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Li H, Wang X, Ma M, Wei Q, Zhu M, Zhou Q, Fu T, Peng J, Liu P, Ning Z, Zhu Z. Endogenous Intermediate Template Guided Crystallization for High Performance FAPbCl 3 UV Detector. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2025:e2501957. [PMID: 40317842 DOI: 10.1002/smll.202501957] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/15/2025] [Revised: 04/07/2025] [Indexed: 05/07/2025]
Abstract
Lead-chloride perovskite is a promising candidate for the active layer of UV detectors. However, due to the high ionic character of chloride compound, it is difficult to form a ligand-lead adduct that guides the crystallization of perovskite, resulting in poor film quality and device performance. Herein, an endogenous intermediate template strategy is developed to guide the crystallization of lead-chloride perovskite FAPbCl3 (FA = formamidine). Based on the enrichment of hydrogen bonds between ligands, a low dimensional N-Pb-O adduct FAPbCl3-DMSO (DMSO = dimethyl sulfoxide) is observed in precursor liquid. This results in the endogenous formation, not the external introduction of low dimensional FAxPbCly (x>1, y>3) intermediate phase, serving as a crystallization template guiding the oriented growth of FAPbCl3 perovskite film with large and closely packed grain. As a result, the film shows much stronger PL intensity and significantly reduced defect density. Therefore, a self-driven lead-chloride perovskite UV detector is realized with responsivity, detectivity and response time of 0.63 A W-1, 1.3 × 1013 Jones, and 205/53 µs at 365 nm and zero bias. Furthermore, for the first time, a uniform 64 × 64 lead-chloride perovskite UV array detector is successfully fabricated and achieves a promising image sensing function.
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Affiliation(s)
- Hansheng Li
- College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, 410073, China
- Nanhu Laser Laboratory, National University of Defense Technology, Changsha, 410073, China
| | - Xuan Wang
- College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, 410073, China
| | - Mingyu Ma
- School of Physical Science and Technology, ShanghaiTech University, Shanghai, 201210, China
| | - Qi Wei
- The Guangdong Institute of Intelligence Science and Technology, Zhuhai, 519031, China
| | - Mengjian Zhu
- College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, 410073, China
- Nanhu Laser Laboratory, National University of Defense Technology, Changsha, 410073, China
| | - Qingwei Zhou
- College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, 410073, China
- Nanhu Laser Laboratory, National University of Defense Technology, Changsha, 410073, China
| | - Tingzhao Fu
- College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, 410073, China
- Nanhu Laser Laboratory, National University of Defense Technology, Changsha, 410073, China
| | - Jialong Peng
- College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, 410073, China
- Nanhu Laser Laboratory, National University of Defense Technology, Changsha, 410073, China
| | - Ping Liu
- College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, 410073, China
- Nanhu Laser Laboratory, National University of Defense Technology, Changsha, 410073, China
| | - Zhijun Ning
- School of Physical Science and Technology, ShanghaiTech University, Shanghai, 201210, China
| | - Zhihong Zhu
- College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, 410073, China
- Nanhu Laser Laboratory, National University of Defense Technology, Changsha, 410073, China
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Karagiorgis X, Nair NM, Sandhu S, Dahiya AS, Skabara PJ, Dahiya R. Fully degradable, transparent, and flexible photodetectors using ZnO nanowires and PEDOT:PSS based nanofibres. NPJ FLEXIBLE ELECTRONICS 2025; 9:22. [PMID: 40078828 PMCID: PMC11893464 DOI: 10.1038/s41528-025-00385-9] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 06/11/2024] [Accepted: 02/09/2025] [Indexed: 03/14/2025]
Abstract
Transparent light detection devices are attractive for emerging see-through applications such as augmented reality, smart windows and optical communications using light fidelity (Li-Fi). Herein, we present flexible and transparent photodetectors (PDs) using conductive poly(3,4-ethylenedioxythiophene): polystyrene sulfonate (PEDOT:PSS): Ag nanowires (NWs) based nanofibres and zinc oxide (ZnO) NWs on a transparent and degradable cellulose acetate (CA) substrate. The electrospun (PEDOT:PSS): Ag NW-based nanofibres exhibit a sheet resistance of 11 Ω/sq and optical transmittance of 79% (at 550 nm of wavelength). The PDs comprise of ZnO NWs, as photosensitive materials, bridging the electrode based on conductive nanofibres on CA substrate. The developed PDs exhibit high responsivity (1.10 ×106 A/W) and show excellent stability under dynamic exposure to ultraviolet (UV) light, and on both flat and curved surfaces. The eco-friendly PDs present here can degrade naturally at the end of life - thus offering an electronic waste-free solution for transparent electrodes and flexible optoelectronics applications.
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Affiliation(s)
- Xenofon Karagiorgis
- School of Engineering, University of Glasgow, Glasgow, G12 8QQ UK
- School of Chemistry, University of Glasgow, Glasgow, G12 8QQ UK
| | - Nitheesh M. Nair
- Institute of Smart Sensors, University of Stuttgart, Stuttgart, 70569 Germany
| | - Sofia Sandhu
- Bendable Electronics and Sustainable Technologies (BEST) Group, Northeastern University, Boston, MA 02115 USA
| | - Abhishek Singh Dahiya
- Bendable Electronics and Sustainable Technologies (BEST) Group, Northeastern University, Boston, MA 02115 USA
| | | | - Ravinder Dahiya
- Bendable Electronics and Sustainable Technologies (BEST) Group, Northeastern University, Boston, MA 02115 USA
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3
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Thomas AM, Vuong VH, Ippili S, Jella V, Yoon SG. Flexo-Phototronic Boosted Self-Powered Ultraviolet Detection in ZnAl:Layered Double Hydroxide Nanosheets/NiO Heterostructure. ACS APPLIED MATERIALS & INTERFACES 2024; 16:43795-43805. [PMID: 39118385 DOI: 10.1021/acsami.4c05210] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 08/10/2024]
Abstract
Developing self-powered and flexible optoelectronic sensors with high responsivity and speed is crucial for modern applications, motivating continuous efforts to enhance their performance. Flexo-phototronics is a less-explored but promising technique to elevate the performance of optoelectronics. Therefore, this work addresses the potential of utilizing the flexo-phototronic effect to enhance the performance of a flexible and self-powered ultraviolet photodetector (UV PD) based on ZnAl:LDH (layered double hydroxides) nanosheets (Ns)/NiO heterostructure. The vertically oriented ZnAl:LDH Ns are synthesized via a simple method involving the immersion of a sputtered 10% Al-doped ZnO thin film in deionized water at room ambient conditions. The fabricated PD exhibits an impressive response to 365 nm UV light, with high sensitivity in the order of 103. The device's photocurrent and responsivity are significantly enhanced by the flexo-phototronic effect, attributed to the flexoelectric properties of ZnAl:LDH Ns. Specifically, applying an inhomogeneous tensile strain of 2% boosted the device responsivity by 57.1% and improved its operational speed. Furthermore, a working model revealing the altered energy-band structure is demonstrated to elucidate the flexo-phototronic-induced boost in the photoresponse. The PD also demonstrated a sustainable performance under severe bending cycles, underlining the good flexibility of the device. The results presented in this study demonstrate a self-powered and flexible UV PD and provide a viable approach to augment the performance of optoelectronics through the flexo-phototronic effect.
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Affiliation(s)
- Alphi Maria Thomas
- Department of Materials Science and Engineering, Chungnam National University, Daedeok Science Town, 34134 Daejeon, Republic of Korea
| | - Van-Hoang Vuong
- Department of Materials Science and Engineering, Chungnam National University, Daedeok Science Town, 34134 Daejeon, Republic of Korea
| | - Swathi Ippili
- Department of Materials Science and Engineering, Chungnam National University, Daedeok Science Town, 34134 Daejeon, Republic of Korea
| | - Venkatraju Jella
- Department of Materials Science and Engineering, Chungnam National University, Daedeok Science Town, 34134 Daejeon, Republic of Korea
| | - Soon-Gil Yoon
- Department of Materials Science and Engineering, Chungnam National University, Daedeok Science Town, 34134 Daejeon, Republic of Korea
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Wen J, Wang Y, Zhang B, Chen R, Zhu H, Han X, Xiao H. High-Performance Ultraviolet Photodetectors Based on Nanoporous GaN with a Ga 2O 3 Single-Crystal Layer. NANOMATERIALS (BASEL, SWITZERLAND) 2024; 14:1165. [PMID: 38998770 PMCID: PMC11243192 DOI: 10.3390/nano14131165] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/08/2024] [Revised: 07/05/2024] [Accepted: 07/06/2024] [Indexed: 07/14/2024]
Abstract
The utilization of a nanoporous (NP) GaN fabricated by electrochemical etching has been demonstrated to be effective in the fabrication of a high-performance ultraviolet (UV) photodetector (PD). However, the NP-GaN PD typically exhibits a low light-dark current ratio and slow light response speed. In this study, we present three types of UV PDs based on an unetched GaN, NP-GaN distributed Bragg reflector (DBR), and NP-GaN-DBR with a Ga2O3 single-crystal film (Ga2O3/NP-GaN-DBR). The unetched GaN PD does not exhibit a significant photoresponse. Compared to the NP-GaN-DBR PD device, the Ga2O3/NP-GaN-DBR PD demonstrates a larger light-dark current ratio (6.14 × 103) and higher specific detectivity (8.9 × 1010 Jones) under 365 nm at 5 V bias due to its lower dark current (3.0 × 10-10 A). This reduction in the dark current can be attributed to the insertion of the insulating Ga2O3 between the metal and the NP-GaN-DBR, which provides a thicker barrier thickness and higher barrier height. Additionally, the Ga2O3/NP-GaN-DBR PD device exhibits shorter rise/decay times (0.33/0.23 s) than the NP-GaN-DBR PD, indicating that the growth of a Ga2O3 layer on the DBR effectively reduces the trap density within the NP-GaN DBR structure. Although the device with a Ga2O3 layer presents low photoresponsivity (0.1 A/W), it should be feasible to use Ga2O3 as a dielectric layer based on the above-mentioned reasons.
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Affiliation(s)
- Junjie Wen
- School of Integrated Circuits, Shandong University, Jinan 250100, China
| | - Yuankang Wang
- School of Integrated Circuits, Shandong University, Jinan 250100, China
| | - Biao Zhang
- School of Integrated Circuits, Shandong University, Jinan 250100, China
| | - Rongrong Chen
- School of Integrated Circuits, Shandong University, Jinan 250100, China
| | - Hongyan Zhu
- School of Integrated Circuits, Shandong University, Jinan 250100, China
| | - Xinyu Han
- School of Integrated Circuits, Shandong University, Jinan 250100, China
| | - Hongdi Xiao
- School of Integrated Circuits, Shandong University, Jinan 250100, China
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5
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Chang KC, Feng X, Duan X, Liu H, Liu Y, Peng Z, Lin X, Li L. Integrating ultraviolet sensing and memory functions in gallium nitride-based optoelectronic devices. NANOSCALE HORIZONS 2024; 9:1166-1174. [PMID: 38668875 DOI: 10.1039/d3nh00560g] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/25/2024]
Abstract
Optoelectronic devices present a promising avenue for emulating the human visual system. However, existing devices struggle to maintain optical image information after removing external stimuli, preventing the integration of image perception and memory. The development of optoelectronic memory devices offers a feasible solution to bridge this gap. Simultaneously, the artificial vision for perceiving and storing ultraviolet (UV) images is particularly important because UV light carries information imperceptible to the naked eye. This study introduces a multi-level UV optoelectronic memory based on gallium nitride (GaN), seamlessly integrating UV sensing and memory functions within a single device. The embedded SiO2 side-gates around source and drain regions effectively extend the lifetime of photo-generated carriers, enabling dual-mode storage of UV signals in terms of threshold voltage and ON-state current. The optoelectronic memory demonstrates excellent robustness with the retention time exceeding 4 × 104 s and programming/erasing cycles surpassing 1 × 105. Adjusting the gate voltage achieves five distinct storage states, each characterized by excellent retention, and efficiently modulates erasure times for rapid erasure. Furthermore, the integration of the GaN optoelectronic memory array successfully captures and stably stores specific UV images for over 7 days. The study marks a significant stride in optoelectronic memories, showcasing their potential in applications requiring prolonged retention.
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Affiliation(s)
- Kuan-Chang Chang
- School of Electronic and Computer Engineering, Peking University Shenzhen Graduate School, Shenzhen, 518055, China.
| | - Xibei Feng
- School of Electronic and Computer Engineering, Peking University Shenzhen Graduate School, Shenzhen, 518055, China.
| | - Xinqing Duan
- School of Electronic and Computer Engineering, Peking University Shenzhen Graduate School, Shenzhen, 518055, China.
| | - Huangbai Liu
- School of Electronic and Computer Engineering, Peking University Shenzhen Graduate School, Shenzhen, 518055, China.
| | - Yanxin Liu
- School of Electronic and Computer Engineering, Peking University Shenzhen Graduate School, Shenzhen, 518055, China.
| | - Zehui Peng
- School of Electronic and Computer Engineering, Peking University Shenzhen Graduate School, Shenzhen, 518055, China.
| | - Xinnan Lin
- Anhui Engineering Research Center of Vehicle Display Integrated Systems, Joint Discipline Key Laboratory of Touch Display Materials and Devices, School of Integrated Circuits, Anhui Polytechnic University, Wuhu 241000, China.
| | - Lei Li
- School of Electronic and Computer Engineering, Peking University Shenzhen Graduate School, Shenzhen, 518055, China.
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Xue J, Tong J, Gao Z, Chen Z, Fang H, Wang S, Zhi T, Wang J. Monolayer graphene/GaN heterostructure photodetector with UV-IR dual-wavelength photoresponses. FRONTIERS OF OPTOELECTRONICS 2024; 17:17. [PMID: 38847978 PMCID: PMC11161448 DOI: 10.1007/s12200-024-00121-7] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/18/2024] [Accepted: 05/14/2024] [Indexed: 06/10/2024]
Abstract
An ultraviolet-infrared (UV-IR) dual-wavelength photodetector (PD) based on a monolayer (ML) graphene/GaN heterostructure has been successfully fabricated in this work. The ML graphene was synthesized by chemical vapor deposition (CVD) and subsequently transferred onto GaN substrate using polymethylmethacrylate (PMMA). The morphological and optical properties of the as-prepared graphene and GaN were presented. The fabricated PD based on the graphene/GaN heterostructure exhibited excellent rectify behavior by measuring the current-voltage (I-V) characteristics under dark conditions, and the spectral response demonstrated that the device revealed an UV-IR dual-wavelength photoresponse. In addition, the energy band structure and absorption properties of the ML graphene/GaN heterostructure were theoretically investigated based on density functional theory (DFT) to explore the underlying physical mechanism of the two-dimensional (2D)/three-dimensional (3D) hybrid heterostructure PD device. This work paves the way for the development of innovative GaN-based dual-wavelength optoelectronic devices, offering a potential strategy for future applications in the field of advanced photodetection technology.
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Affiliation(s)
- Junjun Xue
- College of Electronic and Optical Engineering & College of Flexible Electronics (Future Technology), Nanjing University of Posts and Telecommunications, Nanjing, 210023, China
| | - Jiaming Tong
- College of Electronic and Optical Engineering & College of Flexible Electronics (Future Technology), Nanjing University of Posts and Telecommunications, Nanjing, 210023, China
| | - Zhujun Gao
- College of Electronic and Optical Engineering & College of Flexible Electronics (Future Technology), Nanjing University of Posts and Telecommunications, Nanjing, 210023, China
| | - Zhouyu Chen
- Portland Institute, Nanjing University of Posts and Telecommunications, Nanjing, 210023, China
| | - Haoyu Fang
- Portland Institute, Nanjing University of Posts and Telecommunications, Nanjing, 210023, China
| | - Saisai Wang
- College of Electronic and Optical Engineering & College of Flexible Electronics (Future Technology), Nanjing University of Posts and Telecommunications, Nanjing, 210023, China.
| | - Ting Zhi
- College of Electronic and Optical Engineering & College of Flexible Electronics (Future Technology), Nanjing University of Posts and Telecommunications, Nanjing, 210023, China
| | - Jin Wang
- College of Electronic and Optical Engineering & College of Flexible Electronics (Future Technology), Nanjing University of Posts and Telecommunications, Nanjing, 210023, China.
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7
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Du Y, Yin S, Li Y, Chen J, Shi D, Guo E, Zhang H, Wang Z, Qin Q, Zou C, Zhai T, Li L. Liquid-Metal-Assisted Synthesis of Patterned GaN Thin Films for High-Performance UV Photodetectors Array. SMALL METHODS 2024; 8:e2300175. [PMID: 37317014 DOI: 10.1002/smtd.202300175] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/10/2023] [Revised: 05/31/2023] [Indexed: 06/16/2023]
Abstract
GaN's outstanding physical characteristics allow for a wide range of applications in numerous industries. Although individual GaN-based ultraviolet (UV) photodetectors are the subject of in-depth research in recent decades, the demand for photodetectors array is rising as a result of advances in optoelectronic integration technology. However, as a prerequisite for constructing GaN-based photodetectors array, large-area, patterned synthesis of GaN thin films remains a certain challenge. This work presents a facile technique for pattern growing high-quality GaN thin films for the assembly of an array of high-performance UV photodetectors. This technique uses UV lithography, which is not only very compatible with common semiconductor manufacturing techniques, but also enables precise patterning modification. A typical detector has impressive photo-response performance under 365 nm irradiation, with an extremely low dark current of 40 pA, a high Ilight /Idark ratio over 105 , a high responsivity of 4.23 AW-1 , and a decent specific detectivity of 1.76 × 1012 Jones. Additional optoelectronic studies demonstrate the strong homogeneity and repeatability of the photodetectors array, enabling it to serve as a reliable UV image sensor with enough spatial resolution. These outcomes highlight the proposed patterning technique's enormous potential.
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Affiliation(s)
- Yuchen Du
- Information Materials and Intelligent Sensing Laboratory of Anhui Province, Institutes of Physical Science and Information Technology, Anhui University, Hefei, 230601, P. R. China
| | - Shiqi Yin
- Information Materials and Intelligent Sensing Laboratory of Anhui Province, Institutes of Physical Science and Information Technology, Anhui University, Hefei, 230601, P. R. China
| | - Ying Li
- Information Materials and Intelligent Sensing Laboratory of Anhui Province, Institutes of Physical Science and Information Technology, Anhui University, Hefei, 230601, P. R. China
| | - Jiawang Chen
- Key Laboratory of Materials Physics, Anhui Key Laboratory of Nanomaterials and Nanotechnology, Institute of Solid State Physics, Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei, 230031, P. R. China
| | - Dongfeng Shi
- Key Laboratory of Atmospheric Optics, Anhui Institute of Optics and Fine Mechanics, Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei, 230031, P. R. China
- Advanced Laser Technology Laboratory of Anhui Province, Hefei, 230037, P. R. China
| | - Erjuan Guo
- State Key Laboratory of Materials Processing and Die and Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, P. R. China
| | - Hui Zhang
- Information Materials and Intelligent Sensing Laboratory of Anhui Province, Institutes of Physical Science and Information Technology, Anhui University, Hefei, 230601, P. R. China
| | - Zihan Wang
- Information Materials and Intelligent Sensing Laboratory of Anhui Province, Institutes of Physical Science and Information Technology, Anhui University, Hefei, 230601, P. R. China
| | - Qinggang Qin
- Information Materials and Intelligent Sensing Laboratory of Anhui Province, Institutes of Physical Science and Information Technology, Anhui University, Hefei, 230601, P. R. China
| | - Chongwen Zou
- National Synchrotron Radiation Laboratory, University of Science & Technology of China, Hefei, 230029, P. R. China
| | - Tianyou Zhai
- State Key Laboratory of Materials Processing and Die and Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, P. R. China
| | - Liang Li
- Information Materials and Intelligent Sensing Laboratory of Anhui Province, Institutes of Physical Science and Information Technology, Anhui University, Hefei, 230601, P. R. China
- Key Laboratory of Materials Physics, Anhui Key Laboratory of Nanomaterials and Nanotechnology, Institute of Solid State Physics, Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei, 230031, P. R. China
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Hu T, Zhao L, Wang Y, Lin H, Xie S, Hu Y, Liu C, Zhu W, Wei Z, Liu J, Wang K. High-Sensitivity and Fast-Speed UV Photodetectors Based on Asymmetric Nanoporous-GaN/Graphene Vertical Junction. ACS NANO 2023; 17:8411-8419. [PMID: 37115108 DOI: 10.1021/acsnano.3c00263] [Citation(s) in RCA: 17] [Impact Index Per Article: 8.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/10/2023]
Abstract
GaN-based photodetectors are strongly desirable in many advanced fields, such as space communication, environmental monitoring, etc. However, the slow photo-response speed in currently reported high-sensitivity GaN-based photodetectors still hinders their applications. Here, we demonstrate a high-sensitivity and fast-speed UV photodetector based on asymmetric Au/nanoporous-GaN/graphene vertical junctions. The nanoporous GaN-based vertical photodetector shows an excellent rectification ratio up to ∼105 at +4 V/-4 V. The photo-responsivity and specific detectivity of the device is up to 1.01 × 104 A/W and 7.84 × 1014 Jones, respectively, more than three orders of magnitude higher than the control planar photodetector. With switching light on and off, the repeatable on/off current ratio of the nanoporous GaN-based vertical photodetector is ∼4.32 × 103, which is about 1.51 × 103 times to that of the control planar device. The measured rise/decay time is 12.2 μs/14.6 μs, which is the fastest value for the high-sensitivity GaN-based photodetectors to date. These results suggest that the asymmetric Au/nanoporous-GaN/graphene structure can improve the sensitivity and the photo-response speed of GaN-based PDs simultaneously.
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Affiliation(s)
- Tiangui Hu
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Lixia Zhao
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
- School of Electrical Engineering, Tiangong University, No. 399, Binshuixi Road, Xiqing District, Tianjin 300387, China
| | - Yujing Wang
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Hailong Lin
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Shihong Xie
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
- School of Physics and Astronomy, University of Nottingham, Nottingham NG7 2RD, United Kingdom
| | - Yin Hu
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Chang Liu
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
| | - Wenkai Zhu
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
| | - Zhongming Wei
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Jian Liu
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Kaiyou Wang
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
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9
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Wang S, Yang Z, Wang D, Tan C, Yang L, Wang Z. Strong Anisotropic Two-Dimensional In 2Se 3 for Light Intensity and Polarization Dual-Mode High-Performance Detection. ACS APPLIED MATERIALS & INTERFACES 2023; 15:3357-3364. [PMID: 36599121 DOI: 10.1021/acsami.2c19660] [Citation(s) in RCA: 9] [Impact Index Per Article: 4.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/17/2023]
Abstract
Detecting the light from different freedom is of great significance to gain more information. Two-dimensional (2D) materials with low intrinsic carrier concentration and highly tunable electronic structure have been considered as the promising candidate for future room-temperature multi-functional photodetectors. However, current investigations mainly focus on intensity-sensitive detection; the multi-dimensional photodetection such as polarization-sensitive photodetection is still in its early stage. Herein, the intensity- and polarization-sensitive photodetection based on α-In2Se3 is studied. By using angle-resolved polarized Raman spectroscopy, it is demonstrated that α-In2Se3 shows an anisotropic phonon vibration property indicating its asymmetric structure. The α-In2Se3-based photodetector has a photoelectric performance with a responsivity of 1936 A/W and a specific detectivity of 2.1 × 1013 Jones under 0.2 mW/cm2 power density at 400 nm. Moreover, by studying the polarized angle-resolved photoelectrical effect, it is found that the ratio of maximum and minimum photocurrent (dichroic ratio) reaches 1.47 at 650 nm suggesting good polarization-sensitive detection. After post-annealing, α-In2Se3 in situ converts to β-In2Se3 which has similar in-plane anisotropic crystallinity and exhibits a dichroic ratio of 1.41. It is found that the responsivity of β-In2Se3 is 6 A/W, much lower than that of α-In2Se3. The high-performance light intensity- and polarization-detection of α-In2Se3 enlarges the 2D anisotropic materials family and provides new opportunities for future dual-mode photodetection.
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Affiliation(s)
- Shaoyuan Wang
- College of Materials Science and Engineering, Sichuan University, Chengdu610065, China
| | - Zhihao Yang
- College of Materials Science and Engineering, Sichuan University, Chengdu610065, China
| | - Dong Wang
- College of Materials Science and Engineering, Sichuan University, Chengdu610065, China
| | - Chao Tan
- College of Materials Science and Engineering, Sichuan University, Chengdu610065, China
| | - Lei Yang
- College of Materials Science and Engineering, Sichuan University, Chengdu610065, China
| | - Zegao Wang
- College of Materials Science and Engineering, Sichuan University, Chengdu610065, China
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10
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FIB-Assisted Fabrication of Single Tellurium Nanotube Based High Performance Photodetector. MICROMACHINES 2021; 13:mi13010011. [PMID: 35056176 PMCID: PMC8778105 DOI: 10.3390/mi13010011] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 11/22/2021] [Revised: 12/16/2021] [Accepted: 12/20/2021] [Indexed: 01/28/2023]
Abstract
Nanoscale tellurium (Te) materials are promising for advanced optoelectronics owing to their outstanding photoelectrical properties. In this work, high-performance optoelectronic nanodevice based on a single tellurium nanotube (NT) was prepared by focused ion beam (FIB)-assisted technique. The individual Te NT photodetector demonstrates a high photoresponsivity of 1.65 × 104 AW−1 and a high photoconductivity gain of 5.0 × 106%, which shows great promise for further optoelectronic device applications.
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11
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Liu C, Li X, Hu T, Zhu W, Yan F, Wu T, Wang K, Zhao L. A nanopillar-modified high-sensitivity asymmetric graphene-GaN photodetector. NANOSCALE 2021; 13:17512-17520. [PMID: 34652361 DOI: 10.1039/d1nr04102a] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/21/2023]
Abstract
Integration of two-dimensional (2D) materials with three-dimensional (3D) semiconductors leads to intriguing optical and electrical properties that surpass those of the original materials. Here, we report the high performance of a GaN nanopillar-modified graphene/GaN/Ti/Au photodetector (PD). After etching on the surface of a GaN film, GaN nanopillars exhibit multiple functions for improving the detection performance of the PD. Under dark conditions, surface etching reduces the contact area of GaN with the graphene electrode, leading to a reduced dark current for the PD. When illuminated with UV light, the nanopillars enable an enhanced and localized electric field inside GaN, resulting in an ∼20% UV light absorption enhancement and a several-fold increased photocurrent. In addition, the nanopillars are intentionally etched beneath the metal Ti/Au electrode to modify the semiconductor-metal junction. Further investigation shows that the modified GaN/Ti/Au contact triggers a prominent rectifying I-V behaviour. Benefiting from the nanopillar modification, the proposed PD shows a record large detectivity of 1.85 × 1017 Jones, a small dark current of 5.2 nA at +3 V bias, and a nearly three order of magnitude rectification ratio enhancement compared with non-nanopillar PDs. This pioneering work provides a novel nanostructure-modifying method for combining 2D materials and 3D semiconductors to improve the performances of electronic and optoelectronic devices.
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Affiliation(s)
- Chang Liu
- State Key Laboratory of Superlattices and Microstructure, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, 100083, China
| | - Xiaodong Li
- State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China.
| | - Tiangui Hu
- State Key Laboratory of Superlattices and Microstructure, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, 100083, China
| | - Wenkai Zhu
- State Key Laboratory of Superlattices and Microstructure, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, 100083, China
| | - Faguang Yan
- State Key Laboratory of Superlattices and Microstructure, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, 100083, China
| | - Tiesheng Wu
- Guangxi Key Laboratory of Wireless Wideband Communication and Signal Processing, Guangxi, China
| | - Kaiyou Wang
- State Key Laboratory of Superlattices and Microstructure, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, 100083, China
| | - Lixia Zhao
- State Key Laboratory of Superlattices and Microstructure, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, 100083, China
- State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China.
- School of Electrical and Electronic Engineering, Tiangong University, 399 Binshuixi Road, Tianjin 300387, P. R. China.
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12
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Afzal AM, Iqbal MZ, Dastgeer G, Ahmad AU, Park B. Highly Sensitive, Ultrafast, and Broadband Photo-Detecting Field-Effect Transistor with Transition-Metal Dichalcogenide van der Waals Heterostructures of MoTe 2 and PdSe 2. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2021; 8:e2003713. [PMID: 34105276 PMCID: PMC8188193 DOI: 10.1002/advs.202003713] [Citation(s) in RCA: 22] [Impact Index Per Article: 5.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/01/2020] [Revised: 02/10/2021] [Indexed: 05/11/2023]
Abstract
Recently, van der Waals heterostructures (vdWHs) based on transition-metal dichalcogenides (TMDs) have attracted significant attention owing to their superior capabilities and multiple functionalities. Herein, a novel vdWH field-effect transistor (FET) composed of molybdenum ditelluride (MoTe2 ) and palladium diselenide (PdSe2 ) is studied for highly sensitive photodetection performance in the broad visible and near-infrared (VNIR) region. A high rectification ratio of 6.3 × 105 is obtained, stemming from the sharp interface and low Schottky barriers of the MoTe2 /PdSe2 vdWHs. It is also successfully demonstrated that the vdWH FET exhibits highly sensitive photo-detecting abilities, such as noticeably high photoresponsivity (1.24 × 105 A W-1 ), specific detectivity (2.42 × 1014 Jones), and good external quantum efficiency (3.5 × 106 ), not only due to the intra-TMD band-to-band transition but also due to the inter-TMD charge transfer (CT) transition. Further, rapid rise (16.1 µs) and decay (31.1 µs) times are obtained under incident light with a wavelength of 2000 nm due to the CT transition, representing an outcome one order of magnitude faster than values currently in the literature. Such TMD-based vdWH FETs would improve the photo-gating characteristics and provide a platform for the realization of a highly sensitive photodetector in the broad VNIR region.
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Affiliation(s)
- Amir Muhammad Afzal
- Department of Electrical and Biological PhysicsKwangwoon UniversityWolgye‐DongSeoul01897South Korea
| | - Muhammad Zahir Iqbal
- Nanotechnology Research Laboratory, Faculty of Engineering SciencesGIK Institute of Engineering Sciences and TechnologyTopiKhyber Pakhtunkhwa23640Pakistan
| | - Ghulam Dastgeer
- School of PhysicsPeking UniversityBeijing100871China
- IBS Center for Integrated Nanostructure PhysicsSungkyunkwan UniversitySuwon16419South Korea
| | - Aqrab ul Ahmad
- School of Physics and School of MicroelectronicsDalian University of TechnologyDalian116000China
| | - Byoungchoo Park
- Department of Electrical and Biological PhysicsKwangwoon UniversityWolgye‐DongSeoul01897South Korea
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13
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Han S, Noh S, Kim JW, Lee CR, Lee SK, Kim JS. Stretchable Inorganic GaN-Nanowire Photosensor with High Photocurrent and Photoresponsivity. ACS APPLIED MATERIALS & INTERFACES 2021; 13:22728-22737. [PMID: 33969979 DOI: 10.1021/acsami.1c03023] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
To effectively implement wearable systems, their constituent components should be made stretchable. We successfully fabricated highly efficient stretchable photosensors made of inorganic GaN nanowires (NWs) as light-absorbing media and graphene as a carrier channel on polyurethane substrates using the pre-strain method. When a GaN-NW photosensor was stretched at a strain level of 50%, the photocurrent was measured to be 0.91 mA, corresponding to 87.5% of that (1.04 mA) obtained in the released state, and the photoresponsivity was calculated to be 11.38 A/W. These photosensors showed photocurrent and photoresponsivity levels much higher than those previously reported for any stretchable semiconductor-containing photosensor. To explain the superior performances of the stretchable GaN-NW photosensor, it was approximated as an equivalent circuit with resistances and capacitances, and in this way, we analyzed the behavior of the photogenerated carriers, particularly at the NW-graphene interface. In addition, the buckling phenomenon typically observed in organic-based stretchable devices fabricated using the pre-strain method was not observed in our photosensors. After a 1000-cycle stretching test with a strain level of 50%, the photocurrent and photoresponsivity of the GaN-NW photosensor were measured to be 0.96 mA and 11.96 A/W, respectively, comparable to those measured before the stretching test. To evaluate the potential of our stretchable devices in practical applications, the GaN-NW photosensors were attached to the proximal interphalangeal joint of the index finger and to the back of the wrist. Photocurrents of these photosensors were monitored during movements made about these joints.
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Affiliation(s)
- Sangmoon Han
- Department of Electronic and Information Materials Engineering, Division of Advanced Materials Engineering, and Research Center of Advanced Materials Development, Jeonbuk National University, Jeonju 54896, South Korea
| | - Siyun Noh
- Department of Electronic and Information Materials Engineering, Division of Advanced Materials Engineering, and Research Center of Advanced Materials Development, Jeonbuk National University, Jeonju 54896, South Korea
| | - Jong-Woong Kim
- Department of Electronic and Information Materials Engineering, Division of Advanced Materials Engineering, and Research Center of Advanced Materials Development, Jeonbuk National University, Jeonju 54896, South Korea
| | - Cheul-Ro Lee
- Department of Electronic and Information Materials Engineering, Division of Advanced Materials Engineering, and Research Center of Advanced Materials Development, Jeonbuk National University, Jeonju 54896, South Korea
| | - Seoung-Ki Lee
- School of Materials Science and Engineering, Pusan National University, Busan 46241, South Korea
| | - Jin Soo Kim
- Department of Electronic and Information Materials Engineering, Division of Advanced Materials Engineering, and Research Center of Advanced Materials Development, Jeonbuk National University, Jeonju 54896, South Korea
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14
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Pasupuleti KS, Reddeppa M, Park BG, Peta KR, Oh JE, Kim SG, Kim MD. Ag Nanowire-Plasmonic-Assisted Charge Separation in Hybrid Heterojunctions of Ppy-PEDOT:PSS/GaN Nanorods for Enhanced UV Photodetection. ACS APPLIED MATERIALS & INTERFACES 2020; 12:54181-54190. [PMID: 33200919 DOI: 10.1021/acsami.0c16795] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/24/2023]
Abstract
The surface states, poor carrier life, and other native defects in GaN nanorods (NRs) limit their utilization in high-speed and large-gain ultraviolet (UV) photodetection applications. Making a hybrid structure is one of the finest strategies to overcome such impediments. In this work, a polypyrrole (Ppy)-poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS)/GaN NRs hybrid structure is introduced for self-powered UV photodetection applications. This hybrid structure yields high photodetection performance, while pristine GaN NRs showed negligible photodetection properties. The ability of the photodetector is further boosted by functionalizing the hybrid structure with Ag nanowires (NWs). The Ag NWs-functionalized hybrid structure exhibited a responsivity of 3.1 × 103 (A/W), detectivity of 3.19 × 1014 Jones, and external quantum efficiency of 1.06 × 106 (%) under a UV illumination of λ = 382 nm. This high photoresponse is due to the huge photon absorption rising from the localized surface plasmonic effect of a Ag NWs network. Also, the Ag NWs significantly improved the rising and falling times, which were noted to be 0.20 and 0.21 s, respectively. The model band diagram was proposed with the assistance of X-ray photoelectron spectroscopy to explore the origin of the superior performance of the Ag NWs-decorated Ppy-PEDOT:PSS/GaN NRs photodetector. The proposed hybrid structure seems to be a promising candidate for the development of high-performance UV photodetectors.
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Affiliation(s)
| | - Maddaka Reddeppa
- Institute of Quantum Systems (IQS), Chungnam National University, 99 Daehak-ro, Yuseong-gu, Daejeon 34134, Republic of Korea
| | - Byung-Guon Park
- Department of Physics, Chungnam National University, 99 Daehak-ro, Yuseong-gu, Daejeon 34134, Republic of Korea
| | - Koteswara Rao Peta
- Department of Electronic Science, University of Delhi South Campus, Benito Juarez Road, New Delhi 110021, India
| | - Jae-Eung Oh
- School of Electrical and Computer Engineering, Hangyang University, Ansan 15588, Republic of Korea
| | - Song-Gang Kim
- Department of Information and Communications, Joongbu University, 305 Donghen-ro, Goyang, Kyunggi-do 10279, Republic of Korea
| | - Moon-Deock Kim
- Department of Physics, Chungnam National University, 99 Daehak-ro, Yuseong-gu, Daejeon 34134, Republic of Korea
- Institute of Quantum Systems (IQS), Chungnam National University, 99 Daehak-ro, Yuseong-gu, Daejeon 34134, Republic of Korea
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15
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Pham T, Qamar A, Dinh T, Masud MK, Rais‐Zadeh M, Senesky DG, Yamauchi Y, Nguyen N, Phan H. Nanoarchitectonics for Wide Bandgap Semiconductor Nanowires: Toward the Next Generation of Nanoelectromechanical Systems for Environmental Monitoring. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2020; 7:2001294. [PMID: 33173726 PMCID: PMC7640356 DOI: 10.1002/advs.202001294] [Citation(s) in RCA: 28] [Impact Index Per Article: 5.6] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 04/07/2020] [Revised: 06/08/2020] [Indexed: 05/05/2023]
Abstract
Semiconductor nanowires are widely considered as the building blocks that revolutionized many areas of nanosciences and nanotechnologies. The unique features in nanowires, including high electron transport, excellent mechanical robustness, large surface area, and capability to engineer their intrinsic properties, enable new classes of nanoelectromechanical systems (NEMS). Wide bandgap (WBG) semiconductors in the form of nanowires are a hot spot of research owing to the tremendous possibilities in NEMS, particularly for environmental monitoring and energy harvesting. This article presents a comprehensive overview of the recent progress on the growth, properties and applications of silicon carbide (SiC), group III-nitrides, and diamond nanowires as the materials of choice for NEMS. It begins with a snapshot on material developments and fabrication technologies, covering both bottom-up and top-down approaches. A discussion on the mechanical, electrical, optical, and thermal properties is provided detailing the fundamental physics of WBG nanowires along with their potential for NEMS. A series of sensing and electronic devices particularly for environmental monitoring is reviewed, which further extend the capability in industrial applications. The article concludes with the merits and shortcomings of environmental monitoring applications based on these classes of nanowires, providing a roadmap for future development in this fast-emerging research field.
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Affiliation(s)
- Tuan‐Anh Pham
- Queensland Micro and Nanotechnology CentreGriffith UniversityNathanQLD4111Australia
| | - Afzaal Qamar
- Electrical Engineering DepartmentUniversity of MichiganAnn ArborMI48109USA
| | - Toan Dinh
- Queensland Micro and Nanotechnology CentreGriffith UniversityNathanQLD4111Australia
- Department of Mechanical EngineeringUniversity of Southern QueenslandSpringfieldQLD4300Australia
| | - Mostafa Kamal Masud
- Australian Institute of Bioengineering and NanotechnologyThe University of QueenslandSt LuciaQLD4072Australia
| | - Mina Rais‐Zadeh
- Electrical Engineering DepartmentUniversity of MichiganAnn ArborMI48109USA
- NASA JPLCalifornia Institute of TechnologyPasadenaCA91109USA
| | - Debbie G. Senesky
- Department of Aeronautics and AstronauticsStanford UniversityStanfordCA94305USA
| | - Yusuke Yamauchi
- Australian Institute of Bioengineering and NanotechnologyThe University of QueenslandSt LuciaQLD4072Australia
| | - Nam‐Trung Nguyen
- Queensland Micro and Nanotechnology CentreGriffith UniversityNathanQLD4111Australia
| | - Hoang‐Phuong Phan
- Queensland Micro and Nanotechnology CentreGriffith UniversityNathanQLD4111Australia
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16
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Zhang X, Li J, Ma Z, Zhang J, Leng B, Liu B. Design and Integration of a Layered MoS 2/GaN van der Waals Heterostructure for Wide Spectral Detection and Enhanced Photoresponse. ACS APPLIED MATERIALS & INTERFACES 2020; 12:47721-47728. [PMID: 32960031 DOI: 10.1021/acsami.0c11021] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Molybdenum disulfide (MoS2) as a typical two-dimensional (2D) transition-metal dichalcogenide exhibits great potential applications for the next-generation nanoelectronics such as photodetectors. However, most MoS2-based photodetectors hold obvious disadvantages including a narrow spectral response in the visible region, poor photoresponsivity, and slow response speed. Here, for the first time, we report the design of a two-dimensional MoS2/GaN van der Waals (vdWs) heterostructure photodetector consisting of few-layer p-type MoS2 and very thin n-type GaN flakes. Thanks to the good crystal quality of the 2D-GaN flake and the built-in electric field in the interface depletion region of the MoS2/GaN p-n junction, photogenerated carriers can be rapidly separated and more excitons are collected by electrodes toward the high photoresponsivity of 328 A/W and a fast response time of 400 ms under the illumination of 532 nm light, which is seven times faster than pristine MoS2 flake. Additionally, the response spectrum of the photodetector is also broadened to the UV region with a high photoresponsivity of 27.1 A/W and a fast response time of 300 ms after integrating with the 2D-GaN flake, exhibiting an advantageous synergetic effect. These excellent performances render MoS2/GaN vdWs heterostructure photodetectors as promising and competitive candidates for next-generation optoelectronic devices.
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Affiliation(s)
- Xinglai Zhang
- Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, No. 72 Wenhua Road, Shenyang 110016, China
| | - Jing Li
- Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, No. 72 Wenhua Road, Shenyang 110016, China
| | - Zongyi Ma
- Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, No. 72 Wenhua Road, Shenyang 110016, China
| | - Jian Zhang
- Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, No. 72 Wenhua Road, Shenyang 110016, China
| | - Bing Leng
- Department of Plastic Surgery, The First Affiliated Hospital of China Medical University, No. 155 North Nanjing Street, Shenyang 110001, China
| | - Baodan Liu
- Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, No. 72 Wenhua Road, Shenyang 110016, China
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17
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Meng J, Li Z. Schottky-Contacted Nanowire Sensors. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2020; 32:e2000130. [PMID: 32484268 DOI: 10.1002/adma.202000130] [Citation(s) in RCA: 45] [Impact Index Per Article: 9.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/07/2020] [Revised: 03/16/2020] [Accepted: 03/22/2020] [Indexed: 06/11/2023]
Abstract
The progress of the Internet-of-Things in the past few years has necessitated the support of high-performance sensors. Schottky-contacted nanowire sensors have attracted considerable attention owing to their high sensitivity and fast response time. Their progress is reviewed here, based on several kinds of important nanowires, for applications such as bio/chemical sensors, gas sensors, photodetectors, and strain sensors. Although Schottky-contacted nanowire sensors deliver excellent performance in these fields, they can be further improved by various methods, including defect engineering, surface modification, the piezotronic effect, and the piezophototronic effect, all of which are discussed here. With regard to practical applications, further efforts are required to address challenges such as the stability, selectivity, ultrafast response, multifunctionality, flexibility, distributed energy supply, and sustainability of Schottky-contacted nanowire sensors. Finally, future perspectives and solutions are discussed.
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Affiliation(s)
- Jianping Meng
- CAS Center for Excellence in Nanoscience, Beijing Key Laboratory of Micro-Nano Energy and Sensor, Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing, 100083, China
| | - Zhou Li
- CAS Center for Excellence in Nanoscience, Beijing Key Laboratory of Micro-Nano Energy and Sensor, Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing, 100083, China
- School of Nanoscience and Technology, University of Chinese Academy of Sciences, Beijing, 100049, China
- Center of Nanoenergy Research, School of Physical Science and Technology, Guangxi University, Nanning, 530004, China
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18
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Kunwar S, Pandit S, Jeong JH, Lee J. Improved Photoresponse of UV Photodetectors by the Incorporation of Plasmonic Nanoparticles on GaN Through the Resonant Coupling of Localized Surface Plasmon Resonance. NANO-MICRO LETTERS 2020; 12:91. [PMID: 34138096 PMCID: PMC7770873 DOI: 10.1007/s40820-020-00437-x] [Citation(s) in RCA: 21] [Impact Index Per Article: 4.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/03/2020] [Accepted: 03/25/2020] [Indexed: 05/03/2023]
Abstract
Very small metallic nanostructures, i.e., plasmonic nanoparticles (NPs), can demonstrate the localized surface plasmon resonance (LSPR) effect, a characteristic of the strong light absorption, scattering and localized electromagnetic field via the collective oscillation of surface electrons upon on the excitation by the incident photons. The LSPR of plasmonic NPs can significantly improve the photoresponse of the photodetectors. In this work, significantly enhanced photoresponse of UV photodetectors is demonstrated by the incorporation of various plasmonic NPs in the detector architecture. Various size and elemental composition of monometallic Ag and Au NPs, as well as bimetallic alloy AgAu NPs, are fabricated on GaN (0001) by the solid-state dewetting approach. The photoresponse of various NPs are tailored based on the geometric and elemental evolution of NPs, resulting in the highly enhanced photoresponsivity of 112 A W-1, detectivity of 2.4 × 1012 Jones and external quantum efficiency of 3.6 × 104% with the high Ag percentage of AgAu alloy NPs at a low bias of 0.1 V. The AgAu alloy NP detector also demonstrates a fast photoresponse with the relatively short rise and fall time of less than 160 and 630 ms, respectively. The improved photoresponse with the AgAu alloy NPs is correlated with the simultaneous effect of strong plasmon absorption and scattering, increased injection of hot electrons into the GaN conduction band and reduced barrier height at the alloy NPs/GaN interface.
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Affiliation(s)
- Sundar Kunwar
- Department of Electronic Engineering, College of Electronics and Information, Kwangwoon University, Nowon-gu, Seoul, 01897, South Korea
| | - Sanchaya Pandit
- Department of Electronic Engineering, College of Electronics and Information, Kwangwoon University, Nowon-gu, Seoul, 01897, South Korea
| | - Jae-Hun Jeong
- Department of Electronic Engineering, College of Electronics and Information, Kwangwoon University, Nowon-gu, Seoul, 01897, South Korea
| | - Jihoon Lee
- Department of Electronic Engineering, College of Electronics and Information, Kwangwoon University, Nowon-gu, Seoul, 01897, South Korea.
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19
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Zhang J, Liu Y, Zhang X, Ma Z, Li J, Zhang C, Shaikenova A, Renat B, Liu B. High‐Performance Ultraviolet‐Visible Light‐Sensitive 2D‐MoS
2
/1D‐ZnO Heterostructure Photodetectors. ChemistrySelect 2020. [DOI: 10.1002/slct.202000746] [Citation(s) in RCA: 21] [Impact Index Per Article: 4.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/28/2022]
Affiliation(s)
- Jian Zhang
- School of Information Science and EngineeringShenyang University of Technology Shenyang 110870 China
- Shenyang National Laboratory for Materials Science Institute of Metal ResearchChinese Academy of Sciences Shenyang 110016 China
| | - Yiting Liu
- School of Information Science and EngineeringShenyang University of Technology Shenyang 110870 China
| | - Xinglai Zhang
- Shenyang National Laboratory for Materials Science Institute of Metal ResearchChinese Academy of Sciences Shenyang 110016 China
| | - Zongyi Ma
- Shenyang National Laboratory for Materials Science Institute of Metal ResearchChinese Academy of Sciences Shenyang 110016 China
| | - Jing Li
- Shenyang National Laboratory for Materials Science Institute of Metal ResearchChinese Academy of Sciences Shenyang 110016 China
| | - Cai Zhang
- Shenyang National Laboratory for Materials Science Institute of Metal ResearchChinese Academy of Sciences Shenyang 110016 China
| | - Altynay Shaikenova
- Department of Engineering PhysicsSatbayev University Almaty 050013 Kazakhstan
| | - Beisenov Renat
- Department of Engineering PhysicsSatbayev University Almaty 050013 Kazakhstan
| | - Baodan Liu
- Shenyang National Laboratory for Materials Science Institute of Metal ResearchChinese Academy of Sciences Shenyang 110016 China
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20
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Li J, Xi X, Lin S, Ma Z, Li X, Zhao L. Ultrahigh Sensitivity Graphene/Nanoporous GaN Ultraviolet Photodetectors. ACS APPLIED MATERIALS & INTERFACES 2020; 12:11965-11971. [PMID: 32072811 DOI: 10.1021/acsami.9b22651] [Citation(s) in RCA: 19] [Impact Index Per Article: 3.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/21/2023]
Abstract
Integration of graphene with three-dimensional semiconductors can introduce unique optical and electrical properties that overcome the intrinsic limitation of the materials. Here, we report on the high sensitivity ultraviolet (UV) photodetectors based on monolayer graphene/nanoporous GaN heterojunctions. By investigating the reflectivity, photoluminescence, and Raman spectral characteristics of nanoporous GaN, we find that the increase in the porosity can help to improve its optical properties. The device based on the highest-porosity nanoporous GaN demonstrates rapid and linear response to UV photons, with an ultrahigh detectivity of 1.0 × 1017 Jones and a UV-visible rejection ratio of 4.8 × 107 at V = -1.5 V. We attribute such high sensitivity to the combination of the significantly enhanced light harvesting of high-porosity nanoporous GaN and the unique UV absorption, high mobility, and finite density of states of the monolayer graphene. The high performance together with a simple and low-cost fabrication process endow these graphene/nanoporous GaN heterojunctions with great potential for future selective detection of weak UV optical signals.
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Affiliation(s)
- Jing Li
- State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, No. A35, Qinghua East Road, Haidian District, Beijing 100083, China
- Center of Materials Science and Optoelectronic Engineering, University of Chinese Academy of Sciences, No. 19A, Yuquan Road, Shijingshan District, Beijing 100049, China
| | - Xin Xi
- State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, No. A35, Qinghua East Road, Haidian District, Beijing 100083, China
- Center of Materials Science and Optoelectronic Engineering, University of Chinese Academy of Sciences, No. 19A, Yuquan Road, Shijingshan District, Beijing 100049, China
| | - Shan Lin
- State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, No. A35, Qinghua East Road, Haidian District, Beijing 100083, China
- Center of Materials Science and Optoelectronic Engineering, University of Chinese Academy of Sciences, No. 19A, Yuquan Road, Shijingshan District, Beijing 100049, China
| | - Zhanhong Ma
- State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, No. A35, Qinghua East Road, Haidian District, Beijing 100083, China
- Center of Materials Science and Optoelectronic Engineering, University of Chinese Academy of Sciences, No. 19A, Yuquan Road, Shijingshan District, Beijing 100049, China
| | - Xiaodong Li
- State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, No. A35, Qinghua East Road, Haidian District, Beijing 100083, China
- Center of Materials Science and Optoelectronic Engineering, University of Chinese Academy of Sciences, No. 19A, Yuquan Road, Shijingshan District, Beijing 100049, China
| | - Lixia Zhao
- State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, No. A35, Qinghua East Road, Haidian District, Beijing 100083, China
- Center of Materials Science and Optoelectronic Engineering, University of Chinese Academy of Sciences, No. 19A, Yuquan Road, Shijingshan District, Beijing 100049, China
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21
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Han S, Choi I, Lee CR, Jeong KU, Lee SK, Kim JS. Fast Response Characteristics of Flexible Ultraviolet Photosensors with GaN Nanowires and Graphene. ACS APPLIED MATERIALS & INTERFACES 2020; 12:970-979. [PMID: 31840489 DOI: 10.1021/acsami.9b13109] [Citation(s) in RCA: 9] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
We report the fast response characteristics of flexible ultraviolet photosensors with GaN nanowires (NWs) and a graphene channel. The GaN NWs used as light-absorbing media are horizontally and randomly embedded in a graphene sandwich structure in which the number of bottom graphene layers is varied from zero to three and the top is a fixed single layer of graphene. In the response curve of the photosensor with a double-layer bottom graphene, as obtained under pulsed illumination with a pulse width of 50 ms and a duty cycle of 50%, the rise and decay times were measured as 24.1 ± 0.1 and 28.2 ± 0.1 ms, respectively. The eye-crossing percentage was evaluated as 52.1%, indicating no substantial distortion of the duty cycle and no pulse symmetry problem. The rise and decay times estimated from an equivalent circuit analysis represented by resistances and capacitances agree well with the measured values. When the device was under the bending condition, the rise and decay times of the photosensor were comparable to those in the unbent state.
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Affiliation(s)
| | | | | | | | - Seoung-Ki Lee
- Applied Quantum Composites Research Center , Korea Institute of Science and Technology , Wanju 55324 , South Korea
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Fan X, Su L, Zhang F, Huang D, Sang DK, Chen Y, Li Y, Liu F, Li J, Zhang H, Xie H. Layer-Dependent Properties of Ultrathin GeS Nanosheets and Application in UV-Vis Photodetectors. ACS APPLIED MATERIALS & INTERFACES 2019; 11:47197-47206. [PMID: 31763823 DOI: 10.1021/acsami.9b14663] [Citation(s) in RCA: 18] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Two-dimensional germanium sulfide (GeS), an analogue of phosphorene, has attracted broad attention owing to its excellent environmental stabilities, fascinating electronic and optical properties, and applications in various nanodevices. In spite of the current achievements on 2D GeS, the report of ultrathin few-layer GeS nanosheets within 5 nm is still lacking. Here in this contribution, we have achieved preparation of ultrathin few-layer GeS nanosheets with thicknesses of 1.3 ± 0.1 nm [approximately three layers (∼3L)], 3.2 ± 0.2 nm (∼6L), and 4.2 ± 0.3 nm (∼8L) via a typical liquid-phase exfoliation (LPE) method. Based on various experimental characterizations and first-principles calculations, the layer-dependent electronic, transport, and optical properties are investigated. For the few-layer GeS nanosheets, enhanced light absorption in the UV-vis region and superior photoresponse behavior with increasing layer number is observed, while for the thin films above 10 nm, the properties degenerate to the bulk feature. In addition, the as-prepared ultrathin nanosheets manifest great potential in the applications of photoelectrochemical (PEC)-type photodetectors, exhibiting excellent and stable periodic photoresponse behavior under the radiation of white light. The ∼8L GeS-based photodetector exhibits superior performance than the thinner GeS nanosheets (<4 nm), even better as compared to the bulk or film (above 10 nm) counterparts in terms of higher photoresponsivity along with remarkable photodetection performance in the UV-vis region. This work not only provides direct and solid evidence of the layer-number evolutionary band structure, mobility, and optical properties of ultrathin 2D GeS nanosheets but also promotes the foreseeable applications of 2D GeS as energy-related photoelectric devices.
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Sankaranarayanan S, Kandasamy P, Krishnan B. Catalytic Growth of Gallium Nitride Nanowires on Wet Chemically Etched Substrates by Chemical Vapor Deposition. ACS OMEGA 2019; 4:14772-14779. [PMID: 31552316 PMCID: PMC6751544 DOI: 10.1021/acsomega.9b01284] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 05/04/2019] [Accepted: 08/22/2019] [Indexed: 06/10/2023]
Abstract
Growth of gallium nitride nanowires on etched sapphire and GaN substrates using binary catalytic alloy were investigated by manipulating the growth time and precursor-to-substrate distance. The variations in behavior at different growth conditions were observed using X-ray diffractometer, Raman spectroscopy, X-ray photoelectron spectroscopy, cathodoluminescence spectroscopy, optical microscopy, atomic force microscopy, and scanning electron microscopy. It was noticed that, in respect of both the substrates, when growth time and/or precursor-to-substrate distance is increased, thickness of the nanowires around the etch pits remains unaltered, but there is variation in the density of nanowires. In addition, formation of gallium nitride microwires within the etch pits was also observed on etched sapphire substrates. Similarly, the thickness and density of the microwires were found to increase with increase in growth time and decrease with increase in precursor-to-substrate distance. The dimensionality scaling of gallium nitride was found to have a positive effect in improving the luminescence property and band gap of the grown nanowires. This method of nanowire growth can be helpful in increasing the probability of multiple reflections in the materials which makes them a suitable candidate for optoelectronic devices.
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Jet Nebulizer Sprayed WO3-Nanoplate Arrays for High-Photoresponsivity Based Metal–Insulator–Semiconductor Structured Schottky Barrier Diodes. J Inorg Organomet Polym Mater 2019. [DOI: 10.1007/s10904-019-01285-y] [Citation(s) in RCA: 16] [Impact Index Per Article: 2.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/26/2022]
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Zhang X, Li J, Yang W, Leng B, Niu P, Jiang X, Liu B. High-Performance Flexible Ultraviolet Photodetectors Based on AZO/ZnO/PVK/PEDOT:PSS Heterostructures Integrated on Human Hair. ACS APPLIED MATERIALS & INTERFACES 2019; 11:24459-24467. [PMID: 31246388 DOI: 10.1021/acsami.9b07423] [Citation(s) in RCA: 34] [Impact Index Per Article: 5.7] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/20/2023]
Abstract
Flexible optoelectronics is an emerging research field that has attracted a great deal of interest in recent years due to the special functions and potential applications of these devices in flexible image sensors, optical computing, energy conversion devices, the Internet of Things, and other technologies. Here, we examine the high-performance ultraviolet (UV) photodetectors using AZO/ZnO nanorods/PVK/PEDOT:PSS heterostructures integrated on human hair. Due to the precise interfacial energy-level alignment among all layers and superior mechanical characteristics of human hair, the as-obtained photodetector shows a fast response time, high photoresponsivity, and excellent flexibility. According to integrate 7 heterostructures as 7 display pixels, the flexible UV-image sensor has superior device performance and outstanding flexibility and can produce vivid and accurate images of Arabic numerals from 0 to 9. Different combinations of the two heterostructures can also be used to achieve flexible photon-triggered logic functions, including AND, OR, and NAND gates. Our findings indicate the possibility of using human hair as a fiber-shaped flexible substrate and will allow the use of hair-based hierarchical heterostructures as building blocks to create exciting opportunities for next-generation high-performance, multifunctional, low-cost, and flexible optoelectronic devices.
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Affiliation(s)
- Xinglai Zhang
- Shenyang National Laboratory for Materials Science (SYNL), Institute of Metal Research (IMR) , Chinese Academy of Sciences (CAS) , No. 72 Wenhua Road , Shenyang 110016 , China
| | - Jing Li
- Shenyang National Laboratory for Materials Science (SYNL), Institute of Metal Research (IMR) , Chinese Academy of Sciences (CAS) , No. 72 Wenhua Road , Shenyang 110016 , China
| | - Wenjin Yang
- Shenyang National Laboratory for Materials Science (SYNL), Institute of Metal Research (IMR) , Chinese Academy of Sciences (CAS) , No. 72 Wenhua Road , Shenyang 110016 , China
| | - Bing Leng
- Department of Plastic Surgery , The First Affiliated Hospital of China Medical University , No. 155 North Nanjing Street , Shenyang 110001 , China
| | - Pingjuan Niu
- School of Electrical Engineering and Automation , Tianjin Polytechnic University , No. 399 Binshuixi Road , Tianjin 300387 , China
| | - Xin Jiang
- Shenyang National Laboratory for Materials Science (SYNL), Institute of Metal Research (IMR) , Chinese Academy of Sciences (CAS) , No. 72 Wenhua Road , Shenyang 110016 , China
| | - Baodan Liu
- Shenyang National Laboratory for Materials Science (SYNL), Institute of Metal Research (IMR) , Chinese Academy of Sciences (CAS) , No. 72 Wenhua Road , Shenyang 110016 , China
- State Key Laboratory of Optoelectronic Materials and Technologies and School of Electronics and Information Technology , Sun Yat-sen University , Guangzhou 510275 , P. R. China
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Zhao D, Huang H, Chen S, Li Z, Li S, Wang M, Zhu H, Chen X. In Situ Growth of Leakage-Free Direct-Bridging GaN Nanowires: Application to Gas Sensors for Long-Term Stability, Low Power Consumption, and Sub-ppb Detection Limit. NANO LETTERS 2019; 19:3448-3456. [PMID: 31030517 DOI: 10.1021/acs.nanolett.8b04846] [Citation(s) in RCA: 9] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Direct-bridge growth of aligned GaN nanowires (NWs) over the trench of GaN-coated sapphire substrate was realized in which the issues of parasitic deposition and resultant bypass current were resolved by combining the novel shadowing effect of the deep trench with the surface-passivation effect of the SiO2 coating. Due to the robust connection and the absence of a contact barrier in bridging NWs, the intrinsic sensing properties of the NW itself can be obtained. For the first time, the gas-sensing properties (e.g., NO2) of the bridging GaN NWs were studied. With the assistance of UV light, the detection limit was improved from 4.5 to 0.5 ppb at room temperature, and the corresponding response time was reduced from 518 to 18 s. This kind of sensor is promising for high sensitivity (detection of less than parts per billion), low power consumption (capable of room-temperature operation), high stability (variation in resistance of <0.8% during 240 days), and in situ monolithic integration.
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Affiliation(s)
- Danna Zhao
- Key Lab of Liaoning IC Technology, School of Biomedical Engineer, Faculty of Electronic Information and Electrical Engineering , Dalian University of Technology , Dalian 116024 , China
| | - Hui Huang
- Key Lab of Liaoning IC Technology, School of Biomedical Engineer, Faculty of Electronic Information and Electrical Engineering , Dalian University of Technology , Dalian 116024 , China
| | - Shunji Chen
- Key Lab of Liaoning IC Technology, School of Biomedical Engineer, Faculty of Electronic Information and Electrical Engineering , Dalian University of Technology , Dalian 116024 , China
| | - Zhirui Li
- Key Lab of Liaoning IC Technology, School of Biomedical Engineer, Faculty of Electronic Information and Electrical Engineering , Dalian University of Technology , Dalian 116024 , China
| | - Shida Li
- Key Lab of Liaoning IC Technology, School of Biomedical Engineer, Faculty of Electronic Information and Electrical Engineering , Dalian University of Technology , Dalian 116024 , China
| | - Mengyuan Wang
- Key Lab of Liaoning IC Technology, School of Biomedical Engineer, Faculty of Electronic Information and Electrical Engineering , Dalian University of Technology , Dalian 116024 , China
| | - Huichao Zhu
- Key Lab of Liaoning IC Technology, School of Biomedical Engineer, Faculty of Electronic Information and Electrical Engineering , Dalian University of Technology , Dalian 116024 , China
| | - Xiaoming Chen
- Key Lab of Liaoning IC Technology, School of Biomedical Engineer, Faculty of Electronic Information and Electrical Engineering , Dalian University of Technology , Dalian 116024 , China
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Zheng Y, Wang W, Li Y, Lan J, Xia Y, Yang Z, He X, Li G. Self-Integrated Hybrid Ultraviolet Photodetectors Based on the Vertically Aligned InGaN Nanorod Array Assembly on Graphene. ACS APPLIED MATERIALS & INTERFACES 2019; 11:13589-13597. [PMID: 30892870 DOI: 10.1021/acsami.9b00940] [Citation(s) in RCA: 20] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Integration of one-dimensional (1D) semiconductors with two-dimensional (2D) materials into hybrid systems is identified as promising applications for new optoelectronic and photodetection devices. Herein, a self-integrated hybrid ultraviolet (UV) photodetector based on InGaN nanorod arrays (NRAs) sandwiched between transparent top and back graphene contacts forming a Schottky junction has been demonstrated for the first time. The controlled van der Waals epitaxy of the vertically aligned InGaN NRA assembly on graphene-on-Si substrates is achieved by plasma-assisted molecular beam epitaxy. Moreover, the self-assembly formation mechanisms of InGaN NRAs on graphene are clarified by theoretical calculations with first-principles calculations based on density functional theory. The peculiar 1D/2D heterostructure hybrid system-based integrated UV photodetector simultaneously exhibits ultrafast response time (∼50 μs) and superhigh photosensitivity (∼105 A/W). It is highly believed that the concept proposed in this work has a great potential and can be widely applied for the next-generation integrated 1D/2D nano-based optoelectronic and photodetection devices.
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Affiliation(s)
- Yulin Zheng
- State Key Laboratory of Luminescent Materials and Devices , South China University of Technology , Guangzhou 510640 , China
| | - Wenliang Wang
- State Key Laboratory of Luminescent Materials and Devices , South China University of Technology , Guangzhou 510640 , China
- Guangdong Choicore Optoelectronics Co. Ltd. , Heyuan 517003 , China
| | - Yuan Li
- State Key Laboratory of Luminescent Materials and Devices , South China University of Technology , Guangzhou 510640 , China
| | - Jianyu Lan
- State Key Laboratory of Space Technology , Shanghai Institute of Space Power Sources , Shanghai 200245 , China
| | - Yu Xia
- State Key Laboratory of Luminescent Materials and Devices , South China University of Technology , Guangzhou 510640 , China
| | - Zhichao Yang
- State Key Laboratory of Luminescent Materials and Devices , South China University of Technology , Guangzhou 510640 , China
| | - Xiaobin He
- State Key Laboratory of Space Technology , Shanghai Institute of Space Power Sources , Shanghai 200245 , China
| | - Guoqiang Li
- State Key Laboratory of Luminescent Materials and Devices , South China University of Technology , Guangzhou 510640 , China
- Guangdong Choicore Optoelectronics Co. Ltd. , Heyuan 517003 , China
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Kang S, Dai T, Ma X, Dang S, Li H, Hu P, Yu F, Zhou X, Wu S, Li S. Broad spectral response of an individual tellurium nanobelt grown by molecular beam epitaxy. NANOSCALE 2019; 11:1879-1886. [PMID: 30643911 DOI: 10.1039/c8nr07978a] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/13/2023]
Abstract
The detection of broad wavelengths from the near-ultraviolet to near-infrared regime using functional semiconductor nanostructures is of great importance in either fundamental research or technological application. In this work, we report high-performance optoelectronic nanodevices based on a single Te nanobelt grown by molecular beam epitaxy. The photodetector demonstrates a fast photoresponse time (a rise time of 510 μs and a decay time of 300 μs), a high photoresponsivity of 254.2 A W-1, an external quantum efficiency of 8.6 × 104%, a large detectivity of 8.3 × 108 Jones, on/off ratio of 3 orders, broadband response from the near-ultraviolet to near-infrared region, and robust photocurrent stability and reproducibility. The photodetector with superior performances based on the individual one-dimensional Te nanobelt consequently shows great promise for further optoelectronic device applications.
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Affiliation(s)
- Songdan Kang
- State Key Laboratory of Optoelectronic Materials and Technologies, School of Materials Science and Engineering, Sun Yat-sen University, Guangzhou 510275, People's Republic of China.
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Song W, Si J, Wu S, Hu Z, Long L, Li T, Gao X, Zhang L, Zhu W, Wang L. Synthesis and morphology evolution of indium nitride (InN) nanotubes and nanobelts by chemical vapor deposition. CrystEngComm 2019. [DOI: 10.1039/c9ce00975b] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
InN can form ternary alloys with Ga or Al, which increases the versatility of group-III nitride optoelectronic devices.
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Li P, Li K, Sun S, Chen C, Wang BG. Construction, characterization, and growth mechanism of high-density jellyfish-like GaN/SiOxNy nanomaterials on p-Si substrate by Au-assisted chemical vapor deposition approach. CrystEngComm 2019. [DOI: 10.1039/c9ce00317g] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
High-density GaN/SiOxNy jellyfish-like nanomaterials are synthesized on Au-coated p-type Si substrates by a chemical vapor deposition approach.
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Affiliation(s)
- Pengkun Li
- Key Laboratory of Optoelectronic Materials Chemistry and Physics
- Collaborative Innovation Center for Optoelectronic Semiconductors and Efficient Devices
- Fujian Institute of Research on the Structure of Matter
- Chinese Academy of Science
- Fuzhou
| | - Kang Li
- Key Laboratory of Optoelectronic Materials Chemistry and Physics
- Collaborative Innovation Center for Optoelectronic Semiconductors and Efficient Devices
- Fujian Institute of Research on the Structure of Matter
- Chinese Academy of Science
- Fuzhou
| | - Shujing Sun
- Key Laboratory of Optoelectronic Materials Chemistry and Physics
- Collaborative Innovation Center for Optoelectronic Semiconductors and Efficient Devices
- Fujian Institute of Research on the Structure of Matter
- Chinese Academy of Science
- Fuzhou
| | - Chenlong Chen
- Key Laboratory of Optoelectronic Materials Chemistry and Physics
- Collaborative Innovation Center for Optoelectronic Semiconductors and Efficient Devices
- Fujian Institute of Research on the Structure of Matter
- Chinese Academy of Science
- Fuzhou
| | - B. G. Wang
- Key Laboratory of Optoelectronic Materials Chemistry and Physics
- Collaborative Innovation Center for Optoelectronic Semiconductors and Efficient Devices
- Fujian Institute of Research on the Structure of Matter
- Chinese Academy of Science
- Fuzhou
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Yang J, Liu K, Cheng Z, Jing P, Ai Q, Chen X, Li B, Zhang Z, Zhang L, Zhao H, Shen D. Investigation of Interface Effect on the Performance of CH 3NH 3PbCl 3/ZnO UV Photodetectors. ACS APPLIED MATERIALS & INTERFACES 2018; 10:34744-34750. [PMID: 30207153 DOI: 10.1021/acsami.8b11722] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Recent investigations indicate that the performance of organic-inorganic perovskite optoelectronic devices can be improved by combining the perovskites and the inorganic materials. However, very few studies have focused on the investigation of perovskites/inorganic semiconductor hybrid UV photodetectors and their detailed performance-enhancement mechanism is still not very clear. In this work, a CH3NH3PbCl3/ZnO UV photodetector has been first demonstrated and investigated. Both the photoresponsivity and response speed of the hybrid device are higher than those of pure CH3NH3PbCl3 and ZnO devices. The photoluminescence and transient absorption spectra indicate that the photoinduced electron transfer between CH3NH3PbCl3 and ZnO should be responsible for the performance enhancement of the hybrid device. In addition, the high crystal quality of CH3NH3PbCl3 on ZnO film is another important reason for the excellent UV detection performance. Our findings in this work provide new insights into the intrinsic photophysics essential for perovskite optoelectronic devices.
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Affiliation(s)
- Jialin Yang
- State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics , Chinese Academy of Sciences , Changchun 130033 , People's Republic of China
- University of Chinese Academy of Sciences , Beijing 100049 , People's Republic of China
| | - Kewei Liu
- State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics , Chinese Academy of Sciences , Changchun 130033 , People's Republic of China
| | - Zhen Cheng
- State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics , Chinese Academy of Sciences , Changchun 130033 , People's Republic of China
- University of Chinese Academy of Sciences , Beijing 100049 , People's Republic of China
| | - Pengtao Jing
- State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics , Chinese Academy of Sciences , Changchun 130033 , People's Republic of China
| | - Qiu Ai
- State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics , Chinese Academy of Sciences , Changchun 130033 , People's Republic of China
- University of Chinese Academy of Sciences , Beijing 100049 , People's Republic of China
| | - Xing Chen
- State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics , Chinese Academy of Sciences , Changchun 130033 , People's Republic of China
| | - Binghui Li
- State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics , Chinese Academy of Sciences , Changchun 130033 , People's Republic of China
| | - Zhenzhong Zhang
- State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics , Chinese Academy of Sciences , Changchun 130033 , People's Republic of China
| | - Ligong Zhang
- State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics , Chinese Academy of Sciences , Changchun 130033 , People's Republic of China
| | - Haifeng Zhao
- State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics , Chinese Academy of Sciences , Changchun 130033 , People's Republic of China
| | - Dezhen Shen
- State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics , Chinese Academy of Sciences , Changchun 130033 , People's Republic of China
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Ultraviolet Detectors Based on Wide Bandgap Semiconductor Nanowire: A Review. SENSORS 2018; 18:s18072072. [PMID: 29958452 PMCID: PMC6068994 DOI: 10.3390/s18072072] [Citation(s) in RCA: 63] [Impact Index Per Article: 9.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 05/07/2018] [Revised: 06/05/2018] [Accepted: 06/27/2018] [Indexed: 12/25/2022]
Abstract
Ultraviolet (UV) detectors have attracted considerable attention in the past decade due to their extensive applications in the civil and military fields. Wide bandgap semiconductor-based UV detectors can detect UV light effectively, and nanowire structures can greatly improve the sensitivity of sensors with many quantum effects. This review summarizes recent developments in the classification and principles of UV detectors, i.e., photoconductive type, Schottky barrier type, metal-semiconductor-metal (MSM) type, p-n junction type and p-i-n junction type. The current state of the art in wide bandgap semiconductor materials suitable for producing nanowires for use in UV detectors, i.e., metallic oxide, III-nitride and SiC, during the last five years is also summarized. Finally, novel types of UV detectors such as hybrid nanostructure detectors, self-powered detectors and flexible detectors are introduced.
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Journot T, Bouchiat V, Gayral B, Dijon J, Hyot B. Self-Assembled UV Photodetector Made by Direct Epitaxial GaN Growth on Graphene. ACS APPLIED MATERIALS & INTERFACES 2018; 10:18857-18862. [PMID: 29745232 DOI: 10.1021/acsami.8b01194] [Citation(s) in RCA: 21] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Hybrid systems based on the combination of crystalline bulk semiconductors with 2D crystals are identified as promising heterogeneous structures for new optoelectronic applications. The direct integration of III-V semiconductors on 2D materials is very attractive to make practical devices but the preservation of the intrinsic properties of the underlying 2D materials remains a challenge. In this work, we study the direct epitaxy of self-organized GaN crystals on graphene. We demonstrate that severe metal-organic chemical vapor deposition growth conditions of GaN (chemically aggressive precursors and high temperatures) are not detrimental to the structural quality and the charge carrier mobility of the graphene base plane. Graphene can therefore be used both as an efficient sensitive material and as a substrate for GaN epitaxy to make a self-assembled UV photodetector. A responsivity as high as 2 A W-1 is measured in the UV-A range without any further postprocessing compared to simple deposition of contact electrodes. Our study opens the way to build new self-assembled 2D/III-V hybrid optoelectronic devices by direct epitaxy.
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Affiliation(s)
- Timotée Journot
- Univ. Grenoble Alpes , 38000 Grenoble , France
- CEA, LETI, MINATEC Campus , 38000 Grenoble , France
| | - Vincent Bouchiat
- Univ. Grenoble Alpes , 38000 Grenoble , France
- CNRS-Grenoble, Institut Néel , 38000 Grenoble , France
| | - Bruno Gayral
- Univ. Grenoble Alpes , 38000 Grenoble , France
- CEA, INAC-PHELIQS , 38000 Grenoble , France
| | - Jean Dijon
- Univ. Grenoble Alpes , 38000 Grenoble , France
- CEA, LITEN, MINATEC Campus , 38000 Grenoble , France
| | - Bérangère Hyot
- Univ. Grenoble Alpes , 38000 Grenoble , France
- CEA, LETI, MINATEC Campus , 38000 Grenoble , France
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Pant R, Shetty A, Chandan G, Roul B, Nanda KK, Krupanidhi SB. In-Plane Anisotropic Photoconduction in Nonpolar Epitaxial a-Plane GaN. ACS APPLIED MATERIALS & INTERFACES 2018; 10:16918-16923. [PMID: 29707943 DOI: 10.1021/acsami.8b05032] [Citation(s) in RCA: 6] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Nonpolar a-plane GaN epitaxial films were grown on an r-plane sapphire using the plasma-assisted molecular beam epitaxy system, with various nitrogen plasma power conditions. The crystallinity of the films was characterized by high-resolution X-ray diffraction and reciprocal space mapping. Using the X-ray "rocking curve-phi scan", [0002], [1-100], and [1-102] azimuth angles were identified, and interdigitated electrodes along these directions were fabricated to evaluate the direction-dependent UV photoresponses. UV responsivity ( R) and internal gain ( G) were found to be dependent on the azimuth angle and in the order of [0002] > [1-102] > [1-100], which has been attributed to the enhanced crystallinity and lowest defect density along [0002] azimuth. The temporal response was very stable irrespective of growth conditions and azimuth angles. Importantly, response time, responsivity, and internal gain were 210 ms, 1.88 A W-1, and 648.9%, respectively, even at a bias as low as 1 V. The results were validated using the Silvaco Atlas device simulator, and experimental observations were consistent with simulated results. Overall, the photoresponse is dependent on azimuth angles and requires further optimization, especially for materials with in-plane crystal anisotropy.
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Affiliation(s)
| | | | | | - Basanta Roul
- Central Research Laboratory , Bharat Electronics , Bangalore 560013 , India
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Mishra M, Gundimeda A, Krishna S, Aggarwal N, Goswami L, Gahtori B, Bhattacharyya B, Husale S, Gupta G. Surface-Engineered Nanostructure-Based Efficient Nonpolar GaN Ultraviolet Photodetectors. ACS OMEGA 2018; 3:2304-2311. [PMID: 31458530 PMCID: PMC6641413 DOI: 10.1021/acsomega.7b02024] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/20/2017] [Accepted: 02/14/2018] [Indexed: 05/12/2023]
Abstract
Surface-engineered nanostructured nonpolar (112̅0) gallium nitride (GaN)-based high-performance ultraviolet (UV) photodetectors (PDs) have been fabricated. The surface morphology of a nonpolar GaN film was modified from pyramidal shape to flat and trigonal nanorods displaying facets along different crystallographic planes. We report the ease of enhancing the photocurrent (5.5-fold) and responsivity (6-fold) of the PDs using a simple and convenient wet chemical-etching-induced surface engineering. The fabricated metal-semiconductor-metal structure-based surface-engineered UV PD exhibited a significant increment in detectivity, that is, from 0.43 to 2.83 (×108) Jones, and showed a very low noise-equivalent power (∼10-10 W Hz-1/2). The reliability of the nanostructured PD was ensured via fast switching with a response and decay time of 332 and 995 ms, which were more than five times faster with respect to the unetched pyramidal structure-based UV PD. The improvement in device performance was attributed to increased light absorption, efficient transport of photogenerated carriers, and enhancement in conduction cross section via elimination of recombination/trap centers related to defect states. Thus, the proposed method could be a promising approach to enhance the performance of GaN-based PD technology.
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Affiliation(s)
- Monu Mishra
- Academy
of Scientific and Innovative Research, CSIR-NPL
Campus, Dr. K.S. Krishnan
Marg, New Delhi 110012, India
- Advanced Materials and Devices
Division and Time and Frequency, Electrical &
Electronics Metrology Division, CSIR-National
Physical Laboratory, Dr. K.S. Krishnan Marg, New Delhi 110012, India
| | - Abhiram Gundimeda
- Academy
of Scientific and Innovative Research, CSIR-NPL
Campus, Dr. K.S. Krishnan
Marg, New Delhi 110012, India
- Advanced Materials and Devices
Division and Time and Frequency, Electrical &
Electronics Metrology Division, CSIR-National
Physical Laboratory, Dr. K.S. Krishnan Marg, New Delhi 110012, India
| | - Shibin Krishna
- Academy
of Scientific and Innovative Research, CSIR-NPL
Campus, Dr. K.S. Krishnan
Marg, New Delhi 110012, India
- Advanced Materials and Devices
Division and Time and Frequency, Electrical &
Electronics Metrology Division, CSIR-National
Physical Laboratory, Dr. K.S. Krishnan Marg, New Delhi 110012, India
| | - Neha Aggarwal
- Academy
of Scientific and Innovative Research, CSIR-NPL
Campus, Dr. K.S. Krishnan
Marg, New Delhi 110012, India
- Advanced Materials and Devices
Division and Time and Frequency, Electrical &
Electronics Metrology Division, CSIR-National
Physical Laboratory, Dr. K.S. Krishnan Marg, New Delhi 110012, India
| | - Lalit Goswami
- Advanced Materials and Devices
Division and Time and Frequency, Electrical &
Electronics Metrology Division, CSIR-National
Physical Laboratory, Dr. K.S. Krishnan Marg, New Delhi 110012, India
| | - Bhasker Gahtori
- Advanced Materials and Devices
Division and Time and Frequency, Electrical &
Electronics Metrology Division, CSIR-National
Physical Laboratory, Dr. K.S. Krishnan Marg, New Delhi 110012, India
| | - Biplab Bhattacharyya
- Academy
of Scientific and Innovative Research, CSIR-NPL
Campus, Dr. K.S. Krishnan
Marg, New Delhi 110012, India
- Advanced Materials and Devices
Division and Time and Frequency, Electrical &
Electronics Metrology Division, CSIR-National
Physical Laboratory, Dr. K.S. Krishnan Marg, New Delhi 110012, India
| | - Sudhir Husale
- Advanced Materials and Devices
Division and Time and Frequency, Electrical &
Electronics Metrology Division, CSIR-National
Physical Laboratory, Dr. K.S. Krishnan Marg, New Delhi 110012, India
| | - Govind Gupta
- Academy
of Scientific and Innovative Research, CSIR-NPL
Campus, Dr. K.S. Krishnan
Marg, New Delhi 110012, India
- Advanced Materials and Devices
Division and Time and Frequency, Electrical &
Electronics Metrology Division, CSIR-National
Physical Laboratory, Dr. K.S. Krishnan Marg, New Delhi 110012, India
- E-mail: , . Phone: +91-1145608403 (G.G.)
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37
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Mohammadi F, Schmitzer H, Kunert G, Hommel D, Ge J, Duscher G, Langbein W, Wagner HP. Emission dynamics of hybrid plasmonic gold/organic GaN nanorods. NANOTECHNOLOGY 2017; 28:505710. [PMID: 29064371 DOI: 10.1088/1361-6528/aa95a3] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
We studied the emission of bare and aluminum quinoline (Alq3)/gold coated wurtzite GaN nanorods by temperature- and intensity-dependent time-integrated and time-resolved photoluminescence (PL). The GaN nanorods of ∼1.5 μm length and ∼250 nm diameter were grown by plasma-assisted molecular beam epitaxy. Gold/Alq3 coated GaN nanorods were synthesized by organic molecular beam deposition. The near band-edge and donor-acceptor pair luminescence was investigated in bare GaN nanorods and compared with multilevel model calculations providing the dynamical parameters for electron-hole pairs, excitons, impurity bound excitons, donors and acceptors. Subsequently, the influence of a 10 nm gold coating without and with an Alq3 spacer layer was studied and the experimental results were analyzed with the multilevel model. Without a spacer layer, a significant PL quenching and lifetime reduction of the near band-edge emission is found. The behavior is attributed to surface band-bending and Förster energy transfer from excitons to surface plasmons in the gold layer. Inserting a 5 nm Alq3 spacer layer reduces the PL quenching and lifetime reduction which is consistent with a reduced band-bending and Förster energy transfer. Increasing the spacer layer to 30 nm results in lifetimes which are similar to uncoated structures, showing a significantly decreased influence of the gold coating on the excitonic dynamics.
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Affiliation(s)
- F Mohammadi
- Department of Physics, University of Cincinnati, Cincinnati, OH 45221, United States of America
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38
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Liu B, Yang W, Li J, Zhang X, Niu P, Jiang X. Template Approach to Crystalline GaN Nanosheets. NANO LETTERS 2017; 17:3195-3201. [PMID: 28414238 DOI: 10.1021/acs.nanolett.7b00754] [Citation(s) in RCA: 32] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
Crystalline GaN nanosheets hold great challenge in growth and promising application in optoelectronic nanodevices. In this work, we reported an accessible template approach toward the rational synthesis of GaN nanosheets through the nitridation of metastable γ-Ga2O3 nanosheets synthesized from a hydrothermal reaction. The cubic γ-Ga2O3 nanosheets with smooth surface and decent crystallinity can be directly converted into hexagonal GaN nanosheets with similar morphology framework and comparable crystal quality in NH3 at 850 °C. UV-vis spectrum measurement reveals that the GaN nanosheets show a band gap of 3.30 eV with strong visible absorption in the range of 370-500 nm. The template synthetic strategy proposed in this work will open up more opportunities for the achievement of a variety of sheetlike nanostructures that can not be obtained through conventional routines and will undoubtedly further promote the fundamental research of newly emerging sheetlike nanostructures and nanotechnology.
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Affiliation(s)
- Baodan Liu
- Shenyang National Laboratory for Materials Science (SYNL), Institute of Metal Research (IMR), Chinese Academy of Sciences (CAS) , No. 72 Wenhua Road, Shenyang 110016 China
| | - Wenjin Yang
- Shenyang National Laboratory for Materials Science (SYNL), Institute of Metal Research (IMR), Chinese Academy of Sciences (CAS) , No. 72 Wenhua Road, Shenyang 110016 China
- School of Materials Science and Engineering, University of Science and Technology of China , No. 72 Wenhua Road, Shenyang 110016 China
| | - Jing Li
- Shenyang National Laboratory for Materials Science (SYNL), Institute of Metal Research (IMR), Chinese Academy of Sciences (CAS) , No. 72 Wenhua Road, Shenyang 110016 China
| | - Xinglai Zhang
- Shenyang National Laboratory for Materials Science (SYNL), Institute of Metal Research (IMR), Chinese Academy of Sciences (CAS) , No. 72 Wenhua Road, Shenyang 110016 China
| | - Pingjuan Niu
- School of Electrical Engineering and Automation, Tianjin Polytechnical University No. 399, Binshuixi Road, Tianjin 300387, China
| | - Xin Jiang
- Shenyang National Laboratory for Materials Science (SYNL), Institute of Metal Research (IMR), Chinese Academy of Sciences (CAS) , No. 72 Wenhua Road, Shenyang 110016 China
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Wang H, Ding R, Wang C, Ren X, Wang L, Lv B. Iron cation-induced biphase symbiosis of h-WO3/o-WO3·0.33H2O and their crystal phase transition. CrystEngComm 2017. [DOI: 10.1039/c7ce00774d] [Citation(s) in RCA: 6] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/29/2022]
Abstract
h-WO3 and o-WO3·0.33H2O were proved to coexist in the same hexagonal prism nanoparticle via combination of instrumental characterization and the software simulation.
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Affiliation(s)
- Huixiang Wang
- State Key Laboratory of Coal Conversion
- Institute of Coal Chemistry
- Chinese Academy of Sciences
- Taiyuan 030001
- China
| | - Ruimin Ding
- State Key Laboratory of Coal Conversion
- Institute of Coal Chemistry
- Chinese Academy of Sciences
- Taiyuan 030001
- China
| | - Conghui Wang
- State Key Laboratory of Coal Conversion
- Institute of Coal Chemistry
- Chinese Academy of Sciences
- Taiyuan 030001
- China
| | - Xiaobo Ren
- State Key Laboratory of Coal Conversion
- Institute of Coal Chemistry
- Chinese Academy of Sciences
- Taiyuan 030001
- China
| | - Liancheng Wang
- State Key Laboratory of Coal Conversion
- Institute of Coal Chemistry
- Chinese Academy of Sciences
- Taiyuan 030001
- China
| | - Baoliang Lv
- State Key Laboratory of Coal Conversion
- Institute of Coal Chemistry
- Chinese Academy of Sciences
- Taiyuan 030001
- China
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