational Study on Interlocked-Ferroelectricity-Contributed High-Performance Memristors Based on Two-Dimensional van der Waals Ferroelectric Semiconductors. ACS APPLIED MATERIALS & INTERFACES 2024; 16:26428-26438. [PMID: 38718304 DOI: 10.1021/acsami.4c03812] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/24/2024]
Abstract
In order to realize the prevailing artificial intelligence technology, memristor-implemented in-memory or neuromorphic computing is highly expected to break the bottleneck of von Neumann computers. Although high-performance memristors have been vigorously developed in labs or in industry, systematic computational investigations on memristors are seldom. Hence, it is urgent to provide theoretical or computational support for the exploration of memristor operating mechanisms or the screening of memristor materials. Here, a computational method based on the main input parameters learned from the first-principles calculations was developed to measure resistance switching of two-terminal memristors with sandwiched metal/ferroelectric semiconductor/metal architectures, which strikingly agrees with the experimental measurements. Based on our developed method, the diverse multiterminal memristors were designed to fully exploit the application of interlocked ferroelectricity of a ferroelectric semiconductor and realize their heterosynaptic plasticity, and their heterosynaptic behaviors can still be well described. Our developed method can provide a paradigm for the emulation of ferroelectric memristors and inspire subsequent computational exploration. Furthermore, our study also supplies a device optimization strategy based on the interlocked ferroelectricity and easy processing of two-dimensional van der Waals ferroelectric semiconductors, and our proposed heterosynaptic memristors still await further experimental exploration.
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Affiliation(s)
- Zhuo Chen
- National Laboratory of Solid State Microstructures and Department of Physics and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, Jiangsu 210023, China
- Kuang Yaming Honors School, Nanjing University, Nanjing, Jiangsu 210023, China
| | - Yu-Chen Li
- Kuang Yaming Honors School, Nanjing University, Nanjing, Jiangsu 210023, China
| | - Tie-Lin Kong
- National Laboratory of Solid State Microstructures and Department of Physics and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, Jiangsu 210023, China
- Kuang Yaming Honors School, Nanjing University, Nanjing, Jiangsu 210023, China
| | - Yang-Yang Lv
- National Laboratory of Solid State Microstructures and Department of Materials Science and Engineering, Nanjing University, Nanjing, Jiangsu 210023, China
- Key Laboratory of Quantum Materials and Devices of Ministry of Education Southeast University, Nanjing, Jiangsu 211189, China
| | - Wei Fa
- National Laboratory of Solid State Microstructures and Department of Physics and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, Jiangsu 210023, China
| | - Shuang Chen
- Kuang Yaming Honors School, Nanjing University, Nanjing, Jiangsu 210023, China
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25
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Kang SJ, Jung W, Gwon OH, Kim HS, Byun HR, Kim JY, Jang SG, Shin B, Kwon O, Cho B, Yim K, Yu YJ. Photo-Assisted Ferroelectric Domain Control for α-In 2Se 3 Artificial Synapses Inspired by Spontaneous Internal Electric Fields. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024; 20:e2307346. [PMID: 38213011 DOI: 10.1002/smll.202307346] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/23/2023] [Revised: 12/17/2023] [Indexed: 01/13/2024]
Abstract
α-In2Se3 semiconductor crystals realize artificial synapses by tuning in-plane and out-of-plane ferroelectricity with diverse avenues of electrical and optical pulses. While the electrically induced ferroelectricity of α-In2Se3 shows synaptic memory operation, the optically assisted synaptic plasticity in α-In2Se3 has also been preferred for polarization flipping enhancement. Here, the synaptic memory behavior of α-In2Se3 is demonstrated by applying electrical gate voltages under white light. As a result, the induced internal electric field is identified at a polarization flipped conductance channel in α-In2Se3/hexagonal boron nitride (hBN) heterostructure ferroelectric field effect transistors (FeFETs) under white light and discuss the contribution of this built-in electric field on synapse characterization. The biased dipoles in α-In2Se3 toward potentiation polarization direction by an enhanced internal built-in electric field under illumination of white light lead to improvement of linearity for long-term depression curves with proper electric spikes. Consequently, upon applying appropriate electric spikes to α-In2Se3/hBN FeFETs with illuminating white light, the recognition accuracy values significantly through the artificial learning simulation is elevated for discriminating hand-written digit number images.
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Affiliation(s)
- Seok-Ju Kang
- Department of Physics, Chungnam National University, 99 Daehak-ro, Yuseong-gu, Daejeon, 34134, Republic of Korea
- Institute of Quantum Systems, Chungnam National University, 99 Daehak-ro, Yuseong-gu, Daejeon, 34134, Republic of Korea
| | - Wonzee Jung
- Department of Physics, Chungnam National University, 99 Daehak-ro, Yuseong-gu, Daejeon, 34134, Republic of Korea
- Energy AI & Computational Science Laboratory, Korea Institute of Energy Research, Daejeon, 34129, Republic of Korea
| | - Oh Hun Gwon
- Department of Physics, Chungnam National University, 99 Daehak-ro, Yuseong-gu, Daejeon, 34134, Republic of Korea
| | - Han Seul Kim
- Department of Advanced Material Engineering, Chungbuk National University, Chungdae-ro 1, Seowon-Gu, Cheongju, Chungbuk, 28644, Republic of Korea
| | - Hye Ryung Byun
- Department of Physics, Chungnam National University, 99 Daehak-ro, Yuseong-gu, Daejeon, 34134, Republic of Korea
- Institute of Quantum Systems, Chungnam National University, 99 Daehak-ro, Yuseong-gu, Daejeon, 34134, Republic of Korea
| | - Jong Yun Kim
- Department of Physics, Chungnam National University, 99 Daehak-ro, Yuseong-gu, Daejeon, 34134, Republic of Korea
- Institute of Quantum Systems, Chungnam National University, 99 Daehak-ro, Yuseong-gu, Daejeon, 34134, Republic of Korea
| | - Seo Gyun Jang
- Department of Physics, Chungnam National University, 99 Daehak-ro, Yuseong-gu, Daejeon, 34134, Republic of Korea
| | - BeomKyu Shin
- Department of Physics, Chungnam National University, 99 Daehak-ro, Yuseong-gu, Daejeon, 34134, Republic of Korea
| | - Ojun Kwon
- Department of Advanced Material Engineering, Chungbuk National University, Chungdae-ro 1, Seowon-Gu, Cheongju, Chungbuk, 28644, Republic of Korea
| | - Byungjin Cho
- Department of Advanced Material Engineering, Chungbuk National University, Chungdae-ro 1, Seowon-Gu, Cheongju, Chungbuk, 28644, Republic of Korea
| | - Kanghoon Yim
- Energy AI & Computational Science Laboratory, Korea Institute of Energy Research, Daejeon, 34129, Republic of Korea
| | - Young-Jun Yu
- Department of Physics, Chungnam National University, 99 Daehak-ro, Yuseong-gu, Daejeon, 34134, Republic of Korea
- Institute of Quantum Systems, Chungnam National University, 99 Daehak-ro, Yuseong-gu, Daejeon, 34134, Republic of Korea
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26
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Pang Y, Zhou Y, Tong L, Xu J. 2D Dual Gate Field-Effect Transistor Enabled Versatile Functions. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024; 20:e2304173. [PMID: 37705128 DOI: 10.1002/smll.202304173] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/18/2023] [Revised: 08/28/2023] [Indexed: 09/15/2023]
Abstract
Advanced computing technologies such as distributed computing and the Internet of Things require highly integrated and multifunctional electronic devices. Beyond the Si technology, 2D-materials-based dual-gate transistors are expected to meet these demands due to the ultra-thin body and the dangling-bond-free surface. In this work, a molybdenum disulfide (MoS2 ) asymmetric-dual-gate field-effect transistor (ADGFET) with an In2 Se3 top gate and a global bottom gate is designed. The independently controlled double gates enable the device to achieve an on/off ratio of 106 with a low subthreshold swing of 94.3 mV dec-1 while presenting a logic function. The coupling effect between the double gates allows the top gate to work as a charge-trapping layer, realizing nonvolatile memory (105 on/off ratio with retention time over 104 s) and six-level memory states. Additionally, ADGFET displays a tunable photodetection with the responsivity reaching the highest value of 857 A W-1 , benefiting from the interface coupling between the double gates. Meanwhile, the photo-memory property of ADGFET is also verified by using the varying exposure dosages-dependent illumination. The multifunctional applications demonstrate that the ADGFET provides an alternative way to integrate logic, memory, and sensing into one device architecture.
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Affiliation(s)
- Yue Pang
- Department of Electronic Engineering, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong SAR, 999077, China
| | - Yaoqiang Zhou
- Department of Electronic Engineering, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong SAR, 999077, China
| | - Lei Tong
- Department of Electronic Engineering, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong SAR, 999077, China
| | - Jianbin Xu
- Department of Electronic Engineering, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong SAR, 999077, China
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27
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Park S, Lee D, Kang J, Choi H, Park JH. Laterally gated ferroelectric field effect transistor (LG-FeFET) using α-In 2Se 3 for stacked in-memory computing array. Nat Commun 2023; 14:6778. [PMID: 37880220 PMCID: PMC10600126 DOI: 10.1038/s41467-023-41991-3] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/29/2023] [Accepted: 09/26/2023] [Indexed: 10/27/2023] Open
Abstract
In-memory computing is an attractive alternative for handling data-intensive tasks as it employs parallel processing without the need for data transfer. Nevertheless, it necessitates a high-density memory array to effectively manage large data volumes. Here, we present a stacked ferroelectric memory array comprised of laterally gated ferroelectric field-effect transistors (LG-FeFETs). The interlocking effect of the α-In2Se3 is utilized to regulate the channel conductance. Our study examined the distinctive characteristics of the LG-FeFET, such as a notably wide memory window, effective ferroelectric switching, long retention time (over 3 × 104 seconds), and high endurance (over 105 cycles). This device is also well-suited for implementing vertically stacked structures because decreasing its height can help mitigate the challenges associated with the integration process. We devised a 3D stacked structure using the LG-FeFET and verified its feasibility by performing multiply-accumulate (MAC) operations in a two-tier stacked memory configuration.
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Affiliation(s)
- Sangyong Park
- Flash Technology Development Team, R&D Center, Device Solutions, Samsung Electronics Co. Ltd, Hwasung, 18448, Korea
- Department of Semiconductor and Display Engineering, Sungkyunkwan University (SKKU), Suwon, 16419, Korea
| | - Dongyoung Lee
- Department of Electrical and Computer Engineering, Sungkyunkwan University (SKKU), Suwon, 16419, Korea
| | - Juncheol Kang
- Department of Electrical and Computer Engineering, Sungkyunkwan University (SKKU), Suwon, 16419, Korea
| | - Hojin Choi
- Department of Electrical and Computer Engineering, Sungkyunkwan University (SKKU), Suwon, 16419, Korea
| | - Jin-Hong Park
- Department of Electrical and Computer Engineering, Sungkyunkwan University (SKKU), Suwon, 16419, Korea.
- SKKU Advanced Institute of Nano-Technology (SAINT), Sungkyunkwan University (SKKU), Suwon, Korea.
- Department of Semiconductor Convergence Engineering, Sungkyunkwan University (SKKU), Suwon, Korea.
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Miao S, Nitta R, Izawa S, Majima Y. Bottom Contact 100 nm Channel-Length α-In 2 Se 3 In-Plane Ferroelectric Memory. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2023; 10:e2303032. [PMID: 37565600 PMCID: PMC10582452 DOI: 10.1002/advs.202303032] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/11/2023] [Revised: 07/21/2023] [Indexed: 08/12/2023]
Abstract
Owing to the emerging trend of non-volatile memory and data-centric computing, the demand for more functional materials and efficient device architecture at the nanoscale is becoming stringent. To date, 2D ferroelectrics are cultivated as channel materials in field-effect transistors for their retentive and switchable dipoles and flexibility to be compacted into diverse structures and integration for intensive production. This study demonstrates the in-plane (IP) ferroelectric memory effect of a 100 nm channel-length 2D ferroelectric semiconductor α-In2 Se3 stamped onto nanogap electrodes on Si/SiO2 under a lateral electric field. As α-In2 Se3 forms the bottom contact of the nanogap electrodes, a large memory window of 13 V at drain voltage between ±6.5 V and the on/off ratio reaching 103 can be explained by controlled IP polarization. Furthermore, the memory effect is modulated by the bottom gate voltage of the Si substrate due to the intercorrelation between IP and out-of-plane (OOP) polarization. The non-volatile memory characteristics including stable retention lasting 17 h, and endurance over 1200 cycles suggest a wide range of memory applications utilizing the lateral bottom contact structure.
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Affiliation(s)
- Shurong Miao
- Laboratory for Materials and StructuresInstitute of Innovative ResearchTokyo Institute of TechnologyYokohamaKanagawa226‐8503Japan
| | - Ryosuke Nitta
- Laboratory for Materials and StructuresInstitute of Innovative ResearchTokyo Institute of TechnologyYokohamaKanagawa226‐8503Japan
| | - Seiichiro Izawa
- Laboratory for Materials and StructuresInstitute of Innovative ResearchTokyo Institute of TechnologyYokohamaKanagawa226‐8503Japan
- Joining and Welding Research InstituteOsaka UniversityIbarakiOsaka567‐0047Japan
| | - Yutaka Majima
- Laboratory for Materials and StructuresInstitute of Innovative ResearchTokyo Institute of TechnologyYokohamaKanagawa226‐8503Japan
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29
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Zhang C, Ning J, Lu W, Wang B, Cui X, Zhu X, Shen X, Feng X, Wang Y, Wang D, Wang X, Zhang J, Hao Y. Reversible Diode with Tunable Band Alignment for Photoelectricity-Induced Artificial Synapse. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2023; 19:e2300468. [PMID: 37035993 DOI: 10.1002/smll.202300468] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/20/2023] [Revised: 03/14/2023] [Indexed: 06/19/2023]
Abstract
The advent of big data era has put forward higher requirements for electronic nanodevices that have low energy consumption for their application in analog computing with memory and logic circuit to address attendant energy efficiency issues. Here, a miniaturized diode with a reversible switching state based on N-n MoS2 homojunction used a bandgap renormalization effect through the band alignment type regulated by both dielectric and polarization, controllably switched between type-I and type-II, which can be simulated as artificial synapse for sensing memory processing because of its rectification, nonvolatile characteristic and high optical responsiveness. The device demonstrates a rectification ratio of 103 . When served as memory retention time, it can attain at least 7000 s. For the synapse simulation, it has an ultralow-level energy consumption because of the pA-level operation current with 5 pJ for long-term potentiation and 7.8 fJ for long-term depression. Furthermore, the paired pulse facilitation index reaches up to 230%, and it realizes the function of optical storage that can be applied to simulate visual cells.
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Affiliation(s)
- Chi Zhang
- The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi'an, 710071, P. R. China
- Shaanxi Joint Key Laboratory of Graphene, Xidian University, Xi'an, 710071, P. R. China
| | - Jing Ning
- The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi'an, 710071, P. R. China
- Shaanxi Joint Key Laboratory of Graphene, Xidian University, Xi'an, 710071, P. R. China
| | - Wei Lu
- The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi'an, 710071, P. R. China
- Shaanxi Joint Key Laboratory of Graphene, Xidian University, Xi'an, 710071, P. R. China
| | - Boyu Wang
- The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi'an, 710071, P. R. China
- Shaanxi Joint Key Laboratory of Graphene, Xidian University, Xi'an, 710071, P. R. China
| | - Xuan Cui
- The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi'an, 710071, P. R. China
- Shaanxi Joint Key Laboratory of Graphene, Xidian University, Xi'an, 710071, P. R. China
| | - Xiaoxiao Zhu
- The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi'an, 710071, P. R. China
- Shaanxi Joint Key Laboratory of Graphene, Xidian University, Xi'an, 710071, P. R. China
| | - Xue Shen
- The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi'an, 710071, P. R. China
- Shaanxi Joint Key Laboratory of Graphene, Xidian University, Xi'an, 710071, P. R. China
| | - Xin Feng
- The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi'an, 710071, P. R. China
- Shaanxi Joint Key Laboratory of Graphene, Xidian University, Xi'an, 710071, P. R. China
| | - Yanbo Wang
- The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi'an, 710071, P. R. China
- Shaanxi Joint Key Laboratory of Graphene, Xidian University, Xi'an, 710071, P. R. China
| | - Dong Wang
- The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi'an, 710071, P. R. China
- Shaanxi Joint Key Laboratory of Graphene, Xidian University, Xi'an, 710071, P. R. China
- Xidian-Wuhu Research Institute, Wuhu, 241000, P. R. China
| | - Xinran Wang
- National Laboratory of Solid-State Microstructures, School of Electronic Science and Engineering and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, 210093, P. R. China
| | - Jincheng Zhang
- The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi'an, 710071, P. R. China
- Shaanxi Joint Key Laboratory of Graphene, Xidian University, Xi'an, 710071, P. R. China
| | - Yue Hao
- The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi'an, 710071, P. R. China
- Shaanxi Joint Key Laboratory of Graphene, Xidian University, Xi'an, 710071, P. R. China
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30
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Han Z, Liu CS, Zheng X, Zhang L. Giant tunneling electroresistance in a 2D bilayer-In 2Se 3-based out-of-plane ferroelectric tunnel junction. Phys Chem Chem Phys 2023. [PMID: 37386910 DOI: 10.1039/d3cp01942j] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 07/01/2023]
Abstract
Ferroelectric tunnel junctions (FTJs) have great potential in nonvolatile memory devices and have been extensively studied in recent years. Compared with conventional FTJs based on perovskite-type oxide materials as the barrier layer, two-dimensional (2D) van der Waals ferroelectric materials are advantageous in improving the performance of FTJs and achieving miniaturization of FTJ devices due to the features such as atomic thickness and ideal interfaces. In this work, we present a 2D out-of-plane ferroelectric tunnel junction (FTJ) constructed using graphene and bilayer-In2Se3. Using density functional calculations combined with the nonequilibrium Green's function technique, we investigate the electron transport properties in the graphene/bilayer-In2Se3 (BIS) vdW FTJ. Our calculations show that the FTJ we constructed can be switched from ferroelectric to antiferroelectric by changing the relative dipole arrangement of the BIS to form multiple nonvolatile resistance states. Since the charge transfer between the layers varies for the four different polarization states, the TER ratios range from 103% to 1010%. The giant tunneling electroresistance and multiple resistance states in the 2D BIS-based FTJ suggest that it has great potential for application in nanoscale nonvolatile ferroelectric memory devices.
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Affiliation(s)
- Ziqi Han
- Key Laboratory of Materials Physics, Institute of Solid State Physics, HFIPS, Chinese Academy of Sciences, Hefei 230031, China
- Science Island Branch of Graduate School, University of Science and Technology of China, Hefei 230026, China
- College of Information Science and Technology, Nanjing Forestry University, Nanjing 210037, China.
| | - Chun-Sheng Liu
- College of Electronic and Optical Engineering, Nanjing University of Posts and Telecommunications, Nanjing, 210023, China
| | - Xiaohong Zheng
- College of Information Science and Technology, Nanjing Forestry University, Nanjing 210037, China.
| | - Lei Zhang
- State Key Laboratory of Quantum Optics and Quantum Optics Devices, Institute of Laser Spectroscopy, Shanxi University, Taiyuan 030006, China.
- Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan 030006, China
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31
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He X, Ma Y, Zhang C, Fu A, Hu W, Xu Y, Yu B, Liu K, Wang H, Zhang X, Xue F. Proton-mediated reversible switching of metastable ferroelectric phases with low operation voltages. SCIENCE ADVANCES 2023; 9:eadg4561. [PMID: 37224248 DOI: 10.1126/sciadv.adg4561] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/26/2022] [Accepted: 04/19/2023] [Indexed: 05/26/2023]
Abstract
The exploration of ferroelectric phase transitions enables an in-depth understanding of ferroelectric switching and promising applications in information storage. However, controllably tuning the dynamics of ferroelectric phase transitions remains challenging owing to inaccessible hidden phases. Here, using protonic gating technology, we create a series of metastable ferroelectric phases and demonstrate their reversible transitions in layered ferroelectric α-In2Se3 transistors. By varying the gate bias, protons can be incrementally injected or extracted, achieving controllable tuning of the ferroelectric α-In2Se3 protonic dynamics across the channel and obtaining numerous intermediate phases. We unexpectedly discover that the gate tuning of α-In2Se3 protonation is volatile and the created phases remain polar. Their origin, revealed by first-principles calculations, is related to the formation of metastable hydrogen-stabilized α-In2Se3 phases. Furthermore, our approach enables ultralow gate voltage switching of different phases (below 0.4 volts). This work provides a possible avenue for accessing hidden phases in ferroelectric switching.
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Affiliation(s)
- Xin He
- ZJU-Hangzhou Global Scientific and Technological Innovation Center, School of Micro-Nano Electronics, Zhejiang University, Hangzhou 311215, China
- Physical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal 23955-6900, Saudi Arabia
| | - Yinchang Ma
- Physical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal 23955-6900, Saudi Arabia
| | - Chenhui Zhang
- Physical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal 23955-6900, Saudi Arabia
| | - Aiping Fu
- College of Chemistry and Chemical Engineering, Qingdao University, Qingdao, 266071, China
| | - Weijin Hu
- Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China
- School of Materials Science and Engineering, University of Science and Technology of China, Shenyang 110016, China
| | - Yang Xu
- ZJU-Hangzhou Global Scientific and Technological Innovation Center, School of Micro-Nano Electronics, Zhejiang University, Hangzhou 311215, China
| | - Bin Yu
- ZJU-Hangzhou Global Scientific and Technological Innovation Center, School of Micro-Nano Electronics, Zhejiang University, Hangzhou 311215, China
| | - Kai Liu
- Physics Department, Georgetown University, Washington, DC 20057, USA
| | - Hua Wang
- ZJU-Hangzhou Global Scientific and Technological Innovation Center, School of Micro-Nano Electronics, Zhejiang University, Hangzhou 311215, China
| | - Xixiang Zhang
- Physical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal 23955-6900, Saudi Arabia
| | - Fei Xue
- ZJU-Hangzhou Global Scientific and Technological Innovation Center, School of Micro-Nano Electronics, Zhejiang University, Hangzhou 311215, China
- Physical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal 23955-6900, Saudi Arabia
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Abstract
As the size of the transistor scales down, this strategy has confronted challenges because of the fundamental limits of silicon materials. Besides, more and more energy and time are consumed by the data transmission out of transistor computing because of the speed mismatching between the computing and memory. To meet the energy efficiency demands of big data computing, the transistor should have a smaller feature size and store data faster to overcome the energy burden of computing and data transfer. Electron transport in two-dimensional (2D) materials is constrained within a 2D plane and different materials are assembled by the van der Waals force. Owning to the atomic thickness and dangling-bond-free surface, 2D materials have demonstrated advantages in transistor scaling-down and heterogeneous structure innovation. In this review, from the performance breakthrough of 2D transistors, we discuss the opportunities, progress and challenges of 2D materials in transistor applications.
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Affiliation(s)
- Qing Zhang
- State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China
| | - Chunsen Liu
- State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China
- Frontier Institute of Chip and System, Fudan University, Shanghai 200433, China
| | - Peng Zhou
- State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China
- Frontier Institute of Chip and System, Fudan University, Shanghai 200433, China
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33
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Li W, Zhang X, Yang J, Zhou S, Song C, Cheng P, Zhang YQ, Feng B, Wang Z, Lu Y, Wu K, Chen L. Emergence of ferroelectricity in a nonferroelectric monolayer. Nat Commun 2023; 14:2757. [PMID: 37179407 PMCID: PMC10183010 DOI: 10.1038/s41467-023-38445-1] [Citation(s) in RCA: 27] [Impact Index Per Article: 13.5] [Reference Citation Analysis] [Abstract] [Grants] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/03/2022] [Accepted: 04/28/2023] [Indexed: 05/15/2023] Open
Abstract
Ferroelectricity in ultrathin two-dimensional (2D) materials has attracted broad interest due to potential applications in nonvolatile memory, nanoelectronics and optoelectronics. However, ferroelectricity is barely explored in materials with native centro or mirror symmetry, especially in the 2D limit. Here, we report the first experimental realization of room-temperature ferroelectricity in van der Waals layered GaSe down to monolayer with mirror symmetric structures, which exhibits strong intercorrelated out-of-plane and in-plane electric polarization. The origin of ferroelectricity in GaSe comes from intralayer sliding of the Se atomic sublayers, which breaks the local structural mirror symmetry and forms dipole moment alignment. Ferroelectric switching is demonstrated in nano devices fabricated with GaSe nanoflakes, which exhibit exotic nonvolatile memory behavior with a high channel current on/off ratio. Our work reveals that intralayer sliding is a new approach to generate ferroelectricity within mirror symmetric monolayer, and offers great opportunity for novel nonvolatile memory devices and optoelectronics applications.
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Affiliation(s)
- Wenhui Li
- Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Xuanlin Zhang
- State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou, 310027, China
| | - Jia Yang
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
- National Center for Nanoscience and Technology, Chinese Academy of Sciences, Beijing, 100190, China
| | - Song Zhou
- Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Chuangye Song
- Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- Songshan Lake Materials Laboratory, Dongguan, Guangdong, 523808, China
| | - Peng Cheng
- Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Yi-Qi Zhang
- Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Baojie Feng
- Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Zhenxing Wang
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
- National Center for Nanoscience and Technology, Chinese Academy of Sciences, Beijing, 100190, China
| | - Yunhao Lu
- State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou, 310027, China.
- Zhejiang Province Key Laboratory of Quantum Technology and Device, School of Physics, Zhejiang University, Hangzhou, 310027, China.
| | - Kehui Wu
- Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China.
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China.
- Songshan Lake Materials Laboratory, Dongguan, Guangdong, 523808, China.
| | - Lan Chen
- Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China.
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China.
- Songshan Lake Materials Laboratory, Dongguan, Guangdong, 523808, China.
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Bian R, Cao G, Pan E, Liu Q, Li Z, Liang L, Wu Q, Ang LK, Li W, Zhao X, Liu F. High-Performance Sliding Ferroelectric Transistor Based on Schottky Barrier Tuning. NANO LETTERS 2023; 23:4595-4601. [PMID: 37154868 DOI: 10.1021/acs.nanolett.3c01053] [Citation(s) in RCA: 8] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/10/2023]
Abstract
Sliding ferroelectricity associated with interlayer translation is an excellent candidate for ferroelectric device miniaturization. However, the weak polarization gives rise to the poor performance of sliding ferroelectric transistors with a low on/off ratio and a narrow memory window, which restricts its practical application. To address the issue, we propose a facile strategy by regulating the Schottky barrier in sliding ferroelectric semiconductor transistors based on γ-InSe, in which a high performance with a large on/off ratio (106) and a wide memory window (4.5 V) was ultimately acquired. Additionally, the memory window of the device can be further modulated by electrostatic doping or light excitation. These results open up new ways for designing novel ferroelectric devices based on emerging sliding ferroelectricity.
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Affiliation(s)
- Renji Bian
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
- Yangtze Delta Region Institute (Huzhou), University of Electronic Science and Technology of China, Huzhou 324003, China
| | - Guiming Cao
- School of Information Science and Technology, Xi Chang University, Xi Chang 615013, China
| | - Er Pan
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
| | - Qing Liu
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
| | - Zefen Li
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
| | - Lei Liang
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
| | - Qingyun Wu
- Science, Mathematics and Technology, Singapore University of Technology and Design (SUTD), 8 Somapah Road, Singapore 487372, Singapore
| | - Lay Kee Ang
- Science, Mathematics and Technology, Singapore University of Technology and Design (SUTD), 8 Somapah Road, Singapore 487372, Singapore
| | - Wenwu Li
- Shanghai Frontiers Science Research Base of Intelligent Optoelectronics and Perception, Institute of Optoelectronics, Department of Materials Science, Fudan University, Shanghai 200433, China
| | - Xiaoxu Zhao
- School of Materials Science and Engineering, Peking University, Beijing 100871, China
| | - Fucai Liu
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
- Yangtze Delta Region Institute (Huzhou), University of Electronic Science and Technology of China, Huzhou 324003, China
- State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 611731, China
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35
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Yang JY, Park M, Yeom MJ, Baek Y, Yoon SC, Jeong YJ, Oh SY, Lee K, Yoo G. Reconfigurable Physical Reservoir in GaN/α-In 2Se 3 HEMTs Enabled by Out-of-Plane Local Polarization of Ferroelectric 2D Layer. ACS NANO 2023; 17:7695-7704. [PMID: 37014204 DOI: 10.1021/acsnano.3c00187] [Citation(s) in RCA: 10] [Impact Index Per Article: 5.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/19/2023]
Abstract
Significant effort for demonstrating a gallium nitride (GaN)-based ferroelectric metal-oxide-semiconductor (MOS)-high-electron-mobility transistor (HEMT) for reconfigurable operation via simple pulse operation has been hindered by the lack of suitable materials, gate structures, and intrinsic depolarization effects. In this study, we have demonstrated artificial synapses using a GaN-based MOS-HEMT integrated with an α-In2Se3 ferroelectric semiconductor. The van der Waals heterostructure of GaN/α-In2Se3 provides a potential to achieve high-frequency operation driven by a ferroelectrically coupled two-dimensional electron gas (2DEG). Moreover, the semiconducting α-In2Se3 features a steep subthreshold slope with a high ON/OFF ratio (∼1010). The self-aligned α-In2Se3 layer with the gate electrode suppresses the in-plane polarization while promoting the out-of-plane (OOP) polarization of α-In2Se3, resulting in a steep subthreshold slope (10 mV/dec) and creating a large hysteresis (2 V). Furthermore, based on the short-term plasticity (STP) characteristics of the fabricated ferroelectric HEMT, we demonstrated reservoir computing (RC) for image classification. We believe that the ferroelectric GaN/α-In2Se3 HEMT can provide a viable pathway toward ultrafast neuromorphic computing.
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Affiliation(s)
- Jeong Yong Yang
- School of Electronic Engineering, Soongsil University, Seoul 06938, South Korea
| | - Minseong Park
- Department of Electrical and Computer Engineering, University of Virginia, Charlottesville, Virginia 22904, United States
| | - Min Jae Yeom
- School of Electronic Engineering, Soongsil University, Seoul 06938, South Korea
| | - Yongmin Baek
- Department of Electrical and Computer Engineering, University of Virginia, Charlottesville, Virginia 22904, United States
| | - Seok Chan Yoon
- School of Electronic Engineering, Soongsil University, Seoul 06938, South Korea
| | - Yeong Je Jeong
- School of Electronic Engineering, Soongsil University, Seoul 06938, South Korea
| | - Seung Yoon Oh
- School of Electronic Engineering, Soongsil University, Seoul 06938, South Korea
| | - Kyusang Lee
- Department of Electrical and Computer Engineering, University of Virginia, Charlottesville, Virginia 22904, United States
- Department of Material Science and Engineering, University of Virginia, Charlottesville, Virginia 22904, United States
| | - Geonwook Yoo
- School of Electronic Engineering, Soongsil University, Seoul 06938, South Korea
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36
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Dutta D, Mukherjee S, Uzhansky M, Mohapatra PK, Ismach A, Koren E. Edge-Based Two-Dimensional α-In 2Se 3-MoS 2 Ferroelectric Field Effect Device. ACS APPLIED MATERIALS & INTERFACES 2023; 15:18505-18515. [PMID: 37000129 DOI: 10.1021/acsami.3c00590] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/19/2023]
Abstract
Heterostructures based on two-dimensional materials offer the possibility to achieve synergistic functionalities, which otherwise remain secluded by their individual counterparts. Herein, ferroelectric polarization switching in α-In2Se3 has been utilized to engineer multilevel nonvolatile conduction states in a partially overlapping α-In2Se3-MoS2-based ferroelectric semiconducting field effect device. In particular, we demonstrate how the intercoupled ferroelectric nature of α-In2Se3 allows to nonvolatilely switch between n-i and n-i-n type junction configurations based on a novel edge state actuation mechanism, paving the way for subnanometric scale nonvolatile device miniaturization. Furthermore, the induced asymmetric polarization enables enhanced photogenerated carriers' separation, resulting in an extremely high photoresponse of ∼1275 A/W in the visible range and strong nonvolatile modulation of the bright A- and B- excitonic emission channels in the overlaying MoS2 monolayer. Our results show significant potential to harness the switchable polarization in partially overlapping α-In2Se3-MoS2 based FeFETs to engineer multimodal, nonvolatile nanoscale electronic and optoelectronic devices.
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Affiliation(s)
- Debopriya Dutta
- Nanoscale Electronic Materials and Devices Laboratory, Faculty of Materials Science and Engineering, Technion - Israel Institute of Technology, Haifa 3200003, Israel
| | - Subhrajit Mukherjee
- Nanoscale Electronic Materials and Devices Laboratory, Faculty of Materials Science and Engineering, Technion - Israel Institute of Technology, Haifa 3200003, Israel
| | - Michael Uzhansky
- Nanoscale Electronic Materials and Devices Laboratory, Faculty of Materials Science and Engineering, Technion - Israel Institute of Technology, Haifa 3200003, Israel
| | - Pranab K Mohapatra
- Department of Materials Science and Engineering, Tel Aviv University, Ramat Aviv, Tel Aviv 6997801, Israel
| | - Ariel Ismach
- Department of Materials Science and Engineering, Tel Aviv University, Ramat Aviv, Tel Aviv 6997801, Israel
| | - Elad Koren
- Nanoscale Electronic Materials and Devices Laboratory, Faculty of Materials Science and Engineering, Technion - Israel Institute of Technology, Haifa 3200003, Israel
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37
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Lanza M, Hui F, Wen C, Ferrari AC. Resistive Switching Crossbar Arrays Based on Layered Materials. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2205402. [PMID: 36094019 DOI: 10.1002/adma.202205402] [Citation(s) in RCA: 14] [Impact Index Per Article: 7.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/14/2022] [Revised: 08/25/2022] [Indexed: 06/15/2023]
Abstract
Resistive switching (RS) devices are metal/insulator/metal cells that can change their electrical resistance when electrical stimuli are applied between the electrodes, and they can be used to store and compute data. Planar crossbar arrays of RS devices can offer a high integration density (>108 devices mm- 2 ) and this can be further enhanced by stacking them three-dimensionally. The advantage of using layered materials (LMs) in RS devices compared to traditional phase-change materials and metal oxides is that their electrical properties can be adjusted with a higher precision. Here, the key figures-of-merit and procedures to implement LM-based RS devices are defined. LM-based RS devices fabricated using methods compatible with industry are identified and discussed. The focus is on small devices (size < 9 µm2 ) arranged in crossbar structures, since larger devices may be affected by artifacts, such as grain boundaries and flake junctions. How to enhance device performance, so to accelerate the development of this technology, is also discussed.
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Affiliation(s)
- Mario Lanza
- Physical Sciences and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
| | - Fei Hui
- School of Materials Science and Engineering, The Key Laboratory of Material, Processing and Mold of the Ministry of Education, Henan Key Laboratory of Advanced, Nylon Materials and Application, Zhengzhou University, Zhengzhou, 450001, P. R. China
| | - Chao Wen
- Cambridge Graphene Centre, University of Cambridge, Cambridge, CB3 0FA, UK
| | - Andrea C Ferrari
- Cambridge Graphene Centre, University of Cambridge, Cambridge, CB3 0FA, UK
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38
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Yan X, Qian JH, Sangwan VK, Hersam MC. Progress and Challenges for Memtransistors in Neuromorphic Circuits and Systems. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2108025. [PMID: 34813677 DOI: 10.1002/adma.202108025] [Citation(s) in RCA: 32] [Impact Index Per Article: 10.7] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/07/2021] [Revised: 11/07/2021] [Indexed: 06/13/2023]
Abstract
Due to the increasing importance of artificial intelligence (AI), significant recent effort has been devoted to the development of neuromorphic circuits that seek to emulate the energy-efficient information processing of the brain. While non-volatile memory (NVM) based on resistive switches, phase-change memory, and magnetic tunnel junctions has shown potential for implementing neural networks, additional multi-terminal device concepts are required for more sophisticated bio-realistic functions. Of particular interest are memtransistors based on low-dimensional nanomaterials, which are capable of electrostatically tuning memory and learning behavior at the device level. Herein, a conceptual overview of the memtransistor is provided in the context of neuromorphic circuits. Recent progress is surveyed for memtransistors and related multi-terminal NVM devices including dual-gated floating-gate memories, dual-gated ferroelectric transistors, and dual-gated van der Waals heterojunctions. The different materials systems and device architectures are classified based on the degree of control and relative tunability of synaptic behavior, with an emphasis on device concepts that harness the reduced dimensionality, weak electrostatic screening, and phase-changes properties of nanomaterials. Finally, strategies for achieving wafer-scale integration of memtransistors and multi-terminal NVM devices are delineated, with specific attention given to the materials challenges for practical neuromorphic circuits.
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Affiliation(s)
- Xiaodong Yan
- Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA
| | - Justin H Qian
- Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA
| | - Vinod K Sangwan
- Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA
| | - Mark C Hersam
- Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA
- Department of Electrical and Computer Engineering, Northwestern University, Evanston, IL, 60208, USA
- Department of Chemistry, Northwestern University, Evanston, IL, 60208, USA
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39
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Liu K, Dang B, Zhang T, Yang Z, Bao L, Xu L, Cheng C, Huang R, Yang Y. Multilayer Reservoir Computing Based on Ferroelectric α-In 2 Se 3 for Hierarchical Information Processing. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2108826. [PMID: 35064981 DOI: 10.1002/adma.202108826] [Citation(s) in RCA: 35] [Impact Index Per Article: 11.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/02/2021] [Revised: 01/10/2022] [Indexed: 06/14/2023]
Abstract
Dynamic physical systems such as reservoir computing (RC) architectures show a great prospect in temporal information processing, whereas hierarchical information processing capability is still lacking due to the absence of advanced multilayer reservoir elements. Here, a stackable reservoir system is constructed based on ferroelectric α-In2 Se3 devices with voltage input and output, which is realized by dynamic voltage division between a ferroelectric field-effect transistor and a planar device and therefore allows the reservoirs to cascade, enabling multilayer RC. Fast Fourier transformation analysis shows high-harmonic generation in the first layer as a result of inherent nonlinearity of the reservoir, and progressive low-pass filtering effect is realized where higher-frequency components are progressively filtered in deeper-layer RCs. Time-series prediction and waveform classification tasks are also demonstrated, serving as evidence for the memory capacity and computing capability of the deep reservoir architecture. This work can provide a promising pathway in exploiting emerging 2D materials and dynamics for advanced neuromorphic computing architectures.
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Affiliation(s)
- Keqin Liu
- Key Laboratory of Microelectronic Devices and Circuits (MOE), School of Integrated Circuits, Peking University, Beijing, 100871, China
| | - Bingjie Dang
- Key Laboratory of Microelectronic Devices and Circuits (MOE), School of Integrated Circuits, Peking University, Beijing, 100871, China
| | - Teng Zhang
- Key Laboratory of Microelectronic Devices and Circuits (MOE), School of Integrated Circuits, Peking University, Beijing, 100871, China
| | - Zhen Yang
- Key Laboratory of Microelectronic Devices and Circuits (MOE), School of Integrated Circuits, Peking University, Beijing, 100871, China
| | - Lin Bao
- Key Laboratory of Microelectronic Devices and Circuits (MOE), School of Integrated Circuits, Peking University, Beijing, 100871, China
| | - Liying Xu
- Key Laboratory of Microelectronic Devices and Circuits (MOE), School of Integrated Circuits, Peking University, Beijing, 100871, China
| | - Caidie Cheng
- Key Laboratory of Microelectronic Devices and Circuits (MOE), School of Integrated Circuits, Peking University, Beijing, 100871, China
| | - Ru Huang
- Key Laboratory of Microelectronic Devices and Circuits (MOE), School of Integrated Circuits, Peking University, Beijing, 100871, China
- Center for Brain Inspired Chips, Institute for Artificial Intelligence, Peking University, Beijing, 100871, China
- Center for Brain Inspired Intelligence, Chinese Institute for Brain Research (CIBR), Beijing, 102206, China
| | - Yuchao Yang
- Key Laboratory of Microelectronic Devices and Circuits (MOE), School of Integrated Circuits, Peking University, Beijing, 100871, China
- Center for Brain Inspired Chips, Institute for Artificial Intelligence, Peking University, Beijing, 100871, China
- Center for Brain Inspired Intelligence, Chinese Institute for Brain Research (CIBR), Beijing, 102206, China
- Beijing Academy of Artificial Intelligence, Beijing, 100084, China
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40
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Wang S, Liu X, Zhou P. The Road for 2D Semiconductors in the Silicon Age. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2106886. [PMID: 34741478 DOI: 10.1002/adma.202106886] [Citation(s) in RCA: 61] [Impact Index Per Article: 20.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/31/2021] [Revised: 10/21/2021] [Indexed: 06/13/2023]
Abstract
Continued reduction in transistor size can improve the performance of silicon integrated circuits (ICs). However, as Moore's law approaches physical limits, high-performance growth in silicon ICs becomes unsustainable, due to challenges of scaling, energy efficiency, and memory limitations. The ultrathin layers, diverse band structures, unique electronic properties, and silicon-compatible processes of 2D materials create the potential to consistently drive advanced performance in ICs. Here, the potential of fusing 2D materials with silicon ICs to minimize the challenges in silicon ICs, and to create technologies beyond the von Neumann architecture, is presented, and the killer applications for 2D materials in logic and memory devices to ease scaling, energy efficiency bottlenecks, and memory dilemmas encountered in silicon ICs are discussed. The fusion of 2D materials allows the creation of all-in-one perception, memory, and computation technologies beyond the von Neumann architecture to enhance system efficiency and remove computing power bottlenecks. Progress on the 2D ICs demonstration is summarized, as well as the technical hurdles it faces in terms of wafer-scale heterostructure growth, transfer, and compatible integration with silicon ICs. Finally, the promising pathways and obstacles to the technological advances in ICs due to the integration of 2D materials with silicon are presented.
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Affiliation(s)
- Shuiyuan Wang
- ASIC & System State Key Lab, School of Microelectronics, Fudan University, Shanghai, 200433, China
| | - Xiaoxian Liu
- ASIC & System State Key Lab, School of Microelectronics, Fudan University, Shanghai, 200433, China
| | - Peng Zhou
- ASIC & System State Key Lab, School of Microelectronics, Fudan University, Shanghai, 200433, China
- Frontier Institute of Chip and System, Shanghai Frontier Base of Intelligent Optoelectronics and Perception, Institute of Optoelectronics, Fudan University, Shanghai, 200433, China
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41
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Xue F, Zhang C, Ma Y, Wen Y, He X, Yu B, Zhang X. Integrated Memory Devices Based on 2D Materials. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2201880. [PMID: 35557021 DOI: 10.1002/adma.202201880] [Citation(s) in RCA: 28] [Impact Index Per Article: 9.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/27/2022] [Revised: 05/07/2022] [Indexed: 06/15/2023]
Abstract
With the advent of the Internet of Things and big data, massive data must be rapidly processed and stored within a short timeframe. This imposes stringent requirements on memory hardware implementation in terms of operation speed, energy consumption, and integration density. To fulfill these demands, 2D materials, which are excellent electronic building blocks, provide numerous possibilities for developing advanced memory device arrays with high performance, smart computing architectures, and desirable downscaling. Over the past few years, 2D-material-based memory-device arrays with different working mechanisms, including defects, filaments, charges, ferroelectricity, and spins, have been increasingly developed. These arrays can be used to implement brain-inspired computing or sensing with extraordinary performance, architectures, and functionalities. Here, recent research into integrated, state-of-the-art memory devices made from 2D materials, as well as their implications for brain-inspired computing are surveyed. The existing challenges at the array level are discussed, and the scope for future research is presented.
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Affiliation(s)
- Fei Xue
- Physical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, 23955-6900, Saudi Arabia
- ZJU-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou, 310020, P. R. China
- School of Micro-Nano Electronics, Zhejiang University, Hangzhou, 311200, P. R. China
| | - Chenhui Zhang
- Physical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, 23955-6900, Saudi Arabia
| | - Yinchang Ma
- Physical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, 23955-6900, Saudi Arabia
| | - Yan Wen
- Physical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, 23955-6900, Saudi Arabia
| | - Xin He
- Physical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, 23955-6900, Saudi Arabia
| | - Bin Yu
- ZJU-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou, 310020, P. R. China
- School of Micro-Nano Electronics, Zhejiang University, Hangzhou, 311200, P. R. China
| | - Xixiang Zhang
- Physical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, 23955-6900, Saudi Arabia
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42
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Chen Y, Li D, Ren H, Tang Y, Liang K, Wang Y, Li F, Song C, Guan J, Chen Z, Lu X, Xu G, Li W, Liu S, Zhu B. Highly Linear and Symmetric Synaptic Memtransistors Based on Polarization Switching in Two-Dimensional Ferroelectric Semiconductors. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2022; 18:e2203611. [PMID: 36156393 DOI: 10.1002/smll.202203611] [Citation(s) in RCA: 7] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/10/2022] [Revised: 09/01/2022] [Indexed: 06/16/2023]
Abstract
Brain-inspired neuromorphic computing hardware based on artificial synapses offers efficient solutions to perform computational tasks. However, the nonlinearity and asymmetry of synaptic weight updates in reported artificial synapses have impeded achieving high accuracy in neural networks. Here, this work develops a synaptic memtransistor based on polarization switching in a two-dimensional (2D) ferroelectric semiconductor (FES) of α-In2 Se3 for neuromorphic computing. The α-In2 Se3 memtransistor exhibits outstanding synaptic characteristics, including near-ideal linearity and symmetry and a large number of programmable conductance states, by taking the advantages of both memtransistor configuration and electrically configurable polarization states in the FES channel. As a result, the α-In2 Se3 memtransistor-type synapse reaches high accuracy of 97.76% for digit patterns recognition task in simulated artificial neural networks. This work opens new opportunities for using multiterminal FES memtransistors in advanced neuromorphic electronics.
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Affiliation(s)
- Yitong Chen
- School of Materials and Engineering, Zhejiang University, Hangzhou, 310027, China
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou, 310024, China
| | - Dingwei Li
- School of Materials and Engineering, Zhejiang University, Hangzhou, 310027, China
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou, 310024, China
| | - Huihui Ren
- School of Materials and Engineering, Zhejiang University, Hangzhou, 310027, China
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou, 310024, China
| | - Yingjie Tang
- School of Materials and Engineering, Zhejiang University, Hangzhou, 310027, China
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou, 310024, China
| | - Kun Liang
- School of Materials and Engineering, Zhejiang University, Hangzhou, 310027, China
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou, 310024, China
| | - Yan Wang
- School of Materials and Engineering, Zhejiang University, Hangzhou, 310027, China
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou, 310024, China
| | - Fanfan Li
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou, 310024, China
| | - Chunyan Song
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou, 310024, China
| | - Jiaqi Guan
- Instrumentation and Service Centre for Physical Sciences, Westlake University, Hangzhou, 310024, China
| | - Zhong Chen
- Instrumentation and Service Centre for Molecular Sciences, Westlake University, Hangzhou, 310024, China
| | - Xingyu Lu
- Instrumentation and Service Centre for Molecular Sciences, Westlake University, Hangzhou, 310024, China
| | - Guangwei Xu
- School of Microelectronics, University of Science and Technology of China, Hefei, 230026, China
| | - Wenbin Li
- Institute of Advanced Technology, Westlake Institute for Advanced Study, Hangzhou, 310024, China
| | - Shi Liu
- School of Science, Westlake University, Hangzhou, Zhejiang, 310024, China
| | - Bowen Zhu
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou, 310024, China
- Institute of Advanced Technology, Westlake Institute for Advanced Study, Hangzhou, 310024, China
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43
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Jin T, Mao J, Gao J, Han C, Loh KP, Wee ATS, Chen W. Ferroelectrics-Integrated Two-Dimensional Devices toward Next-Generation Electronics. ACS NANO 2022; 16:13595-13611. [PMID: 36099580 DOI: 10.1021/acsnano.2c07281] [Citation(s) in RCA: 29] [Impact Index Per Article: 9.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
Ferroelectric materials play an important role in a wide spectrum of semiconductor technologies and device applications. Two-dimensional (2D) van der Waals (vdW) ferroelectrics with surface-insensitive ferroelectricity that is significantly different from their traditional bulk counterparts have further inspired intensive interest. Integration of ferroelectrics into 2D-layered-material-based devices is expected to offer intriguing working principles and add desired functionalities for next-generation electronics. Herein, fundamental properties of ferroelectric materials that are compatible with 2D devices are introduced, followed by a critical review of recent advances on the integration of ferroelectrics into 2D devices. Representative device architectures and corresponding working mechanisms are discussed, such as ferroelectrics/2D semiconductor heterostructures, 2D ferroelectric tunnel junctions, and 2D ferroelectric diodes. By leveraging the favorable properties of ferroelectrics, a variety of functional 2D devices including ferroelectric-gated negative capacitance field-effect transistors, programmable devices, nonvolatile memories, and neuromorphic devices are highlighted, where the application of 2D vdW ferroelectrics is particularly emphasized. This review provides a comprehensive understanding of ferroelectrics-integrated 2D devices and discusses the challenges of applying them into commercial electronic circuits.
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Affiliation(s)
- Tengyu Jin
- Joint School of National University of Singapore and Tianjin University, International Campus of Tianjin University, Binhai New City, Fuzhou 350207, P. R. China
- Department of Physics, National University of Singapore, Singapore 117542, Singapore
| | - Jingyu Mao
- Department of Physics, National University of Singapore, Singapore 117542, Singapore
| | - Jing Gao
- Department of Physics, National University of Singapore, Singapore 117542, Singapore
| | - Cheng Han
- SZU-NUS Collaborative Innovation Center for Optoelectronic Science & Technology, International Collaborative Laboratory of 2D Materials for Optoelectronics Science and Technology of Ministry of Education, Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen 518060, P. R. China
| | - Kian Ping Loh
- Joint School of National University of Singapore and Tianjin University, International Campus of Tianjin University, Binhai New City, Fuzhou 350207, P. R. China
- Department of Chemistry, National University of Singapore, Singapore 117543, Singapore
| | - Andrew T S Wee
- Department of Physics, National University of Singapore, Singapore 117542, Singapore
| | - Wei Chen
- Joint School of National University of Singapore and Tianjin University, International Campus of Tianjin University, Binhai New City, Fuzhou 350207, P. R. China
- Department of Physics, National University of Singapore, Singapore 117542, Singapore
- Department of Chemistry, National University of Singapore, Singapore 117543, Singapore
- National University of Singapore (Suzhou) Research Institute, 377 Lin Quan Street, Suzhou Industrial Park, Suzhou 215123, P. R. China
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44
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Wan S, Peng Q, Wu Z, Zhou Y. Nonvolatile Ferroelectric Memory with Lateral β/α/β In 2Se 3 Heterojunctions. ACS APPLIED MATERIALS & INTERFACES 2022; 14:25693-25700. [PMID: 35623065 DOI: 10.1021/acsami.2c04032] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
The electric dipole locking effect observed in van der Waals (vdW) ferroelectric α-In2Se3 has resulted in a surge of applied research in electronics with nonvolatile functionality. However, ferroelectric tunnel junctions with advantages of lower power consumption and faster writing/reading operations have not been realized in α-In2Se3. Here, we demonstrate the tunneling electroresistance effect in a lateral β/α/β In2Se3 heterojunction built by local laser irradiation. Switchable in-plane polarizations of the vdW ferroelectric control the tunneling conductance of the heterojunction device by 4000% of magnitude. The electronic logic bit can be represented and stored with different orientations of electric dipoles. This prototype enables a new approach to rewritable nonvolatile memory with in-plane ferroelectricity in vdW 2D materials.
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Affiliation(s)
- Siyuan Wan
- School of Physics and Materials Science, Nanchang University, Nanchang 330031, China
- Jiangxi Key Laboratory for Two-dimensional Materials and Devices, Nanchang University, Nanchang 330031, China
| | - Qi Peng
- School of Physics and Materials Science, Nanchang University, Nanchang 330031, China
- Jiangxi Key Laboratory for Two-dimensional Materials and Devices, Nanchang University, Nanchang 330031, China
| | - Ziyu Wu
- School of Physics and Materials Science, Nanchang University, Nanchang 330031, China
- Jiangxi Key Laboratory for Two-dimensional Materials and Devices, Nanchang University, Nanchang 330031, China
| | - Yangbo Zhou
- School of Physics and Materials Science, Nanchang University, Nanchang 330031, China
- Jiangxi Key Laboratory for Two-dimensional Materials and Devices, Nanchang University, Nanchang 330031, China
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45
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Xu X, Zhong T, Zuo N, Li Z, Li D, Pi L, Chen P, Wu M, Zhai T, Zhou X. High- TC Two-Dimensional Ferroelectric CuCrS 2 Grown via Chemical Vapor Deposition. ACS NANO 2022; 16:8141-8149. [PMID: 35441509 DOI: 10.1021/acsnano.2c01470] [Citation(s) in RCA: 21] [Impact Index Per Article: 7.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
Two-dimensional (2D) ferroelectrics have attracted intensive attention. However, the 2D ferroelectrics remain rare, and especially few of them represent high ferroelectric transition temperature (TC), which is important for the usability of ferroelectrics. Herein, CuCrS2 nanoflakes are synthesized by salt-assisted chemical vapor deposition and exhibit switchable ferroelectric polarization even when the thickness is downscaled to 6 nm. On the contrary, a CuCrS2 nanoflake shows a TC as high as ∼700 K, which can be attributed to the robust tetrahedral bonding configurations of Cu cations. Such robustness can be further clarified by a theoretically predicted high order-disorder transition barrier and structure evolution from 600 to 800 K. Additionally, the interlocked out-of-plane (OOP) and in-plane (IP) ferroelectric domains are observed and two kinds of devices based on OOP and IP polarizations are demonstrated.
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Affiliation(s)
- Xiang Xu
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, P. R. China
| | - Tingting Zhong
- Department of Physics, Zhejiang Sci-Tech University, Hangzhou 310018, P. R. China
| | - Nian Zuo
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, P. R. China
| | - Zexin Li
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, P. R. China
| | - Dongyan Li
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, P. R. China
| | - Lejing Pi
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, P. R. China
| | - Ping Chen
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, P. R. China
| | - Menghao Wu
- School of Physics, Huazhong University of Science and Technology, Wuhan 430074, P. R. China
| | - Tianyou Zhai
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, P. R. China
| | - Xing Zhou
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, P. R. China
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46
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Xue W, Jiang Q, Wang F, He R, Pang R, Yang H, Wang P, Yang R, Zhong Z, Zhai T, Xu X. Discovery of Robust Ferroelectricity in 2D Defective Semiconductor α-Ga 2 Se 3. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2022; 18:e2105599. [PMID: 34881497 DOI: 10.1002/smll.202105599] [Citation(s) in RCA: 12] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/17/2021] [Revised: 11/15/2021] [Indexed: 06/13/2023]
Abstract
2D ferroelectrics with robust polar order in the atomic-scale thickness at room temperature are needed to miniaturize ferroelectric devices and tackle challenges imposed by traditional ferroelectrics. These materials usually have polar point group structure regarding as a prerequisite of ferroelectricity. Yet, to introduce polar structure into otherwise nonpolar 2D materials for producing ferroelectricity remains a challenge. Here, by combining first-principles calculations and experimental studies, it is reported that the native Ga vacancy-defects located in the asymmetrical sites in cubic defective semiconductor α-Ga2 Se3 can induce polar structure. Meanwhile, the induced polarization can be switched in a moderate energy barrier. The switched polarization is observed in 2D α-Ga2 Se3 nanoflakes of ≈4 nm with a high switching temperature up to 450 K. Such polarization switching could arise from the displacement of Ga vacancy between neighboring asymmetrical sites by applying an electric field. This work removes the point group limit for ferroelectricity, expanding the range of 2D ferroelectrics into the native defective semiconductors.
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Affiliation(s)
- Wuhong Xue
- Key Laboratory of Magnetic Molecules and Magnetic Information Materials of Ministry of Education, School of Chemistry and Materials Science, Shanxi Normal University, Linfen, 041004, China
| | - Qitao Jiang
- Key Laboratory of Magnetic Molecules and Magnetic Information Materials of Ministry of Education, School of Chemistry and Materials Science, Shanxi Normal University, Linfen, 041004, China
| | - Fakun Wang
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, China
| | - Ri He
- Key Laboratory of Magnetic Materials Devices & Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, 315201, China
| | - Ruixue Pang
- Key Laboratory of Magnetic Molecules and Magnetic Information Materials of Ministry of Education, School of Chemistry and Materials Science, Shanxi Normal University, Linfen, 041004, China
| | - Huali Yang
- Key Laboratory of Magnetic Materials Devices & Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, 315201, China
| | - Peng Wang
- Key Laboratory of Magnetic Molecules and Magnetic Information Materials of Ministry of Education, School of Chemistry and Materials Science, Shanxi Normal University, Linfen, 041004, China
| | - Ruilong Yang
- Key Laboratory of Magnetic Molecules and Magnetic Information Materials of Ministry of Education, School of Chemistry and Materials Science, Shanxi Normal University, Linfen, 041004, China
| | - Zhicheng Zhong
- Key Laboratory of Magnetic Materials Devices & Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, 315201, China
| | - Tianyou Zhai
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, China
| | - Xiaohong Xu
- Key Laboratory of Magnetic Molecules and Magnetic Information Materials of Ministry of Education, School of Chemistry and Materials Science, Shanxi Normal University, Linfen, 041004, China
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47
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Atomically Thin 2D van der Waals Magnetic Materials: Fabrications, Structure, Magnetic Properties and Applications. COATINGS 2022. [DOI: 10.3390/coatings12020122] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/16/2022]
Abstract
Two-dimensional (2D) van der Waals (vdW) magnetic materials are considered to be ideal candidates for the fabrication of spintronic devices because of their low dimensionality, allowing the quantization of electronic states and more degrees of freedom for device modulation. With the discovery of few-layer Cr2Ge2Te6 and monolayer CrI3 ferromagnets, the magnetism of 2D vdW materials is becoming a research focus in the fields of material science and physics. In theory, taking the Heisenberg model with finite-range exchange interactions as an example, low dimensionality and ferromagnetism are in competition. In other words, it is difficult for 2D materials to maintain their magnetism. However, the introduction of anisotropy in 2D magnetic materials enables the realization of long-range ferromagnetic order in atomically layered materials, which may offer new effective means for the design of 2D ferromagnets with high Curie temperature. Herein, current advances in the field of 2D vdW magnetic crystals, as well as intrinsic and induced ferromagnetism or antiferromagnetism, physical properties, device fabrication, and potential applications, are briefly summarized and discussed.
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Mukherjee S, Koren E. Indium Selenide (In
2
Se
3
) – An Emerging Van‐der‐Waals Material for Photodetection and Non‐Volatile Memory Applications. Isr J Chem 2022. [DOI: 10.1002/ijch.202100112] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/11/2022]
Affiliation(s)
- Subhrajit Mukherjee
- Nanoscale Electronic Materials & Devices Laboratory, Faculty of Materials Science and Engineering, Technion – Israel Institute of Technology 3200003 Haifa Israel
| | - Elad Koren
- Nanoscale Electronic Materials & Devices Laboratory, Faculty of Materials Science and Engineering, Technion – Israel Institute of Technology 3200003 Haifa Israel
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Hao S, Zhong S, Ji X, Pang KY, Wang N, Li H, Jiang Y, Lim KG, Chong TC, Zhao R, Loke DK. Activating Silent Synapses in Sulfurized Indium Selenide for Neuromorphic Computing. ACS APPLIED MATERIALS & INTERFACES 2021; 13:60209-60215. [PMID: 34878241 DOI: 10.1021/acsami.1c19062] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
The transformation from silent to functional synapses is accompanied by the evolutionary process of human brain development and is essential to hardware implementation of the evolutionary artificial neural network but remains a challenge for mimicking silent to functional synapse activation. Here, we developed a simple approach to successfully realize activation of silent to functional synapses by controlled sulfurization of chemical vapor deposition-grown indium selenide crystals. The underlying mechanism is attributed to the migration of sulfur anions introduced by sulfurization. One of our most important findings is that the functional synaptic behaviors can be modulated by the degree of sulfurization and temperature. In addition, the essential synaptic behaviors including potentiation/depression, paired-pulse facilitation, and spike-rate-dependent plasticity are successfully implemented in the partially sulfurized functional synaptic device. The developed simple approach of introducing sulfur anions in layered selenide opens an effective new avenue to realize activation of silent synapses for application in evolutionary artificial neural networks.
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Affiliation(s)
- Song Hao
- Department of Engineering Product Design, Singapore University of Technology and Design, 8 Somapah Road, 487372 Singapore
- Department of Science, Mathematics and Technology, Singapore University of Technology and Design, 8 Somapah Road, 487372 Singapore
| | - Shuai Zhong
- Department of Precision Instrument, Center for Brain Inspired Computing Research, Beijing Innovation Center for Future Chip, Tsinghua University, Beijing 100084, China
| | - Xinglong Ji
- Department of Precision Instrument, Center for Brain Inspired Computing Research, Beijing Innovation Center for Future Chip, Tsinghua University, Beijing 100084, China
| | - Khin Yin Pang
- Department of Engineering Product Design, Singapore University of Technology and Design, 8 Somapah Road, 487372 Singapore
| | - Nan Wang
- Department of Science, Mathematics and Technology, Singapore University of Technology and Design, 8 Somapah Road, 487372 Singapore
| | - Huimin Li
- Department of Engineering Product Design, Singapore University of Technology and Design, 8 Somapah Road, 487372 Singapore
| | - Yu Jiang
- Department of Engineering Product Design, Singapore University of Technology and Design, 8 Somapah Road, 487372 Singapore
| | - Kian Guan Lim
- Department of Engineering Product Design, Singapore University of Technology and Design, 8 Somapah Road, 487372 Singapore
| | - Tow Chong Chong
- Department of Engineering Product Design, Singapore University of Technology and Design, 8 Somapah Road, 487372 Singapore
| | - Rong Zhao
- Department of Precision Instrument, Center for Brain Inspired Computing Research, Beijing Innovation Center for Future Chip, Tsinghua University, Beijing 100084, China
| | - Desmond K Loke
- Department of Science, Mathematics and Technology, Singapore University of Technology and Design, 8 Somapah Road, 487372 Singapore
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Unraveling the origin of ferroelectric resistance switching through the interfacial engineering of layered ferroelectric-metal junctions. Nat Commun 2021; 12:7291. [PMID: 34911970 PMCID: PMC8674284 DOI: 10.1038/s41467-021-27617-6] [Citation(s) in RCA: 9] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/16/2021] [Accepted: 12/02/2021] [Indexed: 11/22/2022] Open
Abstract
Ferroelectric memristors have found extensive applications as a type of nonvolatile resistance switching memories in information storage, neuromorphic computing, and image recognition. Their resistance switching mechanisms are phenomenally postulated as the modulation of carrier transport by polarization control over Schottky barriers. However, for over a decade, obtaining direct, comprehensive experimental evidence has remained scarce. Here, we report an approach to experimentally demonstrate the origin of ferroelectric resistance switching using planar van der Waals ferroelectric α-In2Se3 memristors. Through rational interfacial engineering, their initial Schottky barrier heights and polarization screening charges at both terminals can be delicately manipulated. This enables us to find that ferroelectric resistance switching is determined by three independent variables: ferroelectric polarization, Schottky barrier variation, and initial barrier height, as opposed to the generally reported explanation. Inspired by these findings, we demonstrate volatile and nonvolatile ferroelectric memristors with large on/off ratios above 104. Our work can be extended to other planar long-channel and vertical ultrashort-channel ferroelectric memristors to reveal their ferroelectric resistance switching regimes and improve their performances. The mechanism of ferroelectric resistance switching is still under debate. Here, the authors propose an interfacial engineering approach to demonstrate its origin and find that it is governed by three independent variables: polarization, barrier change, and initial barrier.
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